Absorption device and gas treatment device

Abstract

This invention provides an absorption device, a gas treatment device, an aspiration method, and a gas treatment method. The absorption device contacts a gas to be treated containing acidic compounds with a treatment liquid that has been separated by absorbing the acidic compounds, allowing the treatment liquid to absorb the acidic compounds. The absorption device includes: an absorption container; a treatment liquid supply channel having a treatment liquid supply port open inside the absorption container for supplying treatment liquid into the absorption container; a reaction heat recovery unit configured to be immersed in the treatment liquid inside the absorption container to recover the reaction heat generated by the absorption of acidic compounds by the treatment liquid; and a gas supply channel supplying the gas to be treated to the interior of the absorption container at a position within the height range of the reaction heat recovery unit, wherein the treatment liquid supply port is configured to be located below the liquid surface of the treatment liquid during operation. Accordingly, the amount of reaction heat recovered when the treatment liquid absorbs acidic compounds can be increased.

Description

Technical Field

[0001] The present invention relates to an absorption device, a gas treatment apparatus having the absorption device, an absorption method, and a gas treatment method for performing the absorption method. Background Technology

[0002] Previously, as disclosed in, for example, Japanese Patent Publication No. 2018-187553, gas treatment apparatuses were known to separate acidic compounds by contacting them with a treatment liquid. In the gas treatment apparatus disclosed in Japanese Patent Publication No. 2018-187553, a treatment liquid was used that was phase-separated into a first phase portion with a relatively high acidic compound content and a second phase portion with a relatively low acidic compound content.

[0003] Japanese Patent Publication No. 2018-187553 discloses a gas processing apparatus comprising an absorber, a heat exchanger, a regenerator, and a heat pump. The absorber contacts exhaust gas (the gas to be processed) containing carbon dioxide with a processing liquid. The processing liquid undergoes liquid-phase separation by introducing carbon dioxide, resulting in a first phase (CO2-rich phase) with a relatively high carbon dioxide content and a second phase (CO2-lean phase) with a relatively low CO2 content. The processed liquid after liquid-phase separation is conveyed to the regenerator via the heat exchanger. The heat exchanger is positioned in the flow path connecting the absorber and the regenerator to preheat the processed liquid heading towards the regenerator. The regenerator separates carbon dioxide from the processed liquid by heating it. The carbon dioxide separated from the processed liquid is recovered through a recovery channel, while the processed liquid after releasing carbon dioxide is returned to the absorber via the heat exchanger. The heat pump has a closed-loop circulation path, an evaporator disposed within the absorber, a compressor, a condenser disposed within the regenerator, and an expander. The refrigerant circulates along the cycle path through the evaporator, compressor, condenser, and expander. The heat of reaction generated in the absorber through the exothermic reaction between the treatment liquid and the acidic compounds in the treated gas is transferred to the regenerator.

[0004] In the gas processing apparatus disclosed in Japanese Patent Publication No. 2018-187553, the contact between the gas to be processed and the processing liquid in the absorber is achieved by methods such as spraying the processing liquid as a mist into the flow path of the gas to be processed or by causing the processing liquid to flow down along a packing material disposed in the flow path of the gas to be processed. However, in this structure that brings the gas to be processed into contact with the processing liquid, sufficient contact cannot be achieved, and sometimes the heat of reaction during the absorption of acidic compounds cannot be recovered. Summary of the Invention

[0005] The purpose of this invention is to provide an absorption apparatus, a gas treatment apparatus, an absorption method, and a gas treatment method that can increase the amount of heat of reaction recovered when absorbing acidic compounds by using a treatment liquid that is phase-separated into a first phase portion with a relatively high content of acidic compounds and a second phase portion with a relatively low content of acidic compounds.

[0006] One aspect of the invention relates to an absorption device that contacts a gas to be treated containing an acidic compound with a treatment liquid that has been separated by absorbing the acidic compound, allowing the treatment liquid to absorb the acidic compound. The absorption device includes: a container; a treatment liquid supply channel having a treatment liquid supply port having an opening inside the container for supplying the treatment liquid into the container; a reaction heat recovery unit configured to be immersed in the treatment liquid inside the container to recover the reaction heat generated by absorbing the acidic compound through the treatment liquid; and a gas supply channel located at a height within the reaction heat recovery unit for supplying the gas to be treated into the container, wherein the treatment liquid supply port is configured to be located below the liquid surface of the treatment liquid during operation.

[0007] Another aspect of the present invention relates to a gas treatment apparatus comprising: the absorption device; a regeneration device for heating the treatment liquid after it has come into contact with the gas to be treated, thereby separating the acidic compounds; and a flow path for conveying the treatment liquid after it has come into contact with the gas to be treated in the container to the regeneration device.

[0008] Another aspect of the invention relates to an absorption method in which a gas to be treated containing an acidic compound is brought into contact with a treatment liquid that has been separated by absorbing the acidic compound within a container, allowing the treatment liquid to absorb the acidic compound. The treatment liquid, stored inside the container in a state of immersion in a reaction heat recovery device, is supplied through a treatment liquid supply port located below the liquid surface. The gas to be treated is supplied to the treatment liquid stored inside the container from a position within the height range of the reaction heat recovery device. The reaction heat generated by the absorption of the acidic compound from the gas to be treated by the treatment liquid is recovered by the reaction heat recovery device.

[0009] Another aspect of the present invention relates to a gas treatment method comprising the following steps: a liquid delivery step, wherein a treatment liquid containing an acidic compound contained in the gas to be treated has been absorbed in an absorption device by performing the absorption method, and the treatment liquid is delivered from the absorption device to a regeneration device; and a regeneration step, wherein the treatment liquid is heated in the regeneration device to separate the acidic compound from the treatment liquid.

[0010] According to the present invention, it is possible to increase the amount of heat of reaction recovered when absorbing acidic compounds by using a treatment liquid that is phase-separated into a first phase portion with a relatively high acidic compound content and a second phase portion with a relatively low acidic compound content. Attached Figure Description

[0011] Figure 1 This is a schematic diagram showing the overall structure of the gas processing apparatus according to the first embodiment.

[0012] Figure 2 This is a schematic diagram showing the overall structure of the gas processing apparatus according to the second embodiment.

[0013] Figure 3 This is a schematic diagram showing the overall structure of the gas processing apparatus involved in a variation of the second embodiment.

[0014] Figure 4 This is a schematic diagram showing the overall structure of the gas processing apparatus according to the third embodiment.

[0015] Figure 5 This is a schematic diagram illustrating the structure of the absorption device involved in other embodiments.

[0016] Figure 6 This is a schematic diagram showing the overall structure of the gas processing apparatus involved in other embodiments. Detailed Implementation

[0017] The specific embodiments of the present invention will now be described in detail with reference to the accompanying drawings.

[0018] (First Implementation)

[0019] The gas processing apparatus 10 according to the first embodiment is a gas processing apparatus that separates the acidic compound from the gas being processed containing the acidic compound using a processing liquid that separates the phases by absorbing the acidic compound.

[0020] like Figure 1 As shown, the gas processing apparatus 10 includes an absorption device 20, a regeneration device 30, a circulation channel 40, a heat exchanger 50, and a heat transfer section 60. The circulation channel 40 includes a first flow path 41 for introducing the processed liquid drawn from the absorption device 20 into the regeneration device 30; and a second flow path 42 for drawing the processed liquid from the regeneration device 30 and returning it to the absorption device 20. A pump 46 is provided in the second flow path 42, and a pump 55 is provided in the first flow path 41. It should be noted that, as... Figure 6 As shown, in the case where a heat exchange object is provided (in Figure 6 In the example, the heat exchanger for the refrigerant in the outlet chamber 25 is the regeneration device 30, and the heat exchanger 50 can also be omitted.

