Air floating rotation mechanism for epitaxial apparatus

Abstract

The application discloses an air floating rotating mechanism for epitaxial equipment, which comprises a graphite base, an air floating support ring and an air floating base, one end of the air floating support ring is installed in the graphite base, the other end is installed in the air floating base, a plurality of independent gas carrying channels are arranged in the graphite base, a plurality of air floating holes which are in communication with the gas carrying channels are uniformly distributed on the top of the graphite base, a flow guide groove is arranged on the bottom of the air floating base, and the top of the air floating base is used as a wafer disc; the air floating gas enters the graphite base through the gas carrying channels, is sprayed out through the air floating holes, lifts the air floating base, and acts on the flow guide groove to drive the air floating base to rotate around the air floating support ring. The air floating rotating mechanism has the advantages of compact structure, smooth rotation and uniform stress, solves the problems of time difference in gas transmission, aggravation of rotation shaking of the air floating base, acceleration of graphite part loss and large temperature deviation caused by unreasonable arrangement of the gas carrying channels in the graphite base, improves the rotation stability of the air floating base, and prolongs the service life of the equipment.

Description

Technical Field

[0001] This invention belongs to the field of epitaxial equipment technology, and specifically relates to an air-floating rotation mechanism for epitaxial equipment. Background Technology

[0002] Epitaxial furnaces are key equipment for epitaxial wafer fabrication. For epitaxial growth, uniform temperature and gas flow distribution are fundamental to producing high-quality epitaxial wafers with uniform doping concentration and low defect density. To compensate for the inhomogeneity of the temperature and gas flow fields, a substrate rotation method is generally used. This ensures that the movement paths of different points on the substrate within the reaction chamber are not fixed, allowing them to circulate through regions with different temperatures and gas flow densities. This makes the growth conditions at each point on the substrate more consistent, achieving the goal of uniformly growing thin films across the entire substrate surface.

[0003] Currently, epitaxial furnaces place an air-floating rotating base on a graphite base with air-floating holes via a central small shaft. The substrate is first placed in a wafer tray, which is then placed on the air-floating rotating base. Carrier gas for air-floating is introduced through the air-floating holes of the graphite base. The carrier gas reaches the bottom of the rotating base through the air-floating holes. The airflow first lifts the air-floating base, and then the friction generated by the air guide groove on the back of the air-floating base causes the air-floating base to rotate, thereby realizing the rotation of the substrate.

[0004] Because it is supported only at a central point, the air-float rotating base experiences high and low swaying during rotation, which causes irregular disturbances to the airflow along the path and disrupts the stability of the epitaxial growth environment.

[0005] Meanwhile, the unreasonable air flotation path within the graphite base causes a time deviation in the arrival of the air flotation gas at the back of the rotating air flotation base, exacerbating the shaking and swaying of the air flotation base. Furthermore, when using a gas with an etching effect (such as hydrogen) as the air flotation carrier gas, it leads to inconsistent wear of the outlet orifices of different air flotation paths in the graphite base, accelerating the wear of the graphite components themselves. In severe cases, it will cause the air flotation base to stop rotating. At the same time, there is a large temperature difference in the radial direction of the graphite base, exhibiting a temperature decrease from the center to the edge. In other words, the existing air flotation rotation mechanism does not have the ability to improve the temperature of the graphite base.

[0006] In addition, the current air-floating rotation mechanism only allows the introduction of a single type of air-floating gas, which is not conducive to the simultaneous control of the temperature of the epitaxial substrate edge growth area and the stable rotation of the air-floating system. This is because hydrogen is lighter and more conducive to the lifting and rotation of the air-floating base, but the cooling effect of hydrogen is more obvious, which is not conducive to the control of the temperature field at the substrate edge.

