Pre-wetting system with air pressure circulation function
Patent Information
- Application Number
- CN202210955078.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2021-09-17
- Filing Date
- 2022-08-10
- Publication Date
- 2026-10-20
- Estimated Expiration
- 2042-08-10
AI Technical Summary
如此该过滤器的使用效率大幅降低,并进一步影响上线使用后的管路洁净度
[0023]本发明提供的浸润系统是一种稳定、可靠、容易维护的系统,其可提升过滤器上线使用后的效率及洁净度,并能充分利用溶剂,以减少成本、提升良率,以及保护环境。
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Figure CN115826361B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to a pre-wetting system for a liquid filter in semiconductor manufacturing processes. Background Technology
[0002] A Resist Filter Pre-Wet Station is a system used for pre-wetting and cleaning photoresist filters. It cleans and wets one or more unused photoresist filters of different specifications by rinsing or circulating organic solvents before use, so as to effectively remove impurities and particles from the filter, thereby improving the cleanliness and efficiency of the photoresist filter when it is put into operation.
[0003] If a light-blocking filter is not thoroughly pre-impregnated before use, there will be unimpregnated portions inside. These unimpregnated portions cannot be cleaned and require a longer time to remove impurities or particles. This significantly reduces the filter's efficiency and further affects the cleanliness of the pipeline after it is put into operation.
[0004] Conversely, if the filter is thoroughly soaked and cleaned before being put into use, the impurities inside the filter can be cleaned in advance, which can also effectively shorten the time for the filter to reach the appropriate operating condition, so that it has the best operating efficiency and cleanliness.
[0005] Taiwanese patent TW311097B discloses a circulating prehumidification system, whose main components include a first container, a pump, a filter, a second container, and a second filter. The first container contains solvent for prehumidifying the filter. The pump delivers the solvent from the first container to the filter, which filters out impurities from the solvent. The second filter to be prehumidified is located in the second container. The filtered solvent is then delivered to the second container to prehumidify the second filter, and then returned to the first container.
[0006] Taiwanese patent TWI384330B discloses a pre-humidification system for a photoresist filter, which includes a storage tank containing photoresist solvent and one or more pumps connected to the storage tank. Each pump delivers the solvent from the storage tank to one or more photoresist filters. Additionally, a control valve is provided on the piping between each pump and each photoresist filter, and a control device is connected to each pump and each control valve.
[0007] Taiwanese patent TWI612999B discloses a light-blocking filter that includes a rectangular pleated filter element, an inlet port, an outlet port, and a ventilation port.
[0008] Taiwan patent TWI642474B discloses a porous polytetrafluoroethylene (PTFE) membrane that can be used to filter photoresist liquids to remove metals from the solution. Summary of the Invention
[0009] This invention relates to a pre-wetting system for a liquid filter in semiconductor manufacturing processes.
[0010] In some embodiments, a pre-impregnation system includes a pipeline system, a storage tank, a filter, a first buffer tank, a second buffer tank, a first gas, a second gas, and a control system. The storage tank contains solvent. The filter is connected to the pipeline system. The first gas is used to deliver the solvent from the storage tank to the filter via the pipeline system. The first buffer tank is connected to the filter via the pipeline system to store the solvent discharged through the filter. The second buffer tank is connected to the filter via the pipeline system to store the solvent discharged through the filter. The second gas drives the solvent in the first buffer tank to flow back to the filter via the pipeline system and then to the second buffer tank, or drives the solvent in the second buffer tank to flow back to the filter via the pipeline system and then to the first buffer tank. The control system determines the path of the solvent.
[0011] Preferably, the first buffer tank and the second buffer tank each include: a solvent inlet for receiving the solvent discharged from the filter; a gas outlet for discharging gas or receiving the second gas; and a solvent outlet for discharging the solvent.
[0012] Preferably, a control valve is further included between the filter and the solvent inlet to control whether the solvent enters the first buffer tank or the second buffer tank.
[0013] Preferably, a control valve is further included between the second gas and the gas port to control the discharge or entry of the second gas from the gas port.
[0014] Preferably, when the second gas drives the solvent in the first buffer tank to flow back to the filter through the pipeline system and then to the second buffer tank, the second gas enters from the gas port of the first buffer tank, and the second gas in the second buffer tank exits from the gas port of the second buffer tank.
