Superlens

Abstract

The application provides an ultralens. The ultralens comprises a substrate, a plurality of first structures, and a plurality of second structures. The first structures and the second structures are all columnar, and at least part of the first structures and at least part of the second structures are alternately arranged on one side surface of the substrate in a circumferential direction of the substrate. The projected area of the first structures on the substrate is different from the projected area of the second structures on the substrate. The application solves the problem of single function of the existing ultralens.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of optical imaging devices, in particular to an ultralens. BACKGROUND

[0002] The ultralens is a kind of optical device replacing the traditional lens in recent years, which is widely used by major optical manufacturers due to its simple structure and excellent performance. The ultralens is a lens using super surface to focus light, which can manipulate the optical response of incident light, including its amplitude, phase and polarization. The structure on the existing ultralens is relatively simple, mainly through DUV device one-time exposure mask to form PR (photoresist) pattern, and one-time etching to form the structure of the ultralens. This method often produces a large process CD (feature size) deviation due to proximity effect for the design structure of the ultralens, and the single structure leads to single function, which is difficult to meet the multiple needs of users.

[0003] That is, the existing ultralens has the problem of single function. SUMMARY

[0004] The main purpose of the present application is to provide an ultralens to solve the problem of single function of the existing ultralens.

[0005] In order to achieve the above purpose, the present application provides an ultralens, comprising: a substrate; a plurality of first structures; a plurality of second structures, the first structure and the second structure are both columnar, and at least part of the first structure and at least part of the second structure are alternately arranged on one side surface of the substrate around the circumference of the substrate, the projection area of the first structure on the substrate is different from the projection area of the second structure on the substrate.

[0006] Further, the first structure includes a first core column and a first side wall covering the outer circumferential side of the first core column, the first side wall and the first core column are of the same material, and / or the first side wall and the first core column are of the same refractive index.

[0007] Further, the projection area of the first structure on the substrate is greater than the projection area of the second structure on the substrate.

[0008] Further, the height of the first side wall is less than or equal to the height of the first core column.

[0009] Further, the first side wall of the first structure is one or more layers, when the first side wall is multiple layers, the multiple layers of the first side wall are concentrically arranged, at this time the second structure at least includes a layer of side wall, and the ultralens further includes a third structure.

[0010] Further, the superlens further comprises a plurality of third structures, the first structure further comprises a second side wall, the second side wall is wrapped around the outer circumferential side of the first side wall, the second structure comprises a second core column and a third side wall wrapped around the outer circumferential side of the second core column, and the first structure, the second structure and the third structure are alternately arranged around the circumference of the substrate.

[0011] Further, the cross-sectional area of the first structure gradually decreases in the direction away from the substrate, and the cross-sectional area of the second structure remains unchanged in the direction away from the substrate.

[0012] Further, the first side wall is formed by an etching process, and the thickness of the first side wall gradually decreases in the direction away from the substrate.

[0013] Further, the substrate is circular, and the alternately arranged first structure and the second structure on the circular substrate are multiple and cover one side surface of the substrate to form an array region, and the adjacent first structure and the second structure in the array region are arranged with a spacing.

[0014] Further, the projection shape of the first structure on the substrate is the same as or different from the projection shape of the second structure on the substrate.

[0015] Further, the projection shape of the first structure on the substrate and the projection shape of the second structure on the substrate are one of a circle and a polygon; or the projection shape of the first structure on the substrate is one of a circle and a polygon, and the projection shape of the second structure on the substrate is the other of a circle and a polygon.

[0016] Further, the material of the first structure comprises one of amorphous silicon, silicon carbide, titanium dioxide and niobium pentoxide; and / or the material of the second structure comprises one of amorphous silicon, silicon carbide, titanium dioxide and niobium pentoxide; and / or the material of the substrate is glass, silicon, silicon carbide or germanium.

