Apparatus for cleaning a transport container for a can-shaped hollow body, in particular a semiconductor wafer or an EUV lithography mask

Abstract

The invention relates to an apparatus (10) for cleaning a transport container (30) of a can-shaped hollow body (12), in particular a semiconductor wafer or an EUV lithography mask, wherein the apparatus (10) comprises a support wall (20) onto which an edge face (38) of the hollow body (12) can be placed, a closure device (26) with which the hollow body (12) can be connected to the support wall (20) sealingly and releasably, at least one through opening (24) formed by the support wall (20), which is arranged radially inside the closure device (26), a cleaning device (40) with which a first cleaning fluid can be output for cleaning a hollow body inner face (33) when the hollow body (12) is connected to the support wall (20), a first discharge channel (70) having a first end (72), wherein the first discharge channel (70) having the first end (72) is only in fluid communication with the through opening (24) and with which the first cleaning fluid output by the cleaning device (40) can be discharged.

Description

Technical Field

[0001] The present invention relates to an apparatus for cleaning a can-shaped hollow body, particularly a semiconductor wafer or an EUV lithography mask, transport container. Background Technology

[0002] Today, the manufacture of highly integrated electronic circuits and other sensitive semiconductor devices takes place in factories, where so-called semiconductor wafers undergo multiple processing steps. Most of these processing steps are carried out in cleanrooms, which are kept free of impurities, particularly particles, through significant expenditure. This costly processing is necessary because particles, especially those in contact with the semiconductor material of the wafer, can affect the material properties of the wafer, rendering the entire production batch defective and unusable, and requiring rejection.

[0003] Because maintaining cleanliness becomes increasingly important as the integration density of semiconductor circuits increases, and the cost of maintaining cleanliness rises exponentially with the size of cleanrooms, semiconductor wafers are not transported "exposed" from one processing station to the next. Instead, special transport containers (so-called FOUPs, Front Opening Unified Pods) are used. These transport containers are understood as box-shaped transport containers into which multiple semiconductor wafers are inserted. FOUPs are typically closed with a removable lid. Without the lid, a FOUP has a basic can shape with a rectangular base. When a FOUP is closed with its lid, the inserted semiconductor wafers can be transported from one cleanroom to another unaffected by environmental factors. When the FOUPs arrive at a processing station, they are opened, the semiconductor wafers are removed, and processed accordingly. After processing is complete, the semiconductor wafers are returned to the FOUP and subsequently transported to the next processing station.

[0004] Due to the high production losses caused by semiconductor wafer contamination, FOUPs need to be cleaned frequently. FOUPs are particularly prone to contamination by semiconductor wafer debris when semiconductor wafers are introduced into and removed from them.

[0005] Correspondingly, this also applies to the shipping containers for EUV lithography masks (“Extreme Ultraviolet Radiation”). EUV lithography masks are used to manufacture very small integrated circuits. EUV lithography masks must also be transported like semiconductors, where similar situations arise. This explanation also applies to the shipping containers for EUV lithography masks when FOUP is mentioned later.

[0006] For example, devices for cleaning FOUPs are known from US 5 238 703 A, WO 2005 / 001888 A2 and EP 1 899 084 B1.

[0007] In this equipment, the FOUP is cleaned not only on its inner surface but also on its outer surface. Typically, the FOUP is significantly more contaminated on its outer surface than on its inner surface. Therefore, during the cleaning process, particles from both the outer and inner surfaces accumulate in the cleaning fluid. These particles can thus be transported from the outer surface to the inner surface. However, satisfactory cleaning results are only achieved when the particle count is below a certain value. Due to the particles from the outer surface, the cleaning process must be performed for a correspondingly long duration to remove a sufficient proportion of particles. This is disadvantageous, firstly because the required amount of cleaning fluid is relatively high, and secondly because the FOUP cannot be used to transport semiconductor wafers during the cleaning process. Consequently, semiconductor wafer production becomes more expensive. Furthermore, cleaning the outer surface contributes only to a limited reduction in defective semiconductor wafers. Summary of the Invention

[0008] The purpose of this invention is to provide a device for cleaning hollow cans, which allows for the simple and inexpensive cleaning of hollow cans in a short time.

[0009] This objective is achieved using the features described in claim 1. Advantageous embodiments are the subject of the dependent claims.

[0010] Embodiments of the present invention relate to an apparatus for cleaning a can-shaped hollow body, particularly a transport container for semiconductor wafers or EUV lithography masks, wherein the hollow body comprises:

[0011] - A bottom wall and one or more side walls that form the inner surface of the hollow body, and

[0012] - An opening opposite the bottom wall, which is surrounded by the edge of the side wall.

[0013] The equipment includes:

[0014] - Support wall, the edge surface of the hollow body can be placed on the support wall.

[0015] - A locking device that allows the hollow body to be connected to the supporting wall in a sealing and releasable manner via its edge surfaces.

[0016] - At least one through opening formed by a support wall, which is arranged radially inside the locking device.

[0017] - A cleaning device, when the hollow body is connected to the supporting wall, can output a first cleaning fluid to clean the inner surface of the hollow body, and

[0018] - A first outlet channel having a first end, wherein the first outlet channel having the first end is in fluid communication only with a through opening, and the first cleaning fluid output by the cleaning device can be exported through the first outlet channel.

[0019] For cleaning, the hollow body is placed against the support wall with its edge face, wherein the opening of the hollow body and the through opening of the support wall are directly adjacent to each other. Therefore, it is possible to introduce a first cleaning fluid into the hollow body and thus clean its inner surface. Based on the fact that the locking device is designed so that the hollow body is not only secured but also sealed relative to the support wall with its edge face, the first cleaning fluid cannot leave the internal space of the hollow body. Therefore, the first cleaning fluid is not contaminated by particles located outside the hollow body. Therefore, the first cleaning fluid is only used to clean the inner surface of the hollow body, which, as mentioned at the beginning, is generally significantly less contaminated than the outer surface. Therefore, the first cleaning fluid is not contaminated by particles from the outer surface of the hollow body, thereby effectively cleaning the inner surface. When the hollow body is placed against the support wall, the edge face represents the separation section between the inner and outer surfaces of the hollow body. At the edge face, the hollow body is also sealed relative to the support wall. Compared to devices known in the prior art, the time required to clean the inner surface of the hollow body can be significantly reduced. In addition, the amount of the first cleaning fluid required to clean the inner surface of the hollow body is also reduced.

[0020] According to another embodiment, a first end of the first outlet channel is connected to a support wall and surrounds the through opening. In this embodiment, the design costs required to provide the device can be kept minimal. In particular, the first outlet channel can be either integrally manufactured with the support wall or connected to the support wall, for example, by welding.