[0015] Preferably, when the second gas drives the solvent in the second buffer tank to flow back to the filter through the pipeline system and then to the first buffer tank, the second gas enters through the gas port of the second buffer tank, and the second gas in the first buffer tank exits through the gas port of the first buffer tank.
[0016] Preferably, at least one control valve is included between the filter and the solvent outlet to control whether the solvent is returned to the filter.
[0017] Preferably, the first buffer slot further includes: a high-position sensor connected to the control system; and
[0018] A low-level sensor is connected to the control system; wherein, when the high-level sensor detects that the solvent in the first buffer tank has reached a high level, the second pump outputs gas to discharge the solvent in the first buffer tank and then return it to the filter via the pipeline system before delivering it to the second buffer tank; when the low-level sensor detects that the solvent in the first buffer tank has reached a low level, the second pump outputs gas to discharge the solvent in the second buffer tank and then return it to the filter via the pipeline system before delivering it to the first buffer tank.
[0019] Preferably, the second buffer tank further includes: a high-level sensor connected to the control system; and a low-level sensor connected to the control system; wherein, when the high-level sensor detects that the solvent in the second buffer tank has reached a high level, the second pump outputs gas to discharge the solvent in the second buffer tank and then returns it to the filter via the pipeline system before delivering it to the first buffer tank; when the low-level sensor detects that the solvent in the second buffer tank has reached a low level, the second pump outputs gas to discharge the solvent in the first buffer tank and then returns it to the filter via the pipeline system before delivering it to the second buffer tank.
[0020] Preferably, the first buffer tank and the second buffer tank each include: a high-high level sensor connected to the control system; and a low-low level sensor connected to the control system; when the high-high level sensor detects that the solvent in the first buffer tank or the second buffer tank has reached a high-high level, or when the low-low level sensor detects that the solvent in the first buffer tank or the second buffer tank has reached a low-low level, the pre-wetting system is stopped.
[0021] Preferably, the pipeline system includes a cleaning pipeline, a first circulation loop, and a second circulation loop. The solvent enters the filter through the cleaning pipeline and is discharged through the cleaning pipeline. The cleaning pipeline, together with the first receiving pipeline and the first return pipeline connected to the first buffer tank, constitutes the first circulation loop. The cleaning pipeline, together with the second receiving pipeline and the second return pipeline connected to the second buffer tank, constitutes the second circulation loop.
[0022] In some embodiments, a pre-wetting system includes a piping system, a storage tank, a plurality of filters, a first buffer tank, a second buffer tank, a first gas, a second gas, and a control system. The first gas is used to deliver the solvent in the storage tank to the filters via the piping system. The first buffer tank is connected to each filter via the piping system to store the solvent discharged through each filter. The second buffer tank is connected to each filter via the piping system to store the solvent discharged through each filter. The second gas drives the solvent in the first buffer tank to flow back to each filter via the piping system and then back to the second buffer tank, or drives the solvent in the second buffer tank to flow back to each filter via the piping system and then back to the first buffer tank. The control system determines the path of the solvent.
[0023] The immersion system provided by this invention is a stable, reliable, and easy-to-maintain system that can improve the efficiency and cleanliness of filters after they are put into use, and can make full use of solvents to reduce costs, increase yield, and protect the environment. Attached Figure Description
[0024] Figure 1A and Figure 1B This diagram shows a pre-wetting system according to an embodiment of the present invention.
[0025] Figure 2 This illustrates a pre-wetting system according to a preferred embodiment of the present invention.
[0026] Figure 3 Display according to Figure 2 The operation of filling the first buffer tank in the pre-impregnation system.
[0027] Figure 4 Display according to Figure 2 The operation of filling the second buffer tank in the pre-impregnation system.
[0028] Figure 5 Display according to Figure 2 The pre-wetting system involves recovering the solvent in the first buffer tank and simultaneously filling the second buffer tank.
[0029] Figure 6 Display according to Figure 2 The pre-wetting system involves recovering the solvent in the second buffer tank and simultaneously filling the first buffer tank.
[0030] Figure 7 Display according to Figure 2 The operation of draining the solvent from the first buffer tank to the waste liquid collection area in the pre-wetting system.
[0031] Figure 8 Display according to Figure 2The operation of draining the solvent from the second buffer tank to the waste liquid collection area in the pre-wetting system.
[0032] Figure 9 Display according to Figure 2 Another embodiment of the buffer tank in the pre-impregnation system.
