环境γ本底模型及其构建方法及预测γ本底水平的方法

By constructing an environmental gamma background model and using Monte Carlo simulation software to set gamma source terms, the problem of accuracy in predicting gamma background levels inside shielded rooms was solved, enabling rapid and accurate prediction of gamma background levels and improving the sensitivity of the detection system.

CN115906649BActive Publication Date: 2026-07-17BEIJING NORMAL UNIVERSITY

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
BEIJING NORMAL UNIVERSITY
Filing Date
2022-12-01
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing technologies struggle to accurately predict the background gamma level within shielded rooms, impacting the sensitivity of detection systems.

Method used

By constructing an environmental gamma background model, using Monte Carlo simulation software to set gamma source terms, simulating the distribution thickness of gamma rays in a closed shell, and combining the gamma ray method to reconstruct source term information, the gamma background level inside the shield can be accurately predicted.

Benefits of technology

This enables rapid and accurate prediction of the gamma background level within the shielded enclosure, improving the sensitivity of the detection system and the rationality of the shielded enclosure design.

✦ Generated by Eureka AI based on patent content.

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Abstract

本申请涉及一种环境γ本底模型的构建方法、环境γ本底模型、预测由环境γ辐射造成的屏蔽体内γ本底水平的方法。环境γ本底模型的构建方法包括:获得环境γ本底谱;设置γ射线探测器位置;在γ射线探测器位置外围设置封闭壳体基准位置;基于环境γ本底谱将环境γ本底的γ源项模拟为分布在具有分布厚度的封闭壳体中。通过本申请的用于构建环境γ本底模型的技术方案,通过在蒙特卡洛或其他类似模拟软件中设置环境γ本底模型源项,可以相较于传统技术更为准确地预测由环境γ辐射造成的预建造的屏蔽室或屏蔽体内γ本底的水平。
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