[0007] Finally, the current air flotation driving force is relatively small, while the air flotation base in large-size epitaxial furnaces is large in size and weight, resulting in uneven rotation or no rotation at all. Summary of the Invention

[0008] The technical problem to be solved by the present invention is to overcome the shortcomings of the prior art and provide an air-floating rotating mechanism for extension equipment that is compact in structure, rotates smoothly, has uniform force distribution, and has a long service life.

[0009] To solve the above-mentioned technical problems, the present invention adopts the following technical solution:

[0010] An air-floating rotation mechanism for epitaxial equipment includes: a graphite base, an air-floating support ring, and an air-floating base. One end of the air-floating support ring is installed inside the graphite base, and the other end of the air-floating support ring is installed inside the air-floating base. The graphite base has multiple independent carrier gas channels inside, and multiple air-floating holes communicating with the carrier gas channels are evenly distributed on the top of the graphite base. The bottom of the air-floating base has a guide groove, and the top of the air-floating base is a substrate carrier disk for placing the substrate. The air-floating carrier gas enters the graphite base through the carrier gas channels and is ejected through the air-floating holes to support the air-floating base. The air-floating carrier gas acts on the guide groove of the air-floating base to drive the air-floating base to rotate around the air-floating support ring.

[0011] As a further improvement of the present invention, the carrier gas channel includes a main air flotation channel and an auxiliary air flotation channel with independently controlled air intake. The input ends of the main air flotation channel and the auxiliary air flotation channel are arranged side by side on the side of the graphite base. The output end of the main air flotation channel is connected to multiple air flotation holes at the center of the top of the graphite base. The air flotation carrier gas delivered by the main air flotation channel is used to support the air flotation base and drive the air flotation base to rotate around the air flotation support ring. The output end of the auxiliary air flotation channel is connected to multiple air flotation holes on both sides of the top of the graphite base. The air flotation carrier gas delivered by the auxiliary air flotation channel is used to drive the air flotation base to rotate around the air flotation support ring.

[0012] As a further improvement of the present invention, a gas collection chamber is provided at the top center of the graphite base, and the output end of the main air flotation channel is connected to the bottom of the gas collection chamber through a through hole. The top of the gas collection chamber is provided with a second air flotation hole and a plurality of first air flotation holes. The second air flotation hole is located at the exact center of the top of the gas collection chamber. The air flotation carrier gas ejected from the second air flotation hole is used to support the air flotation base. The plurality of first air flotation holes are evenly surrounding the outer periphery of the second air flotation hole. The air flotation carrier gas ejected from the first air flotation holes is used to support the air flotation base and drive the air flotation base to rotate around the air flotation support ring.

[0013] As a further improvement of the present invention, the graphite base is further provided with a first auxiliary air flotation channel and a second auxiliary air flotation channel. The output end of the auxiliary air flotation channel is connected to the input end of the first auxiliary air flotation channel and the second auxiliary air flotation channel, respectively. The graphite base is provided with a first auxiliary air flotation hole and a second auxiliary air flotation hole symmetrically on both sides of the top. The output end of the first auxiliary air flotation channel is connected to the first auxiliary air flotation hole, and the output end of the second auxiliary air flotation channel is connected to the second auxiliary air flotation hole. The air flotation carrier gas ejected from the first auxiliary air flotation hole and the second auxiliary air flotation hole is used to drive the air flotation base to rotate around the air flotation support ring.

[0014] As a further improvement of the present invention, the axis of the second air flotation hole is vertically upward, and the axes of the first air flotation hole and the first auxiliary air flotation hole are both at an angle to the axis of the second air flotation hole, and the angle between the axis of the first air flotation hole and the axis of the second air flotation hole is smaller than the angle between the axis of the first auxiliary air flotation hole and the axis of the second air flotation hole.

[0015] As a further improvement of the present invention, the top of the graphite base is provided with a first support ring groove that matches the air flotation support ring, the first auxiliary air flotation hole and the second auxiliary air flotation hole are located outside the first support ring groove, and the first air flotation hole and the second air flotation hole are located inside the first support ring groove.

