A coating uniformity monitoring and regulation system and method

Abstract

The embodiment of the present application provides a coating uniformity monitoring and regulating system and method, which comprises: a vacuum winding coating device, which comprises a unwinding mechanism, an evaporation mechanism for coating a base film and a winding mechanism; a temperature measuring device for measuring the temperature value of the evaporation mechanism; a surface resistance testing device for measuring the surface resistance value of the base film; and a control device for controlling the base film transmission speed of the unwinding mechanism and / or the heating power of the evaporation mechanism according to the temperature value of the evaporation mechanism and the surface resistance value of the base film, so that the thickness of the coating layer along the moving direction of the base film has uniformity. The present application can realize more consistent thickness uniformity of the coating film in the moving direction based on the matching of temperature control and coating speed.

Description

TECHNICAL FIELD

[0001] The present application relates to a uniformity monitoring and regulation control system for vacuum roll-to-roll coating process, in particular to a coating uniformity problem of MD direction (coating direction) verification, and more particularly to a coating uniformity monitoring and regulation control system and method. BACKGROUND

[0002] In the field of vacuum coating, especially for large-area flexible substrate surface coating equipment system, the coating method includes vacuum magnetron sputtering coating and vacuum thermal evaporation system coating. Vacuum thermal evaporation system coating is usually divided into two aspects. One is to use an evaporation boat to coat, for example, the most common coating in the field of packaging film, that is, a related wire feeding mechanism continuously feeds coating materials to the surface of the evaporation boat at high temperature. When the material contacts or almost contacts the surface of the evaporation boat, it is instantly vaporized and deposited on the substrate surface due to the condition of being much higher than the melting temperature of the material. The advantage of this method is that the related mechanism has a very fast heating and cooling process, but there is a fatal problem that as the use time of the evaporation boat increases, serious corrosion pits appear on the surface. When the evaporated material is placed near the corrosion pit, the evaporation process is easy to form sputtering phenomenon, thereby causing the flexible substrate to be burned and the use of the coating material to be inhibited.

[0003] Based on such problems, another technical means is developed, that is, the evaporated material is first placed in a high-temperature-resistant container, which is inside an electric heating device and a temperature maintaining / measuring system. When the electric heating device is turned on, the temperature of the high-temperature-resistant container rises, causing the evaporated material inside to change from solid to liquid to gas, and finally the material is deposited on the substrate surface. This method has the advantage that the state of the evaporated material is relatively stable, and the problem of sputtering and burning holes caused by the evaporated material is less likely to occur, thereby more significantly avoiding the application defects of the coating product.

[0004] However, this method also has some disadvantages. For example, the system heats the container by electric heating and heat conduction, and then the container heats the evaporated material, finally achieving the effect of evaporating the evaporated material. The whole system has a relatively slow heating process, and it takes a longer time for the evaporated material in the container and the container / heat preservation material to reach a relatively stable equilibrium temperature. Especially in this process, as the temperature of the evaporated material rises, the amount of evaporation increases, and the amount of evaporation is unstable. Under the condition of unstable evaporation, a large amount of evaporated material is wasted, especially evaporated onto the coating baffle, which will greatly reduce the actual coating area of the loaded evaporated material.

[0005] On the other hand, since the electric heating component of the heater changes its own working heat output as the thermal environment temperature increases, the film layer uniformity in the MD direction is poor when the baffle is directly opened to coat the film at a certain speed because the evaporation amount in the initial state is unstable. SUMMARY

[0006] Therefore, the embodiment of the present application aims to provide a film coating uniformity monitoring and control system and method to solve the problems in the prior art.

[0007] In a first aspect, the embodiment of the present application provides a film coating uniformity monitoring and control system, which comprises:

[0008] The vacuum winding film coating device comprises a unwinding mechanism, an evaporation mechanism for evaporating the base film, and a winding mechanism;

[0009] A temperature measuring device is used to measure the temperature value of the evaporation mechanism;

[0010] A surface resistance testing device is used to measure the surface resistance value of the base film;

[0011] A control device is used to control the base film transmission speed of the unwinding mechanism and / or the heating power of the evaporation mechanism according to the temperature value of the evaporation mechanism and the surface resistance value of the base film, so that the thickness of the coating layer along the moving direction of the base film has uniformity.

[0012] In some possible implementations, the control device is specifically configured to determine the real-time base film transmission speed of the unwinding mechanism according to the functional relationship between the base film transmission speed at the preset surface resistance threshold value and the temperature value of the evaporation mechanism, and the real-time temperature value of the evaporation mechanism.

[0013] In some possible implementations, the evaporation mechanism comprises a first evaporation system and a second evaporation system, and the first evaporation system is arranged upstream of the second evaporation system along the base film conveying path;

[0014] The temperature measuring device comprises a first temperature probe arranged on the first evaporation system for measuring the first temperature value of the first evaporation system, and a second temperature probe arranged on the second evaporation system for measuring the second temperature value of the second evaporation system;

[0015] The surface resistance testing device comprises a first surface resistance tester arranged on the base film conveying path between the first evaporation system and the second evaporation system, and used for measuring the first surface resistance value of the current coated surface of the base film; and a second surface resistance tester arranged on the base film conveying path between the second evaporation system and the winding mechanism, and used for measuring the total surface resistance value of the coating layer formed on the double surfaces of the base film, and obtaining the second surface resistance value of the other coated surface according to the difference between the total surface resistance value and the first surface resistance value.

[0016] In some possible implementation manners, the control device is specifically configured to: when the first surface resistance value reaches the preset surface resistance threshold value, determine a real-time base film conveying speed according to a first functional relationship between the base film conveying speed under the preset surface resistance threshold value and the temperature value of the first evaporation system, and a real-time temperature value of the first evaporation system; obtain an ideal temperature value of the second evaporation system according to a second functional relationship between the base film conveying speed under the preset surface resistance threshold value and the temperature value of the second evaporation system, and the real-time base film conveying speed; and adjust the heating power of the second evaporation system according to a comparison result between the ideal temperature value of the second evaporation system and an actual temperature value of the second evaporation system.

[0017] In some possible implementation manners, the control device is specifically configured to:

[0018] If the ideal temperature value of the second evaporation system is greater than the actual temperature value of the second evaporation system, the heating power of the second evaporation system is controlled to be increased, and the heating power of the second evaporation system is controlled to be greater than the heating power of the first evaporation system; if the ideal temperature value of the second evaporation system is less than the actual temperature value of the second evaporation system, the heating power of the second evaporation system is controlled to be reduced, and the heating power of the second evaporation system is controlled to be less than the heating power of the first evaporation system.

