Plasma generation device and method of controlling the same

Abstract

According to one embodiment of the present disclosure, a plasma generating apparatus for performing plasma discharge and a control method thereof can be provided, the plasma generating apparatus having a plurality of operation modes including a first mode and a second mode, and including: a first power supply capable of varying a frequency within a first frequency range; a second power supply capable of varying a frequency within a second frequency range different at least in part from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound at least once around the dielectric tube, a second unit coil wound at least once around the dielectric tube, and a first capacitor connected in series between the first unit coil and the second unit coil.

Description

Technical Field

[0001] This disclosure relates to a plasma generating apparatus and a control method thereof. More specifically, this disclosure relates to a plasma generating apparatus and a control method thereof for reducing byproducts generated during plasma discharge. Background Technology

[0002] Plasma discharge is used in many industrial and scientific applications, and it generates active substances for various gases in various industrial fields (such as semiconductor wafer processing) or achieves the treatment of by-products generated in industrial processes.

[0003] Plasma sources used for plasma discharge primarily employ inductively coupled plasma (ICP) or capacitively coupled plasma (CCP) methods. The ICP method involves applying radio frequency (RF) power to a coil to create an induced electric field, and then using this induced electric field to perform plasma discharge.

[0004] Because the active species or ions generated by the discharge collide with the dielectric tube due to the voltage applied to the antenna used for discharge, impurities may be introduced into the active species during plasma discharge. Therefore, there is a need to develop a plasma generation device that reduces impurities contained in the active species through the structure or design of the antenna used for plasma discharge.

[0005] The foregoing is intended only to help understand the background of this disclosure and is not intended to imply that this disclosure falls within the scope of related technologies known to those skilled in the art. Summary of the Invention

[0006] Technical issues

[0007] This disclosure relates to providing a plasma generating apparatus.

[0008] Additionally, this disclosure relates to providing a plasma generating apparatus that provides active species with reduced impurities.

[0009] The technical problems to be solved by this disclosure are not limited to those mentioned above, and those skilled in the art will clearly understand other technical problems not mentioned based on this disclosure and the accompanying drawings.

[0010] Technical solutions

[0011] According to embodiments of this disclosure, a plasma generating apparatus for performing plasma discharge is provided. The plasma generating apparatus has multiple operating modes, including a first mode and a second mode, and includes: a first power supply capable of changing frequencies within a first frequency range; a second power supply capable of changing frequencies within a second frequency range that is at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound at least once around the dielectric tube, a second unit coil wound at least once around the dielectric tube, and a first capacitor connected in series between the first unit coil and the second unit coil. When the operating mode is the first mode, the antenna module senses a first plasma discharge based on a power signal having a first frequency within the first frequency range; or when the operating mode is the second mode, the antenna module senses a second plasma discharge based on a power signal having a second frequency within the second frequency range. The first unit coil and the second unit coil have a first inductance, the first capacitor has a first capacitance, and the first frequency corresponds to a first resonant frequency determined based on the first inductance and the first capacitance.

[0012] According to another embodiment of this disclosure, a control method for a plasma generating device is provided. The plasma generating device includes: a first power supply capable of changing frequencies within a first frequency range; a second power supply capable of changing frequencies within a second frequency range at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound at least once around the dielectric tube, a second unit coil wound at least once around the dielectric tube, and a first capacitor connected in series between the first unit coil and the second unit coil. The control method includes: operating in a first mode, wherein the first frequency is used as a driving frequency to provide RF power to the antenna module; and operating in a second mode, wherein the second frequency is used as the driving frequency to provide RF power to the antenna module, wherein the first unit coil and the second unit coil have a first inductance, and the first capacitor has a first capacitance, wherein the second frequency corresponds to a second resonant frequency determined by the first inductance and the first capacitance.

[0013] According to another embodiment of this disclosure, a plasma generating apparatus is provided, the plasma generating apparatus being configured to generate plasma by receiving power from a first power supply capable of changing frequencies within a first frequency range when the operating mode is a first mode, or receiving power from a second power supply capable of changing frequencies within a second frequency range at least partially different from the first frequency range when the operating mode is a second mode. The plasma generating apparatus includes: a dielectric tube; and an antenna module including a first unit coil wound at least once around the dielectric tube, a second unit coil wound at least once around the dielectric tube, and a first capacitor connected in series between the first unit coil and the second unit coil. When the operating mode is the first mode, the antenna module senses a first plasma discharge based on a power signal having a first frequency within the first frequency range; or when the operating mode is the second mode, the antenna module senses a second plasma discharge based on a power signal having a second frequency within the second frequency range. The first unit coil and the second unit coil have a first inductance, the first capacitor has a first capacitance, and the first frequency corresponds to a first resonant frequency determined based on the first inductance and the first capacitance.

[0014] The technical solutions described herein may not be limited to those described above, and those skilled in the art will clearly understand other unmentioned technical solutions based on this description and the accompanying drawings.

[0015] Beneficial effects

[0016] According to this disclosure, a plasma generating apparatus that can be used in various environments can be provided.

[0017] According to this disclosure, a plasma generating apparatus capable of reducing impurities contained in active species can be provided.

[0018] The effects of this disclosure are not limited to those described above, and those skilled in the art should clearly understand, based on this disclosure and the accompanying drawings, other effects not described herein. Attached Figure Description

[0019] Figure 1 This is a diagram illustrating a plasma generation system according to an embodiment of the present disclosure.

[0020] Figure 2 This is a diagram illustrating a plasma generation system according to an embodiment of the present disclosure.

[0021] Figure 3 This is a diagram illustrating a plasma generating apparatus according to an embodiment of the present disclosure.

[0022] Figure 4This is a diagram illustrating a direct current (DC) electrode according to an embodiment of the present disclosure.

[0023] Figure 5 This is a diagram illustrating a DC power supply according to an embodiment of the present disclosure.

[0024] Figure 6 This is a diagram illustrating a DC electrode according to an embodiment of the present disclosure.

[0025] Figure 7 This is a diagram illustrating a DC power supply according to an embodiment of the present disclosure.

[0026] Figure 8 This is a diagram illustrating an antenna module according to an embodiment of the present disclosure.

[0027] Figure 9 This is a diagram illustrating the operation of an antenna module according to an embodiment of the present disclosure.

[0028] Figure 10 This is a diagram illustrating an antenna module according to an embodiment of the present disclosure.

[0029] Figure 11 This is a diagram illustrating the operation of an antenna module according to an embodiment of the present disclosure.

[0030] Figure 12 This is a diagram showing the shape of an antenna module according to an embodiment of the present disclosure.

[0031] Figure 13 This is a diagram illustrating an RF power supply according to an embodiment of the present disclosure.

[0032] Figure 14 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0033] Figure 15 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0034] Figure 16 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0035] Figure 17 This is a diagram illustrating a plasma generating apparatus according to an embodiment of the present disclosure.

[0036] Figure 18 This is a diagram illustrating a plasma generating apparatus according to an embodiment of the present disclosure.

[0037] Figure 19 This is a diagram illustrating a control method for a plasma generating apparatus according to an embodiment of the present disclosure.

[0038] Figure 20This is a diagram illustrating a plasma generating apparatus according to an embodiment of the present disclosure.

[0039] Figure 21 This is a diagram illustrating a control method for a plasma generating apparatus according to an embodiment of the present disclosure.

[0040] Figure 22 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0041] Figure 23 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0042] Figure 24 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0043] Figure 25 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0044] Figure 26 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0045] Figure 27 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0046] Figure 28 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0047] Figure 29 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0048] Figure 30 This is a diagram illustrating a plasma generation process according to an embodiment of the present disclosure.

[0049] Figure 31 This is a diagram illustrating a plasma generating apparatus according to an embodiment of the present disclosure.

[0050] Figure 32 This is a diagram illustrating a control method for a plasma generating apparatus according to an embodiment of the present disclosure.

[0051] Figure 33 This is a diagram illustrating a plasma generating apparatus according to an embodiment of the present disclosure.

[0052] Figure 34 This is a diagram illustrating a control method for a plasma generating apparatus according to an embodiment of the present disclosure.

[0053] Figure 35 This is a diagram illustrating a control method for a plasma generating apparatus according to an embodiment of the present disclosure.

[0054] Figure 36 This is a diagram illustrating an antenna module according to an embodiment of the present disclosure.

[0055] Figure 37 This is a diagram illustrating a unit antenna according to an embodiment of the present disclosure.

[0056] Figure 38 This is a diagram illustrating the voltage applied to the antenna module according to an embodiment of the present disclosure.

[0057] Figure 39 This is a diagram illustrating the voltage applied to the antenna module according to an embodiment of the present disclosure.

[0058] Figure 40 This is a diagram illustrating the voltage applied to the antenna module according to an embodiment of the present disclosure. Detailed Implementation

[0059] According to embodiments of this disclosure, a plasma generating apparatus for performing plasma discharge is provided. The plasma generating apparatus has multiple operating modes, including a first mode and a second mode, and includes: a first power supply capable of changing frequencies within a first frequency range; a second power supply capable of changing frequencies within a second frequency range that is at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound at least once around the dielectric tube, a second unit coil wound at least once around the dielectric tube, and a first capacitor connected in series between the first unit coil and the second unit coil. When the operating mode is the first mode, the antenna module senses a first plasma discharge based on a power signal having a first frequency within the first frequency range; or when the operating mode is the second mode, the antenna module senses a second plasma discharge based on a power signal having a second frequency within the second frequency range. The first unit coil and the second unit coil have a first inductance, the first capacitor has a first capacitance, and the first frequency corresponds to a first resonant frequency determined based on the first inductance and the first capacitance.

[0060] According to embodiments of this disclosure, the first power supply may include a first matching element having a first impedance.

[0061] According to an embodiment of this disclosure, when the operating mode is the first mode, the antenna module can perform the first plasma discharge based on the power signal having the first frequency, wherein the first frequency may correspond to the first resonant frequency determined based on the first impedance, the first inductance, and the first capacitance.

[0062] According to embodiments of this disclosure, the second power supply may include a second matching element having a second impedance, and when the operating mode is the second mode, the antenna module may perform the second plasma discharge based on the power signal having the second frequency, wherein the second frequency may correspond to a second resonant frequency determined based on the second impedance, the first inductor and the first capacitor, and the second resonant frequency is different from the first resonant frequency.

[0063] According to embodiments of this disclosure, the second resonant frequency may be higher than the first resonant frequency, and when the operating mode is the first mode, the first voltage, which is the voltage between the end of the first unit coil that is not connected to the first capacitor and the end of the second unit coil that is not connected to the first capacitor, may be lower than the second voltage, which is the voltage between the end of the first unit coil that is not connected to the first capacitor and the end of the second unit coil that is not connected to the first capacitor, when the operating mode is the second mode.

[0064] According to an embodiment of this disclosure, when the operating mode is the first mode, the voltage between the two ends of the first unit coil can correspond to the voltage between the end of the first unit coil that is not connected to the first capacitor and the end of the second unit coil that is not connected to the first capacitor.

[0065] According to an embodiment of this disclosure, when the operating mode is the first mode, the voltage between the two ends of the antenna module may be lower than the voltage between the two ends of the antenna module when the operating mode is the second mode.

[0066] According to an embodiment of this disclosure, when the operating mode is the first mode, the magnitude of the first current flowing through the antenna module may be less than the magnitude of the second current flowing through the antenna module when the operating mode is the second mode.

[0067] According to embodiments of this disclosure, when the operating mode is the first mode, the power consumed by the antenna module can be a first power source, and when the operating mode is the second mode, the power consumed by the antenna module can be a second power source, wherein the second power source is lower than the first power source.

[0068] According to another embodiment of this disclosure, a control method for a plasma generating device is provided. The plasma generating device includes: a first power supply capable of changing frequencies within a first frequency range; a second power supply capable of changing frequencies within a second frequency range at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound at least once around the dielectric tube, a second unit coil wound at least once around the dielectric tube, and a first capacitor connected in series between the first unit coil and the second unit coil. The control method includes: operating in a first mode, wherein the first frequency is used as a driving frequency to provide RF power to the antenna module; and operating in a second mode, wherein the second frequency is used as the driving frequency to provide RF power to the antenna module, wherein the first unit coil and the second unit coil have a first inductance, and the first capacitor has a first capacitance, wherein the second frequency corresponds to a second resonant frequency determined by the first inductance and the first capacitance.

[0069] According to embodiments of this disclosure, the second power supply may include a second matching element having a second impedance, and operating in the second mode may include operating using the second frequency as the drive frequency, wherein the second frequency may correspond to a second resonant frequency determined based on the first inductor, the first capacitor, and the second impedance.

[0070] According to embodiments of this disclosure, the first power supply may include a first matching element having a first impedance, and operating in the first mode may include operating using the first frequency as the drive frequency, wherein the first frequency may correspond to a first resonant frequency determined based on the first inductor, the first capacitor, and the first impedance.

[0071] According to embodiments of this disclosure, when the operating mode is the first mode, the power consumed by the antenna module can be a first power source, and when the operating mode is the second mode, the power consumed by the antenna module can be a second power source, wherein the second power source is higher than the first power source.

[0072] According to an embodiment of this disclosure, when the operating mode is the first mode, the voltage between the two ends of the first unit coil can correspond to the voltage between the end of the first unit coil that is not connected to the first capacitor and the end of the second unit coil that is not connected to the first capacitor.

[0073] According to an embodiment of this disclosure, when the operating mode is the first mode, the magnitude of the first current flowing through the antenna module may be less than the magnitude of the second current flowing through the antenna module when the operating mode is the second mode.

[0074] According to an embodiment of this disclosure, the control method of the plasma generating device may further include: when the operating mode is the first mode, acquiring the current flowing through the antenna module; and when the current flowing through the antenna module is equal to or less than a reference value, changing the operating mode to the second mode.

[0075] According to an embodiment of this disclosure, the control method of the plasma generating device may further include: when the operating mode is the first mode, acquiring the current flowing through the inverter of the first power supply; and when the current flowing through the inverter of the first power supply is equal to or less than a reference value, changing the operating mode to the second mode.

[0076] According to another embodiment of this disclosure, a plasma generating apparatus is provided, the plasma generating apparatus being configured to generate plasma by receiving power from a first power supply capable of changing frequencies within a first frequency range when the operating mode is a first mode, or receiving power from a second power supply capable of changing frequencies within a second frequency range at least partially different from the first frequency range when the operating mode is a second mode. The plasma generating apparatus includes: a dielectric tube; and an antenna module including a first unit coil wound at least once around the dielectric tube, a second unit coil wound at least once around the dielectric tube, and a first capacitor connected in series between the first unit coil and the second unit coil. When the operating mode is the first mode, the antenna module senses a first plasma discharge based on a power signal having a first frequency within the first frequency range; or when the operating mode is the second mode, the antenna module senses a second plasma discharge based on a power signal having a second frequency within the second frequency range. The first unit coil and the second unit coil have a first inductance, the first capacitor has a first capacitance, and the first frequency corresponds to a first resonant frequency determined based on the first inductance and the first capacitance.

[0077] According to an embodiment of this disclosure, when the operating mode is the first mode, the voltage between the two ends of the antenna module may be lower than the voltage between the two ends of the antenna module when the operating mode is the second mode.

[0078] According to an embodiment of this disclosure, when the operating mode is the first mode, the voltage between the two ends of the first unit coil can correspond to the voltage between the end of the first unit coil that is not connected to the first capacitor and the end of the second unit coil that is not connected to the first capacitor.

[0079] According to embodiments of this disclosure, an antenna module coupled to a dielectric tube and powered by a power source is provided. The antenna module includes: a first unit antenna including a first unit turn having a first point and a second point, and a second unit turn having a third point and a fourth point, wherein the first unit turn is placed between the dielectric tube and the second unit turn, and wherein the second point of the first unit turn is connected to the third point of the second unit turn; a first capacitor electrically inserted between a first terminal of the power source and the first point of the first unit turn, wherein the first point of the first unit turn is connected to the first capacitor; and a second capacitor electrically inserted between a second terminal of the power source and the fourth point of the second unit turn, wherein the capacitance of the second capacitor is smaller than the capacitance of the first capacitor, thereby minimizing damage to the dielectric tube and the generation of byproducts caused by the voltage applied to the antenna module.

[0080] According to embodiments of this disclosure, the antenna module may further include a third capacitor electrically inserted between the fourth point of the second unit turn and the second capacitor, wherein the capacitance of the third capacitor is less than the capacitance of the second capacitor.

[0081] According to embodiments of this disclosure, the capacitance of the first capacitor may be more than twice the capacitance of the second capacitor.

[0082] According to embodiments of this disclosure, the total capacitance of the first capacitor and the second capacitor may correspond to the capacitance of the third capacitor.

[0083] According to embodiments of this disclosure, the antenna module may further include a second unit antenna, the second unit antenna including a third unit turn having a fifth point and a sixth point and a fourth unit turn having a seventh point and an eighth point, wherein the third unit turn is placed between the dielectric tube and the fourth unit turn, wherein the sixth point of the third unit turn is connected to the seventh point of the fourth unit turn, wherein a third capacitor is electrically inserted between the fourth point and the fifth point of the second unit turn, and wherein a second capacitor is electrically inserted between the eighth point of the fourth unit turn and the second terminal of the power supply.

[0084] According to embodiments of the present disclosure, the first unit turn and the second unit turn may be placed in a plane perpendicular to the length direction of the dielectric tube, and each of the first unit turn and the second unit turn may have an arc shape.

[0085] According to embodiments of this disclosure, the first point may be closer to the dielectric tube than the fourth point.

[0086] According to embodiments of this disclosure, when power is supplied to the antenna module, the voltage applied to the reactance component of the first capacitor may be less than the voltage applied to the reactance component between the first and second points, and the voltage applied to the reactance component of the third capacitor may correspond to the voltage applied to the reactance component between the first and second points.

[0087] According to an embodiment of this disclosure, the antenna module resonates at a resonant frequency determined based on the capacitance of the third capacitor and the inductance of the first unit antenna, and when the antenna module is in a resonant state, the point where the potential of the reactance component of the first terminal is 0 can be placed on the first unit turn of the first unit antenna.

