Liquid chemical supply unit, substrate processing apparatus provided with the same, and liquid chemical supply method

Abstract

The present invention is a chemical liquid supply unit, a substrate processing apparatus provided with the same, and a chemical liquid supply method, which discloses a chemical liquid supply technology of supplying a chemical liquid to a plurality of chemical liquid lines at the same flow rate and adjusting the flow rate by a flow rate control valve arranged in one or more of the plurality of chemical liquid lines so that the plurality of chemical liquid lines can supply the chemical liquid at different flow rates.

Description

Technical Field

[0001] The present invention relates to a liquid supply unit and a substrate processing apparatus having the same, as well as a liquid supply method, and more specifically to a liquid supply technology that supplies liquid to multiple liquid lines at the same flow rate and regulates the flow rate by means of a flow control valve configured in one or more of the multiple liquid lines, thereby enabling the multiple liquid lines to supply liquid at different flow rates. Background Technology

[0002] In semiconductor manufacturing processes, a process is performed that uses various chemical solutions to treat the substrate.

[0003] Depending on the substrate processing process, a process can be performed that supplies a single chemical solution to treat the substrate, or a process can be performed that supplies a mixed chemical solution in a certain proportion to treat the substrate. When supplying such various chemical solutions to treat the substrate, some processes may require a large flow rate of chemical solution, while others may require a low flow rate of chemical solution.

[0004] Figure 1 An example of a liquid medicine supply unit based on conventional technology is shown.

[0005] As an example, in order to prepare a mixed medicine solution by mixing three different medicine solutions A, B and C in different proportions, flow controllers 30 and 40 are configured to adjust and provide the flow rate of each of the medicine solutions A, B and C, and mixing tanks 31 and 41 are configured to mix and supply the medicine solutions A, B and C.

[0006] Depending on the substrate processing process, different flow rates of the liquid medicine need to be supplied through the nozzle 15 of the substrate processing apparatus 10. For example, in order to supply a large flow rate of liquid medicine, a flow controller 30 is configured to adjust and supply the flow rate of each of the liquid medicines A, B, and C in response to the large flow rate of liquid medicine, and a mixing tank 31 is configured to mix them. A valve 35 is configured to supply the large flow rate of liquid medicine to the nozzle 15 of the substrate processing apparatus 10.

[0007] In contrast, in order to supply low-flow-rate liquid medicine, a flow controller 40 is configured separately from the structure for supplying high-flow-rate liquid medicine, for adjusting and providing the flow rate of each of the liquid medicines A, B, and C in response to the low-flow-rate liquid medicine, and a mixing tank 41 for mixing them is configured, and a valve 45 is configured for supplying the low-flow-rate liquid medicine to the nozzle 15 of the substrate processing device 10.

[0008] Therefore, in order to supply different flow rates of medicine, medicine supply units should be configured separately according to each required flow rate.

[0009] In particular, when multiple different flow rates of medicine need to be supplied, each medicine supply unit is configured separately according to the number of different flow rates to be supplied. Therefore, there is a problem that the flow controllers for adjusting the flow rate of each medicine, the medicine supply lines according to each flow rate, the supply control valves, etc. increase exponentially. Summary of the Invention

[0010] The present invention is proposed to solve the problems of the prior art as described above, and its purpose is to disclose a solution that can supply different flow rates of chemical solution through a single chemical solution supply unit according to the substrate processing conditions.

[0011] In particular, the aim is to solve the following problem: when multiple liquid solutions with different flow rates need to be supplied according to different substrate processing conditions, each liquid solution supply unit is configured separately according to the number of different flow rates to be supplied, so the flow controllers for adjusting the flow rate of each liquid solution, the liquid solution supply lines according to each flow rate, the supply control valves, etc. increase geometrically.

[0012] The purpose of this invention is not limited to the foregoing content, and other purposes and advantages of this invention not mentioned can be understood from the following description.

[0013] To address the aforementioned issues, one embodiment of the drug supply unit according to the present invention may include: a drug supply member for providing drug solution; a first flow rate drug supply member for receiving the supplied drug solution from the drug supply member and supplying the drug solution of a first flow rate to a nozzle unit of a substrate processing apparatus; a second flow rate drug supply member for receiving the supplied drug solution of the same flow rate from the drug supply member and adjusting the drug solution flow rate to supply the drug solution of a second flow rate to the nozzle unit of the substrate processing apparatus; and a control unit for selectively controlling the drug solution supply of the first flow rate drug supply member and the second flow rate drug supply member, and controlling the adjustment of the drug solution flow rate to supply a different flow rate than the first flow rate.

[0014] As an example, the liquid supply component may include: a liquid supply line that supplies liquid via branch lines; the first flow liquid supply component includes: a first liquid line connected to one of the branch lines of the liquid supply line to supply the first flow of liquid to the nozzle unit of the substrate processing apparatus; the second flow liquid supply component includes: a second liquid line connected to the other branch line of the liquid supply line to supply the second flow of liquid to the nozzle unit of the substrate processing apparatus; and a flow control valve disposed on the second liquid line to control the flow rate of the liquid, wherein the control unit controls the flow control valve to adjust the flow rate of the second liquid line to a second flow rate that is relatively less than the first flow rate of the first liquid line.

[0015] Furthermore, the first flow rate drug supply component may further include: a first drug line valve, disposed on the first drug line and selectively supplying drug to the first drug line according to opening and closing; the second flow rate drug supply component may further include: a second drug line valve, disposed on the second drug line and selectively supplying drug to the second drug line according to opening and closing; and the control unit controls the first drug line valve and the second drug line valve to supply drug of different flow rates to the nozzle unit of the substrate processing device.

[0016] Preferably, the medicine supply unit may further include: a residual medicine treatment component, which treats the residual medicine in the supplied medicine other than the medicine at the second flow rate as the flow rate of the second flow rate medicine supply component is adjusted.

[0017] As an example, the residual medicine liquid treatment component may include: a discharge line for discharging the residual medicine liquid.

[0018] Preferably, the liquid medicine supply component may include: a plurality of liquid medicine supply units for providing a plurality of different liquid medicines; a plurality of flow control units for adjusting the liquid medicine supply amount of the plurality of liquid medicine supply units; and a mixing tank for mixing the plurality of liquid medicines to provide them.

[0019] As an example, the residual medicine liquid treatment component may include: a recovery line for recovering the residual medicine liquid and supplying it to the mixing tank.

[0020] Alternatively, the residual medicine liquid treatment component may include: a recovery line for recovering the residual medicine liquid; and a storage tank for storing the recovered medicine liquid recovered through the recovery line.

[0021] As an example, the residual medicine liquid treatment component may further include: a medicine liquid recovery supply line, which provides the recovered medicine liquid stored in the storage tank to the medicine liquid supply component.

[0022] As an example, the residual medicine liquid treatment component may further include: a medicine liquid recovery supply line that supplies the recovered medicine liquid stored in the storage tank to the mixing tank.

[0023] Alternatively, the substrate processing apparatus according to the present invention may include: the above-described liquid supply unit; a nozzle unit that receives liquids of different flow rates from the liquid supply unit and sprays them onto the substrate in accordance with the substrate processing process; and a substrate support unit on which the substrate to be processed is placed.

[0024] Alternatively, one embodiment of the drug supply method according to the present invention may include: a drug supply step of providing the same flow rate of drug solution, providing the same first flow rate of drug solution to a first drug solution line and a second drug solution line branching from the drug solution supply line; a flow rate control step, controlling the required flow rate of drug solution; and a spray drug solution supply step, selectively supplying the first flow rate of the first drug solution line or the second flow rate of drug solution adjusted by the second drug solution line to the nozzle unit of the substrate processing apparatus according to the required flow rate of drug solution.