[0021] In an improved embodiment, the first outlet channel may be funnel-shaped towards the first end. Due to this funnel-shaped expansion of the first outlet channel towards the first end, the diameter difference between the through opening and the first outlet channel can be compensated for in a simple manner. This keeps design costs minimal. Furthermore, there is no sudden diameter abrupt change, which could cause disturbances in the flow, such as eddies. These disturbances could lead to particle deposition, thereby potentially slowing down or completely interrupting particle outflow and adversely affecting the cleaning of the hollow inner surface.

[0022] In an improved embodiment, the first outlet channel may be flush with the through opening at its first end. No dead zones where particles could deposit are created, which could potentially negatively impact the cleaning of the hollow inner surface.

[0023] In another embodiment, the cleaning device may have a first cleaning head extending through the opening. In this embodiment, the first cleaning head can be introduced into the interior space of the hollow body. This reduces the distance between the first cleaning head and the inner surface of the hollow body. The pressure of the cleaning fluid leaving the first cleaning head also acts on the inner surface of the hollow body with minimal loss, thereby removing particles located on the outer surface of the hollow body particularly effectively.

[0024] An improved embodiment is characterized in that the first cleaning head is rotatable and / or translational. Due to the mobility of the first cleaning head, it can respond to the geometric characteristics of the inner surface of the hollow body. In particular, it is possible to apply the first cleaning fluid at least substantially perpendicular to the inner surface of the hollow body, thereby allowing the kinetic energy of the first cleaning fluid to be used particularly effectively for cleaning the inner surface of the hollow body.

[0025] According to an improved embodiment, the first cleaning head has a plurality of first cleaning nozzles through which a first cleaning fluid can be output at a jet angle. The first cleaning head has an adjustment device that allows adjustment of the jet angle. The jet angle at which the first cleaning fluid is output also determines the angle at which the cleaning fluid impacts the inner surface of the hollow body. Ideally, the angle is 90° or approximately 90°. Because the jet angle is adjustable, the geometry of the inner surface of the hollow body can be simulated, allowing the first cleaning fluid to be applied to almost the entire inner surface of the hollow body at an angle of 90° or approximately 90°. The inner surface of the hollow body typically has angled portions, which can cause obstruction in the case of non-adjustable cleaning nozzles. In the case of obstruction, no first cleaning fluid or only a limited amount of first cleaning fluid with sufficient kinetic energy can be applied to the inner surface of the hollow body. In this embodiment, such obstruction can be avoided, thereby improving the overall cleaning result.

[0026] An improved implementation can specify that the first cleaning nozzles can be opened and closed independently of each other. If one of the first cleaning nozzles is opened, then the first cleaning fluid can be output, which is not possible in the closed state. Therefore, it is possible to clean the inner surface of the hollow body first, cleaning the sections that are expected to be cleaner, and then cleaning the more contaminated sections. Thus, the load of the first cleaning fluid with particles separated from the inner surface of the hollow body is kept very low for as long as possible. This specifically prevents the use of a first cleaning fluid that already has a high load to clean relatively clean sections. In many cases, the particle absorption capacity of the first cleaning fluid decreases with increasing load. In extreme cases, particles from the first cleaning fluid may even deposit on the relatively clean sections of the hollow body's inner surface. This can be prevented by appropriately manipulating the first cleaning nozzles.

[0027] Furthermore, only specific sections of the hollow inner surface can be cleaned, and the number of absorbed particles can be counted. Particle counting can be repeated frequently, allowing for representative conclusions. This determines whether an above-average number of particles has been applied to the hollow inner surface during a specific semiconductor wafer manufacturing process. This allows for the identification of specific errors or potential for improvement in the manufacturing process.

[0028] One embodiment is characterized by having at least one coupling unit for coupling sound waves into a first cleaning fluid. Here, the sound waves can be specifically designed as ultrasonic waves or megasonic waves. By definition, ultrasonic waves have a frequency range of approximately 20 kHz to 500 kHz, while megasonic waves have a frequency range of approximately 500 kHz to 3 MHz. Appropriately, the first cleaning fluid is used to completely wet the inner surface of the hollow body, or to submerge the entire space surrounded by the inner surface of the hollow body, and the sound waves are coupled into the first cleaning fluid. The first cleaning fluid then acts as a carrier for the sound waves. The cleaning effect is improved due to the fact that a specific amount of energy is thus input into the first cleaning fluid, because particles adhering to the inner surface of the hollow body can be separated particularly well. The energy input increases with the frequency of the coupled sound. When using megasonic waves, the advantage is that energy can be applied precisely to the inner surface of the hollow body to be cleaned, thereby obtaining good cleaning results.

[0029] In an improved embodiment, at least some of the coupling units can be integrated into or work in conjunction with at least some of the cleaning nozzles in the first cleaning nozzle. In this case, the cleaning nozzle can be designed as a "megasonic nozzle" capable of coupling acoustic waves into the first cleaning fluid output from the first cleaning nozzle. Thus, it is not necessary to wet the entire inner surface of the hollow body with the first cleaning fluid, thereby keeping the required amount of the first cleaning fluid very small.

[0030] According to another embodiment, the cleaning device has a delivery channel for conveying a first cleaning fluid to a first cleaning head, wherein the first outlet channel and the delivery channel are combined into a fluid guiding unit at least in partial sections. However, the delivery channel and the outlet channel remain fluid-separated. Here, the delivery channel and the outlet channel can be designed as pipes and / or hoses. Because the first outlet channel and the delivery channel are combined into a fluid guiding unit, structural space can be saved, and therefore the device can be designed to be compact. Furthermore, because the number of parts in the device can be reduced, manufacturing costs can be kept low.

[0031] According to another embodiment, a first channel is arranged in the support wall, through which the flushing fluid can be guided to the edge surface. Nitrogen or compressed air, and particularly preferably very clean, dry air—also known as XCDA—is specifically used as the flushing fluid. This prevents the first cleaning fluid from reaching the outer surface of the hollow body through the edge surface, where it could mix with a second cleaning fluid. Furthermore, it prevents the second cleaning fluid from reaching the inner surface of the hollow body through the edge surface, where it could mix with the first cleaning fluid. Therefore, contamination is prevented.

