Photomask stage unit and photomask stocker comprising the same

Abstract

A photomask stage unit for aligning a photomask includes an alignment member for aligning the photomask to position the photomask at a proper location, and a guide member for supporting an edge of the photomask and guiding the photomask to the proper location, wherein the alignment member pushes the photomask in a diagonal direction.

Description

Technical Field

[0001] This invention relates to a photomask processing device. Background Technology

[0002] A photomask (or lithography mask or photomask plate) is used to transfer patterns of photoresist films. As such a photomask moves between lithography stations, processing stations, and storage stations, it is stored in a container (or carrier or cassette) and moved.

[0003] Simultaneously, information related to the photomask (i.e., identification information) is displayed on the photomask itself in a machine-readable format. This machine-readable format can be a barcode or OCR. Therefore, to identify the photomask, a visual inspection is necessary. The mask sorting system opens the container, removes the photomask, and performs a visual inspection while placing the photomask on the stage.

[0004] However, the problem is that visual inspection cannot be performed accurately when the photomask is not properly positioned on the stage where the visual inspection is performed. Summary of the Invention

[0005] The present invention aims to provide a photomask stage unit capable of accurately aligning photomasks and a photomask storage device including the photomask stage unit.

[0006] The present invention also aims to provide a photomask stage unit capable of minimizing the contact surface with the photomask and a photomask storage device including the photomask stage unit.

[0007] The purpose of this invention is not limited thereto, and other purposes not mentioned will be clearly understood by those skilled in the art through the following description.

[0008] One aspect of the present invention provides a photomask stage unit for aligning a photomask, the photomask stage unit comprising: an alignment member for aligning the photomask to position the photomask in a suitable location; and a guide member for supporting the edge of the photomask and guiding the photomask to the suitable location, wherein the alignment member pushes the photomask in a diagonal direction.

[0009] Furthermore, the guiding member may include: a first guiding member for supporting a first corner, wherein a first side surface and a second side surface of the photomask intersect at the first corner; and a second guiding member positioned diagonally opposite the first corner and supporting a second corner, wherein a third side surface and a fourth side surface of the photomask intersect at the second corner, and the alignment member pushes the photomask diagonally from the second edge toward the first corner.

[0010] In addition, the first guiding member may include: a first position determining block for supporting a first bottom corner, wherein the bottom surface of the photomask and the first side surface intersect at the first bottom corner; and a second position determining block for supporting a second bottom corner, wherein the bottom surface of the photomask and the second side surface intersect at the second bottom corner.

[0011] Furthermore, the first position determining block may have: a first vertical surface that contacts the first side surface when the photomask is aligned in the appropriate position; and a first inclined surface that slopes downward in an inward direction from the lower end of the first vertical surface, and the second position determining block has: a second vertical surface that contacts the second side surface when the photomask is aligned in the appropriate position, and a second inclined surface that slopes downward in an inward direction from the lower end of the second vertical surface.

[0012] Furthermore, the pushing member may include: an actuator; and a pushing finger that moves along the diagonal direction via the actuator and contacts the second corner of the photomask.

[0013] Furthermore, the pushing finger may include a first finger and a second finger that respectively contact the third side surface and the fourth side surface, and the first finger and the second finger may include an elastic member for reducing vibration when in contact with the photomask.

[0014] In addition, the actuating component may include: a first air displacement nozzle configured to face the third side surface and spray air toward the third side surface; and a second air displacement nozzle configured to face the fourth side surface and spray air toward the fourth side surface.

[0015] Furthermore, the first air displacement nozzle and the second air displacement nozzle may include injection holes arranged in a horizontal direction, the injection holes being configured such that their diameter increases with increasing distance from the second corner, and the air comprising clean dry air (CDA).

[0016] Furthermore, the second guiding member may include: a first anti-reverse movement surface for supporting a third bottom corner and inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the third side surface intersect at the third bottom corner; and a second anti-reverse movement surface for supporting a fourth bottom corner and inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the fourth side surface intersect at the fourth bottom corner.

[0017] Furthermore, the photomask stage unit may also include: a third guide member for supporting a third corner portion, wherein the first side surface of the photomask and the third side surface intersect at the third corner portion; and a fourth guide member for supporting a fourth corner portion and positioned diagonally opposite the third corner portion, wherein the second side surface of the photomask and the fourth side surface intersect at the fourth corner portion, wherein the third guide member may have: a third vertical surface that contacts the first side surface when the photomask is aligned in the appropriate position; and a third inclined surface that slopes downward in an inward direction from the lower end of the third vertical surface, and the fourth guide member may have: a fourth vertical surface that contacts the second side surface when the photomask is aligned in the appropriate position; and a fourth inclined surface that slopes downward in an inward direction from the lower end of the fourth vertical surface.

