一种空间轨迹提取方法、系统、电子设备及介质

By acquiring the overall and local deviations of the three-dimensional model of the shoe body and optimizing the upper processing trajectory, the shoe quality problem caused by last deviation was solved, the precision of roughing, glue spraying and treatment agent application was improved, and the consistency of adhesion between the upper and the sole was enhanced.

CN115984478BActive Publication Date: 2026-07-17DONGGUAN ZHIRUI INTELLIGENT TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
DONGGUAN ZHIRUI INTELLIGENT TECH CO LTD
Filing Date
2023-01-10
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

In the existing technology, due to the deviation of the shoe upper being fitted onto the last and the clamping error of the last, deviations occur when using a fixed teaching trajectory method during roughing, glue spraying, and treatment application, affecting the consistency of the adhesion between the shoe upper and the sole and the quality of shoe manufacturing.

Method used

By acquiring the shoe template and real-time 3D model of the shoe, the overall offset is calculated and overall correction is performed. Combined with local correction, the shoe surface processing trajectory is optimized. Point cloud data is acquired by scanning with a 3D camera, and correction is performed using rotation and translation matrices. Spherical expansion is used for local adjustment.

Benefits of technology

It improves the precision of roughing, spraying glue and applying treatment agents, enhances shoe manufacturing quality, ensures consistent adhesion between the upper and sole, and reduces glue overflow or insufficient glue.

✦ Generated by Eureka AI based on patent content.

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    Figure CN115984478B_ABST
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Abstract

本发明属于制鞋技术领域,其目的在于提供一种空间轨迹提取方法、系统、电子设备及介质。本发明通过获取鞋体模板和实时鞋体三维模型,再获取鞋体模板的基准三维模型,以及基准三维模型和实时鞋体三维模型之间的整体偏移量;根据整体偏移量对基准空间轨迹进行整体纠偏处理,得到基准鞋体的整体纠偏后空间轨迹;根据实时鞋体三维模型和整体纠偏后空间轨迹,对整体纠偏后空间轨迹中的每个点进行局部纠偏处理,得到实时鞋体三维模型对应的实时鞋体的空间轨迹。本发明可对基准空间轨迹进行整体纠偏处理,并消除因为其他工序引入的鞋面整体和局部偏差,从而利于提高对实时鞋体处理过程中如打粗、喷胶、施处理剂等处理工序的精度,进而可提升制鞋质量。
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