Display panel and display device comprising the same

Abstract

The present disclosure provides a display panel and a display device including the same, the display device including a first optical electronic device located below the display panel and overlapping at least a portion of a first optical area included in a display area, and the display panel being configured such that: respective thicknesses of a first insulating layer in an ordinary area and in the first optical area can be less than respective thicknesses of a second insulating layer in the ordinary area and in the first optical area; a thickness of the first insulating layer disposed in the ordinary area can be greater than a thickness of the first insulating layer disposed in the first optical area; and a thickness of the second insulating layer disposed in the ordinary area can be greater than a thickness of the second insulating layer disposed in the first optical area.

Description

Technical Field

[0001] This disclosure relates to an electronic device, and more particularly to a display panel capable of improving the transmittance of an area where optical devices are disposed, and a display device including the display panel. Background Technology

[0002] With advancements in display technology, display devices can offer additional functionalities, such as image capture, sensing, and image display capabilities. To provide these functionalities, display devices may need to include optoelectronic devices, such as cameras and sensors for detecting images.

[0003] In order to receive light passing through the front surface of the display device, it may be desirable for the optical electronics to be located in an area of ​​the display device where it can advantageously receive or detect incident light from the front surface. Therefore, in such a display device, the optical electronics can be located at the front of the display device to allow the optical electronics to be effectively exposed to incident light. To mount the optical electronics in such an implementation, an increased bezel can be designed for the display device, or a notch or hole can be formed in the display area of ​​the display panel of the display device.

[0004] Therefore, it is expected that even when an optical electronic device (such as a camera, sensor, etc.) that receives or detects incident light and performs a predefined function is attached to the display device, the display device will have a higher transmittance to perform the intended function. Summary of the Invention

[0005] The inventors have developed a technique for providing or placing one or more optical electronic devices in a display device without reducing the area of ​​the display area of ​​the display panel of the display device. Through this development, the inventors have invented a display panel and display device with a light transmission structure in which the optical electronic devices can normally and properly receive or detect light even when the optical electronic devices are located below the display area of ​​the display panel and are therefore not exposed in the front surface of the display device.

[0006] In addition, the inventors have invented a display panel and display device having an area provided with optoelectronic devices configured to have a high transmittance structure and capable of forming the structure by a simple process.

[0007] One or more embodiments of this disclosure can provide a display panel and display device that can reduce the non-display area of ​​the display panel and, by placing the optical electronic devices below the display area of ​​the display panel or at the bottom of the display panel, enable optical electronic devices such as cameras and sensors to be concealed from being exposed on the front surface of the display panel.

[0008] One or more embodiments of this disclosure may provide a display panel and a display device having a light transmission structure, the light transmission structure being used to enable an optical electronic device located below the display area of ​​the display panel or in the lower part of the display panel to properly receive or detect light transmitted through the display panel.

[0009] One or more embodiments of this disclosure can provide a display panel and a display device that are capable of performing display driving normally in an optical region included in the display area of ​​the display panel and overlapping with an optoelectronic device.

[0010] According to an aspect of this disclosure, a display device is provided, the display device comprising: a display panel, the display panel including a display area and a non-display area, the display area including a first optical area and a normal area located outside the first optical area, wherein the first optical area includes a plurality of light-emitting areas and a plurality of first transmissive areas, and the normal area includes a plurality of light-emitting areas; and a first optoelectronic device located below or in the lower part of the display panel, and overlapping at least a portion of the first optical area included in the display area. The display panel includes: an organic light-emitting element disposed in the first optical area and the normal area; an encapsulation layer disposed on at least one of the organic light-emitting elements; a first insulating layer disposed on the encapsulation layer; a touch sensor disposed on the first insulating layer; and a second insulating layer disposed on the touch sensor. The corresponding thickness of the first insulating layer in the normal area and the first optical area may be less than the corresponding thickness of the second insulating layer in the normal area and the first optical area. The thickness of the first insulating layer disposed in the normal area may be greater than the thickness of the first insulating layer disposed in the first optical area. The thickness of the second insulating layer disposed in the ordinary area can be greater than the thickness of the second insulating layer disposed in the first optical area.

[0011] According to an aspect of this disclosure, a display panel is provided, the display panel comprising: a substrate including a display area and a non-display area; an organic light-emitting element disposed above the substrate in a first optical area and a general area; an encapsulation layer disposed on at least one of the organic light-emitting elements; a first insulating layer disposed on the encapsulation layer; a touch sensor disposed on the first insulating layer; and a second insulating layer disposed on the touch sensor. The display area includes a first optical area at least partially overlapping with a first optoelectronic device located below the substrate and a general area located outside the first optical area. The respective thicknesses of the first insulating layer in the general area and the first optical area may be less than the respective thicknesses of the second insulating layer in the general area and the first optical area. The thickness of the first insulating layer disposed in the general area may be greater than the thickness of the first insulating layer disposed in the first optical area. The thickness of the second insulating layer disposed in the general area may be greater than the thickness of the second insulating layer disposed in the first optical area.

[0012] According to one or more embodiments of the present disclosure, a display panel and display device can be provided that are capable of reducing the non-display area of ​​the display panel and that the optical electronic devices are not exposed on the front surface of the display panel by disposing the optical electronic devices below the display area of ​​the display panel or in the lower part of the display panel.

[0013] According to one or more embodiments of the present disclosure, a display panel and display device having a light transmission structure can be provided, wherein an optical electronic device located below the display area of ​​the display panel or in the lower part of the display panel has the ability to normally receive or detect light.

[0014] According to one or more embodiments of the present disclosure, a display panel and a display device can be provided that are capable of performing display driving normally in an optical region included in the display area of ​​the display panel and overlapping with an optoelectronic device.

[0015] According to one or more embodiments of the present disclosure, a display panel and display device can be provided having a structure in which an area provided with optical electronic devices is configured to have high transmittance, and the structure can be formed by a simple process.

[0016] Additional features and aspects will be set forth in part in the description which follows, and will also be apparent in part from the description, or may be learned by practicing the inventive concept provided herein. Other features and aspects of the inventive concept may be realized and obtained by means of structures particularly pointed out in the written description, its claims and drawings, or from which they may be derived.

[0017] Other systems, methods, features, and advantages will be or will become apparent to those skilled in the art upon studying the following figures and detailed description. All such additional systems, methods, features, and advantages are intended to be included within this specification, within the scope of this disclosure, and protected by the appended claims. Nothing in this section should be construed as limiting those claims.

[0018] It should be understood that the foregoing general description and the following detailed description of this disclosure are exemplary and illustrative, and are intended to provide further explanation of the claimed inventive concept. Attached Figure Description

[0019] The accompanying drawings, which are included to provide a further understanding of this disclosure and are incorporated in and constitute a part of this disclosure, illustrate aspects of this disclosure and, together with the description, serve to explain the principles of this disclosure. In the drawings:

[0020] Figure 1A , Figure 1B , Figure 1C and Figure 1D This is a plan view illustrating an example display device according to aspects of this disclosure;

[0021] Figure 2 An example system configuration of a display device according to aspects of this disclosure is illustrated;

[0022] Figure 3 An exemplary equivalent circuit for a sub-pixel in a display panel according to an aspect of this disclosure is illustrated;

[0023] Figure 4A An example arrangement of subpixels in three regions of a display area of ​​a display panel, according to aspects of this disclosure, is illustrated.

[0024] Figure 4B Another example structure of the first optical region of a display panel according to aspects of this disclosure is illustrated;

[0025] Figure 5A An example arrangement of signal lines in each of the first optical region and the general region of a display panel according to aspects of this disclosure is illustrated;

[0026] Figure 5B An example arrangement of signal lines in each of the second optical region and the general region of a display panel according to aspects of this disclosure is illustrated;

[0027] Figure 6 and Figure 7 This is an example cross-sectional view of each of the first optical region, the second optical region, and the ordinary region in the display area of ​​a display panel, according to aspects of this disclosure;

[0028] Figure 8 , Figure 9 , Figure 10 and Figure 11 This schematically illustrates the method for forming including Figure 6 Example process of the first insulating layer and the second insulating layer in a display device;

[0029] Figure 12 This is an example cross-sectional view of the edge of a display panel according to aspects of this disclosure; and

[0030] Figure 13 This is a table showing the yellow index and transmittance of the display devices at short wavelengths compared to Examples 1 and 2 and Embodiments 1 and 2. Detailed Implementation

[0031] Reference will now be made in detail to embodiments of this disclosure, examples of which are illustrated in the accompanying drawings. In the following description, unless otherwise stated, the structures, embodiments, implementations, methods, and operations described herein are not limited to one or more specific examples set forth herein, and may be varied as is known in the art. The names of the corresponding elements used in the following explanations are chosen solely for ease of writing the specification, and therefore may differ from those used in actual products.

[0032] The shapes, dimensions, ratios, angles, quantities, etc., illustrated in the accompanying drawings to describe various exemplary embodiments of this disclosure are given by way of example only. Therefore, this disclosure is not limited to the illustrations in the drawings. Unless otherwise stated, the same reference numerals always denote the same elements. The advantages and features of this disclosure and its implementation methods will be illustrated by the following exemplary embodiments described with reference to the accompanying drawings. However, this disclosure may be implemented in different forms and should not be construed as limited to the exemplary embodiments set forth herein. Rather, these exemplary embodiments are provided so that this disclosure is sufficiently thorough and complete to assist those skilled in the art in fully understanding the scope of this disclosure. Furthermore, the scope of protection of this disclosure is defined by the claims and their equivalents. In the following description, a detailed description of a known function or configuration may be omitted where such a detailed description might unnecessarily obscure aspects of this disclosure. Where terms such as “comprising,” “having,” “including,” “containing,” “constituting,” “forming,” “composed of,” “formed from,” etc., are used, one or more additional elements may be added unless a term such as “only” is used. Elements described in the singular are intended to include multiple elements, and vice versa, unless the context clearly indicates otherwise. The singular forms used herein are intended to include plural forms unless the context clearly indicates otherwise.

[0033] When constructing a component, the component will be interpreted as including a range of errors or tolerances, even if no explicit description of such a range of errors or tolerances is provided.

[0034] When describing positional relationships, such as when using terms like "above," "over," "below," "over," "beside," "next," etc., to describe the positional relationship between two parts, one or more other parts may be located between the two parts unless more restrictive terms such as "immediately," "directly," or "near" are used. For example, when an element or layer is placed "above" another element or layer, a third element or layer may be inserted therebetween. Furthermore, the terms "left," "right," "top," "bottom," "down," "up," "upper," "lower," etc., refer to any frame of reference. Temporal relative terms used to describe temporal relationships between events, operations, etc. (such as "after," "following," "next," "before," etc.) are generally intended to include events, situations, circumstances, operations, etc., that occur discontinuously, unless terms such as "directly," "immediately," etc., are used.

[0035] When describing temporal relationships, non-continuous cases may be included when describing the order of time as such as "after", "following", "next" or "before", unless more restrictive terms such as "only", "immediately" or "directly" are used.

[0036] While the terms “first,” “second,” A, B, (a), (b), etc., may be used herein to describe various elements, these elements should not be construed as being limited by these terms, as they are not used to define a particular order or priority. These terms are used herein only to distinguish elements from other elements. The expressions “first element,” “second element,” and “ / or” “third element” should be understood to mean one of the first, second, and third elements, or any combination of the first, second, and third elements.

[0037] For example, A, B, and / or C may refer to only A, only B, or only C; any one or some combinations of A, B, and C; or all of A, B, and C. Therefore, the first element mentioned below may be a second element in the technical concept of this disclosure.

[0038] Furthermore, the term “can” fully encompasses all the meanings of the term “able to”.

[0039] The term “at least one” should be understood to include any one or all combinations of one or more of the related listed items. For example, “at least one of the first element, the second element and the third element” means a combination of all three listed elements, a combination of any two of the three elements, and each individual element, the first element, the second element and the third element.

[0040] Various embodiments of this disclosure will be described in detail below with reference to the accompanying drawings.

[0041] Figure 1A , Figure 1B , Figure 1C and Figure 1D This is a plan view illustrating an example display device 100 according to aspects of this disclosure.

[0042] Reference Figure 1A , Figure 1B , Figure 1C and Figure 1D The display device 100 according to aspects of this disclosure may include a display panel 110 for displaying images and one or more optical electronic devices (11 and / or 12).

[0043] The display panel 110 may include a display area DA for displaying images and a non-display area NDA for not displaying images.

[0044] Multiple subpixels can be arranged in the display area DA, and several types of signal lines used to drive the multiple subpixels can be arranged therein.

[0045] The non-display area NDA can refer to the area outside the display area DA. Various types of signal lines can be arranged in the non-display area NDA, and various types of drive circuits can be connected to it. At least a portion of the non-display area NDA can be bent to be invisible from the front of the display panel, or it can be covered by the housing (not shown) of the display panel 110 or the display device 100. The non-display area NDA can also be referred to as a bezel or bezel area.

[0046] Reference Figure 1A , Figure 1B , Figure 1C and Figure 1D In the display device 100 according to aspects of the present disclosure, one or more optical electronic devices (11 and / or 12) may be located below the display panel 110 or in the lower part of the display panel 110 (opposite to its viewing surface).

[0047] Light can enter the front surface (viewing surface) of the display panel 110, pass through the display panel 110, and reach one or more optical electronic devices (11 and / or 12) located below the display panel 110 or on the lower part of the display panel 110 (opposite side of the viewing surface).

[0048] One or more optical electronic devices (11 and / or 12) can receive or detect light transmitted through the display panel 110 and perform predefined functions based on the received light. For example, one or more optical electronic devices (11 and / or 12) may include one or more of the following: an image capturing device, such as a camera (image sensor); or a sensor, such as a proximity sensor, an illuminance sensor, etc.

[0049] Reference Figure 1A , Figure 1B , Figure 1C and Figure 1D In the display panel 110 according to aspects of this disclosure, the display area DA may include one or more optical areas (OA1 and / or OA2) and a general area NA. Hereinafter, the term "general area" NA is an area that, when present in the display area DA, does not overlap with one or more optoelectronic devices (11 and / or 12) and may also be referred to as a non-optical area.

