A shell processing method, a shell, and an electronic device

Abstract

The present disclosure provides a shell processing method, a shell and an electronic device, and relates to the technical field of electronic devices. The method mainly comprises: forming a first film layer with a first pore structure on a substrate to be processed; performing a first treatment on the first film layer to adjust the first pore structure of the first film layer to obtain a second film layer with a second pore structure, the second pore structure being different from the first pore structure; and performing a first dyeing operation based on the second film layer to obtain a target shell.

Description

Technical Field

[0001] This disclosure relates to a housing processing method, a housing, and an electronic device. Background Technology

[0002] Currently, the casings of electronic devices such as laptops can generally only achieve a uniform appearance across the entire surface. However, with the development of various electronic devices, a uniform casing appearance can no longer meet the personalized needs of consumers. Summary of the Invention

[0003] This disclosure provides a shell processing method, apparatus, device, and storage medium to at least solve the above-mentioned technical problems existing in the prior art.

[0004] According to a first aspect of this disclosure, a shell processing method is provided, the method comprising: forming a first film layer having a first pore structure on a substrate to be processed; performing a first processing on the first film layer to adjust the first pore structure of the first film layer to obtain a second film layer having a second pore structure, the second pore structure being different from the first pore structure; and performing a first dyeing operation based on the second film layer to obtain a target shell.

[0005] In one embodiment, after obtaining the second film layer having the second pore structure, the method further includes: forming a third film layer based on a substrate having the second film layer; correspondingly, the first dyeing operation includes: performing the first dyeing operation based on the substrate forming the third film layer.

[0006] In one embodiment, after forming a first film layer having a first pore structure on the substrate to be treated, the method further includes: performing a second dyeing operation based on the first film layer; performing a first sealing operation based on the first film layer after the second dyeing operation; correspondingly, the first treatment of the first film layer includes: performing the first treatment based on the first film layer after the first sealing operation.

[0007] In one embodiment, after performing the first dyeing operation to obtain the target shell, the method further includes performing a second sealing operation on the target shell, wherein the sealing time of the second sealing operation is longer than the sealing time of the first sealing operation.

[0008] In one embodiment, the first treatment is sandblasting; after obtaining the second membrane layer with the second pore structure, the method further includes: performing a cleaning operation based on the second membrane layer; correspondingly, the first dyeing operation based on the second membrane layer includes: performing a first dyeing operation based on the cleaned second membrane layer.

[0009] In one possible embodiment, the substrate to be processed is obtained by: contouring an initial substrate; and surface cleaning the contoured substrate to obtain the substrate to be processed.

[0010] According to a second aspect of this disclosure, a housing is provided, the housing comprising a substrate, on which a second film layer having a second pore structure is formed, the second film layer having the second pore structure being obtained by performing a first treatment on a first film layer having a first pore structure formed on the substrate, the first treatment being used to adjust the first pore structure of the first film layer to the second pore structure, the second pore structure being different from the first pore structure; a first dye layer is formed on the second film layer, the first dye layer being used to fill the second pore structure of the second film layer.

[0011] In one embodiment, a third film layer is formed between the second film layer and the first dyeing layer, the third film layer being used to cover the bottom and sidewalls of the second pore structure of the second film layer, and correspondingly, the first dyeing layer being used to fill the pores of the third film layer.

[0012] In one embodiment, the second membrane layer is composed of a first membrane layer, a second dyeing layer and a first sealing layer formed sequentially, and the first processing is used to adjust the first pore structure of the second membrane layer composed of the first membrane layer, the second dyeing layer and the first sealing layer to the second pore structure.

[0013] In one embodiment, a second sealing layer is formed on the first dyeing layer.

[0014] According to a third aspect of this disclosure, an electronic device is provided, the electronic device including the housing described in this disclosure.