[0018] Another aspect of the present invention provides a photomask accumulator, comprising: a loading unit for receiving a container storing a photomask and opening the container to expose the photomask; and an inspection unit connected to the loading unit for reading information related to the photomask to obtain information about the photomask, wherein the inspection unit comprises: a stage on which the photomask is placed; and an alignment module for pushing the photomask in one direction and aligning the photomask when it is placed on the stage.

[0019] Furthermore, the stage may include: a first guide member for supporting a first corner, wherein a first side surface and a second side surface of the photomask intersect at the first corner; and a second guide member for supporting a second corner and positioned diagonally opposite to the first corner, wherein a third side surface and a fourth side surface of the photomask intersect at the second corner; and the alignment module may include a pushing member for pushing the photomask diagonally from the second corner toward the first corner.

[0020] Furthermore, the pushing member may include: an actuator; and a pushing finger that moves along the diagonal direction via the actuator and contacts the second corner of the photomask.

[0021] In addition, the pushing finger may include: a finger that contacts the third side surface and the fourth side surface respectively; and an elastic member for reducing vibration when in contact with the photomask.

[0022] Furthermore, the pushing component can displace the photomask in a non-contact manner by spraying clean, dry air (CDA) onto the third and fourth side surfaces.

[0023] Furthermore, the actuating member may include: a first air displacement nozzle configured to face the third side surface and spray air toward the third side surface; and a second air displacement nozzle configured to face the fourth side surface and spray air toward the fourth side surface, wherein the first air displacement nozzle and the second air displacement nozzle include spray holes arranged in a horizontal direction, and the spray holes are configured such that their diameter increases with the increase of the distance from the second corner.

[0024] Furthermore, the first guiding member may include: a first positioning block for supporting a first bottom corner, wherein the bottom surface of the photomask and a first side surface intersect at the first bottom corner; and a second positioning block for supporting a second bottom corner, wherein the bottom surface of the photomask and the second side surface intersect at the second bottom corner, and each of the first positioning block and the second positioning block may have: a first end that is inclined upward in an outward direction away from the photomask; a vertical surface that extends vertically from the outer end of the first end; and a second end that is inclined upward in an outward direction from the upper end of the vertical surface.

[0025] Furthermore, the second guiding member may include: a first anti-reverse movement surface for supporting a third bottom corner and inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the third side surface intersect at the third bottom corner; and a second anti-reverse movement surface for supporting a fourth bottom corner and inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the fourth side surface intersect at the fourth bottom corner.

[0026] Furthermore, the photomask reservoir may also include: a third guide member for supporting a third corner, wherein the first side surface of the photomask and the third side surface intersect at the third corner; and a fourth guide member for supporting a fourth corner and positioned diagonally opposite the third corner, wherein the second side surface of the photomask and the fourth side surface intersect at the fourth corner, and each of the third and fourth guide members may have: a first end that is inclined upward in an outward direction away from the photomask; and a vertical surface that extends vertically from the outer end of the first end and is configured to face the first side surface.

[0027] Another aspect of the present invention provides a photomask storage device, comprising: a loading unit for receiving a container storing a photomask and opening the container to expose the photomask; an inspection unit connected to the loading unit and reading information related to the photomask to inspect the photomask; and a storage unit for storing the photomask inspected by the inspection unit, wherein the inspection unit comprises: a stage, the stage including: a first guide member for supporting a first corner, a first side surface and a second side surface of the photomask intersecting at the first corner; and a second guide member positioned diagonally opposite the first corner and for supporting a second corner, a third side surface and a fourth side surface of the photomask intersecting at the second corner; a pushing member for pushing the photomask diagonally from the second corner toward the first corner and aligning the photomask while the photomask is placed on the first guide member and the second guide member; and a vision module for acquiring information from or inspecting the photomask positioned at an appropriate location on the stage by the pushing member.

[0028] Furthermore, the pushing member may include: an actuator; and a pushing finger that moves along the diagonal direction via the actuator and contacts the second corner of the photomask, and the pushing finger may include: a finger that contacts the third side surface and the fourth side surface respectively; and an elastic member for reducing vibration when the finger contacts the photomask.

[0029] Furthermore, the actuating member may include: a first air displacement nozzle configured to face the third side surface and spray air toward the third side surface; and a second air displacement nozzle configured to face the fourth side surface and spray air toward the fourth side surface, wherein the first air displacement nozzle and the second air displacement nozzle may include spray holes arranged in a horizontal direction, and the spray holes are configured such that their diameter increases with the increase of the distance from the second corner.

