A large area continuous double-sided processing plasma device and a processing method thereof

CN116544093BActive Publication Date: 2026-09-15BEIJING UNIV OF CHEM TECH +1
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Patent Information

Application Number
CN202310543738.1
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-05-15
Publication Date
2026-09-15
Estimated Expiration
2043-05-15

AI Technical Summary

Technical Problem

然而受自身放电结构的限制,等离子体处理面积较小,因此大面积化等离子体处理成为新的发展趋势

Benefits of technology

[0027] This invention utilizes a shared ground electrode structure with two parallel flat plasma electrodes, effectively achieving large-area uniform discharge while reducing device size. This simplifies the process and facilitates continuous, double-sided automated processing. The working environment is atmospheric pressure. Through a special electrode structure design, energy consumption and temperature are effectively reduced, thus conserving resources and minimizing damage to material surfaces. A wide range of working gases can be selected, including single gases and mixed gases, to meet different material processing needs. The ingenious arrangement of the rotating shaft mechanism and the synergistic effect of the sliding guide rails enable automatic flipping within a small space for large-area continuous processing, facilitating continuous automated processing and saving labor and time costs. Furthermore, secondary or multiple repetitive processing of materials can be achieved by controlling the reverse rotation of the motor.

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Abstract

The application provides a large-area continuous double-sided processing plasma device and a processing method thereof, which comprises an upper plasma electrode and a lower plasma electrode, and a common ground electrode serving as a receiving table; the upper plasma electrode and the lower plasma electrode are symmetrically installed on the upper and lower sides of the ground electrode, and realize simultaneous discharge through the common ground electrode; the upper plasma electrode and the lower plasma electrode are connected with upper and lower sliding rails respectively, and the receiving table is provided with adjusting wheels at the front and rear ends; a material to be processed is processed by the upper plasma electrode through the receiving table and adjusting wheels, and then is changed in surface through a plurality of conveying shafts, and then is processed by the lower plasma electrode on the other surface, and then is collected by a collecting shaft. The two parallel plate electrode structure type plasma electrodes share one ground electrode, which effectively realizes large-area uniform discharge on the basis of reducing the size of the device, simplifies the process, and is beneficial to realize continuous double-sided automatic processing.
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Description

Technical Field

[0001] This invention belongs to the field of plasma technology, specifically relating to a plasma device and method for large-area continuous double-sided processing. Background Technology

[0002] In recent years, with in-depth research into plasma technology, plasma treatment has become an effective method for modifying material surfaces. This technology can increase the surface energy of materials, enhance their wear resistance and corrosion resistance, and thus significantly improve material properties. Furthermore, plasma surface treatment can form various nanostructures on material surfaces, such as nanowires and nanoparticles, endowing materials with new properties and applications, such as improving their catalytic activity and biocompatibility. Especially in the field of surface coating preparation, plasma treatment technology overcomes the drawbacks of traditional coating preparation processes, such as high energy consumption and easy contamination.

[0003] In plasma surface modification technology, plasma jet structures are favored due to their advantages such as high particle activity and strong adaptability. However, the plasma treatment area is relatively small due to the limitations of its own discharge structure, making large-area plasma treatment a new development trend. Chinese patent CN113490322A discloses a portable large-area plasma jet device system, which achieves large-area jet discharge through a distributed resistance-needle series array electrode, but the jet temperature is high, making it unsuitable for surface treatment of low-melting-point materials such as fiber plastics; Chinese patent CN114126179A discloses a device for generating large-area uniform glow discharge plasma, which uses a reverse brush electrode structure to achieve uniform discharge, but requires operation under vacuum conditions; Chinese patent CN113473688A discloses a large-area plasma discharge device with a flat electrode structure, which can sterilize slender and complex rod-shaped medical devices through drift diffusion, but it is not suitable for material surface modification or coating preparation.