[0015] The present invention discloses a shell processing method, apparatus, device and storage medium, wherein a first processing is performed on a first film layer on a substrate to be processed to adjust the first pore structure of the first film layer to obtain a second film layer having a second pore structure, the second pore structure being different from the first pore structure, and a first dyeing operation is performed based on the second film layer to obtain a target shell.

[0016] It should be understood that the description in this section is not intended to identify key or essential features of the embodiments of this disclosure, nor is it intended to limit the scope of this disclosure. Other features of this disclosure will become readily apparent from the following description. Attached Figure Description

[0017] The above and other objects, features, and advantages of this disclosure will become readily apparent from the following detailed description of exemplary embodiments, taken in conjunction with the accompanying drawings. Several embodiments of this disclosure are illustrated in the drawings by way of example and not limitation, in which:

[0018] In the accompanying drawings, the same or corresponding reference numerals indicate the same or corresponding parts.

[0019] Figure 1 A schematic flowchart of a shell processing method according to an embodiment of the present disclosure is shown. Figure 1 ;

[0020] Figure 2 A schematic diagram of a target housing according to the present disclosure is shown;

[0021] Figure 3 A schematic flowchart of a shell processing method according to an embodiment of the present disclosure is shown. Figure 2 ;

[0022] Figure 4 A schematic flowchart of a shell processing method according to an embodiment of the present disclosure is shown. Figure 3 ;

[0023] Figure 5 A schematic diagram of a scenario based on a first specific application embodiment of this disclosure is shown;

[0024] Figure 6 A complete process flow diagram of the first specific application embodiment of this disclosure is shown;

[0025] Figure 7 A schematic diagram of a scenario based on a second specific application embodiment of this disclosure is shown;

[0026] Figure 8 A complete process flow diagram of the second specific application embodiment of this disclosure is shown;

[0027] Figure 9 A schematic diagram of a scenario based on a third specific application embodiment of this disclosure is shown;

[0028] Figure 10 A complete process flow diagram of the third specific application embodiment of this disclosure is shown. Detailed Implementation

[0029] To make the objectives, features, and advantages of this disclosure more apparent and understandable, the technical solutions in the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this disclosure, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this disclosure without creative effort are within the scope of protection of this disclosure.

[0030] Figure 1 A schematic flowchart of a shell processing method according to an embodiment of the present disclosure is shown. Figure 1 ,like Figure 1 As shown, the method mainly includes:

[0031] Step S101: A first film layer having a first pore structure is formed on the substrate to be treated.

[0032] Specifically, the material of the substrate to be treated can be aluminum, aluminum alloy, titanium alloy, etc., and a first film layer with a first pore structure can be formed on the substrate to be treated by oxidation, that is, the first film layer can be an oxide film layer; of course, the first film layer of the present disclosure embodiments is not limited to oxide film layers, and other non-oxide film layers applicable to the present disclosure embodiments should also fall within the protection scope of the present disclosure embodiments.

[0033] Step S102: Perform a first treatment on the first membrane layer to adjust the first pore structure of the first membrane layer and obtain a second membrane layer with a second pore structure.

[0034] Specifically, the first pore structure generally exhibits regularity, meaning the first film layer formed on the substrate to be treated has regularly arranged pores. If the substrate to be treated is dyed based on the first film layer with the first pore structure, the final effect is a uniform shell appearance across the entire surface. Therefore, in order to achieve a more distinctive shell appearance, the first film layer needs to undergo a first treatment to adjust its first pore structure, resulting in a second film layer with a second pore structure, which differs from the first pore structure.

[0035] Specifically, adjusting the first pore structure of the first membrane layer may include adjusting the regularity, pore size, and / or pore depth of the first pore structure, that is, the arrangement order, pore size, and / or pore depth of the pores in the second pore structure are different from those of the first pore structure. In some optional embodiments, the arrangement order, pore size, and / or pore depth of the pores in the second pore structure obtained after adjusting the first pore structure may no longer be regular.