[0088] According to embodiments of this disclosure, the antenna module can resonate at a resonant frequency determined based on the capacitance of the third capacitor and the inductance of the first unit antenna, wherein the voltage of the reactive component applied between the first point and the first terminal of the power supply can be substantially the same as the voltage of the reactive component applied between the second point and the first terminal of the power supply.

[0089] According to embodiments of this disclosure, an antenna module may be provided, the antenna module being coupled to a dielectric tube and powered by a power source, the antenna module comprising: a first unit antenna including a first unit turn having a first point and a second point and a second unit turn having a third point and a fourth point, wherein the first unit turn is placed between the dielectric tube and the second unit turn, and wherein the second point of the first unit turn is connected to the third point of the second unit turn; a first capacitor electrically inserted between a first terminal of the power source and the first point of the first unit turn; and a second capacitor connected to the fourth point of the second unit turn, wherein the first capacitor is electrically inserted between the first terminal of the power source and the first point of the first unit turn.

[0090] According to embodiments of this disclosure, the antenna module can resonate at a resonant frequency determined based on the capacitance of the second capacitor and the inductance of the first unit antenna, and wherein when the antenna module resonates, a point where the voltage in the first unit antenna is minimized can be located in the first unit turn.

[0091] According to an embodiment of this disclosure, when power is applied to the antenna module, a point where the voltage in the first unit antenna is minimized may be located in the first unit turn.

[0092] According to an embodiment of this disclosure, when power is applied to the antenna module, the point where the absolute value of the potential of the reactance component in the first unit antenna is located in the first unit turn.

[0093] According to embodiments of this disclosure, the capacitance of the first capacitor may be more than twice the capacitance of the second capacitor.

[0094] According to embodiments of this disclosure, in order to minimize damage to the dielectric tube and the generation of byproducts caused by the voltage applied to the antenna module, the capacitance of the second capacitor may be smaller than the capacitance of the first capacitor.

[0095] According to embodiments of this disclosure, the antenna module may further include a second unit antenna, the second unit antenna including a third unit turn extending from a fifth point to a sixth point and a fourth unit turn extending from a seventh point to an eighth point, wherein the third unit turn is located inside the fourth unit turn, and the sixth point is connected to the seventh point, wherein a second capacitor is connected between the fourth point and the fifth point, and wherein a third capacitor may be included connected between the eighth point and a second terminal of the power supply.

[0096] According to embodiments of this disclosure, the capacitance of the second capacitor may be smaller than the capacitance of the third capacitor.

[0097] According to embodiments of this disclosure, the total capacitance of the first capacitor and the third capacitor may correspond to the capacitance of the second capacitor.

[0098] According to embodiments of this disclosure, an antenna module can be provided, the antenna module being coupled to a dielectric tube and powered by a power source, the antenna module comprising: a first unit antenna including a first unit turn extending from a first point to a second point and a second unit turn extending from a third point to a fourth point, the first unit turn being located inside the second unit turn and the second point being connected to the third point; a first capacitor connected to the first point of the first unit turn and connected between a first terminal of the power source and the first point; and a second capacitor connected between a second terminal of the power source and the fourth point; wherein the capacitance of the second capacitor is different from the capacitance of the first capacitor.

[0099] According to embodiments of this disclosure, the antenna module may further include: a third capacitor connected between a fourth point of the second unit turn and the second capacitor; a second unit antenna including a third unit turn extending from a fifth point to a sixth point and a fourth unit turn extending from a seventh point to an eighth point, the third unit turn being located inside the fourth unit turn and the sixth point being connected to the seventh point; wherein the third capacitor is connected between the fourth point and the fifth point, wherein the second capacitor is connected between the eighth point and the second terminal of the power supply, and wherein the total capacitance of the first capacitor and the second capacitor corresponds to the capacitance of the third capacitor.

[0100] Invention patterns

[0101] The above-described objects, features, and advantages of this disclosure will become more apparent from the following description taken in conjunction with the accompanying drawings. This disclosure can be modified in various ways and implemented by various embodiments, such that specific embodiments are shown and will be described in detail in the accompanying drawings.

[0102] In the accompanying drawings, the thickness of layers and regions is exaggerated for clarity. Furthermore, it should be understood that when an element or layer is located on another element or layer, the element or layer may be directly disposed on the other element or layer, or it may be disposed on the other element or layer with an intermediate layer or element between the two elements or layers. Throughout this specification, the same reference numerals denote the same elements in principle. Additionally, in the drawings of each embodiment, the same reference numerals are used to describe elements having the same function within the same scope.

[0103] When it is determined that a detailed description of a known function or configuration related to this disclosure may obscure the essential points of this disclosure, such detailed description will be omitted. Furthermore, the numbers used in describing this disclosure (e.g., first, second, etc.) are merely identification symbols used to distinguish individual elements.

[0104] In addition, the terms “module” and “unit” used for components in the following description are given or combined and are used only for ease of preparing the instruction manual, and do not in themselves have a distinguishing meaning or function from each other.

[0105] The method according to the embodiments can be configured to be program instructions executable by various computer components and recordable on a computer-readable medium. The computer-readable medium may include program instructions, data files, data structures, and the like, individually or in combination. The program instructions recorded on the medium may be specifically designed and configured for this disclosure or may be well known and usable by those skilled in the art of computer software. Examples of computer-readable recording media include: magnetic media, such as hard disks, floppy disks, and magnetic tapes; optical media, such as compact disc-read-only memory (CD-ROM) and digital versatile disc (DVD); magneto-optical media, such as floppy disks; and hardware devices, such as ROM, random access memory (RAM), and flash memory, said computer-readable recording media being specifically configured to store and execute program instructions. Examples of program instructions may include machine language code compiled by a compiler and high-level language code executed by a computer using an interpreter. The aforementioned hardware device may be configured to act as one or more software modules to perform the operations of the embodiments, or vice versa.

[0106] 1. Plasma generation system

[0107] According to an embodiment, a plasma generation system may be provided.

[0108] Figure 1This is a diagram illustrating a plasma generation system according to an embodiment. (Refer to...) Figure 1 The plasma generation system may include: a power supply unit 100 for providing power; a plasma generation unit 200 for receiving power from the power supply unit 100 and generating plasma; and a gas supply unit 300 for supplying gas to the plasma generation unit 200. The plasma generation system may also include a process unit 400 for performing processes using the generated plasma.

[0109] The power supply unit 100 can supply the power required to generate plasma. The power supply unit 100 can supply power to the plasma generating unit 200. The power supply unit 100 may include DC power and / or RF power. The power supply unit 100 can provide high-voltage pulses to the plasma generating unit 200 via DC power. The power supply unit 100 can provide RF power to the plasma generating unit 200 via RF power.

[0110] The plasma generation unit 200 can perform plasma discharge. The plasma generation unit 200 can acquire discharge gas and perform plasma discharge through the discharge gas. The plasma generation unit 200 can perform inductively coupled plasma discharge or capacitively coupled plasma discharge.

[0111] The plasma generation unit 200 can be a remote plasma source. The plasma generation unit 200 can form active species and provide the formed active species to the process unit 400.

[0112] The plasma generation unit 200 may include a normal pressure plasma device that performs plasma discharge at atmospheric pressure (normal pressure). For example, the plasma generation unit 200 may include a normal pressure plasma device that performs plasma discharge at pressures ranging from several hundred Torr to atmospheric pressure (750 Torr).

[0113] The plasma generation unit 200 may include a low-pressure plasma device for performing low-pressure plasma discharge. For example, the plasma generation unit 200 may include a low-pressure plasma device having a 10 -5 Up to 10 -7 or less than 10 -7 The initial vacuum level (base pressure) environment is maintained, and plasma is generated using the desired process gas at a process pressure of a few millitors to a few tors.

[0114] The plasma generation unit 200 can perform low-temperature plasma discharge operations at temperatures ranging from tens to hundreds of degrees Celsius. For example, the plasma generation unit 200 can perform low-pressure and low-temperature plasma discharge operations, such as cleaning, etching, deposition, surface treatment, and material synthesis in semiconductor and display manufacturing processes. Additionally, for example, the plasma generation unit 200 can perform normal-pressure and low-temperature plasma discharge operations for cleaning processes on glass substrates, modification of hydrophilic / hydrophobic surfaces, nanotechnology, sterilization, removal of hazardous substances, and reduction of carbon dioxide.

[0115] The plasma generation unit 200 can perform high-temperature plasma discharge operations for gas reforming, particle generation, plasma welding, cutting and metallurgy at temperatures ranging from several thousand degrees Celsius to tens of thousands of degrees Celsius.

[0116] In the following text, plasma generation unit 200 or plasma generation device may be interpreted as equipment that performs the above-mentioned low-temperature plasma discharge or high-temperature plasma discharge.

[0117] The plasma generation unit 200 can generate seed charges to generate plasma. Specifically, when the plasma generation unit 200 performs normal pressure plasma discharge, it generates seed charges for initial discharge. The plasma generation unit 200 includes a DC electrode, and seed charges are generated when a high-voltage DC pulse is supplied to the DC electrode.

[0118] The plasma generation unit 200 can generate plasma by performing initial discharge and main discharge. The plasma generation unit 200 can perform initial discharge according to capacitive coupling mode (mode E) or main discharge according to inductive coupling mode (mode H). The plasma generation unit 200 includes an inductively coupled antenna containing a coil, and can perform initial discharge or main discharge when RF power is supplied to the inductively coupled antenna.

[0119] The detailed configuration and operation of the plasma generation unit 200 will be described below.

[0120] The gas supply unit 300 can supply gas for plasma discharge to the plasma generation unit 200. The gas supply unit 300 can also supply reactive gas or process gas to the plasma generation unit 200. The gas supply unit 300 can supply gas selected according to the function or purpose of the plasma generation unit 200 or the process unit 400.

[0121] For example, the gas supply unit 300 may supply the plasma generation unit 200 with any of the following gases or a mixture of gases and air: nitrogen trifluoride (NF3), argon (Ar), xenon (Xe), krypton (Kr), nitrogen (N2), oxygen (O2), hydrogen (H2), helium (He), neon (Ne), silane (SiH4), ammonia (NH3), phosphine (PH3), diborane (B2H6), dichlorosilane (DCS), octafluorocyclopropene (C5F8), carbon tetrafluoride (CF4), hydrogen bromide (HBr), chlorine (Cl2), sulfur hexafluoride (SF6), and methane (CH4). The gas supply unit 300 can supply gas to the plasma generation unit via liquid precursors (such as tetra-ethyl-ortho-silicate (TEOS), tetra(ethylmethylamino)zirconium, trimethylaluminum, and hexamethyldisiloxane).

[0122] Processing unit 400 can perform the process before or after plasma discharge. The processing unit can perform the desired process using plasma generated by plasma generation unit 200. Alternatively, processing unit 400 can transfer material generated by performing the desired process to plasma generation unit.

[0123] The following are possible process steps: a cleaning process that removes fine oil films from the surface of the material to be treated by surface and plasma ion / free radical collisions; an etching process that uses reactive etching gases to generate plasma and selectively removes materials using plasma; a deposition process that injects a suitable deposition gas and an additional gas for plasma discharge and deposits materials on the surface; a modification process that uses plasma to change the properties of the surface; and a material decomposition process that decomposes the target material by plasma discharge.

[0124] The process unit 400 can perform operations related to the processing of the semiconductor substrate. For example, the process unit 400 can receive active species (e.g., hydrogen-active species) from the plasma generation unit and can perform a cleaning process inside the process chamber.

[0125] The process unit 400 may include: a process chamber; a substrate holder disposed inside the process chamber, wherein the semiconductor substrate to be processed (e.g., a silicon semiconductor substrate) is located at the substrate holder; a shower head located above the substrate holder and used to supply substrate processing material into the process chamber; and / or a vacuum pump for discharging air from the process chamber.

[0126] The plasma generation system can be configured such that the process unit 400 performs the intended process through plasma generated by the plasma generation unit 200, or that byproducts generated by the intended process of the process unit 400 are processed by the plasma generation unit 200. Figure 2 This is a diagram illustrating a plasma generation system according to several embodiments.

[0127] Reference Figure 2 (a) According to an embodiment, the plasma generation system may include a process unit 401 and a plasma generation unit 201 for processing the materials generated by the process unit 401. For example, referring to... Figure 2 (a) The plasma generation system may include a gas scrubbing device. Process unit 401 is an apparatus for performing a semiconductor manufacturing process. Plasma generation unit 201 may perform treatment of persistent gases (e.g., sulfur hexafluoride (SF6), carbon tetrafluoride (CF4), and perfluorocarbon (PFC) gases) generated during the semiconductor manufacturing process of process unit 401.

[0128] Reference Figure 2 (b) According to the embodiment, the plasma generation system may include: a plasma generation unit 202 that generates active species and supplies the active species to a process unit (402); and a process unit (402) that performs a process using the active species. For example, the plasma generation unit 202 may generate the active species through plasma discharge of gases such as NF3, H2, N2, O2, C3F8, CF4, Cl2, and SiH4. The process unit (402) may perform operations such as dry etching, plasma-enhanced chemical vapor deposition (PECVD), physical vapor deposition (PVD), ashing, and cleaning using the active species generated by the plasma generation unit 202.

[0129] 2. Plasma generating device

[0130] 2.1 Overview of Plasma Generation Devices

[0131] The following section will describe a plasma generation device that uses multiple resonant frequencies to perform plasma discharge.

[0132] According to an embodiment, the plasma generating device may include multiple modules with different impedances. When power is supplied at a resonant frequency corresponding to the respective module, the plasma generating device resonates at the resonant frequency corresponding to the respective module. For example, the plasma generating device may include a first module having a first impedance and a second module having a second impedance, and may resonate at a first frequency corresponding to the first module and a second frequency corresponding to the second module.

[0133] According to an embodiment, the plasma generating device can perform different functions depending on the frequency of the applied power supply. For example, when power is supplied at a first frequency, the plasma generating device performs an initial discharge to promote the initial generation of plasma. Alternatively, when power is supplied at a second frequency different from the first frequency, the plasma generating device performs a main discharge to continuously generate and maintain plasma.

[0134] The plasma generating apparatus can be configured such that the components supplied with power vary according to the frequency of the applied power supply. When power is supplied at a first frequency, the plasma generating apparatus supplies more power to the first module than to the second module. When power is supplied at a second frequency, the plasma generating apparatus supplies more power to the second module than to the first module.

[0135] In the following, a plasma generating apparatus according to several embodiments will be described, the plasma generating apparatus including the power supply unit and the plasma generating unit described above.

[0136] 2.2 Configuration of Plasma Generation Device

[0137] 2.2.1 Overview

[0138] Figure 3 This is a diagram illustrating a plasma generating apparatus according to an embodiment. (Refer to...) Figure 3 The plasma generating apparatus according to an embodiment may include: an RF power supply 101 capable of changing its frequency; and a plasma generating unit that receives power from the RF power supply 101 and generates plasma. (See also...) Figure 3 The plasma generating unit may include: a dielectric tube 210; gas tubes 211 and 213 located inside the dielectric tube 210; and an antenna module 220 located close to the dielectric tube 210, receiving power from the RF power supply 101 to form an induced electric field and generate plasma inside the dielectric tube 210. The plasma generating device may also include an auxiliary gas supply nozzle 250.

[0139] RF power supply 101 can change the drive frequency within a variable frequency range. RF power supply 101 can have a variable frequency range of hundreds of kilohertz to tens of megahertz and / or a power supply of tens of kilowatts or more. For example, RF power supply 101 can provide alternating current (AC) power at frequencies ranging from 100 kilohertz to 5 megahertz.

[0140] According to an embodiment, the frequency of the RF power supply 101 can be applied differently depending on the shape of the antenna module. For example, the frequency of the RF power supply can vary depending on the spacing of the capacitors included in the antenna module. For example, depending on the spacing of the capacitors included in the antenna module, an RF power supply with a maximum frequency of several million hertz or tens of megahertz can be used.

[0141] The RF power supply 101 can achieve impedance matching by changing the driving frequency. The RF power supply 101 can change the driving frequency so that the plasma generation unit operates in a resonant state.

[0142] The RF power supply 101 may include: a rectifier that converts commercial AC power into DC power; a controller that controls the drive frequency and power supply by providing a switching signal; and an inverter that converts DC power into RF power based on the controller's switching signal.

[0143] The dielectric tube 210 can be provided in the form of a cylindrical tube. The outer diameter of the dielectric tube 210 can be from a few centimeters to tens of centimeters. The inner diameter of the dielectric tube 210 can be a few millimeters to a few centimeters smaller than its outer diameter.

[0144] The dielectric tube 210 may be a dielectric tube. The dielectric tube 210 may be made of a non-conductive material (e.g., ceramic (e.g., alumina or AlN), sapphire, and quartz).

[0145] The dielectric tube 210 provides a discharge region in which plasma resides. The internal and external pressures of the dielectric tube 210 can be adjusted differently. As needed, the internal pressure of the dielectric tube 210 can be adjusted to an ultra-low pressure equivalent to a vacuum, or to a low pressure of a few millitors equal to or higher than atmospheric pressure.

[0146] Gas tubes 211 and 213 provide pathways for supplying gas to dielectric tube 210 and its interior. Gas tubes 211 and 213 prevent plasma from contacting the inner wall of dielectric tube 210 and ensure plasma stability.

[0147] The number of gas tubes 211 and 213 may be one or more. A gas tube may include a first gas tube 211 and a second gas tube 213. The first gas tube 211 and the second gas tube 213 may have a concentric structure. The first gas tube 211 may provide an input path for a first gas (e.g., a gas used in a reaction, such as methane gas). The second gas tube 213 may provide an input path for a second gas having a composition different from that of the first gas (e.g., a gas containing carbon dioxide as a main component).

[0148] The first gas pipe 211 and the second gas pipe 213 can provide swirl flow. For example, the first gas pipe 211 can provide internal swirl flow, and the second gas pipe 213 can provide external swirl flow.

