Transparent display device

Abstract

A transparent display device is provided, which can reduce or minimize light transmission loss due to a touch sensor and a touch line, and can repair a defective touch sensor. The transparent display device includes a substrate provided with a plurality of transmission areas and a non-transmission area disposed between the transmission areas adjacent to each other and including a plurality of light emitting areas, a plurality of touch sensors respectively disposed in the plurality of transmission areas above the substrate and including a touch sensor electrode, a plurality of touch lines disposed in the non-transmission area above the substrate and extending in a first direction, a plurality of touch bridge lines disposed in the non-transmission area above the substrate and extending in a second direction to be connected to one of the plurality of touch lines, and a plurality of touch connection parts connecting the plurality of touch bridge lines with the plurality of touch sensors and including a high resistance line.

Description

Technical Field

[0001] This invention relates to a transparent display device. Background Technology

[0002] With the development of the information age, the demand for display devices for displaying images has increased in various forms. As a result, various types of display devices have recently been used, such as liquid crystal display (LCD) devices, plasma display panel (PDP) devices, quantum dot light-emitting display (QLED) devices, and organic light-emitting display (OLED) devices.

[0003] Recently, research on transparent display devices has been actively underway, in which users can view objects or images located on the opposite side of the display device. A transparent display device includes a display area on which an image is displayed, wherein the display area can include a transmissive area and a non-transmissive area capable of transmitting external light, and can have high light transmittance through the transmissive area.

[0004] Transparent display devices can be equipped with multiple touch sensors and multiple touch lines to achieve touch functionality. However, the problem with transparent display devices is that it is not easy to form multiple touch sensors and multiple touch lines, or the manufacturing process is complex, and the light transmittance may be reduced due to the presence of multiple touch sensors and multiple touch lines. Summary of the Invention

[0005] This disclosure has been made in view of the above-mentioned problems, and one object of this disclosure is to provide a transparent display device that can reduce or minimize light transmittance loss due to touch sensors and touch lines.

[0006] Another object of this disclosure is to provide a transparent display device that can repair defective touch sensors.

[0007] In addition to the purposes of this disclosure as stated above, other purposes and features of this disclosure will be clearly understood by those skilled in the art from the following description.

[0008] According to one aspect of this disclosure, the above and other objectives can be achieved by providing a transparent display device comprising: a substrate having a plurality of transmissive regions and non-transmissive regions disposed between adjacent transmissive regions, the non-transmissive regions including a plurality of light-emitting regions; a plurality of touch sensors disposed in the plurality of transmissive regions above the substrate and including touch sensor electrodes; a plurality of touch lines disposed in the non-transmissive regions above the substrate and extending along a first direction; a plurality of touch bridge lines disposed in the non-transmissive regions above the substrate and extending along a second direction to connect to one of the plurality of touch lines; and a plurality of touch connection portions connecting the plurality of touch bridge lines to the plurality of touch sensors and including high-resistance wires.

[0009] According to another aspect of this disclosure, the above and other objectives can be achieved by providing a transparent display device comprising: a substrate having a plurality of transmissive regions and a non-transmissive region disposed between adjacent transmissive regions, the non-transmissive region including a plurality of light-emitting regions; a plurality of light-emitting elements disposed in the plurality of light-emitting regions above the substrate and including an anode electrode, a light-emitting layer and a cathode electrode; a plurality of driving transistors connected to the anode electrode of each light-emitting element and including an active layer, a gate electrode, a source electrode and a drain electrode; a plurality of touch sensors disposed in the plurality of transmissive regions above the substrate and including touch sensor electrodes disposed in the same layer as the cathode electrodes; a plurality of touch bridge lines disposed in the non-transmissive regions; and a plurality of touch connection portions connecting the plurality of touch bridge lines to the plurality of touch sensors, the plurality of touch connection portions including touch contact electrodes disposed in the transmissive regions and touch connection lines formed in a layer disposed between the substrate and the driving transistors. Attached Figure Description

[0010] The above and other objects, features and advantages of this disclosure will become clearer from the following detailed description taken in conjunction with the accompanying drawings, in which:

[0011] Figure 1 This is a schematic plan view showing a transparent display device;

[0012] Figure 2 It shows the setting Figure 1 A schematic diagram illustrating an example of pixels in region A;

[0013] Figure 3 It shows the setting Figure 2 A view of examples of signal lines, touch lines, and touch sensors in area B;

[0014] Figure 4 It is a view showing the connection relationships between multiple touch blocks and multiple touch lines;

[0015] Figure 5 This is a view showing the connection relationships between multiple touch sensors and multiple touch lines in a touch block;

[0016] Figure 6 It is along Figure 3 A cross-sectional view taken from line I-I';

[0017] Figure 7 This is a view showing an example of setting up a cathode electrode and a touch sensor electrode;

[0018] Figure 8 This is a view illustrating an example of a touch sensor that is defective due to particles entering the first undercut structure;

[0019] Figure 9 It is shown Figure 3 A magnified view of region C;

[0020] Figure 10 It is along Figure 9 The cross-sectional view taken from line II-II'; and

[0021] Figure 11 This is a view showing an example of laser cutting a high-resistance wire when a defective touch sensor is detected. Detailed Implementation

[0022] The advantages and features of this disclosure, and its implementation methods, will be illustrated by the following description of embodiments with reference to the accompanying drawings. However, this disclosure may be implemented in various forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure is thorough and complete, and fully conveys the scope of this disclosure to those skilled in the art. Furthermore, this disclosure is limited only by the scope of the claims.

[0023] The shapes, dimensions, scales, angles, and quantities disclosed in the drawings used to describe embodiments of this disclosure are merely examples, and therefore, this disclosure is not limited to the details shown. Throughout the specification, the same reference numerals refer to the same elements. In the following description, detailed descriptions of relevant known functions or configurations will be omitted where such descriptions unnecessarily obscure the essential points of this disclosure. Where terms such as 'comprising,' 'having,' and 'including' are used in this specification, additional terms may be added unless 'only' is used. Singular terms may include plural forms unless otherwise stated.

[0024] When interpreting an element, it is interpreted as including a range of errors, although there is no explicit description.

[0025] When describing positional relationships, such as when the positional relationship is described as "above", "on", "below", and "next to", one or more parts may be arranged between two other parts, unless "exactly" or "directly" is used.

[0026] It should be understood that although the terms "first," "second," etc., may be used herein to describe various elements, these elements should not be limited by these terms. These terms are used only to distinguish one element from another. For example, without departing from the scope of this disclosure, a first element may be referred to as a second element, and similarly, a second element may be referred to as a first element.

[0027] In describing the elements of this disclosure, the terms “first,” “second,” etc., may be used. These terms are intended to identify corresponding elements from other elements, and the basis, order, or number of corresponding elements is not limited by these terms. The statement that an element is “connected” or “linked” to another element should be understood as meaning that the element can be directly connected or linked to the other element, unless specifically mentioned, or a third element can be inserted between the corresponding elements.

[0028] Features of the various embodiments of this disclosure may be coupled or combined with each other in part or in whole, and may interoperate differently with each other and be technically driven, as will be fully understood by those skilled in the art. Embodiments of this disclosure may be performed independently of each other, or may be performed together in an interdependent relationship.

[0029] Figure 1 This is a schematic plan view showing a transparent display device.

[0030] In the following, the X-axis represents the line parallel to the scan line, the Y-axis represents the line parallel to the data line, and the Z-axis represents the height direction of the transparent display device 100.

[0031] Although the transparent display device 100 according to one embodiment of the present disclosure has been described as an organic light-emitting display device, the transparent display device 100 may be implemented as a liquid crystal display device, a plasma display panel (PDP), a quantum dot light-emitting display (QLED) or an electrophoretic display device.

[0032] Reference Figure 1 According to one embodiment of the present disclosure, a transparent display device includes a transparent display panel 110. The transparent display panel 110 may include a display area DA provided with pixels for displaying images and a non-display area NDA not used for displaying images.

[0033] The display area DA can be configured with a first signal line SL1, a second signal line SL2, and pixels. The non-display area NDA can be configured with a pad area PA and at least one scan driver 205, wherein pads are configured in the pad area PA.

