A method of polishing a flange end face of a tubular target

Abstract

The present application relates to a kind of polishing methods of tubular target flange end face, the polishing method includes using annular polishing fixture to the flange end face of tubular target sequentially carries out first polishing and second polishing;The annular polishing fixture is provided with annular polishing medium area;The ring width of the annular polishing medium area is ≥ the ring width of the flange end face of the tubular target;The time of the first polishing is less than the time of the second polishing.The polishing method provided by the present application, by the design of polishing process, utilizes specific annular polishing fixture and polishing process cooperation, realizes the efficient polishing of the flange end face of tubular target, and the uniformity and gloss of the roughness of polishing surface after polishing have significantly improved.

Description

Technical Field

[0001] This invention relates to the field of surface treatment, and more specifically to a polishing method for the flange end face of a tubular target. Background Technology

[0002] Currently, physical vapor deposition (PVD) is a commonly used method for preparing thin films and coatings on workpiece surfaces to achieve mechanical or optoelectronic effects. It has wide applications in semiconductors, microelectronics, magnetic recording, mold making, and decorative applications. The target material, as the source material in PVD, is a key material for preparing thin films and coatings. Currently, target materials are mainly divided into two shapes: planar targets and tubular targets.

[0003] For example, CN115725943A discloses a method for preparing aluminum-based tubular targets, including: cladding assembly, raw material mixing, powder filling, cladding degassing, hot isostatic pressing (HIP), and finished product processing. This method combines the target forming and the bonding process between the target and the back tube into one step, eliminating the bonding process, significantly shortening the production cycle and reducing production costs. A zinc-containing bonding layer is formed between the outer wall of the back tube and the inner wall of the target as a metallurgical transition layer, which enhances the bonding strength between the target and the back tube and the heat transfer during sputtering, making it suitable for high-power sputtering. The preparation of aluminum-based tubular targets based on the HIP process avoids the formation of brittle aluminum-based intermetallic compounds, providing a useful reference for the preparation of aluminum-based multi-element tubular targets.

[0004] CN114394818A discloses a method for preparing a large aspect ratio ITO tubular target and a mold for its fabrication, relating to the technical field of ITO tubular target preparation methods. The method includes the following steps: Step 1, uniformly mixing indium oxide powder and tin oxide powder at a weight ratio of 90:10; Step 2, calcining the mixed powder to form an ITO mixed powder; A tapered steel core is used to give the inner diameters of the upper and lower ends of the ITO tubular blank a natural taper, which can reduce the deviation in the inner diameters of the upper and lower ends caused by the inconsistent shrinkage rate from the lower to the upper end due to friction between the ITO tubular blank and the firing plate during sintering. Simultaneously, using highly rounded zirconia spheres that do not react with the ITO tubular blank as the firing plate allows for the relative free sliding or misalignment of the zirconia spheres, reducing the shrinkage obstruction during sintering of the ITO tubular blank from bottom to top, thus achieving uniform shrinkage of the inner diameters of the upper and lower ends of the large aspect ratio tubular target.

[0005] However, tubular targets usually require installation during use, and the installation structure is usually connected through a flange structure. However, when the flange end face of the tubular target is mechanically polished, there is an uneven surface roughness, which leads to poor sealing effect during use after connection. Summary of the Invention

[0006] In view of the problems existing in the prior art, the purpose of the present invention is to provide a polishing method for the flange end face of a tubular target material, so as to solve the problem that the surface roughness of the polished surface is uneven when mechanically polishing the flange end face of a tubular target material, resulting in poor sealing effect during use.

[0007] To achieve this objective, the present invention adopts the following technical solution:

[0008] The present invention provides a polishing method for the flange end face of a tubular target, the polishing method comprising using an annular polishing fixture to sequentially perform a first polishing and a second polishing on the flange end face of the tubular target;

[0009] The annular polishing fixture is provided with an annular polishing medium area;

[0010] The annular width of the annular polishing medium region is greater than or equal to the annular width of the flange end face of the tubular target.

