一种用微波等离子体化学气相沉积制备的碳化钛及其制备方法

By using microwave plasma chemical vapor deposition (IPC) with double-conducting copper foil and titanium foil as raw materials, and combined with the controlled introduction of methane and hydrogen, the preparation problem of titanium carbide has been solved, achieving efficient, rapid, and large-area titanium carbide preparation. This simplifies traditional methods and is suitable for preparation of titanium carbide of different sizes and thicknesses.

CN116623160BActive Publication Date: 2026-07-17KUNMING UNIV OF SCI & TECH

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
KUNMING UNIV OF SCI & TECH
Filing Date
2023-05-08
Publication Date
2026-07-17

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Abstract

本发明公开了一种用微波等离子体化学气相沉积制备的碳化钛及其制备方法,属于功能二维材料表面工程技术领域。所述碳化钛以双导铜箔和钛箔为衬底。具体方法为:先将沉积基底进行表面预处理,然后将其置于基片台的中心的凹槽处,再将钼钛放于接有冷水管的载物台上,关闭反应腔,进行抽真空后向反应腔中分别通入甲烷和氢气;继续通入氢气至所述反应腔,利用微波产生等离子体,之后再次通入氢气,并同步调节微波输入功率,依据所述沉积基底温度通入甲烷进行钛箔表面形核;调节装置的各项工艺参数进行碳化钛的制备。本发明的制备方法简单、速度快,能够制备大面积碳化钛,适合于制备不同尺寸及厚度的碳化钛。
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