Magnetic field measurement method, magnetic field measurement system, and magnetic field measurement device

Abstract

A magnetic field measurement method includes: applying a magnetic field to first particles and second particles; generating, by the first particles, first output light in accordance with the magnetic field and a first coupling strength between the first particles and the second particles; and calculating a strength of the magnetic field in accordance with an intensity of the first output light. In this way, the magnetic field can be finely measured. Furthermore, a magnetic field measurement system and a magnetic field measurement device are also disclosed.

Description

Technical Field

[0001] The present invention relates to a magnetic field measurement technique, and more particularly to a magnetic field measurement method, a magnetic field measurement system, and a magnetic field measurement device. Background Technology

[0002] When observing tiny cells or devices, it is necessary to measure weak magnetic fields. However, measuring devices for weak magnetic fields have many drawbacks. For example, they need to operate in extremely low-temperature environments or cannot adjust spatial resolution. Therefore, overcoming these drawbacks is an important issue in this field. Summary of the Invention

[0003] This invention includes a magnetic field measurement method. The magnetic field measurement method includes: applying a magnetic field to a first particle and a second particle; generating a first output light through the first particle based on the magnetic field and a first coupling strength between the first particle and the second particle; and calculating the strength of the magnetic field based on the strength of the first output light.

[0004] In some embodiments, generating a first output light includes: adjusting the distance between a first particle and a second particle to adjust a first coupling strength; and adjusting the intensity of the first output light by adjusting the first coupling strength.

[0005] In some embodiments, the magnetic field measurement method further includes: fixing a first particle with a first laser; and fixing a second particle with a second laser; wherein adjusting the distance between the first particle and the second particle includes: adjusting at least one of the positions of the first laser and the second laser.

[0006] In some embodiments, calculating the strength of the magnetic field includes: generating a readout signal based on the intensity of the first output light; and calculating the strength of the magnetic field based on at least one coupling strength value of a first coupling strength corresponding to at least one local peak of the readout signal.

[0007] This invention includes a magnetic field measurement system. The system comprises a first particle, a second particle, and a sensing device. The first particle generates a first output light based on a first coupling strength and a magnetic field. The second particle couples with the first particle at the first coupling strength. The sensing device generates a readout signal corresponding to the intensity of the magnetic field based on the intensity of the first output light.

[0008] In some embodiments, the magnetic field measurement system further includes: a first moving device for adjusting the distance between the first particle and the second particle to adjust the first coupling strength, wherein the distance is perpendicular to the direction of the magnetic field.

[0009] In some embodiments, the magnetic field measurement system further includes a processing device for calculating the strength of the magnetic field based on at least one coupling strength value of a first coupling strength corresponding to at least one local peak of the readout signal after the first moving device adjusts the distance.

[0010] This invention includes a magnetic field measuring device. The magnetic field measuring device includes a first sensing module, a second sensing module, a first laser generating device, a second laser generating device, and a moving device. The first sensing module is used to sense the intensity of the magnetic field around the first sensing module. The second sensing module is used to sense the intensity of the magnetic field around the second sensing module. The first laser generating device is used to position the first sensing module. The second laser generating device is used to position the second sensing module. The moving device is used to move at least one of the first and second laser generating devices to adjust the distance between the first and second sensing modules.

[0011] In some embodiments, the first sensing module includes a processing device for calculating the strength of a magnetic field around the first sensing module based on the coupling strength between the first particle and the second particle, wherein the first laser generating device is further configured to generate a laser and fix the first particle by means of the laser.

[0012] In some embodiments, the magnetic field measuring device further includes: a third sensing module, comprising a third particle and a fourth particle, wherein the third sensing module is used to calculate the intensity of the magnetic field around the third sensing module based on the coupling strength between the third particle and the fourth particle, wherein the first laser generating device is further used to fix the third particle by laser. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of a magnetic field measurement system according to an embodiment of the present invention.

[0014] Figure 2 This is a diagram illustrating the relationship between the signal strength, coupling strength, and applied field of the readout signal according to an embodiment of this case.

[0015] Figure 3A This is a schematic diagram of a magnetic field measurement system according to an embodiment of the present invention.

