Precursor delivery system, precursor supply package and related methods

Abstract

This application relates to precursor delivery systems, precursor supply packages, and related methods. Some embodiments relate to a precursor delivery system for generating a gaseous precursor. The precursor delivery system can include one or more precursor supply packages containing a solid precursor material. The one or more precursor supply packages can be configured to heat the solid precursor material to a temperature sufficient to cause thermal decomposition of the solid precursor material. The thermal decomposition of the solid precursor material can generate a gaseous precursor. The gaseous precursor can be supplied to a process that utilizes a gaseous precursor. Further embodiments relate to precursor supply packages and related methods.

Description

Technical Field

[0001] This disclosure generally relates to precursor delivery systems, precursor supply packaging, and related methods. Background Technology

[0002] Gaseous precursors for various industrial applications are stored and transported as adsorbed or compressed gases. These technologies are expensive and complex. Furthermore, efforts to transport vaporizable solid precursors face technical and operational challenges in terms of reliability, reproducibility, and quality. Summary of the Invention

[0003] Some embodiments relate to a precursor supply package. The precursor supply package may include a container body containing a solid precursor material. The precursor supply package may include a heater configured to heat the container body to a temperature sufficient to generate a gaseous precursor by thermally decomposing the solid precursor material. In some embodiments, the gaseous precursor comprises PF5. The precursor supply package may include an outlet fluidly connected to the container body.

[0004] In some embodiments, the solid precursor material comprises metal hexafluorophosphate.

[0005] In some embodiments, the solid precursor material has the molecular formula MPF6, where M is Li, Na, K, Rb, Cs, or Ag.

[0006] In some embodiments, the solid precursor material comprises at least one of the following: HPF6, LiPF6, NaPF6, KPF6, RbPF6, CsPF6, NH4PF6, AgPF6, Mg(PF6)2, Ca(PF6)2, Ba(PF6)2, Zn(PF6)2, Cu(PF6)2, Pb(PF6)2, Al(PF6)2, Fe(PF6)2, or any combination thereof.

[0007] Some embodiments relate to a precursor delivery system. The precursor delivery system includes a plurality of precursor supply packages. Each of the plurality of precursor supply packages includes: a container body containing solid precursor material; a heater configured to heat the container body to a temperature sufficient to generate a gaseous precursor, wherein the gaseous precursor includes PF5, by thermally decomposing the solid precursor material; and an outlet fluidly connected to the container body. The precursor delivery system further includes a manifold fluidly connected to the plurality of precursor supply packages and an outlet fluidly connected to the manifold.

[0008] In some embodiments, the solid precursor material comprises metal hexafluorophosphate.

[0009] In some embodiments, the solid precursor material has the molecular formula MPF6, where M is Li, Na, K, Rb, Cs, or Ag.

[0010] In some embodiments, the solid precursor material comprises at least one of the following: HPF6, LiPF6, NaPF6, KPF6, RbPF6, CsPF6, NH4PF6, AgPF6, Mg(PF6)2, Ca(PF6)2, Ba(PF6)2, Zn(PF6)2, Cu(PF6)2, Pb(PF6)2, Al(PF6)2, Fe(PF6)2, or any combination thereof.

[0011] In some embodiments, at least one heater is configured to heat at least one container body to a temperature greater than the thermal decomposition temperature of the solid precursor material.

[0012] In some embodiments, at least one heater is configured to maintain at least one container body at a temperature greater than the thermal decomposition temperature of the solid precursor material.

[0013] In some embodiments, the manifold is configured to control the extraction of the gaseous precursor from each of the plurality of precursor supply packages.

[0014] In some embodiments, the precursor delivery system further includes a pressure transducer.

[0015] In some embodiments, a pressure below a set pressure, determined by the pressure transducer, indicates that the solid precursor material contained in the precursor supply package to produce the gaseous precursor has been depleted.

[0016] In some embodiments, the precursor delivery system further includes a pressure regulator valve.

[0017] In some embodiments, the pressure regulator valve is configured to maintain the pressure of the gaseous precursor at or below atmospheric pressure through the outlet.