[0033] Figure 10 This illustrates a pre-wetting system according to another preferred embodiment of the present invention.
[0034] [Explanation of Key Component Symbols]
[0035] 1: Pre-impregnation system 2: Pre-impregnation system
[0036] 3: Pre-impregnation system 5: Piping system
[0037] 10: Filter; 20: Storage tank
[0038] 30: Solvent; 40: First gas
[0039] 51: Inlet pipeline 52: Outlet pipeline
[0040] 53: Vent pipe; 54A: First receiving pipe
[0041] 54B: Second receiving line; 55A: First return line
[0042] 55B: Second return line; 56A: First solvent discharge line
[0043] 56B: Second solvent discharge line; 57A: First buffer tank gas line
[0044] 57B: Gas pipeline for the second buffer tank; 58A: Inlet pipeline for the first buffer tank.
[0045] 58B: Second buffer tank inlet pipe; 59A: First buffer tank exhaust pipe.
[0046] 59B: Second buffer tank exhaust pipeline; 61: Control valve
[0047] 62: Control valve 63: Control valve
[0048] 64: Control valve 65: Control valve
[0049] 71A: Control valve 71B: Control valve
[0050] 72A: Control valve 72B: Control valve
[0051] 73A: Control valve 73B: Control valve
[0052] 74A: Control valve 74B: Control valve
[0053] 81: First buffer slot; 82: Second buffer slot
[0054] 90: Second gas; 100: Flow meter
[0055] 101: Entrance 102: Exit
[0056] 103: Vent 811: Solvent Inlet
[0057] 812: Gas outlet; 814: Solvent outlet Detailed Implementation
[0058] The various embodiments of this invention will be described in detail below, with illustrations provided. In addition to these detailed descriptions, the invention can be widely implemented in other embodiments, and any easy substitutions, modifications, or equivalent changes to the described embodiments are included within the scope of this invention and are subject to the following patent claims. In the description of the specification, many specific details are provided to give the reader a more complete understanding of the invention; however, the invention may still be implemented even with some or all of these specific details omitted. Furthermore, well-known procedural steps or elements are not described in the details to avoid unnecessarily limiting the invention.
[0059] Figure 1A and Figure 1B This diagram shows a pre-wetting system according to an embodiment of the present invention. Figure 1A and 1B As shown, storage tank 20 is used to store solvent 30. Furthermore, a first gas 40 (e.g., nitrogen) is supplied into storage tank 20 to drive the solvent 30 within storage tank 20 into pipeline system 5. The required first gas 40 can be supplied by a pump (not shown), such as an N2 positive pressure pump or a DC pump.
[0060] See Figure 1A and Figure 1B The filter 10 to be pre-wetted includes, but is not limited to, an inlet 101, an outlet port 102, and a vent port 103. After being pre-wetted by the pre-wetting system 1, the filter 10 will be used to filter semiconductor process solutions, such as solutions required for semiconductor lithography, etching, cleaning, or other processes, such as photoresist, developer, and anti-reflective coating solutions. The pipeline system 5 has cleaning pipelines for pre-wetting and cleaning the filter 10, which may include, but is not limited to, an inlet pipeline 51, an outlet pipeline 52, and a vent pipeline 53. The inlet pipeline 51 connects the storage tank 20 and the inlet 101 of the filter 10, the outlet pipeline 52 connects the outlet 102 of the filter 10 and the waste liquid collection area (Vent), and the vent pipeline 53 connects the vent port 103 of the filter 10 and the waste liquid collection area (Vent).
[0061] See Figure 1A and Figure 1B Control valves 61, 62, and 63 may be respectively installed on the inlet pipeline 51, outlet pipeline 52, and vent pipeline 53. A control system (not shown) is connected to the control valves 61 / 62 / 63 to control the flow path of the solvent 30. In this embodiment, control valves 61, 62, and 63 are two-port, two-position solenoid valves, but are not limited to this. Furthermore, a flow meter 100 is installed on the inlet pipeline 51. The control system is connected to the flow meter 100 and the pump to adjust the flow rate of the first gas 40 and / or the solvent 30 based on the flow meter's measurement signal and / or other parameters (e.g., pressure).
[0062] See Figure 1A Control valves 61 and 63 are opened by the control system, while control valve 62 is closed. Solvent 30 is transported from storage tank 20 to inlet line 51, enters filter 10 through inlet 101 for cleaning, and then exits through vent 103 of filter 10 to vent line 53, and finally into waste collection area (vent).
