Automatic analysis device, jig for position adjustment, and method for position adjustment

Abstract

The present application provides an automatic analysis device capable of positioning in a short time. To solve the problem, the automatic analysis device is provided with: a rotating mechanism that rotates a nozzle (203) in a horizontal plane in a circumferential direction, the nozzle performing at least one of pipetting of a fluid in a container housed in a housing portion on a trajectory during rotation and discharging of the fluid to the container; a height positioning mechanism that performs positioning in a height direction of a position adjustment jig (303) housed in the housing portion by driving the nozzle (203); and a circumferential positioning mechanism that, after the height position of the position adjustment jig (303) is determined, performs positioning of the circumferential direction of the housing portion in which the position adjustment jig (303) is housed by contacting the position adjustment jig (303) from the side by the nozzle (203).

Description

Technical Field

[0001] This disclosure relates to an automatic analysis device, a fixture for position adjustment, and a position adjustment method. Background Technology

[0002] Automated analytical devices used for chemical analysis in clinical examinations, such as biochemical analysis devices and immunoassay devices, have a dispensing mechanism that includes nozzles for dispensing samples and reagents. The nozzles are preferably adjusted to stop at the center relative to each stopping position. Here, Patent Document 1 describes a technique for detecting the tilt surface of a fixture by repeatedly moving the dispensing probe downwards (paragraphs 0088-0105). Figure 10 ).

[0003] Existing technical documents

[0004] Patent documents

[0005] Patent Document 1: Japanese Patent Application Publication No. 2007-285957 (Abstract) Summary of the Invention

[0006] The problem that the invention aims to solve

[0007] Patent document 1 has the problem of time-consuming location comparison.

[0008] The problem to be solved by this disclosure is to provide an automatic analysis device, a position adjustment fixture, and a position adjustment method that can perform positioning in a short time.

[0009] Solution for solving the problem

[0010] The automatic analysis apparatus disclosed herein includes: a rotation mechanism that rotates a nozzle circumferentially in a horizontal plane, the nozzle performing at least one of suction of fluid in a container housed in a receiving section arranged on the rotation trajectory, and discharge of fluid into the container; a height positioning mechanism that, driven by the nozzle, positions a position adjustment fixture housed in the receiving section in the height direction; a circumferential positioning mechanism that, after determining the height position of the position adjustment fixture, uses the nozzle to contact the position adjustment fixture from the side to position the receiving section housing the position adjustment fixture circumferentially; and a computational control device that controls the rotation mechanism, the height positioning mechanism, and the circumferential positioning mechanism. Other solutions will be described later in embodiments for implementing the invention.

[0011] Invention Effects

[0012] According to this disclosure, an automatic analysis device, a position adjustment fixture, and a position adjustment method capable of positioning in a short time can be provided. Attached Figure Description

[0013] Figure 1 This is a top view of the automatic analysis device.

[0014] Figure 2 This diagram illustrates the use of a nozzle to dispense samples and reagents.

[0015] Figure 3A This is a diagram illustrating the alignment of the radial nozzle (showing the diagram before alignment).

[0016] Figure 3B This is a 3D diagram of the fixture used for position adjustment.

[0017] Figure 3C This is a diagram illustrating the alignment of the radial nozzles (showing the alignment result).

[0018] Figure 4A This is a top view of a position adjustment fixture according to another embodiment.

[0019] Figure 4B This is a side view of a position adjustment fixture according to another embodiment.

[0020] Figure 5 This diagram shows the situation where the nozzle contacts the upper surface of the position adjustment fixture.

[0021] Figure 6A It is a top view when circumferential alignment is performed from one direction.

[0022] Figure 6B It is a side view when circumferential alignment is performed from one direction.

[0023] Figure 7A This is a top view when circumferential alignment is performed from another direction.

[0024] Figure 7B This is a side view when circumferential alignment is performed from another direction.

[0025] Figure 8 It is a diagram illustrating the relationship between the height position of a nozzle with a shape that has an outer diameter that varies in the height direction and the distance between the nozzle and the center of the position adjustment fixture.

[0026] Figure 9A It is a top view illustrating the alignment when it is correct and incorrect (showing the situation when it is in contact from one direction).

[0027] Figure 9B It is a top view illustrating the alignment when it is correct and incorrect (showing the situation when contacting from another direction).

[0028] Figure 10 This is a flowchart illustrating the automatic adjustment method. Detailed Implementation

[0029] Hereinafter, embodiments (referred to as implementation methods) for carrying out this disclosure will be described with reference to the accompanying drawings. In the following description of one embodiment, other embodiments applicable to that embodiment will also be described as appropriate. This disclosure is not limited to the following single embodiment; different embodiments can be combined with each other, or arbitrarily modified within a range that does not significantly impair the effects of this disclosure. Furthermore, the same reference numerals are used to label the same parts, and repeated descriptions are omitted. Furthermore, parts having the same function are labeled with the same name. The illustrations are merely illustrative; for ease of illustration, sometimes changes are made from the actual structure without significantly impairing the effects of this disclosure, or illustrations of some parts are omitted or modified between the drawings.

[0030] Figure 1 This is a top view of the automated analysis device 100. A sample container 102 is mounted on the conveyor frame 101 of the automated analysis device 100 to hold the sample. The sample container 102 is moved to the nozzle 203 via the conveyor line 117. Figure 2 The nozzle 203 draws the reaction liquid (an example of a fluid) from the reaction vessel 105 (an example of a vessel) or discharges the sample and reagent (an example of a fluid) into the reaction vessel 105, as will be described later in detail.

[0031] Multiple reaction vessels 105 can be arranged in the culture vessel (reaction tray) 104. To move the reaction vessels 105 arranged in the circumferential direction to predetermined positions, the culture vessel 104 can rotate in the horizontal plane. The conveying mechanism 106 can move along the X-axis, Y-axis, and Z-axis. The conveying mechanism 106 includes a holding component 107, a stirring mechanism 108, a waste hole 109, and an end cap 119. Figure 3A The device moves within the range of the installation position 110 and the predetermined part of the incubator 104 to transport the end 119 and the reaction vessel 105.