[0025] As an example, the liquid spraying supply step may include: when the required liquid flow rate is the first flow rate, opening the first liquid line valve of the first liquid line and closing the second liquid line valve of the second liquid line; and supplying the first flow rate of liquid to the nozzle unit of the substrate processing device through the first liquid line.

[0026] As an example, the liquid spraying supply step may include: when the required liquid flow rate is a second flow rate that is relatively less than the first flow rate, closing the first liquid line valve of the first liquid line, adjusting the flow rate of the second liquid line to a second flow rate that is relatively less than the first flow rate by means of a flow control valve configured in the second liquid line; opening the second liquid line valve of the second liquid line; and supplying the liquid at the second flow rate to the nozzle unit of the substrate processing apparatus through the second liquid line.

[0027] Preferably, the drug supply method may further include a residual drug treatment step, which treats the residual drug solution other than the drug solution at the second flow rate in the first flow rate of the drug solution supplied to the second drug solution line.

[0028] As an example, the residual medicine treatment step may involve discharging the residual medicine through a discharge line.

[0029] As another example, the residual medicine treatment step may include: a residual medicine recovery step, which recovers the residual medicine other than the medicine at the second flow rate from the first flow rate of medicine supplied to the second medicine supply line through a recovery line; and a recovered medicine supply step, which provides the recovered medicine recovered through the recovery line to the medicine supply line.

[0030] As another example, the same flow rate drug supply step may involve adjusting the supply flow rates of multiple different drug solutions and supplying them to a mixing tank, from which drug solution is supplied to the drug supply line. The residual drug solution handling step may further include: a residual drug solution recovery step, recovering the residual drug solution other than the drug solution at the second flow rate from the first flow rate drug solution supplied to the second drug supply line via a recovery line; a storage tank step, storing the recovered drug solution recovered via the recovery line in a storage tank; and a recovered drug solution supply step, supplying the recovered drug solution stored in the storage tank to the mixing tank or the drug supply line.

[0031] Furthermore, the drug supply method may further include a drug recovery adjustment step, which causes the recovered drug stored in the storage tank to circulate to the circulation line and be adjusted according to the drug supply conditions.

[0032] Alternatively, a preferred embodiment of the liquid supply unit according to the present invention may include: a liquid supply member for providing liquid medicine; a liquid supply line for receiving liquid medicine from the liquid supply member and supplying it through branch lines; a first liquid supply line connected to one of the branch lines of the liquid supply line for supplying liquid medicine at a first flow rate to a nozzle unit of a substrate processing apparatus; a first liquid supply line valve disposed on the first liquid supply line for selectively supplying liquid medicine at the first flow rate of the first liquid supply line according to its opening and closing; a second liquid supply line connected to the other of the branch lines of the liquid supply line for supplying liquid medicine at a second flow rate to a nozzle unit of the substrate processing apparatus; and a flow control valve disposed on the second liquid supply line for controlling the flow rate of the liquid medicine. The first flow rate of the drug solution supplied to the second drug solution line is adjusted to a relatively small second flow rate; a second drug solution line valve is disposed on the second drug solution line and selectively supplies the second flow rate of the drug solution to the second drug solution line according to its opening and closing; a recovery line recovers the remaining drug solution other than the second flow rate of the drug solution supplied to the second drug solution line according to the flow rate adjustment of the flow control valve; and a control unit controls the flow control valve to adjust the flow rate of the second drug solution line to a relatively small second flow rate, and controls the first drug solution line valve and the second drug solution line valve to supply different flow rates of drug solution to the nozzle unit of the substrate processing apparatus.

[0033] According to this invention, different flow rates of pharmaceutical solution can be supplied through a single pharmaceutical solution supply unit according to the substrate processing conditions.

[0034] In particular, multiple liquid lines are supplied with liquid at the same flow rate, and the flow rate is adjusted by flow control valves configured in one or more of the multiple liquid lines, so that the multiple liquid lines can supply liquid at different flow rates.

[0035] The effects of the present invention are not limited to those mentioned above. Other effects not mentioned can be clearly understood by those skilled in the art from the following description. Attached Figure Description

[0036] Figure 1 An example of a liquid medicine supply unit based on conventional technology is shown.

[0037] Figure 2 An example of a substrate processing apparatus to which the present invention is applied is shown.

[0038] Figure 3 A structural diagram of an embodiment of the liquid medicine supply unit according to the present invention is shown.

[0039] Figure 4 A first embodiment of the liquid medicine supply unit according to the present invention is shown.

[0040] Figure 5 A second embodiment of the liquid medicine supply unit according to the present invention is shown.

[0041] Figure 6 as well as Figure 7 A third embodiment of the liquid medicine supply unit according to the present invention is shown.

[0042] Figure 8 A flowchart illustrating an embodiment of the pharmaceutical solution supply method according to the present invention is shown.

[0043] Figure 9 A flowchart is shown illustrating an embodiment of supplying a pharmaceutical solution via a pharmaceutical solution supply component in a pharmaceutical solution supply method according to the present invention.

[0044] Figure 10 A flowchart is shown of an embodiment of supplying a pharmaceutical solution at a first flow rate in a pharmaceutical solution supply method according to the present invention.

[0045] Figure 11 An embodiment is shown in which a pharmaceutical solution is supplied at a first flow rate in a substrate processing apparatus according to the invention.

[0046] Figure 12 A flowchart is shown of an embodiment of supplying a pharmaceutical solution at a second flow rate in a pharmaceutical solution supply method according to the present invention.

[0047] Figure 13 A flowchart is shown illustrating a first embodiment of processing surplus pharmaceutical solution in a pharmaceutical solution supply method according to the present invention.

[0048] Figure 14 A first embodiment of processing residual pharmaceutical solution in a substrate processing apparatus according to the present invention is shown.

[0049] Figure 15A flowchart illustrating a second embodiment of processing surplus pharmaceutical solution in the pharmaceutical solution supply method according to the present invention is shown.

[0050] Figure 16 A second embodiment of processing residual pharmaceutical solution in a substrate processing apparatus according to the present invention is shown.

[0051] Figure 17 A flowchart is shown of a third embodiment of processing surplus pharmaceutical solution in the pharmaceutical solution supply method according to the present invention.

[0052] Figures 18 to 20 A third embodiment of processing residual pharmaceutical solution in a substrate processing apparatus according to the present invention is shown.

[0053] (Explanation of reference numerals in the attached diagram)

[0054] 100: Substrate processing apparatus

[0055] 170: Nozzle unit,

[0056] 200: Medicine supply unit,

[0057] 210: Medicine supply component,

[0058] 230: First flow rate medicine supply component,

[0059] 250: Second flow rate liquid supply component,

[0060] 253: Flow control valve

[0061] 270: Residual drug solution treatment component,

[0062] 290: Control Department. Detailed Implementation

[0063] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings, but the present invention is not limited or restricted by the embodiments.

[0064] To illustrate the advantages of the present invention and its operation, as well as the objectives achieved through its implementation, preferred embodiments of the present invention are described below with reference to these embodiments.

[0065] First, the terminology used in this application is for illustrative purposes only and is not intended to limit the invention. Unless otherwise explicitly stated in the context, singular expressions may include plural expressions. Furthermore, in this application, terms such as "comprising" or "having" refer to the presence of features, numbers, steps, actions, constituent elements, parts, or combinations thereof described in the specification, and should be understood as not precluding the presence or additional possibilities of one or more other features, numbers, steps, actions, constituent elements, parts, or combinations thereof.