[0030] Furthermore, the first guiding member may include: a first positioning block for supporting a first bottom corner, wherein the bottom surface of the photomask and a first side surface intersect at the first bottom corner; and a second positioning block for supporting a second bottom corner, wherein the bottom surface of the photomask and the second side surface intersect at the second bottom corner, and each of the first positioning block and the second positioning block may have: a first end that is inclined upward in an outward direction away from the photomask; a vertical surface that extends vertically from the outer end of the first end; and a second end that is inclined upward in an outward direction from the upper end of the vertical surface.

[0031] Furthermore, the second guiding member may include: a first anti-reverse movement surface for supporting a third bottom corner and inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the third side surface intersect at the third bottom corner; and a second anti-reverse movement surface for supporting a fourth bottom corner and inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the fourth side surface intersect at the fourth bottom corner.

[0032] According to the present invention, photomasks can be precisely aligned.

[0033] According to the present invention, contamination and damage to the photomask can be prevented by minimizing the contact surface with the photomask during the alignment process.

[0034] The effects of this invention are not limited to those described above. Those skilled in the art will clearly understand from this specification and the accompanying drawings any effects not mentioned. Attached Figure Description

[0035] Figure 1 This is an exemplary perspective view of a photomask reservoir according to an exemplary embodiment of the present invention.

[0036] Figure 2 This is an exemplary top view of a photomask reservoir according to an exemplary embodiment of the present invention.

[0037] Figure 3 This is an exemplary block diagram of a photomask storage device according to an exemplary embodiment of the present invention.

[0038] Figure 4A It is a perspective view illustrating a photomask.

[0039] Figure 4B This is a three-dimensional diagram representing a photomask stage unit.

[0040] Figure 5 yes Figure 4B The top view of the photomask stage unit shown.

[0041] Figure 6 yes Figure 4B The side view of the photomask stage unit shown.

[0042] Figure 7A This is a perspective view showing the first guide member.

[0043] Figure 7B From Figure 7A Side view of the first guide member as seen in direction A1.

[0044] Figure 7C From Figure 7ASide view of the first guide member as observed in direction A2.

[0045] Figure 8 This is a diagram used to illustrate the second guide member.

[0046] Figure 9 This is a diagram used to illustrate the third guiding component.

[0047] Figure 10 This is a diagram used to illustrate the fourth guiding component.

[0048] Figure 11 This is a diagram used to illustrate the alignment components.

[0049] Figure 12 This is an enlarged view used to describe the main part of the pushing finger.

[0050] Figure 13 and Figure 14 This is a diagram showing other examples of aligned components. Detailed Implementation

[0051] In the following description, exemplary embodiments of the invention will be described more fully with reference to the accompanying drawings, in which exemplary embodiments of the invention are illustrated. However, the invention may be implemented in different ways and is not limited to the following exemplary embodiments. In the following description of the invention, detailed descriptions of known functions and configurations incorporated herein are omitted to avoid obscuring the subject matter of the invention. Furthermore, the same reference numerals are used throughout the drawings for parts having similar functions and effects.

[0052] Unless explicitly stated otherwise, the expressions “comprising” and variations such as “including” or “containing” shall be construed as implying inclusion of the stated elements but excluding any other elements. It should be understood that the terms “comprising” and “having” are intended to indicate the presence of features, numbers, operations, constituent elements, and components or combinations thereof described in the specification, and do not exclude the presence or addition of one or more other features, numbers, operations, constituent elements, and components or combinations thereof.

[0053] Singular expressions used herein include plural expressions unless they have a clearly contradictory meaning in the context. Accordingly, the shapes, sizes, etc. of elements in the accompanying drawings may be exaggerated for clarity.

[0054] The terms "first," "second," etc., are used to describe various constituent elements, but the constituent elements are not limited by these terms. These terms are only used to distinguish one constituent element from another. For example, without departing from the scope of the invention, a first element may be named a second constituent element, and similarly, a second constituent element may be named a first constituent element.

[0055] It should be understood that when a component is referred to as "connected to" or "connected to" another component, the component can be directly connected to or connected to the other component, but there may also be intermediate components. Conversely, when a component is "directly connected to" or "directly connected to" another component, it should be understood that there are no intermediate components. Other expressions describing the relationship between components, such as "between" and "just between," or "adjacent to" and "directly adjacent to," should be interpreted similarly.

[0056] All terms used herein, including technical or scientific terms, have the same meaning as commonly understood by those skilled in the art, unless they are defined differently. Terms defined in general dictionaries should be interpreted as having a meaning that matches the meaning in the relevant technical context, and should not be interpreted as having an ideal or overly formal meaning unless explicitly defined in this application.

