Substrate processing apparatus

Abstract

The present invention provides a substrate processing apparatus capable of efficiently processing a conveyed substrate without damaging the substrate. The substrate processing apparatus is configured to have a conveying roller (12 (10)) that conveys a substrate (W) after liquid processing, an auxiliary roller (21 (20)) that is provided between a guide inlet (121) of the substrate (W) and the conveying roller (12 (10)) and guides the substrate to the conveying roller, and a detector (30) that irradiates a light beam to a conveying path of the substrate (W) to detect the substrate (W), the auxiliary roller (21) being provided with a liquid removing portion (25) that contacts a surface of the conveyed substrate and removes a liquid component of the substrate, the detector (30) being configured to irradiate the light beam to a portion of the substrate (W) from which the liquid component has been removed by the liquid removing portion (25) of the auxiliary roller (21) on a downstream side of the substrate (W) in a conveying direction of the substrate (W).

Description

Technical Field

[0001] Embodiments of the present invention relate to a substrate processing apparatus for processing the surface of a transported substrate. Background Technology

[0002] In a substrate processing apparatus, substrates such as glass substrates or semiconductor wafers for liquid crystal display devices are transported by a roller conveyor, and a processing liquid (etching solution, cleaning solution, etc.) is supplied to the surface of the transported substrate to process the surface of the substrate (wet processing). In this substrate processing apparatus, a substrate detector is used to detect whether a substrate is being transported by the roller conveyor at a specified transport position.

[0003] As an example of a substrate detector, there is a oscillator-type sensor. The oscillator of this sensor oscillates around an axis. The front end of the oscillator is pressed by the front end of the conveyed substrate, causing it to oscillate around the axis as a fulcrum, thus tilting the oscillator. Furthermore, when the rear end of the conveyed substrate disengages from the front end of the oscillator, the oscillator returns to its original state. Based on the sensor output, which changes as the oscillator moves, the placement position (predefined conveying position) of the substrate through the oscillator-type sensor can be detected.

[0004] Patent Document 1: Japanese Patent Application Publication No. 2016-58411

[0005] However, such oscillator-type sensors detect the passage of the conveyed substrate through the mechanical movement (oscillation) of the oscillator body. Therefore, the mechanical movement of the oscillator body may become sluggish, resulting in the oscillator body failing to return to its original position even if the rear end of the substrate detaches. To maintain the oscillator-type sensor in a normal state and prevent this situation, the maintenance frequency must be increased. However, increasing the maintenance frequency in this way will impair the efficient handling of the substrate.

[0006] Therefore, it is considered that a light sensor (reflective or transmissive type) should be used as a substrate detector, without the aforementioned mechanical movements, thus avoiding the drawbacks caused by such mechanical movements. If this light sensor is positioned opposite the lower surface of the substrate being processed, there is a possibility that liquid components dripping from the lower surface of the substrate after treatment with the processing liquid may adhere to the light sensor, causing the substrate to malfunction. Furthermore, there is a possibility that liquid components adhering to the surface (lower surface) of the substrate may cause false detection of the substrate. Thus, when the light sensor malfunctions or falsely detects the substrate, it will cause problems for the normal processing of the substrate. Summary of the Invention

[0007] The present invention was made in view of the following situation, and provides a substrate processing apparatus that can efficiently process a transported substrate without damaging the substrate.

[0008] The substrate processing apparatus of the present invention is configured to process a substrate after liquid treatment while conveying it via a conveyor roller. The substrate processing apparatus includes: a conveyor roller for conveying the substrate; an auxiliary roller disposed between the inlet and the conveyor roller for guiding the substrate toward the conveyor roller; and a detector that irradiates a light beam onto the substrate in the conveying path to detect the substrate. The auxiliary roller has a liquid removal section that contacts the surface of the conveyed substrate to remove liquid components from the substrate. The detector is configured to irradiate the portion of the auxiliary roller downstream of the substrate in the conveying direction with the light beam after the liquid components have been removed by the liquid removal section.