[0021] The absorption device 20 contacts the gas to be treated with a treatment liquid, causing acidic compounds in the gas to be absorbed into the treatment liquid, and then discharges the gas after the acidic compounds have been removed. The absorption device 20 includes an absorption container (container) 21, an inlet chamber 24, and an outlet chamber 25.

[0022] The absorption container 21 includes: a main body 22; and a widened portion 23 connected to the main body 22 such that it covers the main body 22 from above and has a width greater than the main body 22.

[0023] The main body 22 is configured as a bottomed cylindrical shape with height in the vertical direction, having: a bottom 22a; a side portion 22b extending upward from the periphery of the bottom 22a; and an upper opening 22c opening upward at the upper end of the side portion 22b.

[0024] The width of the widened portion 23 is wider than that of the main body portion 22, and it is configured as a cover to cover the upper opening 22c. The widened portion 23 has: a lower end portion 23a connected to the side portion 22b of the main body portion 22; a side portion 23b extending upward from the lower end portion 23a; and an upper portion 23c connected to the upper end portion of the side portion 23b in a manner that closes the upper opening of the side portion 23b. The lower end portion 23a of the widened portion 23 extends circumferentially along the outer surface of the side portion 22b of the main body portion 22 at a position lower than the upper opening 22c. In this embodiment, the lower end portion 23a of the widened portion 23 is connected to the outer surface of the side portion 22b of the main body portion 22 at a position lower than the upper opening 22c and higher than the vertical center of the side portion 22b of the main body portion 22. A space S1 is provided between the outer surface of the side portion 22b of the main body portion 22 and the inner surface of the side portion 23b of the widened portion 23. In addition, a space S2 is provided between the upper opening 22c and the inner surface of the upper part 23c of the widened portion 23.

[0025] A reaction heat recovery unit 60a is disposed inside the main body 22. The reaction heat recovery unit 60a has a pipe that extends through the bottom 22a and through which refrigerant can flow. In this embodiment, the pipe is in the shape of an inverted U and rises vertically from the inner surface of the bottom 22a of the main body 22. The two ends of the pipe are connected to the inlet chamber 24 and the outlet chamber 25, respectively. That is, one end of the pipe is connected to the inlet chamber 24, and refrigerant is introduced into the pipe from the inlet chamber 24 through one end of the pipe. The other end of the pipe is connected to the outlet chamber 25, and refrigerant in the pipe is discharged to the outlet chamber 25 through the other end of the pipe. The reaction heat recovery unit 60a is formed, for example, by a bundle of multiple inverted U-shaped pipes.

[0026] The vertical length of the reaction heat recovery unit 60a, that is, the length from the lower end to the upper end of the inverted U-shape, is shorter than the vertical length of the main body 22. Therefore, the reaction heat recovery unit 60a is housed inside the main body 22. The width of the reaction heat recovery unit 60a is smaller than the width of the main body 22, and the reaction heat recovery unit 60a is configured to be separate from the inner surface of the side portion 22b of the main body 22.

[0027] Multiple baffles 70, staggered from each other, are installed on the inner surface of the main body 22. These baffles 70 constitute a serpentine flow path that causes the fluid containing the treated gas and the treated liquid within the main body 22 to serpentine and rise. Each baffle 70 includes a first plate extending from one inner surface of the side portion 22b toward another inner surface in a longitudinal section, and a second plate extending from the other inner surface toward one of the inner surfaces in the same longitudinal section; the first and second plates are alternately arranged. Accordingly, a serpentine flow path is formed within the main body 22. Here, "longitudinal section" refers to the flow path along... Figure 1 A cross-section along the direction of the paper.

[0028] Multiple baffles 70 are arranged around the reaction heat recovery unit 60a in a manner that does not interfere with it. For example, the first baffle may have a configuration that surrounds approximately half of the reaction heat recovery unit 60a on one of its inner surface sides, and the second baffle may have a configuration that surrounds approximately half of the reaction heat recovery unit 60a on the other inner surface side. However, this is not a limitation, the multiple baffles 70 may also be arranged inside the reaction heat recovery unit 60a.

[0029] The main body 22 is connected to a gas supply channel 11 for supplying process gases or other gases to be processed, and a first discharge section 14 for discharging a portion of the processed liquid from the main body 22. The gas supply channel 11 is connected to the main body 22 at a position within the height range of the reaction heat recovery unit 60a. In this embodiment, the gas supply channel 11 is connected to the bottom 22a or a side portion 22b near the bottom 22a of the main body 22, which corresponds to or is near the lower end of the reaction heat recovery unit 60a. The first discharge section 14 is connected to the side portion 22b near the bottom 22a.

[0030] The widened section 23 is connected to a gas discharge channel 12 for discharging treated gas, a second discharge section 15 for discharging a portion of the treated liquid from the widened section 23, and a second flow path 42. The gas discharge channel 12 is connected to the upper part 23c of the widened section 23. The second discharge section 15 is connected to the widened section 23 at a position higher than the first discharge section 14 in the vertical direction and communicating with the space S1. The second flow path 42 is connected to the side part 23b of the widened section 23. It should be noted that, as an example, the case where the gas discharge channel 12, the second discharge section 15, and the second flow path 42 are "connected" to objects such as the widened section 23 includes cases where the piping passes through the object, thereby connecting the space inside the piping with the space inside the object.

[0031] A treatment fluid supply channel 13 is provided within the widened portion 23 to supply treatment fluid to the main body 22. The treatment fluid supply channel 13 includes a supply channel main body 13a connected to the second flow path 42 and a supply pipe located at the distal end of the supply channel main body 13a. In this embodiment, the supply channel main body 13a is connected to the second flow path 42 at the side portion 23b of the widened portion 23. The connection portion (through portion) 16 between the supply channel main body 13a and the widened portion 23 is located at a position higher than the height of the upper opening 22c.

[0032] The main body 13a of the supply channel is configured to extend from the connecting portion 16 into the main body 22. Specifically, the main body 13a of the supply channel extends from the connecting portion 16 to above the upper opening 22c, and extends downward from above the upper opening 22c toward the interior of the main body 22.

[0033] A processing liquid supply port 13b is formed in the supply piping. The processing liquid supply port 13b may be a single opening formed in the supply piping, but in this embodiment, it is a plurality of downward openings intermittently formed along the direction of extension of the supply piping. The processing liquid supply port 13b opens within the main body 22. The processing liquid supply port 13b is configured to be below the surface of the processing liquid stored in the main body 22 during operation of the absorption device 20. In this embodiment, the processing liquid supply port 13b is disposed within the main body 22 between the surface of the processing liquid during operation of the absorption device 20 and the upper end of the reaction heat recovery unit 60a. That is, the processing liquid supply port 13b is located above the upper end of the reaction heat recovery unit 60a. The processing liquid supply port 13b is disposed within the main body 22 closer to the reaction heat recovery unit 60a than the connecting portion 16. When viewed from above, the area in the supply piping where the processing liquid supply port 13b is formed overlaps with the reaction heat recovery unit 60a.

[0034] The main body 22 is equivalent to the absorption section 28, which is filled with the processing liquid and opens upwards in the state of containing the reaction heat recovery unit 60a.

