A crystalline silicon cell photo-thermal annealing device

Abstract

The application discloses a kind of crystalline silicon cell photo-thermal annealing equipment, it is related to photovoltaic cell production equipment technical field.The equipment includes cabinet, and the side of cabinet is opened with the material opening for sending in and taking out wafer, annealing passage is equipped in cabinet, halogen tungsten lamp tube, laser and oscillation piece are equipped in annealing passage, oscillation piece is equipped on the inner wall of annealing passage, is connected with several lasers, for driving several lasers reciprocating oscillation, to increase the randomness of laser irradiation wafer surface;The application can change the position of lamp tube and light radiation device during annealing, so that the irradiation angle of lamp tube and light radiation device to crystalline silicon thin film changes, the randomness of irradiation is improved, the light produced by lamp tube and light radiation device can be uniformly distributed on crystalline silicon thin film, the annealing effect produced by each part on crystalline silicon thin film is uniform, the quality of each position of crystalline silicon thin film is guaranteed to be the same, and the production quality of crystalline silicon thin film is improved.

Description

Technical Field

[0001] This invention relates to the field of photovoltaic cell production equipment technology, and in particular to a photothermal annealing equipment for crystalline silicon cells. Background Technology

[0002] Solar photovoltaic utilization is one of the fastest-growing and most dynamic research fields in recent years, and one of the most prominent projects. To this end, people have researched and developed solar cells.

[0003] Among silicon-based solar cells, monocrystalline silicon solar cells have the highest conversion efficiency and the most mature technology. High-performance monocrystalline silicon cells are based on high-quality monocrystalline silicon materials and related mature processing technologies. The manufacturing process of monocrystalline silicon cells is nearing maturity, and techniques such as surface texturing, emitter passivation, and zoned doping are generally employed in cell production.

[0004] For the crystallization of crystalline silicon thin films, the main low-temperature crystallization methods currently include laser crystallization, post-annealing crystallization, and metal-induced crystallization. Currently, laser crystallization can obtain high-quality materials, but it is not suitable for large-area continuous production; while conventional furnace annealing has a long time and produces materials with small grain sizes.

[0005] Therefore, photothermal annealing technology emerged. Photothermal annealing technology utilizes the photon effect produced by light radiation and the rapid heating effect of halogen tungsten lamps to crystallize amorphous silicon thin film materials at low temperatures.

[0006] Currently, Chinese patent CN109004061A discloses a test device and method for electro-injection annealing of crystalline silicon photovoltaic solar cells, including a dark box, a sample test stage, a temperature control device, a power supply device, and an image acquisition device. The sample test stage, temperature control device, power supply device, and image acquisition device are located inside the dark box. The sample test stage is used to place solar cells, the temperature control device is used to control the temperature of the solar cells, the power supply device provides current to the solar cells, and the image acquisition device is used to acquire electroluminescence images of the solar cells under different temperature and current conditions.

[0007] This device allows for easy monitoring of the entire process of cell excitation and passivation defects. It has a simple structure, but because the light beam generated by the lamp tube and light radiation generator is not uniform enough, the annealing effect on the crystalline silicon thin film is unevenly distributed, and the annealing effect varies in different parts of the crystalline silicon thin film. Summary of the Invention

[0008] In view of the above-mentioned technical problems and to overcome the shortcomings of the prior art, the present invention provides a photothermal annealing device for crystalline silicon solar cells.

[0009] To address the above technical problems, this invention provides a photothermal annealing device for crystalline silicon solar cells.

[0010] Technical benefits: The position of the lamp and light radiation device can be changed during annealing, thereby changing the irradiation angle of the crystalline silicon thin film by the lamp and light radiation device, increasing the randomness of irradiation, and enabling the light generated by the lamp and light radiation device to be evenly distributed on the crystalline silicon thin film. This ensures that the annealing effect on all parts of the crystalline silicon thin film is uniform, guarantees that the quality of the crystalline silicon thin film is the same in all locations, and improves the production quality of the crystalline silicon thin film.