[0009] According to this structure, a substrate treated with liquid, introduced through the inlet, is sequentially supported by auxiliary rollers and guided towards a conveyor roller, starting from its front end, and then conveyed by the conveyor roller. As the substrate passes through the auxiliary rollers, the liquid components adhering to the substrate and in contact with the liquid removal section of the auxiliary rollers are removed by the liquid removal section. Furthermore, a light beam is irradiated from a photosensor on the downstream side of the substrate conveyed in the conveying direction, opposite the portion of the conveyed substrate where the liquid components have been removed by the liquid removal section.

[0010] In another embodiment of the present invention, a substrate processing apparatus is configured such that a conveying roller is provided between an inlet and a outlet, and a substrate introduced from the inlet is reciprocated between the inlet and the outlet by the conveying roller while being processed by liquid, and then discharged from the outlet. This substrate processing apparatus includes: a first detector disposed between the inlet and the conveying roller, which detects the substrate by irradiating a light beam into the transport path of the substrate; a second detector disposed between the outlet and the conveying roller, which also detects the substrate by irradiating a light beam into the transport path of the substrate; and a first auxiliary roller unit, which consists of the first detector sandwiched between the inlet and the conveying roller in the transport direction of the substrate. The system comprises a plurality of auxiliary rollers arranged in a manner described above; and a second auxiliary roller unit, which comprises a plurality of auxiliary rollers arranged between the feed outlet and the conveying roller in such a manner that the second detector is sandwiched in the conveying direction of the substrate. The auxiliary rollers constituting the first auxiliary roller unit and the second auxiliary roller unit respectively have a liquid removal section that contacts the surface of the conveyed substrate to remove liquid components from the substrate. The first detector is configured to irradiate the portion of the substrate after the liquid components have been removed by the liquid removal section of the auxiliary roller constituting the first auxiliary roller unit with the light beam, and the second detector is configured to irradiate the portion of the substrate after the liquid components have been removed by the liquid removal section of the auxiliary roller constituting the second auxiliary roller unit with the light beam.

[0011] According to an embodiment of the substrate processing apparatus of the present invention, the detector for irradiating the light beam is positioned opposite to the portion of the conveyed substrate after the liquid components have been removed by the dehydration section of the auxiliary roller. This prevents liquid components from dripping from the substrate onto the detector and also prevents erroneous detections by the detector due to liquid components adhering to the substrate. As a result, the conveyed substrate can be processed normally without compromising its efficiency. Attached Figure Description

[0012] Figure 1 This is a perspective view showing the basic structure of the substrate processing apparatus according to the first embodiment of the present invention.

[0013] Figure 2 This is a side view showing the basic structure of the substrate processing apparatus according to the first embodiment of the present invention.

[0014] Figure 3 This is a front view showing a structural example of the outer roller body of the auxiliary roller of the substrate processing apparatus according to the first embodiment of the present invention.

[0015] Figure 4 This is a side view showing an example of the structure of the outer roller body of the auxiliary roller of the substrate processing apparatus according to the first embodiment of the present invention.

[0016] Figure 5 This is a perspective view of a substrate processing apparatus according to the first embodiment of the present invention, showing a substrate being moved in from the loading port.

[0017] Figure 6 This is a perspective view showing another example of an auxiliary roller used in a substrate processing apparatus according to the first embodiment of the present invention.

[0018] Figure 7 This is a side view showing the substrate processing apparatus according to the second embodiment of the present invention.

[0019] Label Explanation

[0020] 10: Conveyor roller assembly; 11: Rotating shaft; 12: Roller; 20: Auxiliary roller unit; 21: Auxiliary roller; 21a: Auxiliary roller shaft; 21b: Outer roller body; 22: Support block; 24a, 24b: Semi-ring blocks; 25: Liquid removal section; 26a, 26b: Bolts; 30: Photosensor; 40: Auxiliary roller; 41: Roller body; 42: Liquid removal section; 50: Conveyor roller; 60: Conveyor roller assembly; 71, 72: Processing liquid discharge section. Detailed Implementation

[0021] Embodiments of the present invention will be described using the accompanying drawings.

