Calibration apparatus, machining system and calibration method

CN116367956BActive Publication Date: 2026-09-15TRUMPF LASER GMBH CO KG
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Patent Information

Application Number
CN202180069805.X
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Priority Date
2020-10-12
Filing Date
2021-10-07
Publication Date
2026-09-15
Estimated Expiration
2041-10-07

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Abstract

The invention, in conjunction with all the figures, relates to an apparatus (10) for aligning a plurality of optical tools of a processing machine to a common focal position. The apparatus (10) has a light source (56, 58) and a light sensor (60, 62) for detecting and emitting light (38) through an aperture (14) of a diaphragm. The invention also relates to a processing system having such an apparatus (10) and a plurality of optical tools. Finally, the invention relates to a method for aligning a light emitting tool and a light detecting optical tool by means of such an apparatus (10).
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Description

Technical Field

[0001] This invention relates to a calibration apparatus for a machining system having multiple optical tools, wherein the calibration apparatus includes a sensor assembly for detecting light. The invention also relates to a method for calibrating a machining system having multiple optical tools, and to a machining system having multiple optical tools. Background Technology

[0002] Modern machine tools with optical tools, especially laser cutting machines, often have additional optical tools in addition to the actual machining tools. These additional optical tools can be used, for example, to support the machining tools and / or for quality assurance purposes. This improves the machining process performed using the machine tool.

[0003] In order to use optical tools more accurately during the machining process, the optical tools must be calibrated with respect to their focal positions. For this purpose, it is generally known to calibrate the optical tools separately from each other, and for this purpose, a separate calibration device can be used for each optical tool.

[0004] DE 10 2004 043 072 A1 discloses an apparatus for processing using a laser beam. The apparatus has a laser head movable relative to at least one workpiece, optical components for orienting and focusing the laser beam onto an effective area, and at least one camera arranged at the laser head and pointing towards the effective area. The laser head can be positioned in a spatially fixed calibration station, wherein the calibration station contains a calibration object within the effective area. The calibration station is constructed of a flat plate. Fixed patterns and tracks are located on the surface of the plate. For better visibility, the patterns can be formed by self-emitting light elements. Light-emitting diodes (LEDs) can be provided as self-emitting light elements, located in recesses in the surface of the plate, and each is covered with a diffusion panel. A device for beam measurement is integrated at the center of the plate. For this purpose, light receivers arranged in a matrix are provided in the surface.

[0005] DE 10 2018 219 129 B3 discloses a method for determining translational and / or rotational deviations between the measurement coordinate system of a measuring mirror scanner and the machining coordinate system of a machining mirror scanner. The measuring mirror scanner is tiltable about two axes and causes a measuring beam, generated, for example, by a coherence tomography machine, to be two-dimensionally redirected. The machining mirror scanner is also tiltable about two axes and causes the measuring beam redirected by the measuring mirror scanner and the machining beam to be two-dimensionally redirected onto the workpiece. The measuring beam reflected at the workpiece returns along the path of the incident measuring beam and is detected by a spatially resolved measuring sensor to obtain spatially resolved information related to the workpiece. Furthermore, at the zero position of the measuring mirror scanner, the reflected measuring beam is imaged into the sensor image of the measuring sensor at a previously known image position. To determine the translational deviation between the machining and measurement coordinate systems, the xy-focus position deviation of the machining beam relative to the center of a pinhole aperture detector arranged on a workpiece support plane is calculated. This is accomplished through the following steps: The pinhole aperture is scanned in the xy grid using a machining beam directed by a machining mirror scanner, and the laser output detected at each grid point is analyzed and processed by a detector surface positioned downstream of the pinhole aperture. The machining mirror scanner is then fixed at a scanning position corrected for the obtained xy focal position deviation, where the focal position of the machining beam is precisely at the center of the pinhole aperture. With the machining mirror scanner fixed in this manner, the height of the pinhole aperture is detected spatially with the aid of a measuring sensor by scanning the pinhole aperture using the measuring beam directed by the measuring mirror scanner. Based on the deviation between the previously known image position corresponding to the focal position of the machining beam in the sensor image from the measuring sensor and the center of the pinhole aperture detected in terms of height, the translational deviations Δx and Δy between the machining coordinate system and the measuring coordinate system can be determined.

[0006] Purpose of the invention

[0007] The purpose of this invention is to achieve simple and accurate calibration of multiple optical tools in a processing system relative to each other. Summary of the Invention

[0008] According to the present invention, this objective is achieved by the calibration device according to claim 1, the method according to claim 13, and the processing system according to claim 16.

[0009] Calibration device according to the present invention

[0010] This objective is thus achieved by a calibration device for a processing system having multiple optical tools. The calibration device has a housing with an aperture, a sensor assembly for detecting light incident through the aperture, and a light source assembly for emitting light through the aperture.