[0016] Figure 3B This is a schematic diagram of a magnetic field measurement system according to an embodiment of the present invention.

[0017] Figure 4 This is a schematic diagram of a magnetic field measuring device according to an embodiment of the present invention. Detailed Implementation

[0018] In this document, when an element is referred to as a “connection” or “coupled,” it may mean an “electrical connection” or “electrical coupling.” “Connection” or “coupled” can also be used to indicate the operation or interaction between two or more elements. Furthermore, although terms such as “first,” “second,” etc., are used to describe different elements, these terms are only used to distinguish elements or operations described using the same technical terminology. Unless the context clearly indicates otherwise, these terms do not specifically refer to or imply order or sequence, nor are they intended to limit the scope of this document.

[0019] Unless otherwise defined, all terms used herein (including technical and scientific terms) have the same meaning as commonly understood by one of ordinary skill in the art to which this case pertains. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with their meaning in the relevant technical context and this case, and will not be interpreted as having an idealized or overly formal meaning unless expressly defined as such herein.

[0020] The terminology used herein is for the purpose of describing particular embodiments only and is not restrictive. As used herein, unless the content clearly indicates otherwise, the singular forms “a,” “an,” and “the” are intended to include the plural forms, including “at least one.” “Or” means “and / or.” As used herein, the term “and / or” includes any and all combinations of one or more of the associated listed items. It should also be understood that, when used in this specification, the terms “comprising” and / or “including” specify the presence of the stated features, areas, integrals, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, areas, integrals, steps, operations, elements, components, and / or combinations thereof.

[0021] The following describes several embodiments of this invention with reference to the accompanying drawings. For clarity, many practical details will be described in the following description. However, it should be understood that these practical details are not intended to limit the scope of this invention. That is, these practical details are not essential in the embodiments described in the content section of this invention. Furthermore, for the sake of simplicity, some conventional structures and elements will be shown in the drawings in a simple schematic manner.

[0022] Figure 1 This is a schematic diagram of a magnetic field measurement system 100 according to one embodiment of the present invention. In some embodiments, the magnetic field measurement system 100 is used to measure a magnetic field B1 applied to the magnetic field measurement system 100.

[0023] In some embodiments, the magnetic field measurement system 100 may be a quantum measurement system, including particles PT1 and PT2, a light-emitting device 110, a moving device 120 and 130, a laser generating device 140 and 150, a fixing device 160 and 170, a sensing device 180, and a processing device 190.

[0024] like Figure 1 As shown, the light-emitting device 110 emits input light L11 and L12 to particles PT1 and PT2. Particle PT1 generates output light L13 based on the input light L11. Particle PT2 generates output light L14 based on the input light L12. In some embodiments, the wavelengths of the input light L11 and L12 are approximately 473 nanometers, and the wavelengths of the output light L13 and L14 are approximately 550 nanometers. In different embodiments, the input light L11 and L12 and the output light L13 and L14 may have different wavelengths.

[0025] like Figure 1 As shown, the sensing device 180 is used to receive at least one of the output light L13 and L14, and to generate a readout signal BS1 based on at least one of the output light L13 and L14. The processing device 190 performs calculations based on the readout signal BS1 to obtain the strength of the magnetic field B1.

[0026] In some embodiments, particle PT1 comprises a nucleus NC1 and a radical pair RP1, and particle PT2 comprises a nucleus NC2 and a radical pair RP2. Radical pair RP1 comprises radicals RD1 and RD2, and radical pair RP2 comprises radicals RD3 and RD4. In some embodiments, nuclei NC1 and NC2 can be implemented by proteins or synthetic molecules. Radical pairs RP1 and RP2 can be implemented by lone pairs of electrons. Radicals RD1 to RD4 can be implemented by electrons.

[0027] like Figure 1 As shown, the distance between free radicals RD2 and RD3 is shorter than the distance between free radicals RD2 and RD4, and the distance between free radicals RD2 and RD3 is shorter than the distance between free radicals RD1 and RD3. In some embodiments, the coupling strength G1 between free radicals RD2 and RD3 is stronger than each of the coupling strength between free radicals RD2 and RD4 and the coupling strength between free radicals RD1 and RD3.