[0022] The substrate processing apparatus of the first embodiment of the present invention is as follows: Figure 1 and Figure 2 It is constructed as shown. Additionally... Figure 1 This is a perspective view showing the basic structure of the substrate processing apparatus. Figure 2 This is a side view showing the basic structure of the substrate processing apparatus.

[0023] exist Figure 1 and Figure 2 In this substrate processing apparatus, a processing chamber 100 is continuous with a pre-processing chamber 200. The pre-processing chamber 200 uses a processing liquid (e.g., a cleaning liquid) to process the surface of a substrate W (e.g., a glass substrate) (cleaning process). The pre-processing chamber 200 and the processing chamber 100 are separated by a partition wall 120. The partition wall 120 has an inlet 121. The substrate W, which has been treated with the processing liquid in the pre-processing chamber 200, is conveyed by a conveying roller 50 and introduced into the processing chamber 100 through the inlet 121. The processing chamber 100 is equipped with a conveying mechanism comprising multiple rollers. The substrate W, introduced into the processing chamber 100 through the inlet 121, is conveyed by the conveying mechanism (multiple rollers). Furthermore, the substrate W is dried while being conveyed within the processing chamber 100. Alternatively, a wet processing method using a processing liquid can be performed instead of a drying process.

[0024] The conveying mechanism for conveying the substrate W in the processing chamber 100 includes: a conveying roller assembly 10, which is composed of multiple rollers; and an auxiliary roller unit 20 (auxiliary roller 21), which guides the substrate W introduced from the inlet 121 toward the conveying roller assembly 10. The conveying roller assembly 10 is structured such that multiple rollers are mounted at predetermined intervals on multiple rotating shafts 11. Figure 1 There are three rollers 12 in the middle. The plurality of rotating shafts 11 are arranged at predetermined intervals along the conveying direction D of the substrate W and extend horizontally perpendicular to the conveying direction D. The rotating shafts 11 are connected to a drive source (not shown), and the rollers 12 rotate when the rotating shafts 11 rotate. The auxiliary roller unit 20 has the following structure: a plurality of rollers (in the middle) are rotatably supported by support blocks 22. Figure 1 (There are four) auxiliary rollers 21 arranged at specified intervals along a horizontal direction perpendicular to the conveying direction D of the substrate W.

[0025] Due to the presence of the partition wall 120 separating the pre-processing chamber 200 and the processing chamber 100, the distance between the downstream conveyor roller 50 located in the transport direction D of the pre-processing chamber 200 and the upstream roller 12 located in the transport direction D of the transport roller group 10 of the processing chamber 10 tends to increase compared to the distance between the rollers 12 of the transport roller group 10 in the transport direction D. On the other hand, with the lightweighting of products (e.g., liquid crystal panels) using substrate W (e.g., glass substrates for liquid crystal panels), the thinning of the substrate W is being promoted. Therefore, the substrate W, which advances from the transport roller 50 of the pre-processing chamber 200 and is introduced into the processing chamber 100 through the inlet 121 of the partition wall 120, may bend, causing the leading edge of the substrate W to collide with the upstream roller 12 of the transport roller group 10 located in the transport direction D and create a notch. This is because, due to the presence of partition walls 120 and the like between the pretreatment chamber 200 and the processing chamber 100, the spacing between the conveyor rollers increases, resulting in greater sag at the front end of the substrate due to deflection. In order to support the substrate W and guide it toward the conveyor roller group 10 before the front end of the substrate W reaches the conveyor roller group 10 through the inlet 121, an auxiliary roller unit 20 (auxiliary roller 21) is provided.

