Mask and display panel

Abstract

The application provides a mask and a display panel. The mask comprises a substrate and a first electrode layer, an electrochromic layer and a second electrode layer which are sequentially stacked on the substrate. The electrochromic layer is electrically connected with the first electrode layer and the second electrode layer. The electrochromic layer comprises a plurality of electrochromic units arranged in an array. The material of the electrochromic unit comprises at least a metal organic framework material. The electrochromic unit is configured to change the transmittance of the mask under the control of the voltage difference between the first electrode layer and the second electrode layer. That is, the transmittance of the electrochromic unit can be adjusted between 0-100% by controlling the voltage difference between the first electrode layer and the second electrode layer. The transmittance of the plurality of electrochromic units arranged in an array is changed to realize different patterns by using the same mask. The mask is suitable for various scenes. The material cost can be saved, the product development schedule and development cost can be shortened, and the competitiveness of the product is enhanced.

Description

Technical Field

[0001] This application belongs to the field of display technology, and in particular relates to photomasks and display panels. Background Technology

[0002] Masks can be used to create various functional patterns and precisely position them on substrates such as thin films, plastics, and glass. They have a wide range of applications and have therefore attracted increasing research attention.

[0003] However, the current production process of conventional photomasks is very complex. Moreover, once a conventional photomask is formed, the pattern is fixed and cannot be changed. This results in the need for a large number of masks to achieve different patterns, which is costly. Furthermore, for masks with fixed patterns, they can only be used for a single product, resulting in low utilization value. Summary of the Invention

[0004] In view of this, embodiments of this application provide a photomask and a display panel. The photomask includes a substrate and a first electrode layer, an electrochromic layer, and a second electrode layer sequentially stacked on the substrate. The electrochromic layer is electrically connected to both the first and second electrode layers. The electrochromic layer includes a plurality of electrochromic units arranged in an array. By ensuring that the material of the electrochromic units includes at least a metal-organic framework material, the electrochromic units are configured to change the transmittance of the photomask under the control of the voltage difference between the first and second electrode layers. That is, the transmittance of the electrochromic units can be adjusted between 0-100% by controlling the voltage difference between the first and second electrode layers. By changing the transmittance of the plurality of electrochromic units arranged in an array, different patterns can be achieved through the same photomask, making the photomask suitable for various scenarios. Furthermore, it can save a significant amount of material costs, shorten product development time and costs, and enhance product competitiveness.

[0005] A first aspect of this application provides a photomask, including a substrate and a first electrode layer, an electrochromic layer and a second electrode layer sequentially stacked on the substrate, wherein the electrochromic layer is electrically connected to both the first electrode layer and the second electrode layer.

[0006] The electrochromic layer includes a plurality of electrochromic units arranged in an array. Each electrochromic unit includes at least a metal-organic framework material. The electrochromic unit is configured to change the transmittance of the mask under the control of the voltage difference between the first electrode layer and the second electrode layer.

[0007] In one embodiment, the electrochromic unit is made of a first metal-organic framework material configured to change the transmittance of the photomask under the control of a voltage difference between the first electrode layer and the second electrode layer.

[0008] In one embodiment, the material of the electrochromic unit includes a first electrochromic material and a second metal-organic framework material, wherein the first electrochromic material is doped into the second metal-organic framework material;

[0009] The first electrochromic material is configured to change the transmittance of the photomask under the control of the voltage difference between the first electrode layer and the second electrode layer.

[0010] In one embodiment, the electrochromic unit is made of a first metal-organic framework material and a hole-carrier material, wherein the first metal-organic framework material is doped into the hole-carrier material.

[0011] The first metal-organic framework material is configured to change the transmittance of the mask under the control of the voltage difference between the first electrode layer and the second electrode layer.

[0012] In one embodiment, the doping concentration of the first metal-organic framework material in the hole-carrier material ranges from 5 to 15 wt%.

[0013] In one embodiment, the mask further includes a hole-blocking layer disposed between the electrochromic unit and the second electrode layer.

[0014] In one embodiment, the mask further includes a driving layer disposed on the side of the first electrode layer away from the electrochromic layer. The driving layer includes a plurality of driving units. The first electrode layer includes a plurality of first electrodes. The second electrode layer includes a second electrode disposed throughout the entire layer. Each electrochromic unit is electrically connected to both a first electrode and a second electrode. Each first electrode is electrically connected to one of the driving units.

[0015] In one embodiment, the voltage difference between the first electrode and the second electrode ranges from 0 to 5V.

