Multipole field device and method of multipole field device processing
By metallizing and groove-cutting on an insulating base to form conductive and insulating components, the complex structure and processing difficulties of traditional multipole field devices are solved, and simplified processing and high-precision alignment of multipole field devices are achieved, making them suitable for charged particle beam instruments and equipment.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SUZHOU SILICON TECH CO LTD
- Filing Date
- 2021-12-30
- Publication Date
- 2026-07-21
AI Technical Summary
Traditional multipole field devices have complex structures and require complicated and difficult-to-control fabrication processes, especially in terms of electrode assembly symmetry and precision.
By employing a metallizable insulating base, conductive and insulating parts are formed on the insulating base through a metallization process. The electrode block is divided into multiple mutually insulated electrode blocks using grooves, realizing the integrated processing of multi-field devices, simplifying the processing technology and improving the alignment accuracy.
It simplifies the structure and facilitates the fabrication of multi-field devices, improves the alignment accuracy of electrodes, simplifies the assembly process, and is suitable for functions such as deflection and aberration correction in charged particle beam instruments and equipment.
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Figure CN116417311B_ABST