Systems, devices, and methods for beam misalignment detection

Abstract

Embodiments of systems, apparatuses, and methods relate to a beam system. An example method of detecting beam misalignment in a beam system includes detecting beam misalignment in an injector system of the beam system. The example method further includes detecting beam misalignment in an accelerator system of the beam system.

Description

[0001] Cross-reference to related applications

[0002] This application claims priority to U.S. Provisional Application Serial No. 63 / 070,799, filed August 26, 2020, entitled “SYSTEMS, DEVICES, AND METHODS FOR BEAM MISALIGNMENT DETECTION”, and U.S. Provisional Application Serial No. 63 / 071,185, filed August 27, 2020, entitled “SYSTEMS, DEVICES, AND METHODS FOR BEAMMISALIGNMENT DETECTION”, the entire contents of which are incorporated herein by reference for all purposes. Technical Field

[0003] The topics described herein generally relate to systems, apparatus, and methods for detecting, regulating, and safely interrupting misaligned beams in accelerator systems. Background Technology

[0004] Boron neutron capture therapy (BNCT) is a physical therapy used to treat many types of cancer—including some of the most difficult to treat. BNCT is a technique that selectively targets tumor cells while using boron compounds to protect normal cells. A boron-containing substance is injected into the bloodstream, and the boron accumulates in the tumor cells. The patient then receives neutron radiation therapy (e.g., in the form of a neutron beam). The neutrons react with the boron to kill the tumor cells while minimizing damage to surrounding normal cells. Long-term clinical studies have demonstrated that neutron beams with an energy spectrum in the 3–30 keV range are more suitable for achieving more effective cancer treatment while reducing the patient's radiation load. This energy spectrum or range is often referred to as hyperthermia.

[0005] Most conventional methods for generating superthermal neutrons (e.g., superthermal neutron beams) are based on the nuclear reaction of protons with beryllium or lithium (e.g., beryllium or lithium targets).

[0006] For electrostatic accelerator-based solutions, beam diagnostics are an inherent part of charged particle beamline design. A critical task in beam delivery is ensuring the beam is correctly positioned within the beamline (e.g., without direct interaction between the beam and beamline components and walls). Any effects of placing or using such beam diagnostics can be proportional to the beam energy, as beam destructive forces increase with beam energy. This is especially true for the delivery of direct current (DC) beams, where irreversible damage can occur on beamline components and to patients receiving beam-based treatments within millisecond timescales. Therefore, continuous monitoring of beam position is crucial for successful beam delivery in accelerator-based solutions, as it allows for rapid interruption or adjustment of beams that have been detected as misaligned.

[0007] For these and other reasons, there is a need for improved, efficient, and compact systems, apparatuses, and methods that can safely monitor and interrupt misaligned beams delivered in accelerator-based solutions. Summary of the Invention

[0008] Exemplary embodiments of systems, apparatuses, and methods are described herein as beam misalignment detection in injector systems and accelerator systems of neutron beam systems. Exemplary embodiments relate to beam misalignment detection in beam systems.

[0009] In various embodiments, beam misalignment can be detected in the beam injector or injector system based on current measurements obtained from the magnetic elements of the beam injector or voltage measurements obtained from the biased components of the beam injector. When the current measurement deviates from the nominal conditions or the voltage measurement deviates from the nominal conditions, it can be determined that the beam is misaligned.

[0010] In various embodiments, beam misalignment can be detected in the accelerator system by evaluating beam loss based on obtaining the input and output beam currents of the accelerator system and various parameters associated with the charge exchange device of the accelerator system. When the detected beam loss exceeds a beam loss threshold, beam misalignment can be determined.

[0011] Other systems, apparatuses, methods, features, and advantages of the subject matter described herein will be apparent to or will become apparent to those skilled in the art upon review of the following figures and detailed description. It is intended that all such additional systems, methods, features, and advantages are included within the scope of this description, the subject matter described herein, and protected by the appended claims. Features of exemplary embodiments should in no way be construed as limiting the appended claims, where no explicit statement of those features is made in the claims. Attached Figure Description

[0012] The details of the subjects described herein, both in terms of their structure and operation, become apparent from the accompanying drawings, in which the same reference numerals denote the same parts. The components in the drawings are not necessarily drawn to scale, but rather emphasize the principles of the illustrated subjects. Furthermore, all illustrations are intended to convey concepts, where relative dimensions, shapes, and other detailed properties may be shown schematically rather than literally or precisely.

[0013] Figure 1A This is a schematic diagram of an exemplary embodiment of a neutron beam system for use with embodiments of the present disclosure.

[0014] Figure 1B This is a schematic diagram of an exemplary embodiment of a neutron beam system used in boron neutron capture therapy (BNCT).

[0015] Figure 2 An exemplary pre-accelerator system or ion beam injector for use with embodiments of this disclosure is illustrated.

[0016] Figure 3 yes Figure 2 A perspective view of an exemplary embodiment of the beam position monitor (BPM) of the ion beam injector system shown.

[0017] Figure 4A yes Figure 2 A perspective view of the ion source and the ion source vacuum chamber shown.

[0018] Figure 4B It describes Figure 4A An exploded perspective view of an exemplary embodiment of the single lens shown.

[0019] Figure 5 An exemplary pre-accelerator tube for use with embodiments of this disclosure is illustrated.

[0020] Figure 6 The illustration shows an exemplary operation of an exemplary embodiment of this disclosure.

[0021] Figure 7 The illustration shows a block diagram of a system in which embodiments of the present disclosure may operate.

[0022] Figure 8 An exemplary computing device that can be specifically configured according to embodiments of the present disclosure is illustrated. Detailed Implementation

[0023] Before describing this subject matter in detail, it will be understood that this disclosure is not limited to the specific embodiments described, as these are of course subject to variation. It will also be understood that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting, as the scope of this disclosure will be limited only by the appended claims.

[0024] The term “particle” is used extensively throughout this document and, unless otherwise limited, can be used to describe electrons, protons (or H+ ions) or neutrons, as well as matter having more than one electron, proton and / or neutron (e.g., other ions, atoms and molecules).

[0025] Boron neutron capture therapy (BNCT) involves deploying high-energy (e.g., 2–3 MeV) and high-current (e.g., up to 20 mA) DC proton beams for cancer treatment. Such powerful beams can lead to harmful events caused by beam misalignment, interruption, beamline component failure, or the development of beam instability. For example, direct interaction between the beam and the beamline walls can cause irreversible damage within milliseconds.

[0026] Embodiments of this disclosure enable the monitoring and prevention of such undesirable events during system operation by using a beam diagnostic device and a control system configured to employ methods for detecting beam misalignment and adjusting or interrupting misaligned beams.

[0027] Beam delivery simulations are typically performed to determine "safe corridors" for various beam characteristics, including but not limited to: deviations from the optimal path in spatial and phase coordinates, beam size constraints, and beam energy variations. These simulations are complex and sometimes inaccurate due to uncertainties in initial conditions and inherent inaccuracies in the applied methods. However, benchmarking the simulations against experiments can increase confidence in the results. Benchmarking simulation results depends on accurate beam characterization and monitoring, which can be achieved through non-invasive diagnostic tools during machine or system commissioning and operation.

[0028] Non-invasive measurements of beam characteristics are difficult to perform, especially for high-power DC beams (invasive diagnostics are not applicable). Considering space constraints and other limitations along the beamline, practical beam diagnostic device components can only provide partial information about the beam. Exemplary embodiments of this disclosure overcome this point-like coverage of the beam by enabling reliable interlocking systems and methods to demonstrate the safety and reliability of beam delivery. The embodiments described herein are able to interpret relevant signals from the beam diagnostic device in a timely and reliable manner, subsequently initiating beam interruption if necessary.

[0029] The embodiments described herein may include dedicated non-invasive or minimally invasive beam diagnostic devices that cause minimal beam perturbation or interference during measurement. That is, beam measurements using interceptor or invasive beam diagnostic devices affect beam characteristics via beam-probe interactions. For example, beam space and phase distribution are typically affected by beam characteristics and beam energy. Therefore, interceptor or invasive beam diagnostic devices are generally only suitable for use during machine commissioning or during machine maintenance or repair.