[0032] The retaining component 107 is provided with a plurality of unused reaction vessels 105 and end caps 119. Figure 3A The conveying mechanism 106 moves upward above the holding member 107, descends to hold the unused reaction vessel 105, rises, moves to a predetermined position above the incubator 104, and then descends again to set the reaction vessel 105. Next, the conveying mechanism 106 moves upward above the holding member 107, descends to hold the unused end 119, rises, moves above the mounting position 110, and then descends again to set the end 119.

[0033] Nozzle 203 ( Figure 2The nozzle 203 is capable of rotating and moving up and down in the horizontal plane. After rotating upwards to the mounting position 110, it descends to press the end 119 into and mount it to the front end of the nozzle 203. The nozzle 203 with the end 119 mounted moves above the sample container 102 placed on the conveyor 101 and descends to aspirate the sample held in the sample container 102. After aspirating the sample, the nozzle 203 moves upwards to the incubator 104 and descends to discharge the sample into the unused reaction vessel 105 held in the incubator 104. When the discharge is complete, the nozzle 203 moves upwards to the waste hole 109 to discard the used end 119 from the waste hole 109.

[0034] A plurality of reagent containers 118 are provided in the reagent tray 111. A cover 112 is provided on the upper part of the reagent tray 111 (partially omitted in the illustrated example to make the interior visible), and the interior of the reagent tray 111 is kept at a predetermined temperature. An opening 113 is provided in a portion of the cover 112. A nozzle 114 is rotatable and movable up and down in the horizontal plane. After rotating above the opening 113, it descends, immersing the tip of the nozzle 114 in the reagent in the predetermined reagent container 118, and aspirating a predetermined amount of reagent. Then, after the nozzle 114 rises, it rotates above a predetermined position of the incubator 104, discharging reagent into the reaction vessel 105.

[0035] The reaction vessel 105, having discharged the sample and reagents, is moved to a predetermined position by the rotation of the incubator 104 and then conveyed to the stirring mechanism 108 via the conveying mechanism 106. The stirring mechanism 108 stirs and mixes the sample and reagents within the reaction vessel 105 by applying rotational motion to it. After stirring, the reaction vessel 105 returns to the predetermined position in the incubator 104 via the conveying mechanism 106.

[0036] Nozzle 115 can rotate and move up and down in the horizontal plane to dispense samples and reagents. After stirring, it moves in the incubator 104 above the reaction vessel 105 after a predetermined reaction time and then descends to aspirate the reaction liquid inside the reaction vessel 105. The reaction liquid aspirated by nozzle 115 is analyzed by detection unit 116. The reaction vessel 105, from which the reaction liquid is aspirated, is moved to a predetermined position by the rotation of incubator 104, and then moved from incubator 104 to above waste hole 109 by conveying mechanism 106, where it is disposed of.

[0037] In the illustrated example, the suction and discharge of the sample, reagent, and reaction solution are performed independently via nozzles 203, 114, and 115. This specification primarily describes the alignment of nozzle 203. In another embodiment, the automatic analysis device 100 is equipped with a nozzle (not shown) for suction and discharge of the fluids by performing cleaning with a cleaning solution. This nozzle is aligned in the same manner as the nozzle 203 described below. In yet another embodiment, the nozzles 114 and 115 are aligned in the same manner as the nozzle 203 described below.

[0038] The automatic analysis device 100 includes a control rotation mechanism 400. Figure 3A ), height positioning mechanism 500 ( Figure 5 ) and 600 circumferential positioning mechanism Figure 5 The arithmetic control device 800 is not shown in the accompanying drawings, but may include, for example, a CPU (Central Processing Unit), RAM (Random Access Memory), or ROM (Read Only Memory). The arithmetic control device 800 is implemented by expanding a predetermined control program stored in ROM into RAM and executing it through the CPU.

[0039] Figure 2 This diagram illustrates the dispensing of samples and reagents using nozzle 203. Nozzle 203 is configured to either draw in or dispense at least one of the reaction liquid (an example of a fluid) into the reaction vessel 105 housed in the receiving portion 120 on the rotational trajectory, i.e., the circumference 204. Nozzle 203 is located below the front end of the arm 202 mounted on the rotational shaft 201.

[0040] The storage section 120 is provided in at least one of the following: culture vessel 104, transport rack 101, reagent tray 111, and cleaning solution holder (not shown) (all examples of holders). The culture vessel 104 is continuously arranged in the circumferential direction with reaction containers 105 (an example of a container) capable of holding samples and reagents, both of which are fluids. The transport rack 101 holds a container holding at least one of the following: samples, reagents, or cleaning solution from the cleaning nozzle 203, all of which are fluids. Thus, the alignment of the sample container 102, reaction container 105, reagent container 118, etc., stored in these storage sections 120 is possible.

[0041] Alternatively, a cleaning solution may be used when at least two of the sample, reagent, or cleaning solution are aspirated and discharged through a single nozzle 203; however, it may not be used if separate nozzles 203 are provided for aspirating and discharging the sample, reagent, or cleaning solution. In the illustrated example, a cleaning solution is not used. The nozzle 203 rotates through the mounting position 110, the sample aspiration position 207 on the transport frame 101, the sample discharge position 209 on the culture vessel 104, and the waste port 109.

[0042] Figure 3A This diagram illustrates the alignment of the radial nozzle 203, showing the position before alignment. The automatic analysis device 100 includes a rotation mechanism 400 that rotates the nozzle 203 circumferentially in a horizontal plane. The rotation mechanism 400 includes a rotation shaft 201, a motor (not shown) that rotates the rotation shaft 201 circumferentially, an arm 202, and a detection mechanism 305. The rotation mechanism 400 is connected to the arithmetic control device 800 via an electrical signal line (not shown). Figure 1 )connect.

[0043] The nozzle 203 has a shape in which the outer diameter varies in the height direction, for example, it has a conical end 119 that tapers downward. By having the end 119, the suction pressure at the tapered tip can be reduced, and the scattering of fluid during discharge can be suppressed.