[0034] A first signal line SL1 may extend in a first direction (e.g., the Y-axis direction). The first signal line SL1 may intersect a second signal line SL2 within the display area DA. The second signal line SL2 may extend within the display area DA along a second direction (e.g., the X-axis direction). Pixels may be disposed in the area where the first signal line SL1 and the second signal line SL2 intersect each other, and emit predetermined light to display an image.

[0035] The scan driver 205 is connected to the scan line and provides a scan signal to the scan line. The scan driver 205 can be set in the non-display area NDA on one or both sides of the display area DA of the transparent display panel 110 by means of the in-panel gate driver (GIP) method or the tape auto-bonding (TAB) method.

[0036] To enable touch functionality, in addition to the first signal line SL1, the second signal line SL2, and pixels, the transparent display panel 110 may also include touch lines and a touch sensor. See below for further details. Figures 2 to 11 A detailed description of the touch line and touch sensor.

[0037] Figure 2 It shows the setting Figure 1 A schematic diagram of an example of pixels in region A. Figure 3 It shows the setting Figure 2 A view of an example of signal lines, touch lines, and touch sensors in area B.

[0038] like Figure 2 As shown, the display area DA includes a transmissive area TA and a non-transmissive area NTA. The transmissive area TA is the area through which most of the external incident light passes, while the non-transmissive area NTA is the area through which most of the external incident light cannot pass. For example, the transmissive area TA can be an area with a transmittance greater than α% (e.g., about 90%), and the non-transmissive area NTA can be an area with a transmittance less than β% (e.g., about 50%). In this case, α is greater than β. Due to the transmissive area TA, the user can view objects or backgrounds arranged on the rear surface of the transparent display panel 110.

[0039] The non-transmissive region NTA may include a first non-transmissive region NTA1, a second non-transmissive region NTA2, and multiple pixels P.

[0040] A pixel P can be provided to at least partially overlap at least one of a first signal line SL1 and a second signal line SL2, thereby emitting predetermined light to display an image. The emitting region EA can correspond to the area in pixel P from which light is emitted.

[0041] like Figure 2 As shown, each pixel P may include at least one of a first sub-pixel SP1, a second sub-pixel SP2, a third sub-pixel SP3, and a fourth sub-pixel SP4. The first sub-pixel SP1 may include a first emitting region EA1 that emits light of a first color. The second sub-pixel SP2 may include a second emitting region EA2 that emits light of a second color. The third sub-pixel SP3 may include a third emitting region EA3 that emits light of a third color. The fourth sub-pixel SP4 may include a fourth emitting region EA4 that emits light of a fourth color.

[0042] The first to fourth luminescent regions EA1, EA2, EA3, and EA4 can emit different colors of light. For example, the first luminescent region EA1 can emit green light. The second luminescent region EA2 can emit red light. The third luminescent region EA3 can emit blue light. The fourth luminescent region EA4 can emit white light. However, the luminescent regions are not limited to this example. Each pixel P can also include subpixels that emit light of colors other than red, green, blue, and white. Furthermore, the arrangement order of subpixels SP1, SP2, SP3, and SP4 can be changed in various ways.

[0043] The first non-transmissive region NTA1 may extend in the display region DA in a first direction (Y-axis direction) and may be arranged to at least partially overlap the light-emitting regions EA1, EA2, EA3, and EA4. A plurality of first non-transmissive regions NTA1 may be provided in the transparent display panel 110, and a transmissive region TA may be provided between two adjacent first non-transmissive regions NTA1. In the first non-transmissive region NTA1, a first signal line extending in the first direction (Y-axis direction) and a touch line TL extending in the first direction (Y-axis direction) may be arranged to be spaced apart from each other.

[0044] For example, the first signal line SL1 may include at least one of the following: pixel power line VDD, common power line VSS, reference line REF, or data lines DL1, DL2, DL3, and DL4.

[0045] The pixel power line VDD can provide the first power to the driving transistor TFT of each sub-pixel SP1, SP2, SP3 and SP4 located in the display area DA.

[0046] The common power line VSS can provide a second power supply to the cathode electrodes CE of sub-pixels SP1, SP2, SP3, and SP4 located in the display area DA. In this case, the second power supply can be a common power supply commonly provided to sub-pixels SP1, SP2, SP3, and SP4.

[0047] A common power line VSS can supply a second power supply to the cathode electrode through the cathode contact portion CCT located between the transmission region TA and the common power line VSS. A power connection line VCL can be located between the common power line VSS and the cathode contact portion CCT. One end of the power connection line VCL can be connected to the common power line VSS, and the other end can be connected to the cathode contact portion CCT. The cathode electrode can be connected to the cathode contact portion CCT. Therefore, the cathode electrode can be electrically connected to the common power line VSS through the power connection line VCL and the cathode contact portion CCT.

[0048] The reference line REF can provide initialization voltage (or sensing voltage) to the driving transistor TFT of each sub-pixel SP1, SP2, SP3 and SP4 located in the display area DA.

[0049] The reference line REF can be set between multiple data lines DL1, DL2, DL3, and DL4. For example, the reference line REF can be set at the center of multiple data lines DL1, DL2, DL3, and DL4, that is, between the second data line DL2 and the third data line DL3.

[0050] The reference line REF can branch and connect to multiple sub-pixels SP1, SP2, SP3, and SP4. Specifically, the reference line REF can be connected to the circuit elements of multiple sub-pixels SP1, SP2, SP3, and SP4 to provide an initialization voltage (or sensing voltage) to each sub-pixel SP1, SP2, SP3, and SP4.

[0051] When the reference line REF is set close to the edge of the first non-transparent region NTA1, the deviation between the connection lengths from the bifurcation point to the circuit elements of each of the multiple sub-pixels SP1, SP2, SP3, and SP4 increases. For example, when the reference line REF is set at the leftmost edge of the region providing the first non-transparent region NTA1, the connection length from the bifurcation point to the circuit element located on the right side of the first non-transparent region NTA1 may be greater than the connection length from the bifurcation point to the circuit element located on the left side of the first non-transparent region NTA1. In this case, a difference may occur between the signal provided to the circuit region located on the right side of the first non-transparent region NTA1 and the signal provided to the circuit region located on the left side of the first non-transparent region NTA1.

[0052] In a transparent display panel 110 according to one embodiment of the present disclosure, a reference line REF can be disposed in the middle region of the first non-transmissive region NTA1, thereby reducing or minimizing the deviation between the connection lengths of the circuit elements to each of the sub-pixels SP1, SP2, SP3, and SP4. Therefore, the reference line REF can uniformly provide signals to the circuit elements of each of the plurality of sub-pixels SP1, SP2, SP3, and SP4.

[0053] Each of the data lines DL1, DL2, DL3, and DL4 can provide a data voltage to sub-pixels SP1, SP2, SP3, and SP4. For example, the first data line DL1 can provide a first data voltage to the first driving transistor TFT of the first sub-pixel SP1, the second data line DL2 can provide a second data voltage to the second driving transistor TFT of the second sub-pixel SP2, the third data line DL3 can provide a third data voltage to the third driving transistor TFT of the third sub-pixel SP3, and the fourth data line DL4 can provide a fourth data voltage to the fourth driving transistor TFT of the fourth sub-pixel SP4.

[0054] In a transparent display panel 110 according to one embodiment of the present disclosure, a touch line TL may be further disposed in a first non-transmissive region NTA1.

[0055] At least two touch lines TL can be provided in the first non-transmissive region NTA1. When multiple touch lines TL are provided in the transmissive region TA of the transparent display panel 110, the light transmittance may be degraded due to the multiple touch lines TL.

[0056] Furthermore, slits, particularly elongated linear or rectangular shapes, can be provided between the multiple touch lines TL. When external light passes through the slits, diffraction may occur. According to diffraction, when light passes through the slits, light corresponding to a plane wave can become a spherical wave, and interference may occur within the spherical wave. Therefore, constructive and destructive interferences occur within the spherical wave, resulting in irregular light intensities for the external light that has passed through the slits. Consequently, the clarity of objects or images located on opposite sides of the transparent display panel 110 may be reduced. For this reason, the multiple touch lines TL are preferably located in the first non-transmissive region NTA1, rather than in the transmissive region TA.

[0057] Multiple touch lines TL can be positioned between the first signal lines SL1 in the first non-transmissive region NTA1, such as... Figure 3As shown. For example, six touch lines TL1, TL2, TL3, TL4, TL5, and TL6 can be arranged in a first non-transmissive region NTA1. Each of the six touch lines TL1, TL2, TL3, TL4, TL5, and TL6 can be arranged among the first signal lines SL1 arranged in the order of pixel power line VDD, first data line DL1, second data line DL2, reference line REF, third data line DL3, fourth data line DL4, and common power line VSS, but is not limited to this arrangement.