[0028] In some embodiments, a magnetic field B1 is applied to particles PT1 and PT2. Particle PT1 generates output light L13 based on the input light L11, the magnetic field B1, and the coupling strength G1. Particle PT2 generates output light L14 based on the input light L12, the magnetic field B1, and the coupling strength G1. In some embodiments, the intensity of output light L13 and output light L14 is related to the coupling strength G1.

[0029] In some embodiments, the Hamiltonian function H representing the energy of particles PT1 and PT2 can be expressed as follows (1).

[0030] ...Equation (1).

[0031] In some embodiments, in equation (1) The coefficients representing hyperfine interactions. Corresponding to the spin of the free radical RD1, Corresponding to the spin of particle PT1, Corresponding to the spin of the free radical RD2, The spin of the corresponding particle PT2, The spin component in the Z direction corresponding to the free radical RD1. The component of the spin in the Z direction corresponding to the free radical RD2. The spin component in the Z direction corresponding to the free radical RD4. The component of the spin in the Z direction corresponding to the free radical RD3, and The corresponding external fields are applied to particles PT1 and PT2. In some embodiments, the Z direction is parallel to the direction of magnetic field B1. In some embodiments, the external field... The relationship with the magnetic field B1 can be expressed as follows (2), where It is a constant.

[0032] ...Equation (2).

[0033] In some embodiments, corresponding to the Hamiltonian function H, particles PT1 and PT2 have characteristic states |m> and |n>, respectively, where m and n are positive integers. The energies corresponding to the characteristic states |m> and |n>, that is, the eigenvalues ​​corresponding to the characteristic states |m> and |n>, include the applied field. And information about the coupling strength G1. In other words, the eigenvalues ​​corresponding to the characteristic states |m> and |n> will change with the applied field. It changes with and / or the coupling strength G1.

[0034] In some embodiments, the intensity of output light L13 and the intensity of output light L14 can each be expressed as a function of the following equation (3). In some embodiments, the function is represented. The signal strength corresponding to the readout signal BS1, such as the voltage level or current level of the readout signal BS1. In some embodiments, the signal strength of the readout signal BS1 corresponds to at least one of the intensity of the output light L13 and the intensity of the output light L14.

[0035] …Formula (3).

[0036] In some embodiments, in equation (3) The corresponding density function, where M is a positive integer. The energy difference between the energy levels of the corresponding characteristic states |m> and |n>. It can be represented by the following equation (4), and It can be represented by the following formula (5).

[0037] …Formula (4).

[0038] …Formula (5).

[0039] In some embodiments, in equation (4) The corresponding projection operator. k in equation (5) is a constant.

[0040] As shown in equations (1) to (5) above, the function With additional venues And / or the coupling strength G1 changes. From equations (1) to (5) above, it can be calculated that when the coupling strength G1 has coupling strength values ​​G11~G12 as shown in equations (6) to (7), the function... It has local peak values.

[0041] …Formula (6).

[0042] …Formula (7).

[0043] In some embodiments, the functions in equations (6) to (7) For additional venues The function of the coupling strength values ​​G11 and G12 is known. The applied field can be obtained by the following equation (8). The intensity.

[0044] …Formula (8).

[0045] In some embodiments, the processing device 190 is used to perform operations on equations (1) to (8). In various embodiments, equations (1) to (8) may have various forms.

[0046] like Figure 1 As shown, fixing device 160 is used to fix particle PT2, and fixing device 170 is used to fix particle PT1. Laser generating device 150 is used to generate laser LZ1, and uses laser LZ1 to position fixing device 170 in space. Laser generating device 140 is used to generate laser LZ2, and uses laser LZ2 to position fixing device 160 in space.

[0047] In some embodiments, the fixing device 170 includes a fixing body FB1 and a line segment SG1, and the fixing device 160 includes a fixing body FB2 and a line segment SG2. For example... Figure 1 As shown, fixation body FB1 is used to be fixed in space by laser LZ1, and line segment SG1 is used to connect fixation body FB1 and particle PT1. Fixation body FB2 is used to be fixed in space by laser LZ2, and line segment SG2 is used to connect fixation body FB2 and particle PT2. In some embodiments, fixation bodies FB1 and FB2 are implemented using plastic microspheres, and line segments SG1 and SG2 are made of protein. In different embodiments, fixation bodies FB1 and FB2 and line segments SG1 and SG2 can be implemented using different shapes and materials.