[0019] In some possible implementation manners, the control device is specifically configured to:

[0020] When the first surface resistance value reaches the preset surface resistance threshold value earlier than the second surface resistance value, the real-time base film conveying speed is determined according to the first functional relationship between the base film conveying speed under the preset surface resistance threshold value and the temperature value of the first evaporation system, and the real-time temperature value of the first evaporation system; the ideal temperature value of the second evaporation system is obtained according to the second functional relationship between the base film conveying speed under the preset surface resistance threshold value and the temperature value of the second evaporation system, and the real-time base film conveying speed; the heating power of the second evaporation system is adjusted according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system; or,

[0021] When the second surface resistance reaches the preset surface resistance threshold value prior to the first surface resistance, a real-time base film transmission speed of the unwinding mechanism is determined according to a second function relationship between the base film transmission speed at the preset surface resistance threshold value and a temperature value of the second evaporation system, and a real-time temperature value of the second evaporation system; an ideal temperature value of the first evaporation system is obtained according to a first function relationship between the base film transmission speed at the preset surface resistance threshold value and a temperature value of the first evaporation system, and the real-time base film transmission speed; and the heating power of the first evaporation system is adjusted according to a comparison result between the ideal temperature value of the first evaporation system and an actual temperature value of the first evaporation system.

[0022] In a second aspect, a coating uniformity monitoring and regulating method is provided, and the method comprises:

[0023] obtaining a temperature value of an evaporation mechanism;

[0024] obtaining a surface resistance value of a base film;

[0025] controlling a base film transmission speed of an unwinding mechanism and / or a heating power of the evaporation mechanism according to the temperature value of the evaporation mechanism and the surface resistance value of the base film, so that the thickness of the coating layer along the moving direction of the base film has uniformity.

[0026] In some possible embodiments, the controlling of the base film transmission speed of the unwinding mechanism according to the temperature value of the evaporation mechanism and the surface resistance value of the base film specifically comprises:

[0027] determining a real-time base film transmission speed of the unwinding mechanism according to a function relationship between the base film transmission speed at a preset surface resistance threshold value and a temperature value of the evaporation mechanism, and a real-time temperature value of the evaporation mechanism.

[0028] In some possible embodiments, the evaporation mechanism comprises a first evaporation system and a second evaporation system, the first evaporation system is arranged upstream of the second evaporation system along a base film conveying path; and the method specifically comprises:

[0029] obtaining a first temperature value of the first evaporation system and a second temperature value of the second evaporation system;

[0030] obtaining a first surface resistance value of a current coating surface of the base film, obtaining a total surface resistance value of the coating layer formed on both surfaces of the base film, and obtaining a second surface resistance value of another coating surface according to a difference between the total surface resistance value and the first surface resistance value;

[0031] determining a real-time base film conveying speed according to a first function relationship between the base film conveying speed at the preset areal resistance threshold value and a temperature value of the first evaporation system, and a real-time temperature value of the first evaporation system, when the first areal resistance value reaches the preset areal resistance threshold value;

[0032] obtaining an ideal temperature value of the second evaporation system according to a second function relationship between the base film conveying speed at the preset areal resistance threshold value and a temperature value of the second evaporation system, and the real-time base film conveying speed;

[0033] adjusting a heating power of the second evaporation system according to a comparison result between the ideal temperature value of the second evaporation system and an actual temperature value of the second evaporation system.

[0034] In some possible implementation manners, the adjusting the heating power of the second evaporation system according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system specifically includes:

[0035] if the ideal temperature value of the second evaporation system is greater than the actual temperature value of the second evaporation system, controlling to increase the heating power of the second evaporation system, and controlling the heating power of the second evaporation system to be greater than the heating power of the first evaporation system or controlling a temperature increasing speed of the second evaporation system to be greater than a temperature increasing speed of the first evaporation system; if the ideal temperature value of the second evaporation system is less than the actual temperature value of the second evaporation system, controlling to decrease the heating power of the second evaporation system, and controlling the heating power of the second evaporation system to be less than the heating power of the first evaporation system or controlling the temperature increasing speed of the second evaporation system to be less than the temperature increasing speed of the first evaporation system.

[0036] In some possible implementation manners, the evaporation mechanism includes a first evaporation system and a second evaporation system, the first evaporation system is arranged upstream of the second evaporation system along a base film conveying path; and the method specifically includes:

[0037] obtaining a first temperature value of the first evaporation system and a second temperature value of the second evaporation system;

[0038] obtaining a first areal resistance value of a current coated surface of the base film and a second areal resistance value of two surfaces of the base film;

[0039] when the first surface resistance reaches a preset surface resistance threshold value earlier than the second surface resistance, determining a real-time base film transmission speed according to a first function relationship between the base film transmission speed under the preset surface resistance threshold value and a temperature value of the first evaporation system, and a real-time temperature value of the first evaporation system; obtaining an ideal temperature value of the second evaporation system according to a second function relationship between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the second evaporation system, and the real-time base film transmission speed; adjusting the heating power of the second evaporation system according to a comparison result between the ideal temperature value of the second evaporation system and an actual temperature value of the second evaporation system; or,

[0040] when the second surface resistance reaches a preset surface resistance threshold value earlier than the first surface resistance, determining a real-time base film transmission speed according to a second function relationship between the base film transmission speed under the preset surface resistance threshold value and a temperature value of the second evaporation system, and a real-time temperature value of the second evaporation system; obtaining an ideal temperature value of the first evaporation system according to a first function relationship between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the first evaporation system, and the real-time base film transmission speed; adjusting the heating power of the first evaporation system according to a comparison result between the ideal temperature value of the first evaporation system and an actual temperature value of the first evaporation system.

[0041] In a third aspect, a computer readable storage medium is provided, and the computer readable storage medium stores a computer program. The computer program is executed by a processor to implement any one of the film coating uniformity monitoring and adjusting methods in the second aspect.

[0042] In a fourth aspect, a computer device is provided, and the computer device includes:

[0043] one or more processors;

[0044] a storage device configured to store one or more programs;

[0045] When the one or more programs are executed by the one or more processors, the one or more processors implement any one of the film coating uniformity monitoring and adjusting methods in the second aspect.

[0046] The above technical solutions have the following beneficial effects:

[0047] The single-surface MD direction surface resistance test value deviation is within an expected range at the same film coating speed, and the MD direction surface resistance test value deviations of the two surfaces are both within a control range;

[0048] The film coating adjustment is performed in advance at a low evaporation amount, and the film coating efficiency and the evaporation material utilization rate are improved;

[0049] The invalid deposition coating of the baffle above the high-temperature resistant evaporation container is reduced, so that the splash phenomenon caused by the deposition coating under the baffle being too much and unable to adhere or being inconvenient to handle and finally falling to the high-temperature resistant evaporation container is avoided, and the high-temperature resistant evaporation container and the appearance quality of the substrate are damaged. BRIEF DESCRIPTION OF DRAWINGS

[0050] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiments or the prior art description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative effort on the basis of these drawings.