[0058] The multiple touch lines TL must not overlap with the circuit areas CA1, CA2, CA3, and CA4 where circuit elements are located, and the arrangement order of the multiple touch lines TL and the first signal line SL1 can be modified in various ways. In another embodiment, the multiple touch lines TL can be arranged between the first signal line SL1 and the transmission area TA. Three touch lines TL1, TL2, and TL3 can be arranged between the pixel power line VDD and the transmission area TA, while the other three touch lines TL4, TL5, and TL6 can be arranged between the common power line VSS and the transmission area TA.

[0059] According to one embodiment of the present disclosure, a transparent display panel 110 includes pixels P between adjacent transmissive regions TA, and pixels P may include light-emitting regions EA1, EA2, EA3, and EA4, wherein light-emitting elements are arranged to emit light. Since the size of the non-transmissive region NTA in the transparent display panel 110 is small, circuit elements can be configured to at least partially overlap with the light-emitting regions EA1, EA2, EA3, and EA4. That is, the light-emitting regions EA1, EA2, EA3, and EA4 may include circuit regions CA1, CA2, CA3, and CA4 in which circuit elements are disposed.

[0060] For example, the circuit region may include: a first circuit region CA1, wherein a circuit element connected to a first sub-pixel SP1 is provided; a second circuit region CA2, wherein a circuit element connected to a second sub-pixel SP2 is provided; a third circuit region CA3, wherein a circuit element connected to a third sub-pixel SP3 is provided; and a fourth circuit region CA4, wherein a circuit element connected to a fourth sub-pixel SP4 is provided.

[0061] In a transparent display panel 110 according to one embodiment of the present disclosure, multiple touch lines TL do not overlap with circuit regions CA1, CA2, CA3 and CA4, thereby reducing or minimizing the parasitic capacitance of the touch lines TL caused by circuit elements.

[0062] Furthermore, the transparent display panel 110 according to one embodiment of this disclosure can reduce the horizontal distance difference between touch lines TL. Since at least two transistors and one capacitor are disposed in circuit regions CA1, CA2, CA3, and CA4, it may be difficult to form the touch lines TL in circuit regions CA1, CA2, CA3, and CA4 as straight lines, and it may be difficult to maintain a constant horizontal distance. Therefore, the horizontal distance difference between touch lines TL increases, thereby potentially resulting in very low uniformity of parasitic capacitance.

[0063] In a transparent display panel 110 according to one embodiment of the present disclosure, the touch line TL can be configured not to overlap with the circuit areas CA1, CA2, CA3 and CA4, thereby reducing the influence of circuit elements and simultaneously reducing the horizontal distance difference between the touch lines TL to improve the uniformity of parasitic capacitance.

[0064] The second non-transmissive region NTA2 can extend in the display region DA along a second direction (X-axis direction) and can be configured to at least partially overlap with the light-emitting regions EA1, EA2, EA3, and EA4. A plurality of second non-transmissive regions NTA2 can be provided in the transparent display panel 110, and a transmissive region TA can be provided between two adjacent second non-transmissive regions NTA2. The second signal line SL2 and the touch bridge line TBL can be configured to be spaced apart from each other in the second non-transmissive regions NTA2.

[0065] The second signal line SL2 may extend in a second direction (X-axis direction) and may include, for example, a scan line SCANL. The scan line SCANL may provide scan signals to the sub-pixels SP1, SP2, SP3, and SP4 of pixel P.

[0066] The touch bridge cable (TBL) can connect any one of multiple touch lines (TL) to the touch sensor (TS). For example... Figure 5 As shown, the touch bridge line TBL extending in the X-axis direction may include a sub-bridge line SBL extending in the Y-axis direction for connection with the touch sensor TS. The sub-bridge line SBL of the touch bridge line TBL can be connected to any one of the multiple touch lines TL through the second contact hole CH2. Furthermore, the sub-bridge line SBL of the touch bridge line TBL can be connected to at least two touch sensors TS that extend along the second direction (X-axis direction) and are arranged along the second direction (X-axis direction).

[0067] In one embodiment, the touch bridge line TBL may include multiple layers, such as two layers. The touch bridge line TBL may include a first touch bridge line disposed in a region of the first layer that overlaps with the first non-transmissive region NTA1, and a second touch bridge line disposed in a region of the second layer that does not overlap with the first non-transmissive region NTA1. A first touch bridge line may be connected at one end to a second touch bridge line via a third contact hole CH3, and at the other end to another second touch bridge line via a fourth contact hole CH4. For example, the first layer may be the same layer as the gate electrode of the driving transistor, and the second layer may be the same layer as the source and drain electrodes of the driving transistor.

[0068] In a transparent display panel 110 according to one embodiment of the present disclosure, multiple touch lines TL can be disposed in a first non-transmissive region NTA1 instead of a second non-transmissive region NTA2, thereby preventing the light transmittance from deteriorating due to the multiple touch lines TL. Figure 3 As shown, the second non-transmissive region NTA2, extending along the second direction (X-axis direction), intersects with adjacent transmissive regions TA. When the width of the second non-transmissive region NTA2, which intersects with the transmissive region TA, increases, the size of the transmissive region TA may decrease.

[0069] When multiple touch lines TL are set in the second non-transmissive area NTA2, the width of the second non-transmissive area NTA2 increases to accommodate a large number of lines, and the size of the transmissive area TA decreases. In other words, due to the multiple touch lines TL, the light transmittance of the transparent display panel 110 may decrease.

[0070] In a transparent display panel 110 according to one embodiment of the present disclosure, multiple touch lines TL are disposed in a first non-transmissive region NTA1, and only one touch bridge line TBL for connecting multiple touch sensors TS is disposed in a second non-transmissive region NTA2. Therefore, the transparent display panel 110 according to one embodiment of the present disclosure can reduce or minimize the reduction in the size of the transmissive region TA or the reduction in light transmittance caused by the multiple touch lines TL and the touch bridge line TBL.

[0071] A touch sensor TS can be disposed in a transmission area TA. The touch sensor TS can be disposed in each of multiple transmission areas TA and its capacitance can change during user contact. A touch driver (not shown) can be connected to multiple touch sensors TS via multiple touch lines TL to detect capacitance changes in the multiple touch sensors TS.

[0072] In the following text, reference will be made to Figure 4 and Figure 5 The connection relationships between multiple touch sensors TS, multiple touch lines TL, and multiple touch bridge lines TBL are described in more detail.

[0073] Figure 4 This is a view showing the connection relationships between multiple touch blocks and multiple touch lines. Figure 5 It is a view showing the connection relationships between multiple touch sensors and multiple touch lines in a touch block.

[0074] Reference Figures 4 to 5 According to one embodiment of the present disclosure, the transparent display panel 110 may include a plurality of touch blocks TB. Each of the plurality of touch blocks TB may include a plurality of pixels P and a plurality of transmissive regions TA arranged in a one-to-one correspondence with the plurality of pixels P, as a basic unit for determining the user touch position.

[0075] like Figure 5 As shown, a transparent display panel 110 according to one embodiment of this disclosure may include touch sensors TS in the transmissive region TA. For example, each of a plurality of touch blocks TB may include 12×15 pixels P and 12×15 touch sensors TS. In this case, when the image resolution is 1920×1080, the touch resolution may be 160×72.

[0076] In this case, the touch sensor TS may include a touch sensor electrode TSE. The touch sensor electrode TSE may be made of the same material as the cathode electrode CE of the pixel P in the same layer. In this case, the touch sensor electrode TSE and the cathode electrode CE may be arranged to be spaced apart from each other.

[0077] In a transparent display panel 110 according to one embodiment of the present disclosure, since each of the multiple touch lines TL is connected to one of the multiple touch blocks TB, changes in the capacitance of the touch sensor TS disposed in the connected touch block TB can be sensed. That is, the multiple touch lines TL disposed in the transparent display panel 110 can correspond one-to-one with the multiple touch blocks TB. Therefore, the number of touch lines TL can be the same as the number of touch blocks TB in the transparent display panel 110. For example, when the number of touch blocks TB is 160×72, the touch lines TL can also be 160×72, and can be connected to the touch driver TIC.