[0016] The first electrode layer includes a plurality of first electrodes, and the second electrode layer includes a second electrode disposed throughout the entire layer;

[0017] The mask also includes conductive units and frame traces. The conductive units are located between the frame traces and the first electrode and are in contact with the first electrode and the frame traces respectively. The conductive units are configured to receive electrical signals transmitted by the frame traces and transmit the electrical signals to the first electrode.

[0018] A second aspect of this application provides a display panel, including a substrate and a first metal layer, an insulating layer, a second metal layer, a passivation layer and a pixel electrode layer sequentially stacked on the substrate. At least one of the first metal layer, the insulating layer, the second metal layer, the passivation layer and the pixel electrode layer is formed by generating a corresponding pattern using a mask provided in the first aspect of this application and then exposing it.

[0019] The photomask provided in the first aspect of this application includes a substrate and a first electrode layer, an electrochromic layer, and a second electrode layer sequentially stacked on the substrate. The electrochromic layer is electrically connected to both the first and second electrode layers. The electrochromic layer includes a plurality of electrochromic units arranged in an array. Each electrochromic unit includes at least a metal-organic framework material. The electrochromic units are configured to change the transmittance of the photomask under the control of the voltage difference between the first and second electrode layers. Specifically, the transmittance of the electrochromic units can be adjusted between 0% and 100% by controlling the voltage difference between the first and second electrode layers. This allows different patterns to be achieved using the same photomask by changing the transmittance of the array of multiple electrochromic units, making the photomask suitable for various scenarios. Furthermore, it can save significant material costs, shorten product development time and costs, and enhance product competitiveness.

[0020] It is understandable that the beneficial effects of the second aspect mentioned above can be found in the relevant descriptions in the first aspect mentioned above, and will not be repeated here. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 This is a schematic diagram of the first structure of the photomask provided in Embodiment 1 of this application;

[0023] Figure 2 This is a schematic diagram of the second structure of the photomask provided in Embodiment 1 of this application;

[0024] Figure 3 This is a schematic diagram of the patterned graphic provided in Embodiment 1 of this application;

[0025] Figure 4 This is a schematic diagram of the third structure of the mask provided in Embodiment 1 of this application;

[0026] Figure 5This is a schematic diagram of the fourth structure of the mask provided in Embodiment 1 of this application;

[0027] Figure 6 This is a top view of the frame traces and electrochromic unit in the photomask provided in Embodiment 1 of this application;

[0028] Figure 7 This is a top view of a portion of the structure in the photomask provided in Embodiment 1 of this application.

[0029] Icon labels:

[0030] 1-Substrate, 2-First electrode layer, 3-Electrochromic layer, 4-Second electrode layer, 5-Driving unit, 31-Electrochromic unit, 20-Hole blocking layer, 21-First electrode;

[0031] 11-First insulating layer, 12-First protective layer, 13-Second insulating layer, 14-Third insulating layer, 15-Second protective layer, 16-First planarization layer, 17-Second planarization layer, 18-Definition layer, 19-Supporting layer;

[0032] 51-Active layer, 52-Gate insulating layer, 53-Gate, 54-Source / drain metal layer, 61-Conductive unit, 62-Frame trace, 71-Gate line, 72-Data line, 73-Gate driver, 74-Source driver. Detailed Implementation

[0033] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of the present application.

[0034] The term "comprising," and any variations thereof, in the specification, claims, and accompanying drawings of this application are intended to cover a non-exclusive inclusion. For example, a process, method, system, product, or apparatus that comprises a series of steps or units is not limited to the listed steps or units, but may optionally include steps or units not listed, or may optionally include other steps or units inherent to such processes, methods, products, or apparatus. Furthermore, the terms "first," "second," etc., are used to distinguish different objects, not to describe a specific order.

[0035] Example 1

[0036] refer to Figures 1-2 and Figure 4As shown, this application provides a photomask, including a substrate 1 and a first electrode layer 2, an electrochromic layer 3, and a second electrode layer 4 sequentially stacked on the substrate 1. The electrochromic layer 3 is electrically connected to both the first electrode layer 2 and the second electrode layer 4. The electrochromic layer 3 includes a plurality of electrochromic units 31 arranged in an array. The material of the electrochromic units 31 includes at least a metal-organic framework material. The electrochromic units 31 are configured to change the transmittance of the photomask under the control of the voltage difference between the first electrode layer 2 and the second electrode layer 4.

[0037] The material of the substrate is not specifically limited here; it may include rigid materials, such as glass, or flexible materials, such as polyimide (PI). When the substrate is made of glass, it can both support the entire photomask and ensure that the photomask has sufficient mechanical strength.