[0051] Figure 1 is a structure diagram of a film coating uniformity monitoring and control system according to an embodiment of the present application;

[0052] Figure 2 is a flow diagram of a film coating uniformity monitoring and control system according to an embodiment of the present application Figure 1 ;

[0053] Figure 3 is a flow diagram of a film coating uniformity monitoring and control system according to an embodiment of the present application Figure 2 .

[0054] BRIEF DESCRIPTION OF DRAWINGS

[0055] A1, unwinding roller; A2, winding roller;

[0056] B1, first passing roller; B2, second passing roller; B3, third passing roller; B4, fourth passing roller;

[0057] C1, first flattening roller; C2, second flattening roller; C3, third flattening roller;

[0058] D1, first film coating cold drum; D2, second film coating cold drum;

[0059] E1, first evaporation system; E2, second evaporation system;

[0060] E11, first temperature detector; E21, second temperature detector;

[0061] E12, first heat preservation material; E22, second heat preservation material;

[0062] E13, first heating electrode; E23, second heating electrode;

[0063] E14, first evaporation container; E24, second evaporation container;

[0064] F1, first face resistance tester; F2, second face resistance tester. DETAILED DESCRIPTION

[0065] Features and exemplary embodiments of various aspects of the present application will be described in detail below. In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the present application. However, it will be apparent to one of ordinary skill in the art that the present application can be practiced without some of these specific details. The description of the embodiments is merely intended to provide a more detailed understanding of the present application. In the drawings and description below, well-known structures and techniques have not been shown or described in detail in order to avoid unnecessarily obscuring the application; and, for clarity, some structures can be exaggerated in the drawings. Furthermore, features, structures or characteristics described below can be combined in any suitable manner in one or more embodiments.

[0066] Based on the existing vacuum coating system in the industry, there are technical problems such as changes in the evaporation amount of the evaporated material of the evaporation source, waste of the evaporated material, and obvious non-uniformity of the coating thickness in the MD direction (film running direction). The embodiments of the present application aim to better solve the above problems by using the following technical solutions, mainly by double regulation of the base film transmission speed and the evaporation system temperature, realizing the early opening of the baffle film running coating action of the evaporation source system even in the non-steady state evaporation stage, and realizing the uniformity of the MD direction coating thickness based on the matching of temperature control and coating speed (base film transmission speed at the unwinding end).

[0067] The technical problems to be solved by the embodiments of the present application include the following: how to ensure the thickness consistency of the film layer in the film running direction; how to use the high-efficiency coating of the coating evaporation system and realize the high utilization rate of the coating material; and how to avoid the impact of the baffle depositing a film with a considerable thickness on subsequent production.

[0068] The embodiments of the present application provide a coating uniformity monitoring and regulation system, which includes system components with basic vacuum winding and coating functions, especially temperature measuring devices closest to the high-temperature evaporation source near the evaporation system, non-contact eddy current resistance testing devices, and coating substrate running speed control devices, which issue instructions to control the coating running speed by collecting temperature data and resistance data.

[0069] The embodiments of the present application use a high-temperature-resistant container to hold the coating material, heat the coating material to gasification and evaporation by an auxiliary heat preservation electric heating device, and form a film on the substrate surface, and regulate the MD direction film layer thickness uniformity of the coating material by the organic combination of the coating speed and the temperature control of the electric heating device, and issue temperature and film speed regulation instructions through the feedback results of the non-contact face resistance tester of the substrate.

[0070] This invention provides a coating uniformity monitoring and control system, the system comprising:

[0071] A vacuum roll-to-roll coating apparatus, comprising an unwinding mechanism, an evaporation mechanism for depositing a base film, and a rewinding mechanism;

[0072] A temperature measuring device is used to measure the temperature value of an evaporation mechanism, specifically the temperature value of a graphite heating electrode.

[0073] A surface resistance testing device is used to measure the surface resistance of a base film.

[0074] A control device is used to control the base film transmission speed of the unwinding mechanism and / or the heating power of the evaporation mechanism based on the temperature value of the evaporation mechanism and the surface resistance value of the base film, so as to make the thickness of the coating uniform along the movement direction of the base film.

[0075] In some embodiments, a coating baffle is provided above the evaporation mechanism, and the control device is also used to control the unwinding mechanism to start the base film transmission and to open the coating baffle when the temperature value of the evaporation mechanism reaches a preset coating temperature threshold.

[0076] In some embodiments, the control device is specifically used to determine the real-time base film transmission speed of the unwinding mechanism based on the functional relationship between the base film transmission speed at a preset sheet resistance threshold and the temperature value of the evaporation mechanism, as well as the real-time temperature value of the evaporation mechanism.

[0077] like Figure 1 As shown, the coating uniformity monitoring and control system includes: unwinding roller A1, first pass roller B1, first flattening roller C1, first coating cooling drum D1, first evaporation system E1, second pass roller B2, third pass roller B3, first surface resistance tester F1, second flattening roller C2, second coating cooling drum D2, second evaporation system E2, fourth pass roller B4, second surface resistance tester F2, third flattening roller C3, and take-up roller A2.

[0078] The first evaporation system E1 is located below the first coating cooling drum D1. The first evaporation system E1 includes: a first temperature detector E11, a first insulating material E12, a first heating electrode E13, and a first evaporation container E14. The first heating electrode E13 has at least one hole, and one or more first evaporation containers E14 are installed in corresponding holes of the first heating electrode E13. Each first evaporation container E14 contains evaporation material. The first insulating material E12 may be located around the first heating electrode E13 (e.g., a graphite heating electrode) or around the first evaporation container E14 (e.g., a crucible).

[0079] The second evaporation system E2 is arranged below the second coating cold drum D2, and includes a second temperature detector E21, a second heat preservation material E22, a second heating electrode E23, and a second evaporation container E24. The second heating electrode E23 is provided with at least one hole, and one or more second evaporation containers E24 are arranged in the corresponding holes of the second heating electrode E23, and the second evaporation containers E24 are provided with evaporation materials. The second heat preservation material E22 can be arranged around the second heating electrode E23 (for example, a graphite heating electrode) and around the second evaporation container E24 (for example, a crucible).

[0080] The film to be coated is sent out from the unwinding roller A1, and sequentially passes through the first passing roller B1, the first flattening roller C1, the first coating cold drum D1, the second passing roller B2, the third passing roller B3, the second flattening roller C2, the second coating cold drum D2, the fourth passing roller B4, and the third flattening roller C3, and reaches the winding roller A2.

[0081] The first flattening roller C1 and the second passing roller B2 are respectively arranged on the two sides of the first coating cold drum D1, and the second flattening roller C2 and the fourth passing roller B4 are respectively arranged on the two sides of the second coating cold drum D2. The first passing roller B1 is arranged between the unwinding roller A1 and the first flattening roller C1, the third passing roller B3 is arranged between the second passing roller B2 and the second flattening roller C2, and the third flattening roller C3 is arranged between the fourth passing roller B4 and the winding roller A2.