[0018] Some embodiments relate to a method for supplying a gaseous precursor. The method includes one or more of the following steps: obtaining a first container containing a solid precursor material; heating the first container to a temperature sufficient to cause thermal decomposition of the solid precursor material to produce a gaseous precursor containing PF5; and supplying the gaseous precursor from the first container to a downstream process.

[0019] In some embodiments, the solid precursor material comprises metal hexafluorophosphate.

[0020] In some embodiments, the solid precursor material comprises LiPF6 and the gaseous precursor comprises PF5.

[0021] In some embodiments, the method further includes one or more of the following steps: obtaining a second container containing the solid precursor material; heating the second container concurrently with the first container to a temperature sufficient to cause thermal decomposition of the solid precursor material to produce the gaseous precursor; and supplying the gaseous precursor from the second container to the downstream process before the solid precursor material is exhausted in the first container.

[0022] In some embodiments, the method further includes one or more of the following steps: obtaining a third container containing the solid precursor material; concurrently heating the third container and the second container to a temperature sufficient to cause thermal decomposition of the solid precursor material to produce the gaseous precursor; and supplying the gaseous precursor from the third container to the downstream process before the solid precursor material is exhausted in the second container. Attached Figure Description

[0023] Referring to the drawings, which form part of this disclosure and illustrate embodiments in which the materials and methods described herein can be practiced.

[0024] Figure 1 This is a schematic diagram of a precursor transport system according to some embodiments of the present disclosure.

[0025] Figure 2 This is a schematic diagram of a precursor supply package according to some embodiments of the present disclosure.

[0026] Figure 3 This is a schematic diagram of a precursor transport system according to some embodiments of the present disclosure.

[0027] Figure 4 This is a flowchart of a method for supplying a gaseous precursor according to some embodiments of the present disclosure. Detailed Implementation

[0028] Some embodiments relate to precursor delivery systems, precursor supply packages, and related methods for generating gaseous precursors by thermally decomposing solid precursor materials. The precursor delivery system is used to contain solid precursor materials and generate gaseous precursors for supply to downstream processes. The gaseous precursor is generated by heating the solid precursor material to a temperature sufficient to cause thermal decomposition of the solid precursor material. Without heating, the solid precursor material typically exists in a stable solid state. In this way, the precursor delivery system and precursor supply package disclosed herein can store solid precursor material until a gaseous precursor is needed, and in response to said need, the precursor delivery system can be operated to generate gaseous precursors for supply to downstream processes. When implemented with a monitoring and control system, the precursor delivery system can provide a continuous supply of gaseous precursors to downstream processes.

[0029] Figure 1 This is a schematic diagram of a precursor transport system 100 according to some embodiments of the present disclosure.

[0030] The precursor delivery system 100 includes a system enclosure 102. The system enclosure 102 includes precursor supply packages 104, 106, and 108, each of which may have the same or similar construction. Discharge lines 110, 112, and 114 fluidly connect the respective precursor supply packages 104, 106, and 108 to a manifold 116. The manifold 116 is fluidly connected to an outlet 118 via a delivery line 120. The delivery line 120 includes a pressure transducer 122 for measuring the pressure of the gaseous precursor in the delivery line 120 and a pressure regulator 124 for minimizing or stabilizing pressure fluctuations of the gaseous precursor exiting the precursor delivery system 100 through the outlet 118.

[0031] It should be understood that the number of precursor supply packages may differ from the three precursor supply packages presented in the illustrated embodiments. Generally, without departing from this disclosure, the precursor delivery system 100 may include one or more precursor supply packages. For example, in some embodiments, the number of precursor supply packages may be less than three. In other embodiments, the number of precursor supply packages may be greater than three.

[0032] Precursor supply packages 104, 106, and 108 are capable of containing solid precursor material until a need arises and, in response to this need, generating a gaseous precursor for supply to downstream processes. To generate the gaseous precursor, the precursor supply packages 104, 106, and 108 are configured to heat the solid precursor material to a temperature sufficient to cause thermal decomposition of the solid precursor material. A temperature sufficient to cause thermal decomposition of the solid precursor material includes any temperature at or above the thermal decomposition temperature of the solid precursor material. The thermal decomposition temperature may be the minimum temperature at which the solid precursor material undergoes thermal decomposition. The thermal decomposition temperature may be specific to the solid precursor material and therefore may depend on the solid precursor material used. In some embodiments, the thermal decomposition temperature may also depend on the conditions under which the thermal decomposition process is carried out (e.g., temperature, pressure, etc.). The thermal decomposition of the solid precursor material produces the gaseous precursor. The gaseous precursor includes the thermal decomposition products of the solid precursor material.