[0050] Reference Figure 1A , Figure 1B , Figure 1C and Figure 1D One or more optical regions (OA1 and / or OA2) may be one or more regions that overlap with one or more optoelectronic devices (11 and / or 12).

[0051] according to Figure 1A For example, the display area DA may include a first optical area OA1 and a normal area NA. In this example, at least a portion of the first optical area OA1 may overlap with the first optoelectronic device 11.

[0052] Although Figure 1A An example is shown where the first optical region OA1 has a circular shape, but the shape of the first optical region OA1 according to embodiments of the present disclosure is not limited thereto.

[0053] For example, such as Figure 1B As shown, the first optical region OA1 can have an octagonal shape or various polygonal shapes.

[0054] according to Figure 1C For example, the display area DA may include a first optical area OA1, a second optical area OA2, and a normal area NA. Figure 1C In this example, at least a portion of the ordinary region NA may exist between the first optical region OA1 and the second optical region OA2. In this example, at least a portion of the first optical region OA1 may overlap with the first optoelectronic device 11, and at least a portion of the second optical region OA2 may overlap with the second optoelectronic device 12.

[0055] according to Figure 1D For example, the display area DA may include a first optical area OA1, a second optical area OA2, and a normal area NA. Figure 1D In this example, the ordinary region NA may not exist between the first optical region OA1 and the second optical region OA2. For example, the first optical region OA1 and the second optical region OA2 may be in contact with each other (e.g., in direct contact). In this example, at least a portion of the first optical region OA1 may overlap with the first optoelectronic device 11, and at least a portion of the second optical region OA2 may overlap with the second optoelectronic device 12.

[0056] In some implementations, it is desirable to form an image display structure and a light transmission structure within one or more optical regions (OA1 and / or OA2). For example, since one or more optical regions (OA1 and / or OA2) are part of a display area DA, it is necessary to set subpixels for displaying the image within one or more optical regions (OA1 and / or OA2). Furthermore, in order for light to be able to pass through one or more optoelectronic devices (11 and / or 12), a light transmission structure is required, and therefore, the light transmission structure is formed within one or more optical regions (OA1 and / or OA2).

[0057] Even if one or more optical electronic devices (11 and / or 12) are required to receive or detect light, one or more optical electronic devices (11 and / or 12) may be located on the back side of the display panel 110 (e.g., on the opposite side of the viewing surface). In this embodiment, one or more optical electronic devices (11 and / or 12) are located, for example, below or in the lower part of the display panel 110, and are configured to receive light that has been transmitted through the display panel 110.

[0058] For example, one or more optoelectronic devices (11 and / or 12) are not exposed on the front surface (viewing surface) of the display panel 110. Therefore, when a user views the front of the display device 100, one or more optoelectronic devices (11 and / or 12) are positioned to be invisible to the user.

[0059] In one embodiment, the first optical electronic device 11 may be a camera, and the second optical electronic device 12 may be a sensor such as a proximity sensor, an illumination sensor, an infrared sensor, etc. For example, the camera may be a webcam, an image sensor, or a unit that includes at least one of a webcam and an image sensor. The sensor may be, for example, an infrared sensor capable of detecting infrared light.

[0060] In another embodiment, the first optical electronic device 11 may be a sensor, and the second optical electronic device 12 may be a camera.

[0061] In the following discussion, for convenience only, reference will be made to an embodiment where the first optical electronic device 11 is a camera and the second optical electronic device 12 is a sensor. However, it should be understood that the scope of this disclosure includes embodiments where the first optical electronic device 11 is a sensor and the second optical electronic device 12 is a camera. For example, the camera may be a webcam, an image sensor, or a unit that includes at least one of a webcam and an image sensor.

[0062] In an example where the first optical electronic device 11 is a camera, the camera may be located on the back of the display panel 110 (e.g., below or in the lower part), and may be a front-facing camera capable of capturing objects or images in front of the display panel 110. Therefore, a user can capture images or objects by means of a camera that is not visible on the viewing surface while viewing the viewing surface of the display panel 110.

[0063] Although Figure 1A , Figure 1B , Figure 1C and Figure 1D In each of the display areas DA, there are ordinary areas NA and one or more optical areas (OA1 and / or OA2) that are areas where images can be displayed. However, the ordinary area NA is an area that does not require the formation of a light transmission structure, while the one or more optical areas (OA1 and / or OA2) are areas that require the formation of a light transmission structure. Therefore, in some embodiments, the ordinary area NA is an area that does not have or include a light transmission structure, while the one or more optical areas (OA1 and / or OA2) are areas that have or include a light transmission structure.

[0064] Therefore, one or more optical regions (OA1 and / or OA2) may have a transmittance greater than or equal to a predetermined level, i.e., relatively high transmittance, and the general region NA may have no light transmission or a transmittance less than a predetermined level, i.e., relatively low transmittance.

[0065] For example, one or more optical regions (OA1 and / or OA2) may have different resolutions, subpixel arrangements, number of subpixels per unit area, electrode structures, line structures, electrode arrangements, line arrangements, etc., than ordinary regions NA.

[0066] In one implementation, the number of subpixels per unit area in one or more optical regions (OA1 and / or OA2) may be less than the number of subpixels per unit area in the ordinary region NA. For example, the resolution of one or more optical regions (OA1 and / or OA2) may be lower than the resolution of the ordinary region NA. Here, the number of subpixels per unit area may be a unit used to measure resolution, for example, referred to as pixels per inch (or subpixels) (PPI), which represents the number of pixels per inch.

[0067] In one implementation, Figure 1A , Figure 1B , Figure 1C and Figure 1D In each of these, the number of sub-pixels per unit area in the first optical region OA1 can be less than the number of sub-pixels per unit area in the ordinary region NA. In one embodiment, in Figure 1C and Figure 1D In each of the two optical regions, the number of sub-pixels per unit area in the second optical region OA2 can be greater than or equal to the number of sub-pixels per unit area in the first optical region OA1.

[0068] exist Figure 1A , Figure 1B , Figure 1C and Figure 1D In each of these, the first optical region OA1 can have various shapes, such as circular, elliptical, quadrilateral, hexagonal, octagonal, etc. Figure 1C and Figure 1D In each of the two optical regions, the second optical region OA2 can have various shapes, such as circular, elliptical, quadrilateral, hexagonal, octagonal, etc. The first optical region OA1 and the second optical region OA2 can have the same shape or different shapes.

[0069] Reference Figure 1C In the example where the first optical region OA1 and the second optical region OA2 are in contact with each other, the entire optical region including the first optical region OA1 and the second optical region OA2 can also have various shapes, such as circles, ellipses, quadrilaterals, hexagons, octagons, etc.

[0070] In the following discussion, for ease of description, embodiments in which each of the first optical region OA1 and the second optical region OA2 has a circular shape will be provided. However, it should be understood that the scope of the invention includes embodiments in which one or both of the first optical region OA1 and the second optical region OA2 have a shape other than a circular shape.

[0071] In this document, a display device 100 having a structure in which a first optical electronic device 11 is positioned under or in the lower part of the display panel 110 and not exposed to the outside, according to aspects of this disclosure, may be referred to as a display (or display device) to which under-display camera (UDC) technology is applied.

[0072] The display device 100 with this configuration can have the advantage of preventing the size of the display area DA from shrinking, because it is not necessary to form a notch or camera hole in the display panel 110 for exposing the camera.

[0073] Since the notch or camera hole for camera exposure does not need to be formed in the display panel 110, the display device 100 can have other advantages such as reduced bezel area size and improved design freedom (because such restrictions on design are removed).

[0074] Although, according to aspects of this disclosure, one or more optical electronic devices (11 and / or 12) are positioned to cover the back (below or in the lower part) of the display panel 110 in the display device 100, i.e., to be hidden from the outside, one or more optical electronic devices (11 and / or 12) need to be able to receive or detect light for the normal performance of predefined functions.

[0075] Furthermore, in the display device 100 according to aspects of this disclosure, although one or more optical electronic devices (11 and / or 12) are positioned to cover the back (below or in the lower part) of the display panel 110 and are positioned to overlap with the display area DA, it is generally necessary to perform image display in one or more optical areas (OA1 and / or OA2) in the area DA that overlap with one or more optical electronic devices (11 and / or 12).

[0076] Figure 2 An example system configuration of a display device 100 according to aspects of this disclosure is illustrated.

[0077] Reference Figure 2 The display device 100 may include a display panel 110 and a display driving circuit, which are components for displaying images.

[0078] The display driving circuit is a circuit used to drive the display panel 110, and may include a data driving circuit 220, a gating driving circuit 230, a display controller 240, and other components.

[0079] The display panel 110 may include a display area DA for displaying images and a non-display area NDA for not displaying images. The non-display area NDA may be an area outside the display area DA and may also be referred to as an edge area or a border area. All or part of the non-display area NDA may be an area visible from the front surface of the display device 100, or an area not visible from the front surface of the display device 100 when the corresponding portion is bent.

[0080] The display panel 110 may include a substrate SUB and a plurality of sub-pixels SP disposed on the substrate SUB. The display panel 110 may also include various signal lines to drive the plurality of sub-pixels SP.

[0081] In some embodiments, the display device 100 herein may be a liquid crystal display device or a self-emitting display device that emits light from the display panel 110 itself. In an example where the display device 100 according to aspects of this disclosure is a self-emitting display device, each of the plurality of sub-pixels SP may include a light-emitting element.

[0082] In one embodiment, the display device 100 according to aspects of the present disclosure may be an organic light-emitting display device, wherein the light-emitting element is implemented using an organic light-emitting diode (OLED). In another embodiment, the display device 100 according to aspects of the present disclosure may be an inorganic light-emitting display device, wherein the light-emitting element is implemented using a light-emitting diode based on inorganic materials. In yet another embodiment, the display device 100 according to aspects of the present disclosure may be a quantum dot display device, wherein the light-emitting element is implemented using quantum dots as self-emitting semiconductor crystals.

[0083] The structure of each of the plurality of subpixels SP can vary depending on the type of display device 100. In an example where the display device 100 is a self-emitting display device including self-emitting subpixels SP, each subpixel SP may include a self-emitting light-emitting element, one or more transistors, and one or more capacitors.

[0084] The various types of signal lines arranged in the display device 100 may include, for example, multiple data lines DL for carrying data signals (which may be referred to as data voltage or image signals), multiple gating lines GL for carrying gating signals (which may be referred to as scan signals), etc.

[0085] Multiple data lines (DL) and multiple gating lines (GL) can intersect each other. Each of the multiple data lines (DL) can extend in a first direction. Each of the multiple gating lines (GL) can extend in a second direction.

[0086] For example, the first direction can be a column or a vertical direction, and the second direction can be a row or a horizontal direction. In another example, the first direction can be a row direction, and the second direction can be a column direction.

[0087] The data driving circuit 220 can be a circuit for driving multiple data lines DL, and can provide data signals to the multiple data lines DL. The gating driving circuit 230 can be a circuit for driving multiple gating lines GL, and can provide gating signals to the multiple gating lines GL.

[0088] The display controller 240 can be a device for controlling the data drive circuit 220 and the gating drive circuit 230, and can control the driving timing of multiple data lines DL and multiple gating lines GL.

[0089] The display controller 240 can provide a data drive control signal DCS to the data drive circuit 220 to control the data drive circuit 220, and provide a gating drive control signal GCS to the gating drive circuit 230 to control the gating drive circuit 230.

[0090] The display controller 240 can receive input image data from the host system 250 and supply image data Data to the data drive circuit 220 based on the input image data.

[0091] The data drive circuit 220 can provide data signals to multiple data lines DL according to the drive timing control of the display controller 240.

[0092] The data drive circuit 220 can receive digital image data Data from the display controller 240, convert the received image data Data into an analog data signal, and provide the obtained analog data signal to multiple data lines DL.

[0093] The gating drive circuit 230 can provide gating signals to multiple gating lines GL according to the timing control of the display controller 240. The gating drive circuit 230 can receive a first gating voltage corresponding to the on-level voltage and a second gating voltage corresponding to the off-level voltage, as well as various gating drive control signals GCS, generate gating signals, and provide the generated gating signals to the multiple gating lines GL.

[0094] In some implementations, the data drive circuit 220 may be connected to the display panel 110 in a tape auto-bonding (TAB) type, or to a conductive pad such as a bonding pad of the display panel 110 in a chip-on-glass (COG) type or chip-on-panel (COP) type, or to the display panel 110 in a chip-on-film (COF) type.

[0095] In some embodiments, the gate drive circuit 230 may be connected to the display panel 110 in a tape auto-bonding (TAB) type, or to conductive pads such as bonding pads of the display panel 110 in a chip-on-glass (COG) or chip-on-panel (COP) type, or to the display panel 110 in a chip-on-film (COF) type. In another embodiment, the gate drive circuit 230 may be disposed in the non-display area NDA of the display panel 110 in a gate-in-panel (GIP) type. The gate drive circuit 230 may be disposed on or above the substrate, or connected to the substrate. That is, in the case of the GIP type, the gate drive circuit 230 may be disposed in the non-display area NDA of the substrate. In the cases of chip-on-glass (COG), chip-on-film (COF), etc., the gate drive circuit 230 may be connected to the substrate.

[0096] In some embodiments, at least one of the data driving circuit 220 and the gating driving circuit 230 may be disposed in the display area DA of the display panel 110. For example, at least one of the data driving circuit 220 and the gating driving circuit 230 may be configured not to overlap with the sub-pixel SP, or may be configured to overlap with one or more or all of the sub-pixels SP.

[0097] The data driving circuit 220 may also be located on, but is not limited to, one side or a portion of the display panel 110 (e.g., the top edge or the bottom edge). In some embodiments, depending on the driving scheme, panel design, etc., the data driving circuit 220 may be located on, but is not limited to, two sides or portions of the display panel 110 (e.g., the top edge and the bottom edge) or at least two of the four sides or portions of the display panel 110 (e.g., the top edge, the bottom edge, the left edge, and the right edge).