[0035] The absorption device 20 is equipped with a level gauge 75 for measuring the level of the treatment liquid in the space S1. In this embodiment, the level gauge 75 is connected to the side 23b of the widened portion 23 in communication with the space S1. The level gauge 75 is electrically connected to the treatment liquid volume control unit 76. The treatment liquid volume control unit 76 controls the amount of treatment liquid supplied from the treatment liquid supply port 13b to the main body 22. In this embodiment, the treatment liquid volume control unit 76 compares the level of the treatment liquid in the space S1 measured by the level gauge 75 with a predetermined level threshold, and controls the pumps 46 and 55 in such a way that the level of the treatment liquid reaches the predetermined level threshold. Accordingly, the ratio of the amount of treatment liquid supplied to the main body 22 to the amount of treatment liquid discharged from the absorption container 21 through the first discharge port 14 and the second discharge port 15 is approximately the same, and the level converges within a predetermined range.

[0036] A gas flow meter 77 is installed in the gas supply channel 11 to measure the flow rate of the gas being processed supplied to the main body 22. The gas flow meter 77 is electrically connected to the refrigerant dosage control unit 78. The refrigerant dosage control unit 78 compares the flow rate of the gas being processed measured by the gas flow meter 77 with a predetermined gas quantity threshold, and controls the rotation speed of the compressor 60c and pump 60d of the heat transfer unit 60 (described later) based on the comparison result. For example, if the flow rate of the gas being processed exceeds the predetermined gas quantity threshold, the refrigerant dosage control unit 78 increases the rotation speed of the compressor 60c and pump 60d to increase the flow rate of liquid refrigerant supplied from the inlet chamber 24 to the reaction heat recovery unit 60a. On the other hand, if the flow rate of the gas being processed is less than the predetermined gas quantity threshold, the refrigerant dosage control unit 78 decreases the rotation speed of the compressor 60c and pump 60d to decrease the flow rate of liquid refrigerant supplied from the inlet chamber 24 to the reaction heat recovery unit 60a. Accordingly, the refrigerant flow rate is adjusted according to the supply flow rate of the gas being processed to the main body 22. It should be noted that pump 60d is not required if compressor 60c sufficiently ensures pressure.

[0037] The regeneration device 30 is connected to a first flow path 41 and a second flow path 42. The first flow path 41 is connected to the upper part of the regeneration device 30, allowing the processing liquid delivered from the pump 55 to be introduced into the regeneration device 30. The second flow path 42 is connected to or near the lower end of the regeneration device 30, allowing the processing liquid stored in the regeneration device 30 to be discharged from the regeneration device 30.

[0038] The regeneration device 30 stores a processing liquid. By heating the processing liquid stored in the regeneration device 30, acidic compounds are removed from the processing liquid. The removal of acidic compounds from the processing liquid is an endothermic reaction. In the regeneration device 30, if the processing liquid is heated, not only will the acidic compounds be removed, but the water in the processing liquid will also evaporate.

[0039] The regeneration unit 30 is connected to a supply channel 80 and a heating flow path 82. The supply channel 80 supplies the acidic compound obtained in the regeneration unit 30 to the target material. A condenser 84 is provided in the supply channel 80 to cool the mixture of gas containing the acidic compound evaporated from the processing liquid and water vapor. If the mixture is cooled by the condenser 84, the water vapor will condense. Therefore, the water vapor can be separated. The separated water vapor is returned to the regeneration unit 30. As the condenser 84, a heat exchanger using inexpensive cooling water such as river water can be used.

[0040] One end of the heating flow path 82 is connected to the second flow path 42, but the other end may also be connected to or near the lower end of the regeneration device 30. The other end of the heating flow path 82 is connected to the lower part of the regeneration device 30. A reboiler 86 is provided in the heating flow path 82 to heat the processed liquid stored in the regeneration device 30. The reboiler 86 may be configured to heat the processed liquid inside the regeneration device 30, but as shown, it may also heat the processed liquid drawn out from the regeneration device 30. In this case, the reboiler 86 may be provided on the heating flow path 82 that returns the processed liquid to the regeneration device 30 after heating. In addition, as the reboiler 86, a reboiler that directly or indirectly heats the processed liquid using any heat source such as electricity, steam, or a burner can be used.

[0041] The heat transfer section 60 transfers the refrigerant from the outlet chamber 25 to the heat exchanger 50. The heat transfer section 60 has a closed-loop circulation path 60b filled with refrigerant. In the circulation path 60b, the inlet chamber 24, the reaction heat recovery unit 60a, the outlet chamber 25, the compressor 60c, the heat exchanger 50, the pump 60d, and the expansion mechanism 60e are arranged sequentially. A condenser 60f is disposed within the heat exchanger 50. The pump 60d may be omitted.

[0042] The heat exchanger 50 is connected to the first flow path 41, the second flow path 42, and the circulation flow path 60b, and performs heat exchange between the process liquid flowing through the first flow path 41, the process liquid flowing through the second flow path 42, and the refrigerant flowing through the circulation flow path 60b. The heat exchanger 50 can be formed, for example, as a plate heat exchanger, but it can also be formed as a microchannel heat exchanger capable of heat exchange between fluids with small temperature differences. This improves energy efficiency.

[0043] The acidic compound that is separated by the gas processing device 10 is not particularly limited as long as its aqueous solution is acidic; examples include hydrogen chloride, carbon dioxide, sulfur dioxide, and carbon disulfide.

[0044] The processing liquid used in the gas processing device 10 is an absorbent capable of reversibly absorbing and removing acidic compounds. The processing liquid is, for example, an alkaline absorbent containing water, an amine compound, and an organic solvent. Preferably, the amine compound is 30 wt%, the organic solvent is 60 wt%, and the water is 10 wt%.

[0045] Examples of amine compounds include, for instance, 2-aminoethanol (MEA: solubility parameter = 14.3 (cal / cm³)). 3 ) 1 / 2 2-(2-aminoethoxy)ethanol (AEE: solubility parameter = 12.7 (cal / cm³)) 3 ) 1 / 2 Primary amines include 2-(methylamino)ethanol (MAE), 2-(ethylamino)ethanol (EAE), and 2-(butylamino)ethanol (BAE); secondary amines include triethanolamine (TEA), N-methyldiethanolamine (MDEA), tetramethylethylenediamine (TEMED), pentamethyldiethylenetriamine (PMDETA), hexamethyltriethylenetetramine, and bis(2-dimethylaminoethyl) ether.

[0046] Examples of organic solvents include: 1-butanol (solubility parameter = 11.3 (cal / cm³)). 3 ) 1 / 2 ), 1-Pentanol (solubility parameter = 11.0 (cal / cm³) 3 ) 1 / 2 Octyl alcohol, diethylene glycol diethyl ether (DEGDEE), diethylene glycol dimethyl ether (DEGDME), etc., can be mixed and used.

[0047] When the solubility parameters of the amine compound and the organic solvent are within a specified range, the treatment liquid is separated into two phases by absorbing acidic compounds: a phase with a high content of acidic compounds and a phase with a low content of acidic compounds. Here, the solubility parameters are represented by the following equation (1). ΔH is the molar latent heat of vaporization, R is the gas constant, T is the absolute temperature, and V is the molar volume.

