一种电子束直写的版图拆分方法和电子束直写方法
By dividing the pattern into multiple dose intervals and setting the number of layers to fill, the problem of the inability of existing equipment to correct the electron beam proximity effect point by point was solved, enabling layered electron beam direct writing on existing equipment, thus improving the lithography quality and the lithography effect of critical dimensions.
CN115712225BActive Publication Date: 2026-07-17INST OF MICROELECTRONICS CHINESE ACAD OF SCI LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- INST OF MICROELECTRONICS CHINESE ACAD OF SCI LTD
- Filing Date
- 2022-11-25
- Publication Date
- 2026-07-17
AI Technical Summary
Technical Problem
Existing electron beam direct writing equipment cannot achieve point-by-point correction of electron beam proximity effect, resulting in lithographic pattern distortion, especially poor linewidth uniformity and edge roughness in small-sized patterns.
Method used
The layout is divided into multiple dose intervals. The number of layers to fill is set according to the dose intervals, and empty dose intervals are deleted to obtain a layout file with multiple layers. Electron beam direct writing is performed using a simple layer division method.
Benefits of technology
Achieving layered electron beam direct writing on existing equipment improves lithography quality, corrects electron beam proximity effect, and enhances lithography quality at critical dimensions and locations.
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Figure CN115712225B_ABST
Abstract
本发明涉及一种电子束直写的版图拆分方法和电子束直写方法，属于微电子加工技术领域，解决了在现有机台上无法实现区域临近效应逐点校正的问题。所述版图拆分方法包括：将版图分割为多个剂量区间；根据分割的剂量区间设置图层填充数目；检测原有版图的剂量矩阵，将原有版图中存在的剂量点位根据其剂量值归至相应剂量区间，删除最终仍然空置的剂量区间，得到含有多个图层的版图文件。该版图拆分方法简单、直接，可以将剂量分布简单化，能够使电子束直写机台实现分图层电子束直写。
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