一种含镁高电子迁移率电子自旋晶体管的外延结构、制备方法和晶体管

By growing specific epitaxial structures on GaAs substrates, including ZnTe buffer layers and ZnTe blocking layers, the problem of low-temperature operation of existing electron spin devices has been solved, achieving stable and controllable magnetization characteristics and high current density at high temperatures, which is suitable for high-density data computing.

CN116565014BActive Publication Date: 2026-07-17CHENGDU HIWAFER SEMICON CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
CHENGDU HIWAFER SEMICON CO LTD
Filing Date
2023-03-13
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing electron spin devices operate at temperatures far below room temperature, making it difficult to meet practical application requirements. Furthermore, magnetic elements are susceptible to thermal disturbances at high temperatures, resulting in unstable magnetic properties.

Method used

An epitaxial structure was constructed on a GaAs substrate, consisting of a ZnTe buffer layer, a p-Zn70%Mg30%Te thin film layer, a ZnTe barrier layer, a (Zn90%, Cr10%)Te magnetic layer, an AlN insulating layer, and an Au voltage extraction layer. The ZnTe barrier layer prevents N atom diffusion, improves the stability of the magnetic layer, and controls the magnetization under an external electric field.

Benefits of technology

The effective operating temperature of the electron spin transistor has been increased to 110K, enhancing the device's stability and current density at high temperatures. It also enables controllable magnetization under external electric and magnetic fields, making it suitable for high-density data computation.

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Abstract

本发明公开了一种含镁高电子迁移率电子自旋晶体管的外延结构、制备方法和晶体管,外延结构包括由下至上依次设置的:GaAs衬底、ZnTe缓冲层、p‑Zn70%Mg30%Te薄膜层、ZnTe阻止层、(Zn90%,Cr10%)Te磁性层、AlN绝缘层、Au电压引出层,所述p‑Zn70%Mg30%Te薄膜层的掺杂元素为N原子。本发明在p‑Zn70%Mg30%Te薄膜层之上的ZnTe阻止层的作用是防止p‑Zn70%Mg30%Te薄膜层的N原子向(Zn90%,Cr10%)Te磁性层进行扩散,从而改变(Zn90%,Cr10%)Te磁性层的物理特性,并进一步提高器件的有效工作温度。
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