[0048]

[0049] For absorbents containing water, amine compounds, and organic solvents, the value obtained by subtracting the solubility parameter of the organic solvent from the solubility parameter of the amine compound is 1.1 (cal / cm³). 3 ) 1 / 2Above and 4.2 (cal / cm) 3 ) 1 / 2 The following method selects a combination of amine compounds and organic solvents to achieve phase separation through the absorption of acidic compounds, resulting in a phase with a high content of acidic compounds and a phase with a low content of acidic compounds.

[0050] Next, a gas treatment method using the gas treatment apparatus 10 will be described. The gas treatment method includes: an absorption method (absorption step) in which an acidic compound contained in the gas to be treated is absorbed into a treatment liquid in an absorption apparatus 20; a liquid delivery step in which the treatment liquid containing the acidic compound is transported from the absorption apparatus 20 to a regeneration apparatus 30; and a regeneration method (regeneration step) in which the acidic compound is released from the treatment liquid by heating it in the regeneration apparatus 30.

[0051] In the absorption method, with the reaction heat recovery unit 60a and multiple baffles 70 immersed in the treatment liquid within the main body 22 (absorption section 28), the treatment liquid is supplied to the absorption device 20 from the second flow path 42. That is, the treatment liquid introduced from the second flow path 42 is supplied into the absorption section 28 (main body 22) through the treatment liquid supply port 13b of the treatment liquid supply channel 13. At this time, the treatment liquid supply port 13b is immersed in the treatment liquid within the absorption section 28. If the treatment liquid is supplied through the treatment liquid supply port 13b, the treatment liquid in the absorption section 28 overflows from the upper opening 22c of the absorption section 28 and flows into the space S1 of the widened section 23. That is, the side portion 22b of the absorption section 28 (main body 22) located inside the widened section 23 acts as a dam to store the treatment liquid within the absorption section 28 until the treatment liquid overflows from the upper opening 22c into the space S1.

[0052] Furthermore, in the absorption device 20, the gas to be processed is supplied while the processing liquid is being supplied. That is, the gas to be processed is supplied to the lower end or the main body 22 near the lower end of the reaction heat recovery unit 60a through the gas supply channel 11. In addition, the refrigerant dosage control unit 78 controls the amount of liquid refrigerant introduced from the inlet chamber 24 into the reaction heat recovery unit 60a based on the flow rate of the gas to be processed measured by the gas flow meter 77.

[0053] If the gas to be treated is supplied to the treatment liquid, the gas comes into contact with the treatment liquid, and the acidic compounds in the gas are absorbed by the treatment liquid. Specifically, with the treatment liquid stored in the absorption section 28, the bubbly gas to be treated rises in the treatment liquid from or near the lower end of the reaction heat recovery unit 60a using buoyancy. In this embodiment, the gas to be treated meanders and rises in the treatment liquid using multiple baffles 70. Accordingly, compared to the case where the gas to be treated rises immediately in the treatment liquid, the contact time between the treatment liquid and the gas to be treated is increased. Therefore, more acidic compounds in the gas to be treated are absorbed by the treatment liquid.

[0054] The reaction in which the processing liquid absorbs acidic compounds from the gas being processed is exothermic, thus generating heat of reaction. This heat of reaction is recovered by the heat recovery unit 60a. Specifically, the refrigerant introduced into the heat recovery unit 60a from the inlet chamber 24 vaporizes using the heat of reaction, becoming a gaseous refrigerant. In other words, the refrigerant in the heat recovery unit 60a recovers the heat of reaction. The gaseous refrigerant is then discharged from the heat recovery unit 60a to the outlet chamber 25. At this time, multiple baffles 70 are used to increase the residence time of the gas being processed in the processing liquid, thus enabling the heat recovery unit 60a to recover even more heat of reaction.

[0055] Furthermore, in this embodiment, when viewed from above, the area in which multiple processing liquid supply ports 13b are formed in the supply piping overlaps with the reaction heat recovery unit 60a, and the processing liquid is supplied to a portion of the entire width of the reaction heat recovery unit 60a through the processing liquid supply ports 13b. Therefore, since the lean processing liquid can be brought into contact with the gas being processed near the reaction heat recovery unit 60a, the reaction heat can be recovered using the reaction heat recovery unit 60a.

[0056] The treated liquid phase, after contact with the gas being treated, separates into a first phase portion with a relatively high content of acidic compounds and a second phase portion with a relatively low content of acidic compounds. The specific gravity of the second phase portion is less than that of the first phase portion. Therefore, the second phase portion faces upwards from the upper opening 22c of the absorption section 28 and flows into the space S1 within the widening section 23, where it is stored. Thus, the treated liquid, mainly containing the second phase portion, is removed from the widening section 23 through the second discharge section 15. On the other hand, the first phase portion faces downwards from the absorption section 28, and the treated liquid, mainly containing the first phase portion, is removed from the absorption section 28 through the first discharge section 14. As described above, by allowing the second phase portion, with a specific gravity less than that of the first phase portion, to overflow from the absorption section 28 and enter the space S1 of the widening section 23, it is possible to remove the treated liquid, mainly containing the second phase portion, from the absorption section 28 through the second discharge section 15. Furthermore, the treated liquid, mainly containing the first phase portion, is removed from the absorption section 28 through the first discharge section 14. Furthermore, the treatment liquid mainly containing the second phase portion in the second discharge section 15 and the treatment liquid mainly containing the first phase portion in the first discharge section 14 are merged. Therefore, the ratio of the first phase portion to the second phase portion can be stabilized in the treatment liquid containing both the first phase portion and the second phase portion taken out from the absorption section 28.

[0057] Then, the processed liquid separated in the absorption unit 20 is transported to the regeneration unit 30. Specifically, the processed liquid mainly containing the first phase portion taken from the absorption unit 28 through the first discharge section 14 and the processed liquid mainly containing the second phase portion taken from the absorption unit 28 through the second discharge section 15 are merged and transported to the regeneration unit 30 through the first flow path 41 using the pump 55. That is, the entire amount of processed liquid taken from the absorption unit 20 is introduced into the regeneration unit 30. At this time, the processed liquid flowing in the first flow path 41 is heated using the heat exchanger 50 before being introduced into the regeneration unit 30.

[0058] Additionally, the gaseous refrigerant discharged from the reaction heat recovery unit 60a to the outlet chamber 25 is compressed by the compressor 60c and flows into the condenser 60f within the heat exchanger 50. The gaseous refrigerant flowing within the condenser 60f condenses as its temperature drops by heating the processing liquid flowing in the first flow path 41. This condensed liquid refrigerant is then pumped by the pump 60d, expanded by the expansion mechanism 60e, and flows into the reaction heat recovery unit 60a through the inlet chamber 24. Through the refrigerant circulation described above, the processing liquid sent to the regeneration unit 30 is heated by absorbing the reaction heat from the absorption device 20. Therefore, by using the heat transfer unit 60, the regeneration energy required for regeneration can be reduced. Furthermore, the pump 60d can be omitted.

[0059] In the regeneration apparatus 30, a regeneration method is performed by heating the treatment liquid introduced into the regeneration apparatus 30 to separate acidic compounds from the treatment liquid. Within the regeneration apparatus 30, the treatment liquid, in a state where a first phase and a second phase are mixed, is heated. Accordingly, acidic compounds are separated from the treatment liquid. Additionally, water vapor evaporated from the treatment liquid is sometimes obtained. The acidic compounds separated from the treatment liquid and the water vapor flow in the supply channel 80. In the supply channel 80, the water vapor is condensed by the condenser 84 and returned to the regeneration apparatus 30. Therefore, only the acidic compounds separated from the treatment liquid are supplied to the target. The treatment liquid stored in the regeneration apparatus 30 flows through the second flow path 42 and returns to the absorption device 20. The heat of the treatment liquid flowing in the second flow path 42 is used by the heat exchanger 50 to heat the treatment liquid flowing in the first flow path 41, thus lowering the temperature of the treatment liquid.