[0082] In other embodiments, the number of passing rollers and flattening rollers described above can be increased or decreased.

[0083] The first surface resistance tester F1 and the second surface resistance tester F2 can non-contact measure the surface resistance value of one side or both sides of the film.

[0084] In some embodiments, the evaporation mechanism includes a first evaporation system E1 and a second evaporation system E2, and the first evaporation system E1 is arranged upstream of the second evaporation system E2 along the base film conveying path.

[0085] The temperature measuring device includes a first temperature detector E11 arranged on the first evaporation system E1 to measure a first temperature value of the first evaporation system E1, and a second temperature detector E21 arranged on the second evaporation system E2 to measure a second temperature value of the second evaporation system E2.

[0086] The surface resistance testing device comprises: a first surface resistance tester F1 arranged on the base film conveying path between the first evaporation system E1 and the second evaporation system E2, and used for measuring the first surface resistance value of the current plated surface of the base film; and a second surface resistance tester F2 arranged on the base film conveying path between the second evaporation system E2 and the winding mechanism, and used for measuring the total surface resistance value of the plated layer formed on the double surfaces of the base film, and obtaining the second surface resistance value of the other plated surface according to the difference between the total surface resistance value and the first surface resistance value.

[0087] The control device is specifically used for determining the real-time base film conveying speed according to the first function relationship between the base film conveying speed under the preset surface resistance threshold value and the temperature value of the first evaporation system E1, and the real-time temperature value of the first evaporation system E1 when the first surface resistance value reaches the preset surface resistance threshold value; obtaining the ideal temperature value of the second evaporation system E2 according to the second function relationship between the base film conveying speed under the preset surface resistance threshold value and the temperature value of the second evaporation system E2, and the real-time base film conveying speed; and adjusting the heating power of the second evaporation system E2 according to the comparison result between the ideal temperature value of the second evaporation system E2 and the actual temperature value of the second evaporation system E2.

[0088] In some embodiments, the control device is specifically used for:

[0089] If the ideal temperature value of the second evaporation system E2 is greater than the actual temperature value of the second evaporation system E2, the control increases the heating power of the second evaporation system E2, and the heating power of the second evaporation system E2 is greater than the heating power of the first evaporation system E1; if the ideal temperature value of the second evaporation system E2 is less than the actual temperature value of the second evaporation system E2, the control reduces the heating power of the second evaporation system E2, and the heating power of the second evaporation system E2 is less than the heating power of the first evaporation system E1.

[0090] In some embodiments, the control device can also be specifically used for:

[0091] When the first surface resistance value reaches the preset surface resistance threshold value earlier than the second surface resistance value, the real-time base film conveying speed is determined according to the first function relationship between the base film conveying speed under the preset surface resistance threshold value and the temperature value of the first evaporation system E1, and the real-time temperature value of the first evaporation system E1; the ideal temperature value of the second evaporation system E2 is obtained according to the second function relationship between the base film conveying speed under the preset surface resistance threshold value and the temperature value of the second evaporation system E2, and the real-time base film conveying speed; the heating power of the second evaporation system E2 is adjusted according to the comparison result between the ideal temperature value of the second evaporation system E2 and the actual temperature value of the second evaporation system E2; or,

[0092] When the second surface resistance value reaches the preset surface resistance threshold value before the first surface resistance value, the real-time surface resistance speed is determined based on the second functional relationship between the base film transmission speed and the temperature value of the second evaporation system E2 under the preset surface resistance threshold value, and the real-time temperature value of the second evaporation system E2; the ideal temperature value of the first evaporation system E1 is obtained based on the first functional relationship between the base film transmission speed and the temperature value of the first evaporation system E1 under the preset surface resistance threshold value, and the real-time surface resistance speed; and the heating power of the first evaporation system E1 is adjusted based on the comparison between the ideal temperature value and the actual temperature value of the first evaporation system E1.

[0093] In some embodiments, the control device is further configured to control the increase of the base film transmission speed of the unwinding mechanism when the first surface resistance exceeds a preset surface resistance threshold; and to increase the heating power of the second evaporation system E2 if the second surface resistance decreases.

[0094] This system can perform single-sided or double-sided coating. Furthermore, in the case of double-sided coating, it is necessary to calculate the temperature control and surface resistance near each coating side and issue speed control commands. Ultimately, the double-sided coating method achieves consistent coating thickness at the same coating speed.

[0095] The technical effects achieved by the embodiments of the present invention include:

[0096] At the same coating speed, the surface resistance test values ​​in the MD direction of a single side are within the expected range, and further, the surface resistance test values ​​in the MD direction of both sides are within the control range.

[0097] Pre-emptive low-evaporation coating control improves coating efficiency and utilization of evaporated materials;

[0098] Reduce ineffective coating deposition on the baffle above the high-temperature evaporator, thereby reducing the risk of excessive coating deposition below the baffle causing it to become unusable or difficult to handle, eventually falling onto the high-temperature evaporator and splashing, thus preventing damage to the high-temperature evaporator and the surface quality of the substrate.

[0099] The following is a more detailed explanation:

[0100] like Figure 1 The vacuum coating system shown begins evacuation once the high-temperature resistant containers (first evaporation container E14 and / or second evaporation container E24) are filled with the preset material to be evaporated and the relevant equipment is ready. The vacuum is then maintained at a level better than 5*10. -2After the temperature of the evaporation system (first evaporation system E1 and / or second evaporation system E2) is gradually increased by starting the electric heating device (first heating electrode E13 and / or second heating electrode E23), the temperature continues to increase, and the baffle of the shielding film material above the high-temperature-resistant container E14, E24 is always above, which is mainly used to avoid the evaporation of the material to the surface of the film material under unintended conditions, or to radiate too much heat to the film material. The material to be evaporated and plated, such as Al, Ag, etc., is placed in the high-temperature-resistant evaporation container E14, E24. In the embodiment of the present application, Al is taken as an example. Al begins to melt at about 600°C, gradually changes from solid to liquid, and finally, with the increase of the temperature of the electric heating device, the liquid aluminum gradually gasifies, i.e., changes into a gaseous state. In general, the stable evaporation and plating of Al material requires a temperature of about 1200°C. The temperature increase of the electric heating device in a vacuum environment is mainly through heat conduction and radiation. The main mode of the electric heating device is conduction. In order to use the electric heating device more safely and for a long service life, it usually takes a long time, for example, 60 minutes, for the temperature of the electric heating device (near the high-temperature-resistant evaporation container) to increase from about 600°C to about 1200°C to reach a stable state, especially the closer to the high temperature, the higher the saturated vapor pressure, i.e., the greater the evaporation amount.