[0011] The calibration device is used to calibrate optical tools to a common focal position. To calibrate the focal position (“focusing”), the actual focal position of the respective optical tool can first be detected. Next, the focus is set according to the aperture. In particular, the respective optical tool can be switched from an uncalibrated state to a calibrated state by “scharfstellen” of the aperture. In principle, the same calibration device is used to calibrate multiple optical tools of the processing system, particularly all optical tools. Calibration can be performed particularly quickly and easily by using the calibration device according to the invention to calibrate multiple or all optical tools of the processing system, unlike when using separate devices to calibrate individual optical tools. Furthermore, the matching of the focal positions of the optical tools is improved by a common reference position (defined by the aperture).

[0012] The sensor assembly has at least one sensor. The sensor assembly is configured to detect the light intensity of incident light, either indirectly or directly. For this purpose, the sensor assembly can be configured to detect temperature and / or brightness. By detecting the light intensity, conclusions can be drawn about the light incident through the aperture. If the light emitted by the light-emitting optical tool is known, conclusions related to the focal position of the light-emitting optical tool relative to the aperture can be drawn by detecting the light incident through the aperture. For example, if the detected light corresponds to the light emitted by the optical tool, the focal position corresponds to the position of the aperture (i.e., the focal point is located within the aperture).

[0013] A light source assembly is used to illuminate the aperture of the calibration device. In other words, the aperture is highlighted by the emission of light emitted by the light source assembly. Based on the light emitted through the aperture, the focal position of the optical probe can be calibrated. Here, the light source assembly can be configured to emit light with a defined wavelength that can be detected by the optical tool to be calibrated. In particular, the light source assembly can be constructed to emit light of different wavelengths. In this way, highlighting the aperture by illuminating it with light of a specific wavelength can be specifically matched to different optical tools to be calibrated.

[0014] The term “light” is understood in this document to mean electromagnetic radiation, especially electromagnetic radiation with a wavelength of at least 10 nm and / or at most 1 mm.

[0015] Except for the aperture, the housing is preferably enclosed on all sides. This prevents dust from entering the housing. The housing is typically constructed of multiple parts. This simplifies the arrangement and / or replacement of components, for example, during the production and / or maintenance of the calibration equipment.

[0016] In principle, the light source assembly and sensor assembly are arranged within a housing. In this way, incident light can be detected by the sensor assembly under defined conditions. Similarly, light can be emitted from the light source assembly and pass through the aperture under defined conditions. Calibration interference factors (such as ambient light) are thus minimized. This improves calibration accuracy.

[0017] In a preferred embodiment, the calibration device has a circuit board arranged in a housing, and the light source assembly and / or sensor assembly are held on the circuit board. Therefore, it is advantageous to arrange the electronic components (circuit board, sensor assembly, light source assembly) in only one manufacturing step and arrange the circuit board in the housing in only another manufacturing step.

[0018] The circuit board is preferably arranged parallel to the aperture with the aperture diameter. In other words, the circuit board can be arranged orthogonally to the aperture axis. This prevents optical distortion. The circuit board is preferably held and clamped in the housing, especially between two housing parts that are detachable from each other. In this way, the position of the circuit board in the housing can be effectively secured.

[0019] According to a preferred extension of this embodiment, the sensor assembly is arranged on the side of the circuit board facing away from the aperture. A light guide structure is provided to guide light incident through the aperture to the sensor assembly. In other words, the circuit board acts as a light shield for the sensor assembly. In this way, the sensor assembly can be protected from direct exposure to incident light. This effectively prevents damage to the sensor assembly. Regardless of the light shield position of the sensor assembly, the light guide structure is able to detect light incident through the aperture.

[0020] The light guide structure preferably has reduced transmittance to decrease the intensity of incident light. The light guide structure preferably has a transmittance of up to 90%, particularly preferably up to 75%, and very particularly preferably up to 50%. More preferably, the light guide structure has a transmittance of at least 10%, particularly preferably at least 20%, and very particularly preferably at least 40%. Due to the light guide structure, the intensity of the incident light can thus be reduced to a level suitable for detection by the sensor assembly.

[0021] In a particularly preferred extension, the light guide structure has a transparent sleeve, especially a PET (polyethylene terephthalate) sleeve, through which the circuit board is held within the housing. The sleeve thus serves both to guide the light and to hold the circuit board. The light guide structure can preferably be formed from the transparent sleeve. The light guiding function can therefore be advantageously achieved by only one light guide structure. The transparent sleeve typically extends on the side of the circuit board facing the aperture and / or away from the aperture. This simplifies the light guiding structure for optical coupling input and / or coupling output. To hold the circuit board within the housing, the transparent sleeve can clamp the edge of the circuit board. In other words, the transparent sleeve is arranged between the edge of the circuit board and the wall of the housing. In this way, incident light can reach the sensor assembly only via the light guide structure, resulting in further improvements in accuracy.