[0032] Another embodiment is characterized in that a particle measuring device for determining the particles contained in the first cleaning fluid is arranged in the first outlet channel. The particle measuring device can be designed, for example, such that the number of particles passing through the particle measuring device in a given volumetric flow rate of the first cleaning fluid through the first outlet channel is determined. If the number of counted particles is below a certain value, then it can be assumed that the inner surface of the hollow body has been sufficiently cleaned. On the one hand, the particle measuring device ensures that the inner surface of the hollow body has indeed been cleaned to a sufficient degree; on the other hand, the cleaning process can be interrupted in this case. In devices known in the prior art, the cleaning process is performed until it can be assumed with sufficient probability that the hollow body has been sufficiently cleaned. In most cases, for safety reasons, the cleaning process is performed for a significantly longer time than required. Since the cleaning process can be interrupted as described according to this embodiment, the duration and amount of the first cleaning fluid are reduced, thereby allowing the cleaning process to be performed significantly more efficiently overall than in the prior art. Furthermore, the particle measuring device is also capable of recording whether a particular FOUP has indeed been cleaned to a sufficient degree.

[0033] According to an improved embodiment, the hollow body has a cover having an inner surface and an outer surface, which can be used to close the opening. Here, a cleaning opening is arranged in the support wall or another wall segment, which can be at least partially closed by a closure body having a receiving unit for receiving the cover of the hollow body, and the cleaning device having an additional first cleaning head, which allows a first cleaning fluid for cleaning to be applied to the inner surface of the cover when the cleaning opening is closed by the closure body or the cover.

[0034] The device embodiments described so far relate to the cleaning of the inner surface of a hollow body. As mentioned above, the FOUP is closed using a removable cover. However, particles that may negatively impact the manufacturing of semiconductor wafers may accumulate on the inner surface of the cover, just as they accumulate on the inner surface of the hollow body. However, in this embodiment, the device includes an additional first cleaning head, which can be used to clean the inner surface of the cover. The same first cleaning fluid is used for this purpose, which is also used to clean the inner surface of the hollow body. However, additional cleaning fluids may be used if necessary. Therefore, particles on the inner surface of the cover can also be removed. To prevent uncontrolled leakage of the first cleaning fluid from the cleaning opening, the cleaning opening must be sealed during the cleaning process. For this purpose, the cover or closure works in conjunction with a support wall or other wall segment to seal the cleaning opening. Here, the cleaning opening can be arranged such that no particles can enter the first cleaning fluid from the environment of the hollow body during the cleaning process. Appropriately, the first cleaning fluid is discharged via a first outlet channel. Here, the receiving unit of the closure works in conjunction with the outer surface of the cover so that the inner surface of the cover, in particular, is accessible to the first cleaning fluid without obstruction.

[0035] Another embodiment specifies that the closure is fixed to a support wall or other wall segment in a manner movable between an open position and a closed position, in which the closure opens a cleaning opening, and in the closed position, the closure closes the cleaning opening. In this embodiment, the closure can be particularly well integrated into the operation of the lid. In the open position, a gripping robot or the like can introduce the lid into a receiving unit of the closure. The receiving unit is equipped with fasteners that allow the lid to be releasably fixed to the closure. After the gripping robot places the lid and fixes it to the closure, the closure moves to the closed position. In the closed position, the cleaning opening is sealed shut, allowing the cleaning process for the inner surface of the lid to begin. After the cleaning process is completed, the closure moves back to the open position, and the connection between the closure and the lid is released, allowing the gripping robot to remove the lid from the receiving unit. It is suitable here that the closure is rotatably fixed to a support wall or other wall segment.

[0036] Another embodiment specifies that the device may have a second channel through which flushing fluid can be directed to the cap. The cap of the transport container typically has a cap seal that allows the cap to be sealed relative to the rest of the transport container. Nitrogen or compressed air, and particularly preferably very clean, dry air—also known as XCDA—is specifically used as the flushing fluid.

[0037] The use of a flushing fluid allows for precise limitation of the area of ​​action of the first cleaning fluid, which cleans the inner surface of the cap. This limitation can be selected so that the first cleaning fluid cannot reach the cap seal. This prevents particles in the first cleaning fluid from adhering to the seal, separating from it during transport, and potentially damaging the semiconductor wafer. When a gas is used, eddies are generated, which facilitate active purging or cleaning of the seal.

[0038] According to another embodiment, the bottom wall and side walls form the outer surface of the hollow body. The cleaning device has a second cleaning head through which a second cleaning fluid for cleaning the outer surface of the hollow body can be output. Here, the device has a second outlet channel through which the second cleaning fluid output by the second cleaning head can be discharged. As mentioned at the beginning, it is not mandatory to also clean the outer surface of the hollow body. This may still be desirable, for example, to keep the particle concentration in the cleanroom very low. In this embodiment, cleaning of the outer surface of the hollow body is possible, wherein the second cleaning fluid is discharged separately from the first cleaning fluid. Preventing the mixing of the first and second cleaning fluids, and the resulting increase in the particle concentration from the outer surface of the hollow body, is impossible in prior art devices. Therefore, when both the inner and outer surfaces of the hollow body are cleaned, particles from the outer surface of the hollow body are also prevented from reaching the inner surface of the hollow body. Therefore, the cleaning process of the inner surface of the hollow body is not negatively affected by particles from the outer surface of the hollow body.

[0039] Typically, the particle concentration on the inner surface of the hollow body is lower than that on the outer surface. Separate extraction of the first and second cleaning fluids allows the first cleaning fluid to be reused to clean the outer surface of the hollow body. Here, the load (or particle concentration) in the first cleaning fluid can first be determined to decide whether the load is low enough to clean the outer surface of the hollow body as necessary. If this is possible, then the amount of cleaning fluid and therefore the cleaning cost can be kept very low.

[0040] In an improved embodiment, the device may have a housing that, together with supporting walls, surrounds a treatment chamber, wherein the treatment chamber is accessible / accessible through an opening in the housing, which can be closed by a cover. A hollow body can be introduced into and removed from the treatment chamber through the housing opening. In this embodiment, it is possible to guide the second cleaning fluid in a defined manner and prevent its uncontrolled distribution within the device.

[0041] In an improved embodiment, the support wall may have multiple through-holes arranged radially outside the locking device, and a second outlet channel is fluidly connected to the processing chamber via these through-holes. Depending on the hollow body design, the through-holes may also be designed as through-slots. A second cleaning fluid can be removed from the processing chamber in a controlled manner through the second outlet channel without mixing with the first cleaning fluid.

[0042] An improved implementation is characterized in that the second cleaning head is designed in a U-shape and is capable of rotating and / or translating within the processing chamber. Due to the U-shaped design of the second cleaning head, the second cleaning fluid can be guided to the bottom and side walls. The mobility of the second cleaning head allows for flexible adaptation to the geometry of the hollow outer surface requiring cleaning.