[0038] The method of electrical connection between the electrochromic layer and the first electrode layer is not specifically limited here. For example, the electrochromic layer and the first electrode layer can be directly electrically connected; or, the electrochromic layer and the first electrode layer can be electrically connected through other structures. Similarly, the method of electrical connection between the electrochromic layer and the second electrode layer is not specifically limited here. For example, the electrochromic layer and the second electrode layer can be directly electrically connected; or, the electrochromic layer and the second electrode layer can be electrically connected through other structures. Figures 1-2 and Figure 4 The illustrations are all based on the example of electrochromic layer 3 being directly electrically connected to the first electrode layer 2 and electrochromic layer 3 being directly electrically connected to the second electrode layer 4.

[0039] The aforementioned first electrode layer may include a first electrode, and there are no specific limitations on the structure and material of the first electrode. For example, the first electrode layer may include a single layer of first electrodes; or, the first electrode layer may include multiple first electrodes, spaced apart from adjacent first electrodes. The aforementioned second electrode layer may include a second electrode, and there are no specific limitations on the structure and material of the second electrode. For example, the second electrode layer may include a single layer of second electrodes; or, the second electrode layer may include multiple second electrodes, spaced apart from adjacent second electrodes. For example, the materials of the first electrode and the second electrode may be the same; or, the materials of the first electrode and the second electrode may be different. Specifically, the materials of the first electrode and the second electrode may include metallic materials, alloy materials, etc., such as copper, aluminum, etc. Figure 2 and Figure 4 The illustrations are all based on the example of a first electrode layer comprising multiple spaced first electrodes 21 and a second electrode layer 4 comprising a whole layer of second electrodes.

[0040] The structure of the electrochromic unit is not specifically limited here; the structure of the electrochromic unit can be determined according to actual needs.

[0041] The statement that the material of the electrochromic unit includes at least a metal-organic framework material means that the material of the electrochromic unit includes only a metal-organic framework material; or, the material of the electrochromic unit may include other materials in addition to a metal-organic framework material, such as hole-carrier materials, etc., without specific limitations.

[0042] The fabrication method of the electrochromic unit is not specifically limited here. For example, electrochromic units can be fabricated by methods such as vapor deposition and solution spin coating.

[0043] The electrochromic unit is configured to change the transmittance of the photomask under the control of the voltage difference between the first and second electrode layers. Specifically, when the voltage difference between the first and second electrode layers is 0V (e.g., when no electrical signal is applied to either layer), the electrochromic unit is fully transparent, and its transmittance is 100%. When the voltage difference is not 0V, the electrochromic unit is not fully transparent, and its transmittance can be greater than or equal to 0% and less than 100%. Therefore, the transmittance of the electrochromic unit can be varied between 0% and 100% by adjusting the voltage difference between the first and second electrode layers. For example, when the transmittance of the electrochromic unit is 50%, the photomask can be used as a halftone mask.

[0044] Electrochromism refers to the reversible color change of a material under the influence of an electric field. Metal-organic frameworks (MOFs) are composed of metal ions / inorganic clusters as nodes and organic ligands as connectors, and can form any type of extended coordination network in one, two, or three dimensions. MOFs include those with electrochromic properties and those without.

[0045] Figure 7 The illustration uses a photomask comprising four electrochromic units 31 arranged in an array as an example. (Reference) Figure 7As shown, the gate lines 71 arranged along the OX direction and the data lines 72 arranged along the OY direction define multiple regions. Each region is provided with an electrochromic unit 31. Each electrochromic unit 31 is connected to the gate lines 71 and the data lines 72 respectively through a driving unit 5. All the gate lines 71 are connected to the gate driver 73, and all the data lines 72 are connected to the source driver 74. For example, the driving unit may include a thin-film transistor (TFT), the gate driver 73 may include an integrated circuit (IC), and the source driver 74 may include a timer control register (Tcon). (Reference) Figure 7 As shown, the gate driver 73 can control the drive unit 5 to turn on row by row. At this time, the source driver 74 can input electrical signals to the data line 72 to control the drive unit 5 of at least each row to work.

[0046] Masks can create and precisely position various functional patterns on substrates such as thin films, plastics, and glass. Masks have a wide range of applications, including display panels, integrated circuits (ICs), flat panel displays (FPDs), printed circuit boards (PCBs), and microelectromechanical systems (MEMS). Taking a display panel as an example, a display panel can include a substrate and film layers formed on the substrate, such as pixel electrode layers. These pixel electrodes can be formed by generating corresponding patterns using the mask of this application and then exposing them. Of course, the mask of this application can also form other structures in the display panel, which are not specifically limited here. The formation methods for various structures in integrated circuits, etc., can be referenced to the pixel electrode layer formation method of the display panel, and will not be elaborated further here.