[0004] To achieve continuous large-area processing of materials, the literature (THIN SOLID FILMS|DOI: 10.1016 / j.tsf.2012.12.102) reports a roll-to-roll microwave plasma chemical vapor deposition technique, which can continuously deposit graphene films over large areas. However, it has high requirements for process conditions and requires a large power supply for excitation. Korean Patent 10-1568380 discloses a curved surface discharge plasma source, which uses multiple plasma ejection holes to treat the affected area, but the maximum discharge area is only 10 cm². 2Furthermore, it is difficult to form a uniform surface discharge; the literature (VACUUM&CRYOGENICS|DOI:10.3969 / j.issn.1006-7086.2004.01.007) reports a radio frequency discharge flat plate plasma polymerization device, which, combined with a transmission mechanism, achieves large-area polymerization coating in both directions, but it needs to be carried out under vacuum conditions and cannot achieve continuous double-sided processing, resulting in low working efficiency; Chinese patent CN115583005A discloses a plasma treatment device for brushless coating of thermally conductive silicone surface, which can achieve product flipping processing through a push mechanism, but it cannot perform continuous large-area processing. Summary of the Invention

[0005] To address the shortcomings of existing technologies, this invention provides a plasma device for large-area continuous double-sided processing under atmospheric pressure. Its purpose is to achieve uniform plasma discharge over a large area under atmospheric pressure using a parallel flat electrode structure with a shared ground electrode. This results in lower temperatures and no damage to the processed materials. Furthermore, the device incorporates a winding mechanism design to achieve simultaneous continuous processing of both sides of the material, greatly improving the efficiency of material surface treatment. Moreover, it eliminates the need for manual flipping and feeding.

[0006] The specific technical solution is as follows:

[0007] A plasma device for large-area continuous double-sided processing includes a plasma generator, a winding mechanism, a transmission mechanism, and a housing;

[0008] The plasma generating device comprises an upper plasma electrode, a lower plasma electrode, and a common ground electrode, which is a receiving platform.

[0009] The upper and lower plasma electrodes are equidistantly installed on the upper and lower sides of the ground electrode, and achieve simultaneous discharge through the shared ground electrode without affecting each other. The discharge gap is 1mm-30mm. The upper and lower plasma electrodes generate uniform discharge through pulse source excitation. The voltage amplitude range is 0-12kV, the power supply frequency range is 0-2kHz, and the pulse width range is 0-500ns.

[0010] The upper plasma electrode and the lower plasma electrode are respectively connected to the upper sliding rail and the lower sliding rail. Both the upper sliding rail and the lower sliding rail are fixed on the housing. The upper sliding rail is controlled by the upper rail control motor, and the lower sliding rail is controlled by the lower rail control motor. The plasma discharge electrode is driven to move back and forth by the motor control, thereby realizing continuous covering of the material. The moving speed of the plasma discharge electrode can be controlled by adjusting the motor speed.

[0011] The gas pipeline is located outside the housing and is connected to the upper plasma electrode and the lower plasma electrode respectively through flexible pipes; the gas flow rate is controlled to be 0-20 L / min by a rotor flow meter.

[0012] The gas can be a single working gas, such as air or argon, or a mixture of working gases, such as TEOS / Ar or TiCl / O2, and the gas can be changed as needed.

[0013] The winding mechanism includes a feeding shaft and a receiving shaft.

[0014] The transmission mechanism includes multiple transmission shafts.

[0015] The feeding shaft is located in front of the receiving platform, and the roll of material to be processed is installed on the feeding shaft.

[0016] The receiving platform is equipped with adjusting wheels at both the front and rear ends. The roll material to be processed passes through the receiving platform via the adjusting wheels and is surface-treated by the upper plasma electrode. Then, it passes through multiple conveying shafts to achieve face changing. After the other side of the material is treated by the lower plasma electrode, it is collected by the receiving shaft.

[0017] The highest point of the adjusting wheel is at the same level as the surface of the receiving platform, ensuring that the feed material makes flat contact with the receiving platform and avoiding wear caused by direct contact with the receiving platform.

[0018] Both the upper and lower plasma electrodes adopt a conical structure with a diameter ranging from 4 to 20 cm. The electrode plates are perforated with evenly distributed small holes with a hole spacing of 3 to 10 mm. Flow equalization blades are installed inside the electrodes to ensure that the working gas can be evenly distributed throughout the discharge cavity, while ensuring that the flow velocity of each gas hole is similar, effectively improving the uniformity of plasma discharge.

[0019] The receiving platform is made of metal, preferably alloy steel or molybdenum, but is not limited to this material, and its dimensions are 60cm×80cm×1cm.

[0020] The grounding pipe is installed on the outer wall of the housing and connected to the ground electrode through a wire to ensure the safety of discharge and the device.

[0021] The CNC panel is mounted on the outer wall of the housing and connected to the motor. It controls the operation of the guide rail and the rotating shaft through a controllable program.

[0022] This invention is applicable to materials such as fibers, PE, and PTFE, but is not limited to these materials.