[0078] As described above, in order to form as many touch lines TL as there are touch blocks TB, at least two touch lines TL should be provided in a first non-transmissive area NTA1. For example, when the image resolution is 1920×1080 and the touch resolution is 160×72, six touch lines TL1, TL2, TL3, TL4, TL5, and TL6 can be provided in a first non-transmissive area NTA1, such as... Figure 3 As shown, this is to form 160×72 touch lines TL in the transparent display panel 110.

[0079] like Figure 5 As shown, multiple touch sensors TS disposed in a touch block TB can be connected to one of multiple touch lines TL disposed in the touch block TB. For example, twelve first non-transmissive regions NTA1 can be provided in a touch block TB, and six touch lines TL1, TL2, TL3, TL4, TL5, and TL6 can be disposed in each of the twelve first non-transmissive regions NTA1. As a result, a touch block TB can be provided with 72 touch lines TL1, ..., TL72. In this case, the multiple touch sensors TS disposed in a touch block TB can be connected to a specific touch line TL among the 72 touch lines TL1, ..., TL72. At this time, the specific touch line TL can be connected to the multiple touch sensors TS arranged in the second direction (X-axis direction) through a touch bridge line TBL extending in the second direction (X-axis direction). As a result, the multiple touch sensors TS disposed in a touch block TB can be electrically connected through the specific touch line TL and the touch bridge line TBL.

[0080] Each of the multiple touch lines TL corresponds one-to-one with a touch block TB. Each touch line TL connects multiple touch sensors TS, which are located in the corresponding touch block TB, to the touch driver TIC. Specifically, each touch line TL can transmit the changing capacitance provided by the touch sensors TS located in the touch block TB to the touch driver TIC. The touch driver TIC can sense the change in capacitance and determine the user's touch position. Furthermore, each touch line TL can provide the sensing voltage generated by the touch driver TIC to the touch sensors TS located in the touch block TB.

[0081] In the following text, reference will be made to Figures 6 to 11 The light-emitting element of the light-emitting area EA, the touch sensor TS of the transmission area TA, and the connection relationship between the touch sensor TS and the touch bridge line TBL are described in more detail.

[0082] Figure 6 It is along Figure 3 A cross-sectional view taken from line I-I'. Figure 7 This is a view showing an example of the arrangement of the cathode electrode and the touch sensor electrode, while Figure 8 This is a view showing an example of a touch sensor that is defective due to particles entering the first undercut structure.

[0083] Reference Figures 6 to 8The first non-transmissive region NTA1 may include circuit regions CA1, CA2, CA3, and CA4, in which at least one transistor and a capacitor are disposed, and pixel power lines VDD, common power lines VSS, reference lines REF, data lines DL, and touch lines TL extending along a first direction (Y-axis direction) and configured not to overlap with the circuit regions CA1, CA2, CA3, and CA4. The second non-transmissive region NTA2 may include scan lines SCANL and touch bridge lines TBL extending in a second direction (X-axis direction).

[0084] The at least one transistor may include a driving transistor (TFT), a switching transistor, and a sensing transistor.

[0085] The switching transistor is switched according to the scan signal provided to the scan line SCANL to charge the capacitor with the data voltage supplied from the data line DL. The sensing transistor is used to sense the threshold voltage deviation of the driving transistor TFT based on the sensing signal, which causes degradation of image quality.

[0086] The driving transistor TFT switches according to the data voltage charged in the capacitor to generate a data current based on the power supplied from the pixel power line VDD, and provides the data current to the first electrode 120 of sub-pixels SP1, SP2, SP3, and SP4. The driving transistor TFT may include an active layer ACT, a gate electrode GE, a source electrode SE, and a drain electrode DE.

[0087] In detail, such as Figure 6 As shown, a light-shielding layer LS can be provided above the first substrate 111. The light-shielding layer LS can shield external light incident on the active layer ACT in the region where the driving transistor TFT is disposed. The light-shielding layer LS may comprise a single layer or multiple layers made of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu) or alloys thereof.

[0088] According to one embodiment of the present disclosure, the transparent display panel 110 may form at least a portion of the pixel power line VDD, common power line VSS, reference line REF, data line DL, and touch line TL in the same layer as the light shielding layer LS. For example, the common power line VSS may include the same material as the light shielding layer LS in the same layer as the light shielding layer LS, but is not limited thereto.

[0089] In a transparent display panel 110 according to one embodiment of the present disclosure, the signal lines disposed on the same layer as the light shielding layer LS can vary according to the arrangement order of the pixel power line VDD, common power line VSS, reference line REF, data line DL, and touch line TL. However, in a transparent display panel 110 according to one embodiment of the present disclosure, two adjacent signal lines may not be disposed on the same layer as the light shielding layer LS. That is, one of the two adjacent signal lines may be disposed on the same layer as the light shielding layer LS, and the other of the two adjacent signal lines may be disposed on a different layer than the light shielding layer LS, for example, on the same layer as the gate electrode GE or the source electrode SE and drain electrode DE. Therefore, the transparent display panel 110 according to one embodiment of the present disclosure can ensure the gap distance between the signal lines.

[0090] A buffer layer BF can be provided above the optical shielding layer LS and the common power line VSS. The buffer layer BF is used to protect the transistor TFT from water penetration into the first substrate 111 which is susceptible to water penetration, and may include inorganic layers, such as silicon oxide layer (SiOx), silicon nitride layer (SiNx), or a multilayer of silicon oxide layer and silicon nitride layer.

[0091] An active layer ACT can be provided above the buffer layer BF. The active layer ACT may include silicon-based semiconductor materials or oxide-based semiconductor materials.

[0092] A gate insulating layer GI can be provided above the active layer ACT. The gate insulating layer GI can be disposed in the non-transmissive region NTA and the transmissive region TA. However, in order to form a first undercut structure UC1 in the transmissive region TA, the gate insulating layer GI can be provided with a first opening region OA1 exposing the buffer layer BF, instead of being disposed in at least a portion of the transmissive region TA. The gate insulating layer G1 can include inorganic layers, such as a silicon oxide layer (SiOx), a silicon nitride layer (SiNx), or a multilayer of silicon oxide and silicon nitride layers.

[0093] The gate electrode GE can be disposed on the gate insulating layer GI. The gate electrode GE may comprise a single layer or multiple layers made of one or an alloy of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu).

[0094] An interlayer dielectric layer (ILD) may be provided above the gate electrode GE. The ILD may be disposed in the non-transmissive region NTA and the transmissive region TA. However, the ILD may have a first opening region OA1 exposing the buffer layer BF, but not in at least a portion of the transmissive region TA, to form a first undercut structure UC1 in the transmissive region TA. The first opening region OA1 of the ILD may at least partially overlap with the first opening region OA1 of the gate insulating layer G1. The ILD may include inorganic layers, such as silicon oxide (SiOx), silicon nitride (SiNx), or a multilayer of silicon oxide and silicon nitride layers.

[0095] A source electrode SE and a drain electrode DE can be provided above the interlayer dielectric layer ILD. The source electrode SE and the drain electrode DE can be connected to the active layer ACT through a fifth contact hole CH5, which passes through the gate insulating layer GI and the interlayer dielectric layer ILD. The source electrode SE and the drain electrode DE can comprise a single layer or multiple layers made of one or an alloy of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd), and copper (Cu).

[0096] In a transparent display panel 110 according to one embodiment of the present disclosure, at least a portion of the pixel power line VDD, common power line VSS, reference line REF, data line DL, and touch line TL can be disposed in the same layer as the source electrode SE and the drain electrode DE. For example, a portion of the data line DL can be made of the same material as the source electrode SE and the drain electrode DE in the same layer as the source electrode SE and the drain electrode DE, but is not limited thereto.

[0097] A first passivation layer PAS1 for insulating the driving transistor TFT can be disposed above the source electrode SE and the drain electrode DE, and a second passivation layer PAS2 can be disposed above the first passivation layer PAS1.

[0098] The first and second passivation layers PAS1 and PAS2 can be disposed in the non-transmissive region NTA and the transmissive region TA. However, the first and second passivation layers PAS1 and PAS2 can be provided with a first opening region OA1 exposing the buffer layer BF, instead of being disposed in at least a portion of the transmissive region TA, to form a first undercut structure UC1 in the transmissive region TA. The first opening region OA1 of the first and second passivation layers PAS1 and PAS2 can at least partially overlap with the first opening region OA1 of the interlayer dielectric layer ILD and the first opening region OA1 of the gate insulating layer GI.