[0017] The technical scheme of the present application is applied to the superlens, which comprises a substrate, a plurality of first structures and a plurality of second structures, the first structure and the second structure are both columnar, and at least part of the first structure and at least part of the second structure are alternately arranged around the circumference of the substrate on one side surface of the substrate, and the projection area of the first structure on the substrate is different from the projection area of the second structure on the substrate.

[0018] By setting the substrate, the substrate provides mounting positions for the first structure and the second structure, which is conducive to improving the use reliability of the first structure and the second structure. The at least part of the first structure and the at least part of the second structure are alternately arranged on one side surface of the substrate in a circumferential direction of the substrate, which sets the arrangement mode of the plurality of first structures and the plurality of second structures, increases the modulation effect of the superlens on the incident light, and ensures the performance stability and functional diversity of the superlens. At the same time, by making the projection area of the first structure on the substrate different from the projection area of the second structure on the substrate, the first structure and the second structure are two structures with different sizes, which increases the types of structures on the substrate, increases the type diversity of the structures, and is conducive to increasing the selection of the focusing position of the superlens on the incident light. The type of the first structure and the second structure can be adjusted according to specific requirements to manipulate the amplitude, phase and polarization of the incident light, thereby ensuring the optical performance of the superlens while increasing the modulation effect of the superlens on the incident light, and ensuring the functional diversity. BRIEF DESCRIPTION OF DRAWINGS

[0019] The drawings accompanying the specification of this application form a part thereof, serve to provide further understanding of the application, and together with the description of the application, serve to explain the application. The embodiments of the application illustrated in the drawings and their descriptions are not intended to limit the application unduly.

[0020] Figure 1 A side view of the superlens of one optional embodiment of the application is shown;

[0021] Figure 2 A top view of the superlens of one optional embodiment of the application is shown;

[0022] Figure 3 A top view of the superlens of another optional embodiment of the application is shown;

[0023] Figure 4 A top view of the superlens of another optional embodiment of the application is shown;

[0024] Figure 5 A top view of the superlens of another optional embodiment of the application is shown;

[0025] Figure 6 A state diagram of the superlens of the application after step S1 in the manufacturing process is shown;

[0026] Figure 7 A state diagram of the superlens of the application after step S2 in the manufacturing process is shown;

[0027] Figure 8 A state diagram of the superlens of the application after step S3 in the manufacturing process is shown;

[0028] Figure 9A state diagram of the superlens of the present application after step S4 in the manufacturing process is shown;

[0029] Figure 10 A state diagram of the superlens of the present application after step S5 in the manufacturing process is shown;

[0030] Figure 11 A side view of the superlens of another optional embodiment of the present application is shown.

[0031] Wherein, the above-mentioned drawings include the following reference signs:

[0032] 10, substrate; 20, first structure; 21, first core column; 22, first side wall; 23, second side wall; 30, second structure; 31, second core column; 32, third side wall; 40, material to be etched; 50, first mask column; 60, second mask hollow column; 70, third mask column; 80, third structure. DETAILED DESCRIPTION

[0033] It should be noted that the embodiments in the present application and the features in the embodiments can be combined with each other without conflict. The present application will be described in detail below with reference to the drawings and in combination with the embodiments.

[0034] It should be noted that, unless otherwise specified, all the technical and scientific terms used in the present application have the same meaning as that generally understood by the ordinary skilled in the art to which the present application belongs.

[0035] In the present application, unless otherwise specified, the orientation words such as "upper", "lower", "top", "bottom" are generally directed to the directions shown in the drawings, or are directed to the vertical, perpendicular or gravity directions of the components themselves; similarly, for the convenience of understanding and description, "inner" and "outer" refer to the inner and outer relative to the contour of the components themselves, but the above orientation words are not used to limit the present application.

[0036] In order to solve the problem of single function of the superstructure in the prior art, the present application provides a superlens.