[0043] According to another embodiment, the first cleaning head, another first cleaning head, and / or the second cleaning head have at least one drying nozzle and / or an infrared diode. In this embodiment, the proposed device can be used not only for cleaning but also for subsequent drying of the hollow body. To end the cleaning process, the delivery of the first cleaning fluid or the first and second cleaning fluids is stopped, and alternatively, a drying gas, such as air or nitrogen, is transported through a fluid guiding unit to dry the hollow body. For this purpose, the hollow body has a suitably designed connector, particularly a negative pressure connector, through which a negative pressure can be generated within the hollow body to draw the drying gas into the hollow body and subsequently remove it from the hollow body. A pipe, also referred to as a vent pipe, is connected to this connector; the pipe may, for example, be connected to a vacuum pump. Here, the position of the hollow body within the device remains unchanged. According to the design, the inner surface and outer surface of the hollow body can be dried. In this case, no mixing of the drying gas for the inner surface of the hollow body with the drying gas for the outer surface of the hollow body occurs.

[0044] Furthermore, it is possible that the second cleaning nozzle and the second cleaning head are also equipped with the same features as the first cleaning nozzle and the first cleaning head, and vice versa, if this is appropriate.

[0045] Alternatively or cumulatively, infrared diodes can be used, which have the advantage that the radiation emitted by the infrared diode is within a narrow, limited frequency range, optimized for the cleaning fluid used. Residues remaining on the inner or outer surface of the hollow body are very effectively heated and thus eliminated.

[0046] One embodiment of the present invention relates to the use of an apparatus according to one of the foregoing embodiments for cleaning a transport container of a semiconductor wafer. The technical effects and advantages achievable using the proposed use correspond to those discussed for the present apparatus. In summary, it should be noted that the time required to clean the inner surface of a hollow body can be significantly reduced compared to apparatus known in the prior art. Furthermore, the amount of the first cleaning fluid required to clean the inner surface of the hollow body is also reduced. These advantages are particularly suitable for the manufacture of semiconductor wafers.

[0047] One aspect of the present invention relates to a method for cleaning a transport container of a can-shaped hollow body, particularly a semiconductor wafer or an EUV lithography mask, using an apparatus according to one of the foregoing embodiments, the method comprising the following steps:

[0048] - Place the edge of the hollow body onto the supporting wall.

[0049] - The hollow body is sealed and releasably connected to the supporting wall by means of a locking device, wherein the hollow body is sealed relative to the supporting wall at its edge face.

[0050] ○ A first cleaning fluid for cleaning the inner surface of the hollow body is output via a first cleaning head of the cleaning device, and the first cleaning fluid is discharged via a first discharge channel; and / or

[0051] ○ A second cleaning fluid for cleaning the outer surface of the hollow body is output through the second cleaning head of the cleaning device, and the second cleaning fluid is discharged through the second discharge channel.

[0052] The technical effects and advantages achievable using the proposed method correspond to those discussed for this device. In summary, it should be noted that the inner and outer surfaces of the hollow body can be cleaned independently of each other. The possibility of the first cleaning fluid used to clean the inner surface of the hollow body being contaminated by particles removed from the outer surface of the hollow body is eliminated. Furthermore, using the proposed method, it is possible to clean either only the outer surface of the hollow body or only the inner surface of the hollow body, if desired. Moreover, the outer surface of the hollow body can be cleaned in a shorter time than the inner surface of the hollow body. It is also possible to clean both the outer and inner surfaces of the hollow body simultaneously.

[0053] According to another design approach, the method may include the following steps:

[0054] - To move the closed body to the open position.

[0055] Place the outer surface of the lid onto the receiving unit of the enclosure, and secure the lid releasably to the enclosure.

[0056] - To move the closed body to its closed position.

[0057] - Utilize a separate first cleaning head to output the first cleaning fluid for cleaning the inner surface of the cover.

[0058] For example, a gripping robot can be used to place the cover onto the receiving unit. In the open position, the receiving unit is easily accessible, allowing for quick and simple placement and removal of the cover without the gripping robot needing to perform complex movements. In the closed position, the guidance of the first cleaning fluid is ensured, thus preventing mixing with the second cleaning fluid for the reasons mentioned above. It should be noted that the proposed device can also be operated such that only the cover is cleaned, not the hollow body. In this case, the through opening can be closed using a locking element.

[0059] Another design scheme specifies that the method includes the following steps:

[0060] -Use the first cleaning fluid to completely submerge the space defined by the inner surface of the hollow body.

[0061] - The acoustic waves are coupled into the first cleaning fluid using a coupling unit.

[0062] For example, sound waves can be coupled in the form of ultrasound or megasound. This improves the cleaning results because energy is introduced into the first cleaning fluid, which is used to separate particles from the inner surface of the hollow body. The inner surface of the cover and the outer surface of the hollow body can then be treated accordingly.

[0063] According to an improved design, the method includes the following steps:

[0064] - The acoustic wave is coupled into the first cleaning fluid output from the first cleaning nozzle by means of a coupling unit, wherein the coupling unit is integrated into or works in conjunction with the first cleaning nozzle.

[0065] In this design, sound waves can also be coupled in as ultrasonic or megasonic waves. For the reasons mentioned above, this design also improves the cleaning results. However, because this design does not require flooding the space defined by the inner surface of the hollow body, the required amount of initial cleaning fluid can be kept correspondingly low. The inner surface of the cover and the outer surface of the hollow body can be treated accordingly. Attached Figure Description

[0066] Exemplary embodiments of the present invention will now be described in detail with reference to the accompanying drawings. Wherein:

[0067] Figure 1 A schematic cross-sectional view of an embodiment of an apparatus for cleaning a transport container in the shape of a can, particularly a semiconductor wafer or an EUV lithography mask;

[0068] Figure 2 Shown in Figure 1The illustration of segment A, which is not enlarged to scale, is limited to the middle section;

[0069] Figure 3 Shown in Figure 1 The illustration of segment B, which is not enlarged to scale, is limited to the middle section. Detailed Implementation

[0070] exist Figure 1 The following is a schematic cross-sectional view illustrating an embodiment of the proposed device 10 for cleaning a hollow, can-shaped body 12. The device 10 has a housing 14 forming a housing opening 16, which can be closed using a cover 18 removable from the housing 14. Furthermore, a support wall 20 is arranged within the housing 14, thereby providing a closed processing chamber 22 within the housing 14. The processing chamber 22 is defined by the support wall 20, the housing 14 itself, and the cover 18. The support wall 20 forms a through opening 24, wherein a locking device 26 is arranged radially outside the through opening 24. In the illustrated embodiment, two through holes 28 in the support wall 20 are provided radially outside the locking device 26.