[0036] Step S102: Perform the first dyeing operation based on the second membrane layer to obtain the target shell.

[0037] Specifically, the first dyeing operation can be performed based on the second membrane layer to obtain the target shell. Since the second pore structure is different from the first pore structure, the dyeing effect based on the second membrane layer is different from the dyeing effect based on the first membrane layer.

[0038] Furthermore, if the arrangement order, pore size, and / or pore depth of the pores in the second pore structure no longer exhibit regularity, then after the dye from the first dyeing operation enters the pores of the second membrane layer, the resulting target shell will display a scattered effect with varying sizes, color depths, and random arrangements, such as... Figure 2 As shown.

[0039] The present invention discloses a shell processing method, wherein a first treatment is performed on a first film layer on a substrate to be processed to adjust the first pore structure of the first film layer, thereby obtaining a second film layer with a second pore structure. Since the second pore structure is irregular, the target shell obtained after the first dyeing operation based on the second film layer can present a scattered appearance effect, thereby achieving a more distinctive shell appearance effect and improving the concealment of appearance defects of the target shell. Moreover, the process is simple and the cost is low.

[0040] Figure 3 A schematic flowchart of a shell processing method according to an embodiment of the present disclosure is shown. Figure 2 ,like Figure 3 As shown, the method includes:

[0041] Step S101: A first film layer having a first pore structure is formed on the substrate to be treated.

[0042] Step S102: Perform a first treatment on the first membrane layer to adjust the first pore structure of the first membrane layer and obtain a second membrane layer with a second pore structure.

[0043] The specific implementation process of steps S101 and S102 has been described above, and will not be repeated here.

[0044] Step S103a: Form a third film layer based on a substrate having a second film layer.

[0045] Step S103b: Perform a first dyeing operation on the substrate for forming the third film layer to obtain the target shell.

[0046] Specifically, in practical applications, there are situations where the second film layer is difficult to dye directly. For example, if the first pore structure of the first film layer formed on the substrate to be treated is relatively dense, the second film layer obtained after the first treatment of the first film layer is difficult to dye directly. Therefore, a third film layer needs to be formed based on the substrate with the second film layer. The third film layer can also be an oxide film layer. The pore structure of the third film layer should be more suitable for dyeing than the pore structure of the first film layer. That is, the pore size of the third film layer should be larger and the pore arrangement should be more sparse than that of the first film layer. Then, the first dyeing operation can be performed on the substrate with the third film layer to obtain the target shell. This avoids the problem of the second film layer being difficult to dye.

[0047] Figure 4 A schematic flowchart of a shell processing method according to an embodiment of the present disclosure is shown. Figure 3 ,like Figure 4 As shown, the method mainly includes:

[0048] Step S101: A first film layer having a first pore structure is formed on the substrate to be treated.

[0049] The specific implementation process of step S101 has been described above, and will not be repeated here.

[0050] Step S102a: Perform the second staining operation based on the first membrane layer.

[0051] Step S102b: Based on the first film layer after the second dyeing operation, perform the first sealing operation.

[0052] Step S102c: Based on the first membrane layer after the first sealing operation, a first process is performed to adjust the first pore structure of the first membrane layer to obtain a second membrane layer with a second pore structure.

[0053] Specifically, in practical applications, if a scattered color-blocking effect is required, after step S101, a second dyeing operation is performed based on the first film layer, and a first sealing operation is performed based on the first film layer after the second dyeing operation. The first sealing operation can be a pre-sealing operation to improve the smoothness of the first film layer after the second dyeing operation. The sealing time of the first sealing operation is shorter than that of a typical finished product sealing operation. Afterwards, a first treatment can be performed on the first film layer after the first sealing operation to adjust the first pore structure of the first film layer and obtain a second film layer with a second pore structure.

[0054] Step S103a: Form a third film layer based on a substrate having a second film layer.

[0055] Step S103b: Perform a first dyeing operation on the substrate for forming the third film layer to obtain the target shell.