[0030] The embodiments described herein can further enable redundant measurements of various beam characteristics or parameters. In some exemplary embodiments, redundancy can be achieved by comparing two or more signals from different measurements to determine the resulting signal. In some exemplary embodiments, redundancy can be further achieved by determining whether different measurement results indicate beam misalignment based on various dynamic or fixed calculations. Redundancy can be implemented here by using hardware, software, or a combination of both.

[0031] Time-resolved measurements of beam parameters can be affected by various phenomena that can be interpreted based on the accuracy of the measurements. For example, collecting beam particles on the surface of an electrical probe, thereby enabling the estimation of beam current, is accompanied by a phenomenon known as secondary particle emission. Secondary particle emission often leads to inaccurate estimates of the beam current, and for negative ion beams, the beam current may be underestimated due to the secondary electrons emitted in this manner. The effects of secondary particle emission can be mitigated by biasing the electrical probe and / or by applying a specially configured external magnetic field. However, other charged particles can be attracted to the electrical probe from nearby generated plasma, thus limiting the accuracy of the signal generated by the electrical probe.

[0032] Since the beam particles can be generated solely by the ion source (e.g., 12), the beam current preferably does not increase as the beam propagates downstream through the beam system (e.g., 10). This condition can be used to detect incorrect readings in the beam diagnostic device. For example, for j≥i, I i ≥I j Where i,j are indices of the beam diagnostic device in the beamline (e.g., beam system 10) increasing from the ion source (e.g., 12), and I i (or I) j ) are the measured beam parameters. For example, the total beam current measured at the exit of the ion source (e.g., 12) should not be less than the total beam current injected into the accelerator system (e.g., 16) measured at the inlet of the accelerator system (e.g., 16).

[0033] Exemplary embodiments of the systems, apparatuses, and methods described herein may include pre-accelerator systems used with particle accelerators. A particle accelerator is a common example, and the embodiments described herein can be used with any type of particle accelerator, or in any particle accelerator application involving generating a charged particle beam at a specified energy to supply to a particle accelerator. Embodiments of this pre-accelerator system or ion beam injector are adapted to provide a negative particle beam to a tandem accelerator, but these are merely exemplary types of accelerators. The pre-accelerator embodiments described herein can be implemented in accelerators that are used as scientific tools, such as for nuclear physics research; particle accelerators used in industrial or manufacturing processes, such as the manufacture of semiconductor chips; accelerators used to modify material properties (e.g., surface treatment); particle accelerators used for food irradiation; and particle accelerators used for pathogen destruction in medical sterilization. These embodiments can also be used in imaging applications, such as cargo or container inspection. And by another non-exhaustive example, these embodiments can be used in particle accelerators used in medical applications such as medical diagnostic systems, medical imaging systems, or radiotherapy systems.

[0034] One such radiation system is a BNCT system. For ease of description, many of the embodiments described herein are carried out in the context of neutron beam systems for BNCT, although these embodiments are not limited to neutron beam or BNCT applications. Embodiments of this disclosure are capable of configuring accelerator systems (also referred to herein as pre-accelerator systems) for generating proton beams with parameters suitable for a neutron source used in BNCT with a neutron-generating target such as lithium (Li) or beryllium (BE).

[0035] To efficiently generate hyperthermal neutrons on a lithium target, a proton beam with energies of 1.9–3.0 MeV may be required. In such applications, for relatively short processing times, forming a neutron beam with a preferred flux density may also involve proton beam currents above 5 mA. For the use of a tandem accelerator system in such applications, a negative hydrogen ion source may be preferred.

[0036] The embodiments disclosed herein can be used in any type of negative ion electrostatic accelerator with beam currents higher than a few milliamperes. Depending on the specific application requirements, the embodiments disclosed herein may have any additional components, including ion optics and beam diagnostics before, within, or after the pre-accelerator system.

[0037] The embodiments of this disclosure can be used with neutron beam systems (NBS) that provide a continuous or modulated proton beam. The proton beam can have a wide range of energies and currents. For example, in some embodiments, the proton beam has particle energies in the range of 1.9–3.0 MeV and a beam current of 5–15 mA. In other embodiments, the proton beam has energies and / or currents outside these ranges. The beam can be directed to a lithium target to produce a neutron beam, or the NBS can be used with a target having other materials for neutron production (e.g., beryllium instead of lithium).

[0038] In some embodiments, the ion source generates a negative hydrogen ion beam with a current up to 15 mA (or higher). The beam particles can be accelerated to energies of 30 keV (or higher) within the ion source. The ion source can be connected to a pre-accelerator system (using one or more intervening components) that provides additional acceleration of the negative ion beam particles to energies of 120-150 keV (or higher). The beam can also be focused within the pre-accelerator system, the focal length of which corresponds to a distance from the input aperture of the tandem accelerator input chamber, for example, a distance less than one meter (m). The pre-accelerator system may include electrostatic lenses (e.g., a single lens), pre-accelerator devices (e.g., a pre-accelerator tube with multiple terminals), and / or magnetic elements (e.g., one or more solenoids) for shaping and accelerating the ion beam to higher energies before it enters the tandem accelerator.

[0039] The electrostatic lens of the pre-accelerator system can be positioned between the ion source and the pre-accelerator tube, downstream of the grounded lens of the ion source. The electrostatic lens can reduce the divergence of the ion beam from the ion source and can also divert and collect ionized backflow particles.

[0040] The magnetic element (or magnetic focusing device) of the pre-accelerator system can be positioned between the pre-accelerator tube and the tandem accelerator, and can fine-tune the beam toward the focal point. The magnetic element can be, for example, a solenoid.

[0041] Exemplary embodiments of the systems, apparatus, and methods described herein also facilitate rapid beam position monitoring to detect beam misalignment in the beamline of beam system 10. In some exemplary embodiments, a beam position monitor (BPM) may include multiple electrodes extending into the interior space of the beamline of the neutron beam system (NBS). In these embodiments, the beam position monitor (BPM) operates by collecting corona currents via the electrodes. The electrodes may be electrically isolated from the walls of the BPM and biased using an external power supply. Biasing relative to the BPM walls reduces the contribution of secondary electron emission (SEE) currents to the signal and increases the corona currents collected from the beam-generated plasma.

[0042] In an exemplary embodiment, the beam position monitor (BPM) is configured to send a signal or indication to the control system when the beam deviates from the axis as it advances through the beam line.

[0043] A beam position monitor (BPM) may include a level of detection sensitivity associated with reducing or eliminating beam-induced damage to beamline components while minimizing interference with the beam traveling through the beamline. That is, as a result of current collection through electrodes, the beam current through the beamline components can be reduced to a minimum. Exemplary embodiments of the BPM may advantageously operate using a direct current (DC) beam, having a millisecond (or faster) response time, and / or accepting beam power of 2.5 MeV (or higher) per core.

[0044] In some exemplary embodiments, the BPM may be part of a beam system configured for generating a neutron beam from an ion beam. The beam system may include an LEBL serving as an ion beam injector system, a high-voltage (HV) tandem accelerator coupled to the ion beam injector system, and an HEBL extending from the tandem accelerator to a neutron target assembly housing a neutron generation target. In these exemplary embodiments, the ion beam injector may include an ion source, beam optics incorporated into a low-energy beamline extending from the ion source, a pre-accelerator tube, beam diagnostics, and a pump chamber coupled to the tandem accelerator. The ion source can generate charged particles in a plasma volume, which can be extracted, accelerated, modulated, and ultimately used to generate neutrons upon delivery to the neutron generation target. This improved, efficient, and compact system, apparatus, and method for monitoring beam position can protect neutron beam system equipment while maintaining operational effectiveness.

[0045] Figure 1A This is a schematic diagram of an exemplary embodiment of a beam system 10 for use with embodiments of the present disclosure. Here, the beam system 10 includes a source 12, a low-energy beamline (LEBL) 14, an accelerator 16 coupled to the LEBL 14, and a high-energy beamline (HEBL) 18 extending from the accelerator 16 to a target 100. The LEBL 14 is configured to deliver a beam from the source 12 to the input of the accelerator 16, which is in turn configured to generate a beam by accelerating the beam delivered by the LEBL 14. The HEBL 18 transfers the beam from the output of the accelerator 16 to the target 100. The target 100 may be a structure configured to produce a desired result in response to a stimulus applied by the incoming beam, or may be capable of altering the properties of the beam. The target 100 may be a component of the system 10 or may be an artifact at least partially regulated or manufactured by the system 10.