[0048] In some embodiments, the moving device 130 is used to move the position of the laser generating device 150, thereby changing the position of the laser LZ1 to adjust the position of the fixing device 170 and the particle PT1. The moving device 120 is used to move the position of the laser generating device 140, thereby changing the position of the laser LZ2 to adjust the position of the fixing device 160 and the particle PT2. Figure 1 As shown, particles PT1 and PT2 have a distance D1 perpendicular to the Z direction. Moving devices 120 and 130 are used to adjust the distance D1 by adjusting the positions of particles PT1 and PT2.

[0049] In some embodiments, when the distance D1 increases, the coupling strength G1 decreases, and when the distance D1 decreases, the coupling strength G1 increases. In some embodiments, the moving devices 120 and 130 are used to adjust the coupling strength G1 by adjusting the distance D1 to change the signal strength of the readout signal BS1. Details regarding the adjustment of the coupling strength G1 are as follows. Figure 2 The embodiments are further illustrated below.

[0050] Figure 2 The signal strength, coupling strength G1, and applied field of the readout signal BS1 are illustrated according to an embodiment of this invention. Relationship diagram 200. (As shown in Figure 200) Figure 2 As shown, the horizontal axis of relational graph 200 corresponds to the coupling strength G1, and the vertical axis of relational graph 200 corresponds to the signal strength of the readout signal BS1. Relational graph 200 includes curves CV1 to CV7.

[0051] In some embodiments, curves CV1 to CV7 correspond to external fields of different intensities. .exist Figure 2 In the illustrated embodiment, curves CV1 to CV7 correspond to applied fields with intensities of 0.3, 0.25, 0.2, 0.15, 0.1, 0.05, and 0, respectively. .

[0052] Please refer to Figure 1 and Figure 2 When additional fields When magnetic field B1 is applied to particles PT1 and PT2, moving devices 120 and 130 change the distance D1 to obtain one of the corresponding curves CV1~CV7 and obtain the corresponding local peak value. After obtaining the local peak value, the applied field can be calculated based on the local peak value and equation (8). The intensity.

[0053] Additional events as follows The curve CV1 with an intensity of 0.3 is used as an example. When the moving device 130 moves particle PT1 closer to particle PT2 and / or when the moving device 120 moves particle PT2 closer to particle PT1, the distance D1 gradually decreases, causing the coupling strength G1 to gradually increase.

[0054] During the above operation, the coupling strength G1 sequentially has coupling strength values ​​G21, G11, G22, G23, G12, and G24. The sensing device 180 receives at least one of the output lights L13 and L14 to sequentially obtain the signal strength value of the readout signal BS1 corresponding to the coupling strength values ​​G21, G11, G22, G23, G12, and G24.

[0055] like Figure 2 As shown, when coupling strength G1 has a coupling strength value G21, the read signal BS1 has a signal strength value F21. When coupling strength G1 has a coupling strength value G11, the read signal BS1 has a signal strength value F11. When coupling strength G1 has a coupling strength value G22, the read signal BS1 has a signal strength value F22. When coupling strength G1 has a coupling strength value G23, the read signal BS1 has a signal strength value F23. When coupling strength G1 has a coupling strength value G12, the read signal BS1 has a signal strength value F12. When coupling strength G1 has a coupling strength value G24, the read signal BS1 has a signal strength value F24.

[0056] like Figure 2As shown, signal strength value F11 is greater than signal strength values ​​F21 and F22, and signal strength value F12 is greater than signal strength values ​​F23 and F24. Therefore, signal strength values ​​F11 and F12 are local peaks of curve CV1. Figure 1 The processing device 190 shown can calculate the applied field using the coupling strength values ​​G11 and G12 corresponding to the signal strength values ​​F11 and F12 and equation (8). The strength is 0.3.

[0057] As another example, when the moving device 130 moves particle PT1 away from particle PT2 and / or when the moving device 120 moves particle PT2 away from particle PT1, the distance D1 increases, causing the coupling strength G1 to decrease.

