Sample analysis device

Abstract

This application provides a sample analysis device, which includes a dispensing mechanism and a cleaning mechanism. The dispensing mechanism includes a moving part and a pipette. The cleaning mechanism includes a cleaning tank and an ultrasonic generator. The ultrasonic generator is located at the bottom of the cleaning tank and on the side of the cleaning tank away from the cleaning chamber, so as to transmit the sound field to the cleaning fluid in the cleaning chamber through the cleaning tank and concentrate the energy of the sound field to the position of the pipette in the cleaning chamber.

Description

Technical Field

[0001] This application relates to the field of medical technology, and in particular to a sample analysis device. Background Technology

[0002] In vitro diagnostic testing equipment requires the use of pipettes (such as sample needles and reagent needles) to add samples or reagents to ensure complete reactions. While pipettes are reusable, they come into contact with different liquid media during operation. To eliminate cross-contamination between different media, pipettes need to be cleaned after each use to remove any residual substances from their surface, preventing them from being carried into the next reaction and causing cross-contamination that could affect the accuracy of test results.

[0003] How to clean pipettes has always been a subject of ongoing research. Summary of the Invention

[0004] This application provides a sample analysis device, which is described in detail below.

[0005] One embodiment provides a sample analysis apparatus, comprising:

[0006] The dispensing mechanism includes a moving part and a pipette disposed on the moving part; the moving part is used to drive the pipette to move between different operating positions to aspirate or dispense target liquid, the target liquid including at least one of a sample or a reagent;

[0007] A cleaning mechanism includes a cleaning tank and an ultrasonic generator. The cleaning tank has a cleaning chamber with a top opening, the opening of which is located on the movement path of a pipette. The pipette is inserted into the cleaning chamber through the opening. The ultrasonic generator is located at the bottom of the cleaning tank and on the side of the cleaning tank opposite to the cleaning chamber, so as to transmit a sound field through the cleaning tank to the cleaning fluid in the cleaning chamber and concentrate the energy of the sound field to the position of the pipette in the cleaning chamber.

[0008] A liquid path support mechanism is provided to supply cleaning fluid to the cleaning chamber.

[0009] In one embodiment, the cleaning chamber includes an energy concentration area and an energy transfer area, the energy transfer area surrounding the energy concentration area, the energy of the sound field emitted by the ultrasonic generator being transferred through the energy transfer area and then concentrated in the energy concentration area, and the pipette being located in the energy concentration area for cleaning.

[0010] In one embodiment, the line connecting the center of gravity of the cleaning tank and the vibration center of the ultrasonic generator is parallel to the axis of the pipette, and the line or its extension passes through the energy concentration area.

[0011] In one embodiment, the center of gravity of the cleaning tank and the vibration center of the ultrasonic generator are located on the axis of the pipette.

[0012] In one embodiment, the ultrasonic generator transmits a sound field to the cleaning fluid in the cleaning chamber through the cleaning tank and concentrates the energy of the sound field onto the pipette.

[0013] In one embodiment, the cleaning tank includes a first bottom wall and a first side wall. The first side wall is arranged around the periphery of the first bottom wall to enclose and form the cleaning chamber. The first bottom wall includes a connecting area. The orthographic projection of the pipette on the first bottom wall is located within the connecting area. The output end of the ultrasonic generator abuts against the connecting area.

[0014] In one embodiment, the first bottom wall includes a bottom surface facing the ultrasonic generator, the bottom surface having a centrally symmetrical structure, and the output end of the ultrasonic generator abutting the center of the bottom surface.

[0015] In one embodiment, the cleaning tank further includes a second sidewall and a second bottom wall. The second bottom wall is disposed around the first bottom wall and connected to the periphery of the first bottom wall. Alternatively, the second bottom wall is disposed around the first sidewall and connected to the outer surface of the first sidewall facing the second bottom wall. The second sidewall is disposed around the outer periphery of the second bottom wall to enclose and form an overflow chamber, which is used to receive liquid overflowing from the cleaning chamber.

[0016] In one embodiment, the first bottom wall is provided with a first waste liquid outlet communicating with the cleaning chamber, and the second bottom wall is provided with a second waste liquid outlet communicating with the overflow chamber.

[0017] In one embodiment, the first sidewall includes a first arc segment, the second sidewall includes a second arc segment, and the axis corresponding to the first arc segment and the axis corresponding to the second arc segment coincide.

[0018] In one embodiment, the first sidewall includes a first arc segment, and the second sidewall includes a second arc segment, wherein the first arc segment accounts for no less than 80% of the first sidewall, and the second arc segment accounts for no less than 60% of the second sidewall.

[0019] In one embodiment, the second bottom wall includes a first surrounding portion and a first protrusion. The first surrounding portion is disposed around the first bottom wall, and the first protrusion is located on the side of the first surrounding portion away from the first bottom wall. The first protrusion is provided with a second waste liquid outlet so that the cleaning liquid in the overflow chamber is discharged through the second waste liquid outlet.

[0020] The second sidewall includes a second surrounding portion connected to the first surrounding portion and a second protrusion connected to the first protrusion.

[0021] The first sidewall includes a balancing portion disposed opposite to the first protrusion and the second protrusion, so that the energy of the sound field of the ultrasonic generator is concentrated at the location of the pipette in the cleaning chamber.

[0022] In one embodiment, the balancing unit is provided with a liquid inlet channel communicating with the cleaning chamber.

[0023] In one embodiment, the first bottom wall is provided with a first waste liquid outlet communicating with the cleaning chamber, and the cleaning tank further includes a first drain connector connected to the first waste liquid outlet and a liquid inlet connector connected to the liquid inlet channel; the cleaning tank further includes a second drain connector installed at the second waste liquid outlet.

[0024] The first drain connector and the inlet connector are located on the same side of the ultrasonic generator, and on opposite sides of the ultrasonic generator as the second drain connector, so that the energy of the sound field of the ultrasonic generator is concentrated at the position of the pipette in the cleaning chamber.

[0025] In one embodiment, the cross-section of the second waste liquid outlet is circular and has a diameter greater than 6 millimeters.

[0026] In one embodiment, the cleaning tank further includes a drain pump connected to the second waste liquid outlet, the second waste liquid outlet having a circular cross-section with a diameter greater than 3 mm.

[0027] In one embodiment, the sample analysis device further includes a controller, which is used to control the ultrasonic generator to stop cleaning the pipette or to make the ultrasonic generator ineffective in cleaning the pipette when the liquid volume in the overflow chamber exceeds a liquid volume threshold.

[0028] In one embodiment, the first sidewall includes a first arc segment, the first arc segment accounting for not less than 80% of the first sidewall, and the diameter corresponding to the first arc segment is less than 1 / 2 wavelength of the ultrasonic wave emitted by the ultrasonic generator.

[0029] In one embodiment, the distance between the surface of the cleaning fluid in the cleaning chamber and the first bottom wall is less than one wavelength of the ultrasonic wave emitted by the ultrasonic generator.

[0030] In one embodiment, the sample analysis device further includes a sample carrying mechanism, a reagent carrying mechanism, a reaction mechanism, a mixing mechanism, and a measuring mechanism. The sample carrying mechanism has at least one sample position for placing a sample container, which is used to contain a sample. The reagent carrying mechanism has at least one reagent position for placing a reagent container, which is used to contain a reagent. The reaction mechanism has multiple placement positions for placing reaction cups, and the reaction mechanism is used to incubate the reaction solution in the reaction cups at its placement positions, wherein the reaction solution is prepared from the sample and the reagent. The mixing mechanism is used to mix the reaction solution in the reaction cups that needs to be mixed. The moving mechanism includes a first moving component and a second moving component. The pipette includes a sample needle and a reagent needle. The first moving component is connected to the sample needle to move the sample needle between the sample position, the placement position, and the cleaning mechanism. The second moving component is connected to the reagent needle to move the reagent needle between the reagent position, the placement position, and the cleaning mechanism.

[0031] In one embodiment, the mixing mechanism includes a stirring rod driving mechanism and a stirring rod. The stirring rod driving mechanism drives the stirring rod to move, so as to mix the reaction liquid in the reaction cup that needs to be mixed. The cleaning mechanism is disposed on the moving trajectory of the stirring rod to perform ultrasonic cleaning on the stirring rod after mixing.

[0032] The sample analysis apparatus according to the above embodiments incorporates an ultrasonic generator, which, in conjunction with a cleaning tank, performs ultrasonic cleaning of the pipette. This concentrates the energy of the ultrasonic wave's sound field onto the pipette, resulting in a powerful stripping and cleaning effect, effectively eliminating accumulated contaminant residues and achieving a thorough cleaning. Furthermore, since the ultrasonic generator is installed outside the cleaning tank and does not need to be submerged in the cleaning solution, waterproofing is not a concern, simplifying the waterproofing requirements for the ultrasonic generator. The cleaning tank does not need to house the ultrasonic generator, allowing for a smaller volume and maximizing the use of space outside the cleaning tank to accommodate the ultrasonic generator, thus improving the space utilization rate within the sample analysis apparatus. Attached Figure Description

[0033] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below.

[0034] Figure 1 This is a schematic diagram of a first structure of the sample analysis device provided in an embodiment of this application.