[0044] In the automatic analysis apparatus 100, the nozzle 203 is aligned radially and circumferentially. From the viewpoint of minimizing contact suppression with the reaction vessel 105 and reducing dead zone volume, the nozzle 203 is more preferably located at the center relative to the suction and discharge positions. However, due to the influence of machining accuracy of the bases (arm 202, etc.) on which each mechanism is grounded, base deflection, stacking tolerances within the mechanism, assembly errors, and the right angle of the nozzle 203, the rotation radius L of the nozzle 203 sometimes deviates from the designed sample discharge position 209. Therefore, by performing radial alignment, the actual rotation radius L1 can be made closer to the designed ideal rotation radius L2. Figure 3C ).

[0045] The automatic analysis device 100 includes an adjustment mechanism 302 that adjusts at least one of the radial position of the nozzle 203 and the angle of the nozzle 203 relative to the rotation axis 201 that rotates the nozzle 203. By including the adjustment mechanism 302, the angle of the nozzle 203 relative to either the radial position or the horizontal direction can be adjusted. Preferably, the adjustment mechanism 302 adjusts both the radial position and the angle. By being able to adjust the angle, it can absorb the deflection of the arm 202, the tilting of the rotation axis 201, and the bending of the nozzle 203. The adjustment mechanism 302 can be, for example, a feed screw, an actuator, etc. Furthermore, the adjustment mechanism 302 can be configured, for example, to make the threaded hole for fastening an elongated hole, allowing the screw to be offset within the elongated hole.

[0046] Figure 3B This is a perspective view of the position adjustment fixture 303. The position adjustment fixture 303 can be housed in the reaction vessel 105. Figure 1 Storage section 120 (an example of a container) Figure 3A The reaction vessel 105 is equipped with a nozzle 203 that is rotatable in the horizontal plane within the automatic analysis device 100. Figure 3A The fluid, such as the reaction liquid, is sucked or discharged. The position adjustment clamp 303 is housed in the receiving section 120. Figure 3A When viewed from above, it protrudes upwards from the storage section 120, and the protruding part has a flange-like structure. The protruding part is a circle with a radius R when viewed from above.

[0047] The position adjustment fixture 303 has a circumference 204 on its upper end face 304 that represents the trajectory of the nozzle 203 as it rotates. Figure 2 The adjustment mark 306 marks part of the arc. According to the position adjustment clamp 303, the user can easily perform radial alignment by adjusting at least one of the radial position and angle of the nozzle 203 by visually positioning the front end of the nozzle 203 above the adjustment mark 306.

[0048] The adjustment mark 306 is the nozzle's rotation radius L ( Figure 3A The reference mark of ) is used by the user to adjust the mechanism 302. Figure 3A Align the nozzle 203 with the adjustment mark 306 and adjust its rotation radius L. The adjustment mark 306 can be any easily visible mark indicating a scribing, groove, adjustment allowable range, a center hole, or a dot. The position adjustment clamp 303 has raised and recessed areas (not shown) on its side walls, bottom surface, etc., to inhibit rotation of the position adjustment clamp 303. As a result, the adjustment mark 306, which serves as the adjustment reference, will not shift.

[0049] The details will be described later. After alignment, a judgment is made as to whether the alignment is proper. Therefore, the position adjustment fixture 303 has a core 311, a surface portion 313, and an insulating layer 312 exposed on the upper end face 304. The surface portion 313 is disposed outside the core 311 and exposed on the upper end face 304, and differs from the core 311 in at least one of volume and dielectric constant. The insulating layer 312 insulates the core 311 from the surface portion 313.

[0050] Rotating mechanism 400 ( Figure 3A ) Equipped with a detection mechanism 305 that detects contact with nozzle 203 by measuring changes in electrostatic capacitance. Figure 3AThe contact between the nozzle 203 and the position adjustment fixture 303 is detected based on changes in electrostatic capacitance. By configuring the position adjustment fixture 303 in this way, contact with the center of the position adjustment fixture 303 can be detected by changes in electrostatic capacitance due to contact with the core 311, and contact of the nozzle 203 from the side due to contact with the surface portion 313 can also be detected by changes in electrostatic capacitance.

[0051] For example, it is possible to determine which of the core 311 and the surface layer 313 is in contact based on whether the electrostatic capacitance detected by the detection mechanism 305 exceeds a threshold. This determination can be made, for example, by an arithmetic control device 800 connected to the detection mechanism 305 via an electrical signal line (not shown). Figure 1 )conduct.

[0052] Core 311 is disposed in reaction vessel 105 ( Figure 1 (a container example) central part ( Figure 3A The position can be near the center. The center line 210 of the position adjustment clamp 303 is aligned with the center line 210 of the reaction vessel 105 (not shown, but the intersection of the diagonals in the case of a rectangle), and when accurately aligned as shown in the figure, it is aligned with the sample discharge position 209. Thus, through the contact detection of the core 311, when the reaction vessel 105 ( Figure 2 Stored in storage section 120 ( Figure 3A When nozzle 203 ( Figure 3A It can be positioned in the center of the reaction vessel 105.

[0053] Furthermore, the shape of the position adjustment fixture 303 is not limited to the example shown in the figure, as long as it can be calculated from the contact point 405 ( Figure 6B The shape of the distance from the center line 210 of the position adjustment fixture 303 can be any shape.

[0054] Figure 3C This diagram illustrates the alignment of the radial nozzle 203, and shows the alignment result. The user can visually adjust the position by following the adjustment marks 306 on the position adjustment fixture 303. Figure 3B When adjusting the nozzle 203 above the reaction vessel 105, the specimen discharge position 209 of the nozzle 203 is aligned with the center line 210 of the position adjustment clamp 303, which is located at the same position as the center of the reaction vessel 105.

[0055] Figure 4A This is a top view of the position adjustment fixture 3031 according to another embodiment. Figure 4B This is a side view of a position adjustment fixture 3031 according to another embodiment. In the position adjustment fixture 3031, as... Figure 4BAs shown, the adjustment mark 306 is a protrusion 3061 formed on the upper end face 304, and the protrusion 3061 is formed as part of the arc of the circumference 204. By providing the protrusion 3061, when the nozzle 203 contacts the upper end face 304 other than the protrusion 3061, it is possible to detect non-contact with the protrusion 3061 based on the difference in height. The radial width of the protrusion 3061 can, for example, be equal to that of the core 311 (…). Figure 3B The size (usually the diameter) of the nozzles is the same. The user simply operates the adjustment mechanism 302 by positioning the nozzle 203 above the protrusion 3061. Figure 3A That's all. Additionally, detection of contact from the side can be performed as described above. Figure 3B As explained, for example, it can be achieved by constructing the side surface with a material that is different from the protrusion 3061 in at least one of volume or dielectric constant.