[0047] The current production process of conventional photomasks is very complex, and may include: (1) drawing a photomask layout file that can be recognized by the generating equipment; (2) using a maskless lithography machine to read the layout file and perform non-contact exposure on the blank photomask with photoresist; irradiating the desired pattern area on the photomask to cause a photochemical reaction in the photoresist in that area; (3) after development and fixing, the photoresist in the exposed area dissolves and falls off, exposing the chromium layer; (4) using a chromium etching solution for wet etching to etch away the exposed chromium layer to form a transparent area, while the chromium layer protected by the photoresist will not be etched, forming an opaque area, thereby forming a planar pattern structure with different transmittance on the photomask; (5) using wet or dry methods to remove the photoresist layer on the photomask, and cleaning, attaching a protective film, packaging and shipping the photomask. Moreover, once a conventional photolithography mask is formed, the pattern is fixed and cannot be changed. This results in the need for a large number of masks to achieve different patterns, which is costly. Furthermore, masks with fixed patterns can only be used for a single product, resulting in low utilization value.

[0048] To address the aforementioned problems, the mask provided in the embodiments of this application includes a substrate and a first electrode layer, an electrochromic layer, and a second electrode layer sequentially stacked on the substrate. The electrochromic layer is electrically connected to both the first and second electrode layers. The electrochromic layer includes a plurality of electrochromic units arranged in an array. The material used for the electrochromic units includes at least a metal-organic framework material. The electrochromic units are configured to change the transmittance of the mask under the control of the voltage difference between the first and second electrode layers. Specifically, the transmittance of the electrochromic units can be adjusted between 0% and 100% by controlling the voltage difference between the first and second electrode layers. This allows different patterns to be achieved using the same mask by changing the transmittance of the array of multiple electrochromic units. For example, it can achieve… Figure 3 The pattern "F" in the mask can be used to create other patterns, making the mask suitable for various scenarios. It can also save a lot of material costs, shorten product development time and costs, and enhance the competitiveness of the product.

[0049] It should be noted that the reference Figure 3 As shown, Figure 3 It includes multiple pattern blocks arranged in an array, specifically ten rows and nine columns of pattern blocks. Each pattern block can correspond to an electrochromic unit in the mask, so the pattern "F" and other various patterns can be achieved by controlling the transmittance of each electrochromic unit.

[0050] In one embodiment, the electrochromic unit is made of a first metal-organic framework material, which is configured to change the transmittance of the photomask under the control of the voltage difference between the first electrode layer and the second electrode layer.

[0051] The aforementioned first metal-organic framework material refers to a metal-organic framework material with electrochromic properties, such as CeO2 and Co3O4 hybrid Ce-MOF / Co-MOF composite materials.

[0052] The electrochromic unit provided in the embodiments of this application is configured with a first metal-organic framework material to change the transmittance of the photomask under the control of the voltage difference between the first electrode layer and the second electrode layer. Specifically, the transmittance of the electrochromic unit can be adjusted between 0-100% by controlling the voltage difference between the first electrode layer and the second electrode layer. Thus, by changing the transmittance of multiple electrochromic units arranged in an array, different patterns can be achieved through the same photomask, making the photomask suitable for various scenarios. Furthermore, it can save a lot of material costs, shorten product development time and development costs, and enhance the competitiveness of the product.

[0053] In one embodiment, the electrochromic unit comprises a first electrochromic material and a second metal-organic framework material, wherein the first electrochromic material is doped into the second metal-organic framework material; the first electrochromic material is configured to change the transmittance of the photomask under the control of the voltage difference between the first electrode layer and the second electrode layer.

[0054] The first electrochromic material mentioned above is not specifically limited here. For example, it can include inorganic electrochromic materials and organic electrochromic materials. Inorganic electrochromic materials can include oxides, complexes, hydrates, and heteropoly acids of transition metals. Specifically, transition metal oxide electrochromic materials can include Group VI metal oxides, such as tungsten oxide and molybdenum oxide, and Group VIII metal oxides, such as oxides or hydrated oxides of platinum, iridium, osmium, palladium, ruthenium, nickel, and rhodium. Specifically, inorganic electrochromic materials can also include tungsten trioxide. Organic electrochromic materials can include polythiophenes and their derivatives, violetin compounds, tetrathiofulvalene, and metal phthalocyanine compounds, such as polypyrrole, polythiophene, polyaniline, and their derivatives.

[0055] The aforementioned second metal-organic framework material refers to a metal-organic framework material that does not possess electrochromic properties. Since the band gap of the second metal-organic framework material is larger than that of the first electrochromic material, the first electrochromic material can be doped into the second metal-organic framework material. This prevents energy from being transferred back from the first electrochromic material to the second metal-organic framework material, thus forming a stable electrochromic unit.