[0046] Figure 1BThis is a schematic diagram illustrating another exemplary embodiment of a neutron beam system 10 for boron neutron capture therapy (BNCT). Here, source 12 is an ion source and accelerator 16 is a tandem accelerator. The neutron beam system 10 includes a pre-accelerator system 20 serving as a charged particle beam injector, a high-voltage (HV) tandem accelerator 16 coupled to the pre-accelerator system 20, and an HEBL 18 extending from the tandem accelerator 16 to a neutron target assembly 200 housing a target 100 (not shown). In this embodiment, the target 100 is configured to produce neutrons in response to a bombardment of protons with sufficient energy and may be referred to as a neutron-generating target. The neutron beam system 10 and the pre-accelerator system 20 may also be used in other applications, such as those other examples described herein, and are not limited to BNCT.

[0047] The pre-accelerator system 20 is configured to deliver an ion beam from the ion source 12 to the input (e.g., the input aperture) of the tandem accelerator 16, thus also acting as the LEBL 14. Powered by a high-voltage power supply 42 coupled thereto, the tandem accelerator 16 produces a proton beam with energy typically equal to twice the voltage applied to the accelerating electrodes positioned within the accelerator 16. This proton beam energy level can be achieved by accelerating the innermost high-potential electrodes from the negative hydrogen ion beam at the input of the accelerator 16, stripping two electrons from each ion, and then accelerating the resulting protons downstream with the same applied voltage.

[0048] HEBL 18 delivers a proton beam from the output of accelerator 16 to a target within neutron target assembly 200, which is positioned at the end of a branch 70 of a beamline extending into a patient treatment chamber. System 10 can be configured to guide the proton beam to any number of targets and associated treatment areas within one or more targets. In this embodiment, HEBL 18 includes three branches 70, 80, and 90 that can extend into three different patient treatment chambers, each terminating in the target assembly 200 and a downstream beam shaping device (not shown). HEBL 18 may include a pump chamber 51, quadrupole magnets 52 and 72 to prevent beam defocusing, dipole or bending magnets 56 and 58 to guide the beam into the treatment chamber, a beam corrector 53, diagnostic devices such as current monitors 54 and 76, a fast beam position monitor section 55, and a scanning magnet 74.

[0049] The design of HEBL 18 depends on the construction of the processing facility (e.g., a single-layer construction, a two-layer construction, etc.). A bending magnet 56 can be used to deliver the beam to the target assembly (e.g., positioned near the treatment chamber) 200. A quadrupole magnet 72 can be included to subsequently focus the beam to a specific dimension at the target. The beam is then passed through one or more scanning magnets 74, which causes the beam to move laterally across the target surface in a desired pattern (e.g., spirals, bends, staircases in rows and columns, combinations thereof, etc.). Lateral beam movement helps achieve a smooth and uniform temporal distribution of the proton beam on the lithium target, thereby preventing overheating and ensuring that neutron generation within the lithium layer is as uniform as possible.

[0050] After entering the scanning magnet 74, the beam can be transmitted to a current monitor 76 for measuring the beam current. A gate valve 77 can be used to physically separate the target assembly 200 from the HEBL volume. The primary function of the gate valve is to separate the vacuum volume of the beamline from the target when loading the target and / or replacing a used target with a new one. In this embodiment, the beam is not bent 90 degrees by the magnet 56, but rather flows directly towards... Figure 1B The beam travels to the right and then enters a quadrupole magnet 52 located in the horizontal beam. The beam can then be bent to the desired angle by another bending magnet 58, depending on the building and room construction. Alternatively, the bending magnet 58 can be replaced with a Y-shaped magnet to split the beam in two directions for two different treatment rooms located on the same floor.

[0051] Figure 2 An example of a pre-accelerator system or ion beam implanter used with embodiments of the present disclosure is shown. In this example, the pre-accelerator system 20 (e.g., LEBL 14) includes a single lens 30 (not shown), a pre-accelerator tube 26, and a solenoid 510, and is configured to accelerate a negative ion beam injected from an ion source 12. The pre-accelerator system 20 is configured to provide the energy required to accelerate the beam particles to the tandem accelerator 16 and to provide overall focusing of the negative ion beam to match the input aperture or inlet area of ​​the tandem accelerator 16. The pre-accelerator system 20 is also configured to minimize backflow or defocusing backflow when refluxing from the tandem accelerator 16 through the pre-accelerator system, in order to reduce the possibility of damage to the ion source 12 and / or backflow to the filament of the ion source.

[0052] In one embodiment, the ion source 12 may be configured to provide a negative ion beam upstream of the single lens 30, and the negative ion beam continues through the pre-accelerator tube 26 and the magnetic focusing device (e.g., a solenoid) 510. The solenoid 510 may be positioned between the pre-accelerator tube 26 and the tandem accelerator 16 and may be electrically connected to a power source. The negative ion beam reaches the tandem accelerator 16 through the solenoid 510.

[0053] The pre-accelerator system 20 may also include an ion source vacuum chamber 24 for gas removal and a pump chamber 28, the pump chamber 28 being part of a relatively low-energy beamline leading to the tandem accelerator 16, along with the pre-accelerator tube 26 and the other aforementioned components. A single lens 30 may be positioned within the ion source vacuum chamber 24, which extends from the ion source 12. The pre-accelerator tube 26 may be coupled to the ion source vacuum chamber 24 and the solenoid 510. The vacuum pump chamber 28 for gas removal may be coupled to the solenoid 510 and the tandem accelerator 16. The ion source 12 serves as a source of charged particles that, when conveyed to a neutron generator, can be accelerated, tuned, and ultimately used to generate a neutron target. Exemplary embodiments will be described herein with reference to an ion source that generates a negative hydrogen ion beam, but the embodiments are not limited thereto, and the source may generate other positive or negative particles.

[0054] The pre-accelerator system 20 may have zero or one or more magnetic elements for purposes such as focusing and / or adjusting beam alignment. For example, any such magnetic element may be used to match the beam to the beamline axis and the receiving angle of the tandem accelerator 16. The ion vacuum chamber 24 may have ion optics positioned therein.

[0055] Negative ion sources 12 are generally of two types based on their mechanisms of negative ion generation: surface-type and volumetric-type. Surface-type sources typically require the presence of cesium (Cs) on a specific inner surface. Volumetric-type sources rely on the formation of negative ions within a volume of high-current discharge plasma. While both types of ion sources can deliver the required negative ion current for applications associated with tandem accelerators, surface-type negative ion sources are not suitable for modulation. That is, for the modulation of the negative ion beam in the embodiments described herein, a volumetric negative ion source (e.g., without cesium (Cs)) is preferred.

[0056] Injector system (e.g., pre-accelerator system 20; e.g., LEBL 14) Can The beam generation, beam formation, beam delivery, and beam matching with the accelerator system (e.g., 16) are achieved. The beam energy in the injector system (e.g., pre-accelerator system 20; e.g., LEBL 14) can be relatively small (e.g., 50–200 keV), which reduces the likelihood of irreversible injector system damage in the event of beam misalignment (e.g., direct beam-wall interaction). However, beam misalignment in the injector system (e.g., 20, 14) can lead to serious consequences associated with beam delivery downstream of the injector system (e.g., downstream of accelerator 16 and HEBL 18). Misaligned (e.g., mismatched) beams can be the root cause of machine performance degradation or even malfunction and damage.

[0057] In embodiments, beam misalignment in an injector system (e.g., pre-accelerator system 20; e.g., LEBL 14) can be detected based on current measurements obtained from one or more magnetic elements of the beam injector system (e.g., 20, 14). That is, the performance of magnetic ion optics, orientation control magnet shifters, magnetic elements, or solenoids can be monitored via time-resolved current readings. Deviations from nominal conditions or alignment current ranges obtained from these components in current measurements can indicate beam misalignment through the injector system.