[0035] Figure 2 for Figure 1 The diagram shows a first structural schematic of the cleaning mechanism in the sample analysis device.

[0036] Figure 3 for Figure 2 Another angle of the cleaning mechanism shown.

[0037] Figure 4 This is a schematic diagram of sound field transmission in the cleaning mechanism provided in the embodiments of this application.

[0038] Figure 5 for Figure 1 The diagram shows a second structural design of the cleaning mechanism in the sample analysis device.

[0039] Figure 6 for Figure 5 Another angle of the cleaning mechanism shown.

[0040] Figure 7 This is a schematic diagram of the cleaning mechanism and dispensing mechanism provided in the embodiments of this application.

[0041] Figure 8 Another schematic diagram of sound field transmission in the cleaning mechanism provided in the embodiments of this application.

[0042] Figure 9 for Figure 1 The diagram shows a third type of cleaning mechanism in the sample analysis device.

[0043] Figure 10 for Figure 9 An exploded view of the cleaning mechanism shown.

[0044] Figure 11 A schematic diagram of the structure of some components of the liquid path support mechanism in the sample analysis device provided in the embodiments of this application.

[0045] Figure 12 for Figure 1 The diagram shows the fourth structure of the cleaning mechanism in the sample analysis device.

[0046] Figure 13 for Figure 12 Another angle view of the cleaning structure shown.

[0047] Figure 14 for Figure 1 The diagram shows the fifth structural design of the cleaning mechanism in the sample analysis device.

[0048] Figure 15 for Figure 14 Another angle view of the cleaning structure shown.

[0049] Figure 16This is a second structural schematic diagram of the sample analysis device provided in the embodiments of this application.

[0050] Figure 17 This is a schematic diagram of a third structure of the sample analysis device provided in the embodiments of this application.

[0051] Figure 18 A perspective view of some components of the sample analysis device provided in the embodiments of this application.

[0052] Figure 19 A flowchart of the sample analysis method provided in the embodiments of this application.

[0053] Figure 20 Another flowchart of the sample analysis method provided in the embodiments of this application. Detailed Implementation

[0054] The present invention will now be described in further detail with reference to specific embodiments and accompanying drawings. Similar elements in different embodiments are referred to by associated similar element reference numerals. In the following embodiments, many details are described to facilitate a better understanding of this application. However, those skilled in the art will readily recognize that some features may be omitted in different situations, or may be replaced by other elements, materials, or methods. In some cases, certain operations related to this application are not shown or described in the specification. This is to avoid obscuring the core parts of this application with excessive description. For those skilled in the art, detailed description of these related operations is not necessary; they can fully understand the related operations based on the description in the specification and general technical knowledge in the art.

[0055] Furthermore, the features, operations, or characteristics described in the specification can be combined in any suitable manner to form various embodiments. At the same time, the steps or actions in the method description can be rearranged or adjusted in a manner obvious to those skilled in the art. Therefore, the various orders in the specification and drawings are only for the clear description of a particular embodiment and do not imply a necessary order, unless otherwise stated that a particular order must be followed.

[0056] The serial numbers assigned to components in this document, such as "first" and "second," are used only to distinguish the described objects and have no sequential or technical meaning. The terms "connection" and "linkage" used in this application, unless otherwise specified, include both direct and indirect connections (linkages).

[0057] For pipettes such as sample needles and reagent needles, dedicated cleaning mechanisms are typically designed. After a dispensing of media—for sample needles dispensing samples and for reagent needles dispensing reagents—the pipette usually moves to the cleaning station for cleaning. Only after cleaning is complete does it perform the next dispensing. To minimize the time spent cleaning and its impact on testing speed, this cleaning process generally cannot completely remove contaminants. With prolonged use, the accumulation of minute contaminants on the instrument's surface can eventually lead to excessive cross-contamination, or the accumulation of residues can alter the surface properties of components, increasing the amount of liquid residue after cleaning. If this residue enters the reaction system, it can cause abnormal test results.

[0058] There are two ways to handle this situation:

[0059] One method is regular manual maintenance and cleaning: This method can effectively remove accumulated residues, but it requires manual operation, and the timing and frequency of operation cannot be accurately controlled, making the operation quite complex. Furthermore, abnormal or improper operation of precision units may cause damage or failure of the units.

[0060] Secondly, specialized chemical cleaning can be used: This method involves using one or more chemical cleaning agents, which are added periodically to perform specialized cleaning on the object to be cleaned, such as pipettes. This process is generally automated. However, this method is only suitable for contaminants that can react with the cleaning agent. It is still difficult to remove complex contaminants, especially in situations where the cleaning force is weak. Furthermore, the introduction of excessive cleaning media increases operational complexity and the difficulty of managing consumables.

[0061] This application introduces an ultrasonic generator for cleaning, specifically for cleaning objects such as pipettes using ultrasonic mode. This achieves a powerful peeling and cleaning effect, effectively eliminating accumulated contaminant residues and resulting in a thorough cleaning. In other solutions, for multiple different objects to be cleaned, such as sample needles and reagent needles, a cleaning mechanism with the same structure and ultrasonic generator can be used, eliminating the need to design different cleaning mechanisms specifically for each object. The invention will be described below.

[0062] Please refer to Figure 1 Some embodiments disclose a sample analysis device, which may include a dispensing mechanism 2, a cleaning mechanism 4, and a liquid path support mechanism, which are described in detail below.

[0063] The dispensing mechanism 2 may include a moving part 22 and pipettes 24 disposed on the moving part 22; the moving part 22 is used to drive the pipettes 24 to move between different operating positions to aspirate or dispense the target liquid. In some embodiments, the number of pipettes 24 may be set to one or more as needed. In some embodiments, when there are multiple pipettes 24, the moving part 22 may drive each pipette 24 to move independently. The moving part 22 may be a two-dimensional or three-dimensional drive mechanism, which may be designed according to specific needs. For the pipettes 24, a typical sequence of actions is as follows: the pipette 24 moves to, for example, the aspiration position to aspirate the target liquid, then moves to, for example, the dispensing position to dispense the aspirated target liquid into the reaction vessel, and then moves to a predetermined position for cleaning. Of course, in some examples, the outer wall of the pipette 24 may be cleaned once after the pipette 24 aspirates the target liquid and before dispensing the target liquid. In some embodiments, the target liquid includes at least one of a sample or a reagent. In some examples, the pipette 24 may aspirate and dispense the sample in a first time period and may also aspirate and dispense the reagent in a second time period. In other examples, pipette 24 is used only for aspirating and dispensing samples, or only for aspirating and dispensing reagents.

[0064] Please combine Figure 2 and Figure 3 The cleaning mechanism 4 may include a cleaning tank 42 and an ultrasonic generator 44. The cleaning tank 42 is provided with a cleaning chamber 424 with a top opening 422. The opening 422 of the cleaning chamber 424 is located on the movement trajectory of the pipette 24, and the pipette 24 can be inserted into the cleaning chamber 424 through the opening 422. A fluid support mechanism is used to supply cleaning fluid to the cleaning chamber 424.

[0065] In some embodiments, the ultrasonic generator 44 is located at the bottom of the cleaning tank 42 and on the side of the cleaning tank 42 away from the cleaning chamber 424, so as to transmit the sound field through the cleaning tank 42 to the cleaning fluid in the cleaning chamber 424 and concentrate the energy of the sound field to the location of the pipette 24 in the cleaning chamber 424.

[0066] It is understandable that the location of the pipette 24 can be interpreted as the area within the cleaning chamber 424 used to accommodate the pipette 24, and this area can be configured as needed. In some examples, this area can be the central area of ​​the cleaning chamber 424, with a cross-sectional area that is half the cross-sectional area of ​​the cleaning chamber 424. In other examples, this area can be a cylindrical region centered on the axis of the cleaning chamber 424, with a radius equal to half the radius of the cleaning chamber 424.

[0067] This application introduces an ultrasonic generator 44, which works in conjunction with the cleaning tank 42 to perform ultrasonic cleaning on the pipette 24. The ultrasonic generator 44 concentrates the energy of the ultrasonic wave's sound field onto the pipette 24, providing a powerful stripping and cleaning effect, effectively eliminating accumulated contaminant residues, and achieving a thorough cleaning. The ultrasonic generator 44 can be positioned at the bottom of the cleaning tank 42, away from the pipette 24; that is, the ultrasonic generator 44 is installed outside the cleaning tank 42 and does not need to be submerged in the cleaning solution. This eliminates the need to consider waterproofing issues for the ultrasonic generator 44, simplifying its waterproofing requirements. Furthermore, the cleaning tank 42 does not need to house the ultrasonic generator 44, allowing for a smaller volume and maximizing the use of space outside the cleaning tank 42 to accommodate the ultrasonic generator 44, thus improving the space utilization within the sample analysis device.