[0011] The time for the first polishing is less than the time for the second polishing.

[0012] The polishing method provided by this invention, through the design of the polishing process and the use of a specific annular polishing fixture in conjunction with the polishing process, achieves efficient polishing of the flange end face of the tubular target material, and significantly improves the uniformity of the roughness and gloss of the polished surface after polishing.

[0013] As a preferred technical solution of the present invention, the polishing medium in the annular polishing medium area is set by pasting.

[0014] As a preferred technical solution of the present invention, the polishing medium in the annular polishing medium zone of the first polishing is a 600-700 mesh polishing medium, such as 600 mesh, 610 mesh, 620 mesh, 630 mesh, 640 mesh, 650 mesh, 660 mesh, 670 mesh, 680 mesh, 690 mesh or 700 mesh, etc., but not limited to the listed values, other unlisted values ​​in this range are also applicable.

[0015] As a preferred technical solution of the present invention, the rotational speed of the annular polishing fixture in the first polishing process is 20-30 r / min, for example, it can be 20 r / min, 20.5 r / min, 21 r / min, 21.5 r / min, 22 r / min, 22.5 r / min, 23 r / min, 23.5 r / min, 24 r / min, 24.5 r / min, 25 r / min, 25.5 r / min, 26 r / min, 26.5 r / min, 27 r / min, 27.5 r / min, 28 r / min, 28.5 r / min, 29 r / min, 29.5 r / min or 30 r / min, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0016] As a preferred technical solution of the present invention, the first polishing time is 30-45s, for example, it can be 30s, 30.5s, 31s, 31.5s, 32s, 32.5s, 33s, 33.5s, 34s, 34.5s, 35s, 35.5s, 36s, 36.5s, 37s, 37.5s, 38s, 38.5s, 39s, 39.5s, 40s, 40.5s, 41s, 41.5s, 42s, 42.5s, 43s, 43.5s, 44s, 44.5s or 45s, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0017] As a preferred technical solution of the present invention, the polishing medium in the annular polishing medium zone of the second polishing is an 800-900 mesh polishing medium, such as 800 mesh, 810 mesh, 820 mesh, 830 mesh, 840 mesh, 850 mesh, 860 mesh, 870 mesh, 880 mesh, 890 mesh or 900 mesh, etc., but not limited to the listed values, other unlisted values ​​within this range are also applicable.

[0018] As a preferred technical solution of the present invention, the rotational speed of the annular polishing fixture in the second polishing process is 40-60 r / min, for example, it can be 40 r / min, 41 r / min, 42 r / min, 43 r / min, 44 r / min, 45 r / min, 46 r / min, 47 r / min, 48 r / min, 49 r / min, 50 r / min, 51 r / min, 52 r / min, 53 r / min, 54 r / min, 55 r / min, 56 r / min, 57 r / min, 58 r / min, 59 r / min or 60 r / min, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0019] As a preferred technical solution of the present invention, the second polishing time is 1-2 minutes, for example, it can be 1 minute, 1.05 minutes, 1.1 minutes, 1.15 minutes, 1.2 minutes, 1.25 minutes, 1.3 minutes, 1.35 minutes, 1.4 minutes, 1.45 minutes, 1.5 minutes, 1.55 minutes, 1.6 minutes, 1.65 minutes, 1.7 minutes, 1.75 minutes, 1.8 minutes, 1.85 minutes, 1.9 minutes, 1.95 minutes or 2 minutes, but is not limited to the listed values, and other unlisted values ​​within this range are also applicable.

[0020] As a preferred embodiment of the present invention, the tubular target material is made of one of aluminum, copper or titanium.

[0021] As a preferred technical solution of the present invention, the polishing method includes using an annular polishing fixture to sequentially perform a first polishing and a second polishing on the flange end face of the tubular target.

[0022] The annular polishing fixture is provided with an annular polishing medium area; the polishing medium in the annular polishing medium area is provided by means of pasting;

[0023] The annular width of the annular polishing medium region is greater than or equal to the annular width of the flange end face of the tubular target.