[0071] With the cover 18 removed, the hollow body 12, particularly the transport container 30 for semiconductor wafers—also known as a FOUP—or the transport container 30 for EUV lithography masks, can be introduced into the processing chamber 22. The hollow body 12 has a bottom wall 32 and, in this case, four side walls 34, making the can-shaped hollow body 12 substantially square. However, it is entirely possible for the can-shaped hollow body 12 to be fitted with other geometries, such as cylindrical ones. The bottom wall 32 and the four side walls 34 form the inner surface 33 and the outer surface 35 of the hollow body.

[0072] The hollow body 12 has an opening 36, which is arranged opposite to the bottom wall 32 and surrounded by an edge surface 38 formed by sidewalls. In the region of the edge surface 38, in the illustrated embodiment, the hollow body 12 is flange-constructed. The hollow body 12 can be placed onto the support wall 20 with the edge surface 38. In the illustrated embodiment, the through opening 24 of the support wall 20 and the opening 36 of the hollow body 12 have at least substantially the same size and the same geometry.

[0073] In addition, the locking device 26 is designed such that the through opening 24 is at least approximately aligned with the section of the hollow inner surface 33 adjacent to the through opening 24.

[0074] Figure 2 Shown in a way that is not enlarged to scale Figure 1 Region A is represented in the image, where precise uniformity does not exist. For display purposes, the locking device 26 is not shown. From... Figure 2As can be seen, the support wall 20 includes a support wall section 37 that forms a contact surface 39 that contacts the edge surface 38 of the transport container 30. Here, the contact surface 39 of the support wall section 37 is completely covered by the edge surface 38. A first channel 41 is arranged in the support wall section 37, which leads into the contact surface 39 and allows flushing fluid, such as air or nitrogen, to be guided to the edge surface 38.

[0075] In addition, the device 10 is equipped with a cleaning device 40 having a first cleaning head 42 that extends out of the through opening 24 and is thus arranged within the processing chamber 22. When the hollow body 12 is connected to the support wall 20, the first cleaning head 42 is surrounded by the hollow body 12.

[0076] The housing 14 also includes a wall section 44 in which a cleaning opening 46 is arranged. The wall section 44 is located on the side of the supporting wall 20 opposite to the locking device 26. The cleaning opening 46 can be at least partially closed by a closure body 48, which is fixed to the wall section 44 in a manner rotatable about a first rotation axis D1 by a drive unit (not shown). The closure body 48 can move between an open position and a closed position, in which the closure body 48 opens the cleaning opening 46, and in the closed position, the closure body 48 at least partially closes the cleaning opening 46. Figure 1 In the middle, the closed body 48 is in a closed position.

[0077] The enclosure 48 has a receiving unit 50, by which a cover 52 can be releasably fixed to the enclosure 48, thereby closing the hollow body 12. The cover 52 forms an inner surface 54 and an outer surface 56. The inner surface 54 is the lower side of the cover 52, which is directly adjacent to the inner surface 33 of the hollow body when the cover 52 is used to close the hollow body 12. In other words, in this case, the inner surface 54 points towards the bottom wall 32 of the hollow body 12.

[0078] In the illustrated embodiment, the receiving unit 50 is designed such that it works in conjunction with the cover 52 solely by means of the outer surface 56 of the cover.

[0079] Figure 3 Shown in a way that is not enlarged to scale Figure 1Region B, as indicated in the diagram, lacks precise uniformity. It can be seen that the housing seal 51 is arranged adjacent to and surrounds the cleaning opening 46 within the housing 14. When the closure 48 is in the closed position, the cover 52 works in conjunction with the housing seal 51. In this respect, the cleaning opening 46 is closed and sealed by means of the cover 52. It should be understood in this context that the closure 48 at least partially closes the cleaning opening 46. However, it is also conceivable that the closure 48, in conjunction with the housing seal 51, completely and completely seals the cleaning opening 46.

[0080] In addition, from Figure 3 As can be seen, the cover 52 has a cover seal 53, which can be used to seal the transport container 30 when the cover 52 is connected to the transport container 30. Furthermore, a channel element 55 is arranged on the housing 14, which together with the housing 14 forms a second channel 57, through which flushing fluid, such as air or nitrogen, can be guided to the cover 52. The channel element 55 is configured such that it forms a gap 60 with the cover seal 53.

[0081] The cleaning device 40 is also equipped with an additional first cleaning head 58, which is arranged near the enclosure 48 when the enclosure is in the closed position.

[0082] The cleaning device 40 also includes a second cleaning head 64, which is substantially U-shaped and at least partially arranged in the processing chamber 22. However, when the hollow body 12 is as Figure 1 When connected to the support wall 20, the second cleaning head 64 is arranged outside the hollow body 12, unlike the first cleaning head 42. The second cleaning head 64 can rotate about a second rotation axis D2, wherein a drive mechanism for this purpose is not shown. Furthermore, the following embodiment is not shown, in which the second cleaning head 64 can move not only rotationally but also translationally, or only translationally. In the illustrated embodiment, the first cleaning head 42 is immovable, but it can also be designed to be rotatable and / or translationally movable.

[0083] The device 10 is also equipped with a fluid guiding unit 66, which guides the first cleaning fluid to the first cleaning head 42 and another first cleaning head 58, and guides the second cleaning fluid to the second cleaning head 64. The fluid guiding unit 66 has a first conveying channel 68, which guides the first cleaning fluid to the first cleaning head 42.

[0084] For display purposes, a detailed depiction of the second delivery channel for delivering the second cleaning fluid to the second cleaning head 64 is omitted, but its design is readily deriveable to those skilled in the art.

[0085] Furthermore, the fluid guiding unit 66 includes a first outlet channel 70 through which the first cleaning fluid output from the first cleaning head 42 and another first cleaning head 58 can be discharged from the processing chamber 22. The first outlet channel 70 has a first end 72 that is in fluid communication with the through opening 24. For example, from... Figure 1 As can be seen, the first outlet channel 70 expands in a funnel shape toward the first end 72 and connects with the support wall 20, so that the first end 72 of the outlet channel is flush with the through opening 24.

[0086] A first particle measuring device 741 is arranged in the first outlet channel 70, which can be used to determine and, in particular, count particles in the first cleaning fluid that originate from the inner surface 33 of the hollow body. Furthermore, a second particle measuring device 742 is arranged in the sub-channel 742, which can be used to determine and, in particular, count particles in the first cleaning fluid that originate from the inner surface 54 of the cover.