[0057] The foregoing detailed description elucidates the present invention. Furthermore, the foregoing has shown and described exemplary embodiments of the invention, and the invention can be used in various other combinations, modifications, and environments. That is, modifications or corrections can be made to the foregoing within the scope of the inventive concept disclosed herein, its equivalents, and / or within the scope of the technology or knowledge in the art. The foregoing exemplary embodiments describe the optimal state for realizing the technical spirit of the invention, and various changes can be made as needed in the specific application fields and uses of the invention. Therefore, the foregoing detailed description of the invention is not intended to limit the invention to the disclosed exemplary embodiments. Furthermore, the appended claims should also be interpreted to include other exemplary embodiments.

[0058] In exemplary embodiments of the present invention, a substrate processing apparatus for etching a substrate using plasma will be described. However, the present invention is not limited thereto and can be applied to various types of apparatuses that perform processing by supplying plasma into a chamber.

[0059] Figures 1 to 3 These are exemplary perspective views, top views, and block diagrams of a photomask storage device according to exemplary embodiments of the present invention.

[0060] Reference Figures 1 to 3 According to some exemplary embodiments of the present invention, the photomask storage device includes a loading area 10, an inspection area 20, a storage area 30, a control module 900, etc.

[0061] For example, the loading area 10 is formed to extend in the first direction X. As shown, a plurality of loading ports 100 and 101 (e.g., two loading ports) may be provided in the loading area 10 in the first direction X.

[0062] Loading area 10 receives container (or carrier, box) 1001, in which photomask 40 is stored through multiple loading ports 100 and 101. Loading area 10 then identifies the information contained in container 1001 and reads information associated with container 1001 and / or photomask 40. For example, it can be checked whether container 1001 corresponds to a first type or a second type in loading area 10. When the type of container 1001 is different, the type of photomask 40 in container 1001 can also be different. Here, loading area 10 can use various types of reading methods to identify information from multiple different types of containers 1001. Alternatively, a single type of reading method can be used multiple times.

[0063] The container 1001 that can be used can be, for example, a marking standard mechanical interface cartridge (RSP) or an EUV marking cartridge. The photomask stored in the RSP (i.e., the RSP photomask) and the photomask stored in the EUV marking cartridge (i.e., the EUV photomask) can be different from each other.

[0064] After identifying information related to container 1001 and / or photomask 40 through the aforementioned reading operation, loading area 10 can open container 1001 in different orders based on the identified information. Container 1001 can be moved along a third direction Z (i.e., the up-down direction) by lifting units 110 and 111. As container 1001 is moved downward by lifting units 110 and 111, the opening process of container 1001 can be performed. When container 1001 is opened, the internal photomask 40 is exposed. For example, when container 1001 is of the first type, container 1001 can be opened in a first order; when container 1001 is of the second type, container 1001 can be opened in a second order different from the first order.

[0065] The loading area 10, the inspection area 20, and the storage area 30 can be configured to contact each other in the second direction Y. For example, the inspection area 20 can be formed to extend in the first direction X.

[0066] The inspection area 20 may include a first transfer robot 210, an aligner (or rotator) 400, a flip module 240, and a vision module 250. Here, the first transfer robot 210, the photomask stage unit 400, the flip module 240, and the vision module 250 can be used regardless of the type of photomask 40.

[0067] The first transfer robot 210 can grasp the photomask 40 and transfer it from the loading area 10 to the interior of the inspection area 20, or conversely, transfer the photomask 40 from the inspection area 20 to the loading area 10. Alternatively, the first transfer robot 210 can be used to transfer the photomask 40 within the inspection area 20. The first transfer robot 210 includes multiple links capable of rotating individually for each link. Therefore, within its permissible reach, the first transfer robot 210 is capable of moving in all directions and can be controlled at multiple angles.

[0068] The photomask stage unit 400 receives the photomask 40 from the first transfer robot 210 and aligns the photomask in place.

[0069] For example, because the photomask 40 is not stored in place in container 1001, the photomask stage unit 400 may receive the photomask 40 in an misaligned state. In this case, the photomask stage unit 400 performs an alignment operation to correctly position the photomask 40. (Refer to...) Figures 4A to 12 Detailed description of photomask stage unit 400.

[0070] The flip module 240 flips the photomask 40. That is, the flip module 240 flips the photomask 40 so that the back of the photomask 40 faces upward, thus turning the photomask 40 upward. The flip module 240 can hold the photomask 40 using an air chuck method.

[0071] The vision module 250 captures images of the photomask 40 to obtain information from or inspect the photomask 40. For example, the vision module 250 can inspect the type of the photomask 40 or inspect the position (or orientation) of the photomask 40.