[0011] A further defined technical solution of the present invention is: a photothermal annealing device for crystalline silicon solar cells, comprising a cabinet, a feed port for feeding and removing wafers on one side of the cabinet, an annealing channel inside the cabinet, and a annealing channel containing...

[0012] Halogen tungsten lamps are located on the side of the annealing channel, with several equidistantly arranged to generate heat and light to the wafer.

[0013] Several lasers are located on the side of the annealing channel and are used to generate lasers on the wafer.

[0014] An oscillating element is located on the inner wall of the annealing channel and is connected to several lasers to drive the lasers to oscillate back and forth, thereby increasing the randomness of laser irradiation on the wafer surface.

[0015] The oscillating component includes a drive rod that is slidably connected to the inner wall of the annealing channel, a push rod that is fixed on the drive rod and perpendicularly arranged thereto, a mounting rod that is hinged to the inner wall of the annealing channel, a laser that is installed at the end of the mounting rod, and the end of the push rod that is hinged to the laser.

[0016] The cabinet is also equipped with a drive unit for reciprocating the drive rod.

[0017] Furthermore, the driving component includes a driving plate that is attached to and slidably connected to the inner wall of the annealing channel. The driving plate and the driving rod are fixed to each other. The driving plate is circular and its shape fits the annealing channel, and it is used to drive the driving rod to reciprocate.

[0018] The aforementioned photothermal annealing equipment for crystalline silicon solar cells includes a drive unit comprising a drive frame located in the middle of a drive plate, a drive cam rotatably connected to the inner side wall of the cabinet via a rotating shaft, the drive frame being embedded at the edge of the drive cam and slidably connected to the drive cam, and the drive unit also including a drive motor for rotating the drive cam.

[0019] The aforementioned photothermal annealing equipment for crystalline silicon solar cells includes a drive motor fixed to the inner wall of a cabinet. The output shaft of the drive motor is equipped with a drive screw, which is perpendicular to and penetrates the drive plate. The drive screw and the drive plate are connected by threads.

[0020] The aforementioned photothermal annealing equipment for crystalline silicon solar cells has a cabinet door on one side of the material inlet. The cabinet door is slidably connected to the cabinet via a sliding rod. The cabinet has a sliding hole that extends into the cabinet. The sliding rod is slidably connected in the sliding hole, and the end of the sliding rod is fixed to the cabinet door. Two sliding rods are symmetrically arranged at the bottom of the cabinet door.

[0021] The aforementioned photothermal annealing equipment for crystalline silicon solar cells has a wafer fixing frame fixed on the cabinet door. The wafer fixing frame includes a support rod that is perpendicular to the cabinet door and is positioned toward the extension direction of the annealing channel. The support rod is provided with a plurality of connecting parts for fixing wafers, and the connecting parts are staggered on the support rod.

[0022] The aforementioned photothermal annealing equipment for crystalline silicon solar cells includes a connecting frame with a plurality of suction cups arranged in a circular array on the connecting frame for adsorbing and fixing the wafer.

[0023] The aforementioned photothermal annealing equipment for crystalline silicon cells has a support rod extending through the cabinet door to the outside. The support rod and the cabinet door are rotatably connected. The support rod is equipped with a drive worm gear, the cabinet door is equipped with a drive worm that meshes with it, and a rotary motor for driving the drive worm to rotate.

[0024] The beneficial effects of this invention are:

[0025] (1) In this invention, during annealing, the operator first fixes the wafer on the wafer holder on the cabinet door, closes the cabinet door and opens the annealing equipment. At this time, the halogen tungsten lamp and laser in the annealing equipment work synchronously, emitting laser and heat towards the wafer for annealing. At the same time, the drive unit is started, driving the drive rod to slide back and forth. Since the push rod at the end of the drive rod is movable, the mounting rod is hinged to the cabinet. Therefore, the movement of the push rod can drive the mounting rod to rotate, so that the end of the mounting rod can drive the laser to oscillate back and forth, realizing the back and forth movement of the laser emitted by the laser. At the same time, the wafer holder drives the wafer to rotate. The combination of the two can improve the randomness of the laser and light on the wafer surface and improve the uniformity of wafer annealing.