[0026] The diameter of each auxiliary roller 21 in the auxiliary roller unit 20 is smaller than that of each roller 12 included in the conveyor roller group 10. Furthermore, as... Figure 2 As shown, each auxiliary roller 21 has a structure in which an outer roller body 21b is mounted on the outer periphery of the auxiliary roller shaft 21a. Figure 3 and Figure 4As shown, the outer roller body 21b has a structure comprising two semi-ring blocks 24a and 24b joined together to form a ring around the auxiliary roller shaft 21a, with a liquid removal section 25 provided on the entire outer periphery of these semi-ring blocks 24a and 24b. The liquid removal section 25 is formed, for example, by a brush made of bristles of PVA (Polyvinyl Alcohol) or nylon material. The liquid removal section 25 can be made of any material capable of contacting the substrate W and removing liquid adhering to the lower surface of the substrate W. Furthermore, liquid removal here does not necessarily mean complete removal of liquid adhering to the lower surface of the substrate W; it is sufficient to remove liquid components to a level that stabilizes the light received by the light sensor 30, as described later, at least within the area contacted by the liquid removal section 25. Additionally, the semi-ring block 24a has through holes for bolts 26a and 26b to pass through for engaging with the semi-ring block 24b. The semi-ring block 24b has bolt holes for inserting bolts 26a and 26b. The semi-ring blocks 24a and 24b are in a ring shape and installed on the auxiliary roller shaft 21a, and are fixed to the auxiliary roller shaft 21a by bolts 26a and 26b.

[0027] Back Figure 1 and Figure 2 A light sensor 30 is provided between the auxiliary roller unit 20 and the upstream roller 12 of the conveying roller group 10, positioned in the conveying direction D, facing the lower surface of the conveyed substrate W. More specifically, the light sensor 30 is positioned at one end of the auxiliary roller unit 20, for example, downstream of the auxiliary roller 21 positioned on the right side in the conveying direction D, facing a straight line L (imaginary line) extending parallel to the auxiliary roller 21 along the conveying direction D. The light sensor 30 is, for example, a reflective type light sensor having a light-emitting section that emits a light beam (e.g., a laser) and a light-receiving section that receives reflected light from the substrate W. The light-emitting section and the light-receiving section are configured to detect the substrate W moving in the conveying path by means of the light beam's emission and reception. The amount of reflected light received by the light-receiving section (light reception amount) is output as a detection signal. When the substrate W is detected according to the detection signal from the light sensor 30, for example, gas is started to be discharged from an air knife (not shown) provided in the processing chamber 100.

[0028] In a substrate processing apparatus with the structure described above, the substrate W, which is being processed using a processing liquid in the pre-processing chamber 200, is conveyed by the transport roller 50 and introduced into the processing chamber 100 through the inlet 121. Figure 5As shown, the substrate W, introduced into the processing chamber 100 through the inlet 121, is supported sequentially by the auxiliary roller units 20 (a plurality of auxiliary rollers 21 arranged in parallel) starting from its front end and guided toward the conveyor roller group 10. Here, even if the substrate W introduced from the inlet 121 is bent downwards, so that its front end contacts the middle of each auxiliary roller 21, the presence of a liquid-removing section 25 formed of bristles or sponge on the outer periphery of each auxiliary roller 21 prevents gaps from forming at the front end of the substrate W. When the liquid-removing section 25 is a brush, the front end of the bent substrate W is inserted between the bristles of the brush when it contacts the middle of the auxiliary roller 21, thus preventing gaps from forming on the substrate W. Moreover, the bristles themselves are elastic, thus absorbing the impact when the substrate W contacts the brush. In other words, the liquid-removing section 25 also serves as a buffer material between the substrate W and the auxiliary rollers 21 (semi-ring blocks 24a, 24b). The substrate W, which is in contact with the auxiliary roller 21, presses and rotates the auxiliary roller 21 in a manner that does not produce a notch, and after being placed on the auxiliary roller 21, it is guided to the conveyor roller group 10.

[0029] In the substrate processing apparatus of the first embodiment, a photosensitive sensor is used as the detector for the substrate as described above. This avoids the erroneous detection of the substrate that can occur with oscillator-type sensors due to sluggish mechanical movement of the oscillator body. Furthermore, while processing liquid can sometimes adhere to the oscillator body and dry and fix it in place, preventing movement of the oscillator body, this does not happen in the substrate processing apparatus using a photosensitive sensor. Thus, by using a photosensitive sensor, processing can be performed efficiently without erroneous detection of the substrate W.

