在掩膜框架上形成对准标记的装置和方法、以及制造掩膜框架的装置和方法
An apparatus and method for forming alignment marks on a mask frame, utilizing a contact measuring device and a femtosecond laser, improves the alignment precision of the mask assembly, solves the problem of insufficient alignment mark precision between the mask frame and the mask sheet or mask strip, reduces errors in the OLED manufacturing process, and improves the resolution of the display device.
CN116096525BActive Publication Date: 2026-07-17PIMS INC
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- PIMS INC
- Filing Date
- 2021-10-15
- Publication Date
- 2026-07-17
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Figure CN116096525B_ABST
Abstract
公开的实施例的装置是一种在掩膜框架上形成对准标记(align mark)的装置，包括：接触式测量器，所述接触式测量器用于测量完成加工的掩膜框架的对准状态；对准装置，所述对准装置基于所述对准状态来对所述掩膜框架进行重新对准；以及打标装置，所述打标装置在完成所述重新对准后，在所述掩膜框架上形成对准标记；其中，当将所述掩膜框架与掩膜片或掩膜条结合以制造掩膜组件时，所述对准标记用于相互间对准。
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