[0056] Specifically, since the second film layer has already undergone the second dyeing operation and the first sealing operation, it is difficult to dye the second film layer again. Therefore, if the second film layer needs to undergo the first dyeing operation, a third film layer needs to be formed based on the substrate with the second film layer. The pore structure of the third film layer is suitable for dyeing, and the first dyeing operation is performed based on the substrate with the third film layer to obtain the target shell. Thus, the target shell can exhibit a scattered effect where the colors of the second dyeing operation and the first dyeing operation contrast.

[0057] In one embodiment, after step S103b, the method further includes: performing a second sealing operation on the target shell, wherein the sealing time of the second sealing operation is longer than that of the first sealing operation, wherein the second sealing operation is a general finished product sealing operation, and the sealing time of the finished product sealing operation is longer than that of the pre-sealed operation. Specifically, the second sealing operation can improve the smoothness, wear resistance, and corrosion resistance of the target shell and can prevent the target shell from being contaminated. Therefore, after obtaining the target shell, a second sealing operation should be performed on the target shell.

[0058] In one embodiment, the first processing in steps S102 and S102c is a sandblasting operation. After obtaining the second film layer through the sandblasting operation, the method further includes: a cleaning operation based on the second film layer. Correspondingly, a first dyeing operation is performed based on the second film layer, including: performing the first dyeing operation based on the cleaned second film layer. Specifically, the cleaning operation can remove dust, oil, and abrasive particles generated during the sandblasting operation from the second film layer, facilitating the subsequent first dyeing operation on the second film layer.

[0059] In one possible implementation, the substrate to be processed is obtained by: contouring an initial substrate; and surface cleaning the contoured substrate to obtain the substrate to be processed.

[0060] Specifically, the initial substrate can be made of materials such as aluminum, aluminum alloy, and titanium alloy. Contouring the initial substrate can yield the contour of the target shell, such as the shell contour of a laptop or mobile phone. Contouring can be performed using methods such as stamping or computer numerical control (CNC).

[0061] Specifically, the surface of the contoured substrate undergoes cleaning treatment to make its surface smoother and cleaner. Surface cleaning treatment may include operations such as grinding, sandblasting, degreasing, and chemical polishing. Grinding improves the flatness of the substrate, sandblasting provides a certain degree of cleanliness and roughness, degreasing removes grease and oil stains from the substrate surface, and chemical polishing removes streaks and scratches, resulting in a smoother surface and a near-mirror-like finish. The specific process of surface cleaning treatment can be customized according to actual needs, and this disclosure does not limit it.

[0062] To facilitate understanding of the shell processing method disclosed herein, three specific application embodiments of the shell processing method are listed below:

[0063] First specific application example:

[0064] Figure 5 A schematic diagram of a scenario based on a first specific application embodiment of this disclosure is shown, such as... Figure 5 As shown in 5a, in this specific application embodiment, a first film layer 20 with a first porous structure is formed on the substrate 10 to be treated by anodizing; that is, the first film layer 20 is an anodized film layer. Figure 5 As shown in 5b, the first film layer 20 undergoes a first treatment, which can be sandblasting, to adjust the first pore structure of the first film layer 20, resulting in a second film layer 30 with a second pore structure. Specifically, since the pore size of the anodic oxide film layer is relatively large, sandblasting the anodic oxide film layer will form a second film layer 30 with pores of varying depths; as shown in 5b, the first film layer 20 undergoes a first treatment, which can be sandblasting, resulting in a second film layer 30 with pores of varying depths. Figure 5 As shown in 5c, the first dyeing operation can be performed directly on the second film layer 30 to form the first dye layer 40, thereby obtaining the target shell. Specifically, since the second film layer 30 has pores of varying depths, the target shell formed after the first dyeing operation will exhibit a scattered effect of contrasting dark and light colors. For example, if the dye used in the first dyeing operation is red, the target shell will exhibit a scattered effect of contrasting dark red and light red colors. Figure 5 As shown in 5d, the target shell is subjected to a second sealing operation, namely finished product sealing, to obtain the second sealing layer 50.