[0101] The electric heating device or the electric heater can specifically include a graphite heating electrode. The evaporation system includes the graphite heating electrode, a crucible, and evaporation material. The graphite heating electrode has a hole, and the crucible is located in the hole. The crucible has the evaporation material.

[0102] Therefore, the technical solution of the embodiment of the present application is to start the film transmission when the temperature increases to a certain range, for example, the temperature is about 950°C, while maintaining a plating speed of 56 m / min, and the shielding plate above the evaporation container E14, E24 is opened for plating. During plating, the temperature of the heater is still rising to a steady state, i.e., the evaporation amount or the deposition rate of the film continues to increase, and the plating speed needs to be continuously increased to keep the plating layer thickness consistent in the MD direction; further, the plating speed is corrected according to the coating thickness of the non-contact eddy current resistance tester F1 as shown in Figure 1

[0103] As shown in Figure 2 If it is a single-sided evaporation system, only the plating speed, the first evaporation system E1, the corresponding first temperature probe E11, and the first non-contact eddy current resistance tester F1 are involved, wherein the non-contact eddy current resistance tester F1 only tests the surface resistance of the single side to convert to the coating thickness.

[0104] ​If it is a double-sided coating system, a second evaporation system E2, a second temperature detector E21 and a second non-contact eddy current resistance tester F2 are added on the basis of the single-sided coating system. The parameters obtained by the above-mentioned testers are comprehensively adjusted to the coating state. The coating speed is determined according to the parameters of the first temperature detector E11, the second temperature detector E21, the first non-contact eddy current resistance tester F1 and the second non-contact eddy current resistance tester F2 and their change trends. Especially for the system of double-sided simultaneous coating, in order to ensure that the thicknesses of the coatings on the two sides are the same (or the difference is within the acceptable quality control range) and the coating speed is set considering the whole coating, the parameters of the first temperature detector E11 and the second temperature detector E21 are needed for setting.

[0105] Before determining the speed control mode, the following parameters need to be determined:

[0106] The first temperature detector E11 tests the temperature T10, the coating speed V1 and the surface resistance R10 when the initial coating starts. The first temperature detector E11 tests the temperature T20, the coating speed V2 and the surface resistance R11 when the steady-state coating is performed. That is, the surface resistance tests under the initial state and the stable state are consistent, that is, R10≈R11, and the fluctuation range is within the acceptable range. In this case, by changing the coating speed, the evaporation amount of the material at different temperatures is matched, and finally the relationship between the coating speed at the preset surface resistance and the temperature of the electric heater is obtained. Of course, the input power and the heating time of the related electric heater are used as the process control conditions in this mode, and their mutual relationship can be obtained by numerical simulation and curve fitting: Y1=0.0623e 0.0057x1 The relationship formula is x1=1200, Y1=125. The relationship formula indicates that when the evaporation baffle is just opened at 1000℃, the coating speed V1=78m / min reaches the surface resistance R10. As the temperature of the heating increases, the evaporation amount gradually increases. When the surface resistance R11 is close to R10 after coating, the coating speed will change. For example, at 1200℃, the coating speed is 125m / min. That is, in this case, based on the fitting formula x1=1200, Y1=125.

[0107] The above-mentioned relationship formula indicates that when the evaporation baffle is just opened at 1000℃, the coating speed V1=78m / min reaches the surface resistance R10. As the temperature of the heating increases, the evaporation amount gradually increases. When the surface resistance R11 is close to R10 after coating, the coating speed will change. For example, at 1200℃, the coating speed is 125m / min. That is, in this case, based on the fitting formula x1=1200, Y1=125.

[0108] Based on the same idea, if the embodiment of the application is to control double-sided coating, the evaporation rate of the second evaporation system E2 can be measured and simulated first. That is, when the coating speed V1 is maintained at 78 m / min to reach the R10 surface resistance, the temperature value measured by the temperature detector E21 of the second evaporation system E2 is different from the temperature and evaporation rate of different evaporation source systems. Therefore, the process is based on the same coating speed and the same surface resistance of each side of the coating during single-sided coating and double-sided coating to obtain the consistency of the surface resistance during double-sided coating. Through a series of data measurement and simulation, the coating speed corresponding to the evaporation system E1 is used to control the temperature of the second evaporation system E2, that is, the temperature control of the second evaporation system is determined by reverse fitting.

[0109] However, in fact, it is actually because of the aforementioned influence of thermal conductivity efficiency and heat capacity of the electric heater in a vacuum environment that the temperature is difficult to reach the desired control range in a short time, that is, the temperature control has hysteresis. Therefore, in the actual control process, the embodiment of the application can use a similar algorithm of temperature control PID to synchronize the temperature control of the first evaporation system E1 and the second evaporation system E2, to ensure that the surface resistance of the newly added coating layer of the first non-contact eddy current resistance tester F1 and the second non-contact eddy current resistance tester F2 is the same or similar (that is, within the allowable range) within a certain speed regulation range. Wherein the surface resistance of the first non-contact eddy current resistance tester F1 and the second non-contact eddy current resistance tester F2 is the same, which can be understood as follows: when the surface resistance of the first non-contact eddy current resistance tester F1 is 800 mΩ during double-sided coating, the corresponding thickness d1 can be calculated under a certain conductivity, and the surface resistance control of the second non-contact eddy current resistance tester F2 can be further calculated after the thickness is increased to 2d1.

[0110] The actual control process requires the first evaporation system E1 and the second evaporation system E2 to control the temperature and the coating speed. That is, when the first evaporation system E1 and the second evaporation system E2 reach a certain temperature near which the shutter can be opened, the shutter is opened, and then the coating is performed. In this case, the coating speed V1 is set, and the speed increment control is performed according to the results of the non-contact eddy current resistance tester F1 and the non-contact eddy current resistance tester F2. The process is to gradually increase the temperature of the first evaporation system E1 and the second evaporation system E2.

[0111] For the case of multiple evaporation sources, the prior art uses a baffle to block the coating material before the coating reaches a steady state, which results in waste of the coating material. The MD direction refers to the film running direction, and the greater the sheet resistance, the thinner the coating. Because the characteristics of the second evaporation system E2 and the first evaporation system E1 are different, for example, the first evaporation system E1 can reach a sheet resistance of 800 mΩ at 1300℃ and 55 m / min; while the second evaporation system E2 can only reach a sheet resistance of 800 mΩ at 1400℃ and 55 m / min.

[0112] The embodiment of the present application hopes to realize such a control method, and the empirical formula fitted by the actual different devices, different sheet resistance controls of the same device, etc. may also be different. The embodiment can realize that the film thickness of the two coatings is the same through multiple adjustments of the PID algorithm, that is, the sheet resistance obtained by the contact sheet resistance meter for single-sided sheet resistance testing is very close. That is, the single-sided film thickness calculated based on the specific resistivity is very close or the difference is within the acceptable range of quality control.