[0058] In an embodiment, beam misalignment in an injector system (e.g., pre-accelerator system 20; e.g., LEBL 14) can be detected by obtaining voltage measurements from at least one biasing component of the beam injector system (e.g., 20, 14). That is, the performance of one or more biasing components, such as an ion source (e.g., 12), a pre-accelerator tube (e.g., 26), or an electrostatic lens (e.g., 30), can be evaluated or monitored via time-resolved readings of the applied voltage values ​​associated with each component. Deviations from nominal conditions or from the alignment voltage range obtained from these components can indicate beam misalignment through the injector system.

[0059] For example, the embodiments described herein may be determined to be beam misalignment propagating through the beam injector when at least one current measurement obtained from at least one magnetic element of the beam injector deviates from the alignment current range. Alternatively or additionally, the embodiments herein may be determined to be beam misalignment propagating through the beam injector when at least one voltage measurement obtained from at least one biasing component of the beam injector deviates from the alignment voltage range.

[0060] The embodiments described herein can be implemented using one or more beam position monitors along the beam injector system. Figure 2 (Not shown in the text) to further achieve redundancy in beam misalignment detection in the beam injector system. The embodiments described herein can be achieved by using one or more scraper components (not shown in the text) along the beam injector system. Figure 2 (Not shown in the image) to further redundancy the beam misalignment detection in the beam injector system. Each scraper member can be configured as a plate, panel, or pillar extending very close to the beam. This plate, panel, or pillar can be configured to surround the beam, for example, it can have an aperture through which the beam passes. Annular members are also suitable. Deviation of the beam from its optimal axis can cause the beam or its corona to impact the scraper member.

[0061] Beam misalignment detection in a beam injector system can be determined based on the presence of signals (e.g., current measurements) obtained from the magnetic elements of the beam injector that violate conditions indicating beam misalignment (e.g., deviation from a threshold of nominal conditions, or deviation from an alignment current range). Beam misalignment detection in a beam injector system can be determined based on the presence of signals (e.g., voltage measurements) obtained from the biasing components of the beam injector that violate conditions indicating beam misalignment (e.g., deviation from a threshold of nominal conditions, or deviation from an alignment voltage range). Beam misalignment detection in a beam injector system can be determined based on signals indicating beam deviation from the axis received from a beam position monitor. Beam misalignment detection in a beam injector system can be determined based on measurement signals from one or more scraper components. Beam misalignment detection in a beam injector system can be further determined based on a combination of two or more of the aforementioned conditions, and in some embodiments, beam misalignment can be determined only if two or more misalignment conditions are met.

[0062] Control system (reference) Figure 7 (Description) can be configured to adjust beam parameters or interrupt beam propagation or system operation based on any of the above determinations or detections.

[0063] Turning Figure 3 An exemplary beam position monitor (BPM) (e.g., or fast beam position monitor) 300 includes a cylindrical wall 302 extending between a pair of flanges 304 adapted to mount the beam position monitor (BPM) 300 along a beamline (e.g., a low-energy beamline (LEBL) 14 (e.g., a pre-accelerator or injector system 20), accelerator 16, high-energy beamline (HEBL) 100). In an example where the beam position monitor (BPM) 300 is mounted along a low-energy beamline (LEBL), the beam position monitor (BPM) 300 may be mounted between a pre-accelerator tube 26 and a pump chamber 28. The beam position monitor (BPM) 300 may be electrically connected via one or more wire connectors (310). Operation of the beam position monitor (BPM) 300 may be based on the collection of corona current by electrodes 306 protruding from the wall 302 and extending into the beamline interior space. In an exemplary embodiment, the electrodes 306 may be cooled by one or more cooling devices. In an exemplary embodiment, one or more cooling devices may include water cooling devices (e.g., water cooling pipe 308).

[0064] exist Figure 3In this embodiment, the beam position monitor (BPM) 300 is shown to include four electrodes 306, but the embodiment is not limited to four electrodes (e.g., any number of electrodes may be used within the scope of this disclosure). The electrodes 306 are preferably shaped as cylinders and made of one or more of tantalum (Ta) or tungsten (W) to increase resistance to heat flux. The electrodes 306 may also be made of composite materials of different shapes capable of withstanding the heat load generated by the beam. The insertion length of the electrodes 306 (e.g., the distance the electrode extends into the internal space of the beam) can be individually adjusted for each electrode 306 (e.g., using...). Figure 3 The control system (not shown) allows users to adapt the beam position monitor (BPM) 300 to beams of any size. Electrode 306 is designed to be exposed to the beam corona current, thus the expected power flux collected is much lower. Furthermore, the plasma formed near the beam-residual gas interaction region extends to the outer boundary of the beam, thereby generating an additional signal for the beam position monitor (BPM) 300.

[0065] Electrode 306 is current-isolated from BPM wall 302 and biased using an external power supply. Biasing relative to BPM wall 302 a) reduces the contribution of secondary electron emission (SEE) current to the signal and b) increases the corona current collected from the plasma generated by the beam.

[0066] While the beam system is operating and the beam is being extracted from a source (e.g., 12) and propagated through components (e.g., 20(14), 16, 18, 100) of an exemplary beam system (e.g., 10), the beam position monitor (BPM) 300 enables the control system to actively monitor the beam position. Each electrode 306 may have an associated current threshold (e.g., signal threshold). When the current (e.g., signal) collected by a given electrode exceeds its current threshold, the beam may be considered to have deflected too far toward that electrode and thus off-axis. The beam position monitor (300) may provide an indication to the control system that the current collected by the electrode has exceeded its current threshold, and the control system may adjust parameters of one or more components of the entire beam system (e.g., 10) to move the beam back onto the axis. Examples of adjustable parameters may include inputs provided to a beam direction control magnet such that the position of the beam direction control magnet is changed to move the beam back onto the desired axis. In this way, the beam position monitor (BPM) 300, together with the control system, continuously / repeatedly and in real time provides feedback to the beam direction control magnet and / or other components of the beam system.

[0067] In an embodiment, the current threshold associated with a given electrode may differ from the current threshold associated with another electrode of the beam position monitor (300). Furthermore, a given electrode may have multiple current thresholds associated with it for more precise beam position detection. That is, multiple current thresholds may be used with the electrodes of the beam position monitor (300). Movement of the beam off-axis in the direction between the electrodes can be detected based on multiple current thresholds associated with adjacent electrodes.

[0068] For example, a pair of adjacent electrodes may each record an increase in signal level (e.g., collected current); however, the increase in signal level may exceed a second lower current threshold associated with each of the adjacent electrodes. In such an example, a signal level exceeding the second lower current threshold associated with each of the adjacent electrodes may indicate the off-axis direction of the beam between the electrodes.

[0069] Therefore, the control system can adjust the beam direction control magnet based on an indication that the signal level exceeds a single threshold of a single electrode of the beam position monitor (BPM) 300 or based on an indication that the signal level exceeds two lower thresholds of adjacent electrodes.

[0070] Furthermore, the control system can monitor signal values ​​on each electrode and extrapolate beam deflection degrees in a specific direction based on these signal values ​​(e.g., independently of one or more current thresholds associated with the electrode, or a combination thereof). The control system can then adjust the beam orientation control magnet or other parameters based on the extrapolated beam deflection degrees to compensate for the beam deflection and bring the beam back to its desired axis. In such examples, the control system can continuously and in real-time adjust beamline parameters, such as the position of the beam orientation control magnet, based on the detected minimum deflection amount (e.g., a deflection threshold).

[0071] Turning Figure 4A The ion source vacuum box 24 of the ion beam implanter 20 (14) includes a single lens 30 positioned therein. Figure 4B As shown in detail, the single lens 30 downstream of the grounding lens 25 of the ion source 12, installed within the vacuum chamber 24, includes a mounting plate 32, two grounding electrodes 34 coupled to each other and spaced apart from each other by a mounting rod 35, and a energized (biased) electrode 38 positioned between the two grounding electrodes 34. Electrodes 34 and 38 are configured as cylindrical apertures and assembled to have an axial axis coinciding with the beam path. The energized electrode 38 is supported by a spacer (or insulator) 36 extending between the grounding electrodes or the aperture 34.