[0065] Figure 6 A complete process flow diagram of a first specific application embodiment of this disclosure is shown, as follows: Figure 6 As shown, the initial substrate is first subjected to contour processing and surface cleaning. Since the first film layer 20 is formed by anodizing, the surface cleaning process can include grinding, sandblasting, degreasing and chemical polishing to obtain the substrate 10 to be treated. Then, the substrate to be treated is anodized to form the first film layer 20, and the first film layer 20 is sandblasted and cleaned to obtain the cleaned second film layer 30. Finally, the cleaned second film layer 30 is dyed to form the first dyed layer 40 to obtain the target shell, and the target shell is sealed to obtain the second sealing layer 50.

[0066] Second specific application example:

[0067] Figure 7 A schematic diagram of a scenario illustrating a second specific application embodiment of this disclosure is shown, such as... Figure 7 As shown in 7a, in this specific application embodiment, a first film layer 20 with a first porous structure is formed on the substrate 10 to be treated by micro-arc oxidation; that is, the first film layer 20 is a micro-arc oxidation film layer. Figure 7As shown in 7b, the first film layer 20 undergoes a first treatment, which can be sandblasting, to adjust the first pore structure of the first film layer 20, resulting in a second film layer 30 with a second pore structure. Specifically, the pores of the micro-arc oxidation film layer are very small and densely arranged; therefore, after sandblasting the micro-arc oxidation film layer, a second film layer 30 with regular pores is formed. Figure 7 As shown in 7c, because the first pore structure of the micro-arc oxidation film is relatively dense, the second film layer is difficult to directly undergo the first dyeing operation. Therefore, it is necessary to use anodizing to form a third film layer 60 based on the substrate with the second film layer, that is, the third film layer 60 is an anodized film layer; as shown in 7c, the first pore structure of the micro-arc oxidation film layer is relatively dense, the second film layer is difficult to directly dye, therefore, it is necessary to use anodizing to form a third film layer 60 based on the substrate with the second film layer. Figure 7 As shown in 7d, a first dyeing operation is performed on the substrate on which the third film layer 60 is formed to form a first dyeing layer 40, thereby obtaining a target shell. The target shell can present a scattered appearance effect. A second sealing operation is then performed on the target shell, namely, finished product sealing, to obtain a second sealing layer 50.

[0068] Figure 8 A complete process flow diagram of a second specific application embodiment of this disclosure is shown, as follows: Figure 8 As shown, the initial substrate is first contoured and cleaned. Since the first film layer 20 is formed by micro-arc oxidation, the surface cleaning process can only include polishing to obtain the substrate to be treated. Then, the substrate to be treated is subjected to micro-arc oxidation to form the first film layer 20, and the first film layer 20 is subjected to sandblasting and cleaning to obtain the cleaned second film layer 30. Since the third film layer needs to be formed based on the second film layer by anodizing, the second film layer 30 needs to be degreased and chemically polished. Then, the chemically polished second film layer 30 is subjected to anodizing to form the third film layer 60. Finally, the substrate on which the third film layer 60 is formed is dyed to form the first dye layer 40 to obtain the target shell. The target shell is then sealed to obtain the second sealing layer 50.