[0113] The following examples illustrate that more accurate data is obtained by combining actual device operation, and the previous data is corrected based on this, for example:

[0114] The first surface data: for example, set the sheet resistance to 600 mΩ; 900℃-35m / min; 950℃-41m / min; 1000℃-50m / min; 1050℃-62m / min; 1100℃-75m / min; 1150℃-92m / min; 1200℃-113m / min; 1250℃-129m / min; 1300℃-132m / min. In order to obtain a relatively stable evaporation state, while considering the effective operation and maintenance protection of the device and other factors, the actual temperature should not be continuously increased.

[0115] The embodiment can simulate the empirical formula based on the above similar numerical values, and the similar empirical formula can also be obtained when the second surface is coated alone. The difference should not be very large, and the difference in coating thickness can be adjusted within a few meters.

[0116] In addition, the lower the sheet resistance, the thicker the film thickness, so if the evaporation efficiency (which can be regarded as the evaporation temperature) does not change, then to obtain a thicker film layer, the coating speed needs to be reduced; on the contrary, if the evaporation temperature is higher, then the sheet resistance value is smaller, but the coating thickness is larger under the condition that the coating speed does not change.

[0117] For example, the first surface resistance test is 600 mΩ, and the thickness of the coating is about 65 nm (if the coating is an Al film) calculated by a specific electrical parameter. If the coating is a copper film, the resistivity parameter of the copper film is substituted for calculation. If the coating is an Al film, the value of the second position of the surface resistance tester is the result of the two-coating film layers measured by the eddy current induction, and the target value should be about 300 mΩ, so that the thickness of the second single coating is about 65 nm, that is, 300 mΩ can be understood as the square resistance value corresponding to the total thickness of the two-coating layers.

[0118] Figure 1 A flowchart of a coating uniformity monitoring and control method according to an embodiment of the present application Figure 2 As shown in FIG. 1, the method comprises the following steps: Figure 3

[0119] S110: Obtain a temperature value of the evaporation mechanism;

[0120] S120: Obtain a surface resistance value of the base film;

[0121] S130: Control the base film transmission speed of the unwinding mechanism and / or the heating power of the evaporation mechanism according to the temperature value of the evaporation mechanism and the surface resistance value of the base film, so that the thickness of the coating along the moving direction of the base film has uniformity.

[0122] In some embodiments, in S130, the base film transmission speed of the unwinding mechanism is controlled according to the temperature value of the evaporation mechanism and the surface resistance value of the base film, specifically comprising: determining the real-time base film transmission speed of the unwinding mechanism according to the function relationship between the base film transmission speed at the preset surface resistance threshold and the temperature value of the evaporation mechanism, and the real-time temperature value of the evaporation mechanism.

[0123] In some embodiments, the method further comprises: when the temperature value of the evaporation mechanism reaches a preset coating temperature threshold, controlling the unwinding mechanism to start the base film transmission, and starting the coating baffle on the evaporation mechanism.

[0124] In some embodiments, the evaporation mechanism comprises a first evaporation system and a second evaporation system, and the first evaporation system is arranged upstream of the second evaporation system along the base film transmission path.

[0125] Figure 2 A flowchart of a coating uniformity monitoring and control method according to an embodiment of the present application Figure 3 As shown in FIG. 1, the method comprises the following steps: ​

[0126] S110’: Obtain a first temperature value of the first evaporation system and a second temperature value of the second evaporation system;

[0127] ​​S120': obtaining a first surface resistance value of a current coated surface of the base film, obtaining a total surface resistance value of the coating layer formed on the two surfaces of the base film, and obtaining a second surface resistance value of another coated surface according to a difference between the total surface resistance value and the first surface resistance value;

[0128] S131: when the first surface resistance value reaches a preset surface resistance threshold value, determining a real-time base film transmission speed according to a first function relationship between the base film transmission speed under the preset surface resistance threshold value and a temperature value of the first evaporation system, and a real-time temperature value of the first evaporation system;

[0129] S132: obtaining an ideal temperature value of the second evaporation system according to a second function relationship between the base film transmission speed under the preset surface resistance threshold value and a temperature value of the second evaporation system, and the real-time base film transmission speed;

[0130] S133: adjusting the heating power of the second evaporation system according to a comparison result between the ideal temperature value of the second evaporation system and an actual temperature value of the second evaporation system.

[0131] In some embodiments, the adjusting of the heating power of the second evaporation system according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system in S133 specifically includes:

[0132] If the ideal temperature value of the second evaporation system is greater than the actual temperature value of the second evaporation system, the heating power of the second evaporation system is controlled to be increased, and the heating power of the second evaporation system is controlled to be greater than the heating power of the first evaporation system or the temperature increasing speed of the second evaporation system is controlled to be greater than the temperature increasing speed of the first evaporation system; if the ideal temperature value of the second evaporation system is less than the actual temperature value of the second evaporation system, the heating power of the second evaporation system is controlled to be decreased, and the heating power of the second evaporation system is controlled to be less than the heating power of the first evaporation system or the temperature increasing speed of the second evaporation system is controlled to be less than the temperature increasing speed of the first evaporation system.

[0133] In some embodiments, the method further includes the following steps:

[0134] obtaining a first temperature value of the first evaporation system and a second temperature value of the second evaporation system;

[0135] obtaining a first surface resistance value of a current coated surface of the base film, obtaining a total surface resistance value of the coating layer formed on the two surfaces of the base film, and obtaining a second surface resistance value of another coated surface according to a difference between the total surface resistance value and the first surface resistance value;

[0136] When the first surface resistance reaches the preset surface resistance threshold value before the second surface resistance, the real-time base film transmission speed is determined according to the first function relationship between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the first evaporation system, and the real-time temperature value of the first evaporation system; the ideal temperature value of the second evaporation system is obtained according to the second function relationship between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the second evaporation system, and the real-time base film transmission speed; the heating power of the second evaporation system is adjusted according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system.

[0137] Or, when the second surface resistance reaches the preset surface resistance threshold value before the first surface resistance, the real-time base film transmission speed is determined according to the second function relationship between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the second evaporation system, and the real-time temperature value of the second evaporation system; the ideal temperature value of the first evaporation system is obtained according to the first function relationship between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the first evaporation system, and the real-time base film transmission speed; the heating power of the first evaporation system is adjusted according to the comparison result between the ideal temperature value of the first evaporation system and the actual temperature value of the first evaporation system.