[0072] Specifically, when the photomask 40 is placed on the photomask stage unit 400, the vision module 250 captures an image of the photomask 40, and the control module 900 can obtain relevant information (i.e., identification information) about the photomask from the captured images (including still images and animations). Identification information may include, for example, tracking numbers, type classifications, and lithography tool classifications. This identification information is displayed on the photomask 40 itself in a machine-readable form. Here, the machine-readable type can be a barcode or OCR. For example, the control module 900 can identify the barcode, alignment marks, etc., of the RSP photomask from an image of the RSP photomask. Furthermore, the control module 900 can identify common shadows on the EUV photomask from images obtained by capturing images of the EUV photomask.

[0073] Information related to the photomask 40 is stored in the control module 900 or in a memory connected to the control module 900. In the memory, for example, the photomask 40 is categorized into 36 types, and the characteristics of each type are stored. Therefore, the control module 900 can acquire information from an image of the photomask and compare the acquired information with the information stored in the memory to determine the type of photomask. The type of photomask 40 determined in this way can be a photomask equipped with a thin-film frame.

[0074] Furthermore, the control module 900 controls the loading area 10, the inspection area 20, and the storage area 30. The control module 900 can also be installed within the inspection area 20. Additionally, the control module 900 can be connected wirelessly or via a wired connection to a control server. The control server is a higher-level system containing information about the entire process of facility automation. Therefore, the control server can issue operating commands to the control module 900 based on this information.

[0075] The photomask accumulator can operate in various modes. These modes include automatic, semi-automatic, and manual modes. For example, in automatic mode, the control module 900 can receive instructions from the control server and control the loading area 10, inspection area 20, and storage area 30 accordingly. Furthermore, in manual mode, the control module 900 can receive instructions directly from the operator. That is, the operator can provide specific instructions via the control panel. As shown, the control panel 160 can be a display panel mounted on one side of the photomask accumulator 1, but is not limited to this. For example, the control panel 160 can be detached from the photomask processing equipment or connected to the control module 600 via wired or wireless communication.

[0076] The storage area 30 may include a shelf 320 for storing photomasks 40 processed in the inspection area 20 and a second transfer robot 310 for transferring the photomasks 40. The second transfer robot 310 transfers the photomasks 40 between the photomask stage unit 400 and the shelf 320. The second transfer robot 310 has the same structure as the first transfer robot 210, and its detailed description will be omitted.

[0077] Figure 4A It is a perspective view showing a photomask, and Figure 4B This is a perspective view showing the stage unit. Figure 5 yes Figure 4B The top view of the platform unit shown in the figure. Figure 6 yes Figure 4B The side view of the stage unit shown in the figure. Figures 7A to 7C This is a diagram showing the first guide member. Figure 8 This is a diagram used to describe the second guide member, and Figure 9and Figure 10 This is a diagram used to describe the third and fourth guide members.

[0078] exist Figure 4A In the accompanying drawings, reference numeral S1 indicates the first angle where the first side surface 41 and the second side surface 42 meet; reference numeral S2 indicates the second angle where the third side surface 43 and the fourth side surface 44 meet; reference numeral S3 indicates the third angle where the first side surface 41 and the third side surface 43 meet; and reference numeral S4 indicates the fourth angle where the second side surface 42 and the fourth side surface 44 meet. Further, reference numeral S5 indicates the first bottom angle where the first side surface 41 and the bottom surface 49 meet; reference numeral S6 indicates the second bottom angle where the second side surface 42 and the bottom surface 49 meet; reference numeral S7 indicates the third bottom angle where the third side surface 43 and the bottom surface 49 meet; and reference numeral S8 indicates the fourth bottom angle where the fourth side surface 44 and the bottom surface 49 meet.

[0079] Reference Figures 4A to 6 The stage unit 400 may include a stage 410 and an alignment member 500.

[0080] For example, the photomask 40 can be loaded by the first transfer robot 210 from a suitable position C1 on the stage 410 to a first position C1 spaced apart by a predetermined interval. The first position C1 can be the diagonal direction in which the second guide member 430 is positioned relative to the suitable position C1. At the same time, the photomask that has undergone visual inspection in the stage unit is unloaded by the second transfer robot 310.

[0081] The platform 410 may include a base plate 412 and first to fourth guide members 420 to 450.

[0082] The base plate 412 has a larger diameter than the photomask 40. First to fourth guide members 420 to 450 are disposed at the corners of the base plate 412. Multiple sensors are mounted on the base plate 412. These sensors may be sensors for detecting the presence and alignment status of the photomask 40 placed on the stage 410.

[0083] The first guide member 420 can be mounted on the base plate 412 to support a portion of the first corner S1 where the first side surface 41 and the second side surface 42 of the photomask 40 meet.

[0084] Figure 7A This is a perspective view showing the first guide member. Figure 7B From Figure 7A The side view of the first guide member as seen from direction A1 is shown in the figure. Figure 7C From Figure 7A The side view of the first guide member as seen from direction A2.

[0085] Reference Figures 7A to 7C The first guide member 420 may include a first position determining block 420a and a second position determining block 420b.