[0060] Furthermore, since both the treatment liquid containing the first phase and the treatment liquid containing the second phase are introduced into the regeneration unit 30, the ratio of the solvent contained in the first phase to the solvent contained in the second phase can be stabilized in the treatment liquid in which the acidic compound is removed in the regeneration unit 30 to restore a single phase. For example, in the case where the treatment liquid is an alkaline absorbent containing water, an amine compound, and an organic solvent, the ratio of water, an amine compound, and an organic solvent can be stabilized.

[0061] As explained above, in the first embodiment, the processing liquid is stored in the absorption container 21, and the gas to be processed is supplied to the processing liquid through the gas supply channel 11 at a position within the height range of the reaction heat recovery device 60a immersed in the processing liquid. Therefore, it is possible to prevent the gas to be processed from passing through the absorption container 21 without contacting the processing liquid. Therefore, since the heat of reaction is increased by the sufficient reaction between the processing liquid and the acidic compounds in the gas to be processed, the amount of heat of reaction recovered by the reaction heat recovery device 60a can be increased. In addition, since the processing liquid is stored in the absorption container 21 such that the reaction heat recovery device 60a is immersed in the processing liquid, it is possible to prevent the reaction heat recovery device 60a from being exposed from the processing liquid even if the liquid level fluctuates. That is, since the state in which the reaction heat recovery device 60a is immersed in the processing liquid can be maintained, it is possible to prevent the decrease in the amount of heat of reaction recovered by the reaction heat recovery device 60a from being reduced.

[0062] Furthermore, since the processing liquid is supplied from the processing liquid supply port 13b, which is located between the surface of the processing liquid and the upper end of the reaction heat recovery unit 60a, the reaction heat generated near the processing liquid supply port 13b is easily transferred to the reaction heat recovery unit 60a. That is, a lean processing liquid with a high absorption rate for acidic compounds in the gas being processed is supplied from the processing liquid supply port 13b. Therefore, near the processing liquid supply port 13b, more acidic compounds in the gas being processed are absorbed by the processing liquid, resulting in more reaction heat being generated within the processing liquid. Therefore, compared to the case where the processing liquid supply port 13b is located higher than the surface of the processing liquid, the reaction heat can be effectively transferred to the reaction heat recovery unit 60a, thus allowing more reaction heat to be recovered using the reaction heat recovery unit 60a. Furthermore, by using multiple baffles 70 to increase the contact time between the processing liquid and the gas being processed, the amount of reaction heat recovered using the reaction heat recovery unit 60a can also be increased.

[0063] Furthermore, in this embodiment, since the processing liquid supply channel 13 extends from the connection portion 16 with the widened portion 23 into the absorption portion 28, even when the connection portion 16 is far from the reaction heat recovery unit 60a, the processing liquid supply port 13b can be closer to the reaction heat recovery unit 60a than the connection portion 16. Therefore, since the processing liquid can be supplied to a position closer to the reaction heat recovery unit 60a, the amount of reaction heat recovered by the reaction heat recovery unit 60a can be increased.

[0064] Furthermore, since the reaction heat recovery unit 60a is vertically erected, the reaction heat generated by the contact between the processing liquid and the gas being processed can be fully recovered along the vertical length of the reaction heat recovery unit 60a in the direction in which the gas being processed rises.

[0065] Furthermore, by configuring the absorption device 20 into a tower shape that is vertically elongated in the vertical direction, the contact time between the gas being treated and the treatment liquid can be extended, thereby generating more heat of reaction and recovering it.

[0066] (Second Implementation)

[0067] Figure 2 This indicates the second embodiment of the present invention. It should be noted that the same reference numerals are used for the same components as in the first embodiment, and detailed descriptions thereof are omitted. The difference between the absorption device 20 in the second embodiment and the absorption device 20 in the first embodiment lies in the position of the treatment liquid supply port 13b.

[0068] The processing liquid supply port 13b is positioned lower than the liquid level of the processing liquid within the main body 22 (absorption section 28). In the absorption device 20 according to the second embodiment, the processing liquid supply port 13b is positioned within the height range of the reaction heat recovery unit 60a. That is, the processing liquid supply port 13b is positioned between the upper and lower ends of the reaction heat recovery unit 60a. Therefore, by bringing the processing liquid supply port 13b close to the reaction heat recovery unit 60a, the amount of reaction heat recovered by the reaction heat recovery unit 60a can be increased.

[0069] In this embodiment, the second flow path 42 is connected to a portion (connection portion 16) within the height range of the reaction heat recovery unit 60a in the main body 22, such that the processing liquid supply port 13b is positioned within the height range of the reaction heat recovery unit 60a. The second flow path 42 is connected to the connection portion 16, and the supply channel main body 13a extends from the connection portion 16 into the main body 22. The processing liquid supply port 13b is located within the height range of the reaction heat recovery unit 60a and opens at the distal end of the supply channel main body 13a. The supply channel main body 13a and the processing liquid supply port 13b are configured in a manner that does not interfere with the reaction heat recovery unit 60a. That is, in Figure 2 In the example, the main body 13a of the supply channel extends from the connecting portion 16 to the inside of the heat recovery unit 60a in a manner that does not interfere with the heat recovery unit 60a, and the processing liquid supply port 13b is located inside the heat recovery unit 60a. However, it is not limited to this; the main body 13a of the supply channel may also extend from the connecting portion 16 to the front of the heat recovery unit 60a, with the processing liquid supply port 13b located in front of the heat recovery unit 60a. Furthermore, in Figure 2 In the example, the processing fluid supply port 13b is a single opening, but it could also be multiple openings. Furthermore, in Figure 2 In the example, the opening direction of the treatment fluid supply port 13b is horizontal, but it can also be downward or upward.

[0070] In addition, such as Figure 3 As shown, the processing liquid supply port 13b can also be located at or near the lower end of the reaction heat recovery unit 60a, i.e., near the bottom 22a within the absorption section 28. Accordingly, both the processing liquid with a high absorption rate of acidic compounds and the gas being processed are supplied to or near the lower end of the reaction heat recovery unit 60a. This allows the processing liquid near or near the lower end of the reaction heat recovery unit 60a to absorb acidic compounds, enabling the recovery of the reaction heat generated through this absorption using the reaction heat recovery unit 60a.

[0071] Furthermore, the multiple processing fluid supply ports 13b are not limited to any particular type, as long as they are located within the main body 22. Figure 2 and Figure 3Alternatively, one processing liquid supply port 13b can be positioned between the surface of the processing liquid and the upper end of the reaction heat recovery unit 60a, while another processing liquid supply port 13b is positioned at or near the lower end of the reaction heat recovery unit 60a.

[0072] (Third Implementation)

[0073] Figure 4 This indicates the third embodiment of the present invention. It should be noted that the same reference numerals are used for the same constituent elements as in the first embodiment, and detailed descriptions thereof are omitted. In the absorption apparatus 20 of the first embodiment, the main body 22 corresponds to the absorption section 28, which is filled with the processing liquid and opens upwards while housing the reaction heat recovery unit 60a. In contrast, in the absorption apparatus 20 of the third embodiment, the separation wall 100 disposed within the main body 22 functions as the absorption section 28.