[0066] In the description of this invention, detailed descriptions of related well-known structures or functions are omitted when it is determined that such detailed descriptions may obscure the spirit of the invention.

[0067] This invention discloses a drug supply technology that supplies drug solution to multiple drug solution lines at the same flow rate and adjusts the flow rate by means of flow control valves configured in one or more of the multiple drug solution lines, thereby enabling the multiple drug solution lines to supply drug solution at different flow rates.

[0068] Figure 2 An example of a substrate processing apparatus to which the present invention is applied is shown.

[0069] The substrate processing apparatus 100 may include a processing container 120, a substrate support unit 140, a lifting unit 160, a nozzle unit 170, etc.

[0070] The processing container 120 may be barrel-shaped with an internal processing space and an open top. The processing container 120 may include a first recycling bin 122, a second recycling bin 124, and a third recycling bin 126. Each recycling bin 122, 124, and 126 can recycle the processing liquid used in the process according to its type. The first recycling bin 122 may be provided as an annular ring surrounding the substrate support unit 140, the second recycling bin 124 may be provided as an annular ring surrounding the first recycling bin 122, and the third recycling bin 126 may be provided as an annular ring surrounding the second recycling bin 124. The inner space of the first recycling bin 122 may function as a first inlet 122a for liquid inflow. The space between the second recycling bin 124 and the first recycling bin 122 may function as a second inlet 124a for liquid to flow into the second recycling bin 124. The space between the second recycling bin 124 and the third recycling bin 126 may function as a third inlet 126a for processing liquid to flow into the third recycling bin 126. In one example, the inlet 122a, 124a, and 126a can be located at different heights. Recycling pipes 122b, 124b, and 126b can be connected below the bottom of each recycling bin 122, 124, and 126.

[0071] The substrate support unit 140 can support the substrate W. The substrate support unit 140 can rotate the substrate W during the process. The substrate support unit 140 may include a body 142, a support pin 144, a chuck pin 146, and a support shaft 148. The body 142 may have an upper surface and a lower surface provided in a circular shape. The upper surface and the lower surface of the body 142 may be configured such that their central axes coincide with each other. The support shaft 148, which can be rotated by the drive unit 149, can be fixedly connected to the lower surface of the body 142.

[0072] Multiple support pins 144 can be provided. The support pins 144 can be arranged at predetermined intervals on the edge of the upper surface of the main body 142 and formed to protrude upward from the main body 142. The support pins 144 can be arranged in a ring shape as a whole by combining with each other. The support pins 144 can support the back edge of the substrate W so that the substrate W is spaced a certain distance from the upper surface of the main body 142.

[0073] Multiple chuck pins 146 may be arranged. The chuck pins 146 may be positioned further away from the center of the body 142 than the support pins 144. The chuck pins 146 may be provided to project upwards within the body 142. The chuck pins 146 may support the sides of the substrate W so that the substrate W does not disengage laterally from its fixed position when rotated. The chuck pins 146 may be provided to be linearly movable between a standby position and a supported position along the radial direction of the body 142. The standby position may be a position further away from the center of the body 142 than the supported position. When the substrate W is loaded or unloaded relative to the substrate support unit 140, the chuck pins 146 may be in the standby position; when processing is performed on the substrate W, the chuck pins 146 may be in the supported position. In the supported position, the chuck pins 146 may contact the sides of the substrate W.

[0074] The lifting unit 160 can adjust the relative height between the processing container 120 and the substrate support unit 140. The lifting unit 160 allows the processing container 120 to move linearly in the vertical direction. As the processing container 120 moves vertically, its relative height to the substrate support unit 140 can change. The lifting unit 160 may include a support 162, a moving shaft 164, a driver 166, etc. The support 162 can be fixedly disposed on the outer wall of the processing container 120, and the moving shaft 164, which moves vertically via the driver 166, can be fixedly coupled within the support 162. When the substrate W is loaded or unloaded relative to the substrate support unit 140, the processing container 120 can be lowered so that the substrate support unit 140 protrudes from above the processing container 120. Furthermore, during the process, the height of the processing container 120 can be adjusted so that, depending on the type of processing liquid supplied to the substrate W, the processing liquid can flow into a pre-set recovery tank 160. Alternatively, the processing container 120 may be fixed at its height, while the main body 142 of the substrate support unit 140 may move in the up-down direction.

[0075] The nozzle unit 170 can supply various liquids to the substrate W. The nozzle unit 170 may include a first nozzle component 170a, a second nozzle component 170b, a rinsing nozzle component 170c, etc. The number of nozzle components can be changed as needed.

[0076] The first nozzle component 170a can supply a first liquid, the second nozzle component 170b can supply a second liquid, and the flushing nozzle component 170c can supply a flushing liquid. According to one example, the first liquid can be a chemical preparation containing a strong acid such as sulfuric acid (H₂SO₄). The second liquid can be an alkaline solution containing an organic solvent. The organic solvent can be isopropanol (IPA). The flushing liquid can be pure water (H₂O).

[0077] The first nozzle component 170a may include a first nozzle moving component 171 and a first nozzle 174a. The first nozzle moving component 171 can move the first nozzle 174a to a process position and a standby position. Here, the process position can be the position where the first nozzle 174a is opposite to the substrate W supported by the substrate support unit 140, and the standby position can be the position where the first nozzle 174a leaves the process position. According to one example, the standby position can be the position where the first nozzle 174a is in standby at a first standby port. The first nozzle moving component 171 may include a rotation shaft 176, a driver 178, and a support arm 172. The rotation shaft 176 may be located on one side of the processing container 120. The rotation shaft 176 may be rotatable by the driver 178. The rotation shaft 176 may be rotatable about its central axis by the driving force provided from the driver 178. The support arm 172 may connect the first nozzle 174a and the rotation shaft 176. As the rotation shaft 176 rotates, the support arm 172 and the first nozzle 174a may rotate about the central axis of the rotation shaft 176.

[0078] The support arm 172 can be provided in a loading shape oriented along its length perpendicular to the rotation axis 176. One end of the support arm 172 can be fixedly coupled to the upper end of the rotation axis 176. The support arm 172 can be rotated about the end coupled to the rotation axis 176. A first nozzle 174a can be coupled to the other end of the support arm 172. According to one example, when viewed from above, the path of movement of the first nozzle 174a can be provided as passing through the center of the substrate W. Therefore, the first nozzle 174a can be moved to a process position and a standby position as the rotation axis 176 and the support arm 172 rotate.

[0079] The second nozzle component 170b may include a second nozzle moving component and a second nozzle 174b. The second nozzle moving component can move the second nozzle 174b to a process position and a standby position. Here, the process position can be the position where the second nozzle 174b is opposite to the substrate W supported on the substrate support unit 140, and the standby position can be the position where the second nozzle 174b is away from the process position. The second nozzle moving component can be configured the same as the first nozzle moving component 171, so a detailed description of this is omitted.

[0080] The rinsing nozzle component 170c may include a rinsing nozzle moving component and a rinsing nozzle 174c. The rinsing nozzle component 170c can move the rinsing nozzle 174c to a process position and a standby position. Here, the process position can be the position where the rinsing nozzle 174c is opposite to the substrate W supported on the substrate support unit 140, and the standby position can be the position where the rinsing nozzle 174c is away from the process position. The rinsing nozzle moving component can be configured identically to the first nozzle moving component 171, therefore a detailed description of it is omitted.

[0081] The controller 150 can control the lifting unit 160 and the nozzle unit 170. The controller 150 can control each unit to sequentially form a first liquid supply step of supplying a first liquid to the substrate W and a second liquid supply step of supplying a second liquid to the substrate W. The controller 150 can control the lifting unit 160 so that the substrate W corresponds to the first inlet 122a in the first liquid supply step and corresponds to the second inlet 124a in the second liquid supply step.