[0026] (2) In this invention, the drive motor drives the drive cam to rotate. Since the drive frame is connected to the edge of the drive cam, the rotation of the drive cam can drive the drive frame to move back and forth. The drive frame is connected to the drive plate, and the movement of the drive frame can drive the entire drive plate to move, thereby realizing the reciprocating sliding of the drive frame.

[0027] (3) In this invention, when the drive motor rotates forward, it drives the drive screw to rotate forward, and under the action of the screw, it can drive the drive plate to slide forward. When the drive motor rotates in reverse, it can drive the drive screw to rotate in reverse, thereby driving the drive plate to move in the opposite direction. Therefore, it is only necessary to control the drive motor to rotate forward and reverse at intervals to realize the reciprocating sliding of the drive plate and the drive frame, and complete the reciprocating oscillation of the laser.

[0028] (4) In this invention, the rotary motor drives the drive worm to rotate, which can drive the worm wheel and the frame rod to rotate in conjunction, thereby driving the entire wafer holder to rotate. The worm wheel and worm gear can make the wafer holder stop at any angle. In addition, the suction cup on the connecting frame can better adsorb and fix the wafer, ensuring the integrity of the wafer connection.

[0029] (5) In this invention, the position of the lamp tube and the light radiation device can be changed during the annealing process, thereby changing the irradiation angle of the lamp tube and the light radiation device on the crystalline silicon thin film, improving the randomness of irradiation, and enabling the light generated by the lamp tube and the light radiation device to be evenly distributed on the crystalline silicon thin film, so that the annealing effect produced on each part of the crystalline silicon thin film is uniform, ensuring that the quality of each position of the crystalline silicon thin film is the same, and improving the production quality of the crystalline silicon thin film. Attached Figure Description

[0030] Figure 1 This is a schematic diagram of the overall implementation of Example 1;

[0031] Figure 2 This is a structural diagram of Example 1;

[0032] Figure 3 This is a structural diagram of Example 2.

[0033] The components include: 1. Cabinet; 11. Material inlet; 12. Annealing channel; 13. Halogen tungsten lamp; 14. Laser; 15. Cabinet door; 16. Sliding hole; 17. Sliding rod; 2. Vibrating component; 21. Drive rod; 22. Push rod; 23. Mounting rod; 3. Drive component; 31. Drive board; 32. Drive frame; 33. Drive cam; 34. Drive motor; 35. Drive screw; 4. Wafer holder; 41. Frame rod; 42. Connecting frame; 43. Suction cup; 5. Drive worm gear; 6. Drive worm; 7. Rotary motor. Detailed Implementation

[0034] This embodiment provides a photothermal annealing device for crystalline silicon solar cells, the structure of which is shown in the figure. It includes a cabinet 1, with a material inlet 11 on one side of the cabinet 1 for feeding and taking out wafers. A cabinet door 15 is provided on the cabinet 1 on one side of the material inlet 11. The cabinet door 15 is slidably connected to the cabinet 1 by a sliding rod 17. A sliding hole 16 is provided on the cabinet 1 to penetrate into the cabinet 1. The sliding rod 17 is slidably connected in the sliding hole 16, and the end of the sliding rod 17 is fixed to the cabinet door 15. Two sliding rods 17 are located at the bottom of the cabinet door 15 and are symmetrically arranged.

[0035] A wafer holder 4 is fixed on the cabinet door 15. The wafer holder 4 includes a support rod 41 perpendicular to the cabinet door 15, which is oriented towards the extension direction of the annealing channel 12. The support rod 41 is provided with several connecting parts for fixing wafers, which are staggered on the support rod 41. The connecting parts include a connecting frame 42, which is provided with several suction cups 43 arranged in a circular array for adsorbing and fixing wafers.