[0056] Figure 5 This diagram shows the situation where the nozzle 203 contacts the upper end face 304 of the position adjustment fixture 303. Automatic analysis device 100 ( Figure 1 The device includes a height positioning mechanism 500, which positions the nozzle 203 in the storage section 120 in the height direction using a position adjustment clamp 303 driven by the nozzle 203. In the illustrated example, the height positioning mechanism 500 includes a rotating shaft 201, an arm 202, a lowering mechanism (not shown) for lowering the nozzle 203, and a detection mechanism 305. The height positioning mechanism 500 is connected to an arithmetic control device 800 via an electrical signal line (not shown). Figure 1 )connect.

[0057] The determined height position is, for example, the deviation (difference) between the actual height position and the height position of the upper end face 304 of the position adjustment fixture 303 designed for the position. Such a deviation can be determined, for example, based on the designed descent distance of the nozzle 203 and the actual descent distance, and is sometimes referred to hereinafter as the "height adjustment value". The height adjustment value is, for example, determined by the calculation control device 800 (…). Figure 1 The calculation is performed and stored. Additionally, during specimen analysis, the nozzle 203 moves in the height direction based on the amount of height adjustment added or subtracted from the design value.

[0058] The height positioning mechanism 500 determines the height position of the position adjustment fixture 303 by detecting the contact position between the upper end face 304 of the position adjustment fixture 303 and the nozzle 203, as detected by the descent of the nozzle 203. That is, after adjusting the radial alignment of the nozzle 203, the height positioning mechanism 500 lowers the nozzle 203 via a lowering mechanism (not shown), bringing the nozzle 203 into contact with the position adjustment fixture 303. This allows the height position of the position adjustment fixture 303 to be determined. Furthermore, if the nozzle 203 is accurately positioned radially, it will contact the core 311 (… Figure 3B However, in the case of improper positioning, the nozzle 203 may contact the surface portion 313 or not contact the positioning clamp 303. In this case, radial alignment must be performed again.

[0059] Nozzle 203 is configured to draw in and discharge at least one of a sample, a reagent, and a cleaning fluid, which are fluids. Therefore, nozzle 203 is used to detect contact between at least one of the sample, reagent, and cleaning fluid, and between the two fluids in contact with the position adjustment clamp 303. At least the lower end of nozzle 203 is made of resin, specifically, for example, having a resin end 119. Figure 3A ). Operation and control device 800 ( Figure 1 This makes the detection sensitivity of the detection mechanism 305 to the position adjustment fixture 303 higher than that of the above-mentioned fluid.

[0060] When the height of the metal nozzle 203 is adjusted, the change in electrostatic capacitance caused by contact is significant, making it easy to detect contact with the solid position adjustment fixture 303. However, when the contact portion with the position adjustment fixture 303 is made of resin, the detection mechanism 305, adjusted to capture the change in electrostatic capacitance caused by contact with the fluid, has a small contact area, making it difficult to detect contact with the solid position adjustment fixture 303. Therefore, by making the detection sensitivity during contact detection higher than that during fluid contact detection, contact with the position adjustment fixture 303 can be easily detected.

[0061] Figure 6A This is a top view of the circumferential alignment from one direction (counterclockwise in the example shown). Figure 6B This is a side view during circumferential alignment from one direction. Automatic analysis device 100 ( Figure 1 The device includes a circumferential positioning mechanism 600. After determining the height position of the position adjustment clamp 303, the nozzle 203 contacts the position adjustment clamp 303 from the side, thereby circumferentially positioning the storage portion 120 that houses the position adjustment clamp 303. The circumferential positioning mechanism 600 includes a rotation shaft 201. Figure 5 ), Arm 202 ( Figure 5 ), descent mechanism (not shown), and testing mechanism 305 ( Figure 5 The circumferential positioning mechanism 600 is connected to the arithmetic control device 800 via an electrical signal line (not shown). Figure 1 )connect.

[0062] like Figure 6B As shown, with the lower end 211 of the nozzle 203 positioned below the upper end face 304 of the position adjustment fixture 303, as... Figure 6AAs shown, the circumferential positioning mechanism 600 brings the nozzle 203 closer to the position adjustment clamp 303 from the side. This allows the nozzle 203 to contact the position adjustment clamp 303 from the side, and the circumferential position of the position adjustment clamp 303 can be determined based on the contact position.

[0063] like Figure 6A and Figure 6B As shown, when the nozzle 203 is rotated counterclockwise, the amount of movement of the nozzle 203 in the counterclockwise direction is adjusted as follows.

[0064] The circumferential positioning mechanism 600 moves the nozzle 203 to a predetermined position, i.e., a pre-adjustment stop position 402, away from the position adjustment fixture 303. The circumferential positioning mechanism 600 lowers the lower end 211 of the nozzle 203 to a position below the upper end face 304 of the position adjustment fixture 303. Then, the circumferential positioning mechanism 600 rotates the arm 202 about the rotation axis 201 and slowly approaches the position adjustment fixture 303, at which point the detection mechanism 305 (… Figure 5 When contact is made, the rotation of nozzle 203 stops. At this time, nozzle 203 is in the position where nozzle 230 exists when it contacts position adjustment fixture 303, i.e., contact position 401. The measured value θ2 of the predetermined distance between the stop position 402 and the contact position 401 before adjustment is recorded in the calculation control device 800. Figure 1 ).

[0065] Operational control device 800 ( Figure 1 The adjustment values ​​α and β (described later) are calculated. These adjustment values ​​α and β (described later) are the difference between the design value θ1 of the distance between the contact position 401 and the pre-adjustment stop position 402, and the measured value θ2 related to the predetermined distance when the circumferential positioning mechanism 600 moves the nozzle 203. Therefore, based on the measured value θ2, the actual deviation relative to the design value θ1 can be calculated as the difference, and the degree of deviation in the circumferential direction can be assessed. Here, using the circumferential angle as the predetermined distance, the calculation control device 800 calculates the difference between the design value θ1 and the measured value θ2, i.e., the adjustment value α. Furthermore, when analyzing the sample, the nozzle 203 moves circumferentially based on the addition and subtraction of the adjustment values ​​α and β to the design values ​​θ1 and θ3, respectively.