[0082] According to one example, the controller 150 can interlock the second nozzle component 170b during the dispensing of the first liquid to prevent the second liquid from being dispensed, and interlock the first nozzle component 170a during the dispensing of the second liquid to prevent the first liquid from being dispensed. This prevents the first and second liquids from mixing.

[0083] Furthermore, the controller 150 can interlock the second nozzle component 170b to prevent the second liquid from being ejected if the first inlet 122a of the processing container 120 is configured to correspond to the substrate W, and interlock the first nozzle component 170a to prevent the first liquid from being ejected if the second inlet 124a of the processing container 120 is configured to correspond to the substrate W. This prevents either the first liquid from being recycled to the second recycling bin or the second liquid from being recycled to the first recycling bin.

[0084] Furthermore, the controller 150 can de-interlock the nozzle components in the first nozzle component 170a and the second nozzle component 170b that are in the standby position. Therefore, it is possible to prevent interlocking of the nozzle components that need to perform pre-discharge.

[0085] The nozzle unit 170 described above can spray different liquids and different flow rates of liquids onto the substrate W through nozzle components 170a, 170b, and 170c. This invention discloses a liquid supply unit that supplies different flow rates of liquids to the nozzle unit 170, and discloses a substrate processing apparatus applicable to the liquid supply unit according to the invention.

[0086] The pharmaceutical supply unit according to the present invention will be illustrated by means of examples.

[0087] Figure 3 A structural diagram of an embodiment of the liquid medicine supply unit according to the present invention is shown.

[0088] The liquid medicine supply unit 200 may include a liquid medicine supply component 210, a first flow liquid medicine supply component 230, a second flow liquid medicine supply component 250, a residual liquid medicine treatment component 270, a control unit 290, etc.

[0089] The liquid medicine supply component 210 may include one or more liquid medicine sources and supply liquid medicine from the liquid medicine sources to the first flow liquid medicine supply component 230 and the second flow liquid medicine supply component 250.

[0090] As an example, the liquid supply component 210 can also supply liquid from a single type of liquid source, or the liquid supply component 210 can adjust the proportions of various liquids supplied from multiple liquid sources and mix them to supply the first flow liquid supply component 230 and the second flow liquid supply component 250 at a certain flow rate.

[0091] The first flow rate liquid supply component 230 and the second flow rate liquid supply component 250 can supply liquid to the nozzle unit of the substrate processing apparatus 100 at different flow rates.

[0092] If the first flow rate liquid supply member 230 can supply a large flow rate of liquid to the nozzle unit of the substrate processing apparatus 100, the second flow rate liquid supply member 250 can supply a small flow rate of liquid to the nozzle unit of the substrate processing apparatus 100.

[0093] The first flow rate liquid supply component 230 can directly supply liquid from the liquid supply component 210 to the nozzle unit of the substrate processing apparatus 100.

[0094] The second flow rate liquid supply component 250 can adjust the flow rate of liquid supplied from the liquid supply component 210 to the required flow rate according to the substrate processing process, and supply the adjusted flow rate liquid to the nozzle unit of the substrate processing apparatus 100.

[0095] Therefore, the second flow medicine supply component 250 may include a flow control valve to regulate the flow rate of the medicine supplied from the medicine supply component 210.

[0096] That is, in this invention, the liquid supply unit 200 can receive liquid of the same flow rate from one liquid supply member 210 while adjusting the flow rate to different flow rates in the first flow rate liquid supply member 230 and the second flow rate liquid supply member 250, thereby selectively supplying the liquid of different flow rates to the nozzle unit of the substrate processing device 100.

[0097] The residual liquid treatment component 270 can handle the remaining liquid flow other than the liquid flow that is regulated and supplied in the second flow liquid supply component 250.

[0098] As an example, the residual liquid treatment component 270 can discharge the remaining liquid after the flow rate is adjusted in the second flow liquid supply component 250 to the outside.

[0099] As another example, the residual liquid treatment component 270 can provide a way to recover the residual liquid left over after adjusting the flow rate in the second flow liquid supply component 250 and reuse it in the liquid supply component 210.

[0100] The control unit 290 can control the first flow rate liquid supply member 230 and the second flow rate liquid supply member 250 to selectively supply liquid of different flow rates to the nozzle unit of the substrate processing apparatus 100.

[0101] As an example, the control unit 290 can control the flow control valve arranged in the second flow liquid supply member 250 to adjust the flow rate to the required flow rate according to the substrate processing process. In addition, the control unit 290 can control the valves arranged in each of the first flow liquid supply member 230 and the second flow liquid supply member 250 to selectively control the flow of liquid and supply it to the nozzle unit of the substrate processing apparatus 100.

[0102] Furthermore, the control unit 290 can be controlled to discharge the remaining medicine to the outside or to recycle and reuse the remaining medicine through the remaining medicine treatment component 270.

[0103] The pharmaceutical supply unit according to the invention can be observed in further detail through specific embodiments.

[0104] Figure 4 A first embodiment of the liquid medicine supply unit according to the present invention is shown.

[0105] It can be that the liquid supply component 210 includes liquid sources 211a, 211b, 211c for each of a plurality of liquids A, B, C to supply liquids A, B, C, and a flow controller 213 is arranged to regulate the flow rate of each of the liquid sources 211a, 211b, 211c to regulate the proportion of the supplied liquids A, B, C.

[0106] The medicine supply component 210 can mix medicines A, B, and C in a mixing tank 215 to a required ratio to generate and supply a mixed medicine solution. In this embodiment, the medicine supply component 210 is described as having a mixing tank 215 to mix and supply multiple medicines, but depending on the situation, the medicine supply component 210 may also have a simple stirrer to mix and supply medicines.

[0107] The liquid supply component 210 can supply liquid to the first flow liquid supply component 230 and the second flow liquid supply component 250 via the liquid supply line 217 connected to the mixing tank 215.

[0108] The liquid supply line 217 can be connected to the mixing tank 215 on one side and branched on the other side. One of the branch lines supplies liquid to the first flow liquid supply component 230, and the other branch line supplies liquid to the second flow liquid supply component 250.

[0109] Here, the liquid supply line 217 can supply liquid of the same flow rate to the first flow rate liquid supply component 230 and the second flow rate liquid supply component 250.

[0110] Alternatively, the first flow rate liquid supply component 230 may include a first liquid line 231, which is connected to one of the branches of the liquid supply line 217 to receive liquid.

[0111] Furthermore, the first flow rate liquid supply component 230 includes a first liquid line valve 232 disposed in the first liquid line 231. The first liquid line valve 232 is opened and closed under the control of the control unit 290, thereby enabling the liquid to be selectively supplied to the nozzle unit 170 of the substrate processing apparatus 100 through the first liquid line 231.

[0112] As an example, the solution supply line 217 supplies a first flow rate of solution, and the first flow rate solution supply member 230 supplies the first flow rate of solution directly to the nozzle unit 170 of the substrate processing apparatus 100. Alternatively, when performing a substrate processing process with a large flow rate of solution, the first flow rate solution supply member 230 can supply the large flow rate of solution to the nozzle unit 170 of the substrate processing apparatus 100, and the liquid solution can be sprayed onto the substrate through the nozzle unit 170.

[0113] Alternatively, the second flow drug supply component 250 may include a second drug line 251, which is connected to another branch of the drug supply line 217 to receive drug.

[0114] The second flow-rate drug supply component 250 may include a flow control valve 253 and a second drug line valve 252 disposed in the second drug line 251.