[0098] The gating drive circuit 230 may be located only on one side or a portion of the display panel 110 (e.g., the left edge or the right edge). In some embodiments, depending on the driving scheme, panel design, etc., the gating drive circuit 230 may be connected to two sides or portions of the display panel 110 (e.g., the left edge and the right edge), or connected to at least two of the four sides or portions of the display panel 110 (e.g., the top edge, the bottom edge, the left edge, and the right edge).

[0099] The display controller 240 can be implemented in a component separate from the data drive circuit 220, or integrated with the data drive circuit 220 and therefore implemented in an integrated circuit.

[0100] Display controller 240 may be a timing controller used in typical display technologies or a controller or control device capable of performing control functions other than those of a typical timing controller. In some embodiments, display controller 240 may be a controller or control device different from the timing controller or may be circuitry or components included in a controller or control device. Display controller 240 may be implemented using various circuitry or electronic components, such as integrated circuits (ICs), field-programmable gate arrays (FPGAs), application-specific integrated circuits (ASICs), processors, etc.

[0101] The display controller 240 can be mounted on a printed circuit board, flexible printed circuit, etc., and is electrically connected to the gating drive circuit 230 and the data drive circuit 220 via the printed circuit board, flexible printed circuit, etc.

[0102] The display controller 240 can send signals to and receive signals from the data driver circuit 220 via one or more predefined interfaces. In some embodiments, such interfaces may include a low-voltage differential signaling (LVDS) interface, an embedded point-to-point clock interface (EPI), a serial peripheral interface (SPI), etc.

[0103] In some embodiments, to further provide touch sensing and image display functions, the display device 100 may include at least one touch sensor and a touch sensing circuit capable of detecting whether a touch object (e.g., a finger, pen, etc.) has triggered a touch event or capable of detecting the corresponding touch position by sensing the touch sensor.

[0104] The touch sensing circuit may include: a touch driving circuit 260, which generates and provides touch sensing data by driving and sensing a touch sensor; a touch controller 270, which uses the touch sensing data to detect the occurrence of a touch event or to detect the touch position; and one or more other components.

[0105] The touch sensor may include multiple touch electrodes. The touch sensor may also include multiple touch lines for electrically connecting the multiple touch electrodes to the touch driving circuitry 260.

[0106] The touch sensor can be implemented externally to the display panel 110, within the touch panel, or as a form of the touch panel, or internally. In the example where the touch sensor is implemented externally to the display panel 110, within the touch panel, or as a form of the touch panel, this type of touch sensor is referred to as an additional type. In the example of setting an additional type touch sensor, the touch panel and display panel 110 can be manufactured and coupled separately during the assembly process. The additional type touch panel may include a touch panel substrate and a plurality of touch electrodes located on the touch panel substrate.

[0107] In an example where the touch sensor is implemented inside the display panel 110, the process of manufacturing the display panel 110 may include placing the touch sensor, along with signal lines and electrodes associated with driving the display device 100, above the substrate SUB.

[0108] The touch driving circuit 260 can provide a touch driving signal to at least one of a plurality of touch electrodes and sense at least one of the plurality of touch electrodes to generate touch sensing data.

[0109] Touch sensing circuits can use self-capacitance sensing technology or mutual capacitance sensing technology to perform touch sensing.

[0110] In an example where the touch sensing circuit performs touch sensing using self-capacitance sensing technology, the touch sensing circuit can perform touch sensing based on the capacitance between each touch electrode and the touch object (e.g., a finger, a pen, etc.).

[0111] According to self-capacitance sensing technology, each of the multiple touch electrodes can be used simultaneously as both a driving touch electrode and a sensing touch electrode. The touch driving circuit 260 can drive all or one or more of the multiple touch electrodes and sense all or one or more of the multiple touch electrodes.

[0112] In an example where the touch sensing circuit performs touch sensing using mutual capacitance sensing technology, the touch sensing circuit can perform touch sensing based on the capacitance between the touch electrodes.

[0113] Based on mutual capacitance sensing technology, multiple touch electrodes are divided into driving touch electrodes and sensing touch electrodes. The touch driving circuit 260 can drive the driving touch electrodes and sense the sensing touch electrodes.

[0114] The touch driving circuit 260 and touch controller 270 included in the touch sensing circuit can be implemented in separate devices or in a single device. Furthermore, the touch driving circuit 260 and data driving circuit 220 can be implemented in separate devices or in a single device.

[0115] The display device 100 may also include a power supply circuit for providing various types of power to the display driving circuit and / or touch sensing circuit.

[0116] In some embodiments, the display device 100 may be a mobile terminal (such as a smartphone, tablet, etc.), or a monitor, television (TV), etc. Such devices may have various types, sizes, and shapes. The display device 100 according to embodiments of this disclosure is not limited thereto, and includes displays of various types, sizes, and shapes for displaying information or images.

[0117] As described above, the display area DA of the display panel 110 may include a normal area NA and one or more optical areas (OA1 and / or OA2), for example, such as Figure 1A , Figure 1B , Figure 1C and Figure 1D As shown.

[0118] A normal region NA and one or more optical regions (OA1 and / or OA2) are areas where an image can be displayed. However, a normal NA is a region where a light transmission structure is not required, while one or more optical regions (OA1 and / or OA2) are regions where a light transmission structure is required.

[0119] As mentioned above Figure 1A , Figure 1B , Figure 1C and Figure 1D As discussed in the examples, although for ease of description, the display area DA of the display panel 110 may include one or more optical areas (OA1 and / or OA2) in addition to the ordinary area NA, in the following discussion, it is assumed that the display area DA includes the first optical area (OA1), the second optical area (OA2), and the ordinary area NA, as... Figure 1C and Figure 1D As shown; and its general region NA includes Figure 1A , Figure 1B , Figure 1C and Figure 1D The ordinary region NA in the image, and its first optical region (OA1) and second optical region (OA2) respectively include Figure 1A , Figure 1B , Figure 1C and Figure 1D The first optical region OA1 and Figure 1C and Figure 1D The second optical region OA2, unless otherwise explicitly stated.

[0120] Figure 3 An example equivalent circuit of a sub-pixel SP in a display panel 110 according to an aspect of this disclosure is illustrated.

[0121] Each sub-pixel SP in the display area DA of the display panel 110, including the ordinary area NA, the first optical area OA1, and the second optical area OA2, may include a light-emitting element ED, a driving transistor DRT for driving the light-emitting element ED, a scanning transistor SCT for transmitting the data voltage Vdata to the first node N1 of the driving transistor DRT, and a storage capacitor Cst for maintaining the voltage at an approximately constant level during a frame, etc.

[0122] The driving transistor DRT may include a first node N1 to which a data voltage is applied, a second node N2 electrically connected to a light-emitting element ED, and a third node N3 to which a driving voltage ELVDD is applied via a driving voltage line DVL. In the driving transistor DRT, the first node N1 may be a gate node, the second node N2 may be a source node or a drain node, and the third node N3 may be a drain node or a source node.

[0123] The light-emitting element ED may include an anode AE, a light-emitting layer EL, and a cathode CE. The anode AE ​​may be a pixel electrode disposed in each sub-pixel SP and may be electrically connected to the second node N2 of the driving transistor DRT of each sub-pixel SP. The cathode CE may be a common electrode typically disposed in multiple sub-pixels SP, and a base voltage ELVSS, such as a low-level voltage, may be applied to the cathode CE.

[0124] For example, the anode AE ​​can be a pixel electrode, while the cathode CE can be a common electrode. In another example, the anode AE ​​can be a common electrode, while the cathode CE can be a pixel electrode. For ease of description, in the following discussion, unless otherwise explicitly stated, it is assumed that the anode AE ​​is a pixel electrode and the cathode CE is a common electrode.

[0125] The light-emitting element (ED) can be, for example, an organic light-emitting diode (OLED), an inorganic light-emitting diode, or a quantum dot light-emitting element. In embodiments using an organic light-emitting diode as the light-emitting element (ED), the light-emitting layer (EL) included in the ED can include an organic light-emitting layer containing organic materials.

[0126] The scanning transistor SCT can be turned on and off by the scanning signal SCAN, which is a gating signal applied by the gating line GL. The scanning transistor SCT is electrically connected between the first node N1 of the driving transistor DRT and the data line DL.

[0127] The storage capacitor Cst can be electrically connected between the first node N1 and the second node N2 of the driving transistor DRT.

[0128] Each sub-pixel SP can include two transistors (2T: DRT and SCT) and one capacitor (1C: Cst) (which can be referred to as a "2T1C structure"), such as Figure 3 As shown, and in some cases, it may also include one or more transistors, or one or more capacitors.

[0129] In some implementations, the storage capacitor Cst that may exist between the first node N1 and the second node N2 of the driving transistor DRT may be an external capacitor that is intentionally configured or designed to be located outside the driving transistor DRT, rather than an internal capacitor, such as a parasitic capacitor (e.g., gate-to-source capacitance Cgs, gate-to-drain capacitance Cgd, etc.).

[0130] Each of the driving transistor DRT and the scanning transistor SCT can be an n-type transistor or a p-type transistor.

[0131] Since the circuit elements (e.g., specifically, the light-emitting element ED) in each sub-pixel SP are susceptible to external moisture or oxygen, an encapsulation layer ENCAP can be provided in the display panel 110 to prevent external moisture or oxygen from penetrating into the circuit elements (e.g., specifically, the light-emitting element ED). The encapsulation layer ENCAP can be configured to cover the light-emitting element ED.

[0132] Figure 4A An example arrangement of subpixels SP in three regions (NA, OA1, and OA2) included in the display area DA of a display panel 110 according to an aspect of the present disclosure is illustrated.

[0133] Figure 4B Another exemplary structure of the first optical region of the display panel 110 according to aspects of this disclosure is illustrated.

[0134] Reference Figure 4A In some implementations, multiple sub-pixels SP can be set in each of the ordinary area NA, the first optical area OA1, and the second optical area OA2 included in the display area DA.

[0135] Multiple sub-pixels SP may include, for example, a red sub-pixel that emits red light (red SP), a green sub-pixel that emits green light (green SP), and a blue sub-pixel that emits blue light (blue SP).

[0136] Therefore, each of the ordinary region NA, the first optical region OA1, and the second optical region OA2 may include one or more light-emitting regions EA of one or more red sub-pixels (red SP), one or more light-emitting regions EA of one or more green sub-pixels (green SP), and one or more light-emitting regions EA of one or more blue sub-pixels (blue SP).

[0137] Reference Figure 4A In some implementations, the ordinary region NA may not include a light-transmitting structure, but may include a light-emitting region EA.

[0138] In contrast, in some implementations, the first optical region OA1 and the second optical region OA2 need to include both the light-emitting region EA and the light-transmitting structure.

[0139] Therefore, the first optical region OA1 may include one or more light-emitting regions EA and one or more first transmission regions TA1, and the second optical region OA2 may include one or more light-emitting regions EA and one or more second transmission regions TA2.

[0140] The luminescent area EA and the transmissive area (TA1 and / or TA2) can differ depending on whether light transmission is permitted. For example, the luminescent area EA can be an area where light transmission is not permitted (e.g., light transmission to the back of the display panel is not permitted), and the transmissive area (TA1 and / or TA2) can be an area where light transmission is permitted (e.g., light transmission to the back of the display panel is permitted).

[0141] The luminescent region EA and the transmissive region (TA1 and / or TA2) can also vary depending on whether a specific metal layer is included. For example, as Figure 3 The cathode CE shown can be disposed in the light-emitting region EA, and the cathode CE may not be disposed in the transmission regions (TA1 and / or TA2). In some embodiments, the light-shielding layer may be disposed in the light-emitting region EA, and the light-shielding layer may not be disposed in the transmission regions (TA1 and / or TA2).

[0142] Since the first optical region OA1 includes the first transmission region TA1 and the second optical region OA2 includes the second transmission region TA2, both the first optical region OA1 and the second optical region OA2 are regions through which light can be transmitted.

[0143] In one embodiment, the transmittance (transmission level) of the first optical region OA1 is substantially equal to the transmittance (transmission level) of the second optical region OA2.

[0144] For example, the first transmission region TA1 of the first optical region OA1 and the second transmission region TA2 of the second optical region OA2 can have substantially the same shape or size. In another example, even if the first transmission region TA1 of the first optical region OA1 and the second transmission region TA2 of the second optical region OA2 have different shapes or sizes, the ratio of the first transmission region TA1 to the first optical region OA1 and the ratio of the second transmission region TA2 to the second optical region OA2 can be substantially equal. In one example, each of the first transmission regions TA1 has the same shape and size. In one example, each of the second transmission regions TA2 has the same shape and size.

[0145] In another embodiment, the transmittance (transmission level) of the first optical region OA1 and the transmittance (transmission level) of the second optical region OA2 may be different from each other.

[0146] For example, the first transmission region TA1 of the first optical region OA1 and the second transmission region TA2 of the second optical region OA2 can have different shapes or sizes. In another example, even when the first transmission region TA1 of the first optical region OA1 and the second transmission region TA2 of the second optical region OA2 have substantially the same shape or size, the ratio of the first transmission region TA1 to the first optical region OA1 and the ratio of the second transmission region TA2 to the second optical region OA2 can be different from each other.

[0147] For example, in such Figure 1A , Figure 1B and Figure 1C The first optical electronic device 11, which overlaps with the first optical region OA1, is a camera, and as shown... Figure 1C and Figure 1D The second optical electronic device 12 shown overlapping with the second optical region OA2 is an example of a sensor used for detecting images. The camera may require a larger amount of light than the sensor.

[0148] Therefore, the transmittance (transmission level) of the first optical region OA1 can be greater than that of the second optical region OA2.

[0149] For example, the first transmission region TA1 of the first optical region OA1 can have a larger size than the second transmission region TA2 of the second optical region OA2. In another example, even when the first transmission region TA1 of the first optical region OA1 and the second transmission region TA2 of the second optical region OA2 have substantially the same size, the ratio of the first transmission region TA1 to the first optical region OA1 can be greater than the ratio of the second transmission region TA2 to the second optical region OA2.