[0086] The first position determining block 420a supports the first bottom angle S5 at the point where the bottom surface 49 of the photomask 40 and the first side surface 41 meet. The first position determining block 420a may include a first vertical surface 423a that contacts the first side surface 41 when the photomask 40 is properly aligned, a first inclined surface 422a that slopes downward inward from the lower end of the first vertical surface 423a, and an inclined surface 424a that slopes upward inward from the upper end of the first vertical surface.

[0087] The second position determining block 420b supports the second bottom angle S6 at the point where the bottom surface 49 of the photomask 40 and the second side surface 42 meet. The second position determining block 420b may include a second vertical surface 423b that contacts the second side surface 42 when the photomask 40 is properly aligned, a second inclined surface 422b that slopes downward inward from the lower end of the second vertical surface 423b, and an inclined surface 424b that slopes upward inward from the upper end of the second vertical surface.

[0088] When the photomask 40 is mounted on the stage 410, the first bottom corner S5 is supported on the first inclined surface 422a, and the second bottom corner S6 is supported on the second inclined surface 422b. Then, when the photomask 40 is aligned by the alignment member 500, the first side surface 41 contacts the first vertical surface 423a, and the second side surface 42 contacts the second vertical surface 423b. The dashed line in the figure represents the photomask before alignment.

[0089] Figure 8 This is a perspective view showing the second guide member.

[0090] Reference Figures 4A to 8 The second guide member 430 can be installed in the base plate 412 to support the second corner S2 where the third side surface 43 and the fourth side surface 44 of the photomask 40 meet.

[0091] The second guide member 430 may include a first reverse movement prevention surface 432 and a second reverse movement prevention surface 434. The first reverse movement prevention surface 432 is inclined to support the third bottom angle S7 of the photomask 40. For example, the first reverse movement prevention surface 432 is inclined upward in the outward direction away from the photomask. The second reverse movement prevention surface 434 is inclined to support the fourth bottom angle S8 of the photomask 40. The second reverse movement prevention surface 434 is inclined upward in the outward direction away from the photomask.

[0092] The first reverse movement prevention surface 432 and the second reverse movement prevention surface 434 have inclined surfaces with a reverse (uphill) shape to prevent the photomask 40 from returning after being aligned in place by the alignment member 500.

[0093] Figure 9 This is a schematic diagram used to describe the third guiding component.

[0094] The third guide member 440 can be installed in the base plate 412 to support a portion of the third corner S3 where the first side surface 41 and the third side surface 43 of the photomask 40 meet.

[0095] The third guide member 440 includes a third vertical surface 443 that contacts the first side surface when the photomask is aligned in the appropriate position, and a third inclined surface 442 that slopes downward in an inward direction from the lower end of the third vertical surface 443.

[0096] When the photomask 40 is mounted on the stage 410, the third bottom corner S5 is supported on the third inclined surface 442. Then, when the photomask 40 is aligned by the alignment member 500, the first side surface 41 contacts the third vertical surface 443.

[0097] Figure 10 This is a perspective view showing the fourth guide member.

[0098] The fourth guide member 450 can be mounted on the base plate 412 to support a portion of the fourth corner S4 where the second side surface 41 and the fourth side surface 44 of the photomask 40 meet.

[0099] The fourth guide member 450 includes a fourth vertical surface 453 that contacts the second side surface 42 when the photomask is aligned in the appropriate position, and a fourth inclined surface 452 that slopes downward in an inward direction from the lower end of the fourth vertical surface 453.

[0100] When the photomask 40 is mounted on the stage 410, the second bottom corner S6 is supported on the fourth inclined surface 452. Then, when the photomask 40 is aligned by the alignment member 500, the second side surface 42 contacts the fourth vertical surface 453.

[0101] As described above, by using line contact instead of surface-to-surface contact, the contact area of ​​the photomask 40 placed on the first to fourth guide members 420 to 450 is minimized, and since the bottom surface of the photomask 40 does not contact the first to fourth guide members 420 to 450, contamination and damage to the bottom surface of the photomask can be prevented.

[0102] Figure 11 This is a diagram used to explain the alignment components. Figure 12 This is an enlarged view used to describe the main part of the pushing finger.

[0103] Reference Figure 11 and Figure 12 The alignment member 500 (hereinafter referred to as the pushing member) pushes the photomask 40 from the second angle S2 to the first angle S1 in a diagonal direction (alignment direction). The pushing member 500 may include an actuator 510 and a pushing finger 520. The pushing finger 520 may be moved diagonally along a guide rail 512 by the actuator 510. The pushing finger 520 contacts the second angle S2 of the photomask 40. The pushing finger 520 may include a first finger 522 and a second finger 524. When the pushing finger 520 is moved forward in the alignment direction by the actuator 510, the first finger 522 contacts the third side surface 43, and the second finger 524 contacts the fourth side surface 44. The first finger 522 and the second finger 524 include an elastic member 530 for cushioning impact when in contact with the photomask 40. The photomask 40, placed on the stage 410, may be moved in the alignment direction by the pushing member 500.