[0099] The first and second passivation layers PAS1 and PAS2 may include inorganic layers, such as silicon oxide layers (SiOx), silicon nitride layers (SiNx), or a multilayer of silicon oxide layers and silicon nitride layers.

[0100] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, at least a portion of the pixel power line VDD, common power line VSS, reference line REF, data line DL, and touch line TL can be disposed between the first passivation layer PAS1 and the second passivation layer PAS2. For example, some of the multiple touch lines TL, TL5 and TL6, can be disposed between the first passivation layer PAS1 and the second passivation layer PAS2, but are not limited thereto.

[0101] A planarization layer PLN can be provided above the second passivation layer PAS2 to planarize the step difference caused by the driving transistor TFT and multiple signal lines. The planarization layer PLN can be disposed in the non-transmissive region NTA, and can be disposed outside at least a portion of the transmissive region TA to form a first undercut structure UC1 in the transmissive region TA.

[0102] The planarization layer PLN may include an organic layer, such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin.

[0103] In a transparent display panel 110 according to one embodiment of the present disclosure, a first undercut structure UC1 can be formed using a planarization layer PLN and a plurality of inorganic insulating layers (e.g., first and second passivation layers PAS1 and PAS2, interlayer dielectric layer ILD, and gate insulating layer GI). Specifically, the first undercut structure UC1 can be formed such that the planarization layer PLN protrudes more than the plurality of inorganic insulating layers (e.g., first and second passivation layers PAS1 and PAS2, interlayer dielectric layer ILD, and gate insulating layer GI) in the direction of the transmission region TA. Therefore, the first undercut structure UC1 can expose at least a portion of the lower surface of the planarization layer PLN, and the plurality of inorganic insulating layers may not be disposed below the exposed lower surface, thereby forming a gap space with the buffer layer BF.

[0104] The first undercut structure UC1 can be formed by a wet etching process. The wet etching process used to form the first undercut structure UC1 can be isotropic etching. Therefore, in the first undercut structure UC1, the first spacing distance d1 from the end of the planarization layer PLN to the ends of the plurality of inorganic insulating layers can be the same as the second spacing distance d2 from the lower surface of the planarization layer PLN to the upper surface of the buffer layer BF. In this case, the first spacing distance d1 of the first undercut structure UC1 should have a minimum distance value, for example, 2 μm or greater, to ensure the separation of the cathode electrode CE and the touch sensor electrode TSE. Therefore, since the second spacing distance d2 of the first undercut structure UC1 should be greater than or equal to 2 μm, the sum of the thicknesses of the first and second passivation layers PAS1 and PAS2, the interlayer dielectric layer ILD, and the gate insulating layer GI can be greater than or equal to 2 μm.

[0105] The first undercut structure UC1 can be disposed within the transmission region TA and can have a planar closed shape. For example, the first undercut structure UC1 can be disposed along the edge of the transmission region TA, such as... Figure 7 As shown, a first undercut structure UC1 can be provided to surround the touch sensor TS.

[0106] In a transparent display panel 110 according to one embodiment of the present disclosure, a first undercut structure UC1 can be formed using a planarization layer PLN and a plurality of inorganic insulating layers, thereby preventing the light transmittance from decreasing due to the first undercut structure UC1.

[0107] The first undercut structure UC1 can be formed using a separate metal pattern that protrudes further into the transmission region TA than multiple inorganic insulating layers. The metal pattern can comprise the same material as the first electrode 120 in the same layer as the first electrode 120, and can be spaced apart from the first electrode 120. In this case, since the metal pattern is made of an opaque metallic material, the area providing the metal pattern cannot be the transmission region TA, but can be the non-transmission region NTA. That is, the first undercut structure UC1 is not preferred because it reduces light transmittance.

[0108] A light-emitting element including a first electrode 120, an organic light-emitting layer 130, and a second electrode 140, as well as a dam 125, can be provided above the planarization layer PLN.

[0109] A first electrode 120 can be provided above the planarization layer PLN for each sub-pixel SP1, SP2, SP3, and SP4. The first electrode 120 is not provided in the transmission region TA.

[0110] The first electrode 120 can be connected to the driving transistor TFT. Specifically, the first electrode 120 can be connected to one of the source electrode SE and drain electrode DE of the driving transistor TFT through contact holes (not shown) penetrating the planarization layer PLN and the first and second passivation layers PAS1 and PAS2.

[0111] The first electrode 120 may include a metallic material with high reflectivity, such as a stacked structure of aluminum and titanium (Ti / Al / Ti), a stacked structure of aluminum and ITO (ITO / Al / ITO), an Ag alloy, a stacked structure of Ag alloy and ITO (ITO / Ag alloy / ITO), a MoTi alloy, and a stacked structure of MoTi alloy and ITO (ITO / MoTi alloy / ITO). The Ag alloy may be an alloy of silver (Ag), palladium (Pd), copper (Cu), etc. The MoTi alloy may be an alloy of molybdenum (Mo) and titanium (Ti). The first electrode 120 may be an anode electrode.

[0112] A dam 125 can be provided above the planarization layer PLN. The dam 125 can be configured to at least partially cover the edge of the first electrode 120 and expose a portion of the first electrode 120. Therefore, the dam 125 can prevent the problem of luminous efficiency degradation due to current concentration at the end of the first electrode 120.

[0113] The dam 125 can define the light-emitting regions EA1, EA2, EA3, and EA4 of sub-pixels SP1, SP2, SP3, and SP4. The light-emitting regions EA1, EA2, EA3, and EA4 of each sub-pixel SP1, SP2, SP3, and SP4 represent areas where the first electrode 120, the organic light-emitting layer 130, and the cathode electrode CE are stacked sequentially, and holes from the first electrode 120 and electrons from the cathode electrode CE combine with each other in the organic light-emitting layer 130 to emit light. In this case, the area where the dam 125 is provided can become a non-light-emitting region NEA because light is not emitted from it, and the area where the dam 125 is not provided and the first electrode is exposed can become a light-emitting region EA.

[0114] The embankment 125 may include an organic layer, such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin.

[0115] An organic light-emitting layer 130 may be disposed above the first electrode 120. The organic light-emitting layer 130 may include a hole transport layer, a light-emitting layer, and an electron transport layer. In this case, when a voltage is applied to the first electrode 120 and the cathode electrode CE, holes and electrons move to the light-emitting layer through the hole transport layer and the electron transport layer, respectively, and combine with each other in the light-emitting layer to emit light.

[0116] In one embodiment, the organic light-emitting layer 130 may be a common layer disposed in sub-pixels SP1, SP2, SP3, and SP4. In this case, the light-emitting layer may be a white light emitting layer for emitting white light.

[0117] In another embodiment, an organic light-emitting layer 130 can be provided for each sub-pixel SP1, SP2, SP3, and SP4. For example, a green light-emitting layer for emitting green light can be provided in the first sub-pixel SP1, a red light-emitting layer for emitting red light can be provided in the second sub-pixel SP2, a blue light-emitting layer for emitting blue light can be provided in the third sub-pixel SP3, and a white light-emitting layer for emitting white light can be provided in the fourth sub-pixel SP4. In this case, the light-emitting layer of the organic light-emitting layer 130 is not disposed in the transmissive region TA.

[0118] The organic light-emitting layer 130 can be separated and discontinuous between the non-transmissive region NTA and the transmissive region TA by the first undercut structure UC1. Specifically, the organic light-emitting layer 131 of the organic light-emitting layer 130 disposed in the non-transmissive region NTA and the organic light-emitting layer 132 of the organic light-emitting layer 130 disposed in the transmissive region TA can be separated from each other by the first undercut structure UC1. That is, the organic light-emitting layer 131 of the organic light-emitting layer 130 disposed in the non-transmissive region NTA and the organic light-emitting layer 132 of the organic light-emitting layer 130 disposed in the transmissive region TA can be separated from each other by the first undercut structure UC1.