[0056] The second metal-organic framework (MOF) material possesses advantages such as high porosity, tunable structure, large internal surface area, and excellent thermal stability. By doping the first electrochromic material into the second MOF material, the second MOF material can act as a carrier. On one hand, the microstructure within the second MOF material allows for the adsorption of smaller molecules of the first electrochromic material, thus better forming electrochromic units. On the other hand, the large steric hindrance effect and two-dimensional extended coordination network of the second MOF material can be utilized to suppress the accumulation and quenching of first electrochromic material molecules during high-concentration doping, thereby ensuring uniform doping of the first electrochromic material and minimizing / avoiding its deactivation. The doping ratio of the first electrochromic material in the second MOF material is not specifically limited and can be determined according to actual needs.

[0057] The electrochromic unit provided in the embodiments of this application, on the one hand, can control the first electrochromic material through the voltage difference between the first electrode layer and the second electrode layer. Specifically, the transmittance of the electrochromic unit can be adjusted between 0-100% by controlling the voltage difference between the first electrode layer and the second electrode layer. Thus, by changing the transmittance of multiple electrochromic units arranged in an array, different patterns can be achieved through the same mask, making the mask applicable to various scenarios. At the same time, it can save a lot of material costs, shorten product development time and development costs, and enhance product competitiveness. On the other hand, since the second metal-organic framework material itself is conductive, the time for the voltage difference between the first electrode layer and the second electrode layer to regulate the first electrochromic material can be reduced, resulting in a better all-black effect of the electrochromic unit. Furthermore, the second metal-organic framework material can receive the voltage difference between the first electrode layer and the second electrode layer, so that the first electrochromic material is at the critical point of excitation, thereby further reducing the time for the voltage difference between the first electrode layer and the second electrode layer to regulate the first electrochromic material.

[0058] In one embodiment, the electrochromic unit comprises a first metal-organic framework material and a hole-carrier material, wherein the first metal-organic framework material is doped into the hole-carrier material; the first metal-organic framework material is configured to change the transmittance of the mask under the control of the voltage difference between the first electrode layer and the second electrode layer.

[0059] The aforementioned hole-carrier materials are organic semiconductor materials that, when holes are injected, can achieve directional, ordered, and controllable migration of charge carriers under the influence of an electric field, thereby achieving charge transfer. No specific limitations are made here regarding the hole-carrier materials. For example, hole-carrier materials can include carbazole groups, in which case the hole mobility is higher; of course, they can also include other groups. For example, hole-carrier materials can be tricresyl phosphate (TCP), 4,4'-bis(9-carbazole)biphenyl (CBP), methylcyclopentenolone (mCP), etc.

[0060] There is no specific limit to the doping ratio of the first metal-organic framework material in the hole-carrier material; it can be determined according to actual needs.

[0061] The fabrication process for doping the first metal-organic framework material into the hole-carrier material is not specifically limited here. For example, vapor deposition, solution method, etc. can be used to dope the first metal-organic framework material into the hole-carrier material.

[0062] The electrochromic unit provided in the embodiments of this application, on the one hand, can control the first metal-organic framework material by controlling the voltage difference between the first electrode layer and the second electrode layer, thereby adjusting the transmittance of the electrochromic unit between 0-100%. Specifically, by controlling the voltage difference between the first electrode layer and the second electrode layer, the transmittance of the electrochromic unit can be adjusted between 0-100%. Thus, by changing the transmittance of multiple electrochromic units arranged in an array, different patterns can be achieved through the same mask, making the mask applicable to various scenarios. At the same time, it can also save a lot of material costs, shorten product development time and development costs, and enhance product competitiveness. On the other hand, when the first metal-organic framework material includes a cationic first metal-organic framework material, since the hole-type charge carrier material has an electron donor, it is conducive to the formation and transport of cationic free radicals. This allows the cationic first metal-organic framework material to be better confined in the electrochromic unit, resulting in a better effect of the electrochromic unit.

[0063] In one embodiment, the doping concentration of the first metal-organic framework material in the hole-carrier material ranges from 5 to 15 wt%.

