Exposure machine

By incorporating an energy conversion component and a baking module into the exposure machine, the problem of the existing exposure machine lacking a baking function was solved, enabling post-baking treatment of glass substrates, reducing modification costs and improving production efficiency.

CN115857288BActive Publication Date: 2026-06-23SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF 1 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
Filing Date
2022-12-29
Publication Date
2026-06-23

AI Technical Summary

Technical Problem

The existing exposure machines in the G4.5 generation line do not have a baking function and cannot perform post-baking treatment on the glass substrate.

Method used

An energy conversion device and/or a baking module are set in the exposure machine. The energy conversion device is used to convert the light waves emitted by the light source into a first electromagnetic wave, and the baking module is used to emit a second electromagnetic wave. The glass substrate is baked by controlling the wavelength range of the electromagnetic waves.

Benefits of technology

This technology enables the post-baking process of glass substrates within the exposure machine, removing solvents through infrared or microwave radiation, ensuring the baking function of the glass substrates, and reducing modification and production costs.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN115857288B_ABST
    Figure CN115857288B_ABST
Patent Text Reader

Abstract

The application discloses an exposure machine, which has a bearing table, a light source and a projection system, and is further provided with an energy conversion piece, which is used for receiving light waves emitted by the light source and converting the light waves into first electromagnetic waves before the light waves enter the projection system, the wavelength of the first electromagnetic waves being greater than 760 nm and less than 1000 nm; and / or the exposure machine is further provided with a baking module, which is used for emitting second electromagnetic waves towards the bearing table, the wavelength of the second electromagnetic waves being greater than 760 nm and less than 1000 nm, or the wavelength of the second electromagnetic waves being greater than 1 mm and less than 1 m. The first electromagnetic waves and the second electromagnetic waves can be used for baking a glass substrate. The exposure machine has the baking function for the glass substrate by arranging the energy conversion piece or the baking module in the exposure machine, so that the glass substrate can be subjected to a post-baking process in the exposure machine.
Need to check novelty before this filing date? Find Prior Art