[0119] The second electrode 140 can be disposed above the organic light-emitting layer 130 and the embankment 125. When the second electrode 140 is deposited over the entire surface, the second electrode 140 can be separated and discontinuous between the non-transmissive region NTA and the transmissive region TA by the first undercut structure UC1. Specifically, the second electrode 140 can be divided by the first undercut structure UC1 into a second electrode CE disposed in the non-transmissive region NTA and a second electrode TSE disposed in the transmissive region TA.

[0120] The second electrode CE disposed in the non-transmissive region NTA can be a cathode electrode CE, and can be a component constituting the light-emitting element. The cathode electrode CE can be connected to the cathode contact portion CCT exposed by the second undercut structure UC2 to receive power from the common power line VSS. The cathode electrode CE can be a common layer disposed together in sub-pixels SP1, SP2, SP3, and SP4 to apply the same voltage to the sub-pixels.

[0121] The second electrode TSE disposed in the transmission region TA can be a touch sensor electrode TSE, and can be a component constituting the touch sensor TS. The touch sensor electrode TSE can be connected to the touch contact electrode TCT exposed by the second undercut structure UC2 to provide capacitance changes to the touch line TL.

[0122] The second electrode 140, which includes the cathode electrode CE and the touch sensor electrode TSE, may comprise a transparent conductive material (TCO) that transmits light, such as ITO and IZO, or a semi-transmissive conductive material, such as magnesium (Mg), silver (Ag), or an alloy of magnesium (Mg) and silver (Ag). When the second electrode 140 comprises a semi-transmissive conductive material, the luminous efficiency can be improved through a microcavity.

[0123] An encapsulation layer 150 may be provided above the light-emitting element and the touch sensor TS. The encapsulation layer 150 may be disposed above the cathode electrode CE and the touch sensor electrode TSE to at least partially cover the cathode electrode CE and the touch sensor electrode TSE.

[0124] The encapsulation layer 150 is used to prevent oxygen or water from penetrating into the organic light-emitting layer 130, the cathode electrode CE, and the touch sensor electrode TSE. For this purpose, the encapsulation layer 150 may include at least one inorganic layer and at least one organic layer.

[0125] In addition, although Figure 6 and Figure 8 It is not shown in the figure, but an additional cover layer may be provided between the second electrode 140 and the encapsulation layer 150.

[0126] A color filter CF can be provided above the encapsulation layer 150. The color filter CF can be disposed above a surface of the second substrate 112 facing the first substrate 111. In this case, the first substrate 111 with the encapsulation layer 150 and the second substrate 112 with the color filter CF can be bonded to each other by an adhesive layer 160. Here, the adhesive layer 160 can be an optically transparent resin (OCR) layer or an optically transparent adhesive (OCA) film.

[0127] A patterned color filter CF can be provided for each sub-pixel SP1, SP2, SP3, and SP4. Specifically, the color filter CF can include a first color filter, a second color filter, and a third color filter. The first color filter can be configured to correspond to the light-emitting area EA1 of the first sub-pixel SP1, and can be a green color filter that transmits green light. The second color filter can be configured to correspond to the light-emitting area EA2 of the second sub-pixel SP2, and can be a red color filter that transmits red light. The third color filter can be configured to correspond to the light-emitting area EA3 of the third sub-pixel SP3, and can be a blue color filter that transmits blue light.

[0128] A black matrix (BM) can be placed between color filters (CF). The black matrix (BM) can also be placed between sub-pixels SP1, SP2, SP3, and SP4 to prevent color mixing between adjacent sub-pixels SP1, SP2, SP3, and SP4. Additionally, the black matrix (BM) prevents externally incident light from being reflected by the multiple lines positioned between sub-pixels SP1, SP2, SP3, and SP4.

[0129] In a transparent display panel 110 according to one embodiment of the present disclosure, the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element can be formed in the same layer through a first undercut structure UC1. The transparent display panel 110 according to one embodiment of the present disclosure has a simple touch process and does not require a separate mask for the touch sensor electrode TSE.

[0130] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, a first undercut structure UC1 can be formed using a planarization layer PLN and a plurality of inorganic insulating layers without loss of light transmittance.

[0131] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, a touch line TL can be disposed below the light-emitting element, thereby preventing the light-emitting efficiency of pixel P from being degraded due to the touch line TL.

[0132] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, the touch line TL can be arranged so as not to overlap with the circuit regions CA1, CA2, CA3 and CA4, thereby reducing or minimizing the influence caused by the circuit elements and improving the uniformity of parasitic capacitance.

[0133] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, multiple touch lines TL can be disposed in a first non-transmissive region NTA1, and only one touch bridge line TBL for connecting multiple touch sensors TS can be disposed in a second non-transmissive region NTA2, thereby reducing or minimizing the reduction in size or light transmittance of the transmissive region TA caused by the multiple touch lines TL and the touch bridge line TBL.

[0134] As described above, in a transparent display panel 110 according to one embodiment of the present disclosure, the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element can be separated from each other through a first undercut structure UC1. However, during the manufacturing process, particles P may appear as follows: Figure 8 In the first undercut structure UC1 shown, the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element can be electrically connected to each other without being separated.

[0135] Because all touch sensors TS included in a single touch block TB are electrically connected to each other, even if a defect occurs only in one touch sensor TS, all touch sensor TS included in the corresponding touch block TB will not function properly. Therefore, as Figure 8 As shown, when the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element are connected to each other to create a defective touch sensor TS, the touch block TB, including the defective touch sensor TS, cannot sense the user's touch.

[0136] In a transparent display panel 110 according to one embodiment of the present disclosure, a defective touch sensor TS can be detected when it is generated. In the transparent display panel 110 according to one embodiment of the present disclosure, the detected defective touch sensor TS and touch bridge line TBL can be electrically separated from each other through a repair process. Specifically, in the transparent display panel 110 according to one embodiment of the present disclosure, the defective touch sensor TS and touch bridge line TBL can be electrically separated from each other by cutting the touch connection portion TC that connects the defective touch sensor TS and touch bridge line TBL via laser cutting. As a result, the other touch sensors TS of the corresponding touch block TB can operate normally.

[0137] In the following text, reference will be made to Figures 9 to 11 The laser cutting of the touch connection portion TC, which connects the touch sensor TS to the touch bridge line TBL, is described in detail.

[0138] Figure 9 It is shown Figure 3 A magnified view of region C. Figure 10 It is along Figure 9 A cross-sectional view taken from line II-II'. Figure 11 This is a view showing an example of cutting a high-resistance wire with a laser when a defective touch sensor is detected.

[0139] Reference Figures 9 to 11 Each of the multiple touch sensors TS can be connected to the touch bridge line TBL via the touch connection section TC.

[0140] At least a portion of each of the plurality of touch connection portions TC may overlap with a touch sensor TS at one end and with a touch bridge line TBL at the other end to connect the touch sensor TS to the touch bridge line TBL. The touch connection portion TC may include a high-resistance line HRL, a first connection electrode CE1, a touch connection line TCL, a second connection electrode CE2, and a touch contact electrode TCT.

[0141] A high-resistance line HRL can be positioned between the first undercut structure UC1 and the touch bridge line TBL. One end of the high-resistance line HRL can be connected to the touch bridge line TBL through the sixth contact hole CH6, and the other end can be connected to the first connection electrode CE1 through the seventh contact hole CH7. Figure 9 and Figure 10 In this embodiment, the high-resistance line HRL is shown connected to the touch connection line TCL via the first connection electrode CE1, but is not limited thereto. In another embodiment, the high-resistance line HRL can be directly connected to the touch connection line TCL via the seventh contact hole CH7.

[0142] The high-resistance line HRL may include a high-resistance region for detecting defective touch sensors TS. A transparent display panel 110 according to one embodiment of this disclosure can detect defective touch sensors by using the high-resistance region.

[0143] In detail, in the case of a defective touch sensor TS, the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element can be electrically connected to each other as described above. Therefore, when different voltages are applied to the touch line TL and the common power line VSS respectively, in the case of a defective touch sensor TS, current flows from the touch sensor electrode TSE to the cathode electrode CE. At this time, when a high-resistance region is provided in the current path, the voltage of the defective touch sensor TS decreases. On the other hand, in the case of a normal touch sensor TS, since no current flows to the touch sensor electrode TSE, the voltage applied from the touch line TL can be maintained.

[0144] In a transparent display panel 110 according to one embodiment of the present disclosure, different voltages can be applied to the touch line TL and the common power line VSS, respectively. The voltage of the touch sensor TS can be measured, and a defective touch sensor TS can be detected based on the voltage difference between the touch sensors TS. That is, in order to generate a voltage difference between the defective touch sensor TS and the normal touch sensor TS, a high-resistance region should be provided.