[0022] In a preferred extension, the calibration device has an optical element arranged between the aperture and the circuit board to redirect light incident through the aperture. Specifically, the optical element redirects light incident along the aperture axis. This advantageously redirects the incident light towards the direction of the light guide structure, further improving light guidance to the sensor assembly. The optical element, in principle, allows light radiated by the light source assembly to exit through the aperture.

[0023] In a preferred embodiment of the calibration device, the sensor assembly has at least one photodiode and / or at least one temperature sensor. Light incident through the aperture can be detected directly by measuring light intensity and / or indirectly by measuring the temperature rise within the housing. The photodiode can detect the intensity of visible light, in particular.

[0024] The light source assembly is preferably positioned near the aperture. In this way, light can be emitted through the aperture with high energy efficiency.

[0025] In a particular configuration, the optical elements are designed to redirect light emitted from the light source assembly along the direction of the aperture. This further improves the emission of light through the aperture. In this case, the optical elements perform a dual function. First, the light emitted from the light source assembly is focused onto the aperture; second, the light incident through the aperture is scattered or guided across the light source assembly. In this way, the light source assembly can be protected from the incident light, and the aperture can also be effectively illuminated.

[0026] In a further preferred embodiment, the light source assembly has at least one first light source, particularly a light-emitting diode (LED), which emits light with a wavelength of at least 760 nm, preferably at least 1100 nm, particularly preferably at least 1500 nm, and preferably at most 2000 nm, particularly preferably at most 1600 nm. This enables the detection of the aperture using infrared-based optical tools (e.g., pyrometers, thermal imagers, etc.).

[0027] In one extended embodiment, the first light source is positioned on the aperture axis of the aperture. This facilitates the direct emission of light through the aperture and provides uniform illumination.

[0028] In another preferred embodiment, the light source assembly has at least one second light source, particularly a light-emitting diode (LED), for emitting light with a wavelength of up to 760 nm, particularly preferably up to 650 nm, and more preferably at least 610 nm, particularly preferably at least 640 nm. This enables the detection of the aperture using red-light-based optical tools (e.g., distance measuring devices, seam position adjustment devices, etc.).

[0029] The at least one second light source is preferably arranged at a certain distance from the aperture axis. This allows the first light source to be arranged on the aperture axis. Typically, the light source assembly has multiple, especially at least two, and particularly preferably at least three, second light sources. These multiple second light sources are preferably arranged in a uniform distribution around the aperture. This allows the aperture to be uniformly illuminated.

[0030] In a preferred embodiment, the calibration apparatus has a test plate extending orthogonally to the aperture axis. The test plate is used to calibrate the common orientation of the optical tools. Common orientation can be characterized by a consistent coordinate system for the optical tools and / or by predefined interrelationships between the coordinate systems. In the calibration state, the optical axes of the optical tools can extend parallel to each other. The extent of the test plate, orthogonal to the aperture axis, simplifies the calibration of orientation.

[0031] The test plate is preferably made of metal, especially aluminum. This is advantageous for the stability, and especially for the strength and / or stiffness of the test plate.

[0032] According to a preferred extension of the calibration equipment, the test plate has at least a partially coated, preferably anodic, surface. The coating protects the surface of the test plate. The coating also supports the calibration of optical tools, for example, by their color or color difference.

[0033] Furthermore, a preferred extension is that the test plate has a surface structure defined for calibrating optical tools. This surface structure differs from the rest of the test plate. In addition to the surface structure, the entire remaining surface of the test plate may also be coated. Compared to the surrounding area, the surface structure may have, for example, differences in color, geometry, height, and / or roughness. In particular, the surface structure may be configured as recesses or cutouts (notches), protrusions, markings, and / or scales. The examples listed herein should be understood as exemplary only and not as exhaustive. The surface structure simplifies the orientation calibration of optical tools.

[0034] In a particularly preferred extension, the test plate has at least one, especially at least two, and particularly preferably at least four, recesses and / or protrusions with height jumps defined parallel to the aperture axis. In other words, the recesses or protrusions are offset parallel to the aperture axis relative to a reference plane of the test plate adjacent to them. This allows for accurate orientation determination via angular correlation measurements of the recesses and / or protrusions.

[0035] The test plate may have a blank reference surface adjacent to the recesses and / or protrusions, particularly a metallic blank reference surface. In other words, the reference surface has an uncoated surface. This improves the measurement accuracy of the recesses and / or protrusions by taking the reference surface into account, and therefore also improves the accuracy during the calibration of the orientation of optical components.

[0036] In a preferred extension configuration, the test plate has at least one test scale with a defined reference spacing. By measuring the defined reference spacing, the orientation of the optical tool can be determined with particular accuracy.

[0037] According to the method of the present invention

[0038] The objective of this invention is also achieved through a method for calibrating a processing system having at least one light-emitting optical tool and at least one light-detecting optical tool by means of a calibration device according to the invention as described above. This method comprises the following steps:

[0039] A) Use a sensor assembly to detect light emitted by a light-emitting optical tool that passes through the aperture and sets the focal position of the light-emitting optical tool according to the aperture.