[0074] The widened portion 23 is connected to the main body 22 in such a way that the upper end of the main body 22 is continuous with the lower end 23a of the widened portion 23.

[0075] A separation wall 100 is disposed inside the main body 22 and the widened portion 23. The separation wall 100 is configured as a vertically elongated cylindrical shape that opens upwards and downwards. The width of the separation wall 100 is smaller than the width of the side portion 22b of the main body 22, and the separation wall 100 is disposed separately from the inner surface of the side portion 22b of the main body 22 and the inner surface of the side portion 23b of the widened portion 23. Therefore, a space S1 is provided between the outer surface of the separation wall 100 and the inner surface of the side portion 22b of the main body 22 and the inner surface of the side portion 23b of the widened portion 23. Furthermore, a space S2 is provided between the upper end of the separation wall 100 and the inner surface of the upper portion 23c of the widened portion 23. The upper end of the separation wall 100 is configured to be positioned above the upper end of the main body 22 and the lower end portion 23a of the widened portion 23. Furthermore, the upper end of the separation wall 100 functions as a dam to allow the treatment liquid inside the absorption section 28 to overflow. The lower end of the separation wall 100 is separated from the inner surface of the bottom 22a of the main body 22. The space formed by this separation can be used to extend the treatment liquid supply channel 13 to the lower end of the separation wall 100, and the treatment liquid supply port 13b can be inserted into the separation wall 100 from the space at the lower end of the separation wall 100.

[0076] A reaction heat recovery unit 60a is disposed inside the separation wall 100. That is, the separation wall 100 is configured as an absorption section 28 filled with the processing liquid and opening upward when the reaction heat recovery unit 60a is contained therein. In other words, the absorption container 21 has an absorption section 28. The reaction heat recovery unit 60a is inserted into the separation wall 100 (absorption section 28) in a manner that elongates vertically in an inverted U-shape from the inner surface of the bottom 22a of the main body 22.

[0077] Furthermore, inside the separation wall 100, the processing liquid supply port 13b is located between the liquid surface of the processing liquid and the upper end of the reaction heat recovery unit 60a.

[0078] Furthermore, multiple inclined baffles 110 are installed on the inner surface of the separation wall 100. These multiple inclined baffles 110 constitute a serpentine section that causes the flow of the fluid containing the treated gas and the treatment liquid within the absorption section 28 to serpentine in a spiral pattern. Figure 4 In this example, each inclined baffle 110 is formed of a sheet metal with multiple holes. For example, each sheet metal is formed of SUS sheet metal with holes. A bundle of tubes constituting the reaction heat recovery unit 60a passes through the holes of the inclined baffle 110. In this embodiment, the plates adjacent to each other in the vertical direction are supported in an inclined state by the inner wall of the separation wall 100. Alternatively, the multiple inclined baffles 110 may be installed on the separation wall 100 in a manner that contacts the reaction heat recovery unit 60a. Figure 4 The inclined baffle 110, shown in solid line, is located on the front side of the paper relative to the plane passing through the center line of the absorption device 20 when viewed from above, while the inclined baffle 110, shown in dashed line, is located on the depth side of the paper relative to the plane passing through the center line when viewed from above.

[0079] The second discharge section 15 is connected to a position that is higher than the first discharge section 14 in the vertical direction and communicates with the space S1. In this embodiment, the second discharge section 15 is connected to either the side portion 22b of the main body 22 or the side portion 23b of the widened portion 23. Alternatively, the second discharge section 15 can be connected to at least one of the side portion 22b of the main body 22 and the side portion 23b of the widened portion 23.

[0080] Within the separation wall 100 (absorption section 28), with the reaction heat recovery unit 60a and multiple inclined baffles 110 immersed in the treatment liquid, the treatment liquid is supplied to the absorption section 28 through the treatment liquid supply port 13b. In this state, if the gas to be treated is supplied to the treatment liquid within the absorption section 28 through the gas supply channel 11, the gas is dispersed through the multiple holes of the multiple inclined baffles 110 and rises within the treatment liquid. In this embodiment, the gas supply channel 11 supplies the gas to be treated to the absorption section 28 from two opposing directions in cross-section. Through contact between the treatment liquid and the gas to be treated, the treatment liquid absorbs acidic compounds in the gas and separates into a first phase and a second phase. The reaction heat generated by the absorption of acidic compounds is recovered through the reaction heat recovery unit 60a. Because the multiple inclined baffles 110 cause the processing liquid and the gas being processed to swirl in a spiral pattern, the residence time of the processing liquid and the gas being processed in the absorption section 28 can be ensured, and the heat transfer rate from the reaction heat to the reaction heat recovery unit 60a is increased. Accordingly, the contact area between the processing liquid and the gas being processed is increased. Therefore, more acidic compounds in the gas being processed are absorbed by the processing liquid, thereby generating more heat of reaction. In addition, when the multiple inclined baffles 110 are in contact with the reaction heat recovery unit 60a, the multiple inclined baffles 110 can transfer the recovered heat to the reaction heat recovery unit 60a. The second phase portion of the liquid phase separation overflows from the opening above the absorption section 28 and flows into the space S1 and accumulates in the space S1. The processing liquid mainly containing the second phase portion is taken out from the second discharge section 15, and the processing liquid mainly containing the first phase portion is taken out from the first discharge section 14.

[0081] In the third embodiment, the location of the processing fluid supply port 13b can be... Figure 2 and Figure 3 In addition to the location shown, multiple processing fluid supply ports 13b may also be provided at the location where... Figures 1 to 3 The position of the combination.

[0082] Alternatively, in the first and second embodiments, multiple inclined baffles 110 may be provided instead of multiple baffles 70. Furthermore, in the third embodiment, multiple baffles 70 may be provided instead of multiple inclined baffles 110.

[0083] It should be noted that the present invention is not limited to the described embodiments, and may also be implemented in the following ways.

[0084] (A) Regarding the Serpentine Section

[0085] The multiple baffles 70 are not limited to the inner wall surface of the main body 22 (absorption part 28) shown in the first and second embodiments, and can also be installed in the reaction heat recovery unit 60a. Figure 5In this example, the multiple baffles 70 include a first baffle portion 70a installed on the reaction heat recovery unit 60a and a second baffle portion 70b installed on the inner wall of the absorption section 28. The first baffle portion 70a is installed across the inverted U-shaped tubes of the reaction heat recovery unit 60a between the other tubes. The first baffle portion 70a is not installed on the inner wall of the absorption section 28. The second baffle portion 70b extends from one of the opposing inner wall surfaces of the absorption section 28 to a position where it overlaps vertically with the first baffle portion 70a. Accordingly, a serpentine flow path is formed within the absorption section 28.

[0086] (B) Regarding the heat transfer section

[0087] The condenser 60f of the heat transfer section 60 can also be like Figure 6 The structure shown is arranged within the regeneration unit 30 instead of the structure located in the heat exchanger 50. In this case, the liquid refrigerant in the refrigerant discharged from the reaction heat recovery unit 60a to the outlet chamber 25 is heated and vaporized by the heat of reaction of the exothermic reaction. The gaseous refrigerant is compressed by the compressor 60c and flows into the condenser 60f arranged within the regeneration unit 30. The gaseous refrigerant flowing in the condenser 60f is condensed by the endothermic reaction within the regeneration unit 30. The condensed liquid refrigerant is pumped by the pump 60d, expanded by the expansion mechanism 60e, and flows into the reaction heat recovery unit 60a through the inlet chamber 24. Thus, through the circulation of the refrigerant, the heat of reaction of the absorption unit 20 is thermally transferred to the regeneration unit 30. That is, through the circulation of the refrigerant, the heat of reaction of the absorption unit 20 is transferred to the regeneration unit 30. By utilizing the heat transfer unit 60, the regeneration energy required for regeneration can be reduced.