[0024] The time for the first polishing is less than the time for the second polishing;

[0025] The polishing medium in the annular polishing medium zone of the first polishing process is a 600-700 mesh polishing medium; the rotation speed of the annular polishing fixture in the first polishing process is 20-30 r / min; and the polishing time of the first polishing process is 30-45 s.

[0026] The polishing medium in the annular polishing medium zone of the second polishing process is an 800-900 mesh polishing medium; the rotation speed of the annular polishing fixture in the second polishing process is 40-60 r / min; the polishing time of the second polishing process is 1-2 min.

[0027] The tubular target material is made of one of aluminum, copper, or titanium.

[0028] Compared with existing technical solutions, the present invention has the following beneficial effects:

[0029] The polishing method provided by this invention improves the polishing fixture and polishing process, achieving efficient polishing of the flange end face of the tubular target material. After polishing, the gloss of the flange end face is significantly improved, and the uniformity of the roughness of the flange end face is significantly improved, which is beneficial to improving the sealing performance of the flange during installation and use, thereby improving the performance of the tubular target material. Attached Figure Description

[0030] Figure 1 This is a schematic diagram of the annular polishing fixture used in the embodiments of the present invention;

[0031] Figure 2 This is a schematic diagram of the flange end face of the tubular target material used in this embodiment of the invention.

[0032] In the diagram: 1 - Annular polishing medium area.

[0033] The present invention will now be described in further detail. However, the examples described below are merely simplified examples of the present invention and do not represent or limit the scope of protection of the present invention. The scope of protection of the present invention is determined by the claims. Detailed Implementation

[0034] To better illustrate the present invention and facilitate understanding of its technical solutions, typical but non-limiting embodiments of the present invention are as follows:

[0035] For example, the annular polishing fixture used in this embodiment is as follows: Figure 1 As shown, its main body is an annular boss structure, with the annular shape representing the annular polishing medium area 1. The diameter of the boss is less than or equal to the inner diameter of the tubular target material to ensure that the annular polishing fixture can match the tubular target material. The polishing fixture is also equipped with a structure connected to the driving device to ensure that the polishing fixture can rotate stably and controllably, thereby achieving polishing. The flange end face of the tubular target material targeted in the embodiment is shown below. Figure 2 As shown.

[0036] Example 1

[0037] This embodiment provides a polishing method for the flange end face of a tubular target material. The polishing method includes using an annular polishing fixture to perform a first polishing and a second polishing on the flange end face of the tubular target material in sequence.

[0038] The annular polishing fixture is provided with an annular polishing medium area; the polishing medium in the annular polishing medium area is set by pasting.

[0039] The annular polishing medium region has a ring width equal to the flange end face of the tubular target.

[0040] The polishing medium in the annular polishing medium zone of the first polishing process is a 600-mesh polishing medium; the rotation speed of the annular polishing fixture in the first polishing process is 25 r / min; and the polishing time of the first polishing process is 37 s.

[0041] The polishing medium in the annular polishing medium zone of the second polishing process is an 800-mesh polishing medium; the rotation speed of the annular polishing fixture in the second polishing process is 45 r / min; the polishing time of the second polishing process is 1 min;

[0042] The tubular target is made of aluminum.

[0043] After polishing, the surface analysis parameters of the flange end face are detailed in Table 1.

[0044] Example 2

[0045] This embodiment provides a polishing method for the flange end face of a tubular target material. The polishing method includes using an annular polishing fixture to perform a first polishing and a second polishing on the flange end face of the tubular target material in sequence.

[0046] The annular polishing fixture is provided with an annular polishing medium area; the polishing medium in the annular polishing medium area is set by pasting.

[0047] The annular polishing medium region has a ring width equal to the flange end face of the tubular target.

[0048] The polishing medium in the annular polishing medium zone of the first polishing process is a 700-mesh polishing medium; the rotation speed of the annular polishing fixture in the first polishing process is 20 r / min; and the polishing time of the first polishing process is 45 s.