[0016] As a further improvement of the present invention, the top of the air-float support ring is evenly distributed with multiple support steps.

[0017] As a further improvement of the present invention, the number of the support steps is greater than 3, and the total area of ​​the multiple support steps accounts for less than 30% of the area of ​​the air-bearing support ring.

[0018] As a further improvement of the present invention, the bottom of the air flotation base is provided with a second support ring groove that matches the air flotation support ring.

[0019] As a further improvement of the present invention, the bottom of the air flotation base is also provided with a plurality of first guide grooves and a plurality of second guide grooves. The first guide grooves and the second guide grooves both extend from the edge of the air flotation base toward the center, and the first guide grooves extend to the inner side of the second support ring groove, and the second guide grooves extend to the outer side of the second support ring groove. The first guide grooves are matched with the main air flotation channel, and the second guide grooves are matched with the auxiliary air flotation channel.

[0020] Compared with the prior art, the advantages of the present invention are as follows:

[0021] The air-floating rotation mechanism for epitaxial equipment of the present invention features an air-floating base connected to a graphite base via an air-floating support ring. The air-floating base rotates around the multi-point support ring, significantly improving support and rotational stability. Simultaneously, the graphite base contains multiple air-floating channels with consistent paths. The consistent paths of these channels ensure that the air-floating carrier gas reaches the bottom guide groove of the air-floating base at a consistent time, further enhancing rotational stability. The multiple air-floating channel paths distributed within and outside the support ring groove on the graphite base allow for flexible use of the air-floating carrier gas. By adjusting the type and flow rate of gas in different channels, the rotational speed of the air-floating base and the uniformity of temperature in the growth zone can be effectively adjusted. Furthermore, the multiple guide grooves and larger mounting groove at the bottom of the air-floating base significantly reduce its weight, ensuring stable rotation even for large-sized air-floating bases. This makes it better suited for rotating larger and heavier air-floating bases in 8-inch epitaxial furnaces. The present invention effectively solves problems such as substrate wobbling, uneven rotation, failure to rotate, and short lifespan of the mechanism itself. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the explosive structure principle of the air-floating rotation mechanism for the epitaxial device of the present invention.

[0023] Figure 2 This is a schematic diagram illustrating the structural principle of the graphite base in this invention.

[0024] Figure 3 for Figure 2 A schematic diagram of the structural principle at point A in the middle.

[0025] Figure 4 This is a schematic diagram of the cross-sectional structure of the graphite base in this invention.

[0026] Figure 5 This is a schematic diagram illustrating the structural principle of the air-bearing support ring in this invention.

[0027] Figure 6 This is a top view schematic diagram of the air-bearing support ring in this invention.

[0028] Figure 7 This is a schematic diagram of the structural principle of the bottom of the air-float base in this invention.

[0029] Legend: 1. Graphite base; 101. Main air flotation channel; 102. Auxiliary air flotation channel; 103. First auxiliary air flotation channel; 104. First auxiliary air flotation hole; 105. Second auxiliary air flotation channel; 106. Second auxiliary air flotation hole; 107. First support ring groove; 108. First air flotation hole; 109. Second air flotation hole; 110. Through hole; 111. Gas collection chamber; 2. Air flotation support ring; 21. Support step; 3. Air flotation base; 31. First guide groove; 32. Second support ring groove; 33. Second guide groove. Detailed Implementation

[0030] The present invention will be further described below with reference to the accompanying drawings and specific preferred embodiments, but this does not limit the scope of protection of the present invention.