[0066] The design value of the distance between the centerline 213 of the nozzle 203 (consistent with the specimen discharge position 209) at the pre-adjustment stop position 402 and the centerline 210 of the position adjustment fixture 303 is θccw. The measured value is (θccw ± α) obtained by adding or subtracting the adjustment value α from θccw. The distance between the centerline 212 of the nozzle 203 when the nozzle 203 is in the contact position 401 and the contact point 405 between the position adjustment fixture 303 and the nozzle 203 is θr. The distance between the centerline 210 of the position adjustment fixture 303 and the contact point 405 is θR. θccw = θ1 + θr + θR is satisfied.

[0067] Figure 7A This is a top view when aligned circumferentially from another direction (clockwise in the example shown). Figure 7B This is a side view of circumferential alignment from another direction. The circumferential positioning mechanism 600, besides reversing the direction of approach, also... Figure 6A as well as Figure 6B Similarly, the distance between the stop position 404 and the contact position 403 before adjustment is determined. (Arithmetic control device 800) Figure 1 Calculate the adjustment value β, which is the difference between the design value θ3 of the predetermined distance between the contact position 403 and the stop position 404 before adjustment, and the measured value θ4 related to the predetermined distance when the circumferential positioning mechanism 600 moves the nozzle 203.

[0068] Furthermore, the design value of the distance between the centerline 214 of the pre-adjustment stop position 404 and the centerline 210 of the position adjustment fixture 303 is θcw, and the measured value is the value of θcw plus or minus β (θccw±β). The distance between the centerline 215 of the nozzle 203 and the contact point 405 when the nozzle 203 is in the contact position 403 is θr. The distance between the centerline 210 of the position adjustment fixture 303 and the contact point 405 is θR. This satisfies θcw=θ3+θr+θR.

[0069] Thus, the circumferential positioning mechanism 600 ( Figure 5 The nozzle 203 is brought closer to the position adjustment clamp 303 from one circumferential direction, and the nozzle 203 is brought closer to the position adjustment clamp 303 from another direction. (Arithmetic control device 800) Figure 1 ) Calculate the adjustment values ​​α and β when approaching from various directions. With nozzle 203 configured in the appropriate position, adjust the centerline 213 of the stop position 402 before adjustment. Figure 6AThe distance between the center line 210 of the position adjustment fixture 303 and the center line 214 of the stop position 404 before adjustment is usually consistent with the distance between the center line 214 of the position adjustment fixture 303 and the center line 210 of the position adjustment fixture 303. Therefore, by calculating the adjustment values ​​α and β when approaching from each direction, the accuracy of circumferential positioning can be improved.

[0070] Rotating mechanism 400 ( Figure 3A ), height positioning mechanism 500 ( Figure 5 ) and 600 circumferential positioning mechanism Figure 5 For example, when the nozzle 203 is driven by gears, it may be affected by backlash. Furthermore, when the rotation mechanism 400, height positioning mechanism 500, and circumferential positioning mechanism 600 detect a stop using, for example, a detector and a detection plate (neither shown), the timing of the detector's detection of the detection plate may differ depending on assembly errors during rotation in one direction versus rotation in another, potentially causing the stop position of the nozzle 203 to deviate. Therefore, in the automatic analysis device 100, circumferential positioning is achieved by bringing the nozzle 203 closer together in both directions. This suppresses deviations in the stop position in both directions. However, if the nozzle 203 can only stop at one of the contact positions 401 or 403, adjustment can be made only on the corresponding side.

[0071] Design values ​​θ1, θ3 Figure 6A as well as Figure 7A The calculation of ) can be, for example, based on the rotation radius L of nozzle 203. Figure 3A ), the distance from the contact point 405 to the center line 210 of the position adjustment fixture 303, and the rotation mechanism 400 ( Figure 3A ), height positioning mechanism 500 ( Figure 5 ) and 600 circumferential positioning mechanism Figure 5 The resolution is determined by factors such as rotation. Figure 6B As shown, the design values ​​θ1 and θ3 can be derived from the design values ​​θ1 = θccw - (θr + θR) and θ3 respectively. Figure 7B The design value shown is θ3 = θcw - (θr + θR).

[0072] When the nozzle 203 is cylindrical, that is, when it has the same shape in the height direction, the radius of the nozzle 203 is the same regardless of the height direction. Therefore, the distance θr from the contact point 405 to the center lines 212 and 216 of the nozzle 203 can be calculated regardless of the amount of descent of the nozzle 203. In addition, the distance θR from the contact point 405 to the center line 210 of the position adjustment fixture 303 can also be calculated based on the radius of the position adjustment fixture 303.

[0073] Figure 8 This diagram illustrates the height position of a nozzle 203 with a shape that varies in outer diameter in the height direction, and the distance between the nozzle 203 and the centerline 210 of the position adjustment clamp 303. When the nozzle 203 has, for example, an end 119, the outer diameter of the nozzle 203 varies in the height direction, specifically having a shape that narrows downwards. Therefore, the height position of the contact point 405 in the nozzle 203 changes according to the amount of descent of the nozzle 203, and the distance between the centerline 212 and the contact point 405 changes.

[0074] For example, at the upper contact position 4011 where the nozzle 203 is positioned above, the distance between the upper end face 304 of the position adjustment fixture 303 and the lower end 211 of the nozzle 203 is z1. At this time, the distance between the center line 2121 and the contact point 405 is θr1. On the other hand, at the lower contact position 4012 where the nozzle 203 is positioned below, the distance between the upper end face 304 of the position adjustment fixture 303 and the lower end 211 of the nozzle 203 is z2. At this time, the distance between the center line 2122 and the contact point 405 is θr2. Therefore, the distance θr varies depending on the height position of the nozzle 203, and it is not possible to uniquely calculate the design values ​​θ1 and θ3. Figure 6A as well as Figure 7A The adjustment values ​​α and β.