[0104] Figure 13 and Figure 14 This is a diagram showing other examples of aligned components.

[0105] Reference Figure 13 and Figure 14 The actuating component 500a aligns the photomask 40 in the alignment direction in a non-contact manner by spraying clean, dry air (CDA) onto the third and fourth side surfaces. The clean, dry air supplied from the actuating component provides an antistatic effect on the photomask.

[0106] For example, the actuating member 500a may include a first air displacement nozzle 540a, a second air displacement nozzle 540b, and an air supply unit 548 for supplying high-pressure clean and dry air to the first air displacement nozzle 540a and the second air displacement nozzle 540b. The first air displacement nozzle 540a is configured to face the third side surface 43 and has a nozzle 542 for spraying air onto the third side surface 43. A plurality of nozzles 542 may be provided along the longitudinal direction of the third side surface 43.

[0107] The second air displacement nozzle 540b is configured to face the fourth side surface 44 and has a nozzle 544 for injecting air into the fourth side surface 44. Multiple nozzles 544 may be provided along the longitudinal direction of the fourth side surface 44.

[0108] The nozzle 542 of the first air shift nozzle 540a and the nozzle 544 of the second air shift nozzle 540b can have a diameter that increases with the distance from the second angle S2. This enlarged nozzle structure provides smooth movement of the photomask in the diagonal direction.

[0109] Since not all components or steps are essential in the exemplary embodiments described in this specification, the present invention may selectively include some components or steps. Furthermore, the steps do not necessarily have to be performed in the order described, so it is possible that a later-described step may be performed before a previously described step.

[0110] Furthermore, the exemplary embodiments described above are not necessarily carried out independently, but can be used alone or in combination with each other.

Claims

1. A photomask stage unit for aligning photomasks, the photomask stage unit comprising: A pushing member for aligning the photomask to position it in the appropriate location; as well as A guiding member for supporting the edge of the photomask and guiding the photomask to the appropriate position. The guiding component includes: A first guiding member for supporting a first corner, wherein the first and second side surfaces of the photomask intersect at the first corner; and A second guiding member, positioned diagonally opposite the first corner and supporting the second corner, wherein the third and fourth side surfaces of the photomask intersect at the second corner, and The pushing member pushes the photomask from the second corner to the first corner along a diagonal direction. The second guide component includes: A first reverse movement prevention surface, which supports the third bottom corner and is inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the third side surface intersect at the third bottom corner; and A second reverse movement prevention surface is used to support the fourth bottom corner and is inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the fourth side surface intersect at the fourth bottom corner.

2. The photomask stage unit according to claim 1, wherein, The first guiding component includes: A first positioning block, used to support a first bottom corner, wherein the bottom surface of the photomask and the first side surface intersect at the first bottom corner; and A second position determining block is used to support the second bottom corner, wherein the bottom surface of the photomask and the second side surface intersect at the second bottom corner.

3. The photomask stage unit according to claim 2, wherein, The first position determining block has: a first vertical surface that contacts the first side surface when the photomask is aligned in the appropriate position; and a first inclined surface that slopes downward in an inward direction from the lower end of the first vertical surface. The second position determining block has: a second vertical surface that contacts the second side surface when the photomask is aligned in the appropriate position, and a second inclined surface that slopes downward in an inward direction from the lower end of the second vertical surface.

4. The photomask stage unit according to claim 1, wherein, The pushing component includes: Actuator; and The finger is pushed, which moves along the diagonal direction via the actuator and contacts the second corner of the photomask.

5. The photomask stage unit according to claim 4, wherein, The pushing finger includes: a first finger and a second finger that respectively contact the third side surface and the fourth side surface, and The first finger and the second finger include elastic members for reducing vibration when in contact with the photomask.

6. The photomask stage unit according to claim 1, wherein, The pushing component includes: A first air displacement nozzle is configured to face the third side surface and spray air toward the third side surface; and A second air displacement nozzle is configured to face the fourth side surface and spray air toward the fourth side surface.

7. The photomask stage unit according to claim 6, wherein, The first air displacement nozzle and the second air displacement nozzle include injection holes arranged in a horizontal direction. The injection hole is configured such that its diameter increases with increasing distance from the second corner, and The air includes clean, dry air.