[0030] Liquid components adhering to the substrate W traveling from the auxiliary roller unit 20 to the conveyor roller group 10 and in contact with the plurality of liquid removal sections 25 disposed on the outer periphery of each auxiliary roller 21 are removed by these plurality of liquid removal sections 25. When the plurality of liquid removal sections 25 are each formed of a bristle bundle, the liquid components adhering to the surface of the substrate W are swept away from the surface and removed.

[0031] The liquid component adhering to the lower surface of the substrate W is removed by the auxiliary roller 21 (multiple liquid removal sections 25) of the auxiliary roller unit 20, which is arranged on the right side facing the conveying direction D. Therefore, the photosensor 30, which is provided on the downstream side of the auxiliary roller 21 in the conveying direction D, will not receive the liquid component dripping from the lower surface of the substrate W. Furthermore, the photosensor 30 will not irradiate the portion of the substrate W with liquid component adhering to it with a light beam. This prevents the photosensor 30 from malfunctioning due to liquid component adhering to it, or from making incorrect detections of the substrate W with liquid component adhering to it. Moreover, with this photosensor 30, it is possible to detect with high accuracy the introduction of the substrate W, which has been treated with liquid, into the processing chamber 100 through the inlet 121.

[0032] According to the substrate processing apparatus of the first embodiment described above, the substrate W can be detected with high precision by the photosensitive sensor 30 without being affected by the liquid composition adhering to the surface of the substrate W after liquid treatment. Therefore, the transported substrate W can be processed normally without compromising the efficient processing of the substrate.

[0033] In the above description, it was stated that the liquid removal section 25 is formed of a brush, but the structure is not limited to this. The liquid removal section 25 may also be formed of a porous material (liquid absorption component) such as a sponge. When the liquid removal section 25 is formed of a porous material, liquid components adhering to the surface of the substrate W are removed by absorption. Moreover, due to the softness or elasticity of the porous material, the impact when the substrate W comes into contact can be absorbed, so when it is formed of a porous material, it is also possible to prevent the substrate W from being damaged.

[0034] Furthermore, the auxiliary roller 21 with the liquid removal section 25 is constructed by joining the semi-circular blocks 24a and 24b. The liquid removal section 25, as described above, is formed of a brush or porous material, and therefore will deform and deteriorate over time. By making the auxiliary roller 21 a ring structure with two joined semi-circular parts (semi-circular blocks 24a and 24b), disassembly and installation relative to the auxiliary roller shaft 21a become easier, even when replacement is needed due to deformation or deterioration.

[0035] Additionally, multiple arrangements (in) Figure 1 The auxiliary roller unit 20 is composed of four auxiliary rollers 21, but is not limited to this structure. The auxiliary rollers are not particularly limited as long as they have a liquid removal section that contacts the conveyed substrate W and removes liquid components from the substrate W. For example, such as... Figure 6 As shown, an auxiliary roller 40 with the following structure can also be used: a liquid removal part 42 formed of sponge or the like is installed on the outer periphery of a cylindrical roller body 41 that extends in a horizontal direction perpendicular to the conveying direction D.

[0036] Next, the second embodiment of the present invention will be described. The substrate processing apparatus of the second embodiment is as follows: Figure 7 It is constructed as shown. Figure 7 This is a side view showing the structure and internal state of the substrate processing apparatus according to the second embodiment. Additionally, in Figure 7 In this document, the same reference numerals are used for parts that are the same as those in the first embodiment, and their descriptions are omitted.

[0037] In the processing chamber 1000 of the substrate processing apparatus of the second embodiment, the conveyor roller assembly 60 is provided in a manner capable of reciprocatingly conveying the substrate W. Within the processing chamber 1000, processing liquid discharge sections 71 and 72, which supply processing liquid to the substrate W, are opposite to the conveying path of the substrate W, and multiple such sections are provided above and below the conveying path. The processing liquid discharge sections 71 and 72 are, for example, spray nozzles. The processing liquid discharge sections 71 and 72 are connected to a processing liquid supply mechanism (not shown) and are capable of supplying processing liquid to the substrate W. The processing liquid discharge section 71 is located above the conveying path of the substrate W and supplies processing liquid to the upper surface of the substrate W. The processing liquid discharge section 72 is located below the conveying path of the substrate W and supplies processing liquid to the lower surface of the substrate.