[0033] Precursor supply packages 104, 106, and 108 can be configured to operate and be controlled independently of each other. For example, precursor supply packages 104, 106, and 108 can be configured to independently apply heat to solid precursor materials to produce gaseous precursors. After being independently heated, at least one of precursor supply packages 104, 106, and 108 can be maintained at or above its thermal decomposition temperature to produce gaseous precursors, while at least one of precursor supply packages 104, 106, and 108 may not be heated. For example, in some embodiments, gaseous precursors can be produced in precursor supply packages 104 and 106, while no gaseous precursors are produced in precursor supply package 108. Additionally, gaseous precursors can be extracted from precursor supply package 104 instead of precursor supply package 106. The gaseous precursors present in precursor supply package 106 can provide a secondary supply of gaseous precursors in the event of a supply interruption. For example, before the solid precursor material in precursor supply package 104 is completely depleted, the gaseous precursor can be switched to be drawn from precursor supply package 106. Approximately simultaneously, precursor supply package 108 can be heated to restart the secondary supply of gaseous precursor. In this way, precursor delivery system 100 can provide a continuous supply of gaseous precursor to downstream processes.

[0034] Manifold 116 may include one or more inlet ports fluidly connecting manifold 116 to precursor supply packages 104, 106, 108. Manifold 116 may include manifold control for controlling the dispensing of gaseous precursor from each of the precursor supply packages 104, 106, 108. For example, in some embodiments, manifold 116 includes a flow control assembly (e.g., a switching assembly) for switching from dispensing gaseous precursor from at least one of the precursor supply packages 104, 106, 108 to at least one of the other precursor supply packages 104, 106, 108. The flow control assembly may be an automatic flow control assembly responsive to a signal from, for example, a pressure transducer. In some embodiments, the flow control assembly includes a flow path selector. In some embodiments, the flow control assembly includes a pneumatically actuated valve. The flow control assembly may include additional elements. For example, manifold 116 may include instruments, flow control valves, mass flow controllers, any combination thereof, and the like for monitoring process conditions (e.g., pressure, temperature, flow rate, etc.) of the gaseous precursor supplied from the precursor to packages 104, 106, 108.

[0035] The precursor supply packages 104, 106, 108, manifold 116, and other elements and components of the precursor delivery system 100 can be housed within a system enclosure 102. In some embodiments, the system enclosure 102 is a cabinet assembly. The cabinet assembly may include sidewalls 128, a base plate 130, and a roof 132 configured and arranged to form the system enclosure 102. In some embodiments, the cabinet assembly may be equipped with doors or other structural features providing access to the interior of the precursor delivery system 100 or to mounting components. In some embodiments, the cabinet assembly includes one or more securing members, such as (but not limited to) at least one of the following: a buckle; a neck ring; a recess or cavity formed in the base plate of the gas holder for compliantly receiving the precursor supply packages 104, 106, 108; and a guide member or compartment structure that holds the precursor supply packages 104, 106, 108 in a desired position within the internal volume of the cabinet assembly; or any combination thereof. In some embodiments, one or more of the manifold 116, discharge lines 110, 112, 114, delivery line 120, pressure transducer 122, and pressure regulator 124 are mounted in or on the cabinet assembly. In this way, the cabinet assembly can be configured and sized to transport the precursor supply packages 104, 106, 108 from one location to another. It should be understood that the cabinet assembly is illustrative only and other system enclosures may be used herein without departing from this disclosure. In other embodiments, the system enclosure 102 may include any structure capable of housing various components and elements of the precursor delivery system 100.