[0037] As shown in Figures 1 to 11 The superlens includes a substrate 10, a plurality of first structures 20 and a plurality of second structures 30, the first structures 20 and the second structures 30 are columnar, and at least part of the first structures 20 and at least part of the second structures 30 are alternately arranged on one side surface of the substrate 10 around the circumference of the substrate 10, the projection area of the first structures 20 on the substrate 10 is different from the projection area of the second structures 30 on the substrate 10.

[0038] By setting the substrate 10, the substrate 10 provides mounting positions for the first structure 20 and the second structure 30, which is conducive to improving the use reliability of the first structure 20 and the second structure 30. The at least part of the first structure 20 and the at least part of the second structure 30 are alternately arranged on one side surface of the substrate 10 in the circumferential direction of the substrate 10, which plans the arrangement mode of the plurality of first structures 20 and the plurality of second structures 30, increases the modulation effect of the superlens on the incident light, and ensures the performance stability and functional diversity of the superlens. At the same time, by making the projection area of the first structure 20 on the substrate 10 different from the projection area of the second structure 30 on the substrate 10, the first structure 20 and the second structure 30 are two structures with different sizes, which increases the types of structures on the substrate 10, increases the type diversity of the structures, and is conducive to increasing the selection of the focusing position of the superlens on the incident light. The type of the first structure 20 and the second structure 30 can be adjusted according to the specific requirements to manipulate the amplitude, phase and polarization of the incident light, thereby ensuring the optical performance of the superlens while increasing the modulation effect of the superlens on the incident light, and ensuring the functional diversity.

[0039] As shown in Figure 1 The first structure 20 includes a first core column 21 and a first side wall 22 conformally coated on the outer circumferential side of the first core column 21. Conformal coating means that when the projection of the first core column 21 on the substrate 10 is circular, the projection of the first structure 20 on the substrate 10 after setting the first side wall 22 is still circular; or when the projection of the first core column 21 on the substrate 10 is polygonal, the projection of the first structure 20 on the substrate 10 after setting the first side wall 22 is still polygonal, that is, setting the first side wall 22 will not change the projection shape of the overall structure on the substrate 10, and the projection shape of the first structure 20 on the substrate 10 can also be understood as being mainly the first core column 21. The first side wall 22 is made of the same material as the first core column 21, and the refractive index of the first side wall 22 is the same as that of the first core column 21. By setting the first side wall 22, the deviation of process design and processing can be compensated. The etching process can also be used to adjust the inclination angle of the first side wall 22, and such angle adjustment can improve the convergence, divergence and collimation performance of the superlens and improve the spot quality.

[0040] As shown in Figures 2 to 5As shown, the projected area of the first structure 20 on the substrate 10 is larger than the projected area of the second structure 30 on the substrate 10. That is, the projected areas of the first structure 20 and the second structure 30 on the substrate 10 are large and small in size, and the first structure 20 and the second structure 30 arranged on the substrate 10 around the circumference of the substrate 10 are also designed to be large and small in size. Similarly, when the first structure 20 and the second structure 30 are both cylinders, the radius of the projection of the first structure 20 on the substrate 10 is larger than the radius of the projection of the second structure 30 on the substrate 10; when the first structure 20 and the second structure 30 are both polygonal prisms, the side length of the projection of the first structure 20 on the substrate 10 is larger than the side length of the projection of the second structure 30 on the substrate 10.

[0041] Specifically, the height of the first side wall 22 is less than or equal to the height of the first core column 21. That is, the side surface of the first side wall 22 away from the substrate 10 is flush with the side surface of the first core column 21 away from the substrate 10, or the side surface of the first side wall 22 away from the substrate 10 is arranged closer to the substrate 10 than the side surface of the first core column 21 away from the substrate 10. Preferably, the height of the first side wall 22 is equal to the height of the first core column 21, at which time the height of the first structure 20 is the same as the height of the second structure 30.