[0031] Example

[0032] like Figures 1 to 7 As shown, the air-floating rotation mechanism for epitaxial equipment of the present invention includes: a graphite base 1, an air-floating support ring 2, and an air-floating base 3. One end of the air-floating support ring 2 is installed inside the graphite base 1, and the other end of the air-floating support ring 2 is installed inside the air-floating base 3. The graphite base 1 has multiple independent carrier gas channels inside, and multiple air-floating holes communicating with the carrier gas channels are evenly distributed on the top of the graphite base 1. The bottom of the air-floating base 3 has a guide groove, and the top of the air-floating base 3 is a substrate carrier disk for placing the substrate. The air-floating carrier gas enters the graphite base 1 through the carrier gas channels and is ejected through the air-floating holes to support the air-floating base 3. The air-floating carrier gas acts on the guide groove of the air-floating base 3 to drive the air-floating base 3 to rotate around the air-floating support ring 2.

[0033] In this embodiment, the carrier gas channel includes a main air flotation channel 101 and an auxiliary air flotation channel 102 with independently controlled air intake. The input ends of the main air flotation channel 101 and the auxiliary air flotation channel 102 are arranged side by side on the side of the graphite base 1. The output end of the main air flotation channel 101 is connected to multiple air flotation holes at the center of the top of the graphite base 1. The carrier gas delivered by the main air flotation channel 101 is used to support the air flotation base 3 and drive the air flotation base 3 to rotate around the air flotation support ring 2. The output end of the auxiliary air flotation channel 102 is connected to multiple air flotation holes on both sides of the top of the graphite base 1. The carrier gas delivered by the auxiliary air flotation channel 102 is used to drive the air flotation base 3 to rotate around the air flotation support ring 2. The air flotation base 3 is fixed to the graphite base 1 by the air flotation support ring 2, and the carrier gas pipeline is connected to the main air flotation channel 101 and the auxiliary air flotation channel 102 on the end face of the graphite base 1, respectively.

[0034] The main air flotation channel 101 and the auxiliary air flotation channel 102 can be vented with different types of gases. Hydrogen is preferred as the carrier gas for the main air flotation channel 101, while argon is preferred as the carrier gas for the auxiliary air flotation channel 102. This ensures the smooth rotation of the air flotation base 3 while achieving precise temperature field control between the central and edge regions of the graphite base 1. Furthermore, the main air flotation channel 101 and the auxiliary air flotation channel 102 are each connected to a separate carrier gas pipeline, allowing for selective activation of air flotation based on the weight of the 6 / 8-inch air flotation base.

[0035] like Figures 2 to 4 As shown, in this embodiment, a gas collecting chamber 111 is provided at the top center of the graphite base 1. The output end of the main air flotation channel 101 is connected to the bottom of the gas collecting chamber 111 through a through hole 110. The top of the gas collecting chamber 111 is provided with a second air flotation hole 109 and a plurality of first air flotation holes 108. The second air flotation hole 109 is located at the exact center of the top of the gas collecting chamber 111. The air flotation carrier gas ejected from the second air flotation hole 109 is used to support the air flotation base 3. The six first air flotation holes 108 are evenly surrounding the outer periphery of the second air flotation hole 109. The air flotation carrier gas ejected from the first air flotation holes 108 is used to support the air flotation base 3 and drive the air flotation base 3 to rotate around the air flotation support ring 2.

[0036] like Figure 2 As shown, in this embodiment, the graphite base 1 is further provided with a first auxiliary air flotation channel 103 and a second auxiliary air flotation channel 105, which are symmetrically arranged on the left and right sides inside the graphite base 1. The output end of the auxiliary air flotation channel 102 is connected to the input end of the first auxiliary air flotation channel 103 and the second auxiliary air flotation channel 105, respectively. The top of the graphite base 1 is symmetrically provided with a first auxiliary air flotation hole 104 and a second auxiliary air flotation hole 106. The output end of the first auxiliary air flotation channel 103 is connected to the first auxiliary air flotation hole 104, and the output end of the second auxiliary air flotation channel 105 is connected to the second auxiliary air flotation hole 106. The air flotation carrier gas ejected from the first auxiliary air flotation hole 104 and the second auxiliary air flotation hole 106 is used to drive the air flotation base 3 to rotate around the air flotation support ring 2.