[0150] In one implementation, such as Figure 4A As shown, the first transmission region TA1 of the first optical region OA1 may have a circular shape in the cross-sectional view, but the structure of the first transmission region TA1 according to the embodiments of this disclosure is not limited to this.

[0151] In another embodiment, such as Figure 4B As shown, the first transmission region TA1 of the first optical region OA1 can have an octagonal shape. In some embodiments, the first transmission region TA1 of the first optical region OA1 can have an elliptical or polygonal shape.

[0152] In this way, by changing the shape of the first transmission region TA1, the transmittance of the first transmission region TA1 can be adjusted, and the area or size of the light-emitting region of the first optical region OA1 can be adjusted.

[0153] For ease of description, the following discussion is provided for an implementation in which the transmittance (transmission level) of the first optical region OA1 is greater than that of the second optical region OA2.

[0154] In addition, such as Figure 4A The transmissive regions shown (TA1 and / or TA2) can be referred to as transparent regions, and the term transmittance can be referred to as transparency.

[0155] Furthermore, in the following discussion, it is assumed that the first optical region OA1 and the second optical region OA2 are located in the upper edge of the display area DA of the display panel 110, and are arranged to be horizontally adjacent to each other, such as, arranged in a direction extending along the upper edge, as shown below. Figure 4A As shown, unless otherwise expressly stated.

[0156] Reference Figure 4A A horizontal display area with a first optical region OA1 and a second optical region OA2 is referred to as the first horizontal display area HA1, and another horizontal display area without the first optical region OA1 and the second optical region OA2 is referred to as the second horizontal display area HA2.

[0157] Reference Figure 4A The first horizontal display area HA1 may include a portion of the normal area NA, the first optical area OA1, and the second optical area OA2. The second horizontal display area HA2 may include only the remaining portion of the normal area NA.

[0158] Figure 5A An example arrangement of signal lines in each of the first optical region OA1 and the ordinary region NA of a display panel 110 according to aspects of this disclosure is illustrated, and Figure 5B An example arrangement of signal lines in each of the second optical region OA2 and the general region NA of a display panel 110 according to an aspect of this disclosure is illustrated.

[0159] Figure 5A and Figure 5B The first horizontal display area HA1 shown is a portion of the first horizontal display area HA1 of the display panel 110. Figure 5A and Figure 5B The second horizontal display area HA2 shown is a portion of the second horizontal display area HA2 of the display panel 110.

[0160] Figure 5AThe first optical region OA1 shown is a part of the first optical region OA1 of the display panel 110, and Figure 5B The second optical region OA2 shown is a part of the second optical region OA2 of the display panel 110.

[0161] Reference Figure 5A and Figure 5B The first horizontal display area HA1 may include a portion of the normal area NA, the first optical area OA1, and the second optical area OA2. The second horizontal display area HA2 may include another portion of the normal area NA.

[0162] Various types of horizontal lines (HL1 and HL2) and various types of vertical lines (VLn, VL1 and VL2) can be set in the display panel 110.

[0163] In some implementations, the terms "horizontal" and "vertical" are used to refer to two directions intersecting the display panel; however, it should be noted that the horizontal and vertical directions may vary depending on the viewing orientation. The horizontal direction may refer, for example, the direction in which a gate line GL extends, and the vertical direction may refer, for example, the direction in which a data line DL extends. Therefore, the terms "horizontal" and "vertical" are used to represent two directions.

[0164] Reference Figure 5A and Figure 5B The horizontal lines set in the display panel 110 may include a first horizontal line HL1 set in the first horizontal display area HA1 and a second horizontal line HL2 set in the second horizontal display area HA2.

[0165] The horizontal lines set in the display panel 110 can be gate lines GL. That is, the first horizontal line HL1 and the second horizontal line HL2 can be gate lines GL. Depending on the structure of one or more sub-pixels SP, the gate lines GL can include various types of gate lines.

[0166] Reference Figure 5A and Figure 5B The vertical lines provided in the display panel 110 may include a vertical line VLn provided only in the normal area NA, a first vertical line VL1 extending through both the first optical area OA1 and the normal area NA, and a second vertical line VL2 extending through both the second optical area OA2 and the normal area NA.

[0167] The vertical lines provided in the display panel 110 may include data lines DL, driving voltage lines DVL, etc., and may also include reference voltage lines, initialization voltage lines, etc. That is to say, a typical vertical line VLn, a first vertical line VL1, and a second vertical line VL2 may include data lines DL, driving voltage lines DVL, etc., and may also include reference voltage lines, initialization voltage lines, etc.

[0168] In some implementations, it should be noted that the term "horizontal" in the second horizontal line HL2 may simply mean that the signal is carried from the left side to the right side (or from the right side to the left side) of the display panel, and may not mean that the second horizontal line HL2 travels in a straight line only in the direct horizontal direction. For example, in Figure 5A and Figure 5B In the diagram, although the second horizontal line HL2 is illustrated as a straight line, one or more of the second horizontal lines HL2 may include lines that are parallel to each other. Figure 5A and Figure 5B The configuration shown has one or more curved or folded sections. Similarly, one or more of the first horizontal lines HL1 may also include one or more curved or folded sections.

[0169] In some implementations, it should be noted that the term "vertical" in a typical vertical line VLn may simply mean that the signal is carried from the top to the bottom (or from the bottom to the top) of the display panel, and may not mean that a typical vertical line VLn extends in a straight line only in the directly vertical direction. For example, in Figure 5A and Figure 5B In this context, although a typical vertical line VLn is exemplified as a straight line, one or more typical vertical lines VLn can include... Figure 5A and Figure 5B The configuration shown may include one or more curved or folded sections. Similarly, one or more of the first vertical lines VL1 and one or more of the second vertical lines VL2 may also include one or more curved or folded sections.

[0170] Reference Figure 5A The first optical region OA1, including the first horizontal display region HA1, may include, for example, Figure 4A The light-emitting region EA and the first transmission region TA1 are shown. In the first optical region OA1, the corresponding outer region of the first transmission region TA1 may include the corresponding light-emitting region EA.

[0171] Reference Figure 5A In order to improve the transmittance of the first optical region OA1, the first horizontal line HL1 can extend through the first optical region OA1 while avoiding the first transmission region TA1 in the first optical region OA1.

[0172] Therefore, each of the first horizontal lines HL1 extending through the first optical region OA1 may include one or more curved or bent portions extending around one or more corresponding outer edges of one or more of the first transmission regions TA1.

[0173] Therefore, the first horizontal line HL1 disposed in the first horizontal display area HA1 and the second horizontal line HL2 disposed in the second horizontal display area HA2 can have different shapes or lengths. For example, the first horizontal line HL1 extending through the first optical area OA1 and the second horizontal line HL2 not extending through the first optical area OA1 can have different shapes or lengths.

[0174] In addition, in order to improve the transmittance of the first optical region OA1, the first vertical line VL1 can extend through the first optical region OA1 while avoiding the first transmission region TA1 in the first optical region OA1.

[0175] Therefore, each of the first vertical lines VL1 extending through the first optical region OA1 may include one or more curved or bent portions extending around one or more corresponding outer edges of one or more of the first transmission regions TA1.

[0176] Therefore, the first vertical line VL1 extending through the first optical region OA1 and the typical vertical line VLn set in the ordinary region NA without extending through the first optical region OA1 can have different shapes or lengths.

[0177] Reference Figure 5A The first transmission region TA1, which is included in the first optical region OA1 in the first horizontal display region HA1, can be arranged in a diagonal direction.

[0178] Reference Figure 5A In the first optical region OA1 within the first horizontal display region HA1, one or more light-emitting regions EA can be positioned between two horizontally adjacent first transmission regions TA1. In the first optical region OA1 within the first horizontal display region HA1, one or more light-emitting regions EA can be positioned between two vertically adjacent first transmission regions TA1.

[0179] Reference Figure 5A Each of the first horizontal lines HL1 located in the first horizontal display area HA1 (e.g., each of the first horizontal lines HL1 extending through the first optical area OA1) may include one or more curved or bent portions extending around one or more corresponding outer edges of one or more first transmission areas TA1.

[0180] Reference Figure 5BThe second optical region OA2, included in the first horizontal display region HA1, may include a light-emitting region EA and a second transmission region TA2. Within the second optical region OA2, the corresponding outer region of the second transmission region TA2 may contain the corresponding light-emitting region EA.

[0181] In one embodiment, the light-emitting region EA and the second transmission region TA2 in the second optical region OA2 can have the same characteristics as... Figure 5A The light-emitting region EA and the first transmission region TA1 in the first optical region OA1 have basically the same position and arrangement.

[0182] In another embodiment, such as Figure 5B As shown, the light-emitting region EA and the second transmission region TA2 in the second optical region OA2 can have the same characteristics as... Figure 5A The first optical region OA1 has different positions and arrangements of the light-emitting region EA and the first transmission region TA1.

[0183] For example, refer to Figure 5B The second transmission regions TA2 in the second optical region OA2 can be arranged horizontally (from left to right or from right to left). In this example, the luminescent region EA may not be positioned between two horizontally adjacent second transmission regions TA2. Furthermore, one or more luminescent regions EA in the second optical region OA2 can be positioned between vertically adjacent second transmission regions TA2. For example, one or more luminescent regions EA can be positioned between two rows of second transmission regions.

[0184] When in a first horizontal display area HA1 extending through the second optical area OA2 and the ordinary area NA adjacent to the second optical area OA2, in one embodiment, the first horizontal line HL1 may have the same characteristics as... Figure 5A The arrangement is basically the same as the first horizontal line HL1.

[0185] In another embodiment, such as Figure 5B As shown, when in the first horizontal display area HA1 extending through the second optical area OA2 and the ordinary area NA adjacent to the second optical area OA2, the first horizontal line HL1 can have the same... Figure 5A The first horizontal line HL1 has a different arrangement.

[0186] This is because Figure 5B The luminescent region EA and the second transmission region TA2 in the second optical region OA2 have the same characteristics as... Figure 5A The first optical region OA1 has different positions and arrangements of the light-emitting region EA and the first transmission region TA1.

[0187] Reference Figure 5B When the first horizontal line HL1 extends through the second optical region OA2 and the ordinary region NA adjacent to the second optical region OA2 in the first horizontal display region HA1, the first horizontal line HL1 can extend in a straight line between the vertically adjacent second transmission regions TA2 without having any curved or bent portions.

[0188] For example, a first horizontal line HL1 may have one or more curved or bent portions in a first optical region OA1, but may not have curved or bent portions in a second optical region OA2.

[0189] To improve the transmittance of the second optical region OA2, the second vertical line VL2 can extend through the second optical region OA2 while avoiding the second transmission region TA2 in the second optical region OA2.

[0190] Therefore, each of the second vertical lines VL2 extending through the second optical region OA2 may include one or more curved or bent portions extending around one or more corresponding outer edges of one or more of the second transmission regions TA2.

[0191] Therefore, the second vertical line VL2 extending through the second optical region OA2 and the typical vertical line VLn set in the ordinary region NA without extending through the second optical region OA2 can have different shapes or lengths.

[0192] like Figure 5A As shown, each or more of the first horizontal lines HL1 extending through the first optical region OA1 may have one or more curved or bent portions extending around one or more of the corresponding outer edges of the first transmission regions TA1.

[0193] Therefore, the length of the first horizontal line HL1 extending through the first optical region OA1 and the second optical region OA2 can be slightly longer than the length of the second horizontal line HL2 which is only set in the ordinary region NA and does not extend through the first optical region OA1 and the second optical region OA2.

[0194] Therefore, the resistance of the first horizontal line HL1 extending through the first optical region OA1 and the second optical region OA2 (referred to as the first resistance) can be slightly greater than the resistance of the second horizontal line HL2, which is only set in the ordinary region NA and does not extend through the first optical region OA1 and the second optical region OA2 (referred to as the second resistance).

[0195] Reference Figure 5A and Figure 5BAccording to the light transmission structure, since the first optical region OA1, which overlaps at least partially with the first optical electronic device 11, includes a first transmission region TA1, and the second optical region OA2, which overlaps at least partially with the second optical electronic device 12, includes a second transmission region TA2, the number of sub-pixels in the first optical region OA1 and the second optical region OA2 can be less than the number of sub-pixels per unit area of ​​the ordinary region NA.

[0196] Therefore, the number of sub-pixels connected to each or one or more of the first horizontal lines HL1 that extend through the first optical region OA1 and the second optical region OA2 can be different from the number of sub-pixels connected to each or one or more of the second horizontal lines HL2 that are only set in the ordinary region NA and do not extend through the first optical region OA1 and the second optical region OA2.

[0197] The number of sub-pixels connected to each or one or more of the first horizontal lines HL1 that extend through the first optical region OA1 and the second optical region OA2 (referred to as the first number) may be less than the number of sub-pixels connected to each or one or more of the second horizontal lines HL2 that are only set in the normal region NA and do not extend through the first optical region OA1 and the second optical region OA2 (referred to as the second number).

[0198] The difference between the first quantity and the second quantity can vary based on the difference between the resolution of each of the first optical region OA1 and the second optical region OA2 and the resolution of the ordinary region NA. For example, as the difference between the resolution of each of the first optical region OA1 and the second optical region OA2 and the resolution of the ordinary region NA increases, the difference between the first quantity and the second quantity can increase.

[0199] As described above, since the number of sub-pixels connected to each or one or more of the first horizontal lines HL1 extending through the first optical region OA1 and the second optical region OA2 (the first number) is less than the number of sub-pixels connected to each or one or more of the second horizontal lines HL2 that are only set in the normal region NA and do not extend through the first optical region OA1 and the second optical region OA2 (the second number), the area where the first horizontal line HL1 overlaps with one or more other electrodes or lines adjacent to the first horizontal line HL1 can be smaller than the area where the second horizontal line HL2 overlaps with one or more other electrodes or lines adjacent to the second horizontal line HL2.