[0088] (C) Other

[0089] In the described embodiment, the multiple baffles 70, the level gauge 75, the liquid flow control unit 76, the gas flow meter 77, and the refrigerant dosage control unit 78 can be appropriately omitted. Furthermore, as long as the refrigerant can be circulated to the reaction heat recovery unit 60a, the inlet chamber 24 and the outlet chamber 25 can also be omitted.

[0090] Here, the implementation method is described in summary.

[0091] (1) The absorption device according to the embodiment brings a gas to be treated containing an acidic compound into contact with a treatment liquid that has been separated by absorbing the acidic compound, so that the treatment liquid absorbs the acidic compound. The absorption device includes: a container; a treatment liquid supply channel having a treatment liquid supply port with an opening in the container for supplying the treatment liquid into the container; a reaction heat recovery unit configured to be immersed in the treatment liquid inside the container to recover the reaction heat generated by absorbing the acidic compound through the treatment liquid; and a gas supply channel located at a height range of the reaction heat recovery unit for supplying the gas to be treated into the container, wherein the treatment liquid supply port is configured to be located below the liquid surface of the treatment liquid during operation.

[0092] In the absorption device, the treatment liquid is stored in a container, and the gas to be treated is supplied to the treatment liquid through a gas supply channel at a position within the height range of the reaction heat recovery unit immersed in the treatment liquid. Therefore, it is possible to prevent the gas to be treated from passing through the container without contacting the treatment liquid. Consequently, the heat of reaction increases as the treatment liquid reacts sufficiently with the acidic compounds in the gas to be treated. Therefore, the amount of heat of reaction recovered using the reaction heat recovery unit can be increased. Furthermore, since the treatment liquid is stored in the container such that the reaction heat recovery unit is immersed in the treatment liquid, it is possible to prevent the reaction heat recovery unit from being exposed from the treatment liquid even if the liquid level fluctuates. That is, since the state of immersion of the reaction heat recovery unit in the treatment liquid can be maintained, it is possible to prevent a decrease in the amount of heat of reaction recovered using the reaction heat recovery unit.

[0093] Furthermore, since the processing liquid is supplied from the processing liquid supply port at a position below the liquid level, and the gas being processed is supplied within the height range of the reaction heat recovery unit immersed in the processing liquid, the reaction heat generated near the processing liquid supply port is easily transferred to the reaction heat recovery unit. Therefore, the amount of reaction heat recovered using the reaction heat recovery unit can be increased.

[0094] (2) The processing liquid supply port can also be positioned closer to the reaction heat recovery unit than the connection portion of the processing liquid supply channel to the container. In this configuration, even if the connection portion of the processing liquid supply channel to the container is far from the reaction heat recovery unit, the processing liquid supply port can be positioned closer to the reaction heat recovery unit than that connection portion. Therefore, the amount of reaction heat recovered by the reaction heat recovery unit can be increased.

[0095] (3) The processing liquid supply port can also be located between the liquid surface and the upper end of the reaction heat recovery unit. In this structure, compared to the case where the processing liquid supply port is positioned higher than the liquid surface, the processing liquid supply port can be located closer to the upper end of the reaction heat recovery unit. Therefore, more reaction heat generated near the processing liquid supply port can be effectively transferred to the upper end of the reaction heat recovery unit, and more reaction heat can be recovered through the upper end.

[0096] (4) The processing liquid supply port can also be configured within the height range of the reaction heat recovery unit. In this configuration, by configuring the processing liquid supply port within the height range of the reaction heat recovery unit, the processing liquid supply port can be brought closer to the reaction heat recovery unit. Accordingly, the amount of reaction heat recovered by the reaction heat recovery unit can be increased.

[0097] (5) The treatment liquid supply port may also be configured at or near the lower end of the reaction heat recovery unit. In this configuration, since the treatment liquid is supplied at or near the lower end of the reaction heat recovery unit, and the gas to be treated is supplied at a position within the height range of the reaction heat recovery unit immersed in the treatment liquid, the treatment liquid absorbs acidic compounds near the reaction heat recovery unit, and the reaction heat generated by this absorption can be recovered.

[0098] (6) The absorption device may also further include a serpentine section, configured to be immersed in the treatment liquid inside the container, which causes the gas to be treated to serpentine and rise in the treatment liquid. In this configuration, since the gas to be treated can serpentine and rise in the treatment liquid using the serpentine section, the residence time of the gas to be treated in the treatment liquid can be increased compared to the case where the gas to be treated rises immediately in the treatment liquid. Accordingly, the contact time between the treatment liquid and the gas to be treated is increased. Therefore, since more acidic compounds in the gas to be treated are absorbed by the treatment liquid, more heat of reaction can be generated.

[0099] (7) The absorption device may also further include a dispersion section, disposed inside the container such that it is immersed in the treatment liquid, and the gas to be treated is dispersed by passing the gas through it. In this structure, by using the dispersion section to disperse the gas to be treated, the surface area of ​​the gas to be treated can be increased. Accordingly, since the contact area between the treatment liquid and the gas to be treated is increased, more acidic compounds in the gas to be treated are absorbed by the treatment liquid, thereby generating more heat of reaction.

[0100] (8) The treatment liquid may also be a treatment liquid that, within the container, undergoes phase separation through contact with the gas being treated, resulting in a first phase portion with a relatively high content of acidic compounds and a second phase portion with a relatively low content of acidic compounds and a lower specific gravity than the first phase portion. In this case, the container may also have a first discharge section and a second discharge section disposed vertically at a position higher than the first discharge section. In this structure, the first phase portion and the second phase portion, which have separated in the treatment liquid after contact with the gas being treated, can be removed from the container through the first discharge section and the second discharge section, respectively. Therefore, the ratio of the first phase portion to the second phase portion in the removed treatment liquid can be stabilized. That is, within the container, the treatment liquid, after contact with the gas being treated containing acidic compounds, undergoes phase separation into a first phase portion with a relatively high content of acidic compounds and a second phase portion with a relatively low content of acidic compounds. Since the second phase portion has a lower specific gravity than the first phase portion, it exists at a higher position than the first phase portion within the container. Furthermore, the treatment liquid, which mainly comprises the first phase portion, is removed from the container through the first discharge section, and the treatment liquid, which mainly comprises the second phase portion, is removed from the container through the second discharge section. Therefore, the ratio of the first phase portion to the second phase portion can be stabilized in the treatment liquid containing both the first phase portion and the second phase portion removed from the container.

[0101] (9) The container may also have an absorption section that is filled with the processing liquid and opens upwards when the reaction heat recovery unit is housed therein. The second discharge section discharges the processing liquid containing the second phase portion overflowing from the absorption section, and the first discharge section discharges the processing liquid other than the processing liquid discharged through the second discharge section. In this structure, by allowing the second phase portion, which has a specific gravity less than that of the first phase portion, to overflow from the main body, the processing liquid mainly containing the second phase portion can be removed from the container through the second discharge section, and the processing liquid mainly containing the first phase portion can be removed from the container through the first discharge section.