[0075] Therefore, in the automatic analysis device 100, the height positioning mechanism 500 is used for height positioning, and then the circumferential positioning mechanism 600 is used for circumferential positioning. Specifically, the calculation control device 800 ( Figure 1 Based on the contact position of nozzle 203 in the height direction of position adjustment fixture 303, i.e., the height position of contact point 405, the circumferential positioning of position adjustment fixture 303 is performed. Therefore, the stopping positions 402 and 404 before adjustment can be determined. Figure 6B as well as Figure 7B The positional relationship between the front end of the descending nozzle 203 and the height position of the contact point 405 of the position adjustment fixture 303 is determined. Furthermore, the distance θr between the center lines 212, 216 and the contact point 405 can be determined based on the height position of the contact point 405, and adjustment values ​​α and β can be calculated. The determined distance θr is stored in the calculation control device 800. Figure 1 In the storage section (not shown).

[0076] Figure 9A It is a top view illustrating the alignment when correct and incorrect, and a diagram showing the situation when contact occurs from one direction. Figure 9B This is a top view illustrating correct and incorrect alignment, and a diagram showing the situation when contact occurs from another direction. In Figure 9A as well as Figure 9BIn each of them, as an example, the outer circumferences 421 and 431 represent the trajectory of the nozzle 203 when it is correctly aligned, and the inner circumferences 422 and 432 represent the trajectory of the nozzle 203 when it is incorrectly aligned.

[0077] After proper alignment, adjust the stop position to 406. Figure 9A ) and the adjusted stop position 407 ( Figure 9B The positions are roughly the same. The adjusted stop position 406 is the position where the nozzle 203 moves a distance θr + θR from the contact position 401 in one direction, satisfying θr + θR = (θccw ± α) - θ1. The adjusted stop position 407 is the position where the nozzle 203 moves a distance θr + θR from the contact position 403 in the other direction, satisfying θr + θR = (θcw ± β) - θ3. However, based on the adjustment mechanism 302 ( Figure 3A In the case of an incorrect radial position adjustment of nozzle 203, where adjustment values ​​α and β are assigned based on incorrect reference positions 441 and 443, the adjusted stop positions 426 and 427 are approaching from one direction. Figure 9A ) and the case of approaching from another direction ( Figure 9B ) become different positions.

[0078] Therefore, the operation control device 800 ( Figure 1 Based on the adjusted stopping positions 406 and 407 (an example of a position) of the nozzle 203 after moving it by adding or subtracting adjustment values ​​α and β from the design values ​​θ1 and θ3 in one direction and another, respectively, the appropriateness of the radial position of the nozzle 203 can be determined. Thus, the appropriateness of the radial positioning performed by the user can be determined using the adjustment values ​​α and β obtained by actually driving the nozzle 203. This appropriateness determination can be made by actually moving the nozzle 203 or by calculation. For example, if the nozzle 203 is driven by a pulse motor (not shown) configured to move a predetermined amount per pulse, and the actual movement of the nozzle 203 is determined, the extent of movement can be determined by measuring the total number of pulses from the start of alignment. Alternatively, an encoder (not shown) can also be used to determine the position.

[0079] The arithmetic control device 800 determines the adjusted stop positions 406 and 407 based on the distance θr stored in its storage unit (not shown). Then, if the adjusted stop positions 406 and 407 differ in response to the respective adjustment values ​​α and β (e.g., the positions of adjusted stop positions 426 and 427), the arithmetic control device 800 issues a warning to the user via its alarm unit (not shown). This prompts the user to perform radial alignment again. Furthermore, the adjusted stop positions 406 and 407 do not need to be strictly identical; for example, a slight deviation that does not affect radial alignment is permissible.

[0080] In another embodiment, the arithmetic control device 800 ( Figure 1 The appropriateness of the radial position of the nozzle 203 is determined by judging whether the adjustment values ​​α and β are included within a predetermined range. Since the judgment is based on whether the adjustment values ​​α and β are included within the predetermined range, the judgment time can be shortened. The predetermined range can be arbitrarily set, for example, to a range in which no sample or the like adheres to the inner wall when discharging into the reaction vessel 105, or to a range in which stirring can be promoted inside when discharging into the reaction vessel 105.

[0081] Figure 10 This is a flowchart illustrating an automatic adjustment method. The automatic adjustment method is, for example, used in an automatic analysis device 100 (…). Figure 1 The control of each mechanism is carried out through the computational control device 800. Figure 1 The automatic adjustment method is initiated by pressing the button (not shown) to perform automatic adjustment. The button can be a physical button or a button displayed on the user interface (UI) such as the display panel.

[0082] By pressing a button, the operation control device 800 prompts the user to position the clamp 303 in the storage section 120. Figure 3B The user sets the position adjustment clamp 303 (step S1). The user can, for example, set it in the storage section 120 of the area displayed on the display section (not shown) of the automatic analysis device 100. Alternatively, the position adjustment clamp 303 can be automatically set by any setting mechanism (not shown) constituting the automatic analysis device 100. After setting, the user operates the adjustment mechanism ( Figure 3A )302, along the adjustment marked 306 ( Figure 3B Radial alignment of nozzle 203 is performed.

[0083] Next, by pressing the button again, the operation control device 800 moves the end 119 (into the mounting position 110) Figure 3AThe nozzle 203 is mounted on the nozzle 203, and the sensitivity of the detection mechanism 305 is switched for height adjustment (step S2). Furthermore, if the end cap 119 is not mounted, or if the lower part of the nozzle 203 is, for example, metal, step S2 can be omitted. The arithmetic control device 800 moves the nozzle 203 to a height adjustment position above the position adjustment clamp 303 (step S3) and lowers it (step S4). The movement and lowering are controlled by the height positioning mechanism 500. Figure 5 )conduct.

[0084] When the testing agency 305 ( Figure 3A When contact between the nozzle 203 and the position adjustment clamp 303 is detected ("Yes" in step S5), the calculation control device 800 calculates and stores the height adjustment value (step S6). On the other hand, if no contact is detected ("No" in step S6), the calculation control device 800 warns the user via an alarm unit (not shown) that the position adjustment clamp 303 is not correctly set (step S7). These steps S3-S7 are height positioning steps, and the nozzle 203 is driven to be stored in the storage unit 120 (…). Figure 2 Positioning of the fixture 303 in the height direction is used for position adjustment.