[0037] In this embodiment, the axis of the second air flotation hole 109 is vertically upward, which is beneficial to the levitation of the air flotation base 3. The first auxiliary air flotation hole 104, the second auxiliary air flotation hole 106, and the first air flotation hole 108 are all inclined at a certain angle, and the inclination angles of the first auxiliary air flotation hole 104 and the second auxiliary air flotation hole 106 are the same. The carrier gas ejected from the first air flotation hole 108 drives the air flotation base 3 to rotate while also ensuring the levitation of the air flotation base 3. The carrier gas ejected from the first auxiliary air flotation hole 104 and the second auxiliary air flotation hole 106 undertakes the function of driving the rotation of the air flotation base 3. The axes of the first air flotation hole 108 and the first auxiliary air flotation hole 104 are both at an angle to the axis of the second air flotation hole 109, and the angle between the axes of the first air flotation hole 108 and the second air flotation hole 109 is smaller than the angle between the axes of the first auxiliary air flotation hole 104 and the second air flotation hole 109.

[0038] In this embodiment, the air flotation holes at the center and the air flotation holes at the edge of the graphite base 1 have different angles to the normal of the surface of the graphite base 1. The air flotation holes in the central region are mainly used to suspend the air flotation base 3, while the air flotation holes in the edge region are mainly used to make the air flotation base 3 rotate rapidly at temperature.

[0039] In this embodiment, the graphite base 1 has multiple air flotation channels, and the distance from the air flotation carrier gas to each air flotation hole is consistent. Different types of air flotation carrier gases can be independently introduced into the multiple air flotation channels inside the graphite base 1. When a lower rotational speed is required, air flotation carrier gas can be introduced only into the central or edge regions; when a higher rotational speed is required, air flotation carrier gas can be introduced into both the central and edge regions simultaneously. Furthermore, lighter hydrogen gas is introduced into the central region to ensure the air flotation base 3 remains suspended and rotates, while also reducing the relatively high temperature in the central region. Argon gas is introduced into the edge regions to reduce heat dissipation, further improving the temperature uniformity of the epitaxial growth region.

[0040] like Figure 2As shown, in this embodiment, the top of the graphite base 1 is provided with a first support ring groove 107 that matches the air flotation support ring 2. The first auxiliary air flotation hole 104 and the second auxiliary air flotation hole 106 are located outside the first support ring groove 107, and the first air flotation hole 108 and the second air flotation hole 109 are located inside the first support ring groove 107. In this embodiment, the top part of the graphite base 1 is divided into inner and outer rings with the first support ring groove 107 as the boundary, and the temperature of the graphite base 1 is adjusted by the airflow size and type of the carrier gas. At the same time, the distribution of the inner and outer rings can be determined according to the size of the air flotation base 3. For example, when the size of the air flotation base 3 is 6 inches, the carrier gas can be introduced only inside the first support ring groove 107, that is, only the main air flotation channel 101 inputs the air flotation carrier gas; when the size of the air flotation base 3 is 8 inches, the carrier gas is introduced into both the inner and outer sides of the first support ring groove 107, that is, both the main air flotation channel 101 and the auxiliary air flotation channel 102 input the air flotation carrier gas, and the type and flow rate of the carrier gas transported in the main air flotation channel 101 and the auxiliary air flotation channel 102 are independently controlled.

[0041] Furthermore, the air-bearing support ring 2 is a graphite support ring with a waist-shaped cross-section. At least three support steps 21 are evenly distributed on the top of the air-bearing support ring 2, and the total area of ​​the multiple support steps 21 accounts for less than 30% of the total area of ​​the air-bearing support ring 2. This ensures that the air-bearing base 3 is stably supported and that the air-bearing carrier gas ejected from the central area of ​​the graphite base 1 can escape from the air-bearing support ring 2, avoiding the concentration of air pressure.

[0042] like Figure 5 and Figure 6 As shown, in this embodiment, four support steps 21 are provided on the air flotation support ring 2, and the included angle of each support step 21 on the ring is 20°, which can not only provide stable support for the air flotation base 3, but also not affect the smooth ejection of the air flotation carrier.