[0200] Therefore, the parasitic capacitance (referred to as the first capacitance) formed between the first horizontal line HL1 and one or more other electrodes or lines adjacent to the first horizontal line HL1 can be much smaller than the parasitic capacitance (referred to as the second capacitance) formed between the second horizontal line HL2 and one or more other electrodes or lines adjacent to the second horizontal line HL2.

[0201] Considering the relationship between the first and second resistors (first resistor ≥ second resistor) and the relationship between the first and second capacitors (first capacitor << second capacitor), the resistance-capacitance (RC) value of the first horizontal line HL1 extending through the first optical region OA1 and the second optical region OA2 (referred to as the first RC value) can be significantly smaller than the RC value of the second horizontal line HL2, which is only set in the ordinary region NA and does not extend through the first and second optical regions OA1 and OA2 (referred to as the second RC value). Therefore, in this example, the first RC value is significantly smaller than the second RC value (i.e., the first RC value << the second RC value).

[0202] Due to this difference (referred to as RC load difference) between the first RC value of the first horizontal line HL1 and the second RC value of the second horizontal line HL2, the signal transmission characteristics through the first horizontal line HL1 can be different from those through the second horizontal line HL2.

[0203] Figure 6 and Figure 7 This is an exemplary cross-sectional view of each of the first optical region OA1, the second optical region OA2, and the ordinary region NA in the display area DA of the display panel 110, according to aspects of this disclosure.

[0204] Figure 6 and Figure 7 Each of these shows an example cross-sectional view of the ordinary region NA, the first optical region OA1, and the second optical region OA2 included in the display area DA.

[0205] First, refer to Figure 6 and Figure 7 Describe the stacking structure of the ordinary region NA. The corresponding light-emitting regions EA of the first optical region OA1 and the second optical region OA2 can have the same stacking structure as the light-emitting region EA of the ordinary region NA.

[0206] Reference Figure 6 and Figure 7The substrate SUB may include a first substrate SUB1, an interlayer insulating layer IPD, and a second substrate SUB2. The interlayer insulating layer IPD may be inserted between the first substrate SUB1 and the second substrate SUB2. Because the substrate SUB includes the first substrate SUB1, the interlayer insulating layer IPD, and the second substrate SUB2, the substrate SUB can prevent or reduce the penetration of moisture. For example, the first substrate SUB1 and the second substrate SUB2 may be polyimide (PI) substrates. The first substrate SUB1 may be referred to as the main PI substrate, and the second substrate SUB2 may be referred to as the auxiliary PI substrate.

[0207] Reference Figure 6 and Figure 7 Various types of patterns such as ACT, SD1, GATE, various types of insulating layers MBUF, ABUF1, ABUF2, GI, ILD1, ILD2, PAS0, and various types of metal patterns TM, GM, ML1, ML2 for setting one or more transistors such as driving transistors DRT can be set on or above the substrate SUB.

[0208] Reference Figure 6 and Figure 7 Multiple buffer layers (MBUF) can be provided on the second substrate SUB2, and a first active buffer layer (ABUF1) can be provided on the multiple buffer layers (MBUF).

[0209] A first metal layer ML1 and a second metal layer ML2 can be disposed on a first active buffer layer ABUF1. The first metal layer ML1 and the second metal layer ML2 can be, for example, an optical shielding layer LS for shielding light.

[0210] The second active buffer layer ABUF2 can be disposed on the first metal layer ML1 and the second metal layer ML2. The active layer ACT that drives the transistor DRT can be disposed on the second active buffer layer ABUF2.

[0211] You can set the gated insulation layer GI to cover the active layer ACT.

[0212] The gate (GATE) of the driving transistor (DRT) can be disposed on the gate insulating layer (GI). Furthermore, the gate material layer (GM) can be disposed together with the gate (GATE) of the driving transistor (DRT) on the gate insulating layer (GI) at a location different from where the driving transistor (DRT) is disposed.

[0213] The first interlayer insulating layer ILD1 can be configured to cover the gate (GATE) and the gate material layer (GM). A metal pattern TM can be disposed on the first interlayer insulating layer ILD1. The metal pattern TM can be located at a different position than where the driving transistor (DRT) is formed. The second interlayer insulating layer ILD2 can be configured to cover the metal pattern TM on the first interlayer insulating layer ILD1.

[0214] Two first source-drain electrode patterns SD1 can be disposed on the second interlayer insulating layer ILD2. One of the two first source-drain electrode patterns SD1 can be the source node of the driving transistor DRT, and the other can be the drain node of the driving transistor DRT.

[0215] The two first source-drain electrode patterns SD1 can be electrically connected to the first and second sides of the active layer ACT, respectively, through contact holes formed in the second interlayer insulating layer ILD2, the first interlayer insulating layer ILD1, and the gate insulating layer GI.

[0216] The portion of the active layer ACT that overlaps with the gate GATE can be used as a channel region. One of the two first source-drain electrode patterns SD1 can be connected to the first side portion of the channel region of the active layer ACT, while the other of the two first source-drain electrode patterns SD1 can be connected to the second side portion of the channel region of the active layer ACT.

[0217] A passivation layer PAS0 can be provided to cover the two first source-drain electrode patterns SD1. A planarization layer PLN can be provided on the passivation layer PAS0. The planarization layer PLN may include a first planarization layer PLN1 and a second planarization layer PLN2.

[0218] The first planarization layer PLN1 can be placed on the passivation layer PAS0.

[0219] The second source-drain electrode pattern SD2 can be disposed on the first planarization layer PLN1. The second source-drain electrode pattern SD2 can be connected to one of the two first source-drain electrode patterns SD1 (corresponding to) through contact holes formed in the first planarization layer PLN1. Figure 3 The second node N2 of the driving transistor DRT in the sub-pixel SP.

[0220] The second planarization layer PLN2 can be configured to cover the second source-drain electrode pattern SD2. The light-emitting element ED can be disposed on the second planarization layer PLN2.

[0221] Based on the example stacked structure of the light-emitting element (ED), the anode AE ​​can be disposed on the second planarization layer PLN2. The anode AE ​​can be electrically connected to the second source-drain electrode pattern SD2 through contact holes formed in the second planarization layer PLN2.

[0222] The dam bank can be arranged to cover a portion of the anode AE. A portion of the dam bank corresponding to the light-emitting area EA of the sub-pixel SP can be turned on.

[0223] A portion of the anode (AE) can be exposed through an opening (opening portion) in the dam bank. The luminescent layer (EL) can be located on the side surface of the dam bank and within the opening (opening portion) of the dam bank. All or at least a portion of the luminescent layer (EL) can be located between adjacent dam sections.

[0224] In the opening of the bank, the light-emitting layer EL can contact the anode AE. The cathode CE can be disposed on the light-emitting layer EL.

[0225] As described above, a light-emitting element (ED) can be formed by including an anode (AE), a light-emitting layer (EL), and a cathode (CE). The light-emitting layer (EL) may include a layer of organic material.

[0226] The encapsulation layer ENCAP can be placed on the stack of light-emitting elements (EDs).

[0227] The ENCAP encapsulation layer can have a single-layer or multi-layer structure. For example, Figure 6 and Figure 7 As shown, the encapsulation layer ENCAP may include a first encapsulation layer PAS1, a second encapsulation layer PCL, and a third encapsulation layer PAS2.

[0228] The first encapsulation layer PAS1 and the third encapsulation layer PAS2 can be, for example, inorganic material layers, while the second encapsulation layer PCL can be, for example, an organic material layer. Among the first encapsulation layer PAS1, the second encapsulation layer PCL, and the third encapsulation layer PAS2, the second encapsulation layer PCL can be the thickest and is used as a planarization layer.

[0229] The first encapsulation layer PAS1 can be disposed on the cathode CE and can be positioned closest to the light-emitting element ED. The first encapsulation layer PAS1 can include an inorganic insulating material that can be deposited using low-temperature deposition. For example, the first encapsulation layer PAS1 can include, but is not limited to, silicon nitride (SiNx), silicon oxide (SiOx), silicon oxynitride (SiON), aluminum oxide (Al2O3), etc. Because the first encapsulation layer PAS1 can be deposited in a low-temperature atmosphere, it can prevent damage to the light-emitting layer EL, which includes organic materials susceptible to high-temperature atmospheres, during the deposition process.

[0230] The second encapsulation layer PCL can have a smaller area or size than the first encapsulation layer PAS1. For example, the second encapsulation layer PCL can be configured to expose both ends or edges of the first encapsulation layer PAS1. The second encapsulation layer PCL can serve as a buffer to alleviate stress between corresponding layers when the display device 100 is bent or folded, and also to enhance planarization performance. For example, the second encapsulation layer PCL can include organic insulating materials such as acrylic resin, epoxy resin, polyimide, polyethylene, silicon carbide (SiOC), etc. The second encapsulation layer PCL can be configured, for example, using an inkjet printing method.

[0231] The third encapsulation layer PAS2 can be disposed above the substrate SUB above the second encapsulation layer PCL, such that the third encapsulation layer PAS2 covers the corresponding top and side surfaces of the second encapsulation layer PCL and the first encapsulation layer PAS1. The third encapsulation layer PAS2 can minimize or prevent external moisture or oxygen from penetrating into the first encapsulation layer PAS1 and the second encapsulation layer PCL. For example, the third encapsulation layer PAS2 may include inorganic insulating materials such as silicon nitride (SiNx), silicon oxide (SiOx), silicon oxynitride (SiON), aluminum oxide (Al2O3), etc.

[0232] In this example, the touch sensor TS can be mounted on the encapsulation layer ENCAP. The structure of the touch sensor will be described in detail below.

[0233] The first insulating layer 610 (touch buffer layer) can be disposed on the encapsulation layer ENCAP. The touch sensor TS can be disposed on the first insulating layer 610.

[0234] The touch sensor TS may include a touch sensor metal TSM located in different layers and at least one bridging metal BRG.

[0235] The second insulating layer 620 (touch interlayer insulating layer) can be disposed between the touch sensor metal TSM and the bridging metal BRG.

[0236] For example, the touch sensor metal TSM may include a first touch sensor metal TSM, a second touch sensor metal TSM, and a third touch sensor metal TSM disposed adjacent to each other. In an embodiment where the third touch sensor metal TSM is disposed between the first and second touch sensor metal TSMs, and the first and second touch sensor metal TSMs need to be electrically connected to each other, the first and second touch sensor metal TSMs can be electrically connected to each other through a bridging metal BRG located on different layers. The bridging metal BRG can be electrically insulated from the third touch sensor metal TSM through a second insulating layer 620.

[0237] When the touch sensor TS is disposed on the display panel 110, chemical solutions (e.g., developers or etchants) used in the corresponding processes or moisture from external sources may be generated or introduced. In some embodiments, by disposing the touch sensor TS on the first insulating layer 610, chemical solutions or moisture can be prevented from penetrating into the light-emitting layer EL, which comprises organic materials, during the manufacturing process of the touch sensor TS. Therefore, the first insulating layer 610 can prevent damage to the light-emitting layer EL, which is susceptible to chemical solutions or moisture.

[0238] To prevent damage to the light-emitting layer EL, which includes organic materials susceptible to high temperatures, the first insulating layer 610 can be formed at a low temperature less than or equal to a predetermined temperature (e.g., 100 degrees Celsius) and can be formed using an organic insulating material having a low dielectric constant of 1 to 3. For example, the first insulating layer 610 may include acrylic, epoxy, or siloxane-based materials. When the display device 100 is bent, the encapsulation layer ENCAP may be damaged, and the touch sensor metal located on the first insulating layer 610 may crack or break. Even when the display device 100 is bent, the first insulating layer 610, which includes organic insulating material and has planarization properties, can prevent damage to the encapsulation layer ENCAP and / or cracking or breaking of the metal (TSM, BRG) included in the touch sensor TS.

[0239] The protective layer PAC can be configured to cover the touch sensor TS. The protective layer PAC can be, for example, an organic insulating layer.

[0240] In the normal region NA, the thickness T1 of the first insulating layer 610 is less than the thickness T2 of the second insulating layer 620.

[0241] Next, we will refer to Figure 6 and Figure 7 Describe the stacking structure of the first optical region OA1.

[0242] Reference Figure 6 and Figure 7 The emitting region EA of the first optical region OA1 can have the same stacking structure as the stacking structure in the ordinary region NA. Therefore, instead of repeatedly describing the emitting region EA of the first optical region OA1 in the following discussion, the stacking structure of the first transmission region TA1 of the first optical region OA1 will be described in detail below.

[0243] In some embodiments, the cathode CE may be disposed in the light-emitting region EA, which is included in the normal region NA and the first optical region OA1, but may not be disposed in the first transmission region TA1 of the first optical region OA1. For example, the first transmission region TA1 of the first optical region OA1 may correspond to the opening of the cathode CE.

[0244] Furthermore, in some embodiments, the light-shielding layer LS, which includes at least one of the first metal layer ML1 and the second metal layer ML2, may be disposed in the light-emitting region EA, which is included in the normal region NA and the first optical region OA1, but may not be disposed in the first transmission region TA1 of the first optical region OA1. For example, the first transmission region TA1 of the first optical region OA1 may correspond to the opening of the light-shielding layer LS.

[0245] The substrate SUB and various types of insulating layers (MBUF, ABUF1, ABUF2, GI, ILD1, ILD2, PAS0, PLN (PLN1, PLN2), BANK, ENCAP (PAS1, PCL, PAS2), 610, 620, PAC) disposed in the light-emitting region EA included in the ordinary region NA and the first optical region OA1 can be disposed in the first transmission region TA1 in the first optical region OA1 in an equal, substantially equal, or similar manner.

[0246] However, in some embodiments, all or one or more of the one or more material layers (e.g., one or more metal material layers and / or one or more semiconductor layers) with electrical properties, other than insulating materials or layers, provided in the light-emitting region EA included in the ordinary region NA and the first optical region OA1 may not be provided in the first transmission region TA1 in the first optical region OA1.

[0247] For example, refer to Figure 6 and Figure 7 All or one or more of the metal material layers (ML1, ML2, GATE, GM, TM, SD1, SD2) associated with at least one transistor and the active layer ACT may not be disposed in the first transmission region TA1.