[0068] It should be noted that the cleaning mechanism 4 in the sample analysis device has a limited volume, and the ultrasonic generator 44 is located at the bottom of the cleaning tank 42. The ultrasonic generator 44 also has a limited volume and correspondingly low power. If the sound field is not concentrated, the sound field generated by the ultrasonic generator 44 will diffuse in all directions, and the energy reaching the pipette 24 will be limited, failing to effectively clean the outer wall of the pipette 24. Choosing a larger and more powerful ultrasonic generator 44 would improve the cleaning effect, but it would increase the volume of the cleaning mechanism and the sample analysis device, as well as their power consumption. However, the sample analysis device has limited volume and cannot provide more space. Therefore, the cleaning tank 42 and ultrasonic generator 44 of this application work together to concentrate the sound field energy to the location of the pipette 24 within the cleaning chamber 424. This achieves a powerful peeling and cleaning effect while maintaining a small volume for both the cleaning mechanism and the ultrasonic generator 44, and the ultrasonic generator also has low power and low power consumption.

[0069] The principle of ultrasonic cleaning of the pipette 24 using the ultrasonic generator 44 is as follows: The ultrasonic waves emitted by the ultrasonic generator 44 exert direct and indirect effects on the liquid and contaminants through cavitation, acceleration, and / or direct flow, thereby dispersing, emulsifying, and peeling off the contaminants to achieve the cleaning purpose. Generally, ultrasonic cleaning utilizes the strong cavitation and vibration generated by ultrasonic waves to peel off dirt from the surface of the object to be cleaned, and can also decompose and emulsify oily contaminants. In some embodiments, the medium used in the ultrasonic cleaning described herein includes chemical reagents, such as the cleaning solution mentioned above.

[0070] In some embodiments, the inner wall of the cleaning tank 42 may be provided with a reflective structure, which can reflect the sound field emitted by the ultrasonic wave to change the propagation direction of the sound field, that is, change the direction of energy transfer of the sound field, so that the energy of the sound field emitted by the ultrasonic wave is concentrated at the location of the pipette 24.

[0071] In some embodiments, the ultrasonic generator 44 can also transmit a sound field to the cleaning fluid in the cleaning chamber 424 through the cleaning tank 42 and concentrate the energy of the sound field onto the pipette 24. The moving component 22 can move the pipette 24 to a fixed position within the cleaning chamber 424. For example, the moving component 22 can move the pipette 24 to the axial position of the cleaning chamber 424. The ultrasonic generator 44 and the cleaning tank 42 work together to concentrate the sound field energy onto the pipette 24, thereby effectively cleaning the outer wall of the pipette 24.

[0072] In some embodiments, the cleaning chamber 424 may include an energy concentration region 424a and an energy transfer region 424b. The energy transfer region 424b surrounds the energy concentration region 424a, that is, the energy transfer region 424b is located between the ultrasonic generator 44 and the energy concentration region 424a. The energy of the sound field emitted by the ultrasonic generator is transferred through the energy transfer region 424b and then concentrated into the energy concentration region 424a. The pipette 24 is located in the energy concentration region 424a for cleaning. The energy of the sound field per unit volume in the energy concentration region 424a is greater than the energy of the sound field per unit volume in the energy transfer region 424b. For example, the energy of the sound field emitted by the ultrasonic generator 44 can be transferred to the energy concentration area 424a through the energy transfer area 424b. When the energy of the sound field is transferred to the inner wall of the cleaning tank 42 through the energy transfer area 424b, the inner wall can reflect the energy of the sound field and transfer the reflected energy of the sound field to the energy concentration area 424a through the energy transfer area 424b, thereby concentrating the energy of the sound field in the energy concentration area 424a, so that the energy of the sound field in the energy concentration area 424a is greater than the energy of the sound field in the energy transfer area 424b.

[0073] Understandably, when the moving part 22 moves the pipette 24 into the cleaning chamber 424, considering the movement error of the moving part 22, the pipette 24 cannot be fixed in the same position each time it moves into the cleaning chamber 424, but it will be within an error range. The energy concentration region 424a can be this error range, or it can include this error range. The energy of the sound field emitted by the ultrasonic generator 44 is concentrated in the energy concentration region 424a. The pipette 24 is located within the energy concentration region 424a, which ensures that the energy of the sound field is concentrated at the position of the pipette 24 each time.

[0074] In some embodiments, to better concentrate the energy of the sound field emitted by the ultrasonic generator 44 to the location of the pipette 24, the line connecting the center of gravity of the cleaning tank 42 and the vibration center of the ultrasonic generator 44 can be set parallel to the axis of the pipette 24, and the line or its extension passes through the energy concentration area 424a. This allows the energy of the sound field emitted by the ultrasonic generator 44 to be transmitted towards the energy concentration area 424a. It is understood that the pipette can be placed vertically with its axis parallel to a vertical line. The center of gravity of the cleaning tank 42 and the vibration center of the ultrasonic generator 44 can be on the same vertical line. During the process of emitting the sound field, the ultrasonic generator 44 simultaneously transmits vibrations to the cleaning tank 42. If the center of gravity of the cleaning tank 42 and the vibration center of the ultrasonic generator 44 are not on the same vertical line, the cleaning tank 42 will tilt during vibration, and the tilt angle may continuously change, causing the propagation direction of the sound field to continuously change. The energy of the sound field will be transmitted in all directions, and the energy of the sound field from the cleaning pipette will not meet the cleaning requirements. In this embodiment, the center of gravity of the cleaning tank 42 and the vibration center of the ultrasonic generator 44 are on the same vertical line. The cleaning tank 42 will not tilt during vibration, thus ensuring that the propagation direction of the sound field remains unchanged, and the energy of the sound field can be transmitted towards the pipette 24. In some embodiments, the inner wall of the cleaning tank 42 may be provided with corresponding reflective structures to reflect the sound field to the pipette 24, thereby concentrating the energy of the sound field onto the pipette. For details, please refer to the above embodiments, which will not be repeated here.

[0075] In some embodiments, the center of gravity of the cleaning tank 42 and the vibration center of the ultrasonic generator 44 are located on the axis of the pipette 24. This allows the energy of the sound field emitted by the ultrasonic generator 44 to be transmitted toward the pipette 24, and the axis of the pipette 24 is the location where the energy is most concentrated. The energy at various locations on the outer wall of the pipette 24 around the axis is similar and very large, thus ensuring that all locations on the outer wall of the pipette 24 are thoroughly cleaned without causing significant energy differences between different locations on the outer wall of the pipette 24, resulting in some parts being thoroughly cleaned while others are not.

[0076] In some embodiments, the cleaning tank 42 includes a first bottom wall 421 and a first side wall 423, the first side wall 423 being disposed around the periphery of the first bottom wall 421 to enclose and form a cleaning chamber 424. (Please refer to...) Figure 4 The first bottom wall 421 may include a connecting area 4212. The orthographic projection of the pipette 24 on the first bottom wall 421 is located within the connecting area 4212. The output end of the ultrasonic generator 44 abuts against the connecting area 4212 so that the sound field emitted by the ultrasonic generator 44 mainly propagates toward the pipette 24, thereby concentrating the energy of the sound field mainly at the location of the pipette 24.

[0077] In some embodiments, the first bottom wall 421 includes a bottom surface 4214 facing the ultrasonic generator 44. The bottom surface 4214 has a centrally symmetrical structure, such as a circle, ellipse, regular polygon, or other central structure. The output end of the ultrasonic generator 44 abuts against the center of the bottom surface 4214. It should be noted that the bottom surface 4214 has a centrally symmetrical structure, and the output end of the ultrasonic generator 44 abuts against the center of the bottom surface 4214. The line connecting the center of the bottom surface 4214 and the vibration center of the ultrasonic wave, or the extension of the line, can pass through the center of gravity of the cleaning tank 42. The connection point with the ultrasonic generator 44 can be easily determined on the bottom surface 4214 through the center of the bottom surface 4214.

[0078] In some embodiments, the bottom surface 4214 of the first bottom wall 421 may also be a non-centrally symmetrical structure. The bottom surface 4214 may include a connection point on the line connecting the center of gravity of the cleaning tank 42 and the vibration center of the ultrasonic generator 44 or on the extension of the line. The output end of the ultrasonic generator 44 abuts against the connection point of the bottom surface 4214.

[0079] In some embodiments, please refer to Figure 5 and Figure 6 The cleaning tank 42 also includes a second side wall 425 and a second bottom wall 427. The second bottom wall 427 is arranged around the first bottom wall 421 and connected to the periphery of the first bottom wall 421. The second side wall 425 is arranged around the outer periphery of the second bottom wall 427 to enclose and form an overflow chamber 426. The overflow chamber 426 is used to receive liquid overflowing from the cleaning chamber 424.

[0080] In addition to the cleaning chamber 424, the cleaning tank 42 may also include an overflow chamber 426. The overflow chamber 426 can receive the liquid overflowing from the cleaning chamber 424. Strict control of the amount of cleaning fluid injected is not required. After the cleaning chamber 424 is full, some of the cleaning fluid can overflow into the overflow chamber 426. The cleaning chamber 424 can always contain a sufficient and consistent amount of cleaning fluid. The second bottom wall 427 and the first bottom wall 421 are interconnected to form the bottom wall of the cleaning tank 42. The second bottom wall 427 and the first bottom wall 421 can be two interconnected bottom walls, or they can be integrally formed.