[0149] Antenna module 220 can receive power from RF power supply 101 and can induce plasma discharge inside dielectric tube 210. Antenna module 220 can receive AC power from RF power supply 101 and can generate inductively coupled plasma inside dielectric tube 210. A more detailed example of antenna module 220 will be illustrated using the following electrode breakdown.

[0150] The auxiliary gas supply nozzle 250 supplies auxiliary gas to the dielectric tube 210. The auxiliary gas supply nozzle 250 can be positioned near the other end facing the dielectric tube 210, through which gas is input. The auxiliary gas supply nozzle 250 can be located close to the dielectric tube 210 and can be positioned between the antenna module 220 and the gas discharge port (the outlet of the dielectric tube 210).

[0151] The plasma generating device may also include a safety housing 190 to ensure the safety of the dielectric tube 210 and antenna module 220 and to block external influences.

[0152] 2.2.2 DC Power Supply and Electrodes

[0153] The plasma generating apparatus according to an embodiment may include: a DC power supply for applying a high DC voltage; and a DC electrode (ignition electrode) for inducing capacitively coupled plasma discharge inside the dielectric tube when the high DC voltage is applied. Specifically, in the case of a plasma generating apparatus for normal pressure plasma discharge, inductively coupled plasma discharge may be more difficult than low-pressure plasma discharge, but the use of an ignition electrode to provide seed charge can assist the initial discharge and improve discharge stability.

[0154] A plasma generating device may include one or more discharge electrodes that induce a discharge inside a dielectric tube. The plasma generating device may apply a DC voltage to the discharge electrodes to induce capacitively coupled discharge, such as local streamer discharge, inside the dielectric tube. The plasma generating device may also provide seed charges inside the dielectric tube by applying a DC voltage to the discharge electrodes.

[0155] Figure 4 This is a diagram showing the discharge electrodes according to an embodiment.

[0156] Reference Figure 4 (a) According to an embodiment, the plasma generating apparatus may include one or more electrodes positioned close to the antenna module 220 that induces plasma discharge and connected to a DC power supply. The plasma generating apparatus may include: a first electrode 231 located above the antenna module 220; and a second electrode 233 located below the antenna module 220.

[0157] Reference Figure 4 (b) The plasma generating apparatus may include: a first electrode 231 located on the outer surface of the dielectric tube and above the induction coil 221 of the antenna module 220; and a second electrode 233 disposed around the outer surface of the dielectric tube and below the induction coil 221. (Refer to...) Figure 4 (b) The first electrode 231 may have the shape of a quadrilateral plate. The second electrode 233 may have the shape of the letter "C". Alternatively, the second electrode 233 may include multiple slits. To prevent eddy currents from flowing through the second electrode 233 due to the influence of the induced electric fields E1 and E2 formed by the induction coil, the second electrode 233 may have an open loop structure that does not completely surround the outer wall of the dielectric tube.

[0158] The DC power supply can apply a positive high voltage to the first electrode 231 and a negative high voltage to the second electrode 233. When a high voltage pulse is applied between the first electrode 231 and the second electrode 233 by the DC power supply, capacitively coupled plasma discharge (e.g., vertical streamer discharge) occurs between the first electrode 231 and the second electrode 233.

[0159] Figure 5 This is a diagram illustrating a power supply according to an embodiment.

[0160] Reference Figure 5(a) The DC power supply may include: an AC-DC converter 111 that converts commercial AC power into DC voltage; a high-voltage pulse generator 113 that generates a positive DC high-voltage pulse through the DC voltage; and a controller 112 that controls the high-voltage pulse generator.

[0161] Figure 5 (b) is shown Figure 5 A diagram of an embodiment of the high-voltage pulse generator shown in (a).

[0162] Reference Figure 5 (b) According to the embodiment, the high-voltage pulse generator 113 may include: a first transformer 113a, including a primary coil that obtains DC voltage from an AC-DC converter and a secondary coil that generates a positive DC high-voltage pulse; a first power transistor 113b, connected to the primary coil of the first transformer 113a; a second transformer 113c, including a primary coil that obtains DC voltage from an AC-DC converter and a secondary coil that generates a negative DC high-voltage pulse; and a second power transistor 113d, connected to the primary coil of the second transformer. A controller 112 can control the gate of the first power transistor 113b and the gate of the second power transistor 113d. One end of the secondary coil of the first transformer 113a is grounded, and the other end of the secondary coil of the first transformer 113a can output a positive DC high-voltage pulse Vo1. One end of the secondary coil of the second transformer 113c is grounded, and the other end of the secondary coil of the second transformer 113c can output a negative DC high-voltage pulse Vo2.

[0163] The DC voltage Vin can be a DC power supply ranging from 12 volts to 24 volts. The controller 112 can control the first power transistor 113b and the second power transistor 113d by synchronizing their on-time with the repetition frequency. The DC high-voltage pulse voltage can be tens of kilovolts, for example, 10 kilovolts to 50 kilovolts. The repetition frequency of the DC high-voltage pulse can be several kilohertz to tens of kilohertz (for example, 10 kilohertz to 100 kilohertz).

[0164] Figure 6 This is a diagram showing a discharge electrode according to another embodiment.

[0165] Reference Figure 6 (a) According to the embodiment, the plasma generating apparatus may include an electrode 231, which is positioned close to the antenna module 220 that causes plasma discharge and is connected to a DC power supply 110.

[0166] The plasma generating device can apply a high voltage to electrode 231 via DC power supply 110, and can induce capacitive coupling discharge between electrode 231 and a nearby object (e.g., a metal object located inside / outside the dielectric tube). The plasma generating device can also apply a high voltage to electrode 231 via DC power supply 110, and can induce capacitive coupling discharge between electrode 231 and a grounded gas tube located inside the dielectric tube. The plasma generating device can induce a discharge between gas tube 211 and electrode 231 to provide seed charge.

[0167] Reference Figure 6 (b) The plasma generating device may include an electrode 231 located on the outer surface of the dielectric tube and above the induction coil 221 of the antenna module 220. The electrode 231 may have a quadrilateral plate shape. The plasma generating device applies a positive high voltage to the electrode 231, which has a quadrilateral plate shape and is located on the outer surface of the dielectric tube, via a DC power supply, causing an induced discharge between the electrode 231 and a gas tube 211 located inside the dielectric tube and grounded. When a high voltage pulse is applied to the electrode 231 via a DC power supply, a capacitively coupled plasma discharge (e.g., streamer discharge) occurs between the electrode 231 and the gas tube 211.

[0168] Figure 7 (a) is a diagram illustrating the power supply according to an embodiment. Figure 7 (b) is shown Figure 7 A diagram of an embodiment of the high-voltage pulse generator shown in (a). Unless otherwise specifically stated, for... Figure 7 (a) and Figure 7 The power supply and high-voltage pulse generator in (b) can be similarly applied to the reference. Figure 5 The content explained.

[0169] Reference Figure 7 (b) According to the embodiment, the high-voltage pulse generator 113 may include: a transformer 113e, including a primary coil that obtains DC voltage from an AC-DC converter and a secondary coil that generates a positive DC high-voltage pulse; and a transistor 113f, connected to the primary coil of the transformer 113e. A controller 112 can control the gate of the transistor 113e. One end of the secondary coil of the transformer 113f is grounded, and the other end of the secondary coil of the transformer 113f can output a positive DC high-voltage pulse Vout.

[0170] 2.2.3 Induction Electrode

[0171] A plasma generating apparatus may include one or more sensing electrodes that induce a discharge within a dielectric tube. The plasma generating apparatus may also include one or more antenna modules that, when powered by an RF power supply, induce inductively coupled plasma discharge. The antenna modules may operate differently depending on their configuration and the frequency of the input power signal. Antenna modules according to several embodiments will be described below.

[0172] 2.2.3.1 Type 1 Antenna Module

[0173] Figure 8 This is a diagram illustrating the form of an antenna module according to an embodiment. (Refer to...) Figure 8 According to the embodiment, the antenna module 223 may include a first capacitor 223a, an induction coil 223b, and a second capacitor 223c.

[0174] A first capacitor 223a may be connected between one end of the induction coil 223b and the RF power supply, and a second capacitor 223c may be connected between the other end of the induction coil 223b and the RF power supply. The first capacitor 223a and the second capacitor 223c may have the same capacitance.

[0175] The induction coil 223b may be located between the first capacitor 223a and the second capacitor 223c. The induction coil 223b may be a solenoid coil with a multi-layered structure. The induction coil 223b may be a solenoid coil wound multiple times or in multiple layers around the outer surface of the dielectric tube. The unit turns constituting the induction coil 223b may be wound to form a magnetic field, which constructively interferes inside the dielectric tube in response to the AC power supply. The induction coil 223b may be a solenoid coil wound multiple times in one direction around the outer surface of the dielectric tube.

[0176] The induction coil 223b can be a densely wound solenoid coil, maximizing the number of windings per unit length of dielectric tube. Although in Figure 5 The diagram briefly illustrates this; however, the induction coil 223b can be configured to have a relatively... Figure 8 The solenoid coil shown has a large number of windings. For example, the induction coil 223b may have a three-layer structure, which includes an inner solenoid coil, a middle solenoid coil, and an outer solenoid coil connected to each other.

[0177] The induction coil 223b may be in the form of a conduit through which the cooling medium flows. The induction coil 223b may be a copper conduit. The cross-section of the induction coil 223b may be circular or quadrilateral.

[0178] The first capacitor 223a, the induction coil 223b, and the second capacitor 223c are connected in series and can resonate at a first frequency. The first frequency can be determined by the capacitance C1 of each of the first capacitor 223a and the second capacitor 223c and the inductance L1 of the induction coil 223b.

[0179] Figure 9 It is shown in Figure 8 The diagram shows the operation of the antenna module at its resonant frequency.

[0180] Reference Figure 9 The antenna module can resonate at a first frequency determined by the capacitance C1 of each of the first capacitor 223a and the second capacitor 223c and the inductance L1 of the induction coil 223b. When power is supplied at the first frequency, the first capacitor 223a and the second capacitor 223c induce a voltage drop opposite to that of the induction coil 223b, thereby minimizing the magnitude of the voltage Va induced at the two ends of the induction coil 223b.

[0181] In the resonant state, the first capacitor 223a and the second capacitor 223c can cancel out the reactance of the induction coil 223b. The plasma generating device supplies power to the antenna module at a first frequency, such that the reactance of the induction coil 223b is canceled out by the first capacitor 223a and the second capacitor 223c, thereby achieving impedance matching. The first capacitor 223a and the second capacitor 223c can be symmetrically arranged relative to the induction coil 223b to reduce the voltage applied to the two ends of the induction coil 223b.

[0182] 2.2.3.2 Second type of antenna module

[0183] Figure 10 This is a diagram illustrating the form of an antenna module according to several embodiments. Figure 10 of (a), Figure 10 (b) and Figure 10 (c) is a diagram showing an antenna module with an induction coil having a different number of turns per unit length of dielectric tube. Figure 10 of (a), Figure 10 (b) and Figure 10 The antenna module shown in (c) may have different discharge characteristics.

[0184] Plasma generating devices may have the following characteristics: the smaller the number of turns of the induction coil in the antenna module per unit length of dielectric tube, the lower the energy loss and the narrower the discharge window. Plasma generating devices may also have the following characteristics: the larger the number of turns of the induction coil in the antenna module per unit length of dielectric tube, the wider the discharge window, which is more advantageous in maintaining the discharge but also results in greater energy loss.

[0185] Reference Figure 10 (a) Antenna module 235 may include: unit coil 235b, each layer having one turn wound around; and interlayer capacitor 235a, connecting the unit coils of the corresponding layers. Figure 10 The 12*1 turn antenna module 235 shown in (a) can be configured such that all antenna element turns are close to the outer surface of the dielectric tube. Figure 10 The antenna module 235 shown in (a) may have a small number of turns per unit length (N / L), and therefore has relatively low discharge efficiency, low energy loss and relatively high process efficiency.

[0186] Reference Figure 10 (b) Antenna module 237 may include: unit coil 237b, each layer having two turns wound around; and interlayer capacitor 237a, for connecting the unit coils of the corresponding layer. Figure 10 The 6*2-turn antenna module 237 shown in (b) can have a relatively Figure 10 The antenna module 235 shown in (a) has a large number of turns per unit length (N / L). Figure 10 The antenna module 237 shown in (b) may have a relatively Figure 10 The antenna module 235 shown in (a) has high discharge efficiency. Discharge efficiency is proportional to the number of turns per unit length (N / L). For example, Figure 10 The antenna module 237 shown in (b) may have Figure 10 The discharge efficiency of the antenna module 235 shown in (a) is twice that of the antenna module 235.

[0187] Reference Figure 10 (c) Antenna module 239 may include: unit coils 239b, each layer having three turns wound around; and interlayer capacitors 239a, connecting the unit coils of the corresponding layers. Antenna module 239 may have a relatively... Figure 10 (a) and Figure 10 The antenna modules 235 and 237 shown in (b) have a large number of turns per unit length (N / L) and can have a relatively large number of turns per unit length. Figure 10 (a) and Figure 10 The antenna modules 235 and 237 shown in (b) have high discharge efficiency. Compared to Figure 10 (a) and Figure 10 Antenna modules 235 and 237 are shown in (b), and antenna module 239 may have the characteristic of easily maintaining discharge under gas conditions where discharge is difficult.

[0188] Figure 10 of (a), Figure 10 (b) and Figure 10 The antenna module shown in (c) may have different inductances. Figure 10 The antenna module 235 shown in (a) may have a first inductor. Figure 10 Antenna module 237 shown in (b) may have a second inductor, and Figure 10 The antenna module 239 shown in (c) may have a third inductor. The second inductor may be greater than the first inductor and the third inductor may be greater than the second inductor.

[0189] Figure 11 It is shown in Figure 10 The diagram shows the operation of the antenna module at its resonant frequency, as shown in (c). In the following text, reference will be made to... Figure 11 Explanation Figure 10 The voltage distribution of the antenna module at the resonant frequency shown in (c).

[0190] Reference Figure 11 According to the embodiment, the antenna module may include: a plurality of unit coils 239b; an interlayer capacitor 239a disposed between the plurality of unit coils; and a terminating capacitor 239c connected to unit coils located at upper and lower levels respectively (not shown).

[0191] The antenna module can resonate at a second frequency determined by the capacitance of the interlayer capacitor 239a, the inductance of the unit coil 239b, and the capacitance of the terminating capacitor 239c.

[0192] To minimize the voltage applied to unit coil 239b, the capacitance of terminating capacitor 239c can be determined to be twice the capacitance of interlayer capacitor 239a. In this paper, the antenna module can resonate at a second frequency determined by the capacitance C2 of interlayer capacitor 239a, the inductance L2 of unit coil 239b, and the capacitance 2*C2 of terminating capacitor 239c. (Refer to...) Figure 11 This shows that each of the interlayer capacitors 239a is a pair of imaginary capacitors connected in series, each having a capacitance of 2*C2.

[0193] In the resonant state, the multiple interlayer capacitors 239a and terminating capacitors 239c can reduce the voltage applied to the ends of the unit coil 239b. When power is supplied to the antenna module at the second frequency, the interlayer capacitors 239a and terminating capacitors 239c induce a voltage drop opposite to that of the induction coil 239b, thereby minimizing the magnitude of the induced voltage Vb at the two ends of the induction coil 239b.

[0194] Interlayer capacitor 239a and terminating capacitor 239c cancel out the reactance of induction coil 239b. The plasma generating device supplies power to the antenna module at a second frequency, such that the reactance of induction coil 239b is canceled out by interlayer capacitor 239a and terminating capacitor 239c, thereby achieving impedance matching. Terminating capacitor 239c may be symmetrically arranged relative to induction coil 239b to reduce the voltage applied to the two ends of induction coil 239b. Interlayer capacitor 239a may be disposed between each layer of induction coil 239b to prevent capacitive coupling by minimizing the interlayer voltage difference between unit induction coils 239b.

[0195] Since the reactance of the induction coil 239b is canceled out by the interlayer capacitor 239a and / or the terminating capacitor 239c, the voltage at the corresponding unit coil 239b can have a corresponding relationship. For example, in the resonant state, the voltage between one end and the other end of unit coil 239b can correspond to the voltage between one end and the other end of another unit coil 239b. The potential at one end of unit coil 239b can correspond to the potential at one end of another unit coil 239b.

[0196] As a specific example, the antenna module may include: a first unit coil (or unit turn) having a first end and a second end; a first interlayer capacitor connected in series to the second end of the first unit coil; and a second unit coil having a first end and a second end, wherein the first end of the second unit coil is connected in series to the first interlayer capacitor. When the antenna module is in a resonant state, the potential at the first end of the first unit coil corresponds to the potential at the first end of the second unit coil. When the antenna module is in a resonant state, the voltage between the first end and the second end of the first unit coil corresponds to the voltage between the first end of the first unit coil and the second end of the second unit coil. When the antenna module is in a resonant state, the voltage between the first end and the second end of the first unit coil corresponds to the voltage between the first end of the first unit coil and the second end of the second unit coil.

[0197] Figure 12 It is shown Figure 10 The diagram shows the structure of the antenna module as shown in (c). The antenna module according to an embodiment may include a plurality of unit coils 239b and interlayer capacitors 239c disposed between the plurality of unit coils. Figure 12 The unit coil 239b of the antenna module according to an embodiment is shown.

[0198] The unit coil 239b may include multiple turns TU1, TU2, and TU3. The unit coil 239b may include: a first terminal TE1; a first turn TU1 connected to the first terminal TE1; a first protrusion PR1 connected to the first turn TU1; a second turn TU2 connected to the first protrusion PR1; a second protrusion PR2 connected to the second turn TU2; a third turn TU3 connected to the second protrusion PR2; and a second terminal TE2 connected to the third turn TU3.

[0199] Unit coil 239b may have one direction (x-axis direction, see Figure 12 The open portion on the coil 239b. The first terminal TE1 and the second terminal TE2 of the unit coil 239b can be defined as an open portion that is open in one direction.