[0042] As shown in FIG. 1, the first structure 20 and the second structure 30 are arranged on the substrate 10 around the circumference of the substrate 10. Figure 1 As shown, the cross-sectional area of the first structure 20 gradually decreases in the direction away from the substrate 10, and the cross-sectional area of the second structure 30 remains unchanged in the direction away from the substrate 10. As shown in the figure, the shape of the side view of the first structure 20 is a trapezoid, and the shape of the side view of the second structure 30 is a rectangle. The first side wall 22 is formed by etching, and the thickness of the first side wall 22 gradually decreases in the direction away from the substrate 10, that is, the change in the size of the cross-sectional area of the first structure 20 is related to the change in the thickness of the first side wall 22, that is, the cross-sectional area of the first core column 21 of the first structure 20 remains unchanged in the direction away from the substrate 10. Such arrangement makes the side wall be arranged obliquely, and by adjusting the angle of the side wall, the convergence, divergence, and collimation performance of the superlens can be improved, and the quality of the light spot can be improved. The cross-sectional area here refers to the area of the cross section in the direction parallel to the surface of the substrate 10.

[0043] As shown in FIG. 1, the first structure 20 and the second structure 30 are arranged on the substrate 10 around the circumference of the substrate 10. Figures 2 to 5As shown, the substrate 10 is circular, and the first structures 20 and the second structures 30 arranged alternately on the circular substrate 10 are multiple groups and cover one side surface of the substrate 10 to form an array region, and any two first structures 20 and second structures 30 arranged adjacently in the array region are arranged with a spacing. That is, the first structures 20 and the second structures 30 arranged adjacently are arranged with a spacing, and the multiple first structures 20 and the multiple second structures 30 are arranged alternately in the circumferential direction of the substrate 10, and the surface of the substrate 10 is covered by arranging the array region, which is beneficial to guarantee the use reliability of the superlens, and further beneficial to the reasonable focusing of the superlens on the incident light.

[0044] It should be noted that, Figures 1 to 11 The figure shown in the above embodiment is a simplified diagram, and is shown in this way for the purpose of clearly showing the shape of the structure on the substrate 10. It is shown in the figure that the first structures 20 and the second structures 30 form a circle around the circumference of the substrate 10, and in actual use, there are not only one circle, but multiple groups or multiple circles to form the above-mentioned array region.

[0045] As shown in the above embodiment, Figures 2 to 5 The projection shape of the first structure 20 on the substrate 10 is the same as or different from the projection shape of the second structure 30 on the substrate 10, and the shape of the first structure 20 and the second structure 30 can be selected according to the actual situation, as long as the projection area of the first structure 20 on the substrate 10 is greater than or equal to the projection area of the second structure 30 on the substrate 10.

[0046] When the projection shape of the first structure 20 on the substrate 10 is the same as the projection shape of the second structure 30 on the substrate 10, the projection shape of the first structure 20 on the substrate 10 and the projection shape of the second structure 30 on the substrate 10 are one of a circle and a polygon, and the polygon at least includes a triangle and a quadrilateral, and of course includes a shape with more than four sides, which can be selected according to the specific situation. As shown in the specific embodiment, Figure 2 In the specific embodiment, the projection shape of the first structure 20 and the second structure 30 on the substrate 10 is a circle, and at this time, the second structure 30 is a cylinder, and the radius of the first structure 20 is greater than the radius of the second structure 30. As shown in the specific embodiment, Figure 3 In the specific embodiment, the projection shape of the first structure 20 and the second structure 30 on the substrate 10 is a square, and at this time, the second structure 30 is a quadrangular prism, and the side length of the first structure 20 is greater than the side length of the second structure 30. As shown in the specific embodiment, Figure 4 In the specific embodiment, the projection shape of the first structure 20 and the second structure 30 on the substrate 10 is a triangle, and at this time, the second structure 30 is a triangular prism, and the side length of the first structure 20 is greater than the side length of the second structure 30.