[0145] To achieve a high-resistance region, the high-resistance line (HRL) can be made of a silicon-based semiconductor material or an oxide-based semiconductor material with high resistance. For example, the high-resistance line (HRL) can include the same material as the active layer (ACT) of the driving transistor TFT in the same layer.

[0146] The first connection electrode CE1 can electrically connect the high-resistance line HRL to the touch connection line TCL. The first connection electrode CE1 can be connected to the high-resistance line HRL at one end through the seventh contact hole CH7, and can be connected to the touch connection line TCL at the other end through the eighth contact hole CH8.

[0147] The first connection electrode CE1 can be disposed in a layer between the high-resistance line HRL and the touch connection line TCL. In one embodiment, the first connection electrode CE1 can be disposed in the same layer as the source electrode SE and drain electrode DE of the driving transistor TFT.

[0148] The touch connection cable (TCL) can be positioned between the high-resistance line (HRL) and the touch contact electrode (TCT) to electrically connect the high-resistance line (HRL) and the touch contact electrode (TCT). One end of the touch connection cable (TCL) can be connected to the first connection electrode (CE1) through the eighth contact hole (CH8), and can also be electrically connected to the high-resistance line (HRL) through the first connection electrode (CE1), but the touch connection cable (TCL) is not limited to this. The touch connection cable (TCL) can be directly connected to the high-resistance line (HRL). The other end of the touch connection cable (TCL) can be connected to the second connection electrode (CE2) through the ninth contact hole (CH9), and can also be electrically connected to the touch contact electrode (TCT) through the second connection electrode (CE2), but the touch connection cable (TCL) is not limited to this. The touch connection cable (TCL) can also be directly connected to the touch contact electrode (TCT).

[0149] Touch connection lines (TCLs) can be formed in a layer disposed between the first substrate 111 and the driving transistor TFT. In one embodiment, the touch connection lines (TCLs) can be in the same layer as the light shielding layer LS, comprising the same material as the light shielding layer LS. The touch connection lines (TCLs) can extend across the first undercut structure UC1. The first undercut structure UC1 can be formed by a wet etching process. In a transparent display panel 110 according to one embodiment of the present disclosure, the touch connection lines (TCLs) can be formed in the same layer as the light shielding layer LS, thereby preventing the loss of the touch connection lines (TCLs) during the wet etching process used to form the first undercut structure UC1.

[0150] The second connecting electrode CE2 can electrically connect the touch connection line TCL to the touch contact electrode TCT. The second connecting electrode CE2 can be connected to the touch connection line TCL at one end through the ninth contact hole CH9, and can be connected to the touch contact electrode TCT at the other end through the tenth contact hole CH10.

[0151] The second connection electrode CE2 can be disposed in the layer between the touch connection line TCL and the touch contact electrode TCT. In one embodiment, the second connection electrode CE2 can be disposed in the same layer as the source electrode SE and drain electrode DE of the driving transistor TFT.

[0152] A touch contact electrode TCT can be provided in the transmission region TA. The touch contact electrode TCT can be positioned between the touch connection line CL and the touch sensor electrode TSE to electrically connect the touch connection line CL to the touch sensor electrode TSE. The touch contact electrode TCT can be connected to the second connection electrode CE2 through the tenth contact hole CH10, and can be electrically connected to the touch connection line TCL through the second connection electrode CE2, but the touch contact electrode TCT is not limited to this. The touch contact electrode TCT can also be directly connected to the touch connection line TCL.

[0153] Furthermore, at least a portion of the upper surface of the touch contact electrode TCT can be exposed through the second undercut structure UC2, and the touch sensor electrode TSE can be connected to the exposed upper surface. According to one embodiment of this disclosure, the transparent display panel 110 can form the second undercut structure UC2 using a planarization layer PLN and a second passivation layer PAS2.

[0154] Specifically, the touch contact electrode TCT can be formed in a layer disposed between the buffer layer BF and the second passivation layer PAS2. In one embodiment, the touch contact electrode TCT can be disposed between the first passivation layer PAS1 and the second passivation layer PAS2. In this case, the second passivation layer PAS2 can be provided with a second opening region OA2 that exposes at least a portion of the upper surface of the touch contact electrode TCT. The second undercut structure UC2 can be formed such that the planarization layer PLN protrudes more than the second passivation layer PAS2 in the second opening region OA2 of the second passivation layer PAS2. Therefore, the second undercut structure UC2 can expose at least a portion of the lower surface of the planarization layer PLN and at least a portion of the upper surface of the touch contact electrode TCT without the second passivation layer PAS2 being located below the exposed lower surface.

[0155] The second undercut structure UC2 can be set in the area where the first undercut structure UC1 is set. Specifically, the second undercut structure UC2 can be set in the touch sensor TS.

[0156] In a transparent display panel 110 according to one embodiment of the present disclosure, a touch sensor electrode TSE can be connected to a touch contact electrode TCT via a second undercut structure UC2. Specifically, at least a portion of the upper surface of the touch contact electrode TCT can be exposed via the second undercut structure UC2. The touch sensor electrode TSE can be deposited on the exposed upper surface of the touch contact electrode TCT and thus connected to the touch contact electrode TCT. The touch contact electrode TCT can transmit the capacitance change of the touch sensor electrode TSE to the touch line TL via a touch connection line TCL, a high-resistance line HRL, and a touch bridge line TBL.

[0157] In a transparent display panel 110 according to one embodiment of the present disclosure, such as Figure 11 As shown, the touch sensor electrode TSE of the touch sensor TS and the cathode electrode CE of the light-emitting element can be electrically connected to each other via particles P. In a transparent display panel 110 according to one embodiment of the present disclosure, when a defective touch sensor TS is detected, the touch connection portion TC used to connect the defective touch sensor TS to the touch bridge line TBL can be laser-cut, so that the defective touch sensor TS and the touch bridge line TBL can be electrically separated from each other. As a result, the other touch sensors TS of the corresponding touch block TB can operate normally.

[0158] In a transparent display panel 110 according to one embodiment of the present disclosure, a high-resistance line HRL can be cut from the touch connection portion TC using a laser, such as... Figure 11 As shown. The high-resistance line HRL can be made of silicon-based semiconductor materials or oxide-based semiconductor materials. During laser irradiation, silicon-based semiconductor materials or oxide-based semiconductor materials may heat up more than metal materials such as Cu, thus generating high heat. Therefore, silicon-based semiconductor materials or oxide-based semiconductor materials can be cut better than other metal materials. That is, in the transparent display panel 110 according to one embodiment of the present disclosure, the high-resistance line HRL made of silicon-based semiconductor materials or oxide-based semiconductor materials can undergo laser cutting to reliably ensure electrical insulation between the defective touch sensor TS and the touch bridge line TBL.

[0159] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, a high-resistance line HRL disposed in the same layer as the active layer ACT of the driving transistor TFT can be laser-cut, thereby allowing repair to be performed without damaging the light-emitting element disposed above the high-resistance line HRL.

[0160] Furthermore, the transparent display panel 110 according to one embodiment of the present disclosure may also include a metal pattern M configured to overlap at least a portion of a high-resistance line HRL. Since the high-resistance line HRL is made of a transparent silicon-based semiconductor material or an oxide-based semiconductor material, it is difficult to identify the precise location of the high-resistance line HRL in the transparent display panel 110. Therefore, in the transparent display panel 110 according to one embodiment of the present disclosure, a metal pattern M can be provided to overlap at least a portion of the high-resistance line HRL, particularly a laser-cut line. In the transparent display panel 110 according to one embodiment of the present disclosure, the metal pattern M comprises an opaque metal, making it easy to detect the area to be laser-irradiated during the repair process.

[0161] In a transparent display panel 110 according to one embodiment of the present disclosure, a metal pattern M may be provided above the high-resistance line HRL. In the transparent display panel 110 according to one embodiment of the present disclosure, a laser may be irradiated onto the lower surface of the first substrate 111 to cut the high-resistance line HRL. At this time, the transparent display panel 110 according to one embodiment of the present disclosure can prevent energy loss and laser reflection through the metal pattern M provided above the high-resistance line HRL. Therefore, the transparent display panel 110 according to one embodiment of the present disclosure can ensure the stability of the repair process.