[0087] Furthermore, the fluid guiding unit 66 has a second outlet channel 76, which is constructed substantially the same as the first outlet channel 70, but is in fluid communication with the two through holes 28. Here, the first outlet channel 70 forms the radial inner wall of the second outlet channel 76, allowing the fluid guiding unit 66 to be designed to be very compact. The following embodiment, in which an additional particle measuring device 74 is arranged in the second outlet channel 76, is not shown. It should be noted at this point that... Figure 1 The fluid guiding unit 66 is shown only in principle. Due to multiple nested channels arranged in different planes, according to... Figure 1 The display of the fluid guiding unit 66 does not require accuracy. However, those skilled in the art can easily see from [the following text is incomplete and requires further context: "from the fluid guiding unit 66 display is not required to be accurate. However, those skilled in the art can easily see from the following text is incomplete and requires further context: ""] Figure 1 At least one functional structure of the fluid guiding unit 66 is derived.

[0088] Device 10 operates as follows: In an initial state (not shown), cover 18 is opened, and the second cleaning head 64 is positioned relative to... Figure 1 Rotate 90° so that the U-shaped section of the second cleaning head 64 is perpendicular to Figure 1 The plane. The closed body 48 is in the open position, in which the closed body 48 is relative to... Figure 1 Oriented roughly horizontally.

[0089] Using an operating device (not shown), such as a gripping robot, the cover 52 is separated from the hollow body 12 and placed onto the receiving unit 50. Figure 1As shown, the opened hollow body 12 is introduced into the processing chamber 22, so that the hollow body 12 rests on the support wall 20 with its edge surface 38. Subsequently, the hollow body 12 is locked by the locking device 26, so that the hollow body is connected to the support wall 20 and thus secured in the processing chamber 22. Here, the locking device 26 is equipped with a seal (not shown) to seal the hollow body 12 relative to the support wall 20. Now, the cover 18 is closed. Furthermore, the receiving unit 50 of the closure 48 is activated, so that the cover 52 is secured to the closure 48. The closure 48 rotates 90° into the closed position, as... Figure 1 As shown. Here, cover 52 seals the cleaning opening 46.

[0090] Now, the first cleaning fluid is guided to the first cleaning head 42 via the first delivery channel 68 and output through the first cleaning nozzle 78, thereby cleaning the inner surface 33 of the hollow body with the first cleaning fluid. The additional first cleaning head 58 has an additional first cleaning nozzle 80, which is used to apply the first cleaning fluid to the inner surface 54 of the cover, thereby cleaning the inner surface of the cover.

[0091] Simultaneously, a second cleaning fluid, corresponding to the first cleaning fluid, is guided to the second cleaning head 64 via a second delivery channel (not shown), where it is output through a second cleaning nozzle 82 to clean the outer surface 35 of the hollow body. Here, the second cleaning head 64 can rotate about a second rotation axis D2.

[0092] The first cleaning nozzle 78, the additional first cleaning nozzle 80, and the second cleaning nozzle 82 can be designed such that the spray angle α of the first and second cleaning fluids output at the spray angle is adjustable. For this purpose, the first cleaning nozzle 78, the additional first cleaning nozzle 80, and the second cleaning nozzle 82 can be ball-head supported. Alternatively or cumulatively, the first cleaning nozzle 78 can be specifically arranged on a tube 83 rotatable about a third axis of rotation D3, thereby allowing adjustment of the spray angle α. The first cleaning head 58 in any case includes an adjustment device 85 by which the spray angle α can be adjusted. The additional first and second cleaning nozzles 80 can be correspondingly designed, wherein the spray angle α is also adjusted by the adjustment device 85, at which the first cleaning fluid is output from the additional first cleaning nozzle 80. The adjustment device 85 can also be designed such that the spray angle α of the second cleaning nozzle 80 located on the second cleaning head 64 can also be adjusted. This allows the first and second cleaning fluids to impact the inner surface 33 of the hollow body and the inner surface of the cover or the outer surface 35 of the hollow body perpendicularly or nearly perpendicularly.

[0093] Furthermore, the device 10 has at least one coupling unit 87 for coupling acoustic waves into the first cleaning fluid. Here, the coupling unit 87 can also be designed so that acoustic waves can also be coupled into the second cleaning fluid. In the illustrated embodiment, some of the coupling units 87 are integrated into at least some of the first cleaning nozzles 78 and designed as so-called "megasonic nozzles." Megasonic waves can be coupled into the first cleaning fluid output from the first cleaning nozzles 78. Correspondingly, additional first cleaning nozzles 80 and second cleaning nozzles 82 can be provided.

[0094] The first cleaning nozzles 78 can be opened and closed independently of each other. Therefore, it is possible to clean different sections of the inner surface 33 of the hollow body first, and then clean other sections subsequently. For example, sections that are empirically less contaminated can be cleaned first, followed by sections that are empirically more contaminated. Accordingly, the additional first cleaning nozzles 80 and second cleaning nozzles 82 can be designed such that the inner surface 54 of the first cover and the outer surface 35 of the hollow body can be cleaned accordingly.

[0095] Simultaneously, the flushing fluid is guided to the edge surface 38 through the first channel 41 and / or to the cover 52 through the second channel 57. This may involve the same flushing fluid, but it is also possible that a first flushing fluid is guided through the first channel 41 and a second flushing fluid, different from the first flushing fluid, is guided through the second channel 57. The flushing fluid guided to the edge surface 38 through the first channel 41 ensures that neither the first nor the second cleaning fluid can cross the edge surface. The flushing fluid thus creates a fluid seal between the first and second cleaning fluids. This ensures that the first and second cleaning fluids cannot mix, preventing contamination of the first and second cleaning fluids.

[0096] The first cleaning fluid, which has been output by the first cleaning head 42 and applied to the inner surface 33 of the hollow body, is discharged via the first discharge channel 70. The same applies to the first cleaning fluid, which has been output by another first cleaning head 58 and applied to the inner surface 54 of the cap. In order to discharge the first cleaning fluid used for cleaning the inner surface 54 of the cap, the first discharge channel 70 has a secondary channel 84 that leads into the first discharge channel 70.

[0097] The flushing fluid directed to the cover 52 flows back into the secondary channel 84 through the gap 60. The housing seal 51 prevents the flushing fluid from entering the environment. The flushing fluid prevents the first cleaning fluid, which has been output by the additional first cleaning head 58 and applied to the inner surface 54 of the cover, from reaching the cover seal 53, where particles in the first cleaning fluid can adhere.

[0098] The flushing fluid directed to the edge face 38 and / or cover 52 can be subjected to sufficiently high pressure.