[0040] B) Use a light-detecting optics tool to detect the light emitted by the light source assembly that passes through the aperture, and set the focal position of the light-detecting optics tool according to the aperture.

[0041] In the method steps preceding step A), the focal positions of the light emitting tool and the light probing tool are preferably (pre-) positioned near the aperture.

[0042] A light-emitting tool has at least one light-emitting element, wherein the emitted light is used to directly achieve the tool's target. Light-emitting tools are, for example, machining lasers and / or laser rangefinders.

[0043] A light detection tool has at least one light detection element capable of analyzing light, particularly light emanating from and / or reflecting from surfaces that emit and / or reflect light. The light detection tool is, for example, a thermal imager and / or an optical camera.

[0044] In step A), the light incident through the aperture is detected by the sensor assembly, particularly by the photodiode of the sensor assembly. Typically, the light emitting tool moves along the aperture in a plane parallel to the aperture (i.e., perpendicular to the aperture axis) according to a test pattern. The test pattern typically has multiple test points with defined deflections. It can be configured such that, for each deflection, the light emitting tool emits light in a defined manner and the proportion of light incident through the aperture can be detected. In other words, for each defined deflection, the amount of light incident through the aperture is recorded. In the uncalibrated state at the focal position, the result is an asymmetric distribution of the detected light on the test pattern, based on which the focal position of the light emitting tool can be set. The focal position can be calibrated parallel to the aperture axis by moving the light emitting tool until the light intensity detected by the sensor assembly reaches its maximum value.

[0045] The focal position of the light probe can be set similarly to the previous description. The light probe moves perpendicularly and / or parallel to the aperture axis according to the test pattern. For each deflection, the light radiated by the aperture can be detected by the light probe. The detected radiated light depends here on the deflection position of the light probe on the aperture. Based on the light detected according to the position, the focal position of the light probe can be set.

[0046] The test pattern preferably has at least 9, especially at least 25, and particularly preferably at least 81 defined deflections. In this way, the focal position can be set particularly accurately. More preferably, the test pattern has defined deflections in the directions of two, particularly preferably three, coordinate axes of the light emitting tool. In other words, the defined deflections have X and Y components and preferably a Z component. In this way, the focal position can be set in the corresponding coordinate directions.

[0047] If the calibration equipment has a test plate, the method may include the following further method steps:

[0048] C) Mark the test identifier on the test board using a light emission tool;

[0049] D) The focal position of the light-emitting tool is checked by using a light-detecting optical tool to detect the test mark.

[0050] The test plate preferably has at least one defined section for marking (preferably for laser engraving) test markings. One or more defined areas preferably do not have surface structures.

[0051] Method step C) is preferably performed before and after method step A). ​​In this case, it is advantageous to perform the check by determining the deviation between the two marked test identifiers.

[0052] The deviation between test markers is preferably determined by a photodetector, particularly a camera with an image processing system. In this way, the optical tools of the processing system can be advantageously used for mutual control.

[0053] If the test board has a surface structure, the following further method steps can be set:

[0054] E) Deflect light in a defined manner to detect optical tools;

[0055] F) Measure at least one of the surface structures using a photodetector optical tool;

[0056] G) Compare the measured value with the stored reference value;

[0057] H) Directional light detection tools based on the deviation between measured values ​​and reference values.

[0058] Method steps E) to H) are preferably performed after the focal position of the optical detection tool has been set. Therefore, it is advantageous for the accuracy of the orientation calibration to begin from a common reference point.

[0059] Method steps E) to G) and, if necessary, H) are preferably performed multiple times. In this way, the accuracy of the calibration can be further improved.

[0060] To measure surface structures, light reflected from the surface structures can be detected by a photodetector and subsequently analyzed. For analysis purposes, the photodetector can be configured to include analysis processing components, particularly software. For example, the photodetector may include a camera and an image processing system for measuring the images recorded by the camera.

[0061] To better detect light reflected from surface structures, light detection tools can be configured to have light-emitting elements for emitting light. For example, a camera can have an exposure element for improving image quality.

[0062] The processing system according to the present invention

[0063] The objective of this invention is further achieved by having a calibration device according to the invention as described above and a processing system having multiple optical tools. Multiple optical tools can be calibrated using a single calibration device, such that a common focal position and defined orientation relative to each other, particularly parallel optical axes, are established. This can be achieved using the method according to the invention as described above.

[0064] The processing system may have at least one photodetector optical tool and at least one photoemitting optical tool. The optical tools are preferably arranged at a common processing head of the processing system. If the optical tools move together via the processing head, their focal positions relative to each other remain unchanged.