[0115] The control unit 290 can control the flow control valve 253 to adjust the flow rate of the medicine in the second medicine line 251 to the required flow rate in the corresponding substrate processing process. The flow control valve 253 can be used in various ways that allow for fine adjustment of the flow rate. As an example, a needle valve can be used to finely adjust the flow rate of the medicine flowing in the second medicine line 251.

[0116] The control unit 290 can control the opening and closing of the second liquid line valve 252 and selectively supply the liquid with the adjusted flow rate to the nozzle unit 170 of the substrate processing apparatus 100 through the second liquid line 251.

[0117] As an example, the second flow rate liquid supply member 250 can receive the first flow rate of liquid from the liquid supply line 217 at the same flow rate as the first flow rate liquid supply member 230, and supply the second flow rate of liquid to the nozzle unit 170 of the substrate processing apparatus 100 by adjusting the first flow rate to the second flow rate required in the substrate processing process through the flow control valve 253. For example, when performing the substrate processing process with a low flow rate of liquid, the second flow rate liquid supply member 250 can supply the low flow rate of liquid to the nozzle unit 170 of the substrate processing apparatus 100, and spray the liquid in a spray state onto the substrate through the nozzle unit 170.

[0118] The liquid supply line 217 of the liquid supply component 210 supplies liquid of the same flow rate to the first liquid supply line 231 and the second liquid supply line 251. The liquid is then supplied to the nozzle unit 170 of the substrate processing device 100 by adjusting the flow rate of the liquid in the second flow liquid supply component 250, with the remaining liquid being supplied.

[0119] The residual medicine treatment component 270 may include a residual medicine line 271, a residual medicine valve 272, and a discharge line 273 for treating the residual medicine after adjusting the flow rate of the medicine in the second medicine line 251.

[0120] Alternatively, the remaining amount of medicine supplied from the medicine supply line 217, excluding the flow rate adjusted in the second flow medicine supply component 250, flows into the remaining medicine line 271. The control unit 290 controls the opening and closing of the remaining medicine valve 272, and the remaining medicine is discharged to the outside through the discharge line 273.

[0121] Thus, according to the present invention, the liquid supply unit 200 can supply liquid of different flow rates to the nozzle unit 170 of the substrate processing apparatus 100 at the same flow rate from a liquid supply member 210, while simultaneously supplying liquid of different flow rates to the nozzle unit 170 through a first flow rate liquid supply member 230 and a second flow rate liquid supply member 250.

[0122] Furthermore, in this invention, the residual liquid treatment component 270, which processes the remaining amount of liquid after adjusting the flow rate in the second flow liquid supply component 250, can be modified in various ways. Further observation is made of various embodiments of the residual liquid treatment component 250.

[0123] Figure 5 A second embodiment of the liquid medicine supply unit according to the present invention is shown.

[0124] In the second embodiment of the liquid supply unit, the liquid supply component 210, the first flow liquid supply component 230, the second flow liquid supply component 250, etc. are the same as or similar to the first embodiment of the liquid supply unit described above, so the description of the repeated parts is omitted.

[0125] The residual medicine liquid treatment component 270 may include a residual medicine liquid line 271, a residual medicine liquid valve 272, a recovery line 274, etc., for recovering and reusing the residual medicine liquid remaining after adjusting the flow rate of the medicine liquid in the second medicine liquid line 251.

[0126] Alternatively, the remaining amount of medicine supplied from the medicine supply line 217, excluding the flow rate adjusted in the second flow medicine supply component 250, flows into the remaining medicine line 271, and the control unit 290 controls the opening and closing of the remaining medicine valve 272 to recover the remaining medicine through the recovery line 274.

[0127] The recovery line 274 is connected to the mixing tank 215 of the medicine supply unit 200. The recovered medicine in the recovery line 274 can be supplied to the mixing tank 215 of the medicine supply unit 200 for reuse.

[0128] Furthermore, the recovery line 274 can also be connected to the drug supply line 217 of the drug supply component 210, and the recovered drug solution in the recovery line 274 can be supplied directly to the first flow drug supply component 230 and the second flow drug supply component 250 without passing through the mixing tank 215.

[0129] Figure 6 as well as Figure 7 A third embodiment of the liquid medicine supply unit according to the present invention is shown.

[0130] In the third embodiment of the liquid supply unit, the liquid supply component 210, the first flow liquid supply component 230, the second flow liquid supply component 250, etc. are the same as or similar to the first embodiment of the liquid supply unit described above, so the description of the repeated parts is omitted.

[0131] The residual medicine liquid handling component 270 may include a residual medicine liquid line 271 for recovering and reusing the residual medicine liquid remaining after adjusting the flow rate of the medicine liquid in the second medicine liquid line 251, a residual medicine liquid valve 272, a recovery line 275, a storage tank 276, a recovery medicine liquid supply line 278, a recovery valve 279, etc.

[0132] Alternatively, the remaining amount of medicine supplied from the medicine supply line 217, excluding the flow rate regulated in the second flow medicine supply component 250, flows into the remaining medicine line 271. The control unit 290 controls the opening and closing of the remaining medicine valve 272, and the remaining medicine is recovered through the recovery line 275. The recovery line 274 can be connected to the storage tank 276 to provide the recovered medicine to the storage tank 276.

[0133] Storage tank 276 can be used for temporary storage and recovery of pharmaceutical liquid.

[0134] In the Figure 6 In the case of an embodiment, the recovered medicine stored in the storage tank 276 can be reused by being supplied to the mixing tank 215 of the medicine supply unit 200 via the recovered medicine supply line 278.

[0135] In the Figure 7 In the case of the embodiment, the recovered medicine stored in the storage tank 276 can be reused by being supplied to the medicine supply line 217 of the medicine supply unit 200 via the recovered medicine supply line 278.

[0136] The control unit 290 can control the recovery liquid valve 279 configured in the recovery liquid supply line 278 to selectively supply the recovery liquid stored in the storage tank 276.

[0137] Furthermore, the residual medicine solution treatment component 270 may also include a circulation line 277. The circulation line 277 may be equipped with a heater (not shown), a pump (not shown), a filter (not shown), etc., and may regulate the recovered medicine solution stored in the storage tank 276 according to the medicine solution supply while circulating the recovered medicine solution through the circulation line 277. New medicine solution for regulating the recovered medicine solution may also be supplied to the storage tank 276 or the circulation line 277 as needed.

[0138] As observed above, the liquid supply unit 200 according to the present invention can selectively supply liquids of different flow rates to the nozzle unit 170 of the substrate processing apparatus 100 through the first flow liquid supply member 230 and the second flow liquid supply member 250, while recovering and reusing the remaining liquids as the flow rate is adjusted.

[0139] This invention discloses a method for supplying a pharmaceutical solution using the pharmaceutical solution supply unit according to the invention as observed above. The following examples illustrate this method of supplying a pharmaceutical solution according to the invention. The method of supplying a pharmaceutical solution according to the invention is implemented in the pharmaceutical solution supply apparatus according to the invention as observed above; therefore, reference is made to the examples of the pharmaceutical solution supply apparatus according to the invention described above.

[0140] Figure 8 A flowchart illustrating an embodiment of the pharmaceutical solution supply method according to the present invention is shown.

[0141] It is possible that the liquid supply component 210 supplies liquid to the first flow liquid supply component 230 and the second flow liquid supply component 250, and provides the same first flow liquid to the first liquid line 231 of the first flow liquid supply component 230 and the second liquid line 251 of the second flow liquid supply component 250, which branches off from the liquid supply line 217 (S110).

[0142] Here, the medicine supplied by the medicine supply component 210 can be a single type of medicine, or it can be a mixture of multiple medicines of different types in a required proportion.

