Multi-stage erase operation for memory devices
By employing voltage offset technology in multi-stage erase operations, the durability and read interference issues caused by the increased threshold voltage of the GIDL generator during the erase operation of non-volatile memory devices are resolved, thereby improving the performance and reliability of the memory.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- MICRON TECHNOLOGY INC
- Filing Date
- 2021-08-10
- Publication Date
- 2026-07-17
AI Technical Summary
Existing non-volatile memory devices suffer from durability limitations and read interference effects during erase operations due to the increased threshold voltage of the GIDL generator, which affects the performance and reliability of the memory devices.
A multi-stage erase operation is employed, which reduces the electrostatic trapping effect by applying different offset voltages to the GIDL generator and the select gate device at different stages of the erase operation, thereby improving the reliability of the GIDL generator and increasing the threshold voltage of the select gate device.
It improves the durability of memory devices and the effectiveness of erase operations, reduces the impact of programming/erasing cycles on device performance, and extends the lifespan of memory.
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Figure CN115997253B_ABST