[0064] The doping concentration of the first metal-organic framework material in the hole-carrier material is not specifically limited here. For example, the doping concentration of the first metal-organic framework material in the hole-carrier material can be 5 wt%, 7 wt%, 9 wt%, 10 wt%, 12 wt%, or 15 wt%, etc. When the doping concentration of the first metal-organic framework material in the hole-carrier material is lower than 5 wt%, it may lead to poor light-shielding effect of the mask. When the doping concentration of the first metal-organic framework material in the hole-carrier material is higher than 5 wt%, it may cause the accumulation and quenching of the first metal-organic framework material molecules, resulting in uneven doping of the first metal-organic framework material in the hole-carrier material. It may also lead to deactivation of the first metal-organic framework material, thereby resulting in poor light-shielding effect of the mask. Therefore, the embodiments of this application, by setting the doping concentration of the first metal-organic framework material in the hole-carrier material to a range of 5-15wt%, can not only make the doping of the first metal-organic framework material in the hole-carrier material uniform, but also reduce / avoid the deactivation of the first metal-organic framework material, so as to make the mask have a better light-shielding effect.

[0065] The voltage difference between the first electrode layer and the second electrode layer is given in Table 1 when the doping concentration of the first metal-organic framework material in the hole-carrier material ranges from 5 to 15 wt%.

[0066] Table 1

[0067] Doping concentration (wt%) 5 10 12.5 15 Voltage difference (V) 2.7 2.7 2.5 2.5

[0068] As can be seen from Table 1, when the doping concentration of the first metal-organic framework material in the hole-carrier material is in the range of 5-15wt%, the voltage difference between the first electrode layer and the second electrode layer is within 0-5V, which is easy to implement, can reduce the power consumption of the mask, and can also make the mask perform better.

[0069] In one embodiment, the first metal-organic framework material comprises a cationic first metal-organic framework material. This allows the hole-carrier material to be better confined within the cationic first metal-organic framework material in the electrochromic unit, resulting in a better electrochromic unit performance. Furthermore, the first electrode layer can provide a conditional negative voltage, and the second electrode layer can provide a conditional positive voltage, making it simple and easy to implement.

[0070] In one embodiment, reference Figure 4 As shown, the mask also includes a hole blocking layer 20, which is disposed between the electrochromic unit 31 and the second electrode layer 4.

[0071] The material of the hole-blocking layer described above is not specifically limited. For example, the material of the hole-blocking layer may include any one or more combinations of aromatic heterocyclic compounds, such as benzimidazole, triazine, pyrimidine, pyridine, pyrazine, quinoxaline, quinoline, diazole, diazaphosphazenecyclopentadiene, phosphine oxide, aromatic ketones, lactams, boranes, and their derivatives. For example, the material of the hole-blocking layer may be 1,3,5-tris(1-phenyl-1H-benzimidazol-2-yl)benzene (TPBI).

[0072] The aforementioned hole-blocking layer can prevent cationic materials such as the first metal-organic framework material from escaping the electrochromic unit, ensuring that more holes remain in the electrochromic unit, thereby improving the luminous efficiency of the electrochromic unit.

[0073] In one embodiment, reference Figure 2 and Figure 4 As shown, the mask also includes a driving layer, which is disposed on the side of the first electrode layer away from the electrochromic layer. The driving layer includes multiple driving units 5, the first electrode layer includes multiple first electrodes 21, and the second electrode layer 4 includes a second electrode disposed throughout the layer. Each electrochromic unit 31 is electrically connected to a first electrode 21 and a second electrode. Each first electrode 21 is electrically connected to a driving unit 5.

[0074] The structure of the driver layer described above is not specifically limited here; for example, please refer to [reference needed]. Figure 2 and Figure 4 As shown, the driving layer may include a first insulating layer 11, an active layer 51, a first protective layer 12, a gate insulating layer 52, a gate 53, a second insulating layer 13, a third insulating layer 14, a second protective layer 15, a source / drain metal layer 54, a first planarization layer 16, and a second planarization layer 17, sequentially disposed on the substrate 1. When the active layer is P+ ion doped, the first protective layer 12 can enhance the bonding ability between the first insulating layer and P+ silicon.

[0075] The type of the driving unit mentioned above is not specifically limited here. For example, the driving unit may include a transistor, such as a TFT. Figure 2 and Figure 4The active layer 51, gate insulating layer 52, gate 53, and source / drain metal layer 54 can constitute a TFT. The material of the active layer is not specifically limited here; it can be an oxide semiconductor material, such as indium gallium zinc oxide (IGZO), indium tin zinc oxide (ITZO), indium zinc oxide (IZO), etc.; it can also be low-temperature polysilicon (LTPS), low-temperature polycrystalline oxide (LTPO); and of course, it can also be single-crystal silicon, etc.

[0076] When the active layer of the driving unit is made of LTPS or LTPO, on the one hand, the driving unit can maintain the potential for a longer time, so that the electrochromic unit can maintain the color change for a long time; on the other hand, LTPS and LTPO themselves have good light transmittance and will not affect the light transmittance of the photomask.