[0143] The control unit 290 determines the required flow rate of the chemical solution in the corresponding substrate processing process (S150). When a first flow rate of chemical solution is required, the control unit 290 can selectively operate the first flow rate chemical solution supply member 230 (S210). At this time, the control unit 290 can stop the operation of the second flow rate chemical solution supply member 250.

[0144] The first flow rate liquid supply component 230 can directly supply the first flow rate of liquid from the liquid supply component 210. Under the control of the control unit 290, the first flow rate liquid supply component 230 can supply the first flow rate of liquid to the nozzle unit 170 of the substrate processing apparatus 100 (S250).

[0145] When a second flow rate of chemical solution is required based on the determination of the required flow rate of chemical solution in the corresponding substrate processing process (S150), the control unit 290 can selectively operate the second flow rate chemical solution supply member 250 (S310). At this time, the control unit 290 can stop the operation of the first flow rate chemical solution supply member 230.

[0146] The control unit 290 can control the second flow medicine supply member 250 to adjust the flow rate of the supplied medicine (S330), and can adjust the flow rate of the first flow rate medicine supplied from the medicine supply member 210 to the second flow rate medicine (S330).

[0147] Under the control of the control unit 290, the second flow liquid supply member 250 can supply the second flow liquid to the nozzle unit 170 of the substrate processing apparatus 100 (S350).

[0148] The various processes of the drug supply method according to the present invention will be observed in further detail through more specific embodiments.

[0149] Figure 9 A flowchart is shown illustrating an embodiment of supplying a pharmaceutical solution via a pharmaceutical solution supply component in a pharmaceutical solution supply method according to the present invention.

[0150] The medicine supply component 210 can supply a mixed medicine solution by adjusting and mixing multiple different medicine solutions in a required ratio.

[0151] Therefore, the liquid supply component 210 can receive liquids from multiple liquid sources 211a, 211b, 211c according to the required mixing ratio, and at the same time adjust the flow rate of each liquid according to the required mixing ratio via the flow controller 213 (S111).

[0152] Multiple liquid medicines with adjusted flow rates can be supplied to the mixing tank 215 of the liquid medicine supply component 210 (S113), and a mixed liquid medicine is generated in the mixing tank 215.

[0153] The liquid medicine in the mixing tank 215 can be supplied to the first liquid medicine line 231 of the first flow liquid medicine supply component 230 and the second liquid medicine line 251 of the second flow liquid medicine supply component 250 through the liquid medicine supply line 217 of the liquid medicine supply component 210 (S115).

[0154] At this time, the flow rate of the medicine supplied from the medicine supply line 217 to the first medicine line 231 and the second medicine line 251 can be the same.

[0155] Below, we will observe an example of supplying a first flow rate of liquid medicine to the processing unit of the substrate processing apparatus according to the present invention.

[0156] Figure 10 A flowchart is shown illustrating an embodiment of supplying a pharmaceutical solution at a first flow rate in the pharmaceutical solution supply method according to the present invention. Figure 11 An embodiment is shown in which a pharmaceutical solution is supplied at a first flow rate in a substrate processing apparatus according to the invention.

[0157] When the required flow rate of the chemical solution in the corresponding substrate processing process is determined and the first flow rate of the chemical solution is required, the control unit 290 can open the first chemical solution line valve 232 disposed in the first chemical solution line 231 and close the second chemical solution line valve 252 disposed in the second chemical solution line 251 (S211).

[0158] With the opening of the first liquid line valve 232, the first flow rate of liquid can be supplied to the nozzle unit 170 of the substrate processing apparatus 100 through the first liquid line 231 (S251).

[0159] Here, the first flow rate liquid supply member 230 directly supplies the first flow rate of the liquid supplied from the liquid supply line 217 of the liquid supply member 210 without adjustment. Therefore, the liquid supplied to the nozzle unit 170 of the substrate processing apparatus 100 through the first flow rate liquid supply member 230 can be a liquid with a large first flow rate. As a result, a large flow rate of liquid in liquid state can be ejected through the nozzle unit 170 of the substrate processing apparatus 100 (S255).

[0160] An example is observed in which a second flow rate of the liquid medicine is supplied to the processing unit of the substrate processing apparatus and the remaining liquid medicine is processed according to the present invention.

[0161] Figure 12 A flowchart is shown illustrating an embodiment of supplying a pharmaceutical solution at a second flow rate in the pharmaceutical solution supply method according to the present invention. Figure 13 A flowchart illustrating a first embodiment of processing surplus pharmaceutical solution in the pharmaceutical solution supply method according to the present invention is shown. Figure 14 A first embodiment of processing residual pharmaceutical solution in a substrate processing apparatus according to the present invention is shown.

[0162] First, refer to the above Figure 12 and stated Figure 14 The following examples illustrate the process of supplying the drug solution at a second flow rate.

[0163] When the control unit 290 determines that the required flow rate of the liquid in the corresponding substrate processing process is required and a second flow rate of liquid is required, it closes the first liquid line valve 232 disposed in the first liquid line 231 (S311).

[0164] Furthermore, the control unit 290 can control the flow control valve 253 configured in the second liquid line 251 to adjust the first flow rate of liquid flowing in the second liquid line 251 to the second flow rate of liquid (S331).

[0165] If the flow rate is adjusted to the required flow rate level by the flow control valve 253, the control unit 290 can open the second liquid line valve 252 in the second liquid line 251 (S335) and supply the second flow rate of liquid to the nozzle unit 170 of the substrate processing apparatus 100 through the second liquid line 251 (S351).

[0166] Here, the control unit 290 adjusts the first flow rate of the liquid supplied from the liquid supply line 217 of the liquid supply member 210 to a second flow rate through the flow control valve 253 of the second flow liquid supply member 250. Therefore, the liquid supplied to the nozzle unit 170 of the substrate processing apparatus 100 through the second flow liquid supply member 250 can be a low-flow-rate liquid. As a result, a low-flow-rate liquid in a spray state can be sprayed out through the nozzle unit 170 of the substrate processing apparatus 100 (S355).

[0167] Because the first flow rate of the medicine supplied from the medicine supply component 210 is adjusted, the second flow rate medicine supply component 250 supplies medicine at a relatively small flow rate, thereby leaving the remaining medicine in the first flow rate excluding the second flow rate.

[0168] The residual liquid treatment component 270 can handle the residual liquid when the second flow of liquid is supplied through the second flow liquid supply component 250 (S400).

[0169] Regarding the process for handling the remaining liquid after supplying the second flow rate of liquid in this invention, please refer to the following... Figure 13 and stated Figure 14 The embodiments are described below.

[0170] The remaining amount of medicine in the second flow medicine supply component 250 can flow into the remaining medicine line 271 of the remaining medicine treatment component 270.

[0171] The control unit 290 can selectively open the remaining medicine valve 272 (S411) configured in the remaining medicine line 271 and discharge the remaining medicine to the outside through the discharge line 273 (S413).

[0172] The process for handling residual medicinal liquid in this invention can be modified in various ways. Regarding this... Figure 15 A flowchart illustrating a second embodiment of processing surplus pharmaceutical solution in the pharmaceutical solution supply method according to the present invention is shown. Figure 16 A second embodiment of processing residual pharmaceutical solution in a substrate processing apparatus according to the present invention is shown.

[0173] The process of supplying a second solution before handling the remaining solution is related to the process described above. Figure 12 and the Figure 14 The descriptions are the same or similar, therefore the explanation is omitted.

[0174] The remaining amount of medicine in the second flow medicine supply component 250 can flow into the remaining medicine line 271 of the remaining medicine treatment component 270.