[0058] During the above operation, the coupling strength G1 sequentially has coupling strength values ​​G24, G12, G23, G22, G11, and G21. The sensing device 180 receives at least one of the output lights L13 and L14 to sequentially obtain the signal strength values ​​of the readout signal BS1 corresponding to the coupling strength values ​​G24, G12, G23, G22, G11, and G21.

[0059] In various embodiments, sensing devices 180, moving devices 120, and 130 are used to perform similar operations to obtain local peak values ​​of curves CV2~CV7 and calculate the corresponding applied field based on the local peak values. The intensity.

[0060] In some practices, the measuring device for precise measurement of magnetic fields requires an extremely low temperature operating environment, or the spatial resolution of the measuring device is limited by the manufacturing process and cannot be easily changed.

[0061] Compared to the above approach, in this embodiment of the invention, the sensing device 180 generates a readout signal BS1 corresponding to the magnetic field B1 based on the coupling strength G1 between particles PT1 having free radical pairs RP1 and PT2 having free radical pairs RP2. The magnetic field measurement system 100 does not require a cryogenic environment and can perform precise measurements of the magnetic field B1. In some embodiments, the sensitivity of the magnetic field measurement system 100 is approximately 1 nT / Where nT stands for nano-Tesla and Hz stands for Hertz.

[0062] Furthermore, compared to the above approach, in this embodiment of the invention, the mobile devices 120 and 130 can be configured in various ways in space to have various spatial resolutions. In some embodiments, the spatial resolution of the magnetic field measurement system 100 can be less than 10 nanometers.

[0063] Figure 3AThis is a schematic diagram illustrating a magnetic field measurement system 300A according to one embodiment of the present invention. In some embodiments, the magnetic field measurement system 300A includes particles PA1 to PA3. Figure 3A As shown, particles PA1 and PA2 have a coupling strength GA1. Particles PA3 and PA2 have a coupling strength GA2. Particles PA1 and PA3 have a coupling strength GA3. In some embodiments, each of the coupling strengths GA1 to GA3 is affected by a magnetic field applied to particles PA1 to PA3. In some embodiments, the magnetic field measurement system 300A operates based only on a portion of the coupling strengths GA1 to GA3. For example, the magnetic field measurement system 300A may operate based only on coupling strengths GA1 and GA2. In some embodiments, an all-to-all connection is not required between particles PA1 to PA3.

[0064] Please refer to Figure 1 and Figure 3A The magnetic field measurement system 300A is a variation of the magnetic field measurement system 100. In some embodiments, particles PA1 to PA3 have a similar configuration relationship to particles PT1 and PT2. Therefore, some details will not be repeated.

[0065] Specifically, in some embodiments, fixing device 170 is used to fix particle PA1, and fixing device 160 is used to fix particle PA2. Light-emitting device 110 is used to emit input light L11 and L12 to particles PA1 and PA2, respectively. Particles PA1 and PA2 generate output light L13 and L14, respectively, based on coupling strength GA1. Sensing device 180 is used to generate readout signal BS1 corresponding to the magnetic field applied to particles PA1 and PA2 based on the output light L13 and L14.

[0066] In some embodiments, particles PA1 and PA2 are also used to generate output lights L13 and L14 based on coupling strengths GA1 to GA3. The sensing device 180 is used to generate a readout signal BS1 corresponding to the magnetic field applied to particles PA1 to PA3 based on the output lights L13 and L14.

[0067] In some embodiments, the moving device 130 is used to adjust the distance between particles PA1 and PA2 to adjust the coupling strength GA1. In some embodiments, the moving device 130 is also used to adjust the distance between particles PA1 and PA3 to adjust the coupling strength GA3.

[0068] Similarly, in some embodiments, the moving device 140 is used to adjust the distance between particles PA1 and PA2 to adjust the coupling strength GA1. In some embodiments, the moving device 140 is also used to adjust the distance between particles PA2 and PA3 to adjust the coupling strength GA2.