[0138] The above method is specifically and in detail as follows:

[0139] According to the film coating uniformity monitoring and control method, in the film coating process, the value measured by the first surface resistance tester F1 is fixed (reaches the target surface resistance value), the actual temperature of the first evaporation system E1 can be obtained first, the unwinding speed can be obtained according to formula one, and the unwinding speed is adjusted to the real-time unwinding speed. Because the temperatures of the first evaporation system E1 and the second evaporation system E2 are always rising before reaching the film coating steady state, the real-time unwinding speed can be obtained according to formula one in real time, and the unwinding speed is adjusted to the real-time speed. At this time, according to formula two, the real-time unwinding speed is taken as the input, the ideal temperature value of the second evaporation system E2 can be obtained. When the ideal temperature value of the second evaporation system E2, the surface resistance value measured by the second surface resistance tester F2 is converted into a thickness value equal to twice the thickness value measured by the first surface resistance tester F1, so that the double-sided film coating thickness is the same.

[0140] According to the coating uniformity monitoring and regulation method of the embodiment, the first evaporation system E1 and the second evaporation system E2 are heated during the whole coating process. If the ideal temperature value of the second evaporation system E2 is greater than the actual temperature value of the second evaporation system E2, the heating power of the second evaporation system E2 is increased, the heating speed of the second evaporation system E2 is increased, and the heating power of the second evaporation system E2 is controlled to be greater than the heating power of the first evaporation system E1, and the heating speed of the second evaporation system E2 is controlled to be greater than the heating speed of the first evaporation system E1. If the ideal temperature value of the second evaporation system E2 is less than the actual temperature value of the second evaporation system E2, the heating power of the second evaporation system E2 is reduced, the heating speed of the second evaporation system E2 is reduced, and the heating power of the second evaporation system E2 is controlled to be less than the heating power of the first evaporation system E1, and the heating speed of the second evaporation system E2 is controlled to be less than the heating speed of the first evaporation system E1. If the ideal temperature value of the second evaporation system E2 is equal to the actual temperature value of the second evaporation system E2, no adjustment is made.

[0141] The coating uniformity monitoring and regulation method of the embodiment is executed by the control device, the first evaporation system E1 corresponds to formula one, the second evaporation system E2 corresponds to formula two, the first face resistance tester F1 is limited to 800 milliohms, and the method comprises the following steps of adjusting the temperature value of the second evaporation system E2 in real time:

[0142] The real-time temperature value of the first evaporation system E1 is acquired in real time, the real-time temperature value of the first evaporation system E1 is used to adjust the unwinding speed in real time according to formula one, and thus the ideal temperature value of the second evaporation system E2 can be obtained according to formula two and the real-time unwinding speed;

[0143] The ideal temperature value of the second evaporation system E2 is compared with the actual temperature value of the second evaporation system E2;

[0144] If the ideal temperature value of the second evaporation system E2 is greater, the temperature increasing speed of the second evaporation system E2 is controlled to be greater than the temperature increasing speed of the first evaporation system E1;

[0145] If the ideal temperature value of the second evaporation system E2 is less, the temperature increasing speed of the second evaporation system E2 is controlled to be less than the temperature increasing speed of the first evaporation system E1.

[0146] As can be seen from the above, if the ideal temperature value of the second evaporation system E2 is greater than the actual temperature value of the second evaporation system E2, the heating power of the second evaporation system E2 is controlled to be increased, and the heating power of the second evaporation system E2 is controlled to be greater than the heating power of the first evaporation system E1, that is, the temperature increasing speed of the second evaporation system E2 is controlled to be greater than the temperature increasing speed of the first evaporation system E1.

[0147] The measurement value of the first surface resistance tester F1 is always 800 milliohm, and with the real-time adjustment of the unwinding speed, the measurement value of the second surface resistance tester F2 is always around 800 milliohm, so that the coating thickness meets the quality requirements.

[0148] The coating film uniformity monitoring and regulating method of the embodiment is executed by the control device, in order to solve the problems of unsuitable real-time adjustment and temperature regulation with hysteresis, and the following method is adopted:

[0149] It is judged which one of the measurement values of the first surface resistance tester F1 and the second surface resistance tester F2 reaches the surface resistance threshold value first;

[0150] If the first surface resistance tester F1 reaches the surface resistance threshold value first, the real-time unwinding speed is adjusted according to the temperature value of the first evaporation system E1, the ideal temperature value of the second evaporation system E2 is obtained according to the formula two and the real-time unwinding speed, and the actual temperature value of the second evaporation system E2 is adjusted according to the ideal temperature value of the second evaporation system E2;

[0151] If the second surface resistance tester F2 reaches the surface resistance threshold value first, the real-time unwinding speed is adjusted according to the temperature value of the second evaporation system E2, the theoretical temperature value of the first evaporation system E1 is obtained according to the formula one and the real-time unwinding speed, and the actual temperature value of the first evaporation system E1 is adjusted by controlling the heating power through the theoretical temperature value of the first evaporation system E1.

[0152] Further, the coating film uniformity monitoring and regulating method further includes the following steps:

[0153] If the thickness measured by the first surface resistance tester F1 exceeds the surface resistance threshold value, the unwinding speed is controlled to be increased to avoid the thickness of the first surface resistance tester F1 exceeding the surface resistance threshold value, and the two surface resistance values (the surface resistance values measured by F1 and F2 respectively) are detected in real time, and if the thickness value or the surface resistance value measured by the second surface resistance tester F2 decreases at this time, the heating power of the second evaporation system E2 is increased.

[0154] Further, if the temperature increases too fast, it is useless to reduce the heating power at that time, and therefore it is better to increase the temperature slowly, so that the ideal temperature value of the second evaporation system E2 is always greater than the actual temperature value. Therefore, the coating film uniformity monitoring and regulating method further includes the following step: when the measurement value of the second surface resistance tester F2 is about to reach the lower limit of the surface resistance threshold value, the temperature is adjusted to increase by a certain proportion.

[0155] The beneficial technical effects of the embodiment of the application are as follows:

[0156] 1. Reduce the waste of evaporated materials in the evaporation boat system during the thin film deposition process;

[0157] 2. The consistency of the overall thickness of the film layer on the substrate surface along the MD direction is better achieved by the double regulation of the evaporation system temperature and the coating speed.

[0158] 3. The invalid deposition coating on the surface of the baffle can be avoided, so that the deposition coating on the surface of the baffle after the coating is completed can be reduced, and the influence of the residual heat of the evaporation system on the deposited coating is reduced.

[0159] In the description of the present application, it should be noted that the terms "upper, lower, inner and outer" indicate the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first, second or third" are only for the purpose of description, and cannot be understood as indicating or implying relative importance.