[0085] After contact detection, the operation and control device 800 controls the circumferential positioning mechanism 600. Figure 5 ), causing nozzle 203 to be adjusted to the stop position 402 in one direction. Figure 6A The nozzle 203 is moved (step S8) and lowered by a predetermined amount (step S9). This predetermined amount is the distance at which the nozzle 203 will not contact the position adjustment clamp 303 if it is lowered from a position far from the position adjustment clamp 303, but will contact the position adjustment clamp 303 if it is lowered from a position close to the position adjustment clamp 303. If the nozzle 203 can be lowered by the predetermined amount ("Yes" in step S9), the arithmetic control device 800 controls the circumferential positioning mechanism 600 to move the nozzle 203 toward the position adjustment clamp 303 (step S10). On the other hand, if the nozzle 203 cannot be lowered by the predetermined amount if it contacts the position adjustment clamp 303 during the predetermined amount descent ("No" in step S9), the arithmetic control device 800 issues a warning to the user through an alarm unit (not shown) (step S11).

[0086] During the movement of the position adjustment fixture 303 from one direction, when the detection mechanism 305 ( Figure 3A When contact is detected ("Yes" in step S12), the operation control device 800 stores the amount of movement of the nozzle 203 up to the detection (step S14). Furthermore, the amount of movement is related to the design value θ1 (…). Figure 6A The corresponding measured value θ2( Figure 6AThe value is consistent with the adjustment value α assigned to the design value θ1. On the other hand, if contact cannot be detected even if the predetermined amount is moved (No in step S12), the operation control device 800 issues a warning to the user through the alarm unit (not shown) (step S13).

[0087] After contact detection based on movement in one direction, the nozzle 203 is similarly moved in the other direction, thereby detecting contact. That is, the operational control unit 800 controls the circumferential positioning mechanism 600 to move the nozzle 203 to another pre-adjustment stop position 404. Figure 7A (Step S15) The nozzle 203 is lowered by a predetermined amount (Step S16). This predetermined amount is synonymous with step S9. If the nozzle 203 can be lowered by the predetermined amount ("Yes" in step S16), the arithmetic control device 800 controls the circumferential positioning mechanism 600 to move the nozzle 203 toward the position adjustment clamp 303 (Step S17). On the other hand, if the nozzle 203 cannot be lowered by the predetermined amount due to contact with the position adjustment clamp 303 during the predetermined amount descent ("No" in step S16), the arithmetic control device 800 issues a warning to the user via an alarm unit (not shown) (Step S18).

[0088] During the movement of the position adjustment fixture 303 from another direction, when the detection mechanism 305 ( Figure 3A When contact is detected ("Yes" in step S19), the operation control device 800 stores the amount of movement of the nozzle 203 up to the detection (step S20). Furthermore, the amount of movement is related to the design value θ3 ( Figure 6B The corresponding measured value θ4 () Figure 6B The value is consistent with the adjustment value β assigned to the design value θ3. On the other hand, if contact cannot be detected even if the predetermined amount is moved (No in step S19), the operation control device 800 issues a warning to the user through the alarm unit (not shown) (step S21).

[0089] The arithmetic control device 800 calculates adjustment values ​​α and β based on design values ​​θ1 and θ3 and measured values ​​θ2 and θ4 (step S22). Based on the adjustment values ​​α and β, the arithmetic control device 800 determines whether the alignment is appropriate (step S23). For example, it determines whether the adjustment values ​​α and β are outside a predetermined range, or whether the adjusted stop positions 406 and 407 are within the predetermined range. Figure 9A as well as Figure 9B The adjustment is performed by determining the relative position of the clamps. If appropriate ("Yes"), the adjustment ends and the operation control device 800 prompts the user to remove the position adjustment clamp 303. If inappropriate ("No"), the operation control device 800 issues a warning to the user via an alarm unit (not shown) (step S24).

[0090] These steps S8-S24 are circumferential positioning steps. After determining the height position of the position adjustment fixture 303, the circumferential positioning of the storage part 120 that houses the position adjustment fixture 303 is performed by contacting the position adjustment fixture 303 from the side through the nozzle 203.

[0091] Based on the above-described automatic analysis device 100 and position adjustment method, positioning can be achieved in a short time.

[0092] Symbol Explanation

[0093] 100—Automatic analyzer; 101—Transfer rack; 102—Specimen container; 104—Culturer; 105—Reaction vessel; 106—Transfer mechanism; 107—Holding component; 108—Stirring mechanism; 109—Waste port; 110—Installation position; 111—Reagent tray; 112—Lid; 113—Opening; 114, 115—Nozzle; 116—Detection unit; 117—Transfer line; 118—Reagent container; 119—End; 120—Receiving section; 201—Rotating shaft (rotation mechanism, height positioning mechanism, circumferential positioning mechanism); 202—Arm (rotation mechanism, height positioning mechanism, circumferential positioning mechanism); 203—Nozzle; 204—Circumference; 207—Specimen suction position; 209—Specimen discharge position; 210, 212, 2121, 2122, 213, 214, 215 216—Centerline; 211—Lower end; 230—Nozzle; 302—Adjustment mechanism; 3021—Protrusion; 303, 3031—Position adjustment fixture; 304—Upper end face; 305—Detection mechanism (rotation mechanism, height positioning mechanism, circumferential positioning mechanism); 3061—Protrusion; 306—Adjustment mark; 311—Core; 312—Insulation layer; 313—Surface layer; 400—Rotation mechanism; 401, 4011, 4012, 403—Contact position; 402, 404—Stop position before adjustment; 405—Contact point; 406, 408, 418—Stop position after adjustment; 421, 422, 431—Circumference; 441, 443—Reference position; 500—Height positioning mechanism; 600—Circumferential positioning mechanism; 800—Calculation control device; L, L1, L2—Rotation radius.