[0072] The support isolator 36 may have a geometry configured to prevent the development of electron avalanche and suppress the formation and propagation of streamers that could cause flashover. The geometry of the support isolator 36 can partially shield the external electric field on the insulator surface that drives electron avalanche and effectively increase the path length. Additionally, the material of the insulator / isolator 36 tends to reduce sputtering effects, loss of negative ions on the surface, volume contamination, and the formation of conductive coatings on the insulator or isolator surface that reduce electrical strength.

[0073] Functionally, the single lens 30 acts on the beam of charged particles advancing from the ion source 12 similarly to the function of an optical focusing lens on a beam. That is, the single lens 30 focuses the incident diverging beam to a point on the focal plane. However, the electric field formed here between the paired energized electrodes 38 and the two grounded electrodes 34 determines the focusing intensity (focal length) of the single lens. By mounting the single lens 30 downstream of the ion source grounded lens 25, it reduces beam free-space transport, where the beam diverges due to its inherent space charge. The dimensions of the axisymmetric or approximately axisymmetric design of the single lens 30 are optimized to avoid direct interaction between the extracted ions and the exposed surface of the single lens 30.

[0074] Figure 5An exemplary pre-accelerator tube 26 for use with embodiments of the present disclosure is illustrated. The exemplary pre-accelerator tube 26 may be cylindrical and includes a first pre-accelerator tube end 26A and a second pre-accelerator tube end 26B. In an embodiment, the first pre-accelerator tube end 26A includes a retainer (e.g., a terminal or electrode) projecting outward from an internal cylindrical structure of the pre-accelerator tube. In an embodiment, the second pre-accelerator tube end 26B includes a retainer (e.g., a terminal or electrode) projecting outward from an internal cylindrical structure of the pre-accelerator tube. That is, the retainer projecting outward from the internal cylindrical structure of the pre-accelerator tube is cylindrical, but may have a diameter larger than the diameter of the internal cylindrical structure. In an embodiment, the pre-accelerator tube 26 includes a plurality of pre-accelerator tube terminals 27-1, 27-2, 27-3, 27-4, 27-5, 27-6, which are evenly spaced from the first pre-accelerator tube end 26A to the second pre-accelerator tube end 26B. In some embodiments, the first pre-accelerator tube end 26A may be referred to as the proximal pre-accelerator tube end 26A, while the second pre-accelerator tube 26B is the distal pre-accelerator tube end 26B. One or more resistors may be connected between each pair of adjacent pre-accelerator tube terminals (e.g., pre-accelerator tube terminals 27-1, 27-2, 27-3, 27-4, 27-5, 27-6), and each resistor may have the same (preferably) or different resistance values. In an embodiment, the first terminal 27-1 at the first pre-accelerator tube end 26A may be electrically connected to a first power supply, while the second terminal 27-2 at the second pre-accelerator tube end 26B may be electrically grounded. Therefore, voltage can be evenly distributed across the pre-accelerator tubes 26.

[0075] Figure 6 Exemplary operations associated with exemplary embodiments of this disclosure are illustrated. Turning to the detection of beam misalignment in an accelerator system (e.g., 16), where charged particles of a beam are accelerated to a desired energy, this embodiment of the accelerator system (e.g., 16) relies on stripping two electrons from each negative ion during a charge exchange process to generate a beam with energy doubled from the applied voltage. After optimization for efficient beam transport, acceleration, and electron stripping, the exemplary accelerator system may have conditions (strong electric field, space confinement, high potential) that prevent the use of direct beam diagnostic devices. Such conditions would make beam monitoring within an accelerator system (e.g., 16) a very difficult task.

[0076] Due to the high voltage applied to the accelerating electrodes (e.g., 601A, 601B, 601C, 601D), the accelerator system (e.g., 16) is characterized by the presence of dark current even without beam delivery. Compared to other particle accelerators, tandem accelerators rely on charge stripping to achieve the tandem acceleration of particles. Therefore, the vacuum conditions within the tandem promote the interaction between the beam and the charge-exchange medium (e.g., argon), leading to the development of dark current. This process can result in incomplete voltage breakdown events that affect beam energy. While the tandem accelerator can continue to operate, the accelerated beam is no longer safe for downstream beamline components and should be discontinued.

[0077] The embodiments described herein enable multiple beam loss detection points within an accelerator system (e.g., 16) to detect beam-wall interactions and limit them to sub-millisecond durations. The control system may consider one or more of these detection points to determine whether the beam is misaligned (e.g., beam-wall interactions exist), whether to send a signal to one or more beamline components to adjust beam parameters, or whether to send a signal to one or more beamline components to interrupt beam or beam system operation.

[0078] like Figure 6 As shown, beam current monitors 603A and 603B (e.g., non-invasive diagnostic devices) can be used to monitor the total beam current upstream and downstream of accelerator system 16, respectively. The difference in the measured current obtained by beam current monitors 603A and 603B can indicate the beam loss experienced within accelerator system 16.

[0079] For example, comparing the input beam current and the output beam current can represent beam loss in an accelerator system.

[0080]

[0081] Where CM represents the current monitor (e.g., 603A, 603B), SM represents the scraper component (e.g., 610A, 610B), LEBL represents the low-energy beamline, and HEBL represents the high-energy beamline. For example, This could be the current measured at a current monitor located between the LEBL and the accelerator system (e.g., 603A in this example), and This could be the current measured at a current monitor located between the HEBL and the accelerator system (e.g., 603B in this example). Continuing with the example, This can be the current measured at the scraper component located between the LEBL and the accelerator system (e.g., 610A in this example), and This can be the current measured at the scraper component located between the LEBL and the accelerator system (e.g., 610B in this example). Current monitors or monitors 612A and 612B can be used to measure the current at the scraper components 610A and 610B, respectively. For simplicity, the charge exchange process (stripping) efficiency can be assumed to be 100%; however, it can be factored in... In the item. The threshold or alignment range can be compared with... This correlation allows deviations within a given range to be considered tolerable. Deviations exceeding a given threshold or alignment range are considered signals of beam misalignment.

[0082] A first scraper member 610A may be positioned at the inlet or input aperture of the accelerator system 16, and a second scraper member 610B may be positioned at the outlet or output aperture of the accelerator system 16. In an exemplary embodiment, scraper members 610A and 610B may be configured to cut off or reduce the corona current and function as limiters. The first scraper member 610A, positioned at the inlet or input aperture, may be configured to absorb most of the beam current. Scraper members 610A and 610B are preferably configured to measure the ingress flux of charged particles (e.g., current). Both members 610A and 610B may be biased to suppress secondary emissions and configured to signal or provide an indication of the collected current to the control system.

[0083] The power supply output voltage and current of accelerator system 16 can also be measured and monitored as part of beam misalignment detection. Measurements include the electron-stripping accelerator (e.g., string) current:

[0084]

[0085] If parasitic discharges occur inside the accelerator system, the above equation will not hold. Therefore, condition I can be... tandem ≥α(I in +I out The interlocking cause (e.g., a beam misalignment signal) is designated as the cause of beam interruption because incomplete breakdown of the accelerator system is likely to occur. Here, α can be adjusted or configured based on the accelerator system power supply characteristics, beam current, beam current energy, etc., to ensure safe beam current delivery. Alternatively, the beam loss can be expressed as:

[0086] or

[0087] This makes it possible to redundantly estimate beam loss via accelerator current measurements.

[0088] The flow rate and temperature of the coolant in the charge exchange device can also be measured at the inlet and outlet within the accelerator system 16. During long-term operation of the accelerator system 16, beam losses within the charge exchange (CEX) device 605, which has or includes a charge exchange medium, can also be estimated via exemplary heat balance equations.

[0089]

[0090] in And P cool =q·c p ·ρ·dT,

[0091] therefore

[0092] Here, q is the flow rate of the coolant (oil), and c... p ρ and dT are the specific heat and density of the oil, respectively, and E is the temperature difference between the inlet (e.g., IN) and outlet (e.g., OUT) of the coolant. beam This refers to the energy of the particles impacting the CEX device 605. These indirectly measured beam losses on the charge exchange device 605 can be used to set the interlock (e.g., a misalignment signal or threshold, or a threshold used to interrupt beam propagation) to... and δ, β, and γ are adjustable parameters. The CEX device 605... Figure 6 The device is configured as a tubular member in which the charge exchange medium is introduced and temporarily held before escaping into the vacuum environment of the accelerator. The CEX device 605 can be configured in other ways, such as having any structure with an internal volume sufficient to at least temporarily hold or guide the flow of the charge exchange medium.