[0043] In this embodiment, multiple support steps 21 are evenly distributed on the air-bearing support ring 2. Each support step 21 occupies a small proportion on the circumference, and the multiple support steps 21 are evenly spaced at a certain angle, which ensures the stability of the air-bearing base 3 and also facilitates the escape of the air-bearing carrier gas in the center of the graphite base.

[0044] In this embodiment, the bottom of the air flotation base 3 is provided with a second support ring groove 32 that matches the air flotation support ring 2. Further, the bottom of the air flotation base 3 is also provided with a plurality of first guide grooves 31 and a plurality of second guide grooves 33 intersectingly. Both the first guide grooves 31 and the second guide grooves 33 extend from the edge of the air flotation base 3 towards the center, with the first guide grooves 31 extending to the inner side of the second support ring groove 32 and the second guide grooves 33 extending to the outer side of the second support ring groove 32. The first guide grooves 31 match the main air flotation channel 101, and the second guide grooves 33 match the auxiliary air flotation channel 102.

[0045] After the air flotation carrier gas delivered by the main air flotation channel 101 reaches the center of the graphite base 1, it enters the gas collection cavity 111 at the center of the graphite base 1 through the upward through hole 110. Part of the gas is ejected through the second air flotation hole 109, which lifts the air flotation base 3. The remaining gas is ejected through the first air flotation hole 108 and acts on the first guide groove 31 at the bottom of the air flotation base 3, driving the air flotation base 3 to rotate around the air flotation support ring 2.

[0046] After the air flotation carrier gas entering through the auxiliary air flotation channel 102 reaches the center of the graphite base 1, it passes through the first auxiliary air flotation channel 103 and the second auxiliary air flotation channel 105 respectively, and then through the first auxiliary air flotation hole 104 and the second auxiliary air flotation hole 106 to act on the second guide groove 33 on the back of the air flotation base 3, driving the air flotation base 3 to rotate around the air flotation support ring 2.

[0047] By intersecting multiple different air guide grooves at the bottom of the air flotation base, which are adapted to the air flotation channels with different paths inside the graphite base 1, the stable rotation of air flotation bases of different sizes and weights is ensured, and the gas utilization rate is improved.

[0048] While the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the invention. Any person skilled in the art can make many possible variations and modifications to the technical solutions of the present invention, or modify them into equivalent embodiments, without departing from the spirit and technical essence of the invention. Therefore, any simple modifications, equivalent substitutions, equivalent changes, and modifications made to the above embodiments based on the technical essence of the present invention, without departing from the content of the present invention, shall still fall within the scope of protection of the present invention.