[0175] Alternatively, the residual medicine liquid treatment component 270 may include a recovery line 274, and the control unit 290 may selectively open the residual medicine liquid valve 272 disposed in the residual medicine liquid line 271 (S421) to recover the residual medicine liquid in the residual medicine liquid line 271 to the recovery line 274 (S423).

[0176] The recovery line 274 of the residual liquid treatment component 270 can be connected to the liquid supply line 217 of the liquid supply component 210 to supply the recovered liquid from the recovery line 274 to the liquid supply line (271) (S425). With the recovery line 274 connected to the liquid supply line 217, the recovered liquid from the recovery line 274 can also be directly supplied to the first flow liquid supply component 210 or the second flow liquid supply component 250 through the liquid supply line 217.

[0177] Furthermore, as described Figure 16 As shown, the recovery line 274 of the residual medicine treatment component 270 can also be connected to the mixing tank 215 of the medicine supply component 210. The recovered medicine in the recovery line 274 can be provided to the mixing tank 215 of the medicine supply component 210 for reuse.

[0178] In this invention, the process of handling the remaining drug solution is presented as another embodiment. Figure 17 A flowchart illustrating a third embodiment of the method for handling excess pharmaceutical solution according to the present invention is shown. Figures 18 to 20 A third embodiment of processing residual pharmaceutical solution in a substrate processing apparatus according to the present invention is shown.

[0179] The process of supplying a second solution before handling the remaining solution is as described above. Figure 12 and the Figure 14 The descriptions are the same or similar, therefore the explanation is omitted.

[0180] First, refer to the above Figure 17 and the Figure 18 This will explain the process of recovering the remaining liquid medicine.

[0181] The remaining amount of medicine in the second flow medicine supply component 250 can flow into the remaining medicine line 271 of the remaining medicine treatment component 270.

[0182] Alternatively, the residual medicine liquid treatment component 270 may include a recovery line 274, and the control unit 290 may selectively open the residual medicine liquid valve 272 disposed in the residual medicine liquid line 271 (S431) to recover the residual medicine liquid in the residual medicine liquid line 271 to the recovery line 274 (S433).

[0183] Alternatively, the residual medicine treatment component 270 may include a storage tank 276, and a recovery line 274 connected to the storage tank 276, through which the recovered medicine is supplied to the storage tank 276. The storage tank 276 may temporarily store the recovered medicine or store it for a certain period of time (S435).

[0184] When the recycled solution is stored in the storage tank 276 for a certain period of time, it may not meet the solution supply conditions such as temperature and density required by the corresponding substrate processing process.

[0185] Therefore, the residual medicine liquid treatment component 270 may include a circulation line 277 that circulates the recovered medicine liquid stored in the storage tank 276. The circulation line 277 may be equipped with heaters (not shown), pumps (not shown), various meters (not shown), etc., and may also supply new medicine liquid.

[0186] The control unit 290 can adjust the liquid supply conditions required for the recovery liquid to be met while the recovered liquid stored in the storage tank 276 is circulated through the circulation line 277 (S437).

[0187] Below, refer to the above Figure 17 The above Figure 19 and the Figure 20 This will explain the process of supplying and recycling the medicine.

[0188] Without passing through the circulation line 277 of the residual liquid treatment component 270, the control unit 290 selectively controls the recovery valve 279, thereby allowing the recovered liquid stored in the storage tank 276 to be supplied to the mixing tank 215 via the recovery liquid supply line 278 (S439) or to the liquid supply line 217 for reuse.

[0189] Preferably, since the recovered solution stored in the storage tank 276 for a certain period of time, as explained above, may not meet the solution supply conditions such as temperature and density required by the corresponding substrate processing process, the recovered solution can be adjusted while being circulated through the circulation line 277 (S437).

[0190] When the recovered medicine meets the appropriate medicine supply conditions or when the recovered medicine needs to be supplied, the control unit 290 can selectively open the recovery valve 279 to supply the recovered medicine stored in the storage tank 276 through the recovered medicine supply line 278, thereby reusing the recovered medicine.

[0191] As described Figure 19 As shown, the recovery liquid supply line 278 of the residual liquid treatment component 270 can be connected to the mixing tank 215 of the liquid supply component 210, and the recovery liquid is supplied to the mixing tank 215 (S439), through which the recovery liquid is reused.

[0192] Or, as described Figure 20 As shown, the recovery liquid supply line 278 of the residual liquid treatment component 270 can also be connected to the liquid supply line 217 of the liquid supply component 210, and the recovery liquid from the recovery line 274 is supplied to the liquid supply line 217. With the recovery line 274 connected to the liquid supply line 217, the recovery liquid from the recovery line 274 can be directly supplied to the first flow liquid supply component 210 or the second flow liquid supply component 250 through the liquid supply line 217.

[0193] As observed above, the present invention enables the supply of different flow rates of chemical solutions through a single chemical solution supply unit, depending on the substrate processing conditions.

[0194] In particular, multiple liquid lines are supplied with liquid at the same flow rate, and the flow rate is adjusted by flow control valves configured in one or more of the multiple liquid lines, so that the multiple liquid lines can supply liquid at different flow rates.

[0195] The above description is merely illustrative of the technical concept of the present invention. Those skilled in the art can make various modifications and variations without departing from the essential characteristics of the invention. Therefore, the embodiments described herein are for illustrating the technical concept and not for limiting it; the technical concept of the invention is not limited by such embodiments. The scope of protection of the present invention should be interpreted according to the appended claims, and all technical concepts within the same scope are included within the scope of the claims.

Claims

1. A liquid medicine supply unit, characterized in that, include: The pharmaceutical supply component includes a pharmaceutical supply line that provides the same flow rate of pharmaceutical solution; The first flow rate liquid supply component includes a first liquid line that receives the supplied liquid from a branch line of the liquid supply line of the liquid supply component and supplies the first flow rate liquid to the nozzle unit of the substrate processing apparatus. The second flow rate liquid supply component includes a second liquid line that receives liquid of the same flow rate as the supplied liquid from a branch line of the liquid supply line of the liquid supply component, and adjusts the liquid flow rate to supply the second flow rate liquid to the nozzle unit of the substrate processing apparatus. The residual medicine liquid treatment component includes a residual medicine liquid line connected to a branch line of the medicine liquid supply line of the medicine liquid supply component, and a residual medicine liquid valve disposed on the residual medicine liquid line to treat the residual medicine liquid other than the medicine liquid of the second flow rate in the supplied medicine liquid as the medicine liquid flow rate of the second flow rate medicine liquid supply component is adjusted. as well as The control unit grasps the required liquid flow rate and selectively controls either the first flow rate liquid supply component or the second flow rate liquid supply component to supply the liquid to the nozzle unit at either the first flow rate or the second flow rate according to the required liquid flow rate. It also controls the adjustment of the liquid flow rate to supply a different flow rate than the first flow rate and controls the residual liquid treatment component to discharge the remaining liquid other than the liquid at the second flow rate to the residual liquid line of the residual liquid treatment component branching off from the liquid supply line.

2. The liquid medicine supply unit according to claim 1, characterized in that, The liquid medicine supply component includes: The medicine supply line provides medicine through branch lines. The first flow rate drug supply component includes: The first liquid supply line is connected to one of the branches of the liquid supply line to supply the first flow rate of liquid to the nozzle unit of the substrate processing apparatus. The second flow-through drug supply component includes: The second liquid supply line, connected to another branch of the liquid supply line, supplies the second flow rate of liquid to the nozzle unit of the substrate processing apparatus; and A flow control valve is configured on the second liquid line to control the flow rate of the liquid. The control unit controls the flow control valve to adjust the flow rate of the second medicine line to a second flow rate that is relatively less than the first flow rate of the first medicine line.