[0069] In some embodiments, the magnetic field measurement system 300A further includes a device (not shown) for controlling the movement of particle PA3. The device for controlling the movement of particle PA3 is used to adjust the distance between particles PA1 and PA3 to adjust the coupling strength GA3. The device for controlling the movement of particle PA3 is also used to adjust the distance between particles PA2 and PA3 to adjust the coupling strength GA2.

[0070] Figure 3B This is a schematic diagram of a magnetic field measurement system 300B according to one embodiment of the present invention. In some embodiments, the magnetic field measurement system 300B includes particles PB1 to PB4.

[0071] like Figure 3B As shown, particles PB1 and PB2 have a coupling strength GB1. Particles PB3 and PB2 have a coupling strength GB2. Particles PB1 and PB3 have a coupling strength GB3. Particles PB1 and PB4 have a coupling strength GB4. Particles PB4 and PB2 have a coupling strength GB5. Particles PB4 and PB3 have a coupling strength GB6. In some embodiments, each of coupling strengths GB1 to GB6 is affected by a magnetic field applied to particles PB1 to PB4. In some embodiments, the magnetic field measurement system 300B operates only based on a portion of the coupling strengths GB1 to GB6. For example, the magnetic field measurement system 300B may operate only based on coupling strengths GB1, GB2, and GB5, but not based on coupling strengths GB3, GB4, and GB6. In some embodiments, an all-to-all connection is not required between particles PB1 to PB4.

[0072] Please refer to Figure 1 and Figure 3B The magnetic field measurement system 300B is a variation of the magnetic field measurement system 100. In some embodiments, particles PB1 to PB4 have a similar configuration relationship to particles PT1 and PT2. Therefore, some details will not be repeated.

[0073] Specifically, in some embodiments, fixing device 170 is used to fix particle PB1, and fixing device 160 is used to fix particle PB2. Light-emitting device 110 is used to emit input light L11 and L12 to particles PB1 and PB2, respectively. Particles PB1 and PB2 generate output light L13 and L14, respectively, based on coupling strength GB1. Sensing device 180 is used to generate readout signal BS1 corresponding to the magnetic field applied to particles PB1 and PB2 based on the output light L13 and L14.

[0074] In some embodiments, particles PB1 and PB2 are also used to generate output light L13 and L14 based on a portion or all of the coupling strengths GB1 to GB6. The sensing device 180 is used to generate a readout signal BS1 corresponding to the magnetic field applied to particles PB1 to PB4 based on the output light L13 and L14.

[0075] In some embodiments, the moving device 130 is used to adjust the distance between particles PB1 and PB2 to adjust the coupling strength GB1. The moving device 130 is also used to adjust the distance between particles PB1 and PB3 to adjust the coupling strength GB3. The moving device 130 is also used to adjust the distance between particles PB1 and PB4 to adjust the coupling strength GB4.

[0076] Similarly, in some embodiments, the moving device 140 is used to adjust the distance between particles PB1 and PB2 to adjust the coupling strength GB1. The moving device 140 is also used to adjust the distance between particles PB2 and PB3 to adjust the coupling strength GB2. The moving device 140 is also used to adjust the distance between particles PB2 and PB4 to adjust the coupling strength GB5.

[0077] In some embodiments, the magnetic field measurement system 300B further includes a device (not shown) for controlling the movement of particle PB3. The device for controlling the movement of particle PB3 is used to adjust the distance between particles PB1 and PB3 to adjust the coupling strength GB3. The device for controlling the movement of particle PB3 is also used to adjust the distance between particles PB2 and PB3 to adjust the coupling strength GB2. The device for controlling the movement of particle PB3 is also used to adjust the distance between particles PB4 and PB3 to adjust the coupling strength GB6.

[0078] In some embodiments, the magnetic field measurement system 300B further includes a device (not shown) for controlling the movement of particle PB4. The device for controlling the movement of particle PB4 is used to adjust the distance between particles PB1 and PB4 to adjust the coupling strength GB4. The device for controlling the movement of particle PB4 is also used to adjust the distance between particles PB2 and PB4 to adjust the coupling strength GB5. The device for controlling the movement of particle PB4 is also used to adjust the distance between particles PB4 and PB3 to adjust the coupling strength GB6.