[0081] It should be noted that, please refer to... Figure 7 and Figure 8 The cleaning tank 42 with overflow chamber 426 can also work with ultrasonic generator 44 to concentrate the energy of the sound field onto pipette 24. For details, please refer to the above embodiments, which will not be repeated here.

[0082] In some embodiments, the cleaning tank 42 further includes a second sidewall 425 and a second bottom wall 427. The second bottom wall 427 is disposed around the first sidewall 423 and connected to the outer surface of the first sidewall 423 facing the second bottom wall 427. The second sidewall 425 is disposed around the outer periphery of the second bottom wall 427 to enclose and form an overflow chamber 426, which is used to receive liquid overflowing from the cleaning chamber 424.

[0083] The second bottom wall 427 can also be connected to the first side wall 423. For example, the second bottom wall 427 can be connected to the edge of the first side wall 423 away from the opening 422, or the second bottom wall 427 can be connected to the middle of the first side wall 423.

[0084] In some embodiments, the second bottom wall 427 and the first bottom wall 421 may be in the same plane.

[0085] In some embodiments, the second bottom wall 427 and the first bottom wall 421 may be located on different planes. For example, the first bottom wall 421 is connected to the middle of the first side wall 423, and the second bottom wall 427 is connected to the end of the first side wall 423 away from the opening 422, that is, the distance between the second bottom wall 427 and the plane containing the opening 422 is greater than the distance between the first bottom wall 421 and the plane containing the opening 422. The first bottom wall 421 and the first side wall 423 may also form a groove opposite to the cleaning chamber 424, and the output end of the ultrasonic generator 44 may be located in the groove and abut against the first bottom wall 421.

[0086] It should be noted that in some embodiments, the cleaning tank 42 may only include the cleaning chamber 424, while in another embodiment, the cleaning tank 42 may include the cleaning chamber 424 and the overflow chamber 426.

[0087] In some embodiments, the first bottom wall 421 is provided with a first waste liquid outlet (not shown in the figure) communicating with the cleaning chamber 424, and the second bottom wall 427 is provided with a second waste liquid outlet 4274 communicating with the overflow chamber 426. The first waste liquid outlet on the first bottom wall 421 can drain the liquid in the cleaning chamber 424, and the second waste liquid outlet 4274 on the second bottom wall 427 can drain the liquid in the overflow chamber 426. It should be noted that the liquid in the cleaning chamber 424 can overflow from the opening 422 of the cleaning chamber 424 into the overflow pool, carrying away some dirt. However, some dirt may remain at the bottom of the cleaning chamber 424 and is not easy to overflow from the opening 422. The first waste liquid outlet can drain all the liquid in the cleaning chamber 424 and drain some residual dirt together, making the cleaning more thorough. In some examples, liquid can be continuously introduced into the cleaning chamber 424 while the first waste liquid outlet is opened, thereby cleaning the cleaning chamber 424 very thoroughly.

[0088] The second waste liquid outlet 4274 can discharge the liquid in the overflow chamber 426, thereby reducing the impact on the center of gravity of the cleaning tank 42.

[0089] In some embodiments, please refer to Figure 9 The first sidewall 423 includes a first arc segment 4232, and the second sidewall 425 includes a second arc segment 4252. The axis corresponding to the first arc segment 4232 and the axis corresponding to the second arc segment 4252 coincide. This facilitates placing the center of gravity of the cleaning tank 42 on the axis corresponding to the first arc segment 4232, so that the energy of the sound field is concentrated towards the pipette.

[0090] In some embodiments, the first sidewall 423 includes a first arc segment 4232, and the second sidewall 425 includes a second arc segment 4252. The first arc segment 4232 occupies a proportion of not less than 80% of the first sidewall 423; for example, the proportion of the first arc segment 4232 to the first sidewall 423 can be 85%, 90%, 95%, 100%, etc. The second arc segment 4252 occupies a proportion of not less than 60% of the second sidewall 425; for example, the proportion of the second arc segment 4252 to the second sidewall 425 can be 65%, 70%, 80%, 90%, 100%, etc. In some examples, the first sidewall 423 is entirely annular, and the proportion of the second arc segment to the second sidewall is between 80% and 90%. In other examples, both the first sidewall 423 and the second sidewall are entirely annular.

[0091] In some embodiments, please refer to Figure 5 The second bottom wall 427 includes a first surrounding portion 4277 and a first protrusion 4278. The first surrounding portion 4277 is disposed around the first bottom wall 421, and the first protrusion 4278 is located on the side of the first surrounding portion 4277 away from the first bottom wall 421. The first protrusion 4278 is provided with a second waste liquid outlet 4274 so that the cleaning liquid in the overflow chamber 426 can be discharged through the second waste liquid outlet 4274. The second side wall 425 includes a second surrounding portion 4256 connected to the first surrounding portion 4277 and a second protrusion 4258 connected to the first protrusion 4278. The first side wall 423 includes a balancing portion 4234 disposed opposite to the first protrusion 4278 and the second protrusion 4258 so that the energy of the sound field of the ultrasonic generator 44 is concentrated at the position of the pipette 24 in the cleaning chamber 424.

[0092] The first surrounding portion 4277 has a regular shape; for example, the first surrounding portion 4277 can be a ring. The center of gravity of the first surrounding portion 4277 is on the axis of the second arc segment 4252, and will not affect the center of gravity of the cleaning tank 42. However, the first protrusion 4278 is located on the side of the first surrounding portion 4277 away from the first bottom wall 421, and the second side wall 425 has a second protrusion 4258 corresponding to the first protrusion 4278. The centers of gravity of the first protrusion 4278 and the second protrusion 4258 are not on the axis of the second arc segment 4252. Therefore, a balancing portion 4234 is provided on the first side wall 423 opposite to the first protrusion and the second protrusion 4258. The first protrusion 4278 and the second protrusion 4258 are provided on one side of the cleaning tank 42, and the balancing portion 4234 is provided on the other side of the cleaning tank 42, so that the center of gravity of the cleaning tank 42 is located on the axis of the second arc segment 4252, and the energy of the sound field of the ultrasonic generator 44 is concentrated at the position of the pipette 24 in the cleaning chamber 424.

[0093] The first protrusion 4278 is provided with a second waste liquid outlet 4274, which can make the size of the first surrounding part 4277 smaller and reduce the overall size of the second bottom wall 427, which is conducive to the miniaturization of the cleaning pool 42 and the sample analysis device.

[0094] In some embodiments, the balancing portion 4234 may be a structure specifically configured to balance the first protrusion 4278 and the second protrusion 4258. The weight of the balancing portion 4234 may be equal to or close to the sum of the weights of the first protrusion and the second protrusion, so that the center of gravity of the cleaning pool is located on the pipette or the extension line of the pipette.

[0095] In some embodiments, the balancing part 4234 may also perform other functions. For example, the balancing part 4234 may be provided with a liquid inlet channel 4236 communicating with the cleaning chamber. One end of the balancing part 4234 is connected to the first sidewall 423, and the other end is connected to the second sidewall 425. The balancing part 4234 is provided with a liquid inlet channel 4236 penetrating the first sidewall 423 and the second sidewall 425 to inject external cleaning fluid into the cleaning chamber.

[0096] In some embodiments, the first bottom wall 421 is provided with a first waste liquid outlet communicating with the cleaning chamber, and the cleaning tank 42 further includes a first drain connector 4216 connected to the first waste liquid outlet and a liquid inlet connector 4238 connected to the liquid inlet channel 4236; the cleaning tank 42 also includes a second drain connector 4276 installed at the second waste liquid outlet 4274; the first drain connector 4216 and the liquid inlet connector 4238 are located on the same side of the ultrasonic generator 44, and are located on opposite sides of the ultrasonic generator 44 to the second drain connector 4276, so that the energy of the sound field of the ultrasonic generator 44 is concentrated at the position of the pipette 24 in the cleaning chamber 424.

[0097] Considering the significant weight of the first drain connector 4216, the second drain connector 4276, and the inlet connector 4238, which could affect the center of gravity of the cleaning tank 42, the first drain connector 4216 and the inlet connector 4238 are positioned on the same side of the ultrasonic generator 44, and the second drain connector 4276 is positioned on opposite sides of the ultrasonic generator 44. This ensures that the center of gravity of the cleaning tank 42 is located on the axis corresponding to the first arc segment 4232 of the first sidewall 423, concentrating the energy of the sound field from the ultrasonic generator 44 to the location of the pipette 24 within the cleaning chamber 424.

[0098] In some embodiments, the second waste liquid outlet 4274 can drain liquid by gravity overflow, and the cross-section of the second waste liquid outlet 4274 can be circular with a diameter of not less than 6 mm. For example, the diameter of the cross-section of the second waste liquid outlet 4274 can be 6 mm, 1 / 4 inch, or 7 mm, etc., to prevent dirt from clogging the second waste liquid outlet 4274.

[0099] In some embodiments, the cleaning tank 42 also includes a drain pump (not shown) connected to a second waste liquid outlet 4274, through which waste liquid can be drained. The cross-section of the second waste liquid outlet 4274 can be circular with a diameter of not less than 3 mm. For example, the diameter of the cross-section of the second waste liquid outlet 4274 can be 3 mm, 1 / 8 inch, or 4 mm, etc., to prevent dirt from clogging the second waste liquid outlet 4274.

