一种基于双光子聚合3D打印的微纳米结构加工方法

By using low surface tension solvents and in-situ UV curing, the problem of fragile structure collapse in two-photon polymerization 3D printing has been solved, achieving higher printing accuracy and efficiency and broadening application scenarios.

CN116277936BActive Publication Date: 2026-07-17WESTLAKE UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
WESTLAKE UNIV
Filing Date
2021-12-02
Publication Date
2026-07-17

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Abstract

本发明公开了一种基于双光子聚合3D打印的微纳米结构加工方法，包括涂胶、双光子激光曝光、显影以及清洗步骤，在清洗步骤中：将显影后的微纳米结构置于低表面张力溶剂中，同时进行紫外光原位固化。本发明解决了镂空、易碎结构在显影、清洗过程中的坍塌问题，拓宽了双光子聚合3D打印的可加工范围；在相同激光功率参数下，保证打印结构质量的前提下大幅提高双光子聚合3D打印的速度，提高加工效率；在相同打印速度下，保证结构打印质量的前提下降低激光功率阈值，减少在打印过程中由于激光能量局域导致过热而产生的气泡，提高打印良率。
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