[0063] See Figure 1B Control valves 61 and 62 are opened by the control system, while control valve 63 is closed. Solvent 30 is transported from storage tank 20 to inlet line 51, enters filter 10 through inlet 101 for wetting and cleaning, and then exits from outlet 102 of filter 10 to outlet line 52 and waste collection area (vent).
[0064] Because filter 10 requires a period of time to reach a state of complete immersion and cleaning, therefore, Figure 1A and Figure 1B The system shown will consume a lot of solvent in the long run. Furthermore, the solvent used in this system is directly discharged without being recycled, which will increase the cost of waste liquid treatment.
[0065] Figure 2 This illustrates a pre-wetting system 2 according to a preferred embodiment of the present invention. This embodiment uses a single filter 10 as an example, but the number of filters 10 is not limited to a single one. Furthermore, the type of filter 10 is not limited to that shown in the figures and may include other filters with multiple outlets and vents. In one embodiment, the filter does not include vents. In some embodiments, the filter includes filters manufactured by companies such as Entegris and Pall, but is not limited thereto.
[0066] See Figure 2 This embodiment and Figure 1A and Figure 1BThe difference lies in that the pre-wetting system 2 also includes a first buffer tank 81 and a second buffer tank 82. Furthermore, in addition to the original cleaning pipelines (including inlet pipeline 51, outlet pipeline 52, and vent pipeline 53), the pipeline system 5 also includes a first circulation loop and a second circulation loop. In this embodiment, the first circulation loop can be composed of a cleaning pipeline, a first receiving pipeline 54A, and a first return pipeline 55A. The first buffer tank 81 is connected to the filter 10 via the first receiving pipeline 54A to store the solvent 30 discharged through the filter 10, and the stored solvent 30 can be returned to the filter 10 via the first return pipeline 55A.
[0067] See Figure 2 In this embodiment, the second circulation loop may consist of a cleaning pipeline, a second receiving pipeline 54B, and a second return pipeline 55B. The second buffer tank 82 is connected to the filter 10 via the second receiving pipeline 54B to store the solvent 30 discharged through the filter 10, and the stored solvent 30 can be returned to the filter 10 via the second return pipeline 55B.
[0068] See Figure 2 In addition, a second gas 90 (e.g., nitrogen) is provided to drive the solvent 30 in the first buffer tank 81 or the second buffer tank 82. The required second gas 90 can be provided by the same pump described above or by using another pump (not shown), such as an N2 positive pressure pump or a DC pump.
[0069] See Figure 2 The first buffer tank 81 and the second buffer tank 82 may each have a solvent inlet 811, a gas outlet 812, and a solvent outlet 814. A first receiving line 54A or a second receiving line 54B is connected to the solvent inlet 811, and a first return line 55A or a second return line 55B is connected to the solvent outlet 814. The second gas 90 enters or exits the first buffer tank 81 or the second buffer tank 82 through the gas outlet 812.
[0070] See Figure 2The pre-impregnation system 2 may further include a first buffer tank gas pipeline 57A, a first buffer tank inlet pipeline 58A, a first buffer tank exhaust pipeline 59A, and a control valve 73A. The first buffer tank gas pipeline 57A is connected to the gas port 812 of the first buffer tank 81. Furthermore, the first buffer tank gas pipeline 57A, the first buffer tank inlet pipeline 58A, and the first buffer tank exhaust pipeline 59A are connected to the control valve 73A. The control valve 73A controls the path, allowing the second gas 90 to enter the first buffer tank 81 via the first buffer tank inlet pipeline 58A and the first buffer tank gas pipeline 57A; or, the second gas 90 is discharged to the exhaust gas system (Exh) via the first buffer tank gas pipeline 57A and the first buffer tank exhaust pipeline 59A. In this embodiment, the control valve 73A is a three-port, two-position solenoid valve, but it is not limited to this.