[0200] Turns TU1, TU2, and TU3 may be arranged on the same plane. Each of turns TU1, TU2, and TU3 may have a predetermined center angle. The center angle of each turn may be equal to or greater than 270 degrees. Turns TU1, TU2, and TU3 may be arranged to have the same central axis and may have different radii.

[0201] Each of the protrusions PR1 and PR2 connects to turns with different radii and can be arranged in a "U" shape. The first protrusion PR1 can connect one end of the first turn TU1 to one end of the second turn TU2.

[0202] The first terminal TE1 or the second terminal TE2 can be connected to the interlayer capacitor 239c or the terminating capacitor 239a. For example, the first terminal TE1 can be connected to the terminating capacitor 239a and the second terminal TE2 can be connected to the interlayer capacitor 239c.

[0203] The antenna module may include multiple unit coils 239b. These unit coils may be arranged around the central axis of the dielectric tube. For example, a first unit coil may be configured such that a protrusion extends in a first direction relative to the central axis of the dielectric tube. A second unit coil may be configured such that a protrusion extends in a second direction relative to the central axis of the dielectric tube. The first and second directions may form a predetermined angle relative to the central axis of the dielectric tube. For example, the predetermined angle may be 90 degrees.

[0204] Figure 13 This is a block diagram illustrating an RF power supply according to an embodiment. (Refer to...) Figure 13 According to an embodiment, the RF power supply 1000 may include an AC power supply 1100, a power supply device 1200, and a load 1400.

[0205] AC power supply 1100 may be a typical 60 Hz power supply used in a household or industrial setting. Load 1400 may be an electrical or electronic device used in a household or industrial setting. Load 1400 may be a plasma generating device described in this disclosure.

[0206] The power supply device 1200 can convert a first AC power supply into a second AC power supply and supply the second AC power supply to a load 1400. For example, the second AC power supply may have a drive frequency of several hundred kilohertz to tens of megahertz and can provide several kilowatts or more of power. The power supply device 1200 may include a rectifier 1210, a capacitor 1220, an inverter 1230, an impedance matching circuit 1300, and a controller 1250.

[0207] Rectifier 1210 converts the output of AC power supply 1100 into DC power supply. Rectifier 1210 supplies DC power between ground node GND and power node VP. Capacitor 1220 can be connected between power node VP and ground node GND. Capacitor 1220 discharges the AC component delivered to power node VP to ground node GND.

[0208] Inverter 1230 receives DC power from power node VP and ground node GND. Inverter 1230 receives a switching signal SW from controller 1250. In response to the switching signal SW, inverter 1230 converts the DC power into a second AC power. The second AC power can be supplied to load 1400 through impedance matching circuit 1300. Impedance matching circuit 1300 provides impedance matching for load 1400.

[0209] The controller 1250 can transmit a switching signal SW to the inverter 1230. The controller 1250 can control the switching signal SW, causing the inverter 1230 to convert DC power into a second AC power. The controller 1250 can control the switching signal SW, thereby adjusting the amount of power supplied from the inverter 1230 to the load 1400.

[0210] 3. Operation and control methods of plasma generation devices

[0211] According to embodiments of this disclosure, a plasma generating apparatus is provided that has multiple discharge modes and is used to perform plasma discharges with different characteristics in the corresponding modes.

[0212] For example, a plasma generating device may have: a first discharge mode with low energy loss; and a second discharge mode for discharging gases that are more difficult to discharge. Alternatively, for example, the plasma generating device may have: a first discharge mode that facilitates the initial discharge of the plasma; and a second discharge mode that facilitates the main discharge with high energy efficiency.

[0213] As needed, a plasma generating device can change the plasma discharge mode by switching one or more antennas with different characteristics. Antenna switching can be explained in a broader sense than the physical switching of a circuit. For example, a plasma generating device can selectively apply the frequency of the transmitted power supply to multiple antenna modules and change the antenna module that performs the main operation, thereby switching the antenna. Alternatively, as needed, the plasma generating device can change the discharge characteristics of the antenna modules by using different power supply modules or providing power at different drive frequencies, thereby switching the antenna.

[0214] According to this disclosure, a plasma generating apparatus is provided that can operate in a wider variety of environments and has a wider operating window. According to this disclosure, a plasma generating apparatus is provided that can still perform plasma discharge under various discharge conditions (gas type, flow rate, pressure, and RF power supply) even when the impedance measured at the antenna changes. According to this disclosure, in cases where the plasma generating apparatus includes a single antenna module or a single power supply module, a predetermined matching range or discharge range limited by the characteristics of components other than the antenna can be extended.

[0215] 3.1 Case with one antenna

[0216] 3.1.1 Plasma generation process in the case of a single antenna

[0217] Figure 14 This diagram illustrates a plasma discharge process in a configuration where the plasma generation apparatus includes an antenna module 220 and an RF power supply 120. The RF power supply 120 may include one or more power modules. The RF power supply 120 may include one or more power modules with different output frequency bands.

[0218] In the following text, reference will be made to Figure 14 This paper describes a mode-changing plasma discharge process in the case of an antenna module.

[0219] Reference Figure 14 In the case where the plasma generating device includes an antenna module 220 and a frequency converter RF power supply 120, the frequency converter RF power supply 120 is used to change the frequency of the power signal supplied to the antenna module 220, thereby changing the discharge mode.

[0220] Reference Figure 14 (a) When the operating mode is the first mode, the plasma generating device transmits a power signal with a first frequency f1 to the antenna module 220 through the power supply 120 and induces plasma discharge inside the dielectric tube.

[0221] When the operating mode is the first mode, the plasma generating device forms a first electric field inside the dielectric tube. The first electric field can be an electric field in the vertical direction parallel to the axis of the dielectric tube, or it can be an electric field in the azimuth direction parallel to the circumference of the dielectric tube.

[0222] According to an embodiment, when the operating mode is the first mode, the plasma generating device transmits a power signal with a first frequency f1 to the antenna module 220 and forms an electric field E1 in the vertical direction. The plasma generating device can generate an electric field E1 in the vertical direction through the antenna module 220 and can induce capacitive coupling of plasma within the dielectric tube to generate plasma.

[0223] According to an embodiment, when the operating mode is the first mode, the plasma generating device induces capacitively coupled plasma generation inside the dielectric tube. When the operating mode is the first mode, the plasma discharge induced inside the dielectric tube of the plasma generating device is mainly capacitively coupled plasma discharge or discharge caused by capacitively coupled mode (E mode).

[0224] According to an embodiment, when the operating mode is the first mode, the plasma generating device transmits a power signal with a first frequency f1 to the antenna module 220 and forms an electric field E2 in the azimuth direction. The plasma generating device can generate an electric field E2 in the azimuth direction through the antenna module 220 and can induce the generation of inductively coupled plasma inside the dielectric tube. When the operating mode is the first mode, the plasma generating device forms an electric field E2 with a first intensity in the azimuth direction.

[0225] According to an embodiment, when the operating mode is the first mode, the plasma generating device induces the generation of inductively coupled plasma inside the dielectric tube. When the operating mode is the first mode, the plasma discharge induced inside the dielectric tube of the plasma generating device is mainly inductively coupled plasma discharge or discharge caused by inductively coupled mode (H mode).

[0226] Reference Figure 14 (b) When the operating mode is the second mode, the plasma generating device transmits a power signal with a second frequency f2 to the antenna module 220 via the power supply 120 and induces plasma discharge inside the dielectric tube. The second frequency f2 may be different from the first frequency f1. The second frequency f2 may differ from the first frequency f1 by a specific value or a greater value. The second frequency f2 may be higher or lower than the first frequency f1 by a specific value or a greater value (e.g., 0.2 MHz).

[0227] When the operating mode is the second mode, the plasma generating device transmits a power signal at a second frequency f2 to the antenna module 220 and induces an electric field E3 in the azimuth direction. The plasma generating device can form an electric field E3 in the azimuth direction through the antenna module 220 and can induce inductively coupled plasma discharge within the dielectric tube. When the operating mode is the second mode, the plasma generating device forms an electric field E3 with a second intensity in the azimuth direction. This second intensity can be higher or lower than the intensity of the electric field E2 in the azimuth direction in the first mode.

[0228] When the operating mode is the second mode, the plasma generator induces inductively coupled plasma discharge inside the dielectric tube. The plasma discharge induced inside the dielectric tube of the plasma generator in the second mode is primarily inductively coupled plasma discharge or discharge caused by inductively coupled mode (H mode).

[0229] Figure 15 This diagram illustrates how the plasma discharge mode is altered by the current flowing through the antenna module, the voltage at both ends of the antenna module, the voltage at both ends of the unit coil, and the frequency of the power supply signal. Figure 15 In the diagram, the current curve and voltage curve show the magnitude.

[0230] In the following text, regarding Figure 15 Regarding such as Figure 10 The antenna module 220 shown is illustrated in the case of unit coils constituting unit layers and interlayer capacitors disposed between unit coils.

[0231] Reference Figure 15 When the plasma generating device operates in the first mode, the power supply 120 provides a power signal with a first frequency f1 to the antenna module 220 and a first current I1 flows through the antenna module.

[0232] When the plasma generating device is operating in the first mode, the voltage at both ends of the induction coil included in the antenna module is the first voltage V1. When the operating mode is the first mode, the voltage at both ends of the unit coil (the coil constituting the unit layer) that makes up the induction coil included in the antenna module is the third voltage V3.

[0233] Reference Figure 15 When the plasma generating device operates in the second mode, the power supply 120 provides a power signal with a second frequency f2 to the antenna module 220 and a second current I2 flows through the antenna module.

[0234] When the plasma generating device is operating in the second mode, the voltage at both ends of the induction coil is the second voltage V2. When the operating mode is the second mode, the voltage at the opposite ends of the unit coils constituting the induction coils included in the antenna module is the fourth voltage V4.

[0235] The second frequency f2 can be lower than the first frequency f1. When the second frequency f2 is lower than the first frequency f1, the second current I2 is greater than the first current I1. When the second frequency f2 is lower than the first frequency f1, the second voltage V2 is lower than the first voltage V1. When the second frequency f2 is lower than the first frequency f1, the third voltage V3 is higher than the fourth voltage V4.

[0236] When the operating mode is the second mode, the voltage V2 at both ends of the coil of the antenna module 220 is lower than the voltage V1 at both ends of the coil of the antenna module in the first mode. When the operating mode is the second mode, the antenna module has discharge characteristics with higher energy efficiency compared to the first mode.

[0237] The second frequency can be the resonant frequency of the antenna module 220. When the operating mode is changed to the second mode, the antenna module 220 resonates at the second frequency with matched impedance.

[0238] Furthermore, according to the embodiments, the plasma discharge state can change over time. The operating mode of the plasma generating device can change according to the change in the plasma discharge state. For example, in the case where the plasma generating device has a first discharge mode that is conducive to the initial discharge of plasma and a second discharge mode that is conducive to the main discharge with high energy efficiency, the operating mode of the plasma generating device can change according to the change in the plasma discharge state.

[0239] For example, plasma discharge according to the first mode can be mainly implemented through capacitive coupling mode. Then, when plasma is sufficiently generated through capacitive coupling mode, a second electric field E2 is formed inside the dielectric tube as an induced electric field in the azimuth direction. When the second electric field E2 is formed, inductively coupled plasma discharge is performed or plasma is generated through inductively coupled mode (H mode).

[0240] The plasma generation device can change its operating mode in response to changes in the plasma discharge state. (Refer to...) Figure 14 (a) The plasma generating device can transmit a power signal with a first frequency f1 to the antenna module 220 via the power supply 120 and can change the operating mode in response to the change of plasma discharge state.

[0241] Plasma generating devices can detect changes in plasma discharge.

[0242] The plasma generating device may include a sensor device that acquires the current flowing through the antenna module 220 and / or the voltage applied to the two ends of the antenna module 220. The plasma generating device can acquire the current flowing through the antenna module 220 and / or the voltage applied to the two ends of the coil of the antenna module 220, can acquire changes in the plasma discharge state, and can change the drive frequency and / or operating mode of the power supply 120.

[0243] The plasma generating device may include a sensor device, the sensor device being self-referencing Figure 13 The described RF power supply acquires changes in voltage or current signals. For example, a plasma generating device may include a sensor device that acquires the voltage or current applied to... Figure 13 The voltage at the two ends of the capacitor 1220 of the power supply device 1200 (the voltage between VP and GND) and / or the current flowing to the inverter (the current flowing from VP to the inverter). The plasma generating device can obtain a change in the discharge state based on a change in the voltage or current signal obtained from the aforementioned RF power supply.

[0244] When the plasma discharge state changes, the current flowing through the antenna module 220 and / or the voltage applied to the two ends of the antenna module 220 changes. For example, when the main plasma discharge state changes from capacitively coupled plasma discharge to inductively coupled plasma discharge, the current flowing through the antenna module 220 and / or the voltage applied to the two ends of the antenna module 220 decreases.

[0245] In response to a decrease in the current flowing through the antenna module 220 and / or the voltage applied to the two ends of the antenna module 220, the plasma generating device can change its operating mode to a second mode.

[0246] According to an embodiment, the plasma discharge state caused by the plasma generating device can have a capacitive coupling mode, a transition mode, and an inductive coupling mode. When the plasma generating device operates in the first mode, the plasma discharge state transitions from the capacitive coupling mode to the transition mode. When the plasma discharge state transitions to the transition mode, the operating mode of the plasma generating device changes from the first mode to the second mode. When the operating mode changes to the second mode, the plasma discharge state transitions from the transition mode to the inductive coupling mode.

[0247] Alternatively, the plasma discharge state can have a first inductively coupled mode and a second inductively coupled mode. As the operating mode of the plasma generating device changes from the first mode to the second mode, the plasma discharge state changes from the first inductively coupled plasma discharge to the second inductively coupled plasma discharge.

[0248] Figure 16 This is a diagram showing the voltage change in the plasma generating apparatus according to an embodiment, depending on the change of the operating mode. Figure 16 This is a diagram showing the voltage distribution depending on the position in the coil of the end-view antenna module in the plasma generation apparatus according to an embodiment. In the following text, reference will be made to... Figures 14 to 16 The changes in voltage at the two ends of the antenna module and the two ends of the unit coil are described according to the change in operating mode.

[0249] Figure 16 The voltage distribution shown is for example Figure 10 The situation is illustrated in (c) with respect to the antenna module, which includes: four unit induction coils disposed on different planes; and interlayer capacitors disposed between the induction coils.

[0250] Figure 16 (a) is a diagram showing the voltage distribution depending on the position in the antenna module according to the embodiment when the plasma generating apparatus according to the embodiment is in the first mode. When the operating mode is the first mode, the plasma generating apparatus uses a first frequency as the driving frequency.

[0251] Reference Figure 16 (a) When the plasma generating apparatus according to the embodiment is in the first operating mode, the voltage between the two ends of the antenna module with a total length of Lt is a first voltage V1. In the first operating mode, the induction coil reactance cancellation through the interlayer capacitor between the unit coils is minimized. In the first operating mode, the plasma generating apparatus operates at a drive frequency of a first frequency, such that reactance cancellation is minimized, the voltage at the two ends of the induction coil is maximized, and capacitively coupled plasma discharge is induced. Preferably, the voltage at the two ends of each of the unit coils constituting the antenna module with a total length of Lt can be a value obtained by dividing the voltage at the two ends of the antenna module by the number of unit coils.

[0252] However, the effect of the reactance of the interlayer capacitor may not be completely eliminated. In other words, for convenience, Figure 16 This illustrates a continuous voltage rise (or fall) in the induction coil, but at least a portion of the induction coil reactance can be canceled out by the interlayer capacitors between the unit coils. That is, the voltage distribution in the first mode may exhibit a similar behavior to... Figure 16 The voltage distribution is shown in (b).

[0253] Figure 16 (b) is a diagram showing the voltage distribution depending on the position in the antenna module when the plasma generating apparatus according to the embodiment is driven at a frequency between the first frequency and the second frequency.

[0254] Reference Figure 16 (b) When the plasma generating device is instantaneously between the first mode and the second mode, or when the plasma generating device has a drive frequency between the first frequency and the second frequency, the voltage between the two ends of the antenna module with a total length of Lt is lower than the first voltage V1. In this instantaneous state, at least a portion of the induction coil reactance can be canceled out by the interlayer capacitor between the unit coils, and the voltage at the two ends can be lower than the first voltage V1.

[0255] When the operating mode is the first mode, the induction coil reactance cancellation through the interlayer capacitor between the unit coils is minimized. When the operating mode is the first mode, the plasma generating device operates at a first frequency drive frequency, such that reactance cancellation is minimized, the voltage at both ends of the induction coil is maximized, and capacitively coupled plasma discharge is induced.

[0256] Figure 16 (c) is a diagram showing the voltage distribution depending on the position in the induction coil when the plasma generating apparatus according to the embodiment is in the second mode. When the operating mode is the second mode, the driving frequency is the second frequency and the antenna module is in a resonant state at the second frequency with matched impedance. According to the embodiment, the plasma generating apparatus can change its operating mode to the second mode in response to a change in plasma discharge state to a transition mode.

[0257] Reference Figure 16 (c) When the plasma generating apparatus according to the embodiment is in the second mode of operation, the voltage between the two ends of the antenna module with a total length of Lt is a second voltage V2. The second voltage V2 may be lower than the first voltage V1.

[0258] When the plasma generating device operates in the second mode, the interlayer capacitors of the antenna module cancel out the voltage rise (or fall) at the two ends of the antenna module. When operating in the second mode, the voltage at the two ends of the induction coil is minimized. When operating in the second mode, the interlayer capacitors and terminating capacitors constituting the antenna module cancel out the reactance of the induction coil. When operating in the second mode, the plasma generating device operates at a second driving frequency, maximizing the voltage at the two ends of the induction coil and inducing inductively coupled plasma discharge.