[0023] A method for processing a plasma device with large-area continuous double-sided processing includes the following steps:

[0024] The roll of material to be processed is mounted on the feeding shaft. The roll passes over the receiving platform via adjusting wheels. The upper plasma electrode on the roll, driven by the upper sliding guide rail, performs a uniform surface treatment. After processing, the roll continues to be conveyed, passing through a transmission mechanism to achieve a face change, and is then transported below the receiving platform. Simultaneously, the lower plasma electrode below performs surface treatment on the other side of the material. The treated material is then collected by the receiving shaft.

[0025] The feeding speed of the roll material is controlled by adjusting the motor speed and the size of the shaft. It can also be controlled by reversing the shaft motor to interchange the functions of the feeding shaft and the receiving shaft, so as to achieve secondary or multiple processing.

[0026] The beneficial effects of this invention are as follows:

[0027] This invention utilizes a shared ground electrode structure with two parallel flat plasma electrodes, effectively achieving large-area uniform discharge while reducing device size. This simplifies the process and facilitates continuous, double-sided automated processing. The working environment is atmospheric pressure. Through a special electrode structure design, energy consumption and temperature are effectively reduced, thus conserving resources and minimizing damage to material surfaces. A wide range of working gases can be selected, including single gases and mixed gases, to meet different material processing needs. The ingenious arrangement of the rotating shaft mechanism and the synergistic effect of the sliding guide rails enable automatic flipping within a small space for large-area continuous processing, facilitating continuous automated processing and saving labor and time costs. Furthermore, secondary or multiple repetitive processing of materials can be achieved by controlling the reverse rotation of the motor. Attached Figure Description

[0028] Figure 1 This is a schematic diagram of the structure of the present invention;

[0029] Figure 2 This is a schematic diagram of the flow equalization blade structure of the present invention;

[0030] Figure 3 This is a schematic diagram of the guide rail structure of the present invention;

[0031] Figure 4 This is a morphology diagram of the silicon oxide coating prepared on the PE surface in Example 2;

[0032] Figure 5 This is an elemental distribution diagram of the coating surface prepared in Example 2. Detailed Implementation

[0033] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention.

[0034] Example 1

[0035] A plasma device for large-area continuous double-sided processing is provided to achieve surface modification treatment of fiber rolls. Combined with... Figure 1 As shown, the upper plasma electrode 5 and the lower plasma electrode 16 are connected to the upper sliding guide rail 4 and the lower sliding guide rail 15, respectively. Figure 3 As shown, the upper sliding guide rail 4 and the lower sliding guide rail 15 are fixed on the housing. The upper sliding guide rail 4 is controlled by the upper guide rail control motor 12, and the lower sliding guide rail 15 is controlled by the lower guide rail control motor 11. In turn, the plasma discharge electrode is moved back and forth through the guide rails at a speed of 60 mm / s.

[0036] The upper plasma electrode 5 and the lower plasma electrode 16, together with the receiving platform 3, form two parallel flat plate dielectric barrier discharge electrode structures. In the discharge structure, the two plasma electrodes share a ground electrode, and the discharge gap is 10 mm. The receiving platform 3 is grounded and acts as the ground electrode.

[0037] An air pump is connected to the plasma discharge electrode via a flexible pipe, and the gas flow rate is controlled at 20 L / min by a rotor flow meter. The plasma discharge device is excited by a pulse source with an excitation voltage of 8 kV, a power supply frequency of 2 kHz, and a pulse width of 50 ns, ensuring stable and uniform discharge of the plasma device under atmospheric pressure.

[0038] Combination Figure 2 As shown, flow equalization blades 501 are built into the upper plasma electrode 5 and the lower plasma electrode 16 to ensure uniform gas velocity and density distribution in the nozzle during gas intake, thereby improving discharge uniformity.

[0039] There are four adjusting wheels 2, which are symmetrically fixed on the receiving platform 3. The highest point is on the same horizontal line as the receiving platform 3. They are used to adjust the relative height of the material to be processed and to avoid wear caused by direct contact with the receiving platform 3.

[0040] The feeding shaft 1, the first transmission shaft 6, the second transmission shaft 8, the third transmission shaft 13, the fourth transmission shaft 17, and the receiving shaft 7 are fixed to the housing by a support rod to ensure that their relative positions remain unchanged.