[0071] See Figure 2 The pre-impregnation system 2 may further include a second buffer tank gas pipeline 57B, a second buffer tank inlet pipeline 58B, a second buffer tank exhaust pipeline 59B, and a control valve 73B. The second buffer tank gas pipeline 57B is connected to the gas port 812 of the second buffer tank 82. Furthermore, the second buffer tank gas pipeline 57B, the second buffer tank inlet pipeline 58B, and the second buffer tank exhaust pipeline 59B are connected to the control valve 73B. The control valve 73B controls the path, allowing the second gas 90 to enter the second buffer tank 82 via the second buffer tank inlet pipeline 58B and the second buffer tank gas pipeline 57B; or, the second gas 90 is discharged to the exhaust gas system (Exh) via the second buffer tank gas pipeline 57B and the second buffer tank exhaust pipeline 59B. In this embodiment, the control valve 73B is a three-port, two-position solenoid valve, but it is not limited to this.
[0072] See Figure 2 The first receiving line 54A may include a control valve 71A to control whether the solvent 30 flows into the first buffer tank 81, and the second receiving line 54B may include a control valve 71B to control whether the solvent 30 flows into the second buffer tank 82. In this embodiment, the control valves 71A and 71B are two-port, two-position solenoid valves, but are not limited to this.
[0073] See Figure 2 The first return line 55A may include a control valve 72A to control whether solvent 30 passes through the control valve 72A, and the second return line 55B may include a control valve 72B to control whether solvent 30 passes through the control valve 72B. In this embodiment, the control valves 72A and 72B are two-port, two-position solenoid valves, but are not limited to this.
[0074] See Figure 2The pre-impregnation system 2 may further include a first solvent discharge line 56A and a second solvent discharge line 56B. The first buffer tank 81 can discharge solvent through the first solvent discharge line 56A, and the second buffer tank 82 can discharge solvent through the second solvent discharge line 56B. Furthermore, the first solvent discharge line 56A may also have a control valve 74A to control whether the solvent 30 passes through the control valve 74A, and the second solvent discharge line 56B may also have a control valve 74B to control whether the solvent 30 passes through the control valve 74B. In this embodiment, the control valves 74A and 74B are two-port, two-position solenoid valves, but this is not a limitation.
[0075] See Figure 2 A control valve 64 may be provided at the junction of the first receiving line 54A and the second receiving line 54B, and a control valve 65 may be provided at the junction of the first return line 55A and the second return line 55A. Control valves 64 and 65 are used to control whether solvent is allowed to pass through. In this embodiment, control valves 64 and 65 are two-port, two-position solenoid valves, but are not limited to this.
[0076] according to Figure 2 The pneumatic circulation pre-impregnation system can perform pre-impregnation and cleaning operations, and can also simultaneously utilize two buffer tanks to alternately recover and reuse the solvent. Details are as follows:
[0077] (1) Cleaning the filter vent path
[0078] See Figure 2 Control valves 61 and 63 are opened, while the remaining control valves are closed or do not operate. Solvent 30 is transported from storage tank 20 to inlet line 51, enters filter 10 through inlet 101 for wetting and cleaning, and then is discharged from vent 103 of filter 10 to vent line 53, and finally discharged into waste liquid collection area (vent).
[0079] (2) Pre-wetting / cleaning of filter outlet path
[0080] See Figure 2 Control valves 61 and 62 are open, while the remaining control valves are closed or inactive. Solvent 30 enters filter 10 through inlet 101 for wetting and cleaning, and then exits through outlet 102 to outlet pipeline 52 and waste collection area (vent). Typically, the filter outlet path is the primary pre-wetting and cleaning path, while the filter vent path is the secondary cleaning path.
[0081] (3) Fill the first buffer groove
[0082] Figure 3 Display according to Figure 2 The operation of filling the first buffer tank 81 in the pre-impregnation system. See [link / reference]. Figure 3 Control valves 61, 64, and 71A are opened; control valve 73A is switched to connect to the first buffer tank exhaust line 59A, and the remaining control valves are closed or do not operate. After solvent 30 pre-wets filter 10, it enters the first buffer tank 81, and the gas in the first buffer tank 81 is discharged through the first buffer tank exhaust line 59A.
[0083] (4) Fill the second buffer groove
[0084] Figure 4 Display according to Figure 2 The procedure for filling the second buffer tank 82 in the pre-impregnation system. See [link / reference]. Figure 4 Control valves 61, 64, and 71B are opened; control valve 73B is switched to connect to the exhaust line 59B of the second buffer tank; the remaining control valves are closed or do not operate. After solvent 30 pre-wets filter 10, it enters the second buffer tank 82, and the gas in the second buffer tank 82 is discharged through the exhaust line 59B of the second buffer tank.
[0085] (5) Recover the solvent in the first buffer tank 81 and simultaneously fill the second buffer tank 82.
