A positron annihilation lifetime measurement device and method for thin film sample characterization
By designing a device consisting of a positron emitter, a detector, and a gamma detector, the problem of thickness limitation in thin film sample measurement was solved, enabling thickness-free and non-contact measurement of thin film samples, expanding the application range and improving measurement accuracy.
Patent Information
- Application Number
- CN202310726693.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-06-19
- Publication Date
- 2026-06-26
- Estimated Expiration
- 2043-06-19
AI Technical Summary
Conventional positron annihilation lifetime spectrometers cannot effectively measure thin film samples because the positrons generated by the radiation source have a continuous energy distribution that may penetrate the thin film, resulting in a limitation on the measurement thickness.
Design a device consisting of a positron emitter, a positron detector, and a gamma detector. The sample is placed between the emitter and the detector, and the gamma detector is placed around the sample. By filtering signals and processing data, non-sample positron annihilation information is eliminated, enabling non-contact measurement. This device is suitable for different types of radiation sources and environmental conditions.
It enables thickness-free measurement of thin film samples, applicable to both non-contaminating and contaminating materials, broadens the application range of positron annihilation lifetime measurement, and improves measurement accuracy and applicability.
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Abstract
Citation Information
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