[0038] The substrate W, introduced through the inlet 121, is processed by the processing liquid supplied from the processing liquid discharge sections 71 and 72 while reciprocating within the processing chamber 1000. The substrate W, having completed processing after a predetermined number of reciprocations, is discharged from the outlet 122 and transported to the next processing chamber. Alternatively, it can be configured to supply different processing liquids for different processing steps on the outgoing and returning paths.

[0039] like Figure 7 As shown, a first photosensor 30a (first detector) is disposed between the inlet 121 and the upstream roller 12 of the conveying roller group 60, facing the lower surface of the conveyed substrate W. Furthermore, a plurality of auxiliary rollers 21 constituting the first auxiliary roller unit 20a are disposed on both the upstream and downstream sides of the first photosensor 30a, sandwiching the first photosensor 30a. Similar to the first embodiment, each auxiliary roller 21 is provided with a liquid removal section (see reference). Figure 3 and Figure 4 The first light sensor 30a is configured to irradiate the portion of the substrate W to which liquid components have been removed by the liquid removal section of the auxiliary roller 21 constituting the first auxiliary roller unit 20a. Furthermore, upstream and downstream here refer to the outgoing direction (when conveyed from the inlet 121 side towards the outlet 122 side). When the substrate W is conveyed in the loop (when conveyed from the outlet 122 side towards the inlet 121 side), upstream and downstream become reversed.

[0040] A second photosensor 30b (second detector) is disposed between the downstream roller 12 and the outlet 122 of the conveying roller assembly 60, facing the lower surface of the conveyed substrate W. Furthermore, multiple auxiliary rollers 21 constituting the second auxiliary roller unit 20b are disposed on both the upstream and downstream sides of the second photosensor 30b, sandwiching the second photosensor 30b. Each auxiliary roller 21 constituting the second auxiliary roller unit 20b also has a liquid removal section (see reference). Figure 3 and Figure 4The second light sensor 30b is configured to irradiate the portion of the substrate W that has had its liquid components removed from the liquid removal section of the auxiliary roller 21, which constitutes the second auxiliary roller unit 20b, with a light beam.

[0041] The first optical sensor 30a detects the substrate W being introduced through the inlet 121. Furthermore, the first optical sensor 30a detects that the substrate W being transported in the loop has reached the downstream end of the loop. Figure 7 The situation on the left side). The second optical sensor 30b detects the arrival of the substrate W transported on the outgoing path at the downstream end of the outgoing path (on the left side). Figure 7 (The situation on the right side). Moreover, the second photosensitive sensor 30b detects the situation where the processed substrate W in the processing chamber 1000 is sent out from the delivery outlet 122. Based on the detection signals of the substrate W detected by the first photosensitive sensor 30a and the second photosensitive sensor 30b, the rotation direction of the conveyor roller group 60 and the supply of processing liquid from the processing liquid discharge sections 71 and 72 are controlled.

[0042] In the substrate processing apparatus of the second embodiment, by providing a first auxiliary roller unit 20a (a plurality of auxiliary rollers 21) between the inlet 121 and the conveying roller group 60, even if the substrate W introduced from the inlet 121 is bent in a drooping manner so that its front end portion contacts the middle belly of each auxiliary roller 21, it is possible to prevent the formation of a notch at the front end portion of the substrate W.

[0043] Furthermore, auxiliary rollers 21 (first auxiliary roller unit 20a, second auxiliary roller unit 20b) with liquid removal sections are provided upstream and downstream of the first optical sensor 30a and the second optical sensor 30b, respectively. Therefore, even while processing is performed by reciprocatingly conveying the substrate W, the substrate W can be detected with high precision on both the outgoing and returning paths using the optical sensors (first optical sensor 30a, second optical sensor 30b). Thus, in the substrate processing apparatus of the second embodiment, the substrate W can also be detected with high precision using optical sensors, enabling efficient processing of the conveyed substrate W without compromising its performance.