[0065] Further advantages of the invention will become apparent from the description and drawings. According to the invention, the above-described features and those yet to be further presented can be used individually or in combination with any desired convenience. The illustrated and described embodiments should not be construed as an exhaustive list, but rather as exemplary features used to illustrate the invention. Attached Figure Description

[0066] Figure 1 An embodiment of a calibration device with a housing and a test plate according to the present invention is shown in a schematic top view;

[0067] Figure 2 It shows the passage along the section line AA Figure 1 A schematic cross-sectional view of the calibration equipment in the diagram;

[0068] Figure 3 It shows the passage along the section line BB. Figure 1 A schematic cross-sectional view of the calibration equipment in the diagram;

[0069] Figure 4 A processing system with multiple optical tools according to the present invention is shown in the schematic diagram;

[0070] Figure 5 A flowchart of the method according to the present invention is shown. Detailed Implementation

[0071] Figure 1 A calibration device 10 according to the present invention is shown, having a housing 12 having an aperture 14.

[0072] The housing 12 is centrally positioned on the test plate 16. For this purpose, the test plate 16, in the case of the invention, has a housing cutout 18 through which a housing protrusion 20 of the housing 12 engages. To prevent the test plate 16 from rotating on the housing 12, the housing 12 has centering pins 22 disposed in a centering cutout 24 of the test plate 16. The test plate 16 is removable from the housing 12 for easy replacement.

[0073] The test plate 16 has multiple surface structures in the form of test markings 26, recesses 28, reference surfaces 30, and test scales 32. In addition to the surface structures, the surface of the test plate 16 can be coated, particularly anodized. The coating can be designed to be colored or non-colored, such as black.

[0074] Test markings 26 are generated on test plate 16 by a light emitting tool (not shown), particularly a laser. Test markings 26 can be generated before, during, and / or after calibration and are used to check the focal position of the light emitting tool.

[0075] The recess 28 has a blank (unanodized) bottom surface and a blank (unanodized) side surface.

[0076] The test scale 32 is constructed as a blank surface with defined spacing.

[0077] Figure 2 The calibration device 10, comprising a housing 12 and a test plate 16, is shown in a side view. For better explanation, the test plate 16 is shown as being cut along section line AA (see [reference]). Figure 1 ).

[0078] In this invention, the test plate 16 has a carrier plate 34 and an anodized layer 36. The anodized layer 36 is used to optically distinguish between surface structures and regions of the test plate 16, which are configured to generate test markings 26 by means of an optical tool (not shown).

[0079] Figure 3 A side view of the calibration device 10 is shown. For the purpose of better explanation, the housing 12 and the test plate 16 are shown as being sectioned along section line BB (see [reference]). Figure 1 ).

[0080] Light 38 passes through the aperture 14 along the aperture axis 40 and enters the housing 12. Optical element 42 is arranged in the housing 12 below the aperture 14. Optical element 42 deflects the incident light 38 from the aperture axis 40 at an angle 44.

[0081] A circuit board 46, having a carrier plate 48 and a printed conductor layer 50, is arranged in the housing 12 below the optical element 42. The circuit board 46 carries the sensor assembly 52 and the light source assembly 54.

[0082] The light source assembly 54 is arranged on the side of the circuit board 46 or the carrier plate 48 facing the aperture 14. In this invention, the light source assembly 54 has a first light source 56 and two second light sources 58. The first light source 56 and the second light source 58 are configured as light-emitting diodes.

[0083] The first light source 56 is configured to emit infrared light, for example, with a wavelength of 1550 nm. The first light source 56 can be arranged along the aperture axis 40 between the optical element 42 and the carrier plate 48 of the circuit board 46. In other words, the first light source 56 is arranged on the aperture axis 40 of the aperture 14. The emission direction of the first light source 56 is in the direction of the aperture 14. In this way, the infrared light emitted by the first light source 56 can radiate through the aperture 14 particularly directly.

[0084] A second light source 58 is arranged on the support plate 48 at a certain radial distance from the aperture axis 40 and emits red light, for example, with a wavelength of 645 nm. The second light source 58 is preferably arranged uniformly on the support plate 48 and corresponding to the contour of the aperture 14. For example, if the aperture 14 is circular, the second light source 58 is arranged in a circular shape. The number of second light sources 58 preferably increases with the increase of the radial distance from the aperture axis 40 to uniformly illuminate the aperture 14. The second light source 58 is preferably oriented parallel to the aperture axis 40.

[0085] Similarly, it is conceivable that the second light source 58 is arranged on the support plate 48 along the aperture axis 40, and the first light source 56 is arranged at a certain radial distance from the aperture axis 40. Accordingly, the preceding description should be understood in a similar manner.

[0086] By using optical element 42 to redirect the incident light 38 passing through aperture 14, the light source assembly 54 is protected from the influence of the light intensity of the incident light 38. In other words, optical element 42 redirects the incident light 38 so that it passes over the light source assembly 54.

[0087] Optical element 42 redirects the infrared and / or red light emitted by light source assembly 54 in the opposite direction to the aperture 14. In other words, the operation of optical element 42 depends on the direction in which it is illuminated. In particular, optical element 42 can redirect the light emitted by the two second light sources 58 onto the aperture.

