一种辅助图形添加方法、装置、设备及可读存储介质
By using a method of globally enlarging the design graphics and resolving MRC conflicts, a target auxiliary graphic is generated and superimposed on the target graphic to be OPC corrected. This solves the problems of wasted computing resources and image quality impact in small-size, high-precision OPC correction, and achieves more efficient graphic correction.
CN116306480BActive Publication Date: 2026-07-17SHANGHAI INTEGRATED CIRCUIT EQUIPMENT & MATERIALS INDUSTRY INNOVATION CENTER CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHANGHAI INTEGRATED CIRCUIT EQUIPMENT & MATERIALS INDUSTRY INNOVATION CENTER CO LTD
- Filing Date
- 2023-03-17
- Publication Date
- 2026-07-17
Smart Images
Figure CN116306480B_ABST
Abstract
本申请公开了一种辅助图形添加方法、装置、设备及可读存储介质，属于光学临近效应修正技术领域，该方法包括：根据待OPC修正的目标图形的目标值，确定预设放大值；以设计图形的中心为放大中心，以所述预设放大值对所述设计图形进行放大，得到辅助图形的目标图形；根据所述辅助图形的目标图形的宽度和相邻所述辅助图形的目标图形之间的距离得到初始辅助图形；当检测到所述初始辅助图形存在MRC冲突时，解决所述MRC冲突，得到目标辅助图形。本申请可以在不修改辅助图形添加规则的基础上，能使SRAF冲突问题变得更简单，节省计算资源，并且能够避免本该保留的SRAF被移除，更接近理想中SRAF的添加结果。
Need to check novelty before this filing date? Find Prior Art