一种用于超低轮廓铜箔微细粗化处理的添加剂及其使用方法

By using titanium sulfate, sodium thiazolinyl dithiopropane sulfonate, and fatty amine polyoxyethylene ether as additives on the surface of copper foil, the problems of high signal transmission loss and insufficient adhesion of HVLP copper foil in high-frequency and high-speed circuit boards are solved, achieving the effect of low roughness and high peel strength.

CN116162976BActive Publication Date: 2026-07-17LINGBAO WASON COPPER FOIL +1

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
LINGBAO WASON COPPER FOIL
Filing Date
2023-01-10
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

The existing roughening treatment of HVLP copper foil cannot simultaneously meet the requirements of low signal transmission loss and adhesion to the resin substrate in high-frequency and high-speed circuit boards, resulting in high signal transmission loss or insufficient adhesion.

Method used

Using titanium sulfate, sodium thiazolinyl dithiopropane sulfonate (SH110), and fatty amine polyoxyethylene ether (AEO) as additives, a uniform and dense coarsening layer is formed on the surface of copper foil through a specific electroplating process, which refines the grains and improves adhesion.

Benefits of technology

This method achieves low surface roughness of copper foil in high-frequency and high-speed circuit boards while maintaining good adhesion to the resin substrate, significantly reducing signal transmission loss and improving peel strength.

✦ Generated by Eureka AI based on patent content.

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Abstract

本发明涉及一种用于超低轮廓铜箔微细粗化处理的添加剂及其使用方法。添加剂由硫酸亚钛、噻唑啉基二硫代丙烷磺酸钠(SH110)、脂肪胺聚氧乙烯醚(AEO)中的一种或两种及以上的任意组合构成;使用方法为将所用添加剂加入硫酸铜基础粗化液中,使处理后的铜箔具有低粗糙度的同时与树脂等基板粘结时维持高剥离强度,可用于高频电路板,有效地减少信号损耗,本发明的粗化处理铜箔在其光面具有狼牙状和 / 或球状铜瘤点颗粒组成的微细凹凸的粗化层,铜箔粗糙度根据SJ‑301粗糙度仪测得的最大表面粗糙度Rz为2μm以下,并且根据INSTRON3343‑70012测得的最大剥离强度可达0.598 N / mm。
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