[0079] Figure 4 This is a schematic diagram illustrating a magnetic field measuring device 400 according to one embodiment of the present invention. In some embodiments, the magnetic field measuring device 400 includes a sensing block 410, a moving device 420, and a laser generating device assembly 430. Figure 4 As shown, the sensing block 410, the laser generating device group 430, and the moving device 420 are arranged sequentially in the Z direction.

[0080] In some embodiments, the sensing block 410 is used to sense the magnetic field B4 applied to the sensing block 410. The laser generating device assembly 430 is used to emit lasers Z1 to Z12 in the opposite direction of the Z direction to the sensing block 410. The moving device 420 is used to move the laser generating device assembly 430. In some embodiments, the direction of the magnetic field B4 is the Z direction.

[0081] In some embodiments, the sensing block 410 includes sensing module columns CL1 to CL6. In some embodiments, each of the sensing module columns CL1 to CL6 is used to sense the strength of the surrounding magnetic field B4. Figure 4 As shown, the sensing modules CL1~CL6 are arranged sequentially along the X direction, which is different from the Z direction. In some embodiments, the X direction is perpendicular to the Z direction.

[0082] In some embodiments, the laser generating device group 430 includes laser generating devices LG1 to LG6. For example... Figure 4 As shown, laser generating devices LG1 to LG6 are arranged sequentially along the X direction. Laser generating device LG1 emits lasers Z1 and Z2 to sensing module array CL1. Laser generating device LG2 emits lasers Z3 and Z4 to sensing module array CL2. Laser generating device LG3 emits lasers Z5 and Z6 to sensing module array CL3. Laser generating device LG4 emits lasers Z7 and Z8 to sensing module array CL4. Laser generating device LG5 emits lasers Z9 and Z10 to sensing module array CL5. Laser generating device LG6 emits lasers Z11 and Z12 to sensing module array CL6.

[0083] In some embodiments, the moving device 420 is used to move the laser generating devices LG1-LG6 to adjust the position of the sensing module arrays CL1-CL6. For example, Figure 4 As shown, there is a distance D41 between the sensing modules CL6 and CL5. The moving device 420 is used to move the laser generating device LG5 closer to the laser generating device LG6 to reduce the distance D41. Alternatively, the moving device 420 is used to move the laser generating device LG5 away from the laser generating device LG6 to increase the distance D41.

[0084] In some practices, the spatial resolution of measuring devices used for precise measurements of magnetic fields is limited by the manufacturing process and cannot be easily changed.

[0085] Compared to the above approach, in this embodiment of the invention, the mobile device 420 can adjust the position of the sensing module arrays CL1~CL6 to adjust the spatial resolution of the magnetic field measurement device 400. In this way, the user can optimize the magnetic field measurement device 400 according to the desired magnetic field B4.

[0086] In some embodiments, each of the sensing module columns CL1 to CL6 includes a plurality of sensing modules arranged sequentially along the Z direction. Each of these sensing modules is used to sense the intensity of the magnetic field B4 in its surroundings. Figure 4 In the illustrated embodiment, sensor module column CL6 includes sensor modules 411, 412, and two other sensor modules. Sensor module column CL5 includes sensor module 413 and three other sensor modules. Sensor modules 412 and 411 are arranged sequentially along the Z direction. Sensor modules 413 and 411 are arranged sequentially along the X direction.

[0087] Please refer to Figure 1 and Figure 4 The magnetic field measuring device 400 is a variation of the magnetic field measuring system 100. Moving devices 120 and 130 correspond to moving device 420. Laser generating devices 140 and 150 correspond to laser generating devices LG1-LG6. The light-emitting device 110, sensing device 180, particles PT1 and PT2, fixing devices 160 and 170, and processing device 190 correspond to the sensing modules in the sensing module series CL1-CL6. Lasers Z1-Z12 correspond to lasers LZ1 and LZ2. Therefore, some details will not be repeated.