[0041] The conveying control motor 9 of the take-up shaft 7 is fixed on the housing 10. The speed of the roll material is controlled by controlling the rotation speed of the shaft. The matching speed of the roll material is set to 0.5 mm / s according to the plasma electrode treatment time.

[0042] The polypropylene fiber roll to be processed is mounted on the feeding shaft 1. The plastic film passes over the receiving platform 3 via the adjusting wheel 2. The upper plasma electrode 5 above the film performs a uniform surface treatment on it under the drive of the upper sliding guide rail 4. The processed film continues to be conveyed, passing through the second transmission shaft 8, the third transmission shaft 13, and the fourth transmission shaft 17 to achieve a face change. At the same time, the lower plasma electrode 16 below performs a surface treatment on the other side of the material. The processed plastic film passes through the first transmission shaft 6 and is then collected by the receiving shaft 7.

[0043] After this treatment process, the hydrophilicity of the polypropylene fiber roll surface was measured to increase from 45° to 120°.

[0044] Example 2

[0045] A plasma device for large-area continuous double-sided processing is provided to achieve the preparation of surface coatings for PE roll materials, thereby enhancing their barrier properties. Combined with... Figure 1 As shown, the upper plasma electrode 5 and the lower plasma electrode 16 are connected to the upper sliding guide rail 4 and the lower sliding guide rail 15, respectively. The guide rails are fixed on the housing. The upper sliding guide rail 4 is controlled by the upper guide rail control motor 12, and the lower sliding guide rail 15 is controlled by the lower guide rail control motor 11. The plasma discharge electrode is moved back and forth through the guide rails at a speed of 50 mm / s.

[0046] The upper plasma electrode 5 and the lower plasma electrode 16, together with the receiving platform 3, form two parallel flat-plate dielectric barrier discharge electrode structures. In this discharge structure, the two plasma electrodes share a single ground electrode, with a discharge gap of 10 mm. The receiving platform 3 is grounded and serves as the ground electrode. A gas cylinder containing Ar / O2 and a gas passage for the TEOS precursor are connected to the plasma discharge electrodes via flexible pipes. The gas flow rates are controlled by a rotor flow meter to be 3 L / min, 5 mL / min, and 100 mL / min, respectively. The plasma discharge device is excited by a pulse source with an excitation voltage of 6 kV, a power supply frequency of 2 kHz, and a pulse width of 50 ns, ensuring stable and uniform discharge under atmospheric pressure.

[0047] Combination Figure 2 As shown, flow equalization blades 501 are built into the upper plasma electrode 5 and the lower plasma electrode 16 to ensure uniform gas velocity and density distribution in the nozzle during gas intake, thereby improving discharge uniformity.

[0048] There are four adjusting wheels 2, symmetrically fixed on the receiving platform 3, with the highest point on the same horizontal line as the receiving platform. They are used to adjust the relative height of the material to be processed and to avoid wear caused by direct contact with the receiving platform. The feeding shaft 1, the first transmission shaft 6, the second transmission shaft 8, the third transmission shaft 13, the fourth transmission shaft 17, and the receiving shaft 7 are fixed to the housing by bracket rods to ensure that their relative positions remain unchanged.

[0049] The conveyor control motor 9 is fixed on the housing 10. The speed of the roll material movement is controlled by controlling the rotation speed of the shaft. The matching movement speed of the roll material is set to 0.1 mm / s according to the plasma electrode treatment time.

[0050] The fiber roll to be processed is installed on the feeding shaft 1. The plastic film passes over the receiving platform 3 via the adjusting wheel 2. The upper plasma electrode 5 above the film is uniformly treated by the sliding guide rail 4 above.

[0051] The processed film continues to be transported, passing through the second transmission shaft 8, the third transmission shaft 13, and the fourth transmission shaft 17 to achieve a face change. At the same time, the lower plasma electrode 16 below performs surface treatment on the other side of the material. The processed plastic film is then collected by the receiving shaft 7 after passing through the first conveying shaft 6.

[0052] After processing, a dense SiO2 film was observed on the surface of the PE roll, such as... Figure 4 and Figure 5 As shown, the uniformity is less than or equal to 10%, and the water vapor barrier rate is less than 10%. -3 g / m 2 / day.