[0036] One end of the support rod 41 extends through the cabinet door 15 to the outside. The support rod 41 is rotatably connected to the cabinet door 15. The support rod 41 is equipped with a drive worm gear 5, the cabinet door 15 is equipped with a drive worm 6 that meshes with it, and a rotary motor 7 for driving the drive worm 6 to rotate.

[0037] The cabinet 1 is equipped with an annealing channel 12, in which halogen tungsten lamps 13 are arranged at equal intervals on the side of the annealing channel 12 to generate heat and light to the wafer; lasers 14 are arranged at several on the side of the annealing channel 12 to generate laser light to the wafer; oscillator 2 is arranged on the inner wall of the annealing channel 12 and connected to several lasers 14 to drive several lasers 14 to oscillate back and forth to increase the randomness of laser irradiation on the wafer surface;

[0038] The oscillating component 2 includes a drive rod 21 that is slidably connected to the inner wall of the annealing channel 12, a push rod 22 that is fixed perpendicular to the drive rod 21, an installation rod 23 that is hinged to the inner wall of the annealing channel 12, a laser 14 that is installed at the end of the installation rod 23, and the end of the push rod 22 that is hinged to the laser 14.

[0039] The cabinet 1 is also equipped with a drive component 3 for driving the drive rod 21 to reciprocate. The drive component 3 includes a drive plate 31 that is attached to and slidably connected to the inner wall of the annealing channel 12. The drive plate 31 and the drive rod 21 are fixed to each other. The drive plate 31 is circular and its shape fits the annealing channel 12, and it is used to drive the drive rod 21 to reciprocate.

[0040] The drive unit 3 includes a drive frame 32 located in the middle of the drive plate 31. A drive cam 33 is rotatably connected to the inner side wall of the cabinet 1 via a rotating shaft. The drive frame 32 is embedded at the edge of the drive cam 33 and is slidably connected to the drive cam 33. The drive unit 3 also includes a drive motor 34 for driving the drive cam 33 to rotate.

[0041] During annealing, the operator first fixes the wafer onto the wafer holder 4 on the cabinet door 15, closes the cabinet door 15, and then opens the annealing equipment. At this time, the halogen tungsten lamp 13 and the laser 14 in the annealing equipment work synchronously, emitting laser and heat towards the wafer for annealing. At the same time, the drive unit 3 is activated, driving the drive rod 21 to slide back and forth. Since the push rod 22 at the end of the drive rod 21 is movable, and the mounting rod 23 is hinged to the cabinet 1, the movement of the push rod 22 can drive the mounting rod 23 to rotate, thereby enabling the end of the mounting rod 23 to drive the laser 14 to oscillate back and forth, realizing the back and forth movement of the laser emitted by the laser 14. At the same time, the wafer holder 4 drives the wafer to rotate. The combination of the two can improve the randomness of the laser and light distribution on the wafer surface and improve the uniformity of wafer annealing.

[0042] Example 2, a photothermal annealing device for crystalline silicon cells, differs from Example 1 in that, as shown in the figure, the driving component 3 includes a driving motor 34 fixed on the inner side wall of the cabinet 1, and a driving screw 35 is provided on the output shaft of the driving motor 34. The driving screw 35 is perpendicular to the driving plate 31 and penetrates the driving plate 31, and the driving screw 35 is threadedly connected to the driving plate 31.

[0043] This invention can change the position of the lamp and the light radiation device during annealing, thereby changing the irradiation angle of the lamp and the light radiation device on the crystalline silicon thin film, increasing the randomness of irradiation, and enabling the light generated by the lamp and the light radiation device to be evenly distributed on the crystalline silicon thin film. This ensures that the annealing effect on each part of the crystalline silicon thin film is uniform, guarantees that the quality of the crystalline silicon thin film is the same at all locations, and improves the production quality of the crystalline silicon thin film.