[0086] Figure 5 Display according to Figure 2 The pre-wetting system involves recovering the solvent in the first buffer tank 81 and simultaneously filling the second buffer tank 82. See [link to documentation]. Figure 5 Control valves 64, 65, 71B, and 72A are opened. Control valve 73A is switched to connect to the first buffer tank inlet line 58A, and control valve 73B is switched to connect to the second buffer tank exhaust line 59B. The remaining control valves are closed. This allows the second gas 90 to drive the solvent in the first buffer tank 81 back to the filter 10 via the first return line 55A. After the solvent 30 pre-wets the filter 10, it enters the second buffer tank 82, and the gas in the second buffer tank 82 is discharged via the second buffer tank exhaust line 59B.
[0087] (6) Recover the solvent in the second buffer tank 82 and simultaneously fill the first buffer tank 81.
[0088] Figure 6 Display according to Figure 2 The pre-wetting system involves recovering the solvent in the second buffer tank 82 and simultaneously filling the first buffer tank 81. See [link to documentation]. Figure 6Control valves 64, 65, 71A, and 72B are opened. Control valve 73A is switched to connect to the first buffer tank exhaust line 59A, and control valve 73B is switched to connect to the second buffer tank inlet line 58B. The remaining control valves are closed. This allows the second gas 90 to drive the solvent in the second buffer tank 82 back to the filter 10 via the second return line 55B. After the solvent 30 pre-wets the filter 10, it enters the first buffer tank 81, and the gas in the first buffer tank 81 is discharged through the first buffer tank exhaust line 59A.
[0089] (7) Drain the solvent in the first buffer tank 81 to the waste liquid collection area.
[0090] Figure 7 Display according to Figure 2 The operation of draining the solvent from the first buffer tank 81 to the waste collection area (vent) in the pre-wetting system. See also Figure 7 Control valve 74A is opened, and control valve 73A is switched to connect to the first buffer tank inlet pipeline 58A. The remaining control valves are closed or do not operate. The second gas 90 drives the solvent in the first buffer tank 81, causing it to be transported to the waste liquid collection area (vent) through the first solvent discharge pipeline 56A.
[0091] (8) Drain the solvent in the second buffer tank to the waste liquid collection area.
[0092] Figure 8 Display according to Figure 2 The procedure for draining the solvent from the second buffer tank 82 into the waste collection area in the pre-wetting system. See [link / reference]. Figure 8 Control valve 74B opens, and control valve 73B switches to connect to the second buffer tank inlet pipeline 58B. The remaining control valves are closed or do not operate. The second gas 90 drives the solvent in the second buffer tank 82, causing it to be transported to the waste liquid collection area (vent) through the second solvent discharge pipeline 56B.
[0093] See Figure 7 and Figure 8 The pre-wetting system 2 may include a sampling point. Figure 10 To monitor the quality of solvent 30.
[0094] In one embodiment, the control system includes a programmable logic controller (PLC) and a human-machine interface (HMI). The user can select the desired operation and number of operations on the HMI as needed. This can be a single operation or a combination of multiple operations. Typically, operations (5) and (6) are performed alternately and can be executed automatically.
[0095] See Figure 5The first buffer tank 81 may include a high-level sensor 120 and a low-level sensor 110, which are respectively connected to the control system and used to detect whether the solvent level in the first buffer tank has reached the high level (H) and the low level (L). When the high-level sensor 120 detects that the solvent in the first buffer tank 81 has reached the high level (H), the second gas 90 drives the solvent in the first buffer tank 81 to flow back to the filter 10 through the pipeline system and then to be transported to the second buffer tank 82, which is equivalent to the operation described above (5). When the low-level sensor 110 detects that the solvent in the first buffer tank 81 has reached the low level (L), the second gas 90 drives the solvent in the second buffer tank 82 to flow back to the filter 10 through the pipeline system and then to be transported to the first buffer tank 81, which is equivalent to the operation described above (6).
[0096] See Figure 6 The second buffer tank 82 may also include a high-level sensor 120 and a low-level sensor 110, which are respectively connected to the control system and used to detect whether the solvent level in the second buffer tank 82 has reached the high level (H) and the low level (L). When the high-level sensor 120 detects that the solvent in the second buffer tank 82 has reached the high level (H), the second gas 90 drives the solvent in the second buffer tank 82 to flow back to the filter 10 through the pipeline system and then to be transported to the first buffer tank 81, which is equivalent to the operation described above (6). When the low-level sensor 110 detects that the solvent in the second buffer tank 82 has reached the low level (L), the second gas 90 drives the solvent in the first buffer tank 81 to flow back to the filter 10 through the pipeline system and then to be transported to the second buffer tank 82, which is equivalent to the operation described above (5).