[0248] Reference Figure 6 and Figure 7 In some embodiments, the anode AE ​​and cathode CE included in the light-emitting element ED may not be disposed in the first transmission region TA1. In some embodiments, depending on design requirements, the light-emitting layer EL of the light-emitting element ED may or may not be disposed in the first transmission region TA1.

[0249] refer to Figure 6 and Figure 7 In some embodiments, the touch sensor metal TSM and bridging metal BRG included in the touch sensor TS may not be disposed in the first transmission region TA1 of the first optical region OA1.

[0250] Therefore, the light transmittance of the first transmission region TA1 in the first optical region OA1 can be provided or improved because a material layer with electrical properties (e.g., one or more metal material layers and / or one or more semiconductor layers) is not disposed in the first transmission region TA1 in the first optical region OA1. Therefore, the first optoelectronic device 11 can perform a predefined function (e.g., image sensing) by receiving light transmitted through the first transmission region TA1.

[0251] In some embodiments, since all or one or more of the first transmission regions TA1 in the first optical region OA1 overlap with the first optical electronic device 11 so that the first optical electronic device 11 can operate normally, it is necessary to further increase the transmittance of the first transmission regions TA1 in the first optical region OA1.

[0252] To achieve the above, in the display panel 110 of the display device 100 according to aspects of the present disclosure, a transmittance improvement structure TIS can be provided to the first transmission region TA1 of the first optical region OA1.

[0253] Reference Figure 6 and Figure 7 The multiple insulating layers included in the display panel 110 may include at least one buffer layer (MBUF, ABUF1, ABUF2) between at least one substrate (SUB1, SUB2) and at least one transistor (DRT, SCT), at least one planarization layer (PLN1, PLN2) between the transistor DRT and the light-emitting element ED, at least one encapsulation layer ENCAP on the light-emitting element ED, etc.

[0254] The multiple insulating layers included in the display panel 110 may also include a first insulating layer 610, a second insulating layer 620 located on the encapsulation layer ENCAP, etc.

[0255] Reference Figure 6 and Figure 7 The first transmission region TA1 in the first optical region OA1 may have a first planarization layer PLN1 and a passivation layer PAS0 with recessed portions extending downward from their respective surfaces as a structure of the transmittance improvement structure TIS.

[0256] Reference Figure 6 and Figure 7 Among the multiple insulating layers, the first planarization layer PLN1 may include at least one recess (e.g., groove, trench, recess, protrusion, etc.). The first planarization layer PLN1 may be, for example, an organic insulating layer.

[0257] In an example where the first planarization layer PLN1 has a recessed portion extending downward from its surface, the second planarization layer PLN2 can be substantially used to provide planarization. In one embodiment, the second planarization layer PLN2 may also have a recessed portion extending downward from its surface. In this embodiment, the second encapsulation layer PCL can be substantially used to provide planarization.

[0258] Reference Figure 6 and Figure 7 The recessed portions of the first planarization layer PLN1 and the passivation layer PAS0 can pass through the insulating layer used to form the transistor DRT (such as the first interlayer insulating layer ILD, the second interlayer insulating layer ILD2, the gate insulating layer GI, etc.) and the buffer layer located below the insulating layer (such as the first active buffer layer ABUF1, the second active buffer layer ABUF2, the multi-buffer layer MBUF, etc.), and extend to the upper part of the second substrate SUB2.

[0259] Reference Figure 6 and Figure 7 The substrate SUB may include at least one recessed or recessed portion as a transmittance improvement structure (TIS). For example, in the first transmission region TA1, the upper portion of the second substrate SUB2 may be recessed or recessed downwards, or the second substrate SUB2 may be perforated.

[0260] Reference Figure 6 and Figure 7 The first encapsulation layer PAS1 and the second encapsulation layer PCL included in the ENCAP encapsulation layer can also have a transmittance improvement structure TIS, in which the first encapsulation layer PAS1 and the second encapsulation layer PCL have recessed portions extending downward from their respective surfaces. The second encapsulation layer PCL can be, for example, an organic insulating layer.

[0261] In some embodiments, the substrate SUB may not include the recess in the first transmissive region TA1, and the first encapsulation layer PAS1 and the second encapsulation layer PCL included in the encapsulation layer ENCAP may also have a flat surface or a flat shape.

[0262] To protect the touch sensor TS, a protective layer PAC can be set to cover the touch sensor TS on the encapsulation layer ENCAP.

[0263] The protective layer PAC may have at least one recess (e.g., groove, trench, recess, protrusion, etc.) in the portion overlapping with the first transmission region TA1 as a transmittance-improving structure (TIS). The protective layer PAC may be, for example, an organic insulating layer.

[0264] The touch sensor TS may include one or more touch sensor metal TSMs with a grid type. In an example where the touch sensor metal TSM is formed in a grid type, multiple openings may be formed in the touch sensor metal TSM. Each of the multiple openings may be positioned to correspond to the light-emitting area EA of the sub-pixel SP.

[0265] In order to make the first optical region OA1 have a higher transmittance than the ordinary region NA, the area or size of the touch sensor metal TSM per unit area in the first optical region OA1 can be smaller than the area or size of the touch sensor metal TSM per unit area in the ordinary region NA.

[0266] In some embodiments, the touch sensor TS may be located in the light-emitting area EA of the first optical area OA1, but may not be located in the first transmission area TA1 of the first optical area OA1.

[0267] In some implementations, such as Figure 6 and Figure 7 As shown, in order to make the transmittance of the first optical region OA1 higher than that of the ordinary region NA, the thickness T3 of the first insulating layer 610 disposed in the first optical region OA1 can be less than the thickness T1 of the first insulating layer 610 disposed in the ordinary region NA, and the thickness T4 of the second insulating layer 620 disposed in the first optical region OA1 can be less than the thickness T2 of the second insulating layer 620 disposed in the ordinary region NA.

[0268] Each of the first insulating layer 610 and the second insulating layer 620 may include silicon nitride (SixNy).

[0269] Compared to light in other visible light wavelength bands, the first insulating layer 610 and the second insulating layer 620, which include silicon nitride (SixNy), have a higher absorption rate for light with short wavelengths (e.g., 440 nm to 470 nm), and therefore, the first optical region OA1, which includes the first transmission region TA1 required to have high transmittance, can be viewed in a pale yellow color.

[0270] In some cases, the display device 100 including the touch sensor TS may include at least one of a first insulating layer 610 and a second insulating layer 620. In examples where the display device 100 includes at least one of the first insulating layer 610 and the second insulating layer 620, it is desirable to increase the transmittance of the first optical region OA1, or to increase the transmittance of the first optical region OA1 and at least a portion of the remaining region excluding the first optical region OA1 in the display region DA.

[0271] In some embodiments, in order to increase the transmittance of the first optical region OA1 for light with short wavelengths, so that the transmittance of the first optical region OA1 can be higher than that of the ordinary region NA, the thickness T3 of the first insulating layer 610 disposed in the first optical region OA1 can be less than the thickness T1 of the first insulating layer 610 disposed in the ordinary region NA, and the thickness T4 of the second insulating layer 620 disposed in the first optical region OA1 can be less than the thickness T2 of the second insulating layer 620 disposed in the ordinary region NA.

[0272] The thickness T2 of the second insulating layer 620 located in the ordinary region NA can be twice the thickness T1 of the first insulating layer 610 therein. For example, in the ordinary region NA, the thickness T2 of the second insulating layer 620 can be 4000 angstroms, and the thickness T1 of the first insulating layer 610 can be 2000 angstroms. However, the thicknesses of the first insulating layer 610 and the second insulating layer 620 in the ordinary region NA according to embodiments of the present disclosure are not limited thereto.

[0273] The thickness T4 of the second insulating layer 620 located in the first optical region OA1 can be greater than twice the thickness T3 of the first insulating layer 610 therein, and less than or equal to 2.5 times the thickness T3 of the first insulating layer 610 therein. For example, in the first optical region OA1, the thickness T4 of the second insulating layer 620 can be 3000 angstroms, and the thickness T2 of the first insulating layer 610 can be 1300 angstroms. However, the thicknesses of the first insulating layer 610 and the second insulating layer 620 in the first optical region OA1 according to the embodiments of the present disclosure are not limited thereto.

[0274] As described above, the first insulating layer 610 and the second insulating layer 620 disposed in the ordinary region NA, the first optical region OA1 and the second optical region OA2 may include silicon nitride (SixNy).

[0275] To increase the transmittance of the ordinary region NA, the first optical region OA1, and the second optical region OA2, the atomic composition ratio (atomic %) of each of the first insulating layer 610 and the second insulating layer 620 can be represented by Equation 1.

[0276] [Equation 1]

[0277] N≥Si

[0278] For example, the atomic percentage (atomic %) of nitrogen (N) included in each of the first insulating layer 610 and the second insulating layer 620 may be greater than or equal to the atomic percentage (atomic %) of silicon (Si).

[0279] For example, the atomic percentage (atomic %) of nitrogen (N) included in each of the first insulating layer 610 and the second insulating layer 620 may be 50% to 52%, and the atomic percentage of silicon (Si) included in each of the first insulating layer 610 and the second insulating layer 620 may be 48% to 50%. However, embodiments of this disclosure are not limited thereto.

[0280] The gases used in the process of forming the first insulating layer 610 and the second insulating layer 620 may include NH3 gas and SiH4 gas. The flow rate (NH3 / SiH4) of the gases used in the process of forming the first insulating layer 610 and the second insulating layer 620 to obtain a composition ratio of atomic numbers satisfying Equation 1 may be from 0.85 to 1.2.

[0281] As described above, by adjusting the atomic ratio of nitrogen (N) and silicon (Si) included in the first insulating layer 610 and the second insulating layer 620, not only can the transmittance of the first optical region OA1 be improved, but also the transmittance of the ordinary region NA and the second optical region OA2 can be improved.

[0282] Next, we will refer to Figure 6 and Figure 7 Describe the stacking structure of the second optical region OA2.

[0283] Reference Figure 6 and Figure 7 The emitting region EA of the second optical region OA2 can have the same stacking structure as the ordinary region NA. Therefore, instead of repeating the description of the emitting region EA in the second optical region OA2 in the following discussion, the stacking structure of the second transmission region TA2 in the second optical region OA2 will be described in detail below.

[0284] In some embodiments, the cathode CE may be disposed in the light-emitting region EA included in the normal region NA and the second optical region OA2, but may not be disposed in the second transmission region TA2 in the second optical region OA2. For example, the second transmission region TA2 in the second optical region OA2 may correspond to the opening of the cathode CE.

[0285] In this embodiment, the light-shielding layer LS, which includes at least one of the first metal layer ML1 and the second metal layer ML2, may be disposed in the light-emitting region EA, which is included in the normal region NA and the second optical region OA2, but may not be disposed in the second transmission region TA2 in the second optical region OA2. For example, the second transmission region TA2 in the second optical region OA2 may correspond to the opening of the light-shielding layer LS.

[0286] In an example where the transmittance of the second optical region OA2 is the same as that of the first optical region OA1, the stacking structure of the second transmission region TA2 in the second optical region OA2 can be the same as the stacking structure of the first transmission region TA1 in the first optical region OA1.

[0287] In another example where the transmittance of the second optical region OA2 is different from that of the first optical region OA1, the stacking structure of the second transmission region TA2 in the second optical region OA2 may be at least partially different from the stacking structure of the first transmission region TA1 in the first optical region OA1.

[0288] For example, such as Figure 6 and Figure 7 As shown, in some embodiments, when the transmittance of the second optical region OA2 is lower than that of the first optical region OA1, the second transmission region TA2 in the second optical region OA2 may not have a transmittance improvement structure (TIS). As a result, the first planarization layer PLN1 and the passivation layer PAS0 may not be recessed or recessed. In some embodiments, the width of the second transmission region TA2 in the second optical region OA2 may be smaller than the width of the first transmission region TA1 in the first optical region OA1.

[0289] The substrate SUB and various types of insulating layers (MBUF, ABUF1, ABUF2, GI, ILD1, ILD2, PAS0, PLN (PLN1, PLN2), BANK, ENCAP (PAS1, PCL, PAS2), 610, 620, PAC) disposed in the light-emitting region EA included in the ordinary region NA and the first optical region OA1 can be disposed in the second transmission region TA2 of the second optical region OA2 equally, substantially equally, or similarly.

[0290] However, in some embodiments, all or one or more of the electrically-functionalized material layers (e.g., one or more metal material layers and / or optical region semiconductor layers) disposed in the light-emitting region EA, which includes the ordinary region NA and the second optical region OA2, may not be disposed in the second transmission region TA2 in the second optical region OA2.

[0291] For example, refer to Figure 6 and Figure 7 All or one or more of the metal material layers (ML1, ML2, GATE, GM, TM, SD1, SD2) associated with at least one transistor and the active layer ACT may not be disposed in the second transmission region TA2 in the second optical region OA2.

[0292] In addition, refer to Figure 6 and Figure 7 In some embodiments, the anode AE ​​and cathode CE included in the light-emitting element ED may not be disposed in the second transmission region TA2. In some embodiments, the light-emitting layer EL of the light-emitting element ED may or may not be disposed in the second transmission region TA2, depending on design requirements.

[0293] The touch sensor metal TSM and bridging metal BRG included in the touch sensor TS may not be set in the second transmission region TA2 in the second optical region OA2.

[0294] Therefore, the light transmittance of the second transmission region TA2 in the second optical region OA2 can be provided or improved because a material layer with electrical properties (e.g., one or more metal material layers and / or one or more semiconductor layers) is not disposed in the second transmission region TA2 in the second optical region OA2. Therefore, the second optoelectronic device 12 can perform a predefined function (e.g., detecting an object or human body, or detecting external lighting) by receiving light transmitted through the second transmission region TA2.

[0295] like Figure 6 As shown, the thickness T5 of the first insulating layer 610 located in the second optical region OA2 can correspond to the thickness T1 of the first insulating layer 610 located in the ordinary region NA. The thickness T6 of the second insulating layer 620 located in the second optical region OA2 can correspond to the thickness T2 of the second insulating layer 620 located in the ordinary region NA.