[0036] After exiting system enclosure 102, the gaseous precursor may be supplied to downstream processes. In some embodiments, the gaseous precursor is delivered and / or discharged to the downstream process at atmospheric pressure or below. The downstream process may include any process utilizing the gaseous precursor. The downstream process may include semiconductor manufacturing processes. In some embodiments, the downstream process includes any one or more of the following processes: ion implantation, epitaxial growth, plasma etching, reactive ion etching, metallization, physical vapor deposition, chemical vapor deposition, plasma deposition, photolithography, cleaning, doping, and the like. In some embodiments, these processes are part of the manufacturing process for semiconductor devices and products, microelectronic devices and products, photovoltaic devices and products, or flat panel display devices and products, and the like. Other processes may be used herein without departing from this disclosure.

[0037] The precursor delivery system 100 may be provided with other arrangements and configurations of additional components. These additional components may include additional flow lines and flow path assemblies, such as (but not limited to) at least one of the following: flow path selector; flow control valve; mass flow controller; pressure regulator; orifice element; thermocouple; monitoring and control devices, such as process gas monitoring instruments for monitoring process conditions (e.g., (but not limited to) pressure, temperature, flow rate, concentration, and the like) of the gaseous precursor dispensed from the precursor supply package; leak detection devices; automatic purification equipment and associated actuators for purging the precursor delivery system or any component thereof when a leak is detected from one or more of the precursor supply packages; heaters for introducing thermal energy into the precursor supply package and its contents; heaters for maintaining the temperature in the discharge and delivery lines; or any combination thereof.

[0038] Figure 2 This is a schematic diagram of a precursor supply package 200 according to some embodiments of the present disclosure.

[0039] The precursor supply package 200 includes a containment body 202. The containment body 202 includes a container 204. The container 204 includes a container body 206 defining an internal volume 208. At least one of a solid precursor material 210, a gaseous precursor 212, or any combination thereof may be disposed within the internal volume 208 of the container body 206. A heater 214 is included to heat the solid precursor material 210 to at least a thermal decomposition temperature. An outlet 216 may be fluidly connected to the container 204. The precursor supply package 200 may be used as one or more of the precursor supply packages 104, 106, and 108 in the precursor delivery system 100.

[0040] Solid precursor material 210 may comprise any substance capable of undergoing thermal decomposition to produce a gaseous precursor. In some embodiments, solid precursor material 210 undergoes thermal decomposition to produce a gaseous precursor comprising phosphorus pentafluoride (PF5). For example, in some embodiments, solid precursor material 210 comprises a hexafluorophosphate precursor. In some embodiments, solid precursor material 210 comprises a metal hexafluorophosphate precursor. In some embodiments, the metal hexafluorophosphate precursor comprises a compound with the molecular formula: MPF6, where M is a metal (e.g., a metal with a suitable valence). In some embodiments, the metal (M) comprises at least one of an alkali metal, a transition metal, or any combination thereof. For example, in some embodiments, the metal (M) may comprise, consist of, or substantially consist of at least one of: Li, Na, K, Rb, Cs, Ag, or any combination thereof. In some embodiments, the metal (M) may be selected from the group consisting of at least one of: Li, Na, K, Rb, Cs, Ag, or any combination thereof. In some embodiments, the solid precursor material 210 may include at least one of, consist of at least one of, or substantially consist of at least one of the following: HPF6, LiPF6, NaPF6, KPF6, RbPF6, CsPF6, NH4PF6, AgPF6, Mg(PF6)2, Ca(PF6)2, Ba(PF6)2, Zn(PF6)2, Cu(PF6)2, Pb(PF6)2, Al(PF6)2, Al(PF6)3, Fe(PF6)2, or any combination thereof. In some embodiments, the solid precursor material 210 may be selected from the group consisting of at least one of the following: HPF6, LiPF6, NaPF6, KPF6, RbPF6, CsPF6, NH4PF6, AgPF6, Mg(PF6)2, Ca(PF6)2, Ba(PF6)2, Zn(PF6)2, Cu(PF6)2, Pb(PF6)2, Al(PF6)2, Fe(PF6)2, or any combination thereof. It should be understood that other gaseous and solid precursor materials may be used herein without departing from this disclosure.