[0088] The sensor assembly 52 is disposed on the side of the circuit board 46 or printed conductor layer 50 opposite to the aperture 14. The sensor assembly 52 here includes a photodiode 60 and a temperature sensor 62.

[0089] A photodiode 60 is configured to detect the light intensity of light 38 incident through the aperture 14. In this invention, the photodiode 60 is arranged on the side of the circuit board 46 opposite to the aperture 14 in order to reduce the light intensity of the light 38 to be detected to a range measurable by the photodiode. In other words, the light intensity of light 38 is too high when it is incident through the aperture 14 and must be reduced before it is detected.

[0090] For this purpose, the housing 12 has a light guide element, which in this invention is embodied in the form of a light guide sleeve 64. The light guide sleeve 64 is arranged between the edge of the circuit board 46 and the side wall 66 of the housing 12. For better light guiding, the light guide sleeve 64 extends not only into the region of the housing 12 facing the aperture 14, but also into the region of the housing 12 away from the aperture 14.

[0091] Incident light 38, deflected by optical element 42, is guided from the side of circuit board 46 facing aperture 14 to the side facing away from aperture 14 by means of light guide sleeve 64. To reduce light intensity, the light guide element has reduced transmittance. The transmittance of the light guide element can be matched to the light intensity of the incident light 38. In other words, some of the incident light 38 is absorbed within the light guide element.

[0092] In this invention, the light guide sleeve 64 is constructed to hold the circuit board 46. For this purpose, the light guide sleeve 64 has a radially circumferential groove for clamping the circuit board 46.

[0093] A plug connector 68 for establishing data and current connections 70 is arranged at circuit board 46.

[0094] Figure 4 A machining system 100 is shown, having a machining machine 112 arranged within a machining space 110.

[0095] The processing machine 112 is arranged on the processing table 114 and has a processing head 116. In this invention, the processing head 116 includes three optical tools, specifically two light emitting tools and one light detection tool.

[0096] In the illustrated embodiment, the light emitting tools are a processing laser 118a and a measuring laser 118b. The light detection tool in this invention is a camera 120.

[0097] The processing laser 118a and camera 120 share a common focusing optics 122. This achieves the same orientation of the laser beam 124 and the camera image 126. The measuring laser 118b has two line lasers 128 for measuring the workpiece 130 in front of and behind the weld seam produced by the laser beam 124.

[0098] The optical tools of the processing head 116 have a common focal position 132. In order to perform the calibration method described below for establishing the common focal position 132, the processing head 116 can be moved to a position above the calibration device 10.

[0099] Figure 5 A schematic sequence of methods for calibrating a machining system according to the present invention is shown. Calibration device 10 (see...) can be used. Figures 1 to 3 For machining system 100 (see...) Figure 4 Execute this method.

[0100] In method step 202, the uncalibrated machining head 116 is positioned approximately above the calibration device 10. The theoretical focal position (ideally expected focal position) of the optical tool of the machining head 116 should here coincide with the aperture 14.

[0101] Next, in method step 204, light is emitted in a defined manner in the direction of aperture 14 by a light emitting tool, particularly a processing laser 118a or a measuring laser 118b, and the light 38 incident through aperture 14 is detected by sensor assembly 52.

[0102] In method step 206, the light-emitting tool is preferably deflected in a defined manner, particularly multiple times. Method step 204 is repeated for each defined deflection. The number, magnitude, and direction of the deflections can be determined here by testing a pattern.

[0103] After performing steps 204 and 206, the actual focal position 132 of the light emitting tool is determined in method step 208. The actual focal position 132 can be determined by the ratio of the actually detected light to the theoretically detectable light for each defined deflection. For example, in the case of an ideal (overlapping) actual focal position 132 above aperture 14, the ratio of the actually detected light 38 can be 100% of the emitted light.

[0104] In method step 210, the actual focal position of the light-emitting tool is set according to the desired focal position, and in particular according to the aperture 14. Here, the theoretical focal position of the optical tool is corrected for the deviation from the determined focal position.

[0105] To check the focus position of such calibration, you can finally set and repeat steps 202 to 208 of the method.

[0106] Alternatively, the focal position of the light-emitting optical tool can be checked by a light-probing optical tool. Here, a test mark 26 is permanently marked on the test plate 16 by the light-emitting optical tool. The test mark 26 is then detected by the light-probing optical tool and its deviation from a reference is checked. In particular, the reference can be in the form of the test mark 26 marked before calibrating the light-emitting optical tool.

[0107] Then, in step 212, the focal point corresponding to the set focal position of the light-emitting optical tool is aligned with the aperture 14. Subsequent calibration of other optical tools is therefore performed relative to the calibrated light-emitting tool. The optical tools of the processing head 116 can thus be set to a common focal position.

[0108] In subsequent method step 214, light is emitted by the light source assembly 54 of the calibration device 10 and radiates through the aperture 14. The emitted light is detected by the light detection tool to be calibrated, in particular the camera 120.