[0296] In this example, the transmittance of the first optical region OA1 for light with short wavelengths (e.g., 440 nm to 470 nm) can be higher than that of the second optical region OA2 for light with short wavelengths.

[0297] However, the embodiments of this disclosure are not limited thereto. For example, such as Figure 7 As shown, the thickness T5 of the first insulating layer 610 located in the second optical region OA2 can correspond to the thickness T3 of the first insulating layer 610 located in the first optical region OA1. The thickness T6 of the second insulating layer 620 located in the second optical region OA2 can correspond to the thickness T4 of the second insulating layer 620 located in the first optical region OA1.

[0298] In this example, the transmittance of the first optical region OA1 for light with short wavelengths (e.g., 440 nm to 470 nm) can correspond to the transmittance of the second optical region OA2 for light with short wavelengths. Therefore, when the second optical region OA2 also needs to have the transmittance of the first optical region OA1 for light with short wavelengths, such as... Figure 7As shown, the thicknesses T5 and T6 of the first insulating layer 610 and the second insulating layer 620 disposed in the second optical region OA2 can be configured to correspond to the thicknesses T3 and T4 of the first insulating layer 610 and the second insulating layer 620 disposed in the first optical region OA1, respectively.

[0299] like Figure 6 and Figure 7 As shown, a first insulating layer 610 and a second insulating layer 620 with different thicknesses for each region can be formed using a first mask and a second mask, thereby simplifying the process of forming these insulating layers.

[0300] In the following text, reference will be made to Figures 8 to 11 The implementation methods of this disclosure in relation to the foregoing are discussed.

[0301] Figure 8 , Figure 9 , Figure 10 and Figure 11 This schematically illustrates the method for forming including Figure 6 An exemplary process for the first and second insulating layers in a display device.

[0302] First refer to Figure 8 In the ordinary region NA, the first optical region OA1, and the second optical region OA2, the first insulating layer material 910 can be disposed above the substrate above which the second encapsulation layer PCL and the third encapsulation layer PAS2 are disposed.

[0303] Photoresist can be applied to the first insulating layer material 910.

[0304] The discussion will be based on an example where the photoresist disposed on the first insulating layer material 910 is a photoresist that cures when exposed to light.

[0305] The first mask 950 can be configured to face the substrate on which photoresist is applied.

[0306] The first mask 950 may include a first region 951 and a second region 952. In the photolithography process, the first region 951 may be a region through which light cannot pass, and the amount of light transmitted through the second region 952 may be greater than the amount of light transmitted through the first region 951. In this example, the amount of light transmitted through the second region 952 may be less than the amount of incident light (i.e., less than 100%).

[0307] The ordinary region NA and the second optical region OA2 can correspond to the first region 951 of the first mask 950, and the first optical region OA1 can correspond to the second region 952 of the first mask 950.

[0308] The photoresist can be patterned by shining light toward the first mask 950.

[0309] like Figure 8 As shown, a first photoresist can be formed in the region corresponding to the first region 951 of the first mask 950, and a second photoresist with a height lower than the first photoresist can be formed in the region corresponding to the second region 952 of the first mask 950.

[0310] The second photoresist can then be removed. In this process, the height of the first photoresist can be reduced by lowering the height of the second photoresist.

[0311] After the photolithography process, the second photoresist may not be present above the first insulating layer material 910 disposed in the first optical region OA1, and the first photoresist may be present above the first insulating layer material 910 disposed in the ordinary region NA and the second optical region OA2.

[0312] Subsequently, the first photoresist can be used as a mask to etch the first insulating layer material 910.

[0313] For example, since the first photoresist is present in the ordinary region NA and the second optical region OA2 where the first photoresist is disposed, the first insulating layer material 910 may not need to be etched. The first insulating layer material 910 in the first optical region OA1, where no photoresist is present, may be partially etched.

[0314] After that, the first photoresist set in the normal region NA and the second optical region OA2 can be removed.

[0315] Therefore, as Figure 9 As shown, the first insulating layer 610 can be disposed in each of the ordinary region NA, the first optical region OA1, and the second optical region OA2.

[0316] The corresponding heights T1 and T5 of the first insulating layer 610, which are set in the ordinary region NA and the second optical region OA2, can correspond to each other.

[0317] In an embodiment, the thickness T3 of the first insulating layer 610 disposed in the first optical region OA1 can be less than the corresponding thicknesses T1 and T5 of the first insulating layer 610 disposed in the ordinary region NA and the second optical region OA2.

[0318] like Figure 10 As shown, the bridging metal BRG can be disposed on the first insulating layer 610.

[0319] The second insulating layer material 1020 can be disposed on the bridging metal BRG and the first insulating layer 610.

[0320] The second insulating layer material 1020 can be disposed in the ordinary region NA, the first optical region OA1, and the second optical region OA2.

[0321] Photoresist can be applied to the second insulating layer material 1020.

[0322] The discussion will be based on an example of a photoresist that cures when exposed to light, with the photoresist disposed on the second insulating layer material 1020.

[0323] The second mask 1050 can be configured to face the substrate on which photoresist is applied.

[0324] The second mask 1050 may include a third region 1051 and a fourth region 1052. In the photolithography process, the third region 1051 may be a region through which light cannot pass, and the amount of light transmitted through the fourth region 1052 may be greater than the amount of light transmitted through the third region 1051. In this example, the amount of light transmitted through the fourth region 1052 may be less than the amount of incident light (i.e., less than 100%).

[0325] The normal region NA and the second optical region OA2 can correspond to the third region 1051 of the second mask 1050, and the first optical region OA1 can correspond to the fourth region 1052 of the second mask 1050.

[0326] The photoresist can be patterned by shining light toward the second mask 1050.

[0327] like Figure 10 As shown, a third photoresist can be formed in the region corresponding to the third region 1051 of the second mask 1050, and a fourth photoresist with a height lower than the third photoresist can be formed in the region corresponding to the fourth region 1052 of the second mask 1050.

[0328] Afterward, the fourth photoresist can be removed. In this process, the height of the third photoresist can be reduced by lowering the height of the fourth photoresist.

[0329] After the photolithography process, the fourth photoresist may not be present above the second insulating layer material 1020 disposed in the first optical region OA1, and the third photoresist may be present above the second insulating layer material 1020 disposed in the normal region NA and the second optical region OA2.

[0330] Subsequently, a third photoresist can be used as a mask to etch the second insulating layer material 1020.

[0331] For example, since the third photoresist is present in the ordinary region NA and the second optical region OA2 where the third photoresist is disposed, the second insulating layer material 1020 may not need to be etched. The second insulating layer material 1020 in the first optical region OA1, where no photoresist is present, may be partially etched.

[0332] The first photoresist set in the normal area NA and the second optical area OA2 can be removed.

[0333] Therefore, as Figure 11 As shown, the second insulating layer 620 can be disposed in each of the ordinary region NA, the first optical region OA1, and the second optical region OA2.

[0334] The corresponding heights T2 and T6 of the second insulating layer 620, which are set in the ordinary region NA and the second optical region OA2, can correspond to each other.

[0335] In an embodiment, the thickness T4 of the second insulating layer 620 disposed in the first optical region OA1 can be less than the corresponding thicknesses T2 and T6 of the second insulating layer 620 disposed in the ordinary region NA and the second optical region OA2.

[0336] Although Figure 11 Although not shown, contact holes for bridging the metal BRG and the touch sensor metal to contact each other can be formed in the second insulating layer 620.

[0337] Through this process, such as Figure 6 As shown in the structure, the thicknesses of the first insulating layer 610 and the second insulating layer 620 disposed in the ordinary region NA and the second optical region OA2 can be greater than the thicknesses of the first insulating layer 610 and the second insulating layer 620 disposed in the first optical region OA1.

[0338] Furthermore, by using a first mask 950 including a first region 951 and a second region 952 to form the first insulating layer 610, and using a second mask 1050 including a third region 1051 and a fourth region 1052 to form the second insulating layer 620, the process for forming the first insulating layer 610 and the second insulating layer 620 disposed in the ordinary region NA, the first optical region OA1 and the second optical region OA2 can be simplified.

[0339] Figure 12 This is an example cross-sectional view of the edge of the display panel 110 according to aspects of this disclosure.

[0340] For the sake of brevity, in Figure 12The diagram illustrates a single substrate SUB comprising a first substrate SUB1 and a second substrate SUB2, and a layer or portion located below the embankment BANK is illustrated in a simplified manner. Similarly, Figure 12 An example is illustrated by a single planarization layer PLN comprising a first planarization layer PLN1 and a second planarization layer PLN2, and a single interlayer insulation layer INS comprising a second interlayer insulation layer ILD2 and a first interlayer insulation layer ILD1 located below the planarization layer PLN.

[0341] Reference Figure 12 The first encapsulation layer PAS1 can be disposed on the cathode CE and positioned closest to the light-emitting element ED. The second encapsulation layer PCL can have a smaller area or size than the first encapsulation layer PAS1. For example, the second encapsulation layer PCL can be configured to expose both ends or edges of the first encapsulation layer PAS1.

[0342] The third encapsulation layer PAS2 can be disposed above the substrate SUB above the second encapsulation layer PCL, such that the third encapsulation layer PAS2 covers the corresponding top and side surfaces of the second encapsulation layer PCL and the first encapsulation layer PAS1.

[0343] The third encapsulation layer, PAS2, can minimize or prevent external moisture or oxygen from penetrating into the first encapsulation layer, PAS1, and the second encapsulation layer, PCL.

[0344] Reference Figure 12 To prevent the encapsulation layer ENCAP from collapsing, the display panel 110 may include one or more barriers (DAM1 and / or DAM2) at or near the end or edge of the inclined surface SLP of the encapsulation layer ENCAP. One or more barriers (DAM1 and / or DAM2) may be present at or near the boundary point between the display area DA and the non-display area NDA.

[0345] One or more barriers (DAM1 and / or DAM2) may comprise DFPs of the same material as the embankment BANK.

[0346] Reference Figure 12 In one embodiment, the second encapsulation layer PCL, comprising organic material, may be located only inside the first barrier DAM1, which is closest to the inclined surface SLP of the encapsulation layer ENCAP within the barrier. For example, the second encapsulation layer PCL may not be located on all barriers (DAM1 and DAM2). In another embodiment, the second encapsulation layer PCL, comprising organic material, may be located on at least the first barrier DAM1 of the first barrier DAM1 and the second barrier DAM2.

[0347] For example, the second encapsulation layer PCL may extend only to all or at least a portion of the upper portion of the first barrier DAM1. In another embodiment, the second encapsulation layer PCL may extend beyond the upper portion of the first barrier DAM1 and extend to all or at least a portion of the upper portion of the second barrier DAM2.

[0348] Reference Figure 12 The touch drive circuit 260 is electrically connected to the touch panel TP, which can be disposed in a portion outside one or more barriers (DAM1 and / or DAM2) of the substrate SUB.

[0349] The touch line TL can be electrically connected to the touch panel TP, touch sensor metal TSM, or bridging metal BRG included in the touch electrodes disposed in the display area DA, or electrically connected to the touch panel TP, touch sensor metal TSM, or bridging metal BRG used as touch electrodes disposed in the display area DA.

[0350] One end or edge of the touch line TL can be electrically connected to the touch sensor metal TSM or the bridging metal BRG, while the other end or edge of the touch line TL can be electrically connected to the touchpad TP.

[0351] The touch line TL can extend downward along the inclined surface SLP of the encapsulation layer ENCAP, extend along the corresponding upper part of one or more barriers (DAM1 and / or DAM2), and extend upward to the touch panel TP disposed outside one or more barriers (DAM1 and / or DAM2).

[0352] Reference Figure 12 In one embodiment, the touch line TL can be a bridging metal BRG. In another embodiment, the touch line TL can be a touch sensor metal TSM.

[0353] Next, refer to Figure 13 The yellow index and transmittance of the display devices at short wavelengths were discussed in comparison examples and implementations.

[0354] Figure 13 This is a table showing the yellow index and transmittance of the display devices at short wavelengths compared to Examples 1 and 2 according to this disclosure.

[0355] exist Figure 13 In Comparative Examples 1 and 2, the display device may include a first insulating layer having a uniform thickness and a second insulating layer having a uniform thickness in a normal region NA, a first optical region OA1, and a second optical region OA2. In Comparative Examples 1 and 2, the thickness of the first insulating layer may be... The thickness of the second insulating layer can be

[0356] exist Figure 13 In the examples 1 and 2, the display device may have Figure 6 The structure is as follows: In the ordinary region NA and the second optical region OA2, the thickness of the first insulating layer can be 2000 angstroms, while the thickness of the second insulating layer can be 4000 angstroms. In the first optical region OA1, the thickness of the first insulating layer can be 1300 angstroms, while the thickness of the second insulating layer can be 3000 angstroms.

[0357] In the display device according to Comparative Example 1 and Example 2, the flow rate (NH3 / SiH4) of the gas used in the process of forming the first insulating layer and the second insulating layer can be 0.93, and in the display device according to Comparative Example 2 and Example 2, the flow rate (NH3 / SiH4) of the gas used in the process of forming the first insulating layer and the second insulating layer can be 1.19.

[0358] according to Figure 13 The yellow index of the display devices in Examples 1 and 2 may be lower than the yellow index of the display devices in Comparative Examples 1 and 2.

[0359] The transmittance of the display device according to Comparative Example 1 for light with wavelengths of 430 nm and 470 nm can be lower than that of the display device according to Example 1 for light with wavelengths of 430 nm and 470 nm.

[0360] The transmittance of the display device according to Comparative Example 2 for light with wavelengths of 430 nm and 470 nm can be lower than that of the display device according to Example 2 for light with wavelengths of 430 nm and 470 nm.

[0361] Therefore, since the thickness of the second insulating layer in the first optical region OA1 can be greater than twice the thickness of the first insulating layer and less than or equal to 2.5 times the thickness of the first insulating layer, high transmittance for incident light at short wavelengths can be achieved.