3. The liquid medicine supply unit according to claim 2, characterized in that, The first flow rate drug supply component also includes: A first drug supply valve is disposed on the first drug supply line and selectively supplies drug supply to the first drug supply line according to its opening and closing. The second flow-through drug supply component also includes: A second drug supply valve is configured on the second drug supply line to selectively supply drug to the second drug supply line based on its opening and closing. The control unit controls the first liquid line valve and the second liquid line valve to supply liquids of different flow rates to the nozzle unit of the substrate processing apparatus.

4. The liquid medicine supply unit according to claim 1, characterized in that, The residual medicine solution treatment component includes: The discharge line discharges the remaining liquid medicine.

5. The liquid medicine supply unit according to claim 1, characterized in that, The liquid medicine supply component includes: Multiple pharmaceutical supply departments provide various different pharmaceutical solutions; Multiple flow control units regulate the liquid supply of the multiple liquid supply units; and A mixing tank is used to mix multiple medicinal solutions for delivery.

6. The liquid medicine supply unit according to claim 5, characterized in that, The residual medicine solution treatment component includes: The recovery line recovers the remaining liquid medicine and supplies it to the mixing tank.

7. The liquid medicine supply unit according to claim 5, characterized in that, The residual medicine solution treatment component includes: The recovery line recovers the remaining liquid medicine; and Storage tanks are used to store the recovered pharmaceutical solutions collected through the recovery line.

8. The liquid medicine supply unit according to claim 7, characterized in that, The residual medicine liquid treatment component also includes: The recovery liquid supply line supplies the recovered liquid stored in the storage tank to the liquid supply component.

9. The liquid medicine supply unit according to claim 7, characterized in that, The residual medicine liquid treatment component also includes: The recovery solution supply line supplies the recovered solution stored in the storage tank to the mixing tank.

10. A substrate processing apparatus, characterized in that, include: The drug supply unit as described in claim 1; The nozzle unit receives different flow rates of liquid medicine from the liquid medicine supply unit and sprays it onto the substrate, corresponding to the substrate processing process. as well as Substrate support unit, on which the substrate to be processed is placed.

11. A method for supplying a medicinal liquid, characterized in that, include: In the same flow rate drug supply step, the same first flow rate of drug is supplied to the first drug supply line of the first flow rate drug supply component and the second drug supply line of the second flow rate drug supply component, which branch off from the drug supply line. The procedure for controlling the flow rate is required, and the control department controls the required flow rate of the liquid medicine. In the liquid spraying supply step, the control unit selectively controls either the first flow liquid supply component or the second flow liquid supply component according to the required liquid flow rate, and selectively supplies the first flow rate of liquid passing through the first liquid line or the second flow rate of liquid adjusted to be relatively less than the first flow rate through the second liquid line to the nozzle unit of the substrate processing device. as well as In the residual medicine liquid treatment step, when the second flow rate of medicine liquid is supplied, the control unit controls the residual medicine liquid valve of the residual medicine liquid treatment component to discharge the residual medicine liquid other than the second flow rate of medicine liquid in the first flow rate of medicine liquid to the residual medicine liquid line of the residual medicine liquid treatment component branching from the medicine liquid supply line.

12. The method for supplying liquid medicine according to claim 11, characterized in that, The step of supplying the sprayed medicine includes: When the required drug flow rate is the first flow rate, the steps of opening the first drug line valve of the first drug line and closing the second drug line valve of the second drug line are as follows: The step of supplying the first flow rate of liquid medicine to the nozzle unit of the substrate processing apparatus via the first liquid medicine line.

13. The method for supplying liquid medicine according to claim 11, characterized in that, The step of supplying the sprayed medicine includes: When the required flow rate of the liquid medicine is a second flow rate that is relatively less than the first flow rate, the first liquid medicine line valve of the first liquid medicine line is closed, and the flow rate of the second liquid medicine line is adjusted to a second flow rate that is relatively less than the first flow rate by means of the flow control valve configured in the second liquid medicine line. The steps of opening the second drug line valve of the second drug line; and The step of supplying the second flow rate of the drug solution to the nozzle unit of the substrate processing apparatus via the second drug solution line.

14. The method for supplying liquid medicine according to claim 11, characterized in that, The residual medicine treatment step involves discharging the residual medicine through a discharge line.

15. The method for supplying liquid medicine according to claim 11, characterized in that, The residual medicine solution treatment steps include: The residual medicine recovery step involves recovering the remaining medicine solution (excluding the medicine solution at the second flow rate) supplied to the second medicine solution line via a recovery line; and The recovered medicine solution supply step involves supplying the recovered medicine solution, which has been recovered through the recovery line, to the medicine solution supply line.

16. The method for supplying liquid medicine according to claim 11, characterized in that, The step of providing the same flow rate of medicine solution involves adjusting the supply flow rate of multiple different medicine solutions and providing them to a mixing tank, from which medicine solution is supplied to the medicine solution supply line. The remaining liquid treatment step also includes: The residual medicine liquid recovery step involves recovering the residual medicine liquid other than the medicine liquid at the second flow rate from the first flow rate of medicine liquid supplied to the second medicine liquid line via a recovery line. The storage tank procedure involves storing the recovered pharmaceutical solution, which has been recovered through the recycling line, in a storage tank; and The step of providing the recovered medicine solution involves supplying the recovered medicine solution stored in the storage tank to the mixing tank or the medicine solution supply line.

17. The method for supplying liquid medicine according to claim 16, characterized in that, The method for supplying the drug solution also includes: The recovery liquid conditioning step involves circulating the recovered liquid stored in the storage tank to the circulation line and adjusting it according to the liquid supply conditions.

18. A liquid medicine supply unit, characterized in that, include: The liquid medicine supply component provides the same flow rate of liquid medicine. The liquid medicine supply line receives liquid medicine from the liquid medicine supply component and supplies it through branch lines; The first liquid line is connected to one of the branches of the liquid supply line to supply a first flow rate of liquid to the nozzle unit of the substrate processing apparatus; A first liquid line valve is disposed on the first liquid line and selectively supplies the first flow rate of liquid to the first liquid line according to its opening and closing. The second liquid line is connected to another branch of the liquid supply line and supplies a second flow rate of liquid to the nozzle unit of the substrate processing apparatus. A flow control valve is configured on the second liquid line to adjust the first flow rate of liquid supplied to the second liquid line to a relatively small second flow rate; A second drug line valve is configured on the second drug line to selectively supply the second flow rate of drug to the second drug line according to its opening and closing. The remaining liquid line is connected to one of the branches of the liquid supply line. A residual medicine valve is configured on the residual medicine line; A recovery line is connected to the remaining liquid medicine line to recover the remaining liquid medicine in the first flow rate of the liquid medicine supplied to the second liquid medicine line according to the flow rate adjustment of the flow control valve, excluding the liquid medicine medicine at the second flow rate. as well as The control unit selectively controls either the first flow rate drug supply member or the second flow rate drug supply member to supply the drug to the nozzle unit at either the first flow rate or the second flow rate according to the required drug flow rate. It also controls the flow control valve to adjust the flow rate of the second drug line to the first flow rate or a second flow rate relatively less than the first flow rate. Furthermore, it controls the first drug line valve and the second drug line valve to selectively supply the first flow rate or the second flow rate of drug to the nozzle unit of the substrate processing apparatus. Finally, it controls the drug processing member to discharge any remaining drug, excluding the second flow rate, to the remaining drug line of the remaining drug processing member branching off from the drug supply line.

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