[0109] In method step 216, the actual focal position of the photodetector optical tool is determined based on the detected light. Preferably, an image of the aperture 14 is generated using the photodetector, and the actual focal position is determined by identifying the illuminated aperture 14 within the image. In particular, the actual focal position can be determined by the positional deviation of the aperture 14 relative to the center of the image. With appropriate correction, the focal position of the photodetector can be set in step 217.

[0110] In addition, the actual focal position can be determined in a manner similar to steps 204 to 208 of the method for a light-detecting tool to be calibrated.

[0111] After calibrating the focal position of the optical tool in the machining head 116, the orientation of the optical tool can be calibrated (e.g., in the case of rotation and / or tilt).

[0112] Therefore, in method step 218, at least one optical tool, particularly a photodetector, can be deflected from its focal position in a defined manner. Next, in method step 220, the defined surface structure, particularly a geometrically defined surface structure, is measured from the deflected position using the optical tool. The resulting measurement value therefore depends on the actual orientation of the optical tool, such as tilt. Preferably, method steps 218 and 220 are performed multiple times, particularly according to a predefined scheme.

[0113] In subsequent method step 222, the measured value is compared with a stored reference value under correct orientation of the optical tool, and in method step 224, the orientation of the optical tool is set according to the deviation between the measured value and the reference value.

[0114] Taking all the accompanying drawings into account, the present invention relates to an apparatus 10 for calibrating a plurality of optical tools of a processing machine 112 to a common focal position 132. The apparatus 10 has light sensors 60, 62 and light sources 56, 58 to detect and emit light 38 through an aperture 14. The invention also relates to a processing system 100 having such an apparatus 10 and a plurality of optical tools. Finally, the invention relates to a method 200 for calibrating light-emitting and light-detecting optical tools using such an apparatus 10.

[0115] List of reference numerals

[0116] 10. Calibration equipment;

[0117] 12. Shell;

[0118] 14. Aperture diameter;

[0119] 16 test boards;

[0120] 18. The shell cutout in test plate 16;

[0121] 20. Shell protrusion of shell 12;

[0122] 22. Centering pin of housing 12;

[0123] The centering cut in test board 16;

[0124] 26 Test Identifiers;

[0125] 28 recess;

[0126] 30 reference planes;

[0127] 32 Test scale;

[0128] 34. Bearing plate;

[0129] 36. Anodized layer;

[0130] 38. Light incident through aperture 14;

[0131] 40 aperture axis;

[0132] 42. Optical components;

[0133] 44 degrees;

[0134] 46. ​​Circuit board;

[0135] 48. Load-bearing plate;

[0136] 50 Printed conductor layers;

[0137] 52. Sensor assembly;

[0138] 54. Light source assembly;

[0139] 56. First light source;

[0140] 58. Second light source;

[0141] 60. Photodiode;

[0142] 62 Temperature sensor;

[0143] 64. Light guide sleeve;

[0144] 66. Sidewalls of shell 12;

[0145] 68. Plug connector;

[0146] 70. Data connection and current connection;

[0147] 100 processing system;

[0148] 110 Processing space;

[0149] 112 processing machines;

[0150] 114 machining station;

[0151] The processing head of machine 112 is used in machining machine 116.

[0152] 118a is used for processing lasers;

[0153] 118b Measurement laser;

[0154] 120 cameras;

[0155] 122 Focusing optics;

[0156] 124 laser beams;

[0157] 126 Camera images;

[0158] 128. Measuring the laser beam;

[0159] 130 workpieces;

[0160] 132. Focal point;

[0161] 200 methods;

[0162] 202 positioning machining head 116;

[0163] 204. Light is emitted and detected by a light-emitting tool as it passes through the aperture of the aperture.

[0164] 206 Deflects the light emission tool in a defined manner;

[0165] 208. Determine the focal position of the light-emitting tool;

[0166] 210. Set up the light emission tool;

[0167] 212. The focus is positioned on the aperture 14;

[0168] 214 emits light through the light source assembly 54;

[0169] 216. The focal position is determined using a light detection tool;

[0170] 217. Set the focus position of the light detection tool;

[0171] 218 deflection light detection tool;

[0172] 220 Surface structure is measured using optical detection tools;

[0173] 222 Compare the measured value with the stored reference value;

[0174] 224 Directional light detection tool.

Claims

1. A calibration device (10) for a processing system having at least one light-emitting optical tool and at least one light-detecting optical tool. The calibration equipment has - Housing (12), the housing having an aperture (14). - Sensor assembly (52), the sensor assembly being used to detect light (38) emitted by the light-emitting optical tool that is incident through the aperture (14), wherein, The focal position of the light-emitting optical tool is set according to the aperture (14), and - Light source assembly (54), which is used to emit light through the aperture (14). The at least one photodetector optical tool is configured to detect light emitted by the light source assembly (54) that passes through the aperture (14), wherein the focal position of the photodetector optical tool is set according to the aperture (14).