[0041] Container 204 may have any construction and configuration suitable for containing solid precursor material 210 and generating gaseous precursor for supply to downstream processes. In some embodiments, container 204 includes a pressure regulating container. The pressure regulating container includes a valve head assembly 220 in the upper portion of container body 206. Valve head assembly 220 includes a valve 222 fluidly coupled to the internal volume 208 of container body 206 and outlet 216 of container 204. Valve actuator 224 is coupled to valve 222. Valve actuator 224 is configured to translate a valve element between an open position and a closed position or at any position between an open position and a closed position to controllably deliver gaseous precursor 212. In some embodiments, valve actuator 224 includes a handwheel. In some embodiments, valve actuator 224 includes a manual valve actuator (e.g., via a handwheel), an electromagnetically operated valve actuator, a pneumatic valve actuator, or another type of valve actuator as described above, configured to translate a valve element between an open position and a closed position. Pressure regulator 226 is fluidly coupled to valve head assembly 220 and is at least partially housed within internal volume 208 of container body 206. Pressure regulator 226 can be configured to maintain downstream pressure at a set pressure (e.g., set point pressure).

[0042] Without departing from this disclosure, other types of pressure regulating containers and precursor storage and dispensing containers may be used herein. Non-limiting examples of such other containers include (but are not limited to): pressure regulating containers that include an internal pressure regulator, such as (for example) the VAC type, commercially available from Entegris Corporation (Billerica, Massachusetts, USA); pressure regulating containers that include an internal pressure regulator, such as (for example) the VACsorb type, commercially available from Entegris Corporation (Billerica, Massachusetts, USA); and other containers, such as (for example) the ProEvap type, commercially available from Entegris Corporation (Billerica, Massachusetts, USA).

[0043] Heater 214 is configured to apply direct or indirect heat to solid precursor material 210 sufficient to cause thermal decomposition of the solid precursor material to produce gaseous precursor 212. To heat solid precursor material 210, heater 214 may be in thermal communication with at least one of confining body 202, container 204 or container body 206, solid precursor material 210, or any combination thereof. In some embodiments, heater 214 is contained within confining body 202. In some embodiments, heater 214 is external to confining body 202. Heater 214 is not particularly limited as long as it can heat to a desired temperature level, such as the thermal decomposition temperature, and maintain this temperature level accurately and reliably.

[0044] Heating can be performed in any suitable manner. In some embodiments, a heating jacket is used around container 204. In some embodiments, an electric heating tape is wrapped around container 204. In some embodiments, a block heater having a shape covering at least a major portion of the outer surface of container 204 is used to heat container 204. In some embodiments, a resistance heater is used to heat container 204. In some embodiments, a lamp heater is used to heat container 204. In some embodiments, a high-temperature heat transfer fluid may contact the outer surface of container 204 to achieve its heating. In some embodiments, heating is performed by irradiating container 204 with infrared or other radiant energy. It should be understood that other heat input devices and assemblies, as well as other configurations and arrangements of heater 214, may be used herein without departing from the scope of this disclosure. In other embodiments, heater 214 may heat at least one of the enclosure 202, container body 206, solid precursor material 210, or any combination thereof.

[0045] The temperature can be any temperature sufficient to cause the thermal decomposition of the solid precursor material 210 and the formation of the gaseous precursor 212. In some embodiments, the temperature is at least the thermal decomposition temperature of the solid precursor material 210. In some embodiments, the temperature can be a temperature selected to maximize the amount of solid precursor material 210 undergoing thermal decomposition to minimize material waste and / or improve system efficiency. For example, in some embodiments, the temperature is a temperature higher than the thermal decomposition temperature of the solid precursor material 210. Although the thermal decomposition temperature may vary depending on the solid precursor material 210, the solid precursor material 210 can be heated or heated to a temperature that can be from 100°C to 300°C. In some embodiments, the temperature is 100°C to 160°C, 110°C to 160°C, 120°C to 160°C, 130°C to 160°C, 140°C to 160°C, or 145°C to 155°C. In other embodiments, the temperature is 100°C to 190°C, 100°C to 180°C, 100°C to 170°C, 100°C to 160°C, 100°C to 150°C, 100°C to 140°C, 100°C to 130°C, 100°C to 120°C, 100°C to 110°C, 110°C to 200°C, 120°C to 200°C, 130°C to 200°C, 140°C to 200°C, 150°C to 200°C, 160°C to 200°C, 170°C to 200°C, 180°C to 200°C, or 190°C to 200°C.