[0047] When the first structure 20 on the substrate 10 is in a shape different from the second structure 30 on the substrate 10, the first structure 20 on the substrate 10 is in one of a circular shape, a polygonal shape, and the second structure 30 on the substrate 10 is in another of a circular shape, a polygonal shape. For example, when the first structure 20 on the substrate 10 is in a circular shape, the second structure 30 on the substrate 10 is in a triangular shape or a quadrangular shape or a pentagonal shape, and the like. As shown in the specific embodiment, Figure 5 the first structure 20 on the substrate 10 is in a circular shape, and the second structure 30 on the substrate 10 is in a square shape. Of course, this figure is only an example, and the specific embodiment further includes a plurality of combination cases: the first structure 20 on the substrate 10 is in a circular shape, and the second structure 30 on the substrate 10 is in a triangular shape; or the first structure 20 on the substrate 10 is in a triangular shape, and the second structure 30 on the substrate 10 is in a quadrangular shape; or the first structure 20 on the substrate 10 is in a triangular shape, and the second structure 30 on the substrate 10 is in a circular shape; or the first structure 20 on the substrate 10 is in a quadrangular shape, and the second structure 30 on the substrate 10 is in a circular shape; or the first structure 20 on the substrate 10 is in a quadrangular shape, and the second structure 30 on the substrate 10 is in a triangular shape.

[0048] Specifically, the material of the first structure 20 includes one of amorphous silicon, silicon carbide, titanium dioxide, and niobium pentoxide, and the material of the first core column 21 and the first side wall 22 of the first structure 20 is the same; the material of the second structure 30 includes one of amorphous silicon, silicon carbide, titanium dioxide, and niobium pentoxide; and the material of the substrate 10 is glass, silicon, silicon carbide, or germanium. The application further provides a manufacturing method of a superlens, which is used to manufacture the superlens, and the manufacturing method comprises the following steps:

[0049] As shown in the specific embodiment, Figure 6 step S1: obtaining a substrate 10, and first depositing a to-be-etched material 40 with a first thickness on one side surface of the substrate 10, the to-be-etched material 40 being one of amorphous silicon, silicon carbide, and titanium dioxide;

[0050] As shown in the specific embodiment, Figure 7 step S2: preparing a photo-lithography process on the side surface of the to-be-etched material 40 away from the substrate 10, setting a photoresist on the side surface of the to-be-etched material 40 away from the substrate 10 and performing a patterning process to form a plurality of first mask columns 50 on the side surface of the to-be-etched material 40 away from the substrate 10, the plurality of first mask columns 50 corresponding to the positions of the plurality of first core columns 21 to be arranged on the substrate 10 one by one, and then performing a first exposure process, in which the first core column 21 with the largest diameter needs to be exposed, and the size of the first core column 21 is obtained by calculation;

[0051] like Figure 8 Step S3: Multiple first core pillars 21 are formed after the first etching process. It should be noted that, since a first mask pillar 50 is set on the corresponding position of the first core pillar 21 of the material to be etched 40 in step S2, the structure at the position of the material to be etched 40 corresponding to the first mask pillar 50 is not etched away during the etching process, while other positions are etched away, and the required first core pillar 21 is finally formed.

[0052] like Figure 9 As shown, in step S4: a second material 40 of a second thickness is deposited on the surface of the substrate 10 on one side of the substrate 10 with the first core pillar 21. Photoresist is set on the surface of the material 40 away from the substrate 10 and patterned to form multiple second mask hollow pillars 60 and multiple third mask pillars 70. The positions of the multiple second mask hollow pillars 60 correspond one-to-one with the positions of the multiple first sidewalls 22 to be set on the substrate 10, and the positions of the multiple third mask pillars 70 correspond one-to-one with the positions of the multiple second structures 30 to be set on the substrate 10. Then, a second exposure process is performed, which requires only exposing the structure with the smallest diameter.

[0053] like Figure 10 As shown, in step S5: a second etching process forms a first sidewall 22 and a second structure 30 covering the first core pillar 21. After etching, the outer periphery of the first core pillar 21 is surrounded by a layer of amorphous silicon, and the pillar size becomes the designed size of the first structure 20. This size is the large-diameter first structure 20 obtained by adding the size of the first core pillar 21 formed in the first step to the size of the first sidewall 22 formed in the second step; the size of the second structure 30 is formed by the second etching. Finally, the first structure 20 and the second structure 30 are formed alternately around the substrate 10 in the circumferential direction, forming the superlens of this application.