[0100] In some embodiments, the sample analysis apparatus further includes a controller 8, which controls the ultrasonic generator 44 to stop cleaning the pipette 24 or to make cleaning the pipette 24 ineffective when the liquid volume in the overflow chamber 426 exceeds a liquid volume threshold.

[0101] For example, when liquid overflows from cleaning chamber 424 into overflow chamber 426, controller 8 can obtain the volume of liquid in overflow chamber 426. When the volume exceeds the volume threshold, it indicates that there is too much liquid in overflow chamber 426, which will cause a change in the sound field distribution of ultrasonic generator 44, resulting in the sound field energy not being concentrated on pipette 24, and the cleaning effect of pipette 24 may not meet the requirements. At this time, controller 8 can control ultrasonic generator 44 to stop cleaning pipette 24, or control ultrasonic generator 44 to stop cleaning pipette 24 if cleaning pipette 24 is ineffective. At the same time, it can also issue a prompt message to allow the operator to handle it in time. For example, it can sound an alarm and / or make the alarm light flash, so that the operator can clean the second waste liquid outlet 4274 in time to drain the liquid in overflow chamber 426.

[0102] In some embodiments, a gravity sensor or pressure sensor may be installed at the bottom of the cleaning tank 42 to test the gravity or pressure of the cleaning tank 42, and calculate the weight of the liquid in the overflow chamber 426 based on the gravity or pressure, thereby determining whether the liquid volume in the overflow chamber 426 exceeds the liquid volume threshold.

[0103] In some embodiments, a liquid level sensor may be installed in the overflow chamber 426 to test the liquid level height in the overflow chamber 426 and determine whether the liquid volume in the overflow chamber 426 exceeds the liquid volume threshold based on the liquid level height.

[0104] In some embodiments, the first sidewall 423 includes a first arc segment 4232, which accounts for no less than 80% of the first sidewall 423. Considering the reflection and propagation attenuation of the cleaning pool 42, in order to enable the cleaning pool 42 to work with the ultrasonic generator 44 to achieve a strong cleaning effect on the pipette 24, the diameter of the first arc segment 4232 can be less than or more than 1 / 2 wavelength of the ultrasonic wave emitted by the ultrasonic generator 44, so that most of the energy of the sound field emitted by the ultrasonic generator 44 can be concentrated on the pipette 24 in the cleaning chamber 424.

[0105] In some embodiments, considering the propagation attenuation of the ultrasonic generator 44, in order to achieve a stronger cleaning effect of the ultrasonic generator 44 on the pipette 24, the distance between the liquid level of the cleaning fluid in the cleaning chamber 424 and the first bottom wall 421 is less than one wavelength of the ultrasonic wave emitted by the ultrasonic generator 44. In some examples, the distance between the liquid level of the cleaning fluid in the cleaning chamber 424 and the first bottom wall 421 can also be less than half a wavelength of the ultrasonic wave emitted by the ultrasonic generator 44.

[0106] In some embodiments, in order to prevent the pipette 24 from colliding with the first bottom wall 421 of the cleaning tank 42 and to prevent vibrations that could affect the bottom wall of the cleaning tank, the pipette 24 and the first bottom wall 421 need to be spaced between 1 mm and 3 mm apart.

[0107] The ultrasonic generator 44 is a device that converts received electrical power into a high-frequency alternating current signal for driving, and then converts the electrical power into mechanical power, i.e., ultrasonic waves, which are then emitted. In some embodiments, the ultrasonic generator 44 can be turned on and off; when turned on, the ultrasonic generator 44 operates, and when turned off, the ultrasonic generator 44 stops operating.

[0108] To better understand the cleaning tank, please refer to some embodiments. Figure 10The cleaning tank may include a cleaning tank housing 420, a first drain connector 4216, a second drain connector 4276, and a liquid inlet connector 4238. The specific structure can be found in the above embodiments and will not be repeated here. The ultrasonic generator 44 may include a lower flange 441a, a first silicone ring 442a, a front cover plate 443, a second silicone ring 442b, an upper flange 441b, a first piezoelectric ceramic 444a, a first electrode plate 445a, a second piezoelectric ceramic 444b, a second electrode plate 445b, a rear end cover 446, an insulating sleeve 447, and an internal hexagon screw 448. The first piezoelectric ceramic 444a, the first electrode plate 445a, the second piezoelectric ceramic 444b, and the second electrode plate 445b work together to output a sound field. The lower flange 441a, front cover plate 443, upper flange 441b, rear cover 446, insulating sleeve 447, and socket head cap screws 448 are fitted together to securely connect with the cleaning tank housing 420. The first silicone ring 442a and the second silicone ring 442b can improve the waterproof effect of the ultrasonic generator. It should be noted that the ultrasonic generator can also adopt other structures as needed, and this embodiment does not limit the specific structure of the ultrasonic generator.

[0109] In some embodiments, please refer to Figure 11 The cleaning mechanism 4 may also include a first control valve 11 for opening and closing the first waste liquid outlet 4216—for example, a solenoid valve; when the first control valve 11 is opened, the waste liquid can be discharged through the first waste liquid outlet 4216.

[0110] The pipette 24 can at least partially extend into the cleaning chamber 424. The medium used for ultrasonic cleaning, or cleaning medium, is delivered into the cleaning chamber 424 through the inlet channel 4236. The ultrasonic generator 44 operates, and the vibration generated by the ultrasonic generator 44 cavitates the cleaning medium in the cleaning chamber 424, thereby performing ultrasonic cleaning on the object to be cleaned in the cleaning chamber 424. After cleaning, the ultrasonic generator 44 stops operating. During the cleaning process, excess cleaning medium may overflow into the overflow chamber 426 through the top opening of the cleaning chamber 424, and then be discharged through the second waste liquid outlet 4274 connected to the overflow chamber 426. In the example where the first control valve 11 is not configured at the first waste liquid outlet 4216 during the cleaning process, the cleaning medium in the overflow chamber 426 can also be discharged through the first waste liquid outlet 4216 during the cleaning process. In this example, the cleaning medium needs to be continuously transported from the inlet channel 4236 to the overflow chamber 426. Of course, in the example where the first control valve 11 is configured at the first waste liquid outlet 4216, the first control valve 11 can also be controlled to open during the cleaning process. Similarly, during the cleaning process, the cleaning medium needs to be continuously transported from the inlet channel 4236 to the overflow chamber 426. In the example where the first control valve 11 is configured at the first waste liquid outlet 4216, the first control valve 11 can also be controlled to close during the cleaning process. After the cleaning is completed, the first control valve 11 is controlled to open again, so that the cleaning medium remaining in the cleaning overflow chamber 426 is discharged through the first waste liquid outlet 4216.

[0111] In examples without an overflow chamber 426, the overflow of liquid in the cleaning chamber 424 can be prevented by controlling the amount of cleaning medium entering the liquid inlet channel 4236.

[0112] One end of the media delivery channel 62 is connected to the liquid inlet channel 4236, and the other end of the media delivery channel 62 can be connected to one or more branches. Each branch can be equipped with a second control valve 64—for example, a solenoid valve. By opening and closing the second control valve 64, the conduction and cutoff of the corresponding branch can be controlled. When the media delivery channel 62 is connected to multiple branches, each branch can be connected to a different cleaning medium. This allows multiple different cleaning media to be used to clean the object to be cleaned. Each branch corresponds to one cleaning medium. When needed, the second control valve 64 of the corresponding branch is opened, and the corresponding cleaning medium is delivered to the cleaning chamber 424 through the media delivery channel 62 and the liquid inlet channel 4236. Ultrasonic cleaning allows one or more cleaning media to be used to clean the object to be cleaned. When there is sufficient cleaning time, different cleaning media can be used to clean the object to be cleaned sequentially during the cleaning process. When there is insufficient cleaning time, only one cleaning medium, such as a cleaning liquid, can be used to clean the object to be cleaned. Of course, when performing ultrasonic cleaning on an object, a cleaning solution can be used in some ultrasonic cleaning cycles, while one or more cleaning media can be used in other ultrasonic cleaning cycles. These cleaning media contain at least a cleaning agent. For example, after performing N ultrasonic cleaning cycles using only the cleaning solution, an ultrasonic cleaning cycle using a cleaning agent can be performed once.

[0113] Since the ultrasonic generator 44 can be turned on and off, this application considers turning off the ultrasonic generator 44 during the cleaning process and directly using the cleaning medium to clean the object being cleaned. This allows the cleaning mechanism 4 to become a regular cleaning mechanism 4, meaning it can perform both ultrasonic cleaning and regular cleaning. Therefore, in some embodiments, the cleaning mechanism 4 and the regular cleaning mechanism 4 are integrated. When the ultrasonic generator 44 is turned on, the cleaning mechanism 4 can perform ultrasonic cleaning; when the ultrasonic generator 44 is turned off, it can perform regular cleaning.

[0114] Considering that there may be multiple objects to be cleaned, such as multiple reagent needles or multiple sample needles, in order to enable multiple objects to be cleaned at the same time and improve work efficiency, multiple cleaning mechanisms 4 can be designed together. Figure 12 and Figure 13 In such an example, two cleaning mechanisms can be designed together, allowing for the simultaneous cleaning of two sample needles.