2. The calibration device according to claim 1, further comprising a circuit board (46) disposed in the housing (12), wherein the light source assembly (54) and / or the sensor assembly (52) are held on the circuit board.

3. The calibration device according to claim 2, wherein, The sensor assembly (52) is arranged on the side of the circuit board (46) opposite to the aperture (14), wherein a light guide structure is provided to guide the light (38) incident through the aperture (14) to the sensor assembly (52).

4. The calibration device according to claim 3, wherein, The light guide structure has a light-transmitting sleeve (64), and the circuit board (46) is held in the housing (12) by means of the light-transmitting sleeve.

5. The calibration device according to any one of claims 2 to 4, the calibration device having an optical element (42) arranged between the aperture (14) and the circuit board (46) to redirect light (38) incident through the aperture (14).

6. The calibration device according to any one of claims 1 to 4, wherein, The sensor assembly (52) has a photodiode (60) and / or a temperature sensor (62).

7. The calibration device according to any one of claims 1 to 4, wherein, The light source assembly (54) has at least one first light source (56) for emitting light with a wavelength of at least 760 nm.

8. The calibration device according to claim 7, wherein, The at least one first light source is a light-emitting diode (LED).

9. The calibration apparatus according to claim 7, wherein, The at least one first light source is used to emit light with a wavelength of at least 1100 nm.

10. The calibration apparatus according to claim 9, wherein, The at least one first light source is used to emit light with a wavelength of at least 1500 nm.

11. The calibration apparatus according to claim 7, wherein, The at least one first light source is used to emit light with a wavelength of up to 2000 nm.

12. The calibration apparatus according to claim 11, wherein, The at least one first light source is used to emit light with a wavelength of up to 1600 nm.

13. The calibration device according to any one of claims 1 to 4, wherein, The light source assembly (54) has at least one second light source (58) for emitting light with a wavelength of up to 760 nm.

14. The calibration apparatus according to claim 13, wherein, The at least one second light source is a light-emitting diode.

15. The calibration apparatus according to claim 13, wherein, The at least one second light source is used to emit light with a wavelength of up to 650 nm.

16. The calibration apparatus according to claim 13, wherein, The at least one second light source is used to emit light with a wavelength of at least 610 nm.

17. The calibration apparatus according to claim 16, wherein, The at least one second light source is used to emit light with a wavelength of at least 640 nm.

18. The calibration apparatus according to any one of claims 1 to 4, the calibration apparatus further comprising a test plate (16) extending orthogonally to the aperture axis (40) of the aperture (14).

19. The calibration apparatus according to claim 18, wherein, The test plate (16) has a partially coated surface (36).

20. The calibration apparatus according to claim 19, wherein, The test plate (16) has an anodized surface (36).

21. The calibration apparatus according to claim 18, wherein, The test plate (16) has a surface structure defined for calibrating the optical tool.

22. The calibration apparatus according to claim 18, wherein, The test plate (16) has at least one recess (28) and / or at least one protrusion, the at least one recess and / or at least one protrusion having a defined height jump parallel to the aperture axis (40).

23. The calibration apparatus according to claim 22, wherein, The test plate (16) has a blank reference surface (30) adjacent to the recess (28) and / or the protrusion.

24. The calibration apparatus according to claim 18, wherein, The test plate (16) has at least one test scale (32) with a defined reference spacing.

25. A method for calibrating a processing system having at least one light-emitting optical tool and at least one light-detecting optical tool using a calibration device (10) according to any one of claims 1 to 24, the method comprising the following steps: A) Using the sensor assembly (52), light (38) emitted by the light-emitting optical tool that is incident through the aperture (14) is detected, and the focal position of the light-emitting optical tool is set according to the aperture (14); B) Using the light detection optical tool, the light emitted by the light source assembly (54) that passes through the aperture (14) is detected, and the focal position of the light detection optical tool is set according to the aperture (14).

26. The method of claim 25, wherein, The calibration device (10) has a test plate (16), and the method has the following further method steps: C) Mark test identifiers (26) on the test board (16) using the light-emitting optical tool; D) The focal position of the light-emitting optical tool is checked by detecting the test mark (26) using the light-detecting optical tool.

27. The method according to claim 25 or 26, wherein, The calibration device also has a test plate (16) extending orthogonally to the aperture axis (40) of the aperture (14), wherein the test plate (16) has a surface structure for calibrating the optical tool, and the method has the following further method steps: E) Deflect the light-detecting optics in a defined manner; F) Measuring at least one surface structure in the surface structure using the optical detection tool; G) Compare the measured value with the stored reference value; H) Orient the light detection tool based on the deviation between the measured value and the reference value.

28. A processing system (100) having a calibration device (10) according to any one of claims 1 to 24 and having a plurality of optical tools.

29. The processing system (100) according to claim 28, wherein, The optical tools are arranged on the common processing head (116) of the processing system (100).

Citation Information

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