[0099] Particles located on the inner surface 33 of the hollow body and the inner surface 54 of the lid are removed using a first cleaning fluid. Particles from the inner surface 33 of the hollow body are detected by a first particle measuring device 741, and particles from the inner surface 54 of the lid are detected by a second particle measuring device. Here, the first particle measuring device 741 and the second particle measuring device 742 can be designed such that the number of particles passing through the particle measuring device 74 within a specific time period under a given volumetric flow rate can be determined. This allows it to be determined whether the inner surface 33 of the hollow body and the inner surface 54 of the lid have been cleaned to the desired extent. For example, if the inner surface 33 of the hollow body is sufficiently clean, the cleaning process for the hollow body 12 can be interrupted, while the cleaning process for the inner surface 54 of the lid continues. During this time, the hollow body 12 can be removed from the device by a gripping robot, thereby saving time.

[0100] As mentioned, an additional particle measuring device 74 can be arranged in the second outlet channel 76. This additional particle measuring device can be used to detect particles from the outer surface 35 of the hollow body. This information can also be included in the decision on whether the cleaning process for the hollow body 12 can be interrupted. If the load of the first cleaning fluid with particles from the inner surface 33 of the hollow body does not exceed a certain value, then the first cleaning fluid can also be used to clean the outer surface 35 of the hollow body.

[0101] The following embodiment is not shown, in which the particle measuring device 74 is arranged downstream of the inlet in the secondary channel 84 to the first outlet channel 70. In this case, it is impossible to distinguish whether the particles originate from the inner surface 54 of the cover or from the inner surface 33 of the hollow body. If the number of particles is below a certain level, the cleaning process may still be interrupted.

[0102] The second cleaning fluid, which has been output by the second cleaning head 64 and applied to the outer surface 35 of the hollow body, is discharged via the second discharge channel 76. Therefore, the first and second cleaning fluids are discharged separately from each other, so that particles from the outer surface 35 of the hollow body cannot enter the first cleaning fluid and therefore cannot reach the inner surface 33 of the hollow body or the inner surface 54 of the cover.

[0103] Generally, cleaning the inner surface 33 of the hollow body and the inner surface 54 of the lid is more important than cleaning the outer surface 35 of the hollow body. If it is determined that the inner surface 33 of the hollow body and the inner surface 54 of the lid have been cleaned to the desired degree, the cleaning process can be interrupted regardless of the degree of preparation of the outer surface 35 of the hollow body.

[0104] Now, the first and second dry gases, such as air or nitrogen, can be guided through the first delivery channel 68 or the second delivery channel to the first cleaning head 42, the additional first cleaning head 58, and the second cleaning head 64 in substantially the same manner as the first and second cleaning fluids. However, a negative pressure is generated in the hollow body 12 for this purpose by connecting a pipeline (not shown) to a negative pressure connector 94, which can be connected to a vacuum pump (also not shown). Due to the negative pressure, the first and / or second dry gases are drawn into the hollow body 12 and subsequently removed from it. The first cleaning head 42 has a first drying nozzle 86, the additional first cleaning head 58 has another first drying nozzle 88, and the second cleaning head has a second drying nozzle 90, which allow the first or second dry gas to be output and applied to the inner surface 33 of the hollow body, the inner surface 54 of the cover, and the outer surface 35 of the hollow body. The first and second dry gases expel the first and second cleaning fluids from the device 10. Furthermore, any residues of the first and second cleaning fluids can be blown away.

[0105] In addition, the first cleaning head 42, the other first cleaning head 58, and the second cleaning head each have an infrared diode 92. The infrared diodes can be used to heat and evaporate the residues of the first and second cleaning fluids, so that the residues can be discharged from the device 10 by the first and second drying gases.

[0106] After the drying process is complete, the cover 18 is opened, and the closure 48 is moved to the open position. The cleaned hollow body 12 is removed from the processing chamber. The receiving unit 50 is deactivated, so the cover 52 can be removed from the closure 48 and conveyed to the hollow body 12 for closing it.

[0107] Now, another hollow body 12 to be cleaned can be processed in the device 10 in the manner described.

[0108] List of reference numerals in the attached diagram:

[0109] 10 Equipment

[0110] 12 Hollow bodies

[0111] 14. Shell

[0112] 16. Shell opening

[0113] 18 Cover parts

[0114] 20 Supporting wall

[0115] 22 Processing Room

[0116] 24 Through opening

[0117] 26. Locking device

[0118] 28 through holes

[0119] 30 Transport Containers

[0120] 32 bottom wall

[0121] 33 Hollow inner surface

[0122] 34 Sidewalls

[0123] 35 Hollow outer surface

[0124] 36 Opening

[0125] 38 Edge face

[0126] 40 Cleaning equipment

[0127] 42 First Cleaning Head

[0128] 44 wall segments

[0129] 46 Cleaning opening

[0130] 48 Closed body

[0131] 50 receiving units

[0132] 52 lids

[0133] 54. Inner surface of the lid

[0134] 56. Outer surface of the cover

[0135] 58. Another first cleaning head

[0136] 64 Second Cleaning Head

[0137] 66 Fluid Guiding Unit

[0138] 68 First Conveying Channel

[0139] 70 First Export Channel

[0140] 72 First end

[0141] 74 Particle measuring device

[0142] 76 Second Export Channel

[0143] 78 First Cleaning Nozzle

[0144] 80 additional first cleaning nozzles

[0145] 82 Second Cleaning Nozzle

[0146] 83 tube body

[0147] 84 Secondary Channels

[0148] 85 Adjustment device

[0149] 86 First drying nozzle

[0150] 87 Coupled-in Units

[0151] 88. Another first drying nozzle

[0152] 90 Second drying nozzle

[0153] 92 Infrared Diode

[0154] 94 Negative pressure connector

[0155] α injection angle

[0156] D1 First rotation axis

[0157] D2 Second Rotation Axis

Claims

1. An apparatus (10) for cleaning a can-shaped hollow body (12) – particularly a transport container (30) for semiconductor wafers or EUV lithography masks – wherein, The hollow body (12) includes: - A bottom wall (32) and one or more side walls (34), the bottom wall and one or more side walls forming the inner surface (33) of a hollow body, and - An opening (36) opposite the bottom wall (32), which is surrounded by the edge surface (38) of the side wall (34). -The device (10) includes: - Support wall (20), the edge surface (38) of the hollow body (12) can be placed on the support wall, - The locking device (26) allows the hollow body (12) to be connected to the support wall (20) in a sealed and releasable manner via its edge surface (38). - At least one through opening (24) formed by the support wall (20), said at least one through opening being arranged radially inside the locking device (26), - A cleaning device (40) is used to output a first cleaning fluid to clean the inner surface (33) of the hollow body (12) when it is connected to the support wall (20). - A first outlet channel (70) having a first end (72), wherein the first outlet channel (70) having the first end (72) is in fluid communication only with the through opening (24), and the first cleaning fluid output by the cleaning device (40) can be discharged through the first outlet channel. Its features are, The cleaning device (40) has a first cleaning head (42) that extends out of the through opening (24). - The first cleaning head (42) has a plurality of first cleaning nozzles (78) through which a first cleaning fluid can be output at a spray angle (α), wherein the first cleaning head (42) has an adjustment device (85) by which the spray angle (α) can be adjusted.