[0069] Third specific application example:

[0070] Figure 9 A schematic diagram of a scenario illustrating a third specific application embodiment of this disclosure is shown, such as... Figure 9 As shown in 9a, in this specific application embodiment, a first film layer 20 with a first porous structure is formed on the substrate 10 to be treated by anodizing; that is, the first film layer 20 is an anodized film layer. Figure 9 As shown in 9b, a second staining operation is performed based on the first membrane layer to form a second staining layer 70; as... Figure 9 As shown in 9c, based on the first membrane layer after the second staining operation, a first sealing operation, i.e., pre-sealing, is performed to obtain the first sealing layer 80; as shown in 9c. Figure 9As shown in 9d, based on the first film layer 20 after the first sealing operation, a first treatment is performed. The first treatment can be sandblasting to adjust the first pore structure of the first film layer 20 after the first sealing operation, thereby obtaining a second film layer 30 with a second pore structure; as shown in 9d. Figure 9 As shown in 9e, since the second film layer 30 has already undergone the second dyeing operation and the first sealing operation, it is difficult for the second film layer to undergo another dyeing operation. Therefore, it is necessary to use anodizing to form the third film layer 60 based on the substrate with the second film layer, that is, the third film layer 60 is an anodized film layer; as shown in 9e, since the second film layer 30 has already undergone the second dyeing operation and the first sealing operation, it is difficult for the second film layer to undergo another dyeing operation. Therefore, it is necessary to use anodizing to form the third film layer 60 based on the substrate with the second film layer. Figure 9 As shown in 9f, a first dyeing operation is performed on the substrate on which the third film layer 60 is formed to form a first dyeing layer 40, thereby obtaining a target shell. The target shell can present a scattering effect where the colors of the second dyeing layer 70 and the first dyeing layer 40 contrast. A second sealing operation is then performed on the target shell, i.e., finished product sealing, to obtain a second sealing layer 50.

[0071] Figure 10 A complete process flow diagram of a third specific application embodiment of this disclosure is shown, such as... Figure 10 As shown, the initial substrate is first subjected to contour processing and surface cleaning. Since the first film layer 20 is formed by anodizing, the surface cleaning process can include grinding, sandblasting, degreasing, and chemical polishing to obtain the substrate to be treated. Then, the substrate to be treated is anodized to form the first film layer 20, and the first film layer 20 is dyed (corresponding to the second dyeing operation) and pre-sealed (corresponding to the first sealing operation). The first film layer 20 after pre-sealing is sandblasted and cleaned to obtain the cleaned second film layer 30. Then, the second film layer 30 is anodized to form the third film layer 60. Finally, the substrate that forms the third film layer 60 is dyed a second time (corresponding to the first dyeing operation) to form the first dyed layer 40 to obtain the target shell. The target shell is then sealed to obtain the second sealing layer 50.

[0072] It should be emphasized that the above three specific application embodiments are only used to explain one shell processing method of this disclosure. In actual scenarios, the application of one shell processing method of this disclosure is not limited to the above three specific application embodiments, and there may be other specific application embodiments.

[0073] This disclosure also provides a housing obtained by a housing processing method of this disclosure, such as... Figure 5As shown, the housing includes a substrate (i.e., the substrate to be processed 10), on which a second film layer 30 having a second pore structure is formed. The second film layer 30 having a second pore structure is obtained by performing a first treatment on the first film layer 20 having a first pore structure formed on the substrate. The first treatment is used to adjust the first pore structure of the first film layer 20 to a second pore structure, which is different from the first pore structure. A first dyeing layer 40 is formed on the second film layer 30, which is used to fill the second pore structure of the second film layer.

[0074] In one possible implementation, such as Figure 7 As shown, a third membrane layer 60 is formed between the second membrane layer 30 and the first dyeing layer 40. The third membrane layer 60 is used to cover the bottom and sidewalls of the second pore structure of the second membrane layer. Correspondingly, the first dyeing layer 40 is used to fill the pores of the third membrane layer 60.

[0075] In one possible implementation, such as Figure 9 As shown, the second membrane layer 30 is composed of a first membrane layer 20, a second dyeing layer 70 and a first sealing layer 80 formed sequentially. The first treatment is used to adjust the first pore structure of the second membrane layer composed of the first membrane layer 20, the second dyeing layer 70 and the first sealing layer 80 into a second pore structure.