Claims

1. An air-floating rotary mechanism for epitaxial devices, characterized in that, include: The graphite base (1), the air-floating support ring (2), and the air-floating base (3) are provided. One end of the air-floating support ring (2) is installed inside the graphite base (1), and the other end of the air-floating support ring (2) is installed inside the air-floating base (3). The graphite base (1) is provided with multiple independent carrier gas channels. The top of the graphite base (1) is evenly distributed with multiple air-floating holes that communicate with the carrier gas channels. The bottom of the air-floating base (3) is provided with a guide groove. The top of the air-floating base (3) is a substrate tray for placing the substrate. The air-floating carrier gas enters the graphite base (1) through the carrier gas channel and is ejected through the air-floating holes to lift the air-floating base (3). The air-floating carrier gas acts on the guide groove of the air-floating base (3) to drive the air-floating base (3) to rotate around the air-floating support ring (2). The carrier gas channel includes a main air flotation channel (101) and an auxiliary air flotation channel (102) with independent air intake control. The input ends of the main air flotation channel (101) and the auxiliary air flotation channel (102) are arranged side by side on the side of the graphite base (1). The output end of the main air flotation channel (101) is connected to multiple air flotation holes at the top center of the graphite base (1). The air flotation carrier gas delivered by the main air flotation channel (101) is used to support the air flotation base (3) and drive the air flotation base (3) to rotate around the air flotation support ring (2). The output end of the auxiliary air flotation channel (102) is connected to multiple air flotation holes on both sides of the top of the graphite base (1). The air flotation carrier gas delivered by the auxiliary air flotation channel (102) is used to drive the air flotation base (3) to rotate around the air flotation support ring (2). The graphite base (1) has a gas collection chamber (111) at the top center. The output end of the main air flotation channel (101) is connected to the bottom of the gas collection chamber (111) through a through hole (110). The top of the gas collection chamber (111) is provided with a second air flotation hole (109) and a plurality of first air flotation holes (108). The second air flotation hole (109) is located at the top center of the gas collection chamber (111). The air flotation carrier gas ejected from the second air flotation hole (109) is used to support the air flotation base (3). The plurality of first air flotation holes (108) are evenly arranged around the outer periphery of the second air flotation hole (109). The air flotation carrier gas ejected from the first air flotation hole (108) is used to support the air flotation base (3) and drive the air flotation base (3) to rotate around the air flotation support ring (2). The graphite base (1) is further provided with a first auxiliary air flotation channel (103) and a second auxiliary air flotation channel (105). The output end of the auxiliary air flotation channel (102) is connected to the input end of the first auxiliary air flotation channel (103) and the second auxiliary air flotation channel (105) respectively. The graphite base (1) is provided with a first auxiliary air flotation hole (104) and a second auxiliary air flotation hole (106) symmetrically on both sides of the top. The output end of the first auxiliary air flotation channel (103) is connected to the first auxiliary air flotation hole (104), and the output end of the second auxiliary air flotation channel (105) is connected to the second auxiliary air flotation hole (106). The air flotation carrier gas ejected from the first auxiliary air flotation hole (104) and the second auxiliary air flotation hole (106) is used to drive the air flotation base (3) to rotate around the air flotation support ring (2). The axis of the second air flotation hole (109) is vertically upward. The axes of the first air flotation hole (108) and the first auxiliary air flotation hole (104) are both at an angle to the axis of the second air flotation hole (109). The angle between the axis of the first air flotation hole (108) and the axis of the second air flotation hole (109) is smaller than the angle between the axis of the first auxiliary air flotation hole (104) and the axis of the second air flotation hole (109). The graphite base (1) has a first support ring groove (107) at the top that matches the air flotation support ring (2). The first auxiliary air flotation hole (104) and the second auxiliary air flotation hole (106) are located outside the first support ring groove (107), and the first air flotation hole (108) and the second air flotation hole (109) are located inside the first support ring groove (107).

2. The air-floating rotating mechanism for epitaxial equipment according to claim 1, characterized in that, The top of the air-float support ring (2) is evenly distributed with multiple support steps (21).

3. The air-floating rotating mechanism for epitaxial equipment according to claim 2, characterized in that, The number of the support steps (21) is greater than 3, and the total area of ​​the multiple support steps (21) accounts for less than 30% of the area on the air-float support ring (2).

4. The air-floating rotation mechanism for epitaxial equipment according to claim 1, characterized in that, The bottom of the air flotation base (3) is provided with a second support ring groove (32) that matches the air flotation support ring (2).

5. The air-floating rotating mechanism for epitaxial equipment according to claim 4, characterized in that, The bottom of the air flotation base (3) is also provided with a plurality of first guide grooves (31) and a plurality of second guide grooves (33). The first guide grooves (31) and the second guide grooves (33) extend from the edge of the air flotation base (3) towards the center. The first guide groove (31) extends to the inner side of the second support ring groove (32), and the second guide groove (33) extends to the outer side of the second support ring groove (32). The first guide groove (31) matches the main air flotation channel (101), and the second guide groove (33) matches the auxiliary air flotation channel (102).

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