[0115] In embodiments that combine multiple cleaning mechanisms, further integration is also possible, for example, the overflow chambers of these multiple cleaning mechanisms are shared, and correspondingly, the second waste liquid discharge outlet is also shared. Figure 14 and Figure 15 In such an example, two cleaning units share an overflow chamber 426, which discharges waste liquid through a second waste liquid outlet 4274.

[0116] In the specific operation of the overflow chamber 426, the height of the object to be cleaned in the cleaning chamber, the cleaning time, and the cleaning medium used for cleaning can all be controlled and set according to requirements.

[0117] When the conditions for ultrasonic cleaning are met, the cleaning organization can perform ultrasonic cleaning on the object to be cleaned either during continuous cycle work or after completing the current project. For example, if 50 projects are applied for in this batch for testing, and the conditions for ultrasonic cleaning are met during the testing process, then ultrasonic cleaning can be performed on the object to be cleaned after completing all 50 projects, or it can be performed immediately after the object to be cleaned completes the current project.

[0118] In some embodiments, please refer to Figure 1 The sample analysis device may also include a sample carrying mechanism 1, a reagent carrying mechanism 3, a reaction mechanism 5, a mixing mechanism 7, and a measuring mechanism 9.

[0119] The sample carrying mechanism 1 is provided with at least one sample position for placing a sample container, which is used to hold the sample. In some embodiments, the sample carrying mechanism 1 can place the sample container using a sample delivery module (SDM) and a front-end track.

[0120] The reagent carrier 3 is provided with at least one reagent position for placing a reagent container, which in turn holds the reagent. In some embodiments, the reagent carrier 3 may be arranged in a disc-shaped structure, and the reagent carrier 3 is rotatable, which rotates the reagent container it carries to rotate the container to the reagent aspiration position so that the reagent needle 244 can aspirate the reagent. In one embodiment, there is a single reagent carrier 3, which may be separately disposed outside the reaction mechanism 5.

[0121] The reaction mechanism 5 has multiple placement positions for placing reaction cups. The reaction mechanism 5 is used to incubate the reaction solution in the reaction cups at its placement positions, wherein the reaction solution is prepared from samples and reagents. In some embodiments, the reaction mechanism 5 may be arranged in a disk-shaped structure, capable of rotation and driving the reaction cups in its placement positions to rotate, for managing the reaction cups and incubating the reaction solution within the reaction mechanism 5. The sample addition position, reagent addition position, mixing position, and measurement position mentioned herein can refer to placement positions in certain locations within the reaction mechanism 5; that is, the sample addition position, reagent addition position, mixing position, and measurement position are located within the reaction mechanism 5.

[0122] In some embodiments, the reaction mechanism 5 may include an inner ring portion and an outer ring portion that can rotate independently or together; the inner ring portion includes one or more rings of track, each ring of track having a plurality of placement positions for incubating the reaction cups and for scheduling the reaction cups among the placement positions in the inner ring portion; the outer ring portion includes one or more rings of track, each ring of track having a plurality of placement positions for scheduling the reaction cups among the placement positions in the outer ring portion.

[0123] The mixing mechanism 7 is used to mix the reaction liquid that needs to be mixed in the reaction vessel.

[0124] The measuring mechanism 9 is used to measure the reaction solution. In some embodiments, the measuring mechanism 9 is used to measure the reaction solution. For example, the measuring mechanism 9 is used to measure the reaction solution in a reaction cup that has been incubated and is located at the measuring position, and obtain test results. In some embodiments, the measuring mechanism 9 can be a photometric measuring unit, which can detect the luminescence intensity or absorbance of the reaction solution to be tested, and calculate the concentration of the analyte in the sample through a calibration curve. In some embodiments, the measuring mechanism 9 can be separately disposed outside the reaction mechanism 5.

[0125] In some embodiments, please combine Figure 16 The moving component 22 includes a first moving component 222 and a second moving component 224. The pipette 24 includes a sample needle 242 and a reagent needle 244. The first moving component 222 is connected to the sample needle 242 to move the sample needle 242 between the sample position, the placement position and the cleaning mechanism 4. The second moving component 224 is connected to the reagent needle 244 to move the reagent needle 244 between the reagent position, the placement position and the cleaning mechanism 4.

[0126] In some embodiments, the sample analysis device includes two cleaning mechanisms: one cleaning mechanism 4 cleans the sample needle 242, and the other cleaning mechanism 4 cleans the reagent needle 244. In other embodiments, the cleaning mechanism 4 can clean the sample needle 242 and the reagent needle 244 in a time-separated manner. The cleaning mechanism 4 is located at the intersection of the movement trajectories of the sample needle 242 and the reagent needle 244.

[0127] In some embodiments, the pipette 24 can be moved to the cleaning mechanism 4 for normal mode cleaning first, and then for ultrasonic mode cleaning via an ultrasonic generator.

[0128] In some embodiments, please refer to Figure 17 The sample analysis apparatus may also include a general cleaning mechanism 10, which is used to clean the pipette 24 in a standard mode. For example, the general cleaning mechanism 10 is used to rinse and / or soak the pipette 24 with a cleaning solution and / or cleaning agent. The cleaning solution referred to herein is a liquid medium such as physiological saline, distilled water, or a diluent, while the cleaning agent refers to a medium that can chemically react with contaminants on the object to be cleaned, such as an acidic liquid. The general cleaning mechanism 10 can employ existing or future cleaning mechanisms to clean the pipette 24.

[0129] The ordinary cleaning mechanism 10 is positioned along the movement trajectory of the pipette 24, allowing the pipette 24 to move to the ordinary cleaning mechanism 10 for cleaning. In some embodiments, the pipette 24 may first move to the ordinary cleaning mechanism 10 for ordinary mode cleaning, and then move to the cleaning mechanism 4 for ultrasonic mode cleaning.

[0130] Besides the pipettes and other probes such as sample needles and reagent needles, other parts of the sample analysis device also need cleaning, such as the mixing mechanism, especially the mixing mechanism that uses a stirring rod to mix. Generally, after dispensing samples and reagents using a pipette, the reaction solution containing the samples and reagents needs to be further stirred to ensure a complete reaction. During this process, the stirring rod will also come into contact with different liquid media. In order to eliminate cross-contamination between different media, the stirring rod needs to be cleaned after each stirring to remove any residual substances on its surface and prevent them from being carried into the next reaction, causing cross-contamination and affecting the accuracy of the test results.

[0131] Not only are pipettes specifically designed with cleaning mechanisms, but mixing mechanisms also have their own dedicated cleaning systems. Generally, different cleaning schemes and mechanisms are designed for different objects to be cleaned because each object comes into contact with different liquid media. Therefore, to achieve a good cleaning effect, each object requires a specific cleaning scheme and mechanism. Furthermore, it is understandable that, besides pipettes, other objects to be cleaned, such as mixing mechanisms, also experience the same problem of residue accumulation as pipettes.

[0132] In some embodiments, please refer to Figure 18The mixing mechanism 7 includes a stirring rod drive mechanism 72 and a stirring rod 74. The stirring rod drive mechanism 72 drives the stirring rod 74 to move, thereby mixing the reaction liquid in the reaction vessel. The number of stirring rods 74 can be one or more. When there are multiple stirring rods, while one stirring rod 74 is performing the stirring action, the other stirring rods 74 can be cleaned during this time. The cleaning mechanism 4 is disposed on the movement trajectory of the stirring rod 74 to perform ultrasonic cleaning on the stirring rod 74 after stirring. The structure of the cleaning mechanism 4 can be referred to in the above embodiments and will not be repeated here.

[0133] It should be noted that in some examples, there may be only one cleaning unit, which performs ultrasonic cleaning of the sample needle, reagent needle, and stirring rod at different times. In other examples, there may be three cleaning units: one unit cleans the sample needle ultrasonically, another cleans the reagent needle ultrasonically, and the remaining unit cleans the stirring rod ultrasonically. In still other examples, there may be two cleaning units: one unit cleans two of the sample needle, reagent needle, and stirring rod ultrasonically, and the other unit cleans the remaining one. Of course, two cleaning units can also perform ultrasonic cleaning of one or two of the sample needle, reagent needle, and stirring rod simultaneously, as needed.

[0134] The working process of the sample analysis device will be explained below.

[0135] Generally, a test project requires the following process: adding samples and reagents, mixing and incubating the reaction solution formed by the samples and reagents, and measuring the incubated reaction solution. During this process, the sample needle 242 generally needs to be cleaned after discharging one sample and before drawing the next sample to prevent cross-contamination. Similarly, the reagent needle 244 generally needs to be cleaned after discharging one reagent and before drawing the next reagent to prevent cross-contamination. Similarly, the mixing mechanism 7 generally needs to be cleaned after stirring the reaction solution in one reaction vessel with the stirring rod 74 and before stirring the reaction solution in the next reaction vessel to prevent cross-contamination.