[0046] Figure 3 This is a schematic diagram of a precursor transport system 300 according to some embodiments of the present disclosure.

[0047] The precursor delivery system 300 includes a monitoring and control system for modulating the flow parameters of the gaseous precursor flowing through the precursor delivery system 300. The monitoring and control system includes a processor assembly 350. The processor assembly 350 is in electronic communication with precursor supply packages 304, 306, 308, manifold 316, pressure transducer 322, and pressure regulator 324. In the schematic diagram of the precursor delivery system 300, dashed lines represent signal transmission lines.

[0048] In addition, the precursor delivery system 300 is similar to the precursor delivery system 100. Precursor supply packages 304, 306, and 308 are housed within the system enclosure 302. Discharge lines 310, 312, and 314 fluidly connect the respective precursor supply packages 304, 306, and 308 to a manifold 316. The manifold 316 is fluidly connected to an outlet 318 via a delivery line 320. The delivery line 320 includes a pressure transducer 322 for measuring the pressure of the gaseous precursor in the delivery line 320. The delivery line 320 further includes a pressure regulator 324 for minimizing or stabilizing pressure fluctuations of the gaseous precursor leaving the precursor delivery system 300 through the outlet 318 to the downstream process.

[0049] As gaseous precursor flows through precursor delivery system 300, pressure transducer 322 measures the pressure of the gaseous precursor flowing through delivery line 320. Pressure transducer 322 may output a pressure sensing signal related to the pressure of the gaseous precursor flowing through delivery line 320. Pressure sensing signal may be transmitted to processor assembly 350 for processing. Various setpoints may be input to processor assembly 350 as comparison thresholds. For example, in some embodiments, a setpoint is a set pressure change (e.g., pressure difference or pressure drop) indicating that the solid precursor material contained in a precursor supply package from which the gaseous precursor is extracted is depleted or nearly depleted. In some embodiments, the setpoint includes a second set pressure change indicating pressure fluctuations (e.g., pressure spikes, oscillating pressure, etc.) in delivery line 320.

[0050] In response to a pressure sensing signal, processor component 350 modulates the flow rate of gaseous precursor through precursor delivery system 300 by transmitting a control signal to at least one of manifold 316, precursor supply packages 304, 306, 308, pressure regulator 324, any combination thereof (e.g., heater, valve actuator, etc.), or any combination thereof. In some embodiments, in response to a control signal from processor component 350, manifold 316 may be configured to switch from extraction of gaseous precursor from one of precursor supply packages 304, 306, 308 to extraction of gaseous precursor from another of precursor supply packages 304, 306, 308. In some embodiments, in response to a control signal from processor component 350, manifold 316 is configured to terminate dispensing operation with respect to precursor supply package 304 and / or initiate dispensing operation with respect to precursor supply package 306.

[0051] In some embodiments, in response to a control signal from processor component 350, at least one of the precursor supply packages 304, 306, 308 is configured to initiate further heating of the solid precursor material contained therein from the gaseous precursor material. In some embodiments, further heating is performed before termination of the dispensing operation to maximize the generation of gaseous precursor from the solid precursor material. In some embodiments, in response to a control signal from processor component 350, one or more of the precursor supply packages 304, 306, 308 are configured to initiate heating to generate or restart a secondary supply of gaseous precursor (e.g., if the supply is interrupted, such as when the solid precursor material is depleted). After heating is initiated, heating may be maintained at a set temperature (e.g., at or above the thermal decomposition temperature of the solid precursor material).

[0052] In some embodiments, in response to a control signal from processor component 350, pressure regulator 324 is configured to optionally open or close in incremental steps to return the pressure in the flow tube to a set pressure. In some embodiments, in response to a control signal from processor component 350, pressure regulator 324 is further configured to maintain the pressure in the flow tube at the set pressure.

[0053] Figure 4 This is a method for supplying gaseous precursors according to some embodiments of the present disclosure. Method 400 can be implemented using any of the precursor supply packages and precursor delivery systems disclosed herein.