[0097] Figure 9 for Figure 2 A magnified view of a portion of the system. See also... Figure 9 In another embodiment, the first buffer tank 81 and the second buffer tank 82 may further include a high-high level sensor 122 and a low-low level sensor 112, which are used to detect whether the solvent level in the first buffer tank 81 and the second buffer tank 82 has reached a high-high level (HH) and a low-low level (LL), respectively. The "high-high level" refers to a level higher than the "high level," and the "low-low level" refers to a level lower than the "low level." When the high-high level sensor 122 detects that the solvent in the first buffer tank 81 or the second buffer tank 82 has reached the high-high level, or when the low-low level sensor 112 detects that the solvent in the first buffer tank 81 or the second buffer tank 82 has reached the low-low level, the control system stops the pre-wetting system. If the high-level sensor 120 or the low-level sensor 110 malfunctions or malfunctions, causing overflow or over-drainage in the circuit, bubbles may form in the pipeline. Setting up a high-high sensor 122 and a low-low sensor 112 can avoid this situation, thereby improving the safety and reliability of the entire system.
[0098] Figures 2 to 8 The pre-impregnation system 2 shown is an example of a single filter paired with two buffer tanks. In some embodiments, multiple filters of the same or different specifications may also be paired with two buffer tanks. Figure 10 This invention illustrates a pre-wetting system 3 according to an embodiment of the present invention, wherein a plurality of filters 10 share a first buffer tank 81 and a second buffer tank 82. Each filter 10 corresponds to a set of cleaning lines, such as, but not limited to, an inlet line 51, an outlet line 52, and a vent line 53. In some embodiments, the number of filters 10 is 2 to 6. The cleaning line of each filter 10, together with the first receiving line 54A and the first return line 55A connected to the first buffer tank 81, forms a first circulation loop, and the cleaning line of each filter 10, together with the second receiving line 54B and the second return line 55B connected to the second buffer tank 82, forms a second circulation loop. The operation of this pre-wetting system 3 is similar to that of the previous system and will not be described again.
[0099] For the sake of simplicity in the illustrations, some minor components have been omitted from the pre-impregnation systems 2 and 3 in the above embodiments. Furthermore, auxiliary components or modules may be added to the pre-impregnation systems 2 or 3 according to user requirements.
[0100] The above embodiments of the present invention are merely for illustrating the technical ideas and features of the present invention. Their purpose is to enable those skilled in the art to understand the content of the present invention and implement it accordingly. They should not be used to limit the patent scope of the present invention. All other equivalent changes or modifications made without departing from the spirit disclosed in the present invention are covered within the scope disclosed in the present invention and should be included within the scope of the claims of this patent application.
Claims
1. A pre-impregnation system with pneumatic circulation function, characterized in that, Include: Piping system; Storage tank containing solvent; Filter, connected to the pipeline system; A first gas is used to transport the solvent in the storage tank to the filter via the pipeline system; The first buffer tank is connected to the filter via the pipeline system to store the solvent discharged through the filter; The second buffer tank is connected to the filter through the pipeline system to store the solvent discharged through the filter; A second gas drives the solvent in the first buffer tank to flow back to the filter via the pipeline system and then to the second buffer tank; or, drives the solvent in the second buffer tank to flow back to the filter via the pipeline system and then to the first buffer tank. A control system is used to determine the path of the solvent, wherein: The first buffer slot also includes: The first high-position sensor is connected to the control system; and The first low-position sensor is connected to the control system; Specifically, when the first high-level sensor detects that the solvent in the first buffer tank has reached a high level, the second gas drives the solvent in the first buffer tank to flow back to the filter through the pipeline system and then be transported to the second buffer tank. When the first low-level sensor detects that the solvent in the first buffer tank has reached a low level, the second gas drives the solvent in the second buffer tank to flow back to the filter through the pipeline system and then be transported to the first buffer tank. The second buffer slot also includes: A second high-position sensor is connected to the control system; and The second low-position sensor is connected to the control system; Specifically, when the second high-level sensor detects that the solvent in the second buffer tank has reached a high level, the second gas drives the solvent in the second buffer tank to flow back to the filter through the pipeline system and then to the first buffer tank. When the second low-level sensor detects that the solvent in the second buffer tank has reached a low level, the second gas drives the solvent in the first buffer tank to flow back to the filter through the pipeline system and then to the second buffer tank.