[0093] Figure 7 This is a block diagram depicting an exemplary embodiment of a control system that can be operated according to embodiments of the present disclosure. For example, the illustrated exemplary system includes a beam system 10 and one or more computing devices 3002. In an embodiment, the beam system 10 may be part of an exemplary neutron beam system (e.g., system 10 described above). In such embodiments, the beam system 10 may employ one or more control systems 3001A with which one or more computing devices 3002 can communicate to interact with the system and components of the beam system 10 (e.g., neutron beam system 10). Each of these devices and / or systems is configured to communicate directly with each other or via a local network (e.g., network 3004).

[0094] The computing device 3002 may be embodied in various user devices, systems, computing equipment, etc. For example, a first computing device 3002 may be a desktop computer associated with a specific user, another computing device 3002 may be a laptop computer associated with a specific user, and yet another computing device 3002 may be a mobile device (e.g., a tablet computer or a smart device). Each of the computing devices 3002 may be configured to communicate with the beam system 10, for example, through a user interface accessible via the computing device. For example, a user may execute a desktop application on the computing device 3002, which is configured to communicate with the beam system 10.

[0095] By communicating with the beam system 10 using the computing device 3002, a user can provide operating parameters (e.g., operating voltage, etc.) for the beam system 10 according to the embodiments described herein.

[0096] The control system 3001A can be configured to receive measurement results, signals, or other data from components of the beam system 10. For example, the control system 3001A can receive a signal indicating beam misalignment through the beam system 10 from an exemplary misalignment detection system 3010. Depending on the degree of misalignment or the signal, the control system 3001A can provide adjustments to the inputs of one or more beamline components 3020 to change the position of the beam according to the methods described herein. The control system 3001A can also, or alternatively, stop or interrupt beam propagation, for example, by means of an extraction electrode on an unbiased ion source. The control system 3001A can also output an indication of beam misalignment or the degree of beam misalignment to a computing device 3002 (and a user). Similarly, the control system 3001A can provide information collected from any component of the beam system 10, including the misalignment detection system 3010, directly or via a communication network 3004 to the computing device 3002.

[0097] The communication network 3004 may include any wired or wireless communication network, such as a wired or wireless local area network (LAN), personal area network (PAN), metropolitan area network (MAN), wide area network (WAN), etc., and any hardware, software, and / or firmware required to implement it (e.g., network routers, etc.). For example, the communication network 3004 may include 802.11, 802.16, 802.20, and / or WiMax networks. Furthermore, the communication network 3004 may include public networks such as the Internet, private networks such as intranets, or combinations thereof, and may utilize various networking protocols now available or developed in the future, including but not limited to TCP / IP based on networking protocols.

[0098] The computing device 3002, the misalignment detection system 3010, and the control system 3001A can be embodied by one or more computing systems, for example Figure 8 The device shown is 3100. (As shown) Figure 8As shown, device 3100 may include processor 3102, memory 3104, input and / or output circuitry 3106, and communication means or circuitry 3108. It should also be understood that some of these components 3102-3108 may include similar hardware. For example, both components may leverage the same processor, network interface, storage medium, etc., to perform their associated functions, thus avoiding the need for duplicate hardware for each device. Therefore, the use of the terms "means" and / or "circuitry" as used herein with respect to components of a device may encompass specific hardware configured with software to perform functions associated with that particular device, as described herein.

[0099] The terms "device" and / or "circuit" should be broadly understood to include hardware, and in some embodiments, the device and / or circuit may also include software for configuring the hardware. For example, in some embodiments, the device and / or circuit may include processing circuitry, storage media, network interfaces, input / output devices, etc. In some embodiments, other elements of the device 3100 may provide or supplement the functionality of a particular device. For example, the processor 3102 may provide processing functionality, the memory 3104 may provide storage functionality, the communication device or circuit 3108 may provide network interface functionality, and so on.

[0100] In some embodiments, processor 3102 (and / or coprocessor or auxiliary processor or any other processing circuitry otherwise associated with the processor) may communicate with memory 3104 via a bus to transfer information between components of the device. Memory 3104 may be non-transitory and may include, for example, one or more volatile and / or non-volatile memories. In other words, for example, memory may be an electronic storage device (e.g., a computer-readable storage medium). Memory 3104 may be configured to store information, data, content, applications, instructions, etc., to enable the device to perform various functions according to exemplary embodiments of the present disclosure.

[0101] The processor 3102 may be embodied in a variety of different ways and may, for example, include one or more processing devices configured to operate independently. Additionally or alternatively, the processor may include one or more processors configured in series via a bus to enable independent execution of instructions, pipelining, and / or multithreading. The use of the terms "processing device" and / or "processing circuitry" is to be understood to include single-core processors, multi-core processors, multiple processors within a device, and / or remote or "cloud" processors.

[0102] In one exemplary embodiment, processor 3102 may be configured to execute instructions stored in memory 3104 or accessible to the processor. Alternatively or additionally, the processor may be configured to perform hard-coded functions. Thus, whether configured by hardware or software methods, or by a combination of hardware and software, the processor may represent an entity (e.g., physically embodied in circuitry) capable of performing operations according to embodiments of this disclosure simultaneously in a given configuration. Alternatively, as another example, when the processor is embodied as an executor of software instructions, the instructions may specifically configure the processor to perform the algorithms and / or operations described herein when the instructions are executed.

[0103] In some embodiments, device 3100 may include an input / output device 3106, which may communicate with processor 3102 to provide output to a user and, in some embodiments, receive input from the user. Input / output device 3106 may include a user interface and may include a device display, such as a user device display that may include a web user interface, mobile application, client device, etc. In some embodiments, input / output device 3106 may also include a keyboard, mouse, joystick, touchscreen, touch area, softkeys, microphone, speaker, or other input / output mechanism. The processor and / or user interface circuitry including the processor may be configured to control one or more functions of one or more user interface elements via computer program instructions (e.g., software and / or firmware) stored in processor-accessible memory (e.g., memory 3104, etc.).

[0104] The communication device or circuit 3108 can be any device, such as device circuitry embodied in hardware or a combination of hardware and software, configured to receive and / or transmit data from / to a network and / or any other device or circuitry communicating with device 3100. In this regard, the communication device or circuit 3108 may include, for example, a network interface for enabling communication with wired or wireless communication networks. For example, the communication device or circuit 3108 may include one or more network interface cards, antennas, buses, switches, routers, modems, and supporting hardware and / or software, or any other means suitable for enabling communication via a network. Additionally or alternatively, the communication interface may include circuitry for interacting with an antenna to induce the transmission of signals via the antenna or for processing signals received via the antenna. These signals may be transmitted by device 3100 using any of a variety of wireless personal area network (PAN) technologies, such as current and future Bluetooth standards (including Bluetooth and Bluetooth Low Energy (BLE)), infrared wireless (e.g., IrDA), FREC, ultra-wideband (UWB), inductive wireless generation, etc. Additionally, it should be understood that these signals can be transmitted using Wi-Fi, Near Field Communication (NFC), Global Microwave Access Interoperability (WiMAX), or other short-range-based communication protocols.

[0105] Any such computer program instructions and / or other type of code can be loaded onto the circuitry of a computer, processor, or other programmable device to produce a machine, such that the computer, processor, or other programmable circuitry executing the code on the machine creates means to implement a variety of functions—including those described herein.

[0106] As described above, embodiments of this disclosure can be configured as systems, methods, mobile devices, backend network devices, etc. Therefore, embodiments can include various architectures, including entirely hardware or any combination of software and hardware. Furthermore, embodiments can take the form of a computer program product on at least one non-transitory computer-readable storage medium having computer-readable program instructions (e.g., computer software) embodied in the storage medium. Any suitable computer-readable storage medium can be used, including non-transitory hard disks, CD-ROMs, flash memory, optical storage devices, or magnetic storage devices.