Claims

1. An automatic analysis device, characterized in that, have: A rotating mechanism that causes a nozzle to rotate circumferentially in a horizontal plane, the nozzle performing at least one of suction of fluid in a container held in a receiving part arranged on a trajectory during rotation and discharge of fluid into the container. A height positioning mechanism that uses the drive of the nozzle to position the clamp for adjusting the position of the storage part in the height direction; A circumferential positioning mechanism, after determining the height position of the position adjustment fixture, uses the nozzle to contact the position adjustment fixture from the side to perform circumferential positioning of the housing part that houses the position adjustment fixture. as well as A computational control device that controls the rotation mechanism, the height positioning mechanism, and the circumferential positioning mechanism. The height positioning mechanism detects the contact position between the upper end face of the position adjustment fixture and the nozzle as the nozzle descends, thereby determining the height position of the position adjustment fixture. With the lower end of the nozzle positioned below the upper end face of the position adjustment fixture, the circumferential positioning mechanism causes the nozzle to approach the position adjustment fixture from the side. The calculation and control device calculates an adjustment value, which is the difference between a design value and a measured value. The design value is a predetermined distance between a predetermined position away from the position adjustment fixture and the position of the nozzle when it contacts the position adjustment fixture. The measured value is a measured value related to the predetermined distance that the nozzle moves using the circumferential positioning mechanism. The circumferential positioning mechanism brings the nozzle closer to the position adjustment fixture from one direction in the circumferential direction, and also brings the nozzle closer to the position adjustment fixture from another direction. The computational control device calculates each adjustment value when approaching from various directions. The computational control device determines the appropriateness of the radial position of the nozzle based on the position of the nozzle obtained by moving the nozzle from one direction and the other direction by adding or subtracting the adjustment value from the design value.

2. The automatic analysis device according to claim 1, characterized in that, The nozzle has a shape in which the outer diameter varies in the height direction. The calculation control device performs circumferential positioning of the storage part based on the contact position of the nozzle with the position adjustment clamp in the height direction.

3. The automatic analysis device according to claim 2, characterized in that, The nozzle has an end that narrows downwards.

4. The automatic analysis device according to claim 1, characterized in that, It includes an adjustment mechanism that adjusts at least one of the radial position of the nozzle and the angle of the nozzle relative to a rotation axis that rotates the nozzle.

5. The automatic analysis device according to claim 1, characterized in that, The receiving portion is provided in at least one of the incubator and the support. The incubator has reaction vessels arranged continuously in the circumferential direction, which can hold samples and reagents used as the fluid. The support holds the container, which contains at least one of the following: a sample, a reagent, and a cleaning fluid for the nozzle, all of which are considered as the fluid.

6. The automatic analysis device according to claim 1, characterized in that, The rotating mechanism includes a detection mechanism that detects contact with the nozzle by measuring changes in electrostatic capacitance. The nozzle is configured to suction, transfer, and discharge at least one of the sample, reagent, and nozzle cleaning fluid, which are the fluids, and at least the lower end is made of resin. The operation control device makes the detection mechanism more sensitive to the position adjustment fixture than to the fluid suction displacement.

7. An automatic analysis device, characterized in that, have: A rotating mechanism that causes a nozzle to rotate circumferentially in a horizontal plane, the nozzle performing at least one of suction of fluid in a container held in a receiving part arranged on a trajectory during rotation and discharge of fluid into the container. A height positioning mechanism that uses the drive of the nozzle to position the clamp for adjusting the position of the storage part in the height direction; A circumferential positioning mechanism, after determining the height position of the position adjustment fixture, uses the nozzle to contact the position adjustment fixture from the side to perform circumferential positioning of the housing part that houses the position adjustment fixture. as well as A computational control device that controls the rotation mechanism, the height positioning mechanism, and the circumferential positioning mechanism. The height positioning mechanism detects the contact position between the upper end face of the position adjustment fixture and the nozzle as the nozzle descends, thereby determining the height position of the position adjustment fixture. With the lower end of the nozzle positioned below the upper end face of the position adjustment fixture, the circumferential positioning mechanism causes the nozzle to approach the position adjustment fixture from the side. The calculation and control device calculates an adjustment value, which is the difference between a design value and a measured value. The design value is a predetermined distance between a predetermined position away from the position adjustment fixture and the position of the nozzle when it contacts the position adjustment fixture. The measured value is a measured value related to the predetermined distance that the nozzle moves using the circumferential positioning mechanism. The circumferential positioning mechanism brings the nozzle closer to the position adjustment fixture from one direction in the circumferential direction, and also brings the nozzle closer to the position adjustment fixture from another direction. The computational control device calculates each adjustment value when approaching from various directions. The calculation control device determines the appropriateness of the radial position of the nozzle by judging whether the adjustment value is included within a predetermined range.

8. A position adjustment method, characterized in that, include: The height positioning step utilizes the drive of a nozzle to position the fixture in the storage section in the height direction. The nozzle performs at least one of suction of fluid in the container stored in the storage section and discharge of fluid into the container, which is arranged on the rotational trajectory in the automatic analysis device, and is capable of rotating in the horizontal plane. as well as In the circumferential positioning step, after determining the height position of the position adjustment fixture, the nozzle contacts the position adjustment fixture from the side to perform circumferential positioning of the housing part containing the position adjustment fixture. In the height positioning step, the contact position between the upper end face of the position adjustment fixture and the nozzle, as detected by the descent of the nozzle, is determined to establish the height position of the position adjustment fixture. In the circumferential positioning step, with the lower end of the nozzle positioned below the upper end face of the position adjustment fixture, the nozzle is brought closer to the position adjustment fixture from the side. An adjustment value is calculated using a computational control device. This adjustment value is the difference between a design value and a measured value. The design value is a predetermined distance between a predetermined position away from the position adjustment fixture and the position of the nozzle when it contacts the position adjustment fixture. The measured value is a measured value related to the predetermined distance the nozzle moves during the circumferential positioning step. In the circumferential positioning step, the nozzle is brought close to the position adjustment fixture from one direction in the circumferential direction, and also from another direction. The computational control device calculates each adjustment value when approaching from various directions. The computational control device determines the appropriateness of the radial position of the nozzle based on the position of the nozzle obtained by moving the nozzle from one direction and the other direction by adding or subtracting the adjustment value from the design value.

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