[0362] This disclosure provides a display device comprising: a display panel including a display area DA and a non-display area NDA, the display area DA including a first optical area OA1 and a normal area NA located outside the first optical area OA1, wherein the first optical area OA1 includes a plurality of light-emitting areas EA and a plurality of first transmission areas TA1, and the normal area NA includes a plurality of light-emitting areas EA; and a first optoelectronic device 11 located below or in the lower part of the display panel and overlapping at least a portion of the first optical area OA1 included in the display area DA. The display panel includes organic light-emitting elements ED disposed in the first optical area OA1 and the normal area NA, an encapsulation layer ENCAP disposed on at least one of the organic light-emitting elements ED, a first insulating layer 610 disposed on the encapsulation layer ENCAP, a touch sensor (e.g., a bridging metal BRG included in the touch sensor) disposed on the first insulating layer 610, and a second insulating layer 620 (e.g., a bridging metal BRG included in the touch sensor) disposed on the touch sensor. The corresponding thicknesses (T1 and T3) of the first insulating layer 610 in the ordinary region NA and the first optical region OA1 can be less than the corresponding thicknesses (T2 and T4) of the second insulating layer 620 in the ordinary region NA and the first optical region OA1. The thickness T1 of the first insulating layer 610 in the ordinary region NA can be greater than the thickness T3 of the first insulating layer 610 in the first optical region OA1. The thickness T2 of the second insulating layer 620 in the ordinary region NA can be greater than the thickness T4 of the second insulating layer 620 in the first optical region OA1.

[0363] The thickness T4 of the second insulating layer 620 in the first optical region OA1 can be greater than twice the thickness T3 of the first insulating layer 610 therein, and less than or equal to 2.5 times the thickness T3 of the first insulating layer 610 therein.

[0364] The thickness T2 of the second insulating layer 620 in the normal region NA can be twice the thickness T1 of the first insulating layer 610 therein.

[0365] The display area DA may further include a second optical area OA2, which is different from the first optical area OA1 and the normal area NA. The display device may also include a second optoelectronic device 12, located below or in the lower part of the display panel 110, and overlapping at least a portion of the second optical area OA2. The normal area NA may or may not be located between the first optical area OA1 and the second optical area OA2.

[0366] The thickness T1 of the first insulating layer 610 disposed in the normal region NA can be greater than the thickness T5 of the first insulating layer 610 disposed in the second optical region OA2, and the thickness T2 of the second insulating layer 620 disposed in the normal region NA can be greater than the thickness T6 of the second insulating layer 620 disposed in the second optical region OA2.

[0367] The thickness T5 of the first insulating layer 610 disposed in the second optical region OA2 can correspond to the thickness T3 of the first insulating layer 610 disposed in the first optical region OA1, and the thickness T6 of the second insulating layer 620 disposed in the second optical region OA2 can correspond to the thickness T4 of the second insulating layer 620 disposed in the first optical region OA1.

[0368] The thickness T5 of the first insulating layer 610 disposed in the second optical region OA2 can correspond to the thickness T1 of the first insulating layer 610 disposed in the ordinary region NA, and the thickness T6 of the second insulating layer 620 disposed in the second optical region OA2 can correspond to the thickness T2 of the second insulating layer 620 disposed in the ordinary region NA.

[0369] In one embodiment, the first optical electronic device 11 may be a camera, and the second optical electronic device 12 may be a sensor such as a proximity sensor, an illuminance sensor, etc.

[0370] Each of the first insulating layer 610 and the second insulating layer 620 may include silicon nitride (SixNy).

[0371] The atomic composition ratio of each of the first insulating layer 610 and the second insulating layer 620 can be represented by Equation 1 below.

[0372] [Equation 1]

[0373] N≥Si

[0374] The number of sub-pixels per unit area in the first optical region OA1 can be less than the number of sub-pixels per unit area in the ordinary region NA, and the number of sub-pixels per unit area in the second optical region OA2 can be greater than or equal to the number of sub-pixels per unit area in the first optical region OA1.

[0375] The display panel may also include a cathode CE, which is disposed in a plurality of light-emitting regions EA included in the normal region NA and the first optical region OA1, but not in a plurality of first transmission regions TA1 in the first optical region OA1.

[0376] The display panel may also include a light shielding layer LS disposed below transistors in multiple light-emitting areas EA and not disposed in multiple transmission areas (TA1 and / or TA2).

[0377] Embodiments of this disclosure provide a display panel comprising: a substrate SUB including a display area DA and a non-display area NDA; an organic light-emitting element (ED) disposed above the substrate SUB in a first optical area OA1 and a normal area NA; an encapsulation layer ENCAP disposed on at least one of the organic light-emitting elements ED; a first insulating layer 610 disposed on the encapsulation layer ENCAP; a touch sensor (e.g., including a bridging metal BRG in the touch sensor) disposed on the first insulating layer 610; and a second insulating layer 620 disposed on the touch sensor (e.g., including a bridging metal BRG in the touch sensor). The display area DA includes a first optical area OA1 that at least partially overlaps with a first optoelectronic device 11 located below the substrate SUB and a normal area located outside the first optical area OA1. The corresponding thicknesses (T1 and T3) of the first insulating layer 610 in the ordinary region NA and the first optical region OA1 can be less than the corresponding thicknesses (T2 and T4) of the second insulating layer 620 in the ordinary region NA and the first optical region OA1. The thickness T1 of the first insulating layer 610 in the ordinary region NA can be greater than the thickness T3 of the first insulating layer 610 in the first optical region OA1. The thickness T2 of the second insulating layer 620 in the ordinary region NA can be greater than the thickness T4 of the second insulating layer 620 in the first optical region OA1.

[0378] The above description has been presented to enable those skilled in the art to make and use the invention, and has been provided in the context of a particular application and its requirements. Various modifications, additions, and substitutions to the described embodiments will be apparent to those skilled in the art, and the general principles defined herein can be applied to other embodiments and applications without departing from the spirit and scope of the invention. Although exemplary embodiments have been described for illustrative purposes, those skilled in the art will understand that various modifications and applications are possible without departing from the essential characteristics of this disclosure. For example, specific components of the exemplary embodiments may be modified differently. The above description and drawings provide examples of the technical ideas of the invention for illustrative purposes only. That is, the disclosed embodiments are intended to illustrate the scope of the technical concept of this disclosure. Therefore, the scope of this disclosure is not limited to the embodiments shown, but is to be accorded the widest scope consistent with the claims. The scope of protection of this disclosure should be interpreted according to the claims, and all technical ideas within the scope of the claims should be interpreted as being included within the scope of the invention.

[0379] Cross-reference of related applications

[0380] This application claims priority to Korean Patent Application No. 10-2021-0156795, filed on November 15, 2021, with the Korean Intellectual Property Office, the entire contents of which are incorporated herein by reference.

Claims

1. A display device, the display device comprising: The display panel includes multiple light-emitting areas; as well as A first optical electronic device is located below the display panel. The first optical region of the display panel that overlaps with the first optical electronic device includes not only the plurality of light-emitting regions but also a plurality of first transmission regions. The third optical region of the display panel that does not overlap with the first optical electronic device includes the plurality of light-emitting regions but excludes the first transmission region. The display panel includes: An organic light-emitting element, wherein the organic light-emitting element is disposed in the first optical region and the third optical region; An encapsulation layer is disposed on at least one of the organic light-emitting elements; A first insulating layer is disposed on the encapsulation layer; A touch sensor, wherein the touch sensor is disposed on the first insulating layer; and A second insulating layer is disposed on the touch sensor. Wherein, the thickness of the first insulating layer in the third optical region is less than the thickness of the second insulating layer in the third optical region, and the thickness of the first insulating layer in the first optical region is less than the thickness of the second insulating layer in the first optical region. Wherein, the thickness of the first insulating layer disposed in the third optical region is greater than the thickness of the first insulating layer disposed in the first optical region, and the thickness of the second insulating layer disposed in the third optical region is greater than the thickness of the second insulating layer disposed in the first optical region. The organic light-emitting element includes an anode, a light-emitting layer, and a cathode, and The light-emitting layer disposed in the first transmission region of the first optical region is separate from the light-emitting layer disposed in the third optical region.

2. The display device according to claim 1, wherein, The thickness of the second insulating layer in the first optical region is greater than twice the thickness of the first insulating layer in the first optical region, and less than or equal to 2.5 times the thickness of the first insulating layer in the first optical region.

3. The display device according to claim 1, wherein, The thickness of the second insulating layer in the third optical region is twice the thickness of the first insulating layer in the third optical region.

4. The display device according to claim 1, further comprising: A second optical electronic device is located below the display panel. The second optical region of the display panel that overlaps with the second optical electronic device includes, in addition to the plurality of light-emitting regions, a plurality of second transmission regions. The third optical region may be disposed between the first optical region and the second optical region or may not be disposed between the first optical region and the second optical region.

5. The display device according to claim 4, wherein, The thickness of the first insulating layer disposed in the third optical region is greater than the thickness of the first insulating layer disposed in the second optical region, and the thickness of the second insulating layer disposed in the third optical region is greater than the thickness of the second insulating layer disposed in the second optical region.

6. The display device according to claim 5, wherein, The thickness of the first insulating layer disposed in the second optical region corresponds to the thickness of the first insulating layer disposed in the first optical region, and the thickness of the second insulating layer disposed in the second optical region corresponds to the thickness of the second insulating layer disposed in the first optical region.

7. The display device according to claim 4, wherein, The thickness of the first insulating layer disposed in the second optical region corresponds to the thickness of the first insulating layer disposed in the third optical region, and the thickness of the second insulating layer disposed in the second optical region corresponds to the thickness of the second insulating layer disposed in the third optical region.

8. The display device according to claim 4, wherein, The first optical electronic device is a camera, and the second optical electronic device is a sensor.

9. The display device according to claim 4, wherein, The number of sub-pixels per unit area in the first optical region is less than the number of sub-pixels per unit area in the third optical region, and the number of sub-pixels per unit area in the second optical region is greater than or equal to the number of sub-pixels per unit area in the first optical region.

10. The display device according to claim 1, wherein, Each of the first insulating layer and the second insulating layer comprises silicon nitride (SixNy).

11. The display device according to claim 10, wherein, The atomic composition ratio of nitrogen (N) in each of the first and second insulating layers is greater than or equal to the atomic composition ratio of silicon (Si).

12. The display device according to claim 1, wherein, The display panel further includes a cathode, which is disposed in the corresponding light-emitting areas included in the third optical region and the first optical region, but not disposed in the first transmission area of ​​the first optical region.

13. The display device according to claim 1, wherein, The display panel further includes a light shielding layer, which is disposed below the transistors in the corresponding light-emitting areas of the third optical region and the first optical region, and is not disposed in the first transmission region.

14. A display panel, the display panel comprising: A substrate, the substrate including a display area having a plurality of organic light-emitting elements corresponding to a plurality of light-emitting areas, wherein a first optical area of ​​the display area overlaps with a first optical electronic device disposed below the display panel, and the first optical area includes a plurality of first transmission areas in addition to the plurality of light-emitting areas, and wherein a third optical area of ​​the display panel that does not overlap with the first optical electronic device includes the plurality of light-emitting areas but does not include the first transmission areas; An encapsulation layer is disposed on the organic light-emitting element; A first insulating layer is disposed on the encapsulation layer; A touch sensor, wherein the touch sensor is disposed on the first insulating layer; and A second insulating layer is disposed on the touch sensor. Wherein, the thickness of the first insulating layer in the third optical region is less than the thickness of the second insulating layer in the third optical region, and the thickness of the first insulating layer in the first optical region is less than the thickness of the second insulating layer in the first optical region. Wherein, the thickness of the first insulating layer disposed in the third optical region is greater than the thickness of the first insulating layer disposed in the first optical region, and the thickness of the second insulating layer disposed in the third optical region is greater than the thickness of the second insulating layer disposed in the first optical region. The organic light-emitting element includes an anode, a light-emitting layer, and a cathode, and The light-emitting layer disposed in the first transmission region of the first optical region is separate from the light-emitting layer disposed in the third optical region.

15. The display panel according to claim 14, wherein, The thickness of the second insulating layer in the first optical region is greater than twice the thickness of the first insulating layer in the first optical region, and less than or equal to 2.5 times the thickness of the first insulating layer in the first optical region.

16. The display panel according to claim 14, wherein, The thickness of the second insulating layer in the third optical region is twice the thickness of the first insulating layer in the third optical region.

17. The display panel according to claim 14, in, The second optical region of the display panel, which overlaps with the second optoelectronic device located below the display panel, includes not only the plurality of light-emitting regions but also a plurality of second transmission regions. The third optical region is disposed between the first optical region and the second optical region.

18. A display panel, the display panel comprising: A substrate, the substrate including a display area and a non-display area, wherein the display area includes a first optical area that at least partially overlaps with a first optical electronic device located beneath the substrate and a normal area located outside the first optical area; and An organic light-emitting element, wherein the organic light-emitting element is disposed above the substrate in the first optical region and the ordinary region; An encapsulation layer is disposed on at least one of the organic light-emitting elements; A first insulating layer is disposed on the encapsulation layer; A touch sensor, wherein the touch sensor is disposed on the first insulating layer; and A second insulating layer is disposed on the touch sensor. The thickness of the first insulating layer is inconsistent in the ordinary region and the first optical region, and the thickness of the second insulating layer is also inconsistent in the ordinary region and the first optical region to increase the transmittance of incident light at a predetermined wavelength. The organic light-emitting element includes an anode, a light-emitting layer, and a cathode, and The light-emitting layer disposed in the first transmission region of the first optical region is separate from the light-emitting layer disposed in the ordinary region.

19. The display panel according to claim 18, in, The second optical region of the display panel, which overlaps with the second optoelectronic device located below the display panel, includes not only multiple light-emitting regions but also multiple second transmission regions. The ordinary region is located between the first optical region and the second optical region.

20. The display panel according to claim 19, wherein, The thickness of the first insulating layer disposed in the ordinary region is greater than the thickness of the first insulating layer disposed in the second optical region, and the thickness of the second insulating layer disposed in the ordinary region is greater than the thickness of the second insulating layer disposed in the second optical region.

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