Oxime ester compound, photoinitiator containing the same, photocurable resin composition and application thereof

CN116444460BActive Publication Date: 2025-02-28CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD +1
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Patent Information

Application Number
CN202210017800.9
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2022-01-07
Publication Date
2025-02-28
Estimated Expiration
2042-01-07

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Abstract

The present invention provides an oxime ester compound, a photoinitiator containing the same, a photocurable resin composition and an application. The oxime ester compound has a structure shown in any one of formulas (I) to (IV): The oxime ester compound having the above-mentioned structure of formula (I) to formula (IV) provided in the present application has a stable structure, is not easy to produce small molecule fragments, and has excellent antioxidant and polymerization inhibition properties. The photocuring process is not affected by oxygen in the environment; at the same time, it has a high sensitivity and a high photoinitiator activity (especially suitable for photoinitiator systems under 385nm illumination conditions). Introducing the oxime ester compound into the oxime ester photoinitiator can significantly improve the antioxidant and polymerization inhibition properties of the oxime ester photoinitiator; at the same time, it reduces the generation of small molecule fragments. The above-mentioned oxime ester photoinitiator is particularly suitable for photocuring under 385nm illumination conditions.
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Citation Information

Patent Citations

  • Oxime ester compound and polymerization initiator containing said compound

    CN107635960A

  • Polymerizable fluorene photoinitiator, photocurable composition containing polymerizable fluorene photoinitiator and application of polymerizable fluorene photoinitiator

    CN112876584A

  • Cyclopentadiketoxime ester and applications thereof

    CN103998422A

  • Black photosensitive resin composition and use thereof

    CN107463067A

  • Photosensitive resin composition and application thereof

    CN108170002A

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