[0160] Unless otherwise explicitly specified and limited, the terms "mounting, connecting, connecting" in the present application should be understood broadly, for example: it can be fixed connection, detachable connection or integral connection; it can also be mechanical connection, electrical connection or direct connection, it can also be indirectly connected through intermediate medium, or it can be the communication between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0161] Although the present application has been described with reference to the preferred embodiments, various modifications can be made thereto and equivalents can be substituted for elements thereof without departing from the scope of the present application. In particular, the technical features mentioned in each embodiment can be combined in any way as long as there is no structural conflict. The present application is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims

1. A coating uniformity monitoring and control system, characterized in that, The system comprises: a vacuum coating device comprising an unwinding mechanism, an evaporation mechanism for evaporating a base film, and a winding mechanism; a temperature measuring device for measuring a temperature value of the evaporation mechanism; a surface resistance testing device for measuring a surface resistance value of the base film; a control device for controlling a base film transmission speed of the unwinding mechanism and / or a heating power of the evaporation mechanism according to the temperature value of the evaporation mechanism and the surface resistance value of the base film, so that the thickness of the coating layer along the moving direction of the base film has uniformity; the control device is specifically configured to determine a real-time base film transmission speed of the unwinding mechanism according to a functional relationship between the base film transmission speed at a preset surface resistance threshold value and the temperature value of the evaporation mechanism, and a real-time temperature value of the evaporation mechanism; the evaporation mechanism comprises a first evaporation system and a second evaporation system, and the first evaporation system is arranged upstream of the second evaporation system along a base film conveying path; the temperature measuring device comprises a first temperature detector arranged on the first evaporation system for measuring a first temperature value of the first evaporation system, and a second temperature detector arranged on the second evaporation system for measuring a second temperature value of the second evaporation system; the surface resistance testing device comprises a first surface resistance tester arranged on the base film conveying path between the first evaporation system and the second evaporation system for measuring a first surface resistance value of a current coating surface of the base film, and a second surface resistance tester arranged on the base film conveying path between the second evaporation system and the winding mechanism for measuring a total surface resistance value of the coating layer formed on both surfaces of the base film, and obtaining a second surface resistance value of another coating surface according to the difference between the total surface resistance value and the first surface resistance value.

2. The coating uniformity monitoring and control system of claim 1, wherein, the control device is specifically configured to, when the first surface resistance value reaches a preset surface resistance threshold value, determine a real-time base film transmission speed according to a first functional relationship between the base film transmission speed at the preset surface resistance threshold value and the temperature value of the first evaporation system, and a real-time temperature value of the first evaporation system, and obtain an ideal temperature value of the second evaporation system according to a second functional relationship between the base film transmission speed at the preset surface resistance threshold value and the temperature value of the second evaporation system, and the real-time base film transmission speed; adjust the heating power of the second evaporation system according to the comparison result between the ideal temperature value of the second evaporation system and an actual temperature value of the second evaporation system.

3. The coating uniformity monitoring and control system of claim 1, wherein The control device is specifically configured to: if the ideal temperature value of the second evaporation system is greater than the actual temperature value of the second evaporation system, control the heating power of the second evaporation system to be increased, and control the heating power of the second evaporation system to be greater than the heating power of the first evaporation system or control the temperature increasing speed of the second evaporation system to be greater than the temperature increasing speed of the first evaporation system; if the ideal temperature value of the second evaporation system is less than the actual temperature value of the second evaporation system, control the heating power of the second evaporation system to be reduced, and control the heating power of the second evaporation system to be less than the heating power of the first evaporation system or control the temperature increasing speed of the second evaporation system to be less than the temperature increasing speed of the first evaporation system.

4. The coating uniformity monitoring and control system of claim 1, wherein, The control device is specifically configured to: When the first surface resistance value reaches a preset surface resistance threshold value earlier than the second surface resistance value, the real-time base film transmission speed is determined according to a first functional relationship between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the first evaporation system and the real-time temperature value of the first evaporation system; and the ideal temperature value of the second evaporation system is obtained according to a second functional relationship between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the second evaporation system and the real-time base film transmission speed. The heating power of the second evaporation system is adjusted according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system. Or, When the second surface resistance value reaches a preset surface resistance threshold value earlier than the first surface resistance value, the real-time base film transmission speed is determined according to a second functional relationship between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the second evaporation system and the real-time temperature value of the second evaporation system; and the ideal temperature value of the first evaporation system is obtained according to a first functional relationship between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the first evaporation system and the real-time base film transmission speed. The heating power of the first evaporation system is adjusted according to the comparison result between the ideal temperature value of the first evaporation system and the actual temperature value of the first evaporation system.

5. A method for monitoring and regulating coating uniformity, characterized in that, The method is applied to the coating uniformity monitoring and control system of any one of claims 1-4, and the method comprises: obtaining the temperature value of the evaporation mechanism; obtaining the surface resistance value of the base film; controlling the base film transmission speed of the unwinding mechanism and / or the heating power of the evaporation mechanism according to the temperature value of the evaporation mechanism and the surface resistance value of the base film, so that the thickness of the coating layer along the moving direction of the base film has uniformity.

6. The method of claim 5, wherein the method further comprises: The control of the base film transmission speed of the unwinding mechanism according to the temperature value of the evaporation mechanism and the surface resistance value of the base film specifically comprises: determining the real-time base film transmission speed of the unwinding mechanism according to a functional relationship between the base film transmission speed under a preset surface resistance threshold value and the temperature value of the evaporation mechanism and the real-time temperature value of the evaporation mechanism.

7. The method of claim 5, wherein the method further comprises: The evaporation mechanism comprises a first evaporation system and a second evaporation system, the first evaporation system is arranged upstream of the second evaporation system along the base film conveying path; the method specifically comprises: obtaining a first temperature value of the first evaporation system and a second temperature value of the second evaporation system; obtaining a first surface resistance value of a current coating surface of the base film, obtaining a total surface resistance value of the coating layer formed on the double surfaces of the base film, and obtaining a second surface resistance value of another coating surface according to the difference between the total surface resistance value and the first surface resistance value; when the first surface resistance value reaches a preset surface resistance threshold value, determining a real-time base film conveying speed according to a first functional relationship between the base film conveying speed under the preset surface resistance threshold value and the temperature value of the first evaporation system, and the real-time temperature value of the first evaporation system; obtaining an ideal temperature value of the second evaporation system according to a second functional relationship between the base film conveying speed under the preset surface resistance threshold value and the temperature value of the second evaporation system, and the real-time base film conveying speed; adjusting the heating power of the second evaporation system according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system.

8. The method of claim 5, wherein the method further comprises: The adjusting of the heating power of the second evaporation system according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system specifically comprises: if the ideal temperature value of the second evaporation system is greater than the actual temperature value of the second evaporation system, controlling to increase the heating power of the second evaporation system, and controlling the heating power of the second evaporation system to be greater than the heating power of the first evaporation system or controlling the temperature increasing speed of the second evaporation system to be greater than the temperature increasing speed of the first evaporation system; if the ideal temperature value of the second evaporation system is less than the actual temperature value of the second evaporation system, controlling to decrease the heating power of the second evaporation system, and controlling the heating power of the second evaporation system to be less than the heating power of the first evaporation system or controlling the temperature increasing speed of the second evaporation system to be less than the temperature increasing speed of the first evaporation system.

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