[0102] (10) The absorption device may also further include: an inlet chamber connected to the outer surface of the bottom of the container, through which a refrigerant for recovering the heat of reaction is introduced into the heat recovery unit; and an outlet chamber connected to the outer surface of the bottom of the container, through which the refrigerant is discharged from the heat recovery unit. In this case, the heat recovery unit may also have a tube extending vertically from the inner surface of the bottom in an inverted U-shape, one end of the tube communicating with the inlet chamber and the other end of the tube communicating with the outlet chamber. In this structure, since the heat recovery unit is extended vertically from the inner surface of the bottom of the container in an inverted U-shape, the two ends of the inverted U-shape can be connected to the inlet chamber and the outlet chamber connected to the outer surface of the bottom of the container, respectively. Furthermore, since the heat recovery unit is extended vertically, the heat of reaction generated by the contact between the processing liquid and the gas being processed can be sufficiently recovered along the vertical length of the heat recovery unit.

[0103] (11) The gas treatment apparatus according to the embodiment includes: the absorption device; the regeneration device for heating the treatment liquid after it has come into contact with the gas to be treated, so as to separate the acidic compound; and the flow path for conveying the treatment liquid after it has come into contact with the gas to be treated in the container to the regeneration device.

[0104] In this gas processing device, the amount of heat of reaction recovered can be increased in the absorption unit, and acidic compounds can be separated from the processing liquid after contact with the gas being processed.

[0105] (12) The absorption method according to the embodiment involves contacting a gas to be treated containing an acidic compound with a treatment liquid that has been separated by absorbing the acidic compound in a container, allowing the treatment liquid to absorb the acidic compound, wherein the treatment liquid stored inside the container in a state of being immersed in a reaction heat recovery device is supplied with the treatment liquid through a treatment liquid supply port located below the liquid surface of the treatment liquid; the gas to be treated is supplied to the treatment liquid stored inside the container from a position within the height range of the reaction heat recovery device; and the reaction heat generated by the absorption of the acidic compound in the gas to be treated by the treatment liquid is recovered by the reaction heat recovery device.

[0106] In this absorption method, the treatment liquid is stored in a container, and the gas to be treated is supplied to the treatment liquid at a height range within which the reaction heat recovery device is immersed in the treatment liquid. Therefore, it is possible to prevent the gas to be treated from passing through the container without contacting the treatment liquid. Thus, since the heat of reaction increases due to the sufficient reaction between the treatment liquid and the acidic compounds in the gas to be treated, the amount of heat of reaction recovered using the reaction heat recovery device can be increased. Furthermore, since the treatment liquid is stored in the container such that the reaction heat recovery device is immersed in the treatment liquid, it is possible to prevent the reaction heat recovery device from being exposed from the treatment liquid even if the liquid level fluctuates. That is, since the state of immersion of the reaction heat recovery device in the treatment liquid can be maintained, it is possible to prevent a decrease in the amount of heat of reaction recovered using the reaction heat recovery device.

[0107] Furthermore, since the processing liquid is supplied from the processing liquid supply port at a position below the liquid level, and the gas being processed is supplied within the height range of the reaction heat recovery unit immersed in the processing liquid, the reaction heat generated near the processing liquid supply port is easily transferred to the reaction heat recovery unit. Therefore, the amount of reaction heat recovered using the reaction heat recovery unit can be increased.

[0108] (13) The gas treatment method according to the embodiment includes the following steps: a liquid delivery step, wherein a treatment liquid containing acidic compounds contained in the gas to be treated is absorbed in an absorption device by performing the absorption method, and the treatment liquid is delivered from the absorption device to a regeneration device; and a regeneration step, wherein the treatment liquid is heated in the regeneration device and the acidic compounds are separated from the treatment liquid.

[0109] In this gas treatment method, the amount of heat of reaction recovered can be increased by implementing the absorption method, and acidic compounds can be separated from the treatment liquid after contact with the gas being treated.

[0110] As explained above, it is possible to increase the amount of heat of reaction recovered when using a treatment solution that is phase-separated into a first phase portion with a relatively high content of acidic compounds and a second phase portion with a relatively low content of acidic compounds to absorb acidic compounds.

Claims

1. An absorption device, characterized in that, The gas to be treated, containing acidic compounds, is contacted with a treatment liquid that has been phase-separated by absorbing the acidic compounds, allowing the treatment liquid to absorb the acidic compounds. The absorption device includes: container; The processing liquid supply channel has a processing liquid supply port that opens inside the container to supply the processing liquid into the container; A reaction heat recovery unit, configured such that the interior of the container is immersed in the treatment liquid, recovers the reaction heat generated by the absorption of the acidic compound through the treatment liquid; and A gas supply channel, located at a position within the height range of the reaction heat recovery unit, supplies the gas to be processed into the interior of the container, wherein... The container has: The absorption section, in the state of housing the reaction heat recovery unit, is filled with the processing liquid and opens upwards; A widened section is formed between the lower part of the widened section and the absorption section, allowing the processing liquid overflowing from the upper opening of the absorption section to flow in. A first discharge section is connected to the absorption section; and The second discharge section is connected to the widened section at a position higher in the vertical direction than the first discharge section and communicating with the space, wherein... The treatment liquid is a liquid that, within the absorption section of the container, undergoes phase separation through contact with the gas being treated, resulting in a first phase portion with a relatively high content of acidic compounds and a second phase portion with a relatively low content of acidic compounds and a lower specific gravity than the first phase portion. The second discharge section discharges the treatment liquid containing the second phase portion that flows into the space, and the first discharge section discharges the treatment liquid other than the treatment liquid discharged through the second discharge section. The treatment fluid supply port is configured to be located below the liquid level of the treatment fluid in the absorption section during operation.

2. The absorption device according to claim 1, characterized in that, The processing liquid supply port is positioned closer to the reaction heat recovery unit than the connection portion of the processing liquid supply channel to the container.

3. The absorption device according to claim 1, characterized in that, The processing liquid supply port is located between the liquid surface and the upper end of the reaction heat recovery unit.

4. The absorption device according to claim 1, characterized in that, The processing liquid supply port is located within the height range of the reaction heat recovery unit.

5. The absorption device according to claim 1, characterized in that, The processing liquid supply port is located at or near the lower end of the reaction heat recovery unit.

6. The absorption device according to claim 1, characterized in that... Also includes: The serpentine section is configured such that the interior of the container is immersed in the treatment liquid, which causes the gas to be treated to serpentine and rise within the treatment liquid.

7. The absorption device according to claim 1, characterized in that... Also includes: An inlet chamber, connected to the outer surface of the bottom of the container, introduces refrigerant for recovering the heat of reaction into the heat recovery unit; and An outlet chamber, connected to the outer surface of the bottom of the container, discharges the refrigerant from the reaction heat recovery unit, wherein... The reaction heat recovery unit has a tube that extends vertically from the inner surface of the bottom in an inverted U-shape, with one end of the tube communicating with the inlet chamber and the other end of the tube communicating with the outlet chamber.

8. A gas processing device, characterized in that... include: The absorption device according to any one of claims 1 to 7; The regeneration device heats the treatment liquid after it has come into contact with the gas being treated, thereby separating the acidic compounds. as well as The flow path delivers the treated liquid, after it has come into contact with the gas being treated in the container, to the regeneration device.

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