一种改善电池结合力的图形化电池制备方法及TOPCon电池
By using a combination of laser and wet cleaning on the TOPCon battery substrate to form a patterned mask and electroplat the grid line electrodes, the problems of insufficient adhesion and laser damage were solved, achieving efficient battery fabrication and silver resource conservation.
CN115986000BActive Publication Date: 2026-07-17SUZHOU KZONE EQUIP TECH
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SUZHOU KZONE EQUIP TECH
- Filing Date
- 2022-12-23
- Publication Date
- 2026-07-17
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Figure CN115986000B_ABST
Abstract
本发明提供了一种改善电池结合力的图形化电池制备方法及TOPCon电池,所述的制备方法包括:(Ⅰ)提供电池基底,在电池基底的n型掺杂面上由内到外依次制备隧穿氧化层、第一多晶硅层与第一氮化硅层,在p型掺杂面上由内到外依次制备第二多晶硅层、氧化铝层与第二氮化硅层;(Ⅱ)在第一氮化硅层与第二氮化硅层的外表面分别覆盖保护膜层;(Ⅲ)采用激光去除待电镀区域的保护膜层;(Ⅳ)对图形化掩膜进行刻蚀处理,并分别进行电镀,形成若干第一栅线电极与第二栅线电极,随后去除其余保护膜层,得到图形化电池。本发明解决了TOPCon电池栅线结合力问题,同时减少激光对电池片的损伤,提升电池效率。
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