[0136] Therefore, in a specific testing procedure, controller 8 controls the first moving component 222 to drive the sample needle 242 to move to the sample carrying mechanism 1 to aspirate the sample to be injected and discharge it into the reaction cup located at the sample dispensing position; controller 8 controls the second moving component 224 to drive the reagent needle 224 to move to the reagent carrying mechanism 3 to aspirate the reagent and discharge it into the reaction cup located at the reagent dispensing position; understandably, the processes of adding the sample and adding the reagent can be performed simultaneously or sequentially, and can be either adding the sample first and then the reagent, or vice versa. Next, controller 8 controls the mixing mechanism 7 to mix the reaction solution, and controller 8 controls the reaction mechanism 5 to incubate the reaction solution. After incubation is completed, controller 8 controls the measuring mechanism 9 to measure the incubated reaction solution.

[0137] To prevent cross-contamination, the sample needle 242, reagent needle 244, and stirring rod 74 can be cleaned during the testing process.

[0138] For example, in the above test process, the controller 8 also controls the ordinary cleaning mechanism to perform ordinary mode cleaning on the sample needle after the sample is discharged, and controls the cleaning mechanism to perform ultrasonic mode cleaning on the sample needle when the ultrasonic cleaning conditions are met.

[0139] For example, in the above test process, the controller 8 also controls the ordinary cleaning mechanism to perform ordinary mode cleaning on the reagent needle after the reagent is discharged, and controls the cleaning mechanism to perform ultrasonic mode cleaning on the reagent needle when the ultrasonic cleaning conditions are met.

[0140] For example, in the above test procedure, controller 8 also controls the ordinary cleaning mechanism to perform ordinary mode cleaning on the mixing mechanism after stirring, and controls the cleaning mechanism to perform ultrasonic mode cleaning on the mixing mechanism when the ultrasonic cleaning conditions are met. Understandably, "stirring complete" here refers to the completion of stirring of the reaction liquid in a reaction vessel.

[0141] The above relates to ultrasonic cleaning conditions. Regardless of whether it's the cleaning mechanism for sample needles, reagent needles, or mixing mechanisms, their ultrasonic cleaning conditions can be the same or different. Specifically, their ultrasonic cleaning conditions can be one or more of the following:

[0142] When the sample analysis device is powered on, this means that the ultrasonic cleaning mode is activated as soon as the sample analysis device is powered on, in order to prepare for the subsequent testing.

[0143] When the sample analysis device is shut down—this means that when the sample analysis device receives a shutdown command, it first performs ultrasonic cleaning and then executes the shutdown command to shut down.

[0144] When the sample analysis device enters hibernation mode—this means that before entering hibernation mode, the sample analysis device undergoes ultrasonic cleaning and then enters hibernation mode;

[0145] When the sample analysis device exits hibernation mode—this means that when the sample analysis device exits hibernation mode, it immediately begins ultrasonic cleaning to prepare for the next test.

[0146] Preset scheduled cleaning times – for example, set regular cleaning times such as 8:00 AM, 12:00 PM, and 4:00 PM every day. When the scheduled cleaning time is reached, ultrasonic cleaning mode will be activated.

[0147] The sample analyzer has been working for a period of time since the last ultrasonic cleaning – for example, if the first time is set to 4 hours, the sample analyzer will automatically start another ultrasonic cleaning cycle 4 hours after the last ultrasonic cleaning.

[0148] Since the last ultrasonic cleaning, the number of samples or items tested by the sample analysis device has reached a first number—for example, if the first number is set to 100, then when the sample analysis device has tested another 100 samples or items since the last ultrasonic cleaning, the sample analysis device will automatically start another ultrasonic cleaning.

[0149] Receive an ultrasonic cleaning start command – for example, a user manually issues an ultrasonic cleaning start command.

[0150] To facilitate users in issuing ultrasonic cleaning start commands, some embodiments may incorporate a hardware structure within the sample analysis device. When this hardware structure is triggered, it will issue an ultrasonic cleaning start command. For example, the sample analysis device may include a button; when this button is pressed, it will issue an ultrasonic cleaning start command. Therefore, the user can manually press the button to issue an ultrasonic cleaning start command to the sample analysis device.

[0151] For details on how to implement ultrasonic cleaning, please refer to the structure of the cleaning mechanism in the above embodiments, which will not be repeated here.

[0152] The above is a description of the sample analysis device. Please refer to it. Figure 19 and Figure 20 Some embodiments of this application also disclose a sample analysis method, which includes the following steps:

[0153] Step 1000: Control the pipette to draw the sample from the aspiration position and discharge it into the reaction cup located at the sample dispensing position.

[0154] Step 1100: Control the pipette to draw reagent from the reagent aspiration position and dispense it into the reaction cup located at the reagent dispensing position. The pipette may include a sample needle and a reagent needle, or the pipette may include a sample-reagent needle, which is a probe that can be used to draw and dispense samples or reagents.

[0155] Step 1200: Control the mixing of the reaction solution formed by the sample and reagents in the reaction vessel. For example, control a stirring rod to stir the reaction solution in the reaction vessel.

[0156] Step 1300: Control the incubation of the reaction solution in the reaction vessel.

[0157] Step 1400: Control the measurement of the reaction solution after incubation.

[0158] During the aforementioned testing process:

[0159] Step 2000: Control the pipette to be cleaned in normal mode after the sample is dispensed;

[0160] Step 2100: When the ultrasonic cleaning conditions are met, the pipette is also controlled to be cleaned in ultrasonic mode.

[0161] Step 3000: Control the stirring rod to perform a normal cleaning mode;

[0162] Step 3100: When the ultrasonic cleaning conditions are met, the stirring rod is also controlled to be cleaned in ultrasonic mode.

[0163] The conventional cleaning and ultrasonic cleaning methods described above can be found in the description of the sample analysis device above. For example, conventional cleaning refers to rinsing and / or soaking the sample needle with a cleaning solution and / or cleaning agent. Ultrasonic cleaning utilizes the cavitation, acceleration, and / or direct flow effects of ultrasound in liquids to directly or indirectly disperse, emulsify, and peel off contaminants, thus achieving the cleaning purpose. Generally, ultrasonic cleaning uses the strong cavitation and vibration generated by ultrasound to peel off dirt from the surface of the object to be cleaned, and can also decompose and emulsify oily contaminants. In some embodiments, the medium used in ultrasonic cleaning described herein includes chemical reagents, such as the cleaning agents mentioned above.

[0164] The ultrasonic cleaning conditions involved in steps 2100 and 3100 can be the same or different. The ultrasonic cleaning conditions in steps 2100 and 3100 can be one or more of the following:

[0165] When the sample analysis device is powered on, this means that the ultrasonic cleaning mode is activated as soon as the sample analysis device is powered on, in order to prepare for the subsequent testing.

[0166] When the sample analysis device is shut down—this means that when the sample analysis device receives a shutdown command, it first performs ultrasonic cleaning and then executes the shutdown command to shut down.

[0167] When the sample analysis device enters hibernation mode—this means that before entering hibernation mode, the sample analysis device undergoes ultrasonic cleaning and then enters hibernation mode;

[0168] When the sample analysis device exits hibernation mode—this means that when the sample analysis device exits hibernation mode, it immediately begins ultrasonic cleaning to prepare for the next test.

[0169] Preset scheduled cleaning times – for example, set regular cleaning times such as 8:00 AM, 12:00 PM, and 4:00 PM every day. When the scheduled cleaning time is reached, ultrasonic cleaning mode will be activated.

[0170] The sample analyzer has been working for a period of time since the last ultrasonic cleaning – for example, if the first time is set to 4 hours, the sample analyzer will automatically start another ultrasonic cleaning cycle 4 hours after the last ultrasonic cleaning.

[0171] Since the last ultrasonic cleaning, the number of samples or items tested by the sample analysis device has reached a first number—for example, if the first number is set to 100, then when the sample analysis device has tested another 100 samples or items since the last ultrasonic cleaning, the sample analysis device will automatically start another ultrasonic cleaning.

[0172] Receive an ultrasonic cleaning start command – for example, a user manually issues an ultrasonic cleaning start command.

[0173] This document describes various exemplary embodiments with reference to them. However, those skilled in the art will recognize that changes and modifications can be made to the exemplary embodiments without departing from the scope of this document. For example, various operational steps and components for performing operational steps can be implemented in different ways depending on the specific application or considering any number of cost functions associated with the operation of the system (e.g., one or more steps can be deleted, modified, or combined with other steps).

[0174] In the above embodiments, implementation can be achieved, in whole or in part, by software, hardware, firmware, or any combination thereof. Furthermore, as those skilled in the art will understand, the principles herein can be reflected in a computer program product on a computer-readable storage medium pre-loaded with computer-readable program code. Any tangible, non-transitory computer-readable storage medium may be used, including magnetic storage devices (hard disks, floppy disks, etc.), optical storage devices (CD-ROMs, DVDs, Blu-ray discs, etc.), flash memory, and / or the like. These computer program instructions can be loaded onto a general-purpose computer, special-purpose computer, or other programmable data processing apparatus to form a machine, such that instructions executing on the computer or other programmable data processing apparatus can generate means for implementing a specified function. These computer program instructions can also be stored in a computer-readable storage medium that can instruct the computer or other programmable data processing apparatus to operate in a particular manner, such that instructions stored in the computer-readable storage medium can form an article of manufacture including means for implementing the specified function. The computer program instructions can also be loaded onto a computer or other programmable data processing apparatus to perform a series of operational steps on the computer or other programmable apparatus to produce a computer-implemented process, such that instructions executing on the computer or other programmable apparatus can provide steps for implementing the specified function.