[0049] The polishing medium in the annular polishing medium zone of the second polishing process is a 900-mesh polishing medium; the rotation speed of the annular polishing fixture in the second polishing process is 60 r / min; the polishing time of the second polishing process is 1 min;

[0050] The tubular target is made of aluminum.

[0051] After polishing, the surface analysis parameters of the flange end face are detailed in Table 1.

[0052] Example 3

[0053] This embodiment provides a polishing method for the flange end face of a tubular target material. The polishing method includes using an annular polishing fixture to perform a first polishing and a second polishing on the flange end face of the tubular target material in sequence.

[0054] The annular polishing fixture is provided with an annular polishing medium area; the polishing medium in the annular polishing medium area is set by pasting.

[0055] The annular polishing medium region has a ring width equal to the flange end face of the tubular target.

[0056] The polishing medium in the annular polishing medium zone of the first polishing process is a 600-mesh polishing medium; the rotation speed of the annular polishing fixture in the first polishing process is 30 r / min; and the polishing time of the first polishing process is 30 s.

[0057] The polishing medium in the annular polishing medium zone of the second polishing process is a 900-mesh polishing medium; the rotation speed of the annular polishing fixture in the second polishing process is 40 r / min; the polishing time of the second polishing process is 2 min.

[0058] The tubular target is made of titanium.

[0059] After polishing, the surface analysis parameters of the flange end face are detailed in Table 1.

[0060] Example 4

[0061] This embodiment provides a polishing method for the flange end face of a tubular target material. The polishing method includes using an annular polishing fixture to perform a first polishing and a second polishing on the flange end face of the tubular target material in sequence.

[0062] The annular polishing fixture is provided with an annular polishing medium area; the polishing medium in the annular polishing medium area is provided by means of pasting;

[0063] The annular polishing medium region has a ring width equal to the flange end face of the tubular target.

[0064] The polishing medium in the annular polishing medium zone of the first polishing process is a 700-mesh polishing medium; the rotation speed of the annular polishing fixture in the first polishing process is 25 r / min; and the polishing time of the first polishing process is 40 s.

[0065] The polishing medium in the annular polishing medium zone of the second polishing process is an 800-mesh polishing medium; the rotation speed of the annular polishing fixture in the second polishing process is 55 r / min; the polishing time of the second polishing process is 1.5 min.

[0066] The tubular target is made of copper.

[0067] After polishing, the surface analysis parameters of the flange end face are detailed in Table 1.

[0068] Example 5

[0069] The only difference from Example 1 is that the first polishing time is 1 minute. After polishing, the surface analysis parameters of the flange end face are detailed in Table 1.

[0070] Example 6

[0071] The only difference from Example 1 is that the rotation speed during the first polishing is 45 r / min. After polishing, the surface analysis parameters of the flange end face are detailed in Table 1.

[0072] In the above embodiments, the surface roughness of the flange end face is tested using a WBJC-800 surface topography scanner. Based on the principle of triangular laser ranging and moving average filtering, the surface roughness of the flange end face with an evaluation area of ​​8mm*120mm is scanned and analyzed to measure the peak and valley height values ​​of the flange end face surface. After filtering, the values ​​are calculated using software. Simultaneously, the surface roughness of the flange end face is evaluated by testing the number of Rpcs with different C values. Specifically, a TIME-3202 roughness meter is used to test the surface roughness of the flange end face, with a sampling length L = 0.8mm, an evaluation length Ln = 5×Lmm, and a measurement range of -40 to +40μm. An RC filter is used, with C values ​​set to 0.25μm, 0.5×Ra, 1×Ra, 1.5×Ra, 2×Ra, 2.5×Ra, and 3×Ra. Rpc is defined as the number of roughness profile elements per unit length that continuously cross the specified upper and lower profile cutoff lines c1 and c2. In practice, c1 is taken as equal to c2, and the distance between them is also called the bandwidth. They are usually located on either side of the centerline or another straight line specified parallel to the centerline, see PREN 10049 for details.