2. The pre-wetting system according to claim 1, characterized in that, The first buffer slot and the second buffer slot each include: Solvent inlet, used to receive the solvent discharged from the filter; A gas port for discharging or receiving the second gas; and Solvent outlet, used to discharge the solvent.
3. The pre-wetting system according to claim 2, characterized in that, A control valve is further included between the filter and the solvent inlet to control whether the solvent enters the first buffer tank or the second buffer tank.
4. The pre-wetting system according to claim 2, characterized in that, A control valve is further included between the second gas and the gas port to control the discharge or entry of the second gas from the gas port.
5. The pre-wetting system according to claim 4, characterized in that, When the second gas drives the solvent in the first buffer tank to flow back to the filter through the pipeline system and then to the second buffer tank, the second gas enters from the gas port of the first buffer tank, and the second gas in the second buffer tank exits from the gas port of the second buffer tank.
6. The pre-wetting system according to claim 4, characterized in that, When the second gas drives the solvent in the second buffer tank to flow back to the filter through the pipeline system and then to the first buffer tank, the second gas enters through the gas port of the second buffer tank, and the second gas in the first buffer tank exits through the gas port of the first buffer tank.
7. The pre-wetting system according to claim 2, characterized in that, At least one control valve is included between the filter and the solvent outlet to control whether the solvent is returned to the filter.
8. The pre-wetting system according to claim 1, characterized in that, The first buffer slot and the second buffer slot each include: High-position sensor, connected to the control system; and Low-level sensor connected to the control system; When the high-high level sensor detects that the solvent in the first buffer tank or the second buffer tank has reached a high-high level, or when the low-low level sensor detects that the solvent in the first buffer tank or the second buffer tank has reached a low-low level, the pre-wetting system is stopped.
9. The pre-wetting system according to claim 1, characterized in that, The pipeline system includes a cleaning pipeline, a first circulation loop, and a second circulation loop. The solvent enters the filter through the cleaning pipeline and is discharged through the cleaning pipeline. The cleaning pipeline, together with the first receiving pipeline and the first return pipeline connected to the first buffer tank, constitutes the first circulation loop. The cleaning pipeline, together with the second receiving pipeline and the second return pipeline connected to the second buffer tank, constitutes the second circulation loop.
10. A pre-impregnation system with pneumatic circulation function, characterized in that, Include: Piping system; Storage tank containing solvent; Multiple filters are connected to the pipeline system; A first gas is used to deliver the solvent in the storage tank to each of the filters via the pipeline system; A first buffer tank, connected to each of the filters via the pipeline system, is used to store the solvent discharged through each of the filters; The second buffer tank is connected to each of the filters through the pipeline system to store the solvent discharged through each of the filters; A second gas drives the solvent in the first buffer tank to flow back through the pipeline system to each of the filters and then to the second buffer tank; or, drives the solvent in the second buffer tank to flow back through the pipeline system to each of the filters and then to the first buffer tank; and A control system is used to determine the path of the solvent, wherein: The first buffer slot also includes: The first high-position sensor is connected to the control system; and The first low-position sensor is connected to the control system; Specifically, when the first high-level sensor detects that the solvent in the first buffer tank has reached a high level, the second gas drives the solvent in the first buffer tank to flow back to the filter through the pipeline system and then be transported to the second buffer tank. When the first low-level sensor detects that the solvent in the first buffer tank has reached a low level, the second gas drives the solvent in the second buffer tank to flow back to the filter through the pipeline system and then be transported to the first buffer tank. The second buffer slot also includes: A second high-position sensor is connected to the control system; and The second low-position sensor is connected to the control system; Specifically, when the second high-level sensor detects that the solvent in the second buffer tank has reached a high level, the second gas drives the solvent in the second buffer tank to flow back to the filter through the pipeline system and then to the first buffer tank. When the second low-level sensor detects that the solvent in the second buffer tank has reached a low level, the second gas drives the solvent in the first buffer tank to flow back to the filter through the pipeline system and then to the second buffer tank.
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