[0077] The materials of the first insulating layer, the second insulating layer, and the third insulating layer can all be silicon nitride, silicon oxide, or silicon oxynitride.

[0078] It should be noted that the reference Figure 2 and Figure 4 As shown, the photomask may further include a defining layer 18 and a support layer 19. The defining layer has an opening, and the electrochromic unit is disposed within the opening of the defining layer. The support layer provides good support for the photomask. Furthermore, only the content relevant to the inventive point is described here; other structures can be obtained from related technologies and will not be described in detail here.

[0079] The mask provided in the embodiments of this application can control the transmittance of each electrochromic unit between 0-100% by using the driving unit and the voltage difference between the first electrode layer and the second electrode layer. Thus, by changing the transmittance of multiple electrochromic units arranged in an array, different patterns can be achieved through the same mask, making the mask suitable for various scenarios. Furthermore, it can save a lot of material costs, shorten product development time and development costs, and enhance the competitiveness of the product.

[0080] In one embodiment, the voltage difference between the first electrode and the second electrode ranges from 0 to 5V. This approach is convenient to implement, results in good mask performance, and lower power consumption.

[0081] The specific value of the voltage difference between the first and second electrodes is not limited here. For example, the voltage difference between the first and second electrodes can be 0V, 1V, 2V, 3V, 4V, or 5V, etc. Specifically, a voltage difference of 0V between the first and second electrodes results in a photomask transmittance of 100%. A voltage difference of 5V between the first and second electrodes results in a photomask transmittance ranging from 0.5% to 10%. Specifically, a voltage difference of 5V between the first and second electrodes can result in a photomask transmittance of 0.5%, 1%, 4%, 7%, or 10%, etc.

[0082] In one embodiment, reference Figure 5 As shown, the first electrode layer includes a plurality of first electrodes 21, and the second electrode layer 4 includes a second electrode disposed throughout the layer; the mask also includes conductive units 61 and frame traces 62. The conductive units 61 are located between the frame traces 62 and the first electrodes 21 and are in contact with the first electrodes 21 and the frame traces 62 respectively. The conductive units 61 are configured to receive electrical signals transmitted by the frame traces 62 and transmit electrical signals to the first electrodes 21.

[0083] The material and location of the conductive units are not specifically limited here. For example, the material of the conductive units may include semiconductor materials. For example, refer to... Figure 5 As shown, the conductive unit 61 can be disposed in the limiting layer 18 and in direct contact with the first electrode; or, the conductive unit can be disposed in other layers; or, the conductive unit can be disposed independently. When the conductive unit is disposed in any layer, the thickness of the mask along the direction perpendicular to the substrate can be reduced.

[0084] The material and location of the aforementioned framework traces are not specifically limited here. For example, the material of the framework traces may include nanoscale metal-organic framework materials. See also... Figure 5 As shown, the frame trace 62 can be disposed in the limiting layer 18 and in direct contact with the conductive unit 61. Specifically, the frame trace 62 can be disposed on the side of the conductive unit 61 away from the substrate 1; or, the frame trace can be disposed in other layers, for example, the frame trace can be disposed in the second planarization layer; or, the frame trace can be disposed independently. When the frame trace is disposed in any layer, the thickness of the mask along the direction perpendicular to the substrate can be reduced.

[0085] The electrical signal is not specifically limited here. For example, the electrical signal may be the voltage applied to the first electrode; or, the electrical signal may be the voltage difference applied between the first electrode and the second electrode, in which case the second electrode may not be energized.

[0086] The above-mentioned conductive unit is configured to receive electrical signals transmitted by the frame traces and transmit electrical signals to the first electrode, meaning that the conductive unit can transmit electrical signals received from the frame traces to the first electrode and has a unidirectional conduction function.

[0087] It should be noted that, Figure 6 A schematic diagram of the conductive unit 61 in the photomask is provided. (Reference) Figure 6 As shown, the conductive unit 61 is disposed on one side of the electrochromic unit 31. When the frame trace 62 is energized, the conductive unit 61 electrically connects the frame trace 62 and the first electrode 21 at the point where the frame trace 62 overlaps with the first electrode 21.

[0088] In the mask provided in the embodiments of this application, on the one hand, the nanoframework wiring can support the mask, thereby improving the rigidity of the mask; on the other hand, due to the fabrication of TFTs in the driving layer, there may be problems such as inconsistent TFT sizes, which may cause inconsistent driving voltages when each TFT controls an electrochromic unit, resulting in uneven transparency adjustment across the entire mask. Therefore, by connecting the first electrode with a semiconductor material, only an electrical signal needs to be applied to the nanoframework wiring to enable unidirectional conduction of the first electrode. Specifically, the first electrode in each row can be turned on, and the driving layer in the mask does not need to work.