[0162] Furthermore, in a transparent display panel 110 according to one embodiment of the present disclosure, a metal pattern M may be disposed between a first passivation layer PAS1 and a second passivation layer PAS2. The metal pattern M is not electrically connected to the high-resistance line HRL and may be an electrically floating metal pattern. When the metal pattern M is electrically connected to the high-resistance line HRL, the resistance of the high-resistance line HRL may decrease, thus potentially preventing the attainment of high resistance. Therefore, the metal pattern M may be insulated from the high-resistance line HRL.

[0163] In a transparent display panel 110 according to one embodiment of the present disclosure, particles may appear between the metal pattern M and the high-resistance line HRL during the manufacturing process. When the distance between the metal pattern M and the high-resistance line HRL is insufficient, the metal pattern M and the high-resistance line HRL may short-circuit in the area where the particles appear.

[0164] In a transparent display panel 110 according to one embodiment of the present disclosure, a metal pattern M may be provided between a first passivation layer PAS1 and a second passivation layer PAS2 to ensure sufficient distance between the metal pattern M and the high resistance line HRL, and to prevent short circuits between the metal pattern M and the high resistance line HRL even if particles appear between the metal pattern M and the high resistance line HRL.

[0165] The following advantages can be obtained according to this disclosure.

[0166] In this disclosure, the touch sensor electrode of the touch sensor and the cathode electrode of the light-emitting element are formed simultaneously using a first undercut structure, thereby simplifying the touch process and eliminating the need for a separate mask for the touch sensor electrode.

[0167] Furthermore, in this disclosure, a high-resistance wire is provided in the touch connection portion for connecting the touch sensor to the touch bridge wire, so that defective touch sensors can be detected in the block.

[0168] Furthermore, in this disclosure, when a defective touch sensor is detected, a repair process can be performed on the high-resistivity wires made of silicon-based semiconductor materials or oxide-based semiconductor materials by laser cutting. This disclosure facilitates laser cutting without damaging the light-emitting element.

[0169] Furthermore, in this disclosure, a metal pattern made of opaque metal is set on a high-resistance line, thereby facilitating the detection of the area to be irradiated by laser. Additionally, this disclosure improves the stability of the restoration process by preventing energy loss and laser reflection through the metal pattern during laser irradiation.

[0170] Furthermore, in this disclosure, a metal pattern can be provided between the first passivation layer and the second passivation layer to ensure sufficient distance between the metal pattern and the high-resistance line, and to prevent short circuits between the metal pattern and the high-resistance line even if particles are present between them.

[0171] Furthermore, in this disclosure, the touch connection lines passing through the first undercut structure can be formed in the same layer as the light shielding layer, thereby preventing the touch connection lines from being lost during the wet etching process used to form the first undercut structure.

[0172] It will be apparent to those skilled in the art that this disclosure is not limited to the embodiments and drawings described above, and that various substitutions, modifications, and variations may be made in this disclosure without departing from its spirit or scope. Therefore, the scope of this disclosure is defined by the appended claims, and all variations or modifications derived from the meaning, scope, and equivalent concepts of the claims are intended to fall within the scope of this disclosure.

Claims

1. A transparent display device, the transparent display device comprising: A substrate having a plurality of transmissive regions and non-transmissive regions disposed between adjacent transmissive regions, the non-transmissive regions comprising a plurality of light-emitting regions; Multiple touch sensors are respectively disposed in the multiple transmissive regions above the substrate and include touch sensor electrodes; Multiple touch lines are disposed in the non-transmissive region above the substrate and extend along a first direction; Multiple touch bridge lines are disposed in the non-transmissive region above the substrate and extend along a second direction to be electrically connected to one of the multiple touch lines; Multiple touch connection portions, wherein the multiple touch connection portions electrically connect the multiple touch bridge lines to the multiple touch sensors and include high resistance lines; as well as A metallic pattern, wherein the metallic pattern is disposed above the high-resistance line and has at least a portion overlapping the high-resistance line. The metal pattern is electrically levitated.

2. The transparent display device according to claim 1, wherein, The high-resistance wire is made of silicon-based semiconductor material or oxide-based semiconductor material.

3. The transparent display device according to claim 1, further comprising a plurality of light-emitting elements respectively disposed in the plurality of light-emitting regions above the substrate, wherein the plurality of light-emitting elements include an anode electrode, a light-emitting layer, and a cathode electrode. in, The cathode electrode constituting the light-emitting element is disposed in the same layer as the touch sensor electrode constituting the touch sensor.

4. The transparent display device according to claim 3, further comprising a first undercut structure disposed along the edge of the transmissive region. in, The cathode electrode and the touch sensor electrode are separated from each other by the first undercut structure.

5. The transparent display device according to claim 4, further comprising: Multiple inorganic insulating layers are disposed in the non-transmissive region above the substrate and are made of inorganic material; as well as A planarization layer, disposed above the plurality of inorganic insulating layers in the non-transmissive region and made of an organic material, The first undercut structure is configured such that the planarization layer protrudes more than the plurality of inorganic insulating layers in the direction of the transmission region.

6. The transparent display device according to claim 4, wherein, Each of the plurality of touch connection portions includes: Touch contact electrodes disposed in the transmission region; and A touch connection line, one end of which is electrically connected to the touch contact electrode, the touch connection line extending through the first undercut structure.

7. The transparent display device according to claim 6, further comprising: A driving transistor disposed between the substrate and the anode electrode; as well as A light-shielding layer is disposed between the substrate and the driving transistor. The touch connection line is located in the same layer as the light shielding layer.

8. The transparent display device according to claim 6, wherein, The high-resistance wire, the touch connection wire, and the touch contact electrode are disposed in different layers, and Each of the plurality of touch connection portions further includes: A first connecting electrode, wherein one end of the first connecting electrode is electrically connected to the high-resistance line through a first contact hole, and the other end is electrically connected to the touch connecting line through a second contact hole; and The second connecting electrode is electrically connected to the touch connecting line at one end through a third contact hole, and electrically connected to the touch contact electrode at the other end through a fourth contact hole.

9. The transparent display device according to claim 1, wherein, The high-resistance wire is laser-cut and electrically connected to the touch connection portion of the defective touch sensor.

10. A transparent display device, the transparent display device comprising: A substrate having a plurality of transmissive regions and non-transmissive regions disposed between adjacent transmissive regions, the non-transmissive regions comprising a plurality of light-emitting regions; Multiple light-emitting elements are respectively disposed in the multiple light-emitting regions above the substrate and include an anode electrode, a light-emitting layer and a cathode electrode; A plurality of driving transistors are electrically connected to the anode electrode of each of the light-emitting elements and include an active layer, a gate electrode, a source electrode and a drain electrode; Multiple touch sensors are respectively disposed in the multiple transmissive regions above the substrate and include touch sensor electrodes disposed in the same layer as the cathode electrode; Multiple touch bridge lines are provided in the non-transmissive area; Multiple touch connection portions electrically connect the multiple touch bridge lines to the multiple touch sensors. The multiple touch connection portions include touch contact electrodes disposed in the transmission region, touch connection lines formed in a layer disposed between the substrate and the driving transistor, and high resistance lines disposed between the touch connection lines and the touch bridge lines. as well as A metallic pattern, wherein the metallic pattern is disposed above the high-resistance line and has at least a portion overlapping the high-resistance line. The metal pattern is electrically levitated.

11. The transparent display device according to claim 10, further comprising a light shielding layer disposed between the substrate and the driving transistor. in, The touch connection line is located in the same layer as the light shielding layer.

12. The transparent display device according to claim 10, further comprising a first undercut structure disposed in the transmissive region, the first undercut structure having a planar closed shape. in, The cathode electrode and the touch sensor electrode are separated from each other by the first undercut structure.

13. The transparent display device according to claim 12, wherein, The touch connection line has one end electrically connected to the touch contact electrode and extends through the first undercut structure.

14. The transparent display device according to claim 10, wherein, The high-resistance line is made of the same material as the active layer of the driving transistor.

15. The transparent display device according to claim 14, wherein, The metal pattern is formed in a layer disposed between the driving transistor and the anode electrode.

16. The transparent display device according to claim 14, wherein, The touch connection portion of the faulty touch sensor is cut by laser in the area of ​​the high-resistance wire that overlaps with the metal pattern.

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