Method for manufacturing TFT photoelectric panel and TFT photoelectric panel

Abstract

The present application provides a method for manufacturing a TFT optoelectronic panel, comprising: performing a target processing operation on a sample plate to respectively process a first target hole, a second target hole and a third target hole on the sample plate, wherein a line connecting the first target hole and the second target hole is a first connecting line direction, and a line connecting the first target hole and the third target hole is a second connecting line direction; grinding the sample plate along a predetermined direction; performing a first detection on the ground sample plate to obtain a first actual distance value in the first connecting line direction between the first target hole and the second target hole, and a second actual distance value in the second connecting line direction between the first target hole and the third target hole; since grinding is performed in a predetermined direction and both the board electrification process and the soldering process of the plate are precisely controlled, the processing accuracy of the optoelectronic panel in the board electrification process and the soldering process is improved, and the scrap rate of the TFT optoelectronic panel is greatly reduced.

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