[0073] Table 1

[0074]

[0075] According to the data in Table 1, in Examples 1-4, the peak values ​​of 2.5×Ra and 3×Ra are basically 0, indicating that there are no abnormal points on the flange end face surface and the surface roughness is more uniform. However, in Examples 5 and 6, the peak values ​​of 2.5×Ra and 3×Ra still have values, indicating that there are abnormal points on the flange end face surface with values ​​higher than 3×Ra, and the surface roughness is uneven. Therefore, the polishing method provided by this invention, through the design of the polishing process and the use of a specific annular polishing fixture in conjunction with the polishing process, achieves efficient polishing of the flange end face of the tubular target material, and significantly improves the uniformity of the polished surface roughness and gloss.

[0076] The present invention is described in detail through the above embodiments, but the present invention is not limited to the above detailed structural features, that is, it does not mean that the present invention must rely on the above detailed structural features to be implemented. Those skilled in the art should understand that any improvements to the present invention, equivalent substitutions for the components used in the present invention, additions of auxiliary components, and selection of specific methods, etc., all fall within the protection scope and disclosure scope of the present invention.

[0077] The preferred embodiments of the present invention have been described in detail above. However, the present invention is not limited to the specific details in the above embodiments. Within the scope of the technical concept of the present invention, various simple modifications can be made to the technical solution of the present invention, and these simple modifications all fall within the protection scope of the present invention.

[0078] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not describe the various possible combinations separately.

[0079] Furthermore, various different embodiments of the present invention can be combined in any way, as long as they do not violate the spirit of the present invention, they should also be regarded as the content disclosed by the present invention.

Claims

1. A polishing method for the flange end face of a tubular target, characterized in that, The polishing method includes using an annular polishing fixture to perform a first polishing and a second polishing on the flange end face of the tubular target material in sequence. The annular polishing fixture is provided with an annular polishing medium area; The polishing medium in the annular polishing medium area can be set by pasting; The annular width of the annular polishing medium region is greater than or equal to the annular width of the flange end face of the tubular target. The time for the first polishing is less than the time for the second polishing; The rotational speed of the annular polishing fixture in the first polishing process is 20-30 r / min; The first polishing time is 30-45 seconds.

2. The polishing method as described in claim 1, characterized in that, The polishing medium in the annular polishing medium zone of the first polishing process is a 600-700 mesh polishing medium.

3. The polishing method as described in claim 1, characterized in that, The polishing medium in the annular polishing medium zone of the second polishing process is an 800-900 mesh polishing medium.

4. The polishing method of claim 1, wherein In the second polishing process, the rotation speed of the annular polishing fixture is 40-60 r / min.

5. The polishing method of claim 1 wherein, The second polishing time is 1-2 minutes.

6. The polishing method of claim 1 wherein, The tubular target material is made of one of aluminum, copper, or titanium.

7. The polishing method of claim 1 wherein the polishing pad is a fixed abrasive pad. The polishing method includes using an annular polishing fixture to perform a first polishing and a second polishing on the flange end face of the tubular target material in sequence. The annular polishing fixture is provided with an annular polishing medium area; the polishing medium in the annular polishing medium area is provided by means of pasting; The annular width of the annular polishing medium region is greater than or equal to the annular width of the flange end face of the tubular target. The time for the first polishing is less than the time for the second polishing; The polishing medium in the annular polishing medium zone of the first polishing process is a 600-700 mesh polishing medium; the rotation speed of the annular polishing fixture in the first polishing process is 20-30 r / min; and the polishing time of the first polishing process is 30-45 s. The polishing medium in the annular polishing medium zone of the second polishing process is an 800-900 mesh polishing medium; the rotation speed of the annular polishing fixture in the second polishing process is 40-60 r / min; the polishing time of the second polishing process is 1-2 min; The tubular target material is made of one of aluminum, copper, or titanium.

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