[0088] For example, in some embodiments, the sensing module 412 includes a light-emitting device 110, a sensing device 180, particles PT1 and PT2, fixing devices 160 and 170, and a processing device 190. The laser generating device LG6 includes laser generating devices 140 and 150. Lasers Z11 and Z12 correspond to lasers LZ1 and LZ2, respectively. Laser Z11 is used to position the fixing device 170. Laser Z12 is used to position the fixing device 160. The moving device 420 includes moving devices 120 and 130. The distance between lasers Z11 and Z12 corresponds to distance D1. The sensing module 412 is used to measure the strength of the magnetic field B4 around the sensing module 412 based on the coupling strength G1 of particles PT1 and PT2.

[0089] For another example, in some embodiments, the sensing module 411 includes a light-emitting device 110, a sensing device 180, particles PT1 and PT2, fixing devices 160 and 170, and a processing device 190. The laser generating device LG6 includes laser generating devices 140 and 150. Lasers Z11 and Z12 correspond to lasers LZ1 and LZ2, respectively. Laser Z11 is used to position the fixing device 170. Laser Z12 is used to position the fixing device 160. The moving device 420 includes moving devices 120 and 130. The distance between lasers Z11 and Z12 corresponds to distance D1. The sensing module 411 is used to measure the strength of the magnetic field B4 surrounding the sensing module 411 based on the coupling strength G1 of particles PT1 and PT2. In some embodiments, the particles in the sensing modules 411 and 412 are positioned by the same lasers Z11 and Z12.

[0090] In some embodiments, other sensing modules in the sensing module series CL1~CL6 also have a configuration similar to that described above for sensing module 412. For example, sensing module 413 includes a first particle corresponding to particle PT1 and a second particle corresponding to particle PT2. Laser Z9 is used to fix the first particle. Laser Z10 is used to fix the second particle. Motion device 420 is used to move the positions of lasers Z9 and Z10 to adjust the coupling strength between the first particle and the second particle. Sensing module 413 is used to calculate the strength of the magnetic field B4 surrounding sensing module 413 based on the coupling strength between the first particle and the second particle.

[0091] In some embodiments, the mobile device 420 is also used to adjust the positions of lasers Z11 and Z10 to adjust the distance D41 between the second particle and the particle PT1 in the sensing module 412, so as to adjust the spatial resolution of the magnetic field measuring device 400.

[0092] like Figure 4 As shown, the sensing modules in the sensing module columns CL1 to CL6, such as sensing module 412, are used for method 499. Method 499 includes operations OP41 to OP44.

[0093] In some embodiments, during operation OP41, free radical pairs are prepared. For example, particles PT1 and PT2 having free radical pairs RP1 and RP2 are fixed by fixing devices 170 and 160, and distance D1 is adjusted by moving devices 120 and 130.

[0094] In some embodiments, during operation OP42, the output light of the free radical pairs is measured. For example, the intensity of the output light L13 and L14 is measured by sensing device 180.

[0095] In some embodiments, during operation OP43, a readout signal is generated based on the output light. For example, sensing device 180 generates readout signal BS1 based on the intensity of output light L13 and L14.

[0096] In some embodiments, during operation OP44, the strength of the magnetic field is calculated based on the readout signal. For example, the strength of the magnetic field B1 or B4 is calculated by processing device 190 based on the readout signal BS1 and equations (1) to (8). In various embodiments, processing device 190 may be located inside or outside the sensing module 412.

[0097] Although the present invention has been disclosed above by way of embodiments, it is not intended to limit the present invention. Any person skilled in the art can make some modifications and refinements without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be determined by the claims.

[0098] [Symbol Explanation] 100, 300A, 300B: Magnetic field measurement system B1, B4: Magnetic Field PT1, PT2, PA1~PA3, PB1~PB4: Particles 110: Light-emitting device 120, 130, 420: Mobile devices 140, 150, LG1~LG6: Laser generating devices 160, 170: Fixing device 180: Sensing device 190: Processing device L11, L12: Input light L13, L14: Output light BS1: Read signal NC1, NC2: Atomic nuclei RP1, RP2: Free radical pairs RD1~RD4: Free radicals G1, GA1~GA3, GB1~GB6: Coupling strength Additional events G11~G12, G21~G24: Coupling strength values LZ1, LZ2, Z1~Z12: Lasers FB1, FB2: Fixed bodies SG1, SG2: Line segments 200: Relationship Diagram CV1~CV