[0044] The embodiments of the present invention have been described above, but these embodiments are provided as examples and are not intended to limit the scope of the invention. These novel embodiments described above can be implemented in various other ways, and various omissions, substitutions, and modifications can be made without departing from the essential points of the invention. These embodiments or variations thereof are included in the scope or essential points of the invention and are included in the invention as described in the claims.

Claims

1. A substrate processing apparatus, wherein a substrate treated with liquid is conveyed along a conveying direction by conveying rollers while the substrate is processed, characterized in that, The substrate processing apparatus has: A conveyor roller assembly, which consists of a plurality of conveyor rollers arranged along the conveying direction; An auxiliary roller, disposed between the inlet of the substrate and the conveyor roller assembly, guides the substrate toward the conveyor roller assembly; and A detector that illuminates a light beam onto the transport path of the substrate to detect the substrate. The auxiliary roller has a liquid removal section that contacts the surface of the conveyed substrate to remove liquid components from the substrate. The detector is configured to irradiate the portion of the substrate after the liquid components have been removed by the liquid removal section onto the downstream side of the substrate in the conveying direction of the auxiliary roller with the light beam. The detector is disposed between the upstream conveying rollers in the conveying direction of the auxiliary roller and the conveying roller group. The auxiliary roller has a brush in its liquid removal section, which sweeps away liquid components from the surface of the substrate by rotating the auxiliary roller.

2. The substrate processing apparatus according to claim 1, wherein, The auxiliary roller has a liquid-absorbing component in its liquid-removing section, which contacts the surface of the substrate to absorb liquid components.

3. The substrate processing apparatus according to claim 1 or 2, wherein, The auxiliary roller is constructed by joining two semi-circular components.

4. A substrate processing apparatus comprising a conveyor roller group consisting of a plurality of conveyor rollers disposed between an inlet and an outlet, wherein a substrate introduced from the inlet is reciprocated between the inlet and the outlet by the conveyor rollers, the substrate is processed by liquid, and the substrate is discharged from the outlet, characterized in that, The substrate processing apparatus includes: The first detector is located between the inlet and the conveying roller group, and illuminates the substrate with a light beam to detect the substrate in the conveying path; The second detector is located between the outlet and the conveying roller group, and illuminates the substrate with a light beam to detect the substrate in the conveying path; The first auxiliary roller unit consists of a pair of auxiliary rollers arranged between the inlet and the conveying roller group, such that the first detector is sandwiched in the conveying direction of the substrate; as well as The second auxiliary roller unit consists of a pair of auxiliary rollers arranged between the feed outlet and the conveying roller group, with the second detector sandwiched between them in the conveying direction of the substrate. The auxiliary rollers constituting the first auxiliary roller unit and the second auxiliary roller unit respectively have a liquid removal section that contacts the surface of the substrate being transported to remove liquid components from the substrate. The first detector is configured to illuminate the portion of the substrate after the liquid component has been removed from the liquid removal section of the auxiliary roller constituting the first auxiliary roller unit with the light beam. Furthermore, the first detector is positioned between the auxiliary roller located on the inlet side of the pair of auxiliary rollers in the first auxiliary roller unit and the conveying roller closest to the inlet side in the conveying roller group. The second detector is configured to illuminate the portion of the substrate after the liquid component has been removed from the liquid removal section of the auxiliary roller constituting the second auxiliary roller unit with the light beam. Furthermore, the second detector is positioned between the auxiliary roller located on the outlet side of the pair of auxiliary rollers in the second auxiliary roller unit and the conveying roller closest to the outlet side in the conveying roller group. The liquid removal unit includes a brush that sweeps away liquid components from the surface of the substrate by rotating the auxiliary roller.

5. The substrate processing apparatus according to claim 4, wherein, The auxiliary roller has a liquid-absorbing component in its liquid-removing section, which contacts the surface of the substrate to absorb liquid components.

6. The substrate processing apparatus according to claim 4 or 5, wherein, The auxiliary roller is constructed by joining two semi-circular components.

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