[0089] In one embodiment, the thickness of the electrochromic unit along the direction perpendicular to the substrate ranges from 50 to 200 nm.

[0090] The thickness of the electrochromic unit along the direction perpendicular to the substrate is not specifically limited here. For example, the thickness of the electrochromic unit along the direction perpendicular to the substrate can be 50nm, 50-200nm, 80nm, 100nm, 150nm, or 200nm, etc.

[0091] The following table shows the voltage difference between the first electrode layer and the second electrode layer when the thickness of the electrochromic unit along the direction perpendicular to the substrate ranges from 50 to 300 nm.

[0092] Table 2

[0093] Thickness (nm) 50 100 150 200 300 Voltage difference (V) 1.9 2.7 3.5 4.6 6.7

[0094] As shown in Table 2, when the thickness of the electrochromic unit along the direction perpendicular to the substrate ranges from 50 to 200 nm, the voltage difference between the first electrode layer and the second electrode layer is within 0 to 5 V. However, when the thickness of the electrochromic unit along the direction perpendicular to the substrate is 300 nm, the voltage difference between the first electrode layer and the second electrode layer is 6.7 V. This may lead to problems such as high power consumption in the mask.

[0095] Example 2

[0096] The display panel provided in this application includes a substrate and a first metal layer, an insulating layer, a second metal layer, a passivation layer and a pixel electrode layer sequentially stacked on the substrate. At least one of the first metal layer, insulating layer, second metal layer, passivation layer and pixel electrode layer is formed by exposure after generating a corresponding pattern through the mask in Embodiment 1.

[0097] The aforementioned display panel can be a flexible display panel (also known as a flexible screen) or a rigid display panel (i.e., a display screen that cannot be bent); there is no limitation here. The aforementioned display panel can be an organic light-emitting diode (OLED) display panel or a liquid crystal display (LCD) panel.

[0098] It should be noted that the display panel may also include other layers, at least one of which can be formed by generating a corresponding pattern using the mask in Embodiment 1 and then exposing it. Only the content related to the inventive point is described here; other structures can be obtained by referring to relevant technologies and will not be described in detail here.

[0099] At least one of the first metal layer, insulating layer, second metal layer, passivation layer and pixel electrode layer in the above-mentioned display panel is formed by exposure after generating a corresponding pattern using the mask in Embodiment 1, thereby realizing a pattern of at least one layer through the mask, which is beneficial to the formation of the display device.

[0100] The above are merely preferred embodiments of this application and are not intended to limit this application. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A photomask, characterized in that, The invention includes a substrate and a first electrode layer, an electrochromic layer, and a second electrode layer sequentially stacked on the substrate, wherein the electrochromic layer is electrically connected to both the first electrode layer and the second electrode layer. The electrochromic layer includes multiple electrochromic units arranged in an array. The electrochromic units are made of a first metal-organic framework material and a hole-carrier material. The first metal-organic framework material is doped into the hole-carrier material. The first metal-organic framework material is configured to change the transmittance of the mask under the control of the voltage difference between the first electrode layer and the second electrode layer. When the doping concentration of the first metal-organic framework material in the hole-carrier material is in the range of 5-15 wt%, the voltage difference between the first electrode layer and the second electrode layer is within 0-5V.

2. The photomask as described in claim 1, characterized in that, The mask also includes a hole-blocking layer disposed between the electrochromic unit and the second electrode layer.

3. The photomask as described in claim 1, characterized in that, The mask also includes a driving layer disposed on the side of the first electrode layer away from the electrochromic layer. The driving layer includes multiple driving units. The first electrode layer includes multiple first electrodes. The second electrode layer includes a second electrode disposed throughout the entire layer. Each electrochromic unit is electrically connected to both a first electrode and a second electrode. Each first electrode is electrically connected to one driving unit.

4. The photomask as described in claim 1, characterized in that, The first electrode layer includes a plurality of first electrodes, and the second electrode layer includes a second electrode disposed throughout the entire layer; The mask also includes conductive units and frame traces. The conductive units are located between the frame traces and the first electrode and are in contact with the first electrode and the frame traces respectively. The conductive units are configured to receive electrical signals transmitted by the frame traces and transmit the electrical signals to the first electrode.

5. A display panel, characterized in that, The substrate includes a substrate and a first metal layer, an insulating layer, a second metal layer, a passivation layer and a pixel electrode layer sequentially stacked on the substrate. At least one of the first metal layer, the insulating layer, the second metal layer, the passivation layer and the pixel electrode layer is formed by exposure after generating a corresponding pattern using a mask as described in any one of claims 1-4.

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