[0175] While the principles herein have been illustrated in various embodiments, numerous modifications to the structure, arrangement, proportions, elements, materials, and components, particularly suited to specific environmental and operational requirements, may be used without departing from the principles and scope of this disclosure. These modifications and other alterations or alterations will be included within the scope of this document.

[0176] The foregoing specific descriptions have been described with reference to various embodiments. However, those skilled in the art will recognize that various modifications and changes can be made without departing from the scope of this disclosure. Therefore, considerations for this disclosure are to be illustrative rather than restrictive, and all such modifications are to be included within its scope. Similarly, advantages, other advantages, and solutions to problems with respect to various embodiments have been described above. However, benefits, advantages, solutions to problems, and any elements that produce these, or make them more explicit, should not be construed as critical, essential, or necessary. The term “comprising” and any other variations thereof as used herein are non-exclusive inclusion, meaning that a process, method, article, or apparatus that includes a list of elements includes not only those elements but also other elements not expressly listed or not part of the process, method, system, article, or apparatus. Furthermore, the term “coupled” and any other variations thereof as used herein refer to physical connections, electrical connections, magnetic connections, optical connections, communication connections, functional connections, and / or any other connections.

[0177] Those skilled in the art will recognize that many changes can be made to the details of the above embodiments without departing from the basic principles of the invention. Therefore, the scope of the invention should be determined only by the claims.

Claims

1. A sample analysis device, wherein, include: The dispensing mechanism includes a moving part and a pipette disposed on the moving part; The moving component is used to drive the pipette to move between different operating positions to aspirate or discharge a target liquid, the target liquid including at least one of a sample and a reagent; A cleaning mechanism includes a cleaning tank and an ultrasonic generator. The cleaning tank has a cleaning chamber with a top opening. The opening of the cleaning chamber is located on the movement trajectory of the pipette. The pipette is inserted into the cleaning chamber through the opening. The ultrasonic generator is located at the bottom of the cleaning tank and on the side of the cleaning tank away from the cleaning chamber, so as to transmit a sound field to the cleaning liquid in the cleaning chamber through the cleaning tank and concentrate the energy of the sound field to the position of the pipette in the cleaning chamber. as well as A fluid supply mechanism is used to provide cleaning fluid to the cleaning chamber; The cleaning tank includes a first side wall, a first bottom wall, a second side wall, and a second bottom wall. The first side wall is arranged around the periphery of the first bottom wall to enclose and form the cleaning chamber. The second side wall is arranged around the outer periphery of the second bottom wall to enclose and form an overflow chamber. The overflow chamber is used to receive liquid overflowing from the cleaning chamber. The first sidewall includes a first arc segment, and the second sidewall includes a second arc segment, wherein the axis corresponding to the first arc segment and the axis corresponding to the second arc segment coincide; The second bottom wall includes a first surrounding portion and a first protrusion. The first surrounding portion is disposed around the first bottom wall, and the first protrusion is located on the side of the first surrounding portion away from the first bottom wall. The second side wall includes a second surrounding portion connected to the first surrounding portion and a second protrusion connected to the first protrusion. The first sidewall includes a balancing portion disposed opposite to the first protrusion and the second protrusion, such that the line connecting the center of gravity of the cleaning tank and the vibration center of the ultrasonic generator is parallel to the axis of the pipette.

2. The sample analysis apparatus as described in claim 1, wherein, The cleaning chamber includes an energy concentration area and an energy transfer area. The energy transfer area surrounds the energy concentration area. The energy of the sound field emitted by the ultrasonic generator is transferred through the energy transfer area and then concentrated into the energy concentration area. The pipette is located in the energy concentration area for cleaning.

3. The sample analysis apparatus as described in claim 2, wherein, The line connecting the center of gravity of the cleaning tank and the vibration center of the ultrasonic generator, or the extension of the line connecting them, passes through the energy concentration area.

4. The sample analysis apparatus as described in claim 1, wherein, The center of gravity of the cleaning tank and the vibration center of the ultrasonic generator are located on the axis of the pipette.

5. The sample analysis apparatus as described in claim 1, wherein, The ultrasonic generator transmits a sound field to the cleaning fluid in the cleaning chamber through the cleaning tank and concentrates the energy of the sound field onto the pipette.

6. The sample analysis apparatus according to any one of claims 2-5, wherein, The first bottom wall includes a connecting region, the orthographic projection of the pipette on the first bottom wall is located within the connecting region, and the output end of the ultrasonic generator abuts against the connecting region.

7. The sample analysis apparatus as described in claim 6, wherein, The first bottom wall includes a bottom surface facing the ultrasonic generator, the bottom surface having a centrally symmetrical structure, and the output end of the ultrasonic generator abutting the center of the bottom surface.

8. The sample analysis apparatus as described in claim 6, wherein, The second bottom wall is disposed around the first bottom wall and connected to the periphery of the first bottom wall, or the second bottom wall is disposed around the first side wall and connected to the outer surface of the first side wall facing the second bottom wall.

9. The sample analysis apparatus as described in claim 8, wherein, The first bottom wall is provided with a first waste liquid outlet communicating with the cleaning chamber, and the second bottom wall is provided with a second waste liquid outlet communicating with the overflow chamber.

10. The sample analysis apparatus as described in claim 9, wherein, The first sidewall includes a first arc segment, and the second sidewall includes a second arc segment. The first arc segment accounts for no less than 80% of the first sidewall, and the second arc segment accounts for no less than 60% of the second sidewall.

11. The sample analysis apparatus as claimed in claim 8, wherein, The first protrusion is provided with a second waste liquid outlet so that the cleaning liquid in the overflow chamber can be discharged through the second waste liquid outlet.

12. The sample analysis apparatus as claimed in claim 11, wherein, The balance section is provided with a liquid inlet channel that communicates with the cleaning chamber.

13. The sample analysis apparatus as described in claim 12, wherein, The first bottom wall is provided with a first waste liquid outlet communicating with the cleaning chamber. The cleaning tank also includes a first drain connector connected to the first waste liquid outlet and a liquid inlet connector connected to the liquid inlet channel. The cleaning tank also includes a second drain connector installed at the second waste liquid outlet. The first drain connector and the inlet connector are located on the same side of the ultrasonic generator, and on opposite sides of the ultrasonic generator as the second drain connector, so that the energy of the sound field of the ultrasonic generator is concentrated at the position of the pipette in the cleaning chamber.

14. The sample analysis apparatus as described in claim 13, wherein, The cross-section of the second waste liquid outlet is circular and has a diameter greater than 6 mm.

15. The sample analysis apparatus as described in claim 13, wherein, The cleaning tank also includes a drain pump, which is connected to the second waste liquid outlet, the second waste liquid outlet having a circular cross-section and a diameter greater than 3 mm.

16. The sample analysis apparatus as claimed in claim 11, wherein, The sample analysis device further includes a controller, which is used to control the ultrasonic generator to stop cleaning the pipette or to make the ultrasonic generator ineffective in cleaning the pipette when the liquid volume in the overflow chamber exceeds the liquid volume threshold.

17. The sample analysis apparatus as claimed in claim 6, wherein, The first sidewall includes a first arc segment, which accounts for no less than 80% of the first sidewall, and the diameter of the first arc segment is less than 1 / 2 wavelength of the ultrasonic wave emitted by the ultrasonic generator.

18. The sample analysis apparatus as claimed in claim 6, wherein, The distance between the surface of the cleaning fluid in the cleaning chamber and the first bottom wall is less than one wavelength of the ultrasonic wave emitted by the ultrasonic generator.

19. The sample analysis apparatus as claimed in claim 1, wherein, The sample analysis device further includes: A sample carrying mechanism is provided with at least one sample position, the sample position being used to place a sample container, the sample container being used to hold a sample; A reagent carrying mechanism is provided with at least one reagent position, the reagent position being used to place a reagent container, and the reagent container being used to hold the reagent; A reaction mechanism having multiple placement positions for placing reaction cups, the reaction mechanism being used to incubate reaction solutions in the reaction cups at its placement positions, wherein the reaction solutions are prepared from samples and reagents; A mixing mechanism is used to mix the reaction solution in the reaction vessel that needs to be mixed; and A measuring device used to measure the reaction solution; The moving component includes a first moving component and a second moving component. The pipette includes a sample needle and a reagent needle. The first moving component is connected to the sample needle to move the sample needle between the sample position, the placement position, and the cleaning mechanism. The second moving component is connected to the reagent needle to move the reagent needle between the reagent position, the placement position, and the cleaning mechanism.

20. The sample analysis apparatus of claim 19, wherein, The mixing mechanism includes a stirring rod driving mechanism and a stirring rod. The stirring rod driving mechanism drives the stirring rod to move, so as to mix the reaction liquid in the reaction cup that needs to be mixed. The cleaning mechanism is set on the moving trajectory of the stirring rod to perform ultrasonic cleaning on the stirring rod after mixing.

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