8. The photomask stage unit according to claim 1, further comprising: A third guiding member is used to support a third corner, wherein the first side surface and the third side surface of the photomask intersect at the third corner; as well as A fourth guiding member, which supports a fourth corner and is positioned diagonally opposite to the third corner, wherein the second side surface and the fourth side surface of the photomask intersect at the fourth corner. The third guiding member comprises: a third vertical surface that contacts the first side surface when the photomask is aligned at the appropriate position; and a third inclined surface that slopes downward inward from the lower end of the third vertical surface. The fourth guiding member has a fourth vertical surface that contacts the second side surface when the photomask is aligned in the appropriate position; And a fourth inclined surface that slopes downward inward from the lower end of the fourth vertical surface.

9. A photomask accumulator, comprising: A loading unit is used to receive a container storing a photomask and open the container to expose the photomask; as well as An inspection unit, connected to the loading unit, reads information related to the photomask to obtain information about the photomask. The inspection unit includes: A stage on which the photomask is mounted; and An alignment module is used to push and align the photomask in one direction when it is placed on the stage. The platform includes: A first guiding member for supporting a first corner, wherein the first and second side surfaces of the photomask intersect at the first corner; and A second guide member, which supports the second corner and is positioned diagonally opposite the first corner, wherein the third and fourth side surfaces of the photomask intersect at the second corner, and The alignment module includes a pushing member for pushing the photomask diagonally from the second corner toward the first corner. The second guide member has: A first reverse movement prevention surface, which supports the third bottom corner and is inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the third side surface intersect at the third bottom corner; and A second reverse movement prevention surface is used to support the fourth bottom corner and is inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the fourth side surface intersect at the fourth bottom corner.

10. The photomask storage device according to claim 9, wherein, The pushing component includes: Actuator; and The finger is pushed, which moves along the diagonal direction via the actuator and contacts the second corner of the photomask.

11. The photomask storage device according to claim 10, wherein, The pushing finger includes: The fingers, which respectively contact the third side surface and the fourth side surface; and An elastic member is used to reduce vibration when the finger contacts the photomask.

12. The photomask storage device according to claim 9, wherein, The pushing member displaces the photomask in a non-contact manner by spraying clean, dry air onto the third and fourth side surfaces.

13. The photomask storage device according to claim 9, wherein, The pushing component includes: A first air displacement nozzle is configured to face the third side surface and spray air toward the third side surface; and A second air displacement nozzle is configured to face the fourth side surface and spray air toward the fourth side surface. The first air displacement nozzle and the second air displacement nozzle include injection holes arranged in a horizontal direction, and The injection hole is configured such that its diameter increases with the distance from the second corner.

14. The photomask storage device according to claim 9, wherein, The first guiding component includes: A first positioning block, used to support a first bottom corner, wherein the bottom surface and the first side surface of the photomask intersect at the first bottom corner; and A second positioning block, used to support the second bottom corner, wherein the bottom surface of the photomask and the second side surface intersect at the second bottom corner, and Each of the first position determination block and the second position determination block has: The first end is tilted upward in an outward direction away from the photomask; A vertical surface that extends vertically from the outer end of the first end; and The second end slopes upward in an outward direction from the upper end of the vertical surface.

15. The photomask storage device according to claim 9, further comprising: A third guiding member is used to support a third corner, wherein the first side surface and the third side surface of the photomask intersect at the third corner; as well as A fourth guiding member, which supports a fourth corner and is positioned diagonally opposite the third corner, wherein the second side surface and the fourth side surface of the photomask intersect at the fourth corner, and Each of the third guide member and the fourth guide member has: The first end is inclined upward in an outward direction away from the photomask; and A vertical surface that extends vertically from the outer end of the first end and is configured to face the first side surface.

16. A photomask reservoir, comprising: A loading unit is used to receive a container storing a photomask and open the container to expose the photomask; An inspection unit, connected to the loading unit, reads information related to the photomask to inspect the photomask; as well as A storage unit for storing the photomask inspected by the inspection unit. The inspection unit includes: A stage, the stage comprising: a first guide member for supporting a first corner, wherein a first side surface and a second side surface of the photomask intersect at the first corner; and a second guide member positioned diagonally opposite the first corner and for supporting a second corner, wherein a third side surface and a fourth side surface of the photomask intersect at the second corner; A pushing member, configured to push and align the photomask diagonally from the second corner toward the first corner while the photomask is placed on the first and second guiding members; and A vision module is used to acquire information from or inspect the photomask, which is positioned at an appropriate location on the platform by the pushing member. The second guide member has: A first reverse movement prevention surface, which supports the third bottom corner and is inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the third side surface intersect at the third bottom corner; and A second reverse movement prevention surface is used to support the fourth bottom corner and is inclined upward in an outward direction away from the photomask, wherein the bottom surface of the photomask and the fourth side surface intersect at the fourth bottom corner.

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