[0044] In addition to the embodiments described above, the present invention may have other implementations. All technical solutions formed by equivalent substitution or equivalent transformation fall within the protection scope claimed by the present invention.

Claims

1. A photothermal annealing device for crystalline silicon solar cells, comprising a cabinet (1), characterized in that: The cabinet (1) has a feed port (11) on one side for feeding and removing wafers. An annealing channel (12) is provided inside the cabinet (1), and the annealing channel (12) contains... Halogen tungsten lamp tubes (13) are located on the side of the annealing channel (12), and several are equidistantly arranged to generate heat and light to the wafer; Several lasers (14) are provided on the side of the annealing channel (12) for generating lasers on the wafer; The oscillating element (2) is located on the inner wall of the annealing channel (12) and is connected to several lasers (14) to drive several lasers (14) to oscillate back and forth, so as to increase the randomness of laser irradiation on the wafer surface; The oscillating component (2) includes a drive rod (21) slidably connected to the inner wall of the annealing channel (12), a push rod (22) perpendicularly arranged on the drive rod (21), an mounting rod (23) hinged to the inner wall of the annealing channel (12), a laser (14) is provided at the end of the mounting rod (23), and the end of the push rod (22) is hinged to the laser (14); The cabinet (1) is also equipped with a drive component (3) for driving the drive rod (21) to reciprocate; The driving component (3) includes a driving plate (31) that is attached to and slidably connected to the inner wall of the annealing channel (12). The driving plate (31) and the driving rod (21) are fixed to each other. The driving plate (31) is arranged in a circular plate shape and its shape is attached to the annealing channel (12) to drive the driving rod (21) to move back and forth. The drive component (3) includes a drive frame (32) located in the middle of the drive plate (31), and a drive cam (33) is rotatably connected to the inner side wall of the cabinet (1) via a rotating shaft. The drive frame (32) is embedded in the edge of the drive cam (33) and is slidably connected to the drive cam (33). The drive component (3) also includes a drive motor (34) for driving the drive cam (33) to rotate. The drive component (3) includes a drive motor (34) fixed on the inner side wall of the cabinet (1). The output shaft of the drive motor (34) is provided with a drive screw (35). The drive screw (35) is perpendicular to the drive plate (31) and penetrates the drive plate (31). The drive screw (35) and the drive plate (31) are threadedly connected. The cabinet (1) is provided with a cabinet door (15) on one side of the material inlet (11). The cabinet door (15) is slidably connected to the cabinet (1) by a sliding rod (17). The cabinet (1) is provided with a sliding hole (16) that passes through the inside of the cabinet (1). The sliding rod (17) is slidably connected in the sliding hole (16), and the end of the sliding rod (17) is fixed to the cabinet door (15). The sliding rod (17) is located at the bottom of the cabinet door (15) and two rods are symmetrically provided. The driving component (3) drives several lasers (14) to oscillate back and forth in a plane parallel to the cabinet door (15) through the oscillating component (2).

2. The photothermal annealing equipment for crystalline silicon solar cells according to claim 1, characterized in that: A wafer holder (4) is fixed on the cabinet door (15). The wafer holder (4) includes a support rod (41) that is perpendicular to the cabinet door (15). The support rod (41) is set in the direction of the extension of the annealing channel (12). The support rod (41) is provided with a number of connecting parts for fixing wafers. The connecting parts are staggered on the support rod (41).

3. The photothermal annealing equipment for crystalline silicon solar cells according to claim 2, characterized in that: The connecting part includes a connecting frame (42), on which a plurality of suction cups (43) arranged in a ring array are provided for adsorbing and fixing the wafer.

4. The photothermal annealing equipment for crystalline silicon solar cells according to claim 3, characterized in that: One end of the frame rod (41) extends through the cabinet door (15) to the outside. The frame rod (41) and the cabinet door (15) are rotatably connected. The frame rod (41) is provided with a drive worm gear (5), the cabinet door (15) is provided with a drive worm (6) that meshes with it, and a rotary motor (7) for driving the drive worm (6) to rotate.

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