[0107] Processing circuitry used in conjunction with embodiments of the present disclosure may include one or more processors, microprocessors, controllers, and / or microcontrollers, each of which may be discrete chips or distributed across multiple different chips (and portions thereof). Processing circuitry used in conjunction with embodiments of the present disclosure may include a digital signal processor, which may be implemented in the hardware and / or software of the processing circuitry used in conjunction with embodiments of the present disclosure. Processing circuitry used in conjunction with embodiments of the present disclosure may be communicatively coupled to other components of the accompanying drawings. Processing circuitry used in conjunction with embodiments of the present disclosure may execute software instructions stored in memory that cause the processing circuitry to take a variety of different actions and control other components of the accompanying drawings.

[0108] Memory used in conjunction with embodiments of this disclosure may be shared by one or more of various functional units, or may be distributed among two or more of them (e.g., as separate memory located within different chips). The memory itself may also be a separate chip. The memory may be non-transitory and may be volatile memory (e.g., RAM, etc.) and / or non-volatile memory (e.g., ROM, flash memory, F-RAM, etc.).

[0109] Computer program instructions that perform operations according to the described subject can be written in any combination of one or more programming languages, including object-oriented programming languages ​​such as Java, JavaScript, Smalltalk, C++, C#, Transact-SQL, XML, PHP, etc., as well as traditional procedural programming languages ​​such as the "C" programming language or similar programming languages.

[0110] The following review and / or supplementation of the embodiments described to date illustrates various aspects of this subject matter, with emphasis placed on the interrelationships and interchangeability of the following embodiments. In other words, emphasis is placed on the fact that each feature of the embodiments can be combined with every other feature, unless expressly stated otherwise or logically implausible.

[0111] In some embodiments, a method for detecting beam misalignment in a beam injector includes obtaining at least one current measurement from at least one magnetic element of the beam injector and at least one voltage measurement from at least one biasing component of the beam injector. In some of these embodiments, the method further includes determining that beam misalignment propagating through the beam injector occurs when one or more of the at least one current measurement obtained from at least one magnetic element of the beam injector deviates from an alignment current range or when at least one voltage measurement obtained from at least one biasing component of the beam injector deviates from an alignment voltage range.

[0112] In some embodiments of these examples, the beam injector includes a beam position monitor. In some embodiments of these examples, the method further includes determining beam misalignment propagating through the beam injector when an output signal from the beam position monitor indicates that a signal at one or more individual electrodes of the beam position monitor violates a condition. In some embodiments of these examples, the method further includes determining beam misalignment propagating through the beam injector when an output signal from the beam position monitor indicates that a first value of current at one or more individual electrodes of the beam position monitor exceeds or falls below a first current threshold.

[0113] In some of these embodiments, the beam injector includes one or more scraper members. In some of these embodiments, the method further includes obtaining one or more measurements from at least one of the one or more scraper members and determining that beam misalignment propagating through the beam injector occurs when the one or more measurements obtained from at least one scraper member deviate from an alignment threshold.

[0114] In some of these embodiments, the at least one magnetic element includes a beam direction control magnet or a solenoid.

[0115] In some of these embodiments, the at least one biasing component includes an ion source, a pre-accelerator tube, or an electrostatic lens.

[0116] In some of these embodiments, the beam injector injects a beam into the accelerator system.

[0117] In some of these embodiments, the method further includes stopping beam propagation through the beam injector when beam misalignment is determined.

[0118] In some of these embodiments, the method further includes sending a beam misalignment signal to a control system or computing device when a beam misalignment is determined to be present.

[0119] In some embodiments, a system for detecting beam misalignment in a beam injector includes a beam injector and a control system, the control system including at least one processor and at least one memory storing instructions, the instructions, together with the at least one processor, configuring the control system to obtain at least one current measurement from at least one magnetic element of the beam injector and at least one voltage measurement from at least one biasing component of the beam injector. In some of these embodiments, the at least one memory stores instructions, together with the at least one processor, further configuring the control system to determine that beam misalignment propagating through the beam injector occurs when one or more of the at least one current measurement obtained from at least one magnetic element of the beam injector deviates from an alignment current range or when at least one voltage measurement obtained from at least one biasing component of the beam injector deviates from an alignment voltage range.

[0120] In some of these embodiments, the beam injector includes a beam position monitor.

[0121] In some of these embodiments, the at least one memory stores instructions that, together with the at least one processor, further configure the control system to determine that a beam misalignment propagating through the beam injector occurs when an output signal from the beam position monitor indicates that a signal at one or more individual electrodes of the beam position monitor violates a condition.

[0122] In some of these embodiments, the at least one memory stores instructions that, together with the at least one processor, further configure the control system to determine that a beam misalignment propagating through the beam injector occurs when an output signal from the beam position monitor indicates that a first current value at one or more individual electrodes of the beam position monitor exceeds or falls below a first current threshold.

[0123] In some of these embodiments, the beam injector includes one or more beam scraper components.

[0124] In some of these embodiments, the at least one memory stores instructions that, together with the at least one processor, further configure the control system to obtain one or more measurement results from at least one of the one or more scraper components, and to determine that a beam misalignment propagating through the beam injector occurs when the one or more measurement results obtained from at least one scraper component deviate from an alignment threshold.

[0125] In some of these embodiments, the at least one magnetic element includes a beam direction control magnet or a solenoid.

[0126] In some of these embodiments, the at least one biasing component includes an ion source, a pre-accelerator tube, or an electrostatic lens.

[0127] In some of these embodiments, the beam injector is configured to inject a beam into the accelerator system.

[0128] In some of these embodiments, the at least one memory stores instructions that, together with the at least one processor, further configure the control system to stop beam propagation through the beam injector when beam misalignment is determined.

[0129] In some of these embodiments, the at least one memory stores instructions that, together with the at least one processor, further configure the control system to send a beam misalignment signal to a computing device when a beam misalignment is determined.

[0130] In some embodiments, a method for detecting beam misalignment in an accelerator system includes: obtaining an input beam current at an input aperture of the accelerator system, obtaining an output beam current at an output aperture of the accelerator system, and determining that beam misalignment propagating through the accelerator system occurs when the difference between the output beam current and the input beam current indicates beam loss exceeding a beam loss threshold.

[0131] In some of these embodiments, the input beam current is determined by measurements from a first current monitor and a first beam scraper component.

[0132] In some of these embodiments, the output beam current is determined by measurements from a second current monitor and a second beam scraper component.

[0133] In some of these embodiments, the method further includes sending a beam misalignment signal to a control system or computing device.

[0134] In some of these embodiments, the method further includes sending a signal to a control system or computing device the difference between the output beam current and the input beam current.

[0135] In some of these embodiments, the method further includes interrupting beam propagation when it is determined that the beam is misaligned.

[0136] In some embodiments, a method for detecting beam misalignment in an accelerator system includes: obtaining the input beam current at the input aperture of the accelerator system, obtaining the output beam current at the output aperture of the accelerator system, and determining that beam misalignment propagating through the accelerator system occurs when the difference between the current of the accelerator system and the sum of the output beam current and the input beam current is greater than zero.

[0137] In some of these embodiments, the input beam current is composed of measurements from a first current monitor and measurements from a first beam scraper component.

[0138] In some of these embodiments, the output beam current is composed of measurements from a second current monitor and a second beam scraper component.

[0139] In some of these embodiments, the method further includes sending a beam misalignment signal to a control system or computing device.

[0140] In some of these embodiments, the method further includes sending a signal to a control system or computing device the difference between the output beam current and the input beam current.

[0141] In some of these embodiments, the method further includes interrupting beam propagation when it is determined that the beam is misaligned.

[0142] In some embodiments, a method for detecting beam misalignment in an accelerator system includes obtaining the flow rate of coolant in a target exchange cooling device of the accelerator system, the energy of particles impacting the charge exchange cooling device of the accelerator system, and the temperature difference of coolant between the inlet and outlet of the charge exchange cooling device. In some embodiments of these embodiments, the method further includes determining that beam misalignment propagating through the accelerator system occurs when a beam loss calculated based on the flow rate, energy, and temperature difference exceeds a beam loss threshold.

[0143] In some of these embodiments, the method further includes sending a beam misalignment signal to a control system or computing device.

[0144] In some of these embodiments, the method further includes sending signals of flow rate, energy, and temperature difference to a control system or computing device.

[0145] In some of these embodiments, the method further includes interrupting beam propagation when it is determined that the beam is misaligned.