[0259] Reference Figure 16(c) When the plasma generating apparatus according to the embodiment operates in the second mode, the voltage between the two ends of the antenna module with a total length of Lt is a second voltage V2. Preferably, the voltage at the two ends of the unit coil constituting the antenna module can be the same as the second voltage V2 at the two ends of the antenna module. However, due to the characteristics of the plasma generating apparatus and the limitations of the power supply frequency resolution, it may be difficult to achieve a complete resonant state. In this case, since at least a portion of the reactance of the induction coil is not canceled out, the voltage distribution in the second mode may show an ascending (or descending) sawtooth shape.

[0260] Furthermore, in the above embodiments, the case where the operating mode changes from a first mode to a second mode in response to a change in plasma has been described; however, the change of operating mode can be performed in the reverse order. The plasma generating device can change the operating mode from a reference mode. Figure 14 The second mode described in (b) is changed to a reference. Figure 14 (a) The first pattern of the description.

[0261] 3.1.2 One antenna and two inverters

[0262] The plasma generating apparatus according to the embodiments may include an antenna module and one or more RF power modules. Unless otherwise specifically stated, the plasma generating apparatus described below may operate similarly to the embodiments described above.

[0263] RF power modules can be AC ​​power supplies with a predetermined output frequency range and matching range. Different RF power modules may have different output frequency ranges and matching ranges.

[0264] Figure 17 This is a diagram illustrating a plasma generating apparatus according to an embodiment. (Refer to...) Figure 17 (a) and Figure 17 (b) According to the embodiment, the plasma generating apparatus may include a first power module 101, a second power module 102 and an antenna module 201.

[0265] The first power module 101 may have a first driving frequency range. The second power module 102 may have a second driving frequency range that is at least partially different from the first driving frequency range. The first power module 101 may be driven by a first frequency within the first driving frequency range. The second power module 102 may be driven by a second frequency within the second driving frequency range.

[0266] According to an embodiment, the first power module 101 may include a first matching element. The second power module 102 may include a second matching element having an impedance different from that of the first matching element. Each matching element may increase the power transmission efficiency of the antenna module of each power module. Additionally, each matching element may function as a filter in the frequency band, rather than at the resonant frequency.

[0267] Figure 18 This is a diagram illustrating a plasma generating apparatus according to an embodiment. (Refer to...) Figure 18 According to the embodiments, the plasma generating apparatus may include: a first power module 101, including a first power unit P1 and a first matching element Z1; a second power module 102, including a second power unit P2 and a second matching element Z2; and an antenna module 201.

[0268] The first power module 101 may include a first matching element, and the first matching element and the antenna module 201 may resonate at a first frequency within a first driving frequency range. The first matching element and the antenna module 201 may resonate at a first frequency determined by the impedance of the first matching element and the impedance of the antenna module 201.

[0269] The second power module 102 may include a second matching element, and the second matching element and the antenna module 201 may resonate at a first frequency within a first driving frequency range. The second matching element and the antenna module 201 may resonate at a second frequency determined by the impedance of the second matching element and the impedance of the antenna module 201.

[0270] Reference Figure 18 The plasma generating apparatus may also include an isolation element 130. When the first power module 101 is operating, the isolation element 130 blocks signal transmission and reception between the circuitry on the side of the second power module 102 and the circuitry on the side of the first power module 101. Examples of the isolation element 130 may include a transformer. Examples of the isolation element 130 may include an isolation transformer (e.g., a shielded transformer), an insulation transformer, and a noise cut transformer. Examples of the isolation element 130 may include a switch.

[0271] Meanwhile, according to another embodiment, the antenna module 201 or the plasma generating device including the antenna module 201 may include a first matching element and a second matching element. The first matching element may be connected between the first power module 101 and the antenna module 201, and the second matching element may be connected between the second power module 102 and the antenna module 201. That is, the above embodiments have been described with respect to the case where the matching element is included in the power module, but the plasma generating system may be configured such that the plasma generating device or antenna module includes one or more matching elements and each matching element is connected to the antenna module and the power module.

[0272] The control method for the plasma generating device according to the embodiment may include: controlling the plasma generating device in a first mode via a first power supply module; and controlling the plasma generating device in a second mode via a second power supply module. The above description can be applied to both the first and second modes.

[0273] Figure 19 This is a diagram illustrating a control method for a plasma generating apparatus according to an embodiment.

[0274] Reference Figure 19 The control method of the plasma generating device according to the embodiment may include: providing power at a first frequency to the antenna module through a first power module at step (S110); and providing power at a second frequency to the antenna module through a second power module at step (S130).

[0275] Providing power at a first frequency to the antenna module through the first power module in step (S110) may include providing power at a first frequency to the antenna module, where the first frequency is a resonant frequency determined by the impedance of the first matching element disposed between the first power module and the antenna module and the impedance of the antenna module. In this document, the power distribution of the antenna module may be characterized as... Figure 16 (a) Related examples.

[0276] Alternatively, providing power at a first frequency to the antenna module via the first power module in step (S110) may include providing the antenna module with a power signal of a first frequency different from the resonant frequency determined by the impedance of the antenna module. In this document, the power distribution of the antenna module may be characterized as... Figure 16 (a) and Figure 16 (b) Related examples.

[0277] Providing power at a first frequency to the antenna module via the first power module at step (S110) may include inducing capacitive coupling plasma discharge inside the dielectric tube by providing a power signal at the first frequency to the antenna module via the first power module.

[0278] Alternatively, providing power at a first frequency to the antenna module via the first power module at step (S110) may include inducing inductively coupled plasma discharge within the dielectric tube by providing a power signal at the first frequency to the antenna module via the first power module, through an induced electric field of a first intensity.

[0279] Providing power at a second frequency to the antenna module via the second power module in step (S130) may include providing a power signal at a second frequency to the antenna module. This second frequency is a resonant frequency determined by the impedance of the second matching element disposed between the second power module and the antenna module, and the impedance of the antenna module. In this document, the voltage distribution of the antenna module may be expressed as... Figure 16 (c) Related instances.

[0280] Providing power at a second frequency to the antenna module via the second power module in step (S130) may include inducing an inductively coupled plasma discharge inside the dielectric tube by providing a power signal at the second frequency to the antenna module via the second power module. Providing a power signal at the second frequency to the antenna module via the second power module in step (S130) may include inducing an inductively coupled plasma discharge by forming an induced electric field with a second intensity inside the dielectric tube. The second intensity may be higher or lower than the first intensity of the electric field induced by the first power module.

[0281] According to an embodiment, the control method for a plasma generating device may further include acquiring a change in a power signal. The control method for a plasma device may include acquiring a change in the current flowing through an antenna module or a change in the voltage at both ends of the antenna module (or some elements constituting the antenna module). The control method for a plasma device may include acquiring the aforementioned change and controlling a first power module and / or a second power module based on the change. The control method for a plasma device may include acquiring the aforementioned change and stopping the operation of the first power module and starting the operation of the second power module based on the change. Alternatively, the control method for a plasma device may include acquiring the aforementioned change and stopping the operation of the second power module and starting the operation of the first power module based on the change.

[0282] 3.1.3 One antenna and one inverter

[0283] The plasma generating apparatus according to the embodiments may include an antenna module and a frequency conversion RF power supply module. Unless otherwise specifically stated, the plasma generating apparatus described below may operate similarly to the embodiments described above.

[0284] Figure 20 This is a diagram illustrating a plasma generating apparatus according to an embodiment. (Refer to...) Figure 20 (a) and Figure 20 (b) According to the embodiment, the plasma generating apparatus may include a power supply module 103 and an antenna module 202.

[0285] The RF power module 101 can be an AC power supply with a predetermined frequency conversion range. The power module 101 can use the resonant frequency of the antenna module 202 as the driving frequency to supply power to the antenna module 202.

[0286] The control method for the plasma generating device according to the embodiment may include: controlling the plasma generating device in a first mode via a power supply module; and controlling the plasma generating device in a second mode via a power supply module. The above description can be applied to both the first and second modes.

[0287] Figure 21 This is a diagram illustrating a control method for a plasma generating apparatus according to an embodiment.

[0288] Reference Figure 21 The control method for the plasma generating apparatus according to the embodiment may include: providing power at a first frequency to the antenna module via the power module at step (S210); and providing power at a second frequency to the antenna module via the power module at step (S230). The second frequency may be the resonant frequency of the antenna module.

[0289] Providing power at a first frequency to the antenna module via the power supply module at step (S210) may include providing the antenna module with a power signal of a first frequency different from the resonant frequency determined by the impedance of the antenna module. In this document, the voltage distribution of the antenna module may be characterized as... Figure 16 (a) Related examples.

[0290] Providing power at a first frequency to the antenna module via the power module at step (S210) may include inducing capacitive coupling plasma discharge inside the dielectric tube by providing a power signal at the first frequency to the antenna module via the power module.

[0291] Providing power at the second frequency to the antenna module via the power supply module at step (S230) may include providing the antenna module with a power signal at the second frequency, which is a resonant frequency determined by the impedance of the antenna module. In this document, the voltage distribution of the antenna module may be characterized as... Figure 16 (c) (or Figure 16 (b) Related examples.

[0292] Providing power at a second frequency to the antenna module via the power module at step (S230) may include inducing inductively coupled plasma discharge inside the dielectric tube by providing a power signal at the second frequency to the antenna module via the power module.

[0293] According to an embodiment, the control method for the plasma generating device may further include acquiring changes in the power supply signal. The control method for the plasma device may include acquiring changes in the current flowing through the antenna module or changes in the voltage at both ends of the antenna module (or some elements constituting the antenna module) and changing the driving frequency of the power supply module based on the acquired changes.

[0294] 3.1.4 Examples of Plasma Generating Devices

[0295] According to embodiments, a plasma generating apparatus for performing plasma discharge can be provided under multiple operating modes, including a first mode and a second mode. The plasma generating apparatus may include: a first power supply capable of changing frequencies within a first frequency range; a second power supply capable of changing frequencies within a second frequency range that is at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound at least once around the dielectric tube, a second unit coil wound at least once around the dielectric tube, and a first capacitor connected in series between the first unit coil and the second unit coil.

[0296] In the plasma generation device, when the operating mode is a first mode, the antenna module induces a first plasma discharge based on a power supply signal having a first frequency within a first frequency range; or when the operating mode is a second mode, the antenna module induces a second plasma discharge based on a power supply signal having a second frequency within a second frequency range. In this document, the first unit coil and the second unit coil have a first inductance, the first capacitor has a first capacitance, and the first frequency corresponds to a first resonant frequency determined based on the first inductance and the first capacitance.

[0297] The first power supply may include a first matching element having a first impedance. When the operating mode is the first mode, the antenna module performs a first plasma discharge based on a power signal having a first frequency, wherein the first frequency corresponds to a first resonant frequency determined based on the first impedance, the first inductance, and the first capacitance.

[0298] The second power supply may include a second matching element having a second impedance. When the operating mode is the second mode, the antenna module performs a second plasma discharge based on a power signal having a second frequency, wherein the second frequency corresponds to a second resonant frequency determined based on the second impedance, the first inductance, and the first capacitance, and the second resonant frequency is different from the first resonant frequency.

[0299] The second resonant frequency may be higher than the first resonant frequency. In this document, the first voltage is lower than the second voltage. When the operating mode is the first mode, the first voltage is the voltage between one end of the first unit coil that is not connected to the first capacitor and one end of the second unit coil that is not connected to the first capacitor, and when the operating mode is the second mode, the second voltage is the voltage between the one end of the first unit coil that is not connected to the first capacitor and the one end of the second unit coil that is not connected to the first capacitor.

[0300] When the operating mode is the first mode, the voltage between the two ends of the first unit coil corresponds to the voltage between the end of the first unit coil that is not connected to the first capacitor and the end of the second unit coil that is not connected to the first capacitor.

[0301] When the operating mode is the first mode, the voltage at both ends of the antenna module is lower than the voltage between the two ends of the antenna module when the operating mode is the second mode.

[0302] When the operating mode is the first mode, the magnitude of the first current flowing through the antenna module can be less than the magnitude of the second current flowing through the antenna module when the operating mode is the second mode.

[0303] When the operating mode is mode one, the power consumed by the antenna module is the first power supply. When the operating mode is mode two, the power consumed by the antenna module is the second power supply, which is lower than the first power supply.

[0304] According to an embodiment, a control method for a plasma generating device is provided. The plasma generating device includes: a first power supply capable of changing frequencies within a first frequency range; a second power supply capable of changing frequencies within a second frequency range that is at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound around the dielectric tube at least once, a second unit coil wound around the dielectric tube at least once, and a first capacitor connected in series between the first unit coil and the second unit coil.

[0305] The control method of the plasma generating device may include: operating in a first mode, wherein a first frequency is used as a driving frequency to provide RF power to the antenna module; and operating in a second mode, wherein a second frequency is used as a driving frequency to provide RF power to the antenna module. The first unit coil and the second unit coil have a first inductance, the first capacitor has a first capacitance, and the second frequency corresponds to a second resonant frequency determined based on the first inductance and the first capacitance.

[0306] The second power supply may include a second matching element having a second impedance. Operation in the second mode may include operation using a second frequency as the drive frequency, wherein the second frequency corresponds to a second resonant frequency determined based on the first inductor, the first capacitor, and the second impedance.

[0307] The first power supply may include a first matching element having a first impedance. Operation in the first mode may include operating using a first frequency as a drive frequency, wherein the first frequency corresponds to a first resonant frequency determined based on the first inductor, the first capacitor, and the first impedance.

[0308] When the operating mode is mode one, the power consumed by the antenna module is the first power supply. When the operating mode is mode two, the power consumed by the antenna module is the second power supply, which is higher than the first power supply.

[0309] When the operating mode is the first mode, the voltage between the two ends of the first unit coil corresponds to the voltage between the end of the first unit coil that is not connected to the first capacitor and the end of the second unit coil that is not connected to the first capacitor.

[0310] When the operating mode is the first mode, the magnitude of the first current flowing through the antenna module can be less than the magnitude of the second current flowing through the antenna module when the operating mode is the second mode.

[0311] Meanwhile, the control method of the plasma generating device may further include: when the operating mode is the first mode, acquiring the current flowing through the antenna module; and when the current flowing through the antenna module is equal to or less than a reference value, changing the operating mode to the second mode.

[0312] The control method of the plasma generating device may further include: when the operating mode is the first mode, acquiring the current flowing through the inverter of the first power supply; and when the current flowing through the inverter of the first power supply is equal to or less than a reference value, changing the operating mode to the second mode.

[0313] According to another embodiment, a plasma generating apparatus is provided, the plasma generating apparatus being used to generate plasma by: receiving power from a first power supply capable of changing frequencies within a first frequency range when the operating mode is a first mode, or receiving power from a second power supply capable of changing frequencies within a second frequency range that is at least partially different from the first frequency range when the operating mode is a second mode.

[0314] The plasma generating device may include an antenna module comprising a first unit coil wound at least once around a dielectric tube, a second unit coil wound at least once around a dielectric tube, and a first capacitor connected in series between the first unit coil and the second unit coil.

[0315] When the operating mode is the first mode, the antenna module senses a first plasma discharge based on a power signal having a first frequency within a first frequency range.

[0316] When the operating mode is the second mode, the antenna module senses a second plasma discharge based on a power signal with a second frequency within a second frequency range.

[0317] The first unit coil and the second unit coil have a first inductance, the first capacitor has a first capacitance, and the first frequency corresponds to a first resonant frequency determined based on the first inductance and the first capacitance.

[0318] When the operating mode is the first mode, the voltage at both ends of the antenna module is lower than the voltage between the two ends of the antenna module when the operating mode is the second mode.

[0319] When the operating mode is the first mode, the voltage between the two ends of the first unit coil corresponds to the voltage between the end of the first unit coil that is not connected to the first capacitor and the end of the second unit coil that is not connected to the first capacitor.

[0320] As described above, in the embodiments, the operating mode is changed by altering the driving frequency of the power supply applied to the antenna module, thereby changing the discharge characteristics of the antenna module. A plasma generating apparatus is provided that provides various discharge characteristics through a single antenna module, thereby exhibiting a wider matching range and various energy efficiencies, and is capable of maintaining discharge in various environments.

[0321] Meanwhile, when using a single antenna module, the discharge characteristics of the antenna module may be limited by the physical structure of the antenna module. Therefore, a plasma generation apparatus comprising two or more antenna modules can be provided. The operation of a plasma generation apparatus comprising two or more antenna modules and the apparatus itself will be described below.

[0322] 3.2 The case with two antennas

[0323] 3.2.1 Plasma generation process for two antennas

[0324] The plasma generating apparatus according to an embodiment may include two or more antenna modules. The plasma generating apparatus may include multiple antenna modules with different discharge characteristics. The two or more antenna modules may have different impedances. The plasma generating apparatus may be configured such that the leading antenna module can be changed as needed. The leading antenna module may refer to the antenna module that primarily consumes power. The two or more antenna modules may be connected in parallel to a frequency converter power supply.

[0325] The two or more antenna modules can operate differently depending on the driving frequency of the plasma generating device. For example, when the driving frequency of the plasma generating device is a first frequency corresponding to the resonant frequency of the first antenna module, the first antenna module operates in a resonant state where its reactance is canceled, and the second antenna module operates in a non-resonant state. For example, when the driving frequency of the plasma generating device is a first frequency corresponding to the resonant frequency of the first antenna module, current flow into the second antenna module, which has an impedance different from that of the first antenna module, is prohibited. When the driving frequency is a second frequency corresponding to the resonant frequency of the second antenna module, current flow into the first antenna module, which has an impedance different from that of the second antenna module, is prohibited. Additionally, for example, when the driving frequency is a third frequency different from the resonant frequencies of both the first and second antenna modules, both the first and second antenna modules operate in a non-resonant state. The antenna modules can induce capacitively coupled plasma discharge in the non-resonant state or inductively coupled plasma discharge in the resonant state.

[0326] As in the examples above, the plasma generation device described in this disclosure controls the drive frequency to selectively switch the dominant antenna module and change the discharge characteristics.