[0054] In summary, by changing the structural size of the first sidewall 22, multiple structural combinations of different sizes can be completed (≥2 different sizes of structures can be processed according to the above method), so that at least two types of structures can be formed on the substrate 10 of the superlens of this application. The present invention utilizes repeated iterations of deposition and etching processes to fabricate the superlens, which effectively avoids the proximity effect problem caused by structures of different sizes undergoing only one exposure.

[0055] It should be noted that, Figures 6 to 10 The bottom center shows the side view, and the top center shows the top view.

[0056] It should also be noted that the first thickness is consistent with the required height of the first core column 21, and the second thickness is consistent with the required height of the first sidewall 22 and the second structure 30.

[0057] In the above specific embodiments, the first sidewall 22 of the first structure 20 is one layer. However, in other alternative embodiments, the first sidewall 22 of the first structure 20 can be multiple layers by the above manufacturing method. When the first sidewall 22 is multiple layers, the multiple layers of the first sidewall 22 are concentrically arranged. In this case, the second structure 30 includes at least one sidewall, and the superlens further includes the third structure 80.

[0058] In Figure 11 In the specific embodiments shown in the drawings, the sidewall of the first structure 20 is two layers, which includes the first sidewall 22 and the second sidewall 23. The superlens further includes a plurality of third structures 80. The second sidewall 23 is conformally coated on the outer circumferential side of the first sidewall 22, so that the first structure 20 has two layers of sidewalls. The second structure 30 includes the second core column 31 and the third sidewall 32 conformally coated on the outer circumferential side of the second core column 31, so that the second structure 30 has one layer of sidewalls. The first structure 20, the second structure 30, and the third structure 80 are alternately arranged around the circumference of the substrate 10. In this case, the structure of the second structure 30 is the same as that of the first structure 20 in the above embodiments, and the structure of the third structure 80 is the same as that of the second structure 30 in the above embodiments. Four or more structures can be designed by the above manufacturing method.

[0059] Obviously, the above-described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative work should fall within the scope of protection of the present application.

[0060] It should be noted that the terms used herein are only intended to describe specific embodiments, and are not intended to limit the exemplary embodiments according to the present application. As used herein, the singular form is intended to include the plural form unless the context clearly indicates otherwise, and it should be understood that the terms "comprise" and / or "include" as used in the specification indicate the presence of the features, steps, operations, devices, components and / or combinations thereof.

[0061] It should be noted that the terms "first", "second", and the like used in the specification and claims of the present application and the above drawings are used to distinguish similar objects, and do not necessarily indicate a specific order or sequence. It should be understood that the data used in this way can be interchanged under appropriate circumstances, so that the embodiments of the present application described herein can be implemented in an order other than that illustrated or described herein.

[0062] The above merely provides the preferred embodiments of the present application, and is not used to limit the present application. For those skilled in the art, the present application can have various modifications and changes. Any modifications, equivalent replacements, improvements, etc. made within the principles and technical scope of the present application shall fall into the scope of the present application.