[0146] In some embodiments, a method for detecting beam misalignment in an accelerator system includes: obtaining the input beam current at the input aperture of the accelerator system, obtaining the output beam current at the output aperture of the accelerator system, or obtaining the flow rate of the coolant in the charge exchange cooling device of the accelerator system, the energy of particles impacting the charge exchange cooling device of the accelerator system, and the temperature difference of the coolant between the inlet and outlet of the charge exchange cooling device. In some embodiments of these embodiments, the method further includes one or more of the following: determining beam misalignment propagating through the accelerator system when the difference between the output beam current and the input beam current indicates a beam loss exceeding a beam loss threshold; or determining beam misalignment propagating through the accelerator system when the difference between the current of the accelerator system and the sum of the output beam current and the input beam current is greater than zero; or determining beam misalignment propagating through the accelerator system when the beam loss calculated based on the flow rate, energy, and temperature difference exceeds a beam loss threshold.

[0147] In some embodiments, a system for detecting beam misalignment in an accelerator system includes an accelerator system and a control system, the control system including at least one processor and at least one memory storing instructions, the instructions together with the at least one processor configuring the control system to perform a method according to any of the foregoing embodiments.

[0148] In some of these embodiments, the system further includes a first current monitor located at the input aperture of the accelerator system and a second current monitor located at the output aperture of the accelerator system. In some of these embodiments, the system further includes a first scraper component located at the input aperture of the accelerator system and a second scraper component located at the output aperture of the accelerator system.

[0149] In some of these embodiments, the system further includes a charge exchange device and a charge exchange cooling device.

[0150] In some embodiments, a beam system includes a system for detecting beam misalignment in a beam injector as described in any of the foregoing embodiments. In some of these embodiments, the beam system further includes a system for detecting beam misalignment in an accelerator system as described in any of the foregoing embodiments.

[0151] In some embodiments, a method for detecting beam misalignment in a beam system includes detecting one or more beam misalignments in a beam injector of the beam system according to any of the methods described in the foregoing embodiments. In some embodiments of these embodiments, the method further includes detecting beam misalignment in an accelerator system of the beam system according to any of the methods described in the foregoing embodiments.

[0152] It should be noted that all features, elements, components, functions, and steps described with respect to any embodiments provided herein are intended to be freely combined and substituted with features, elements, components, functions, and steps from any other embodiment. If a feature, element, component, function, or step is described with respect to only one embodiment, it should be understood that such feature, element, component, function, or step may be used with every other embodiment described herein unless expressly stated otherwise. Therefore, this paragraph serves at all times as the basis for reference and written support of the introduction of the claims, which combine features, elements, components, functions, and steps from different embodiments, or substitute features, elements, components, functions, and steps from one embodiment for features, elements, components, functions, and steps from another embodiment, even if the following description does not expressly state that such combinations or substitutions are possible in particular circumstances. It is expressly acknowledged that a detailed description of every possible combination and substitution would be overly cumbersome, especially considering that the permissibility of each such combination and substitution will be readily apparent to those skilled in the art.

[0153] In the sense that the embodiments disclosed herein include a memory, storage device, and / or computer-readable medium, or operate in conjunction with them, the memory, storage device, and / or computer-readable medium is non-transitory. Therefore, in the sense that the memory, storage device, and / or computer-readable medium is covered by one or more claims, the memory, storage device, and / or computer-readable medium is merely non-transitory.

[0154] As used herein and in the appended claims, the singular forms “a,” “an,” and “the” include plural references unless the context clearly specifies otherwise.

[0155] While the embodiments are readily available with various modifications and alternatives, specific examples have been shown in the accompanying drawings and described in detail herein. However, it should be understood that these embodiments are not limited to the specific forms disclosed, but rather, they will cover all modifications, equivalents, and alternatives falling within the spirit of this disclosure. Furthermore, any feature, function, step, or element of the embodiments may be recited in or added to the claims, as well as to the claims or such negative limitations that define the scope of the invention by features, functions, steps, or elements not within the scope of the claims.

Claims

1. A method for detecting beam misalignment in a beam injector, the method comprising: At least one current measurement result is obtained from at least one magnetic element of the beam injector and at least one voltage measurement result is obtained from at least one biasing component of the beam injector; and When one or more of the at least one current measurement results obtained from at least one magnetic element of the beam injector deviate from the alignment current range, or when at least one voltage measurement result obtained from at least one biasing component of the beam injector deviates from the alignment voltage range, it is determined that the beam is misaligned propagating through the beam injector.

2. The method according to claim 1, wherein, The beam injector includes a beam position monitor.

3. The method according to claim 2, further comprising: When the output signal from the beam position monitor indicates that the signal at one or more individual electrodes of the beam position monitor violates a condition, it is determined that the beam is misaligned propagating through the beam injector.

4. The method of claim 2, further comprising: When the output signal from the beam position monitor indicates that the first value of the current at one or more individual electrodes of the beam position monitor exceeds or falls below a first current threshold, it is determined that the beam is misaligned propagating through the beam injector.

5. The method according to claim 1, wherein, The beam injector includes one or more beam scraper components.

6. The method of claim 5, further comprising: One or more measurement results are obtained from at least one of the one or more scraper components; and When one or more measurements obtained from at least one beam scraper component deviate from the alignment threshold, it is determined that the beam is misaligned and propagating through the beam injector.

7. The method according to any one of claims 1-6, wherein, The at least one magnetic element includes a beam direction control magnet or a solenoid.

8. The method according to claim 1, wherein, The at least one biasing component includes an ion source, a pre-accelerator tube, or an electrostatic lens.

9. The method according to claim 1, wherein, The beam injector injects a beam into the accelerator system.

10. The method of claim 1, further comprising: When a beam misalignment is detected, beam propagation through the beam injector is stopped.

11. The method of claim 1, further comprising: When a beam misalignment is detected, a beam misalignment signal is sent to the control system or computing device.

12. A system for detecting beam misalignment in a beam injector, the system comprising: Beam injector; and A control system comprising at least one processor and at least one memory storing instructions, the instructions, together with the at least one processor, configuring the control system to: Obtain at least one current measurement result from at least one magnetic element of the beam injector and at least one voltage measurement result from at least one biasing component of the beam injector; and When one or more of the at least one current measurement results obtained from at least one magnetic element of the beam injector deviate from the alignment current range, or when at least one voltage measurement result obtained from at least one biasing component of the beam injector deviates from the alignment voltage range, it is determined that the beam is misaligned propagating through the beam injector.

13. The system according to claim 12, wherein, The beam injector includes a beam position monitor.

14. The system according to claim 13, wherein, The at least one memory stores instructions, which, together with the at least one processor, further configure the control system to: When the output signal from the beam position monitor indicates that the signal at one or more individual electrodes of the beam position monitor violates a condition, it is determined that the beam is misaligned propagating through the beam injector.

15. The system according to claim 13, wherein, The at least one memory stores instructions, which, together with the at least one processor, further configure the control system to: When the output signal from the beam position monitor indicates that the first value of the current at one or more individual electrodes of the beam position monitor exceeds or falls below a first current threshold, it is determined that the beam is misaligned propagating through the beam injector.

16. The system according to claim 12, wherein, The beam injector includes one or more beam scraper components.

17. The system according to claim 16, wherein, The at least one memory stores instructions, which, together with the at least one processor, further configure the control system to: One or more measurement results are obtained from at least one of the one or more scraper components; and When one or more measurements obtained from at least one beam scraper component deviate from the alignment threshold, it is determined that the beam is misaligned and propagating through the beam injector.

18. The system according to any one of claims 12-17, wherein, The at least one magnetic element includes a beam direction control magnet or a solenoid.

19. The system according to claim 12, wherein, The at least one biasing component includes an ion source, a pre-accelerator tube, or an electrostatic lens.

20. The system according to claim 12, wherein, The beam injector is configured to inject a beam into the accelerator system.

21. The system according to claim 12, wherein, The at least one memory stores instructions, which, together with the at least one processor, further configure the control system to: When a beam misalignment is detected, beam propagation through the beam injector is stopped.

22. The system according to claim 12, wherein, The at least one memory stores instructions, which, together with the at least one processor, further configure the control system to: When a beam misalignment is detected, a beam misalignment signal is sent to the computing device.

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