[0327] The two or more antenna modules may have different structures. For example, as with... Figure 8 A related example is an antenna module that may include: a solenoid coil wound multiple times around a dielectric tube; and terminating capacitors connected to both ends of the solenoid coil. As a counterpart to... Figure 10 (a) to Figure 10 As in (c) related examples, another antenna module may include a plurality of unit coils and interlayer capacitors disposed between the unit coils. Alternatively, for example, an antenna module may include: a plurality of unit coils, each including a first turn of each layer and forming a first layer; interlayer capacitors disposed between the unit coils; and terminating capacitors. Another antenna module may include: a plurality of unit coils, each including a second turn of each layer and forming a second layer; interlayer capacitors; and terminating capacitors.

[0328] For convenience, the following description focuses on the case of two antenna modules, but the plasma generating device may include two or more antenna modules. The plasma generating device may include two or more antenna modules with different impedances, structures, and / or functions, and may be configured such that the dominant antenna can be changed as needed. The frequency converter may include one or more power supply modules.

[0329] According to this disclosure, a plasma generating apparatus is provided, the plasma generating apparatus comprising: an antenna module having discharge characteristics favorable for initial discharge; an antenna module having discharge characteristics suitable for maintaining discharge; and / or an antenna module having discharge characteristics with low energy loss, wherein mode change is achieved as needed by antenna switching.

[0330] As described above, in this disclosure, a wider impedance range or true resistance range matching can be achieved by using a plasma generation apparatus comprising multiple antenna modules and configured to selectively operate the antenna modules. Furthermore, by utilizing multiple antenna modules with different discharge control ranges (e.g., flow rate, power supply, pressure, and gas type), a plasma generation apparatus with a wider discharge control range is provided.

[0331] 3.2.1.1 First Embodiment

[0332] Figure 22 This diagram illustrates a plasma discharge process in a configuration where the plasma generation apparatus includes a first antenna module 203, a second antenna module 204, and an RF power supply 102. The RF power supply 102 may include one or more power modules. The RF power supply 102 may include one or more power modules with different output frequency bands.

[0333] Figure 23 and Figure 24 This is a schematic circuit diagram illustrating a change in the operating mode of a plasma generating device.

[0334] In the following text, reference will be made to Figures 22 to 24 This paper describes the mode-changing plasma discharge process in the case of two or more antenna modules.

[0335] Reference Figure 22 In the case where the plasma generating device includes a first antenna module 203, a second antenna module 204 and an RF power supply 102, the plasma generating device can change the dominant antenna module by changing the driving frequency of the power supply 102.

[0336] Reference Figure 22 In (a), when the operating mode is the first mode, the plasma generating device transmits a power signal with a first frequency f1 to the first antenna module 203 and the second antenna module 204 via the power supply 102, and induces plasma discharge inside the dielectric tube. The first frequency f1 can be a driving frequency that enables the first antenna module 203 to operate as the dominant antenna module.

[0337] When the operating mode is the first mode, the plasma generating device forms a first electric field E1 inside the dielectric tube. The first electric field E1 can be an electric field E1 in the vertical direction parallel to the axial direction of the dielectric tube. When the operating mode is the first mode, the plasma generating device forms an electric field E2 in the azimuth direction parallel to the circumferential direction of the dielectric tube inside the dielectric tube.

[0338] According to the embodiment, when the operating mode is the first mode, the plasma generating device transmits a power signal with a first frequency f1 to the first antenna module 203 and the second antenna module 204 to form an electric field E1 in the vertical direction and generate plasma by inducing capacitance coupling inside the dielectric tube.

[0339] According to an embodiment, when the operating mode is the first mode, the plasma generating device transmits a power signal with a first frequency f1 to the first antenna module 203 and the second antenna module 204 to form an electric field E2 in the azimuth direction and induce the generation of inductively coupled plasma inside the dielectric tube. When the operating mode is the first mode, the plasma generating device forms an electric field E2 with a first intensity in the azimuth direction.

[0340] Figure 23 It is shown Figure 22 A diagram illustrating the operation of the plasma generating apparatus shown in (a). (Refer to...) Figure 23 When the plasma generating device is in the first mode, the plasma generating device outputs a first current I1 with a second frequency f2 to the first antenna module 203 and the second antenna module 204 through the frequency conversion RF power supply.

[0341] When the plasma generating device operates in the first mode, a first current Ia1 is allocated to the first antenna module 203 and a first current Ib1 is allocated to the second antenna module 204. The first current Ia1 may be greater than the first current Ib1. When the operating mode is the first mode, the first frequency f1, which is the driving frequency, corresponds to the resonant frequency of the first antenna module 203. Most of the reactance of the first antenna module 203 is canceled out, and the reactance of the second antenna module 204 is canceled out relatively less. Most of the current can be allocated to the first antenna module 203. When the plasma generating device operates in the first mode, the first power consumed by the first antenna module 203 is higher than the second power consumed by the second antenna module 204. When the plasma generating device operates in the first mode, the first antenna module 203 induces inductively coupled plasma discharge inside the dielectric tube, and the generated plasma is inductively coupled to the inductor of the first antenna module 203.

[0342] Reference Figure 22(b) When the operating mode is the second mode, the plasma generating device uses a second frequency f2 as the driving frequency to supply power to the first antenna module 203 and the second antenna module 204 via the power supply 102. The second frequency f2 may be different from the first frequency f1. The second frequency f2 may differ from the first frequency f1 by a specific value or a greater value. The second frequency f2 may be higher or lower than the first frequency f1 by a specific value or a greater value (e.g., 0.2 MHz).

[0343] When the operating mode is the second mode, the plasma generating device transmits a power signal at a second frequency f2 to the first antenna module 203 and the second antenna module 204 to induce an electric field E3 in the azimuth direction and induce inductively coupled plasma discharge inside the dielectric tube. When the operating mode is the second mode, the plasma generating device forms an electric field E3 with a second intensity in the azimuth direction. This second intensity can be higher or lower than the intensity of the electric field E2 in the azimuth direction in the first mode.

[0344] Figure 24 It is shown Figure 22 A diagram illustrating the operation of the plasma generating apparatus shown in (b). (Refer to...) Figure 24 When the plasma generating device operates in the second mode, the plasma generating device outputs a second current I2 with a second frequency f2 to the first antenna module 203 and the second antenna module 204 through the frequency conversion RF power supply.

[0345] When the plasma generating device operates in the second mode, the second a current Ia2 is allocated to the first antenna module 203 and the second b current Ib2 is allocated to the second antenna module 204. The second a current Ia2 may be less than the second b current Ib2. According to an embodiment, when the operating mode is the second mode, the second frequency f2, which is the driving frequency, corresponds to the resonant frequency of the second antenna module 204. The reactance of the second antenna module 204 is mostly canceled out, while the reactance of the first antenna module 203 is relatively less canceled out. Most of the current can be allocated to the second antenna module 204. When the plasma generating device operates in the second mode, the second power consumed by the second antenna module 204 is higher than the first power consumed by the first antenna module 203. When the plasma generating device operates in the second mode, the second antenna module 204 induces inductively coupled plasma discharge inside the dielectric tube, and the generated plasma is inductively coupled to the inductor of the second antenna module 204.

[0346] Figure 25 This is a diagram showing the changes in voltage and current depending on the operating mode of the plasma generating device. Figure 25These are graphs showing the current flowing through the first antenna module, the voltage at both ends of the induction coil of the first antenna module, the current flowing through the second antenna module, the voltage at both ends of the induction coil of the second antenna module, and the frequency changing over time. Figure 25 In the diagram, the current curve and voltage curve show the magnitude.

[0347] Reference Figure 25 (e) When the plasma generating device is operating in the first mode, the power supply 102 provides a power signal with a first frequency f1 to the first antenna module 203 and the second antenna module 204. (Referring to...) Figure 25 (a) and Figure 25 (c) A first a current Ia1 flows through the first antenna module 203, and a first b current Ib1, which is less than the first a current Ia1, flows through the second antenna module 204. (Refer to...) Figure 25 (b) and Figure 25 (d) When the operation mode of the plasma generating device is the first mode, the voltage at the two ends of the induction coil of the first antenna module 203 is the first a voltage Va1, and the voltage at the two ends of the induction coil of the second antenna module 204 is the first b voltage Vb1, which is lower than the first a voltage Va1.

[0348] Reference Figure 25 (e) When the plasma generating device is operating in the second mode, the power supply 102 provides a power signal with a second frequency f2 to the first antenna module 203 and the second antenna module 204. (Refer to...) Figure 25 (a) and Figure 25 (c) In the second mode, a second a current Ia2, which is smaller than the first a current Ia1, flows through the first antenna module 203, and a second b current Ib2, which is larger than the first b current Ib1, flows through the second antenna module 204, wherein the second b current Ib2 can be greater than the first a current Ia1. (Refer to...) Figure 25 (b) and Figure 25 (d) When the plasma generating device operates in the second mode, the voltage at the two ends of the induction coil of the first antenna module 203 is a second a voltage Va2, which is lower than the first a voltage Va1, and the voltage at the two ends of the induction coil of the second antenna module 204 is a second b voltage Vb2, which is higher than the first b voltage Vb1. The second b voltage Vb2 may be higher than the second a voltage Va2.

[0349] Figure 26 This is a graph showing the voltage drop in each antenna module of the plasma generation apparatus according to an embodiment. In the following text, reference will be made to... Figure 24 The voltage distribution in each operating mode depends on the position of the induction coil in the dominant antenna module.

[0350] When the plasma generating device is in the first mode (where the first frequency corresponding to the resonant frequency of the first antenna module 203 is the driving frequency), most of the power supplied by the power source is consumed by the first antenna module 203 and the first antenna module 203 operates as the dominant antenna module as described above.

[0351] Figure 26 (a) schematically shows that the first antenna module 203 includes unit coils constituting a unit layer (in Figure 26 In the example shown in (a), there are three unit coils) and the case of interlayer capacitors disposed between the unit coils (as shown in the example). Figure 10 In the diagram, the voltage Vm1 is determined by the position of the induction coil in the first antenna module 203 in the first mode.

[0352] When the operating mode is the first mode, the first antenna module 203 is in a resonant state. When the operating mode is the first mode, the induction coil reactance cancellation of the interlayer capacitor between the unit coils of the first antenna module 203 is maximized, thereby inducing a first inductively coupled plasma discharge.

[0353] Reference Figure 26 (a) The voltage between the two ends of the antenna module with a total length of L13 can be the first voltage V1. Preferably, the voltage at the two ends (from the origin to point L11, from point L11 to point L12, and from point L12 to point L13) of each of the unit coils constituting the antenna module can be substantially the same as the first voltage V1.

[0354] Figure 26 (b) is a graph showing the voltage distribution depending on the position in the second antenna module 204 when the plasma generating apparatus according to the embodiment is in a second mode in which the second frequency is the driving frequency.

[0355] When the plasma generating device is in the second mode (where the second frequency corresponding to the resonant frequency of the second antenna module 204 is the driving frequency), most of the power supplied by the power source is consumed by the second antenna module 204 and the second antenna module 204 operates as the dominant antenna module as described above.

[0356] Figure 26 (b) schematically shows that the second antenna module 204 includes unit coils constituting the unit layer (in Figure 26 In the example shown in (b), there are four unit coils) and interlayer capacitors disposed between the unit coils (as shown in the example). Figure 10 (As shown in the diagram) In the second mode, the voltage Vm2 is determined based on the position in the induction coil of the second antenna module 204.

[0357] When the operating mode is the second mode, the second antenna module 204 is in a resonant state. In the second mode, the induction coil reactance cancellation through the interlayer capacitors between the unit coils of the second antenna module 204 is maximized, resulting in the induction of a second inductively coupled plasma discharge. The second inductively coupled plasma discharge can have a higher energy efficiency than the first inductively coupled plasma discharge.

[0358] Reference Figure 26 (b) The voltage between the two ends of the antenna module with a total length of L24 can be the second voltage V2. Preferably, the voltage between the two ends of each of the unit coils constituting the antenna module (from the origin to point L21, from point L21 to point L22, from point L22 to point L23, and from point L23 to point L24) can be substantially the same as the second voltage V2.

[0359] Meanwhile, when the operating mode is the first mode, the current flowing into the second antenna module 204 is essentially blocked. Therefore, when the operating mode is the first mode, the voltage at both ends of the sensing element constituting the second antenna module 204 converges to a very small voltage. Furthermore, when the operating mode is the second mode, the current flowing into the first antenna module 203 is essentially blocked. Therefore, when the operating mode is the second mode, the voltage at both ends of the sensing element constituting the first antenna module 203 converges to a very small voltage.

[0360] According to the embodiments, such as Figure 8 As shown, the first antenna module 203 may be an antenna module comprising a solenoid coil wound multiple times without an interlayer capacitor. In the case where the first antenna module 203 does not include an interlayer capacitor, when the driving frequency is a first frequency, the voltage at both ends of the induction coil of the first antenna module 203 is a first voltage (maximum value), or when the driving frequency is a second frequency, the voltage is a second voltage lower than the first voltage.

[0361] In the above embodiments, a mode-changing process in which the operation mode of the plasma generating device changes from a first mode to a second mode and the driving frequency decreases has been described. However, this is merely an example and the mode-changing form can be changed as needed. For instance, the operation mode of the plasma generating device can change from a second mode to a first mode. Alternatively, the operation mode of the plasma generating device may include three or more modes.

[0362] 3.2.1.2 Second Embodiment

[0363] The following text will use more detailed examples to illustrate the reference. Figures 22 to 26The illustrated embodiments. According to the embodiments, when it is required to ensure the initial discharge stability of the plasma (e.g., in the case of normal pressure plasma discharge), the plasma generating apparatus further includes a DC power supply and electrodes for providing seed charges to the plasma discharge. In this document, the operating modes of the plasma generating apparatus may include a first mode for assisting the initial discharge (i.e., the initial discharge mode) and a second mode for assisting the main discharge (i.e., the main discharge mode). In the following, unless otherwise specifically stated, the above references may be applied similarly. Figures 22 to 26 The content of the illustrated embodiments.

[0364] Figure 27 This diagram illustrates a plasma discharge process in a configuration where the plasma generation apparatus includes a first antenna module 203, a second antenna module 204, an RF power supply 102, a DC power supply 101, and DC electrodes 231 and 233. Reference can be made to... Figures 4 to 7 The same principles apply to DC power supply 101 and DC electrode 231.

[0365] Figure 28 and Figure 29 It is shown Figure 27 The schematic circuit diagram shows a change in the operating mode of the plasma generating device.

[0366] In the following text, reference will be made to Figure 27 , Figure 28 and Figure 29 This paper describes a mode-changing plasma discharge process that includes a plasma generation device with DC electrodes.

[0367] The operation modes of the plasma generating device may include a first mode for performing initial plasma discharge and a second mode for performing main plasma discharge. Figure 27 (a) is a diagram showing the operation of the plasma generating device in the first mode. Figure 27 (b) is a diagram showing the operation of the plasma generating device in the second mode.

[0368] Reference Figure 27 In (a), the plasma device in the first mode can use a first frequency corresponding to the resonant frequency of the first antenna module as the driving frequency to provide power to the first antenna module 203 and the second antenna module 204 through the power supply 102.

[0369] Reference Figure 27In (a) when the operating mode is the first mode, the DC power supply 101 applies a high-voltage pulse to the DC electrode 231. When the operating mode is the first mode, the plasma generating device applies a high-voltage pulse to the DC electrode 231 via the DC power supply 101 and forms an electric field E4. The electric field E4 can be formed between the DC electrode 231 and an object used as a counter electrode. For example, the electric field E4 can be formed between the DC electrode 231 and the gas tube 211. The plasma generating device can form the electric field E4, induce partial discharge (e.g., streamer discharge), and supply seed charge to the dielectric tube.

[0370] Reference Figure 28 When the operating mode is the first mode, the plasma generating device generates seed charge by applying a high voltage pulse to the DC electrode 231 via the DC power supply 101, and performs initial plasma discharge through the first antenna module 203 based on the generated seed charge.

[0371] When the operating mode is the first mode, the plasma generation device performs plasma discharge through the first antenna module based on seed charge. The plasma discharge through the first antenna module can be capacitively coupled plasma discharge or inductively coupled plasma discharge. In this paper, the case where the discharge through the first antenna module is capacitively coupled plasma discharge is explained.

[0372] According to an embodiment, the plasma discharge state can change over time. The operating mode of the plasma generating device can be changed according to the change in the plasma discharge state.

[0373] For example, plasma discharge according to the first mode can be primarily implemented via capacitive coupling mode (E mode). However, when plasma is sufficiently generated via capacitive coupling mode, a second electric field E2 is formed inside the dielectric tube as an induced electric field in the azimuth direction. When the second electric field E2 is formed, inductively coupled plasma discharge is performed, or plasma is generated via inductively coupled mode (H mode).

[0374] The plasma generation device can change its operating mode in response to changes in the plasma discharge state. (Refer to...) Figure 28 The plasma generating device can transmit a power signal with a first frequency f1 to the first antenna module 203 and the second antenna module 204 through the power supply 102, and can change the operating mode in response to the change of plasma discharge state.

[0375] The plasma generating device can detect changes in plasma discharge. The plasma generating device may include a sensor module that acquires the current flowing through the first antenna module 203 and / or the second antenna module 204, and / or the voltage applied to the two ends of the first antenna module 203 and / or the two ends of the second antenna module 204. The plasma generating device can acquire changes in the current flowing through the first antenna module 203 and / or the second antenna module 204, and / or changes in the voltage applied to the opposite ends of the first antenna module 203 and / or the opposite ends of the second antenna module 204, and can change the drive frequency and / or operating mode of the power supply 102 accordingly.

[0376] For example, when the plasma discharge state changes, the current flowing through the first antenna module 203 and / or the second antenna module 204, and / or the voltage applied to the two ends of the first antenna module 203 and / or the two ends of the second antenna module 204, changes. For example, when the main plasma discharge state changes from capacitively coupled plasma discharge to inductively coupled plasma discharge, the current flowing through the first antenna module 203 and / or the second antenna module 204, and / or the voltage applied to the two ends of the first antenna module 203 and / or the two ends of the second antenna module 204, decreases.