[0076] In one embodiment, a second sealing layer 50 is formed on the first dyeing layer 40.

[0077] This disclosure also provides an electronic device that includes the housing described in this disclosure.

[0078] It should be understood that the various forms of processes shown above can be used to rearrange, add, or delete steps. For example, the steps described in this disclosure can be executed in parallel, sequentially, or in different orders, as long as the desired result of the technical solution disclosed in this disclosure can be achieved, and this is not limited herein.

[0079] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this disclosure, "a plurality of" means two or more, unless otherwise explicitly specified.

[0080] The above description is merely a specific embodiment of this disclosure, but the scope of protection of this disclosure is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in this disclosure should be included within the scope of protection of this disclosure. Therefore, the scope of protection of this disclosure should be determined by the scope of the claims.

Claims

1. A shell processing method, the method comprising: A first film layer having a first pore structure is formed on the substrate to be treated; The first pore structure is regular, and the first film layer is obtained by anodizing or micro-arc oxidation of the substrate to be treated; The first membrane layer is subjected to a first treatment to adjust the first pore structure of the first membrane layer, thereby obtaining a second membrane layer with a second pore structure, the second pore structure being different from the first pore structure; The arrangement order, pore size, and / or pore depth of the pores in the second pore structure are not regular; the first treatment is sandblasting. The first dyeing operation is performed based on the second membrane layer to obtain the target shell.

2. The shell processing method according to claim 1, further comprising, after obtaining the second film layer having the second pore structure: A third film layer is formed based on a substrate having the second film layer; Accordingly, the first staining operation includes: The first dyeing operation is performed on the substrate on which the third film layer is formed; The third film layer is obtained by anodizing a substrate having the second film layer.

3. The shell processing method according to claim 2, after forming a first film layer having a first pore structure on the substrate to be processed, the method further includes: The second staining operation is performed based on the first membrane layer; Based on the first film layer after the second dyeing operation, the first sealing operation is performed; Accordingly, the first processing of the first film layer includes: performing the first processing based on the first film layer after the first sealing operation.

4. The shell processing method according to claim 3, after performing the first dyeing operation to obtain the target shell, the method further includes: A second sealing operation is performed on the target shell, and the sealing time of the second sealing operation is longer than that of the first sealing operation.

5. The shell processing method according to any one of claims 1 to 4, wherein the substrate to be processed is obtained by: The initial substrate is contoured; The surface of the contoured substrate is cleaned to obtain the substrate to be treated.

6. A housing comprising a substrate, wherein a second film layer having a second pore structure is formed on the substrate, the second film layer having the second pore structure being obtained by performing a first treatment on a first film layer having a first pore structure formed on the substrate, the first treatment being used to adjust the first pore structure of the first film layer to the second pore structure, the second pore structure being different from the first pore structure; The arrangement order, pore size, and / or pore depth of the pores in the second pore structure are irregular; the first pore structure is regular, and the first film layer is obtained by anodizing or micro-arc oxidation of the substrate; the first treatment is sandblasting. A first dye layer is formed on the second membrane layer, and the first dye layer is used to fill the second pore structure of the second membrane layer.

7. The housing according to claim 6, wherein a third film layer is formed between the second film layer and the first dyed layer, the third film layer being used to cover the bottom and sidewalls of the second pore structure of the second film layer, and correspondingly, the first dyed layer being used to fill the pores of the third film layer; the third film layer is obtained by anodizing a substrate having the second film layer.

8. The housing according to claim 7, wherein the second membrane layer is composed of a first membrane layer, a second dyeing layer and a first sealing layer formed sequentially, and the first processing is used to adjust the first pore structure of the second membrane layer composed of the first membrane layer, the second dyeing layer and the first sealing layer to the second pore structure.

9. The housing according to any one of claims 6 to 8, wherein a second sealing layer is formed on the first dyed layer.

10. An electronic device comprising the housing as described in any one of claims 6 to 9.

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