2. The device (10) according to claim 1, characterized in that, The first end (72) of the first outlet channel (70) is connected to the support wall (20) and surrounds the through opening (24).

3. The device (10) according to claim 1 or 2, characterized in that, The first outlet channel (70) expands in a funnel shape toward the first end (72).

4. The device (10) according to any one of the preceding claims, characterized in that, The first outlet channel (70) is flush with the through opening (24) at the first end (72).

5. The device (10) according to any one of the preceding claims, characterized in that, The first cleaning head (42) can rotate and / or translate.

6. The device according to any one of the preceding claims, characterized in that, The device (10) has at least one coupling unit (87) for coupling sound waves into a first cleaning fluid.

7. The device according to claim 6, characterized in that, At least some of the coupling units (87) are integrated into or work together with at least some of the cleaning nozzles in the first cleaning nozzle (78).

8. The device (10) according to any one of the preceding claims, characterized in that, The cleaning device (40) has a delivery channel (68) for delivering a first cleaning fluid to a first cleaning head (42), wherein the first outlet channel (70) and the delivery channel (68) are combined in at least a portion of the section to form a fluid guiding unit (66).

9. The device (10) according to any one of the preceding claims, characterized in that, A first channel (41) is arranged in the support wall (20), through which the flushing fluid can be guided to the edge surface (38).

10. The device (10) according to any one of the preceding claims, characterized in that, A particle measuring device (74) is arranged in the first outlet channel (70) for determining particles contained in the first cleaning fluid.

11. The device (10) according to any one of the preceding claims, wherein, The hollow body (12) has a lid (52) having an inner surface (54) and an outer surface (56) for closing an opening (36), characterized in that... A cleaning opening (46) is provided in the supporting wall (20) or another wall section (44), which can be at least partially closed by a closure (48), wherein the closure (48) has a receiving unit (50) for receiving a cover (52) for receiving the hollow body (12). The cleaning device (40) has an additional first cleaning head (58) that allows a first cleaning fluid to be applied to the inner surface (54) of the cover when the cleaning opening (46) is closed by the closure body (48) or the cover (52).

12. The device (10) according to claim 11, characterized in that, The closure (48) is fixed to the support wall (20) or another wall segment (44) in a manner that allows it to move between an open position and a closed position. In the open position, the closure (48) opens the cleaning opening (46), and in the closed position, the closure (48) or the cover (52) closes the cleaning opening (46).

13. The device (10) according to claim 11 or 12, characterized in that, The device (10) has a second channel (57) through which flushing fluid can be guided to the cover (52).

14. The device (10) according to any one of the preceding claims, wherein, The bottom wall (32) and side walls (34) form a hollow outer surface (35), characterized in that, The cleaning device (40) has a second cleaning head (64) which allows for the output of a second cleaning fluid for cleaning the outer surface (35) of the hollow body. The device (10) has a second outlet channel (76) through which a second cleaning fluid output from the second cleaning head (64) can be exported.

15. The device (10) according to claim 14, characterized in that, The device (10) has a housing (14) that, together with a support wall (20), surrounds a processing chamber (22), wherein the processing chamber (22) can be accessed through a housing opening (16) that can be closed by a cover (18).

16. The device (10) according to claim 15, characterized in that, The support wall (20) has a plurality of through holes (28), wherein the plurality of through holes (28) are arranged radially outside the locking device (26), and the second outlet channel (76) is fluidly connected to the processing chamber (22) via the plurality of through holes.

17. The device (10) according to any one of claims 14 to 16, characterized in that, The second cleaning head (64) is designed in a U-shape and can rotate and / or translate within the treatment chamber (22).

18. The device (10) according to claim 1, claim 11, or claim 14, characterized in that, The first cleaning head (42), another first cleaning head (58) and / or the second cleaning head (64) have at least one drying nozzle (86, 88, 90) and / or an infrared diode (92).

19. A method for cleaning a can-shaped hollow body (12) – particularly a transport container (30) for semiconductor wafers or EUV lithography masks – using the apparatus according to any one of the preceding claims, the method comprising the steps of: - Place the edge surface (38) of the hollow body (12) onto the supporting wall (20), -The hollow body (12) is sealed and releasably connected to the support wall (20) by means of a locking device (26), wherein the hollow body (12) is sealed relative to the support wall (20) at its edge surface. ○ A first cleaning fluid for cleaning the inner surface (33) of the hollow body is output by means of a first cleaning head (42) of the cleaning device (40), wherein the first cleaning head (42) has a plurality of first cleaning nozzles (78) through which the first cleaning fluid is output at a spray angle (α), wherein the first cleaning head (42) has an adjustment device (85) by means of which the spray angle (α) can be adjusted, and the first cleaning fluid is discharged through a first outlet channel (70), and / or ○ A second cleaning fluid for cleaning the outer surface (35) of the hollow body is output by means of the second cleaning head (64) of the cleaning device (40), and the second cleaning fluid is discharged by means of the second discharge channel (76).

20. The method of claim 19, wherein the method comprises the following steps: - Move the closed body (48) to the open position. - Place the outer surface (56) of the cover (52) onto the receiving unit (50) of the closure (48), and releasably fix the cover (52) onto the closure (48). - To move the closed body (48) to the closed position, - A first cleaning fluid is output using a separate first cleaning head (58) to clean the inner surface (54) of the cover.

21. The method according to claim 19 or 20, the method comprising the following steps: -The space defined by the inner surface (33) of the hollow body is completely submerged using a first cleaning fluid. - The acoustic wave is coupled into the first cleaning fluid by means of the coupling unit (87).

22. The method according to claim 19 or 21, the method comprising the following steps: - The sound wave is coupled into the first cleaning fluid output from the first cleaning nozzle (78) by means of the coupling unit (87), wherein the coupling unit (87) is integrated into or works together with the first cleaning nozzle.

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