[0377] In response to a decrease in the current flowing through the first antenna module 203 and / or the second antenna module 204, and / or a decrease in the voltage applied to the two ends of the first antenna module 203 and / or the two ends of the second antenna module 204, the plasma generating device may change its operating mode to a second mode.

[0378] When the operation of the plasma generating device changes, the plasma generating device supplies power to the first antenna module 203 and the second antenna module 204 at a second driving frequency, and the second antenna module 204 is operated as the dominant antenna module as described above in the embodiments.

[0379] Reference Figure 27 (b) In the second mode, the DC power supply 101 can stop supplying power. In the second mode, the plasma generating device can use a second frequency corresponding to the resonant frequency of the second antenna module 204 as the driving frequency to supply power to the first antenna module 203 and the second antenna module 204, and can perform main plasma discharge.

[0380] Reference Figure 29 When the operating mode is the second mode, the plasma generating device uses the second frequency as the driving frequency and performs main plasma discharge through the second antenna module 204 based on the initial discharge plasma generated by the first antenna module 203.

[0381] Figure 30 This is a diagram showing the voltage and current changes depending on the operating mode of the plasma generating device. Figure 30 V is shown separately DC+ The graph shows the changes in DC high-voltage pulse, current flowing through the first antenna module, voltage at both ends of the induction coil of the first antenna module, current flowing through the second antenna module, voltage at both ends of the induction coil of the second antenna module, and frequency over time. Figure 30 In the diagram, the current curve and voltage curve show the magnitude.

[0382] about Figure 30 (b) Figure 30 (c) Figure 30 (d) Figure 30 of (e) Figure 30 (f) can refer to the above. Figure 25 The same principles apply to the current flowing through the first antenna module of the plasma generating device, the voltage at the two ends of the induction coil of the first antenna module, the current flowing through the second antenna module, the voltage at the two ends of the induction coil of the second antenna module, and the frequency.

[0383] Reference Figure 30 (a) When the plasma generating device is in the first operating mode, the DC power supply 101 generates high-voltage pulses. The DC power supply 101 can generate high-voltage pulses while maintaining the first mode (keeping the drive frequency at the first frequency f1). Even before the first mode ends, the DC power supply 101 can stop generating high-voltage pulses. The plasma generating device (or the controller of the plasma generating device) can control the DC power supply 101 to generate a predetermined number of high-voltage pulses. The plasma generating device can control the DC power supply 101 to generate high-voltage pulses for a predetermined time.

[0384] Reference Figure 30 (b) and Figure 30 (c) When the operating mode is the first mode, the current flowing through the first antenna module and / or the voltage at both ends of the induction coil of the first antenna module decreases due to the change in plasma discharge state.

[0385] Reference Figure 28 (d) Figure 28 of (e) Figure 28 In response to the decrease in current flowing through the first antenna module and / or the decrease in voltage at both ends of the induction coil of the first antenna module, the plasma generating device changes its operating mode to the second mode. (Refer to...) Figure 30(a) When the plasma generating device is in the second operating mode, the DC power supply stops generating high-voltage pulses.

[0386] Meanwhile, in the above embodiments, the case in which the operating mode changes from the first mode to the second mode in response to the change of plasma state has been described, but the change of operating mode can be carried out in the reverse order.

[0387] 3.2.2 Two antennas and one inverter

[0388] Figure 31 This is a diagram illustrating a plasma generating apparatus according to an embodiment. (Refer to...) Figure 31 The plasma generating device may include a power supply module 104, a first antenna module 203, and a second antenna module 204.

[0389] The RF power supply module 104 can be an AC power supply with a predetermined frequency conversion range. The power supply module 104 can operate using the resonant frequency of the first antenna module 203 and / or the resonant frequency of the second antenna module 204 as the driving frequency.

[0390] The control method for the plasma generating device according to the embodiment may include: controlling the plasma generating device in a first mode via a power supply module; and controlling the plasma generating device in a second mode via a power supply module. The above description can be applied to both the first and second modes.

[0391] Figure 32 This is a diagram illustrating a control method for a plasma generating apparatus according to an embodiment.

[0392] Reference Figure 32 The control method of the plasma generating device according to the embodiment may include: providing power of a first frequency to the first antenna module and the second antenna module through the power module at step (S310); and providing power of a second frequency to the first antenna module and the second antenna module through the power module at step (S330).

[0393] In step (S310), providing power at the first frequency to the first antenna module and the second antenna module via the power supply module may include using the first frequency corresponding to the resonant frequency of the first antenna module as the driving frequency to provide power.

[0394] The first antenna module may be an antenna module including interlayer capacitors. In this paper, the voltage distribution of the first antenna module can be expressed as... Figure 26 Examples related to (a). Alternatively, the first antenna module may be an antenna module that does not include interlayer capacitors. In this paper, the power distribution of the first antenna module may be characterized as... Figure 16 (a) Related examples.

[0395] In step (S310), providing power at the first frequency to the first antenna module and the second antenna module via the power supply module may include inductively coupled plasma discharge via the first antenna module.

[0396] In step (S330), providing power at a second frequency to the first antenna module and the second antenna module via the power supply module may include using a second frequency corresponding to the resonant frequency of the second antenna module as the driving frequency to provide power.

[0397] The second antenna module can be an antenna module that includes interlayer capacitors. In this paper, the power distribution of the second antenna module can be expressed as... Figure 26 (b) Related examples.

[0398] Providing power at the second frequency to the first antenna module and the second antenna module via the power supply module at step (S330) may include inductively coupled plasma discharge via the second antenna module.

[0399] According to an embodiment, the control method for the plasma generating device may further include acquiring a change in the power supply signal. The control method for the plasma device may include acquiring a change in the current flowing through the first antenna module or a change in the voltage at both ends of the first antenna module (or some elements constituting the first antenna module), and changing the driving frequency of the power supply module to a second frequency based on the acquired change.

[0400] 3.2.3 Two antennas and two inverters

[0401] Figure 33 This is a diagram illustrating a plasma generating apparatus according to an embodiment. (Refer to...) Figure 31 The plasma generating apparatus according to the embodiment may include: a first power supply module 105, which is an AC power supply having a first frequency band and a first matching range; a second power supply module 106, which is an AC power supply having a second frequency band and a second matching range; a first antenna module 205, which receives power from the first power supply module 105 and performs plasma discharge; and a second antenna module 206, which receives power from the second power supply module 106 and performs plasma discharge.

[0402] The first power module 105 may have a first driving frequency range, and the second power module 106 may have a second driving frequency range that is at least partially different from the first driving frequency range. The first power module 105 can be driven by the first frequency within the first driving frequency range. The second power module 106 can be driven by the second frequency within the second driving frequency range. The first frequency may correspond to the resonant frequency of the first antenna module 205, and the second frequency may correspond to the resonant frequency of the second antenna module 206. The first power module 105 may include a first matching element. The second power module 106 may include a second matching element having an impedance different from that of the first matching element.

[0403] The control method for the plasma generating device according to the embodiment may include: controlling the plasma generating device in a first mode via a first power supply module; and controlling the plasma generating device in a second mode via a second power supply module. The above description can be applied to both the first and second modes.

[0404] Figure 34 This is a diagram illustrating a plasma generation method according to an embodiment.

[0405] Reference Figure 34 The control method of the plasma generating device according to the embodiment may include: providing power at a first frequency to the first antenna module through a first power module at step (S410); and providing power at a second frequency to the second antenna module through a second power module at step (S430).

[0406] In step (S410), providing power at a first frequency to the first antenna module via the first power supply module may include providing power at a first frequency to the first antenna module via the first power supply module, where the first frequency is the resonant frequency of the first antenna module. In this document, the voltage distribution of the first antenna module may be characterized as... Figure 26 (a) Related examples.

[0407] Providing power at a first frequency to the first antenna module via the first power module at step (S410) may include inducing plasma discharge through capacitive coupling within the dielectric tube by operating at the first frequency as the driving frequency via the first antenna module.

[0408] Alternatively, supplying power at a first frequency to the first antenna module via the first power module at step (S410) may include inducing inductively coupled plasma discharge within the dielectric tube by providing power at the first frequency via the first power module to the first antenna module through an induced electric field of a first intensity.

[0409] In step (S430), supplying power at a second frequency to the second antenna module via the second power module may include supplying power at a second frequency to the second antenna module via the second power module, where the second frequency is the resonant frequency of the second antenna module. In this document, the power distribution of the second antenna module may be characterized as... Figure 26 (b) Related examples.

[0410] Providing power at a second frequency to the second antenna module via the second power module at step (S430) may include inducing inductively coupled plasma discharge within the dielectric tube by operating at the second frequency as the drive frequency through the second antenna module.

[0411] Providing power at a second frequency to the second antenna module via the second power module at step (S430) may include forming an induced electric field with a second intensity inside the dielectric tube and inducing inductively coupled plasma discharge by operating at the second frequency as the driving frequency. The second intensity may be higher or lower than the first intensity of the electric field induced by the first power module.

[0412] According to an embodiment, the control method for a plasma generating device may further include acquiring a change in a power signal. The control method for a plasma device may include acquiring a change in the current flowing through an antenna module or a change in the voltage at both ends of the antenna module (or some elements constituting the antenna module). The control method for a plasma device may include acquiring such changes and controlling a first power module and / or a second power module based on these changes. For example, the control method for a plasma device may acquire a decrease in the current flowing through the first antenna module or a decrease in the voltage at both ends of the first antenna module (or some elements constituting the first antenna module), and based on the decrease, stop the operation of the first power module and start the operation of the second power module.

[0413] According to an embodiment, the control method for the plasma generation device may further include two different modes for providing RF power to the antenna module. (See also...) Figure 35 The control method for the plasma generating device may further include operating in a first mode at step S1010, wherein a first frequency is used as the driving frequency to provide RF power to the antenna module, and operating in a second mode at step S1030, wherein a second frequency is used as the driving frequency to provide RF power to the antenna module.

[0414] As described in the above embodiments, plasma discharge is selectively performed according to various discharge environments by using multiple antenna modules with different discharge characteristics. A plasma generating apparatus is provided that uses multiple antenna modules to perform plasma discharge, thereby enabling discharge in various environments.

[0415] 4. Byproduct suppression plasma generation device

[0416] Meanwhile, by applying a voltage to the antenna coil wound around the tube, byproducts other than the desired products may be formed. For example, by applying a voltage to the coil to form an electric field with a directional component perpendicular to the tube, the plasma generated inside the tube is accelerated toward the inner wall of the tube and collides with the inner wall of the tube, and byproducts that separate from the inner wall of the tube due to the collision mix with plasma products (e.g., free radicals).

[0417] The following will describe a plasma generating apparatus and control method for suppressing the generation of byproducts according to several embodiments.

[0418] 4.1 Antenna Module

[0419] The plasma generating apparatus according to an embodiment may include an antenna module designed to minimize the generation of byproducts.

[0420] The antenna module may include one or more unit antennas and unit capacitors. The antenna module may be positioned around the plasma dielectric tube (see [reference]). Figure 4 , Figure 6 ).

[0421] The antenna module may include one or more element antennas configured to be mounted within a plasma dielectric tube. The element antennas may be spaced apart from each other at predetermined intervals along the length of the tube. The element antennas may be spaced apart from each other along the length of the tube and may be arranged around the central axis of the tube (e.g., see...). Figure 10 (and related explanations). A single-element antenna can be an inductor with inductance. Single-element antennas can have the same inductance.

[0422] Each element antenna may include an element turn. Each element antenna may include: a first turn, in contact with the dielectric tube; and a second turn, positioned further away from the dielectric tube than the first turn. The first and second turns may be located in the same plane. The first and second turns may be located in a plane perpendicular to the length direction of the dielectric tube. For example, such as Figure 12 As shown, a unit antenna module according to an embodiment may be provided.

[0423] The antenna module may include one or more unit capacitors connected to the unit antennas. The unit capacitors may be connected to the unit antennas and may be disposed between the unit antennas. The unit capacitors may be disposed between the unit antennas and a power supply. For example, they may be as follows: Figure 8 or Figure 10The diagram shows a unit capacitor. The one or more unit capacitors included in the antenna module may have the same capacitance. Alternatively, the one or more unit capacitors included in the antenna module may have different capacitances.

[0424] The antenna module can be connected to a power source, receive power from the power source, and provide plasma discharge inside the dielectric tube. The concepts described in this disclosure can be similarly applied to the operation of the power supply and the plasma discharge.

[0425] Figure 36 This is a diagram illustrating an antenna module according to an embodiment.

[0426] Antenna module 360 ​​may include one or more unit antennas 361 and one or more unit capacitors 363. Antenna module 360 ​​may be disposed around a dielectric tube. Antenna module 360 ​​may include the one or more unit antennas 361 having the same shape. Unit antennas may be connected to unit capacitors 363. The unit capacitors included in antenna module 360 ​​may be interlayer capacitors disposed between unit antennas 361 or terminating capacitors disposed between unit antennas and a power supply. Antenna module may be connected to and receive power.

[0427] For example, antenna module 360 ​​may include: a first terminating capacitor connected to a power source; a first unit antenna connected to the first terminating capacitor; a first interlayer capacitor connecting the first unit antenna and a second unit antenna; a second unit antenna located below the first unit antenna; a second interlayer capacitor connecting the second unit antenna and a third unit antenna; a third unit antenna located below the second unit antenna; a third interlayer capacitor connecting the third unit antenna and a fourth unit antenna; and a fourth unit antenna located below the third unit antenna and connected to a power source. The unit antennas are... Figure 37 The form shown is provided and can be provided in a circular manner.

[0428] exist Figure 36 The example provided illustrates a case where the antenna module comprises four antenna elements, but this is merely an example, and the number of antenna elements and / or capacitor elements can be varied. The concepts set forth in this disclosure can be similarly applied to antenna module 360.

[0429] 4.2 Antenna Module Configuration

[0430] The unit antenna and unit capacitor constituting the antenna module according to the embodiment will be described below.

[0431] Figure 37 This is a diagram illustrating a unit antenna according to an embodiment. (Refer to...) Figure 37A single-element antenna may include at least two element turns. The single-element antenna may include two element turns disposed on the same plane and having a concentric circle (concentric arc) shape. The single-element antenna may include: a first element turn, located internally and having a smaller radius; and a second element turn, located externally and having a larger radius than the first element turn. In the state where the antenna module is engaged with the dielectric tube, the first element turn may contact the dielectric tube. The single-element antenna may include a connecting portion connecting the element turns.

[0432] Reference Figure 37 The element antenna may include: a first turn located on the innermost side; a second turn located outside the first turn; and a third turn located outside the second turn. The first turn and the second turn may be connected to each other via a first connecting portion. The second turn and the third turn may be connected to each other via a second connecting portion. The first turn may extend in an arc shape from a first point P1 to a second point P2. The third turn located on the outermost side may have a third point P3 that is furthest from the first point, and the element antenna may be connected from the first point to the third point.

[0433] at the same time, Figure 37 The shape of the element antenna shown is merely an example, and examples of antenna modules may include element antennas of other shapes. For example, Figure 37 The antenna module shown includes three turns, but the antenna module may include more or fewer than three turns.

[0434] Refer to together Figure 36 and Figure 37 The first terminating capacitor can be connected between the first point of the first unit antenna and the power supply. The first interlayer capacitor can be connected between the third point of the first unit antenna and the first point of the second unit antenna. The second interlayer capacitor can be connected between the third point of the second unit antenna and the first point of the third unit antenna.

[0435] The unit capacitor may have a fixed capacitance or a variable capacitance. The unit antenna may have a fixed inductance or a variable inductance. The capacitance of the capacitors included in the antenna module or the inductance of the inductors included in the antenna module may be determined taking into account the arrangement of the antenna module relative to the tubes. The capacitance of the capacitors included in the antenna module or the inductance of the inductors included in the antenna module may be determined taking into account the arrangement of the antenna module to which each capacitor or inductor is connected. Taking into account the arrangement of the antenna module, capacitors, and / or unit antennas, the antenna module may include a capacitor having a capacitance determined to minimize byproduct generation, or a unit antenna having an inductance determined to minimize byproduct generation.

[0436] According to an embodiment, the interlayer capacitor may have a fixed capacitance, and the terminating capacitor may have a variable capacitance. Alternatively, the one or more interlayer capacitors may have the same capacitance, and the terminating capacitor may have a capacitance different from that of the interlayer capacitors. For example, the interlayer capacitor may have a first capacitance, the first terminating capacitor may have a second capacitance different from the first capacitance, and the second terminating capacitor may have a third capacitance different from the second capacitance.

[0437] The capacitance value of the unit capacitor can be determined to minimize the byproducts generated during plasma discharge. During plasma discharge, an electric field with a directional component perpendicular to the inner wall of the dielectric tube is formed by the voltage applied to the antenna, causing the plasma to collide with the inner wall of the dielectric tube and generate byproducts. The capacitance of the unit capacitor can be determined to minimize the effect of the voltage generated by the antenna on the plasma inside the dielectric tube.

[0438] For example, by setting the capacitance of the terminating capacitors at the two ends of the antenna module to a different capacitance than the interlayer capacitors, the generation of byproducts caused by the voltage applied to the antenna module is minimized. For example, by asymmetrically configuring the capacitance of the terminating capacitors, the potential at a point on the unit turn closest to the discharge tube in the unit turn constituting the unit antenna is minimized, thereby minimizing the generation of byproducts caused by plasma collisions. That is, the maximum value (absolute value) of the potential at any point within the unit turn closest to the dielectric tube is minimized, thereby minimizing the generation of byproducts caused by plasma collisions. In other words, by minimizing the voltage at any point within the unit turn closest to the dielectric tube to ground, the generation of byproducts caused by plasma collisions is minimized.