[0054] In step 402, the method includes obtaining a plurality of containers, each of which contains a solid precursor material. The plurality of containers may be included in any of the precursor supply packaging and / or precursor delivery systems disclosed herein. In some embodiments, step 402 includes obtaining a first container. In some embodiments, step 402 includes obtaining a first container and a second container. In some embodiments, step 402 includes obtaining a first container, a second container, and a third container. In other embodiments, step 402 may include obtaining more than three containers.

[0055] In step 404, the method includes heating at least one of a plurality of containers to a temperature sufficient to cause thermal decomposition of the solid precursor material to produce a gaseous precursor. In this step, one or more of the plurality of containers (e.g., one or more of a first container, a second container, and a third container) may be heated to a temperature sufficient to cause thermal decomposition of the solid precursor material. Heating may be concurrent or sequential. In some embodiments, heating responds to a measured pressure falling below a set pressure, as determined by a pressure transducer. A pressure below the set pressure may indicate that the gaseous precursor has been depleted or nearly depleted from the solid precursor material in the container from which it is produced. Therefore, in some embodiments, heating includes heating at least one of the plurality of containers to produce a secondary supply of the gaseous precursor (e.g., if the supply is interrupted, etc.). The containers are heated and maintained at temperatures at or above the thermal decomposition temperature of the solid precursor material.

[0056] In step 406, the method includes supplying a gaseous precursor from at least one of a plurality of containers to a process utilizing the gaseous precursor. In some embodiments, step 406 includes supplying the gaseous precursor from a first container until the solid precursor material therein is depleted or nearly depleted. Before the solid precursor material in the first container is depleted, step 406 includes supplying the gaseous precursor from a second container. In some embodiments, supplying the gaseous precursor from the second container includes switching from supplying the gaseous precursor from the first container to supplying the gaseous precursor from the second container. The gaseous precursor may be supplied from the second container until the solid precursor material therein is depleted or nearly depleted. Before the solid precursor material in the second container is depleted, step 406 includes supplying the gaseous precursor from a third container. In some embodiments, supplying the gaseous precursor from the third container includes switching from supplying the gaseous precursor from the second container to supplying the gaseous precursor from the third container.

Claims

1. A precursor conveying system, comprising: Multiple precursor supply packages, each of the multiple precursor supply packages comprising: A container that holds solid precursor materials; A heater configured to heat the container body to a temperature sufficient to generate a gaseous precursor by thermally decomposing the solid precursor material. The gaseous precursors include PF5; and Fluidly connected to the outlet of the container body; A manifold, which is fluidly connected to the plurality of precursor supply packages; Fluidly connected to the outlet of the manifold, and Pressure transducer; The plurality of precursor supply packages are configured to independently apply heat to the solid precursor material to produce the gaseous precursor; and The manifold includes a flow control assembly for switching the extraction of the gaseous precursor from at least one of the plurality of precursor supply packages to at least one of the other plurality of precursor supply packages, wherein the flow control assembly is an automatic flow control assembly responsive to a signal from the pressure transducer.

2. The precursor delivery system according to claim 1, wherein the solid precursor material comprises metal hexafluorophosphate.

3. The precursor delivery system of claim 1, wherein at least one heater is configured to heat at least one container body to a temperature greater than the thermal decomposition temperature of the solid precursor material.

4. The precursor delivery system of claim 1, wherein at least one heater is configured to maintain at least one container at a temperature greater than the thermal decomposition temperature of the solid precursor material.

5. The precursor delivery system of claim 1, wherein the manifold is configured to control the extraction of the gaseous precursor from each of the plurality of precursor supply packages.

6. A method for supplying a gaseous precursor, said method being carried out using the precursor delivery system of any one of claims 1-5, said method comprising: Obtain the first container to hold the solid precursor material; The first container is heated to a temperature sufficient to cause thermal decomposition of the solid precursor material to produce a gaseous precursor including PF5. and The gaseous precursor is supplied from the first container to the downstream process. Obtain a second container to contain the solid precursor material; The second container is heated concurrently with the first container to a temperature sufficient to cause thermal decomposition of the solid precursor material to produce the gaseous precursor including PF5; and Before the solid precursor material is exhausted in the first container, the gaseous precursor is supplied from the second container to the downstream process.

7. The method of claim 6, wherein the solid precursor material comprises metal hexafluorophosphate.

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