[0053] This embodiment takes the surface treatment of fiber and PE film rolls as an example. The specific workflow is as follows: The roll to be treated is installed on the feeding shaft 1. The plastic film passes over the receiving platform 3 via the adjusting wheel 2. The plasma electrode 5 above the film performs uniform surface treatment under the drive of the sliding guide rail 4. The treated film continues to be conveyed, passing through the second transmission shaft 8, the third transmission shaft 13, and the fourth transmission shaft 17 to achieve a face change. The plasma electrode below then performs surface treatment on the other side of the material. The treated plastic film is then collected by the receiving shaft 7 after passing through the first conveying shaft 6. When all the plastic film has been treated, the shafts can be reversed. At this time, the original receiving shaft acts as the feeding shaft, and the feeding shaft acts as the receiving shaft, thus realizing multiple continuous automatic surface treatments.

[0054] Those skilled in the art will readily understand that the above description is merely a preferred embodiment of the present invention, but the scope of protection of this disclosure is not limited thereto. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A plasma device for large-area continuous double-sided processing, characterized in that, Includes a plasma generator, a winding mechanism, a transmission mechanism, and a housing; The plasma generating device comprises an upper plasma electrode (5) and a lower plasma electrode (16), as well as a common ground electrode, which is also a receiving platform (3). The upper plasma electrode (5) and the lower plasma electrode (16) are equidistantly installed on the upper and lower sides of the ground electrode, and simultaneous discharge is achieved through the shared ground electrode; The upper plasma electrode (5) and the lower plasma electrode (16) are respectively connected to the upper sliding guide rail (4) and the lower sliding guide rail (15). The upper sliding guide rail (4) and the lower sliding guide rail (15) are both fixed on the housing. The upper sliding guide rail (4) is controlled by the upper guide rail control motor (12), and the lower sliding guide rail (15) is controlled by the lower guide rail control motor (11). The plasma discharge electrode is driven to move back and forth through the motor control. The moving speed is adjustable in the range of 0.1-200mm / s. The gas pipeline is located outside the housing and is connected to the upper plasma electrode (5) and the lower plasma electrode (16) respectively through flexible pipes; The winding mechanism includes a feeding shaft (1) and a receiving shaft (7); The transmission mechanism includes multiple transmission shafts; The feeding shaft (1) is located in front of the receiving platform (3). The roll material to be processed is installed on the feeding shaft (1). The moving speed of the roll material is matched with the moving speed of the plasma electrode to ensure uniform processing. The adjustable range is 0.01-10mm / s. The receiving platform (3) is equipped with adjusting wheels (2) at both the front and rear ends. The roll material to be processed passes through the adjusting wheels (2) and is surface-treated by the upper plasma electrode (5) on the receiving platform (3). After passing through multiple conveying shafts, the material is changed side by the lower plasma electrode (16) and then collected by the receiving shaft (7).

2. The plasma device for large-area continuous double-sided processing according to claim 1, characterized in that, The highest point of the adjusting wheel (2) is at the same level as the surface of the receiving platform (3), ensuring that the feed material makes flat contact with the receiving platform (3) and avoiding wear caused by direct contact with the receiving platform (3).

3. The plasma device for large-area continuous double-sided processing according to claim 1, characterized in that, The upper plasma electrode (5) and the lower plasma electrode (16) both adopt a conical structure, with uniformly distributed small holes punched in the electrode plate, and flow equalization blades (501) installed inside the electrode.

4. A processing method for a large-area continuous double-sided plasma device according to any one of claims 1 to 3, characterized in that, Includes the following steps: The roll to be processed is installed on the feeding shaft (1). The roll to be processed is passed over the receiving platform (3) via the adjusting wheel (2). The upper plasma electrode (5) above the roll to be processed is driven by the upper sliding guide rail (4) to perform uniform surface treatment on it. After processing, the roll to be processed continues to be driven. After passing through the transmission mechanism, the surface is changed and transported to the receiving platform (3). At the same time, the lower plasma electrode (16) below performs surface treatment on the other side of the material. The processed material is collected by the receiving shaft (7). The feeding speed of the roll material is controlled by adjusting the motor speed and the size of the shaft, or by controlling the reverse shaft motor to interchange the functions of the feeding shaft and the receiving shaft, so as to achieve secondary or multiple processing.

Citation Information

Patent Citations

  • Discharging device for generating large-area plasma in atmospheric pressure air

    CN113473688A

  • Portable large-area plasma jet device and system

    CN113490322A

  • Device and method for generating large-area uniform glow discharge plasma

    CN114126179A

  • Plasma treatment device for brushing-free coating on surface of heat-conducting silica gel

    CN115583005A

  • Skin treatment apparatus using plasma

    KR101568380B1