[0439] Reference Figure 36 and Figure 37 To minimize the generation of byproducts, the absolute value of the potential V of the reactive component between the first point P1 and the second point P2 of the unit antenna can be used. R Minimize. That is, minimize the voltage applied to the reactive component of the first turn located on the innermost side, so that the voltage component in the direction perpendicular to the inner wall of the dielectric tube is minimized, thereby reducing the generation of by-products.

[0440] The voltage (or potential) of the reactance component between points can refer to the voltage applied to the total reactance component between points (or the potential difference at the two ends).

[0441] According to an embodiment, the capacitance of the first terminating capacitor (the capacitance of the capacitor connected to the first point P1 of the first turn) may be greater than the capacitance of the second terminating capacitor. The capacitance of the first terminating capacitor may be greater than the capacitance of the interlayer capacitor. The capacitance of the second terminating capacitor (the capacitance of the capacitor connected to the third point P3 of the third turn) may be less than the capacitance of the interlayer capacitor. The total capacitance of the first terminating capacitor and the second terminating capacitor may be the same as the capacitance of the interlayer capacitor.

[0442] By appropriately adjusting the capacitance of the first and second terminating capacitors, the absolute value of the potential at the first point P1 is adjusted to be similar to the absolute value of the potential at the second point P2. By adjusting the absolute value of the voltage applied to the first point P1 to be similar to the absolute value of the voltage applied to the second point P2, the absolute value of the potential of the reactance component of the innermost turn is minimized, thereby reducing the generation of byproducts.

[0443] According to another embodiment, to assist in the generation of plasma discharge, the capacitance of the terminal capacitor can be changed such that the absolute value of the potential of the reactance component of the innermost unit turn is maximized.

[0444] For example, to assist plasma discharge, the absolute value V of the potential of the reactive component between the first point P1 and the second point P2 of the unit antenna can be used. R Maximization. That is, by maximizing the absolute value of the potential of the reactance component of the innermost first turn, capacitive coupling discharge and auxiliary discharge are induced inside the dielectric tube. For auxiliary discharge, the capacitance of the first terminating capacitor can be set to be smaller than the capacitance of the second terminating capacitor. The capacitance of the first terminating capacitor can be smaller than the capacitance of the interlayer capacitor. The capacitance of the second terminating capacitor can be larger than the capacitance of the interlayer capacitor. The total capacitance of the first and second terminating capacitors can be the same as the capacitance of the interlayer capacitor.

[0445] According to an embodiment, an antenna module coupled to a dielectric tube and receiving power from a power source can be provided. The antenna module may include a first unit antenna, the first unit antenna including: a first unit turn extending from a first point to a second point; and a second unit turn extending from a third point to a fourth point. The first unit turn may be located inside the second unit turn, and the second point may be connected to the third point. Each of the unit turns may extend in an arc shape or a circular shape. The unit turns may extend in an arc shape having the same center angle.

[0446] The antenna module may include: a first capacitor connected to a first point of the first unit turn and connected between a first terminal of the power supply and the first point; and a second capacitor connected between a second terminal of the power supply and a fourth point.

[0447] To minimize tube damage and byproduct generation caused by the voltage applied to the antenna module, the capacitance of the second capacitor may be smaller than that of the first capacitor. To minimize tube damage and byproduct generation by minimizing the voltage applied to the reactive component of the first unit turn connected to the first capacitor (the turn located on the innermost side of the first unit antenna), the capacitance of the second capacitor may be smaller than that of the first capacitor.

[0448] The capacitance of the first capacitor can be more than twice the capacitance of the second capacitor. This minimizes the voltage applied to the reactive component of the first unit turn.

[0449] The antenna module may include a third capacitor connected between a fourth point of the second unit turn and the second capacitor. The capacitance of the third capacitor may be smaller than the capacitance of the second capacitor.

[0450] The total capacitance of the first capacitor and the second capacitor can correspond to the capacitance of the third capacitor. The total capacitance of the first capacitor and the second capacitor can be substantially the same as the capacitance of the third capacitor.

[0451] The antenna module may further include a second element antenna, which includes: a third element turn extending from point 5 to point 6; and a fourth element turn extending from point 7 to point 8. The third element turn may be located inside the fourth element turn, and point 6 may be connected to point 7. A third capacitor may be connected between point 4 and point 5. A second capacitor may be connected between point 8 and a second terminal of the power supply.

[0452] To minimize tube damage and byproduct generation by minimizing the voltage applied to the reactive component of the first unit turn (located on the innermost side of the first unit antenna) connected to the first capacitor, the capacitance of the third capacitor may be smaller than that of the second capacitor.

[0453] The first unit turn and the second unit turn may be located on a plane perpendicular to the length direction of the dielectric tube. The first unit turn may extend from a first point to a second point in a first direction, and similar to the first unit turn, the second unit turn may extend from a third point to a fourth point in the first direction.

[0454] The first point can be closer to the pipe than the fourth point. The first point can correspond to... Figure 37 P1 is shown in the diagram. The fourth point can correspond to... Figure 37 P3 is shown in the diagram.

[0455] When power is supplied to the antenna module, the voltage of the reactance component applied to the first capacitor is lower than the voltage of the reactance component applied between the first and second points, and the voltage of the reactance component applied to the third capacitor corresponds to the voltage of the reactance component applied between the first and fourth points.

[0456] The antenna module can resonate at a resonant frequency determined by the capacitance of the third capacitor and the inductance of the first element antenna. When the antenna module is in a resonant state, the point where the potential of the first terminal becomes 0 can be located at the first element turn of the first element antenna. This point can be the point where the potential of the reactance component between the first terminal and this point is 0. Alternatively, this point can be the point where the voltage applied to the reactance component between the first terminal and this point is 0.

[0457] The antenna module can resonate at a resonant frequency determined by the capacitance of the third capacitor and the inductance of the first element antenna. When the antenna module is in a resonant state, the voltage of the reactive component applied between the first point and the first terminal is substantially the same as the voltage of the reactive component applied between the second point and the first terminal.

[0458] According to another embodiment, an antenna module coupled to a dielectric tube and receiving power from a power source can be provided. The antenna module includes a first element antenna, a first capacitor, and a second capacitor.

[0459] The first element antenna may include: a first element turn extending from a first point to a second point; and a second element turn extending from a third point to a fourth point. The first element turn may be located inside the second element turn, and the second point may be connected to the third point.

[0460] The antenna module may include a first capacitor connected between a first terminal of the power supply and a first point of the first unit turn.

[0461] The antenna module may include a second capacitor connected to the fourth point of the second unit turn.

[0462] The first capacitor can be connected between the first terminal of the power supply and the first point.

[0463] When power is supplied to the antenna module, the point where the voltage at the first unit antenna becomes the lowest is located at the first unit turn. This point can be the point where the voltage of the reactive component between the first terminal and this point is 0.

[0464] The antenna module can resonate at the resonant frequency determined by the capacitance of the second capacitor and the inductance of the first unit antenna.

[0465] When the antenna module is in a resonant state, the point where the voltage at the first unit antenna becomes the lowest is located at the first unit turn.

[0466] When power is supplied to the antenna module, the point where the voltage at the first unit antenna becomes the lowest is located at the first unit turn.

[0467] When power is supplied to the antenna module, the point where the absolute value of the potential of the reactance component at the first unit antenna becomes the lowest is located at the first unit turn.

[0468] The capacitance of the first capacitor can be more than twice the capacitance of the second capacitor.

[0469] To minimize tube damage and byproduct generation caused by the voltage applied to the antenna module, the capacitance of the second capacitor can be smaller than that of the first capacitor.

[0470] The antenna module may also include a second element antenna, which includes: a third element turn extending from point 5 to point 6; and a fourth element turn extending from point 7 to point 8. The third element turn may be located inside the fourth element turn, and point 6 may be connected to point 7.

[0471] The second capacitor can be connected between the fourth and fifth points.

[0472] It may also include a third capacitor connected between the eighth point and the second terminal of the power supply.

[0473] The capacitance of the second capacitor can be smaller than that of the third capacitor.

[0474] The total capacitance of the first capacitor and the third capacitor can correspond to the capacitance of the second capacitor. The total capacitance of the first capacitor and the third capacitor can also be substantially the same as the capacitance of the second capacitor.

[0475] According to another embodiment, an antenna module coupled to a dielectric tube and receiving power from a power source can be provided. The antenna module includes a first element antenna, a first capacitor, and a second capacitor.

[0476] The first element antenna may include: a first element turn extending from a first point to a second point; and a second element turn extending from a third point to a fourth point. The first element turn may be located inside the second element turn, and the second point may be connected to the third point.

[0477] The first capacitor can be connected to the first point of the first unit turn and can be connected between the first terminal of the power supply and the first point.

[0478] The second capacitor can be connected between the second terminal of the power supply and the fourth point. The capacitance of the second capacitor may be different from that of the first capacitor.

[0479] The antenna module may also include a third capacitor connected between the fourth point of the second unit turn and the second capacitor.

[0480] Additionally, the antenna module may also include a second element antenna, which includes: a third element turn extending from the fifth point to the sixth point; and a fourth element turn extending from the seventh point to the eighth point. The third element turn may be located inside the fourth element turn, and the sixth point may be connected to the seventh point.

[0481] The third capacitor can be connected between points four and five. The second capacitor can be connected between point eight and the second terminal of the power supply.

[0482] The total capacitance of the first capacitor and the second capacitor can correspond to the capacitance of the third capacitor. The total capacitance of the first capacitor and the second capacitor can be substantially the same as the capacitance of the third capacitor.

[0483] Similar to Figures 38 to 40 The following explanations are used to understand the capacitance of the first capacitor, the capacitance of the second capacitor, and the capacitance of the third capacitor.

[0484] 4.3 Voltage distribution during plasma discharge operation

[0485] The absolute value of the potential of the reactance component of the unit antenna based on the capacitance of the terminal capacitor will be explained below.

[0486] Figure 38 This is a diagram showing the potential distribution applied to the antenna module according to an embodiment.

[0487] Figure 38 This is a diagram showing the potential of the antenna module and the reactance component of the antenna module according to an embodiment. Figure 38 This paper simply illustrates the voltage applied to the reactive component of the antenna module at a frequency of approximately 3 MHz and a current of 20 amps, when the capacitance of the first terminating capacitor C1 is greater than that of the second terminating capacitor C2. In this paper, the potential measured at the first point P1 is -100 volts, and the potential measured at the second point P2 is 100 volts.

[0488] During plasma discharge, in order to minimize the byproducts generated by the collision between the plasma and the dielectric tube due to the electric field formed by the antenna and the capacitive coupling of the plasma, the capacitance of the terminal capacitor can be appropriately adjusted. Figure 38 The potential of the antenna module (where the capacitance of the terminating capacitor is determined to minimize byproducts) and the reactive component of the antenna module are simply shown.

[0489] Compared to Figure 11 , Figure 11 The antenna module shown is configured such that the total capacitance of the opposing terminal capacitors corresponds to the capacitance of the interlayer capacitor, which is similar to... Figure 38 The antenna module shown. However, with Figure 38 The antenna modules shown differ because... Figure 11 The capacitances of the opposite terminal capacitors are made equal to each other.

[0490] Figure 11The antenna module shown can be designed such that the voltage of the reactive component applied to the antenna (i.e., the voltage applied between the ends of the antenna) is canceled out, and the voltage of the reactive component applied to the terminating capacitor corresponds to half of the voltage of the reactive component applied to the unit antenna. However, in Figure 38 In the antenna module shown, the capacitances of the opposing terminal capacitors can be set to be different from each other, so that the potential of the reactance component corresponding to the innermost turn of the unit antenna of the antenna module is minimized.

[0491] Figure 38 The antenna module shown can be configured such that the voltage applied to the reactance component of the first terminating capacitor C1 is different from the voltage applied to the reactance component of the second terminating capacitor C2.

[0492] According to an embodiment, the antenna module can be configured such that the voltage applied to the reactance component of the first terminating capacitor C1 connected to the innermost turn of the first unit antenna is lower than the voltage applied to the reactance component of the second terminating capacitor C2 connected to the outermost turn of the second unit antenna.

[0493] According to an embodiment, the antenna module can be configured such that the capacitance of the first terminating capacitor C1 connected to the innermost turn of the first unit antenna is greater than the capacitance of the second terminating capacitor C2 connected to the outermost turn of the second unit antenna.

[0494] According to an embodiment, the antenna module can be configured such that the potential of the reactance component of the innermost turn of the first unit antenna connected to the first terminating capacitor having a first capacitance is less than the potential of the reactance component of the outermost turn of the second unit antenna connected to the second terminating capacitor having a second capacitance, wherein the second capacitance is less than the first capacitance.

[0495] According to the embodiment, the antenna module can be configured such that the potential of the reactance component of the first unit turn located on the innermost side of the unit antenna is less than the potential of the reactance component of the second unit turn located on the outermost side of the unit antenna.

[0496] In the antenna module according to the embodiment, the point with the smallest potential difference relative to the power supply (e.g., the end of the first terminating capacitor not connected to the element antenna or ground) is located at the first element turn positioned on the innermost side of the element antenna, and the point with the largest potential difference relative to the power supply is located at the second element turn positioned on the outermost side of the element antenna. (Refer to...) Figure 38 Compared to Figure 10The antenna module can be configured such that the point where the reactive component of the element antenna has a potential of 0 (i.e., the point with the smallest potential difference relative to the voltage) is closer to the first terminating capacitor C1 or the power supply. That is, the capacitance of the terminating capacitor can be adjusted so that the point with a potential of 0 is located at the innermost turn of the element antenna (i.e., between the first point P1 and the second point P2). In this way, damage to the dielectric tube caused by the voltage applied to the innermost turn closest to the dielectric tube can be reduced, and the generation of byproducts due to damage can be reduced.

[0497] Figure 39 An antenna module according to another embodiment and the voltage of the reactive component applied to the antenna module are simply shown. Figure 39 The voltage of the reactive component applied to the antenna module at a frequency of approximately 3 MHz and a current of 20 amps, omitting the first terminating capacitor C1, is simply shown. In this paper, the potential measured at the first point P1 is 0 volts, and the potential measured at the second point P2 is 200 volts.

[0498] Figure 39 The antenna module shown is illustrated for the case where the first terminating capacitor C1 is omitted and the capacitance of the second terminating capacitor C2 is the same as that of the interlayer capacitor. (Refer to...) Figure 39 The voltage applied to the reactive component of the first unit turn (innermost turn) extending from the first point P1 to the second point P2 can be higher than that applied to... Figure 38 The voltage of the reactance component of the first turn of the antenna module shown.

[0499] Reference Figure 38 and Figure 39 It was found that by appropriately determining the value of the first terminal capacitor, the absolute value of the potential at the point of the reactance component of the innermost turn decreased.

[0500] Figure 40 An antenna module according to yet another embodiment and the voltage of the reactive component applied to the antenna module are simply shown.

[0501] Figure 40 This paper simply illustrates the voltage applied to the reactive component of the antenna module at a frequency of approximately 3 MHz and a current of 20 amps, when the capacitance of the first terminating capacitor C1 is less than that of the second terminating capacitor C2. In this paper, the potential measured at the first point P1 is -700 volts, and the potential measured at the second point P2 is -500 volts.

[0502] Usable Figure 40 The antenna module shown is used to assist in plasma discharge. Figure 40 The antenna module shown maximizes the absolute value of the potential at the point where the reactance component of the innermost turn of the antenna module is maximized, thereby assisting in a more stable plasma discharge.

[0503] To assist plasma discharge, the capacitance of the first terminating capacitor C1 can be set to be smaller than that of the second terminating capacitor C2. The total capacitance of the first terminating capacitor C1 and the second terminating capacitor C2 can correspond to the capacitance of the interlayer capacitor.

[0504] Although embodiments have been described and illustrated, those skilled in the art can make various modifications and variations based on the above description. For example, even if the described techniques are implemented in a different order than the described methods, and / or the elements of the described systems, structures, devices, and circuits are coupled or combined in a different form than the described methods, or are replaced or substituted by other elements or equivalents, suitable results can still be achieved.

[0505] Therefore, other embodiments, examples, and equivalents of the claims are also within the scope of the following claims.

Claims

1. A plasma generating apparatus for performing plasma discharge, the plasma generating apparatus comprising: The power supply is configured to output radio frequency power. The power supply is connected to a DC voltage power source and ground. The power supply mentioned above includes a first terminal and a second terminal; Dielectric tubes provide the space for generating plasma; as well as The antenna module is configured to induce plasma within the dielectric tube by receiving radio frequency power from the power supply. The antenna module includes a first antenna structure and a second antenna structure. The first antenna structure includes a first inner ring antenna and a first outer ring antenna wound around the dielectric tube. The first inner ring antenna and the first outer ring antenna are located on the first virtual plane. The radius of the first inner ring antenna is smaller than the radius of the first outer ring antenna. The first inner ring antenna is connected to the first terminal of the power supply via a first capacitor. The second antenna structure includes a second inner ring antenna and a second outer ring antenna wound around the dielectric tube. The second inner ring antenna and the second outer ring antenna are located on the second virtual plane. The radius of the second inner ring antenna is smaller than the radius of the second outer ring antenna. The first virtual plane and the second virtual plane are spaced apart along the central axis of the dielectric tube. The second outer ring antenna is connected to the second terminal of the power supply via a second capacitor, and The second antenna structure is connected to the first antenna structure via a third capacitor. The first capacitance of the first capacitor is greater than the second capacitance of the second capacitor. The relationship between the first capacitor and the second capacitor is such that the zero potential point is located between the first inner ring antenna and the second inner ring antenna, rather than between the first outer ring antenna and the second outer ring antenna. The zero potential point is defined as the point relative to the ground being at zero potential.

2. The plasma generating apparatus according to claim 1, wherein the third capacitance of the third capacitor is smaller than the second capacitance.

3. The plasma generating apparatus according to claim 1, wherein the first capacitor, the second capacitor and the third capacitor are all variable capacitors.

4. The plasma generating apparatus according to claim 1, wherein the total capacitance of the first capacitor and the second capacitor is the same as the third capacitance of the third capacitor.

Images