Claims

1. A metalens, comprising: The application relates to a substrate (10), a plurality of first structures (20), a plurality of second structures (30), wherein the first structures (20) and the second structures (30) are columnar, and at least part of the first structures (20) and at least part of the second structures (30) are alternately arranged on one side surface of the substrate (10) around the circumference of the substrate (10), the projection area of the first structures (20) on the substrate (10) is different from the projection area of the second structures (30) on the substrate (10), the first structures (20) comprise first core columns (21) and first side walls (22) conformally coated on the outer circumferential side of the first core columns (21), the first side walls (22) are made of the same material as the first core columns (21), and the first side walls (22) have the same refractive index as the first core columns (21); the first side walls (22) are formed by etching, and the thickness of the first side walls (22) gradually decreases in the direction away from the substrate (10); the cross-sectional area of the first structures (20) gradually decreases in the direction away from the substrate (10), and the cross-sectional area of the second structures (30) remains unchanged in the direction away from the substrate (10); the first thickness of the to-be-etched material (40) is deposited on one side surface of the substrate (10) for the first time, the to-be-etched material (40) is one of amorphous silicon, silicon carbide and titanium dioxide, photoresist is arranged on the side surface of the to-be-etched material (40) away from the substrate (10) and is subjected to patterning treatment, so as to form a plurality of first mask columns (50) on the side surface of the to-be-etched material (40) away from the substrate (10), the plurality of first mask columns (50) correspond to the positions of the plurality of first core columns (21) to be arranged on the substrate (10) one by one, and then the first exposure treatment is carried out; the plurality of first core columns (21) are formed after the first etching treatment; the second thickness of the to-be-etched material (40) is deposited on the side surface of the substrate (10) with the first core columns (21) for the second time, photoresist is arranged on the side surface of the to-be-etched material (40) away from the substrate (10) and is subjected to patterning treatment to form a plurality of second mask hollow columns (60) and a plurality of third mask columns (70), the plurality of second mask hollow columns (60) correspond to the positions of the plurality of first side walls (22) to be arranged on the substrate (10) one by one, and the plurality of third mask columns (70) correspond to the positions of the plurality of second structures (30) to be arranged on the substrate (10) one by one, and then the second exposure treatment is carried out; the first side walls (22) and the second structures (30) covering the first core columns (21) are formed after the second etching treatment. The projection area of the first structures (20) on the substrate (10) is greater than the projection area of the second structures (30) on the substrate (10). The height of the first side walls (22) is less than or equal to the height of the first core columns (21). ​ ​ ​ ​ ​ 2. The metalens of claim 1, wherein, ​ 3. The metalens of claim 1, wherein ​ 4. The metalens of claim 1, wherein The first sidewall (22) of the first structure (20) is one or more layers, when the first sidewall (22) is multiple layers, the multiple layers of the first sidewall (22) are concentrically arranged, at this time the second structure (30) at least includes a sidewall, and the superlens further comprises a third structure (80).

5. The metalens of claim 1, wherein The superlens further comprises a plurality of third structures (80), at this time the first structure (20) further comprises a second sidewall (23) which is wrapped around the outer circumferential side of the first sidewall (22), the second structure (30) comprises a second core column (31) and a third sidewall (32) which is wrapped around the outer circumferential side of the second core column (31), and the first structure (20), the second structure (30) and the third structure (80) are alternately arranged around the circumference of the substrate (10).

6. The metalens of claim 1, wherein The substrate (10) is circular, the first structure (20) and the second structure (30) which are alternately arranged on the circular substrate (10) are multiple groups and cover one side surface of the substrate (10) to form an array region, and the first structure (20) and the second structure (30) in the array region are arranged with a spacing between adjacent ones.

7. The metalens of claim 1, wherein The projection shape of the first structure (20) on the substrate (10) is the same as or different from the projection shape of the second structure (30) on the substrate (10).

8. The superlens according to claim 1, characterized in that, The projection shape of the first structure (20) on the substrate (10) and the projection shape of the second structure (30) on the substrate (10) are one of circular and polygonal; or The projection shape of the first structure (20) on the substrate (10) is one of circular and polygonal, and the projection shape of the second structure (30) on the substrate (10) is the other one of circular and polygonal.

9. The superlens according to claim 1, characterized in that, The material of the first structure (20) comprises one of amorphous silicon, silicon carbide, titanium dioxide and niobium pentoxide; and / or The material of the second structure (30) comprises one of amorphous silicon, silicon carbide, titanium dioxide and niobium pentoxide; and / or The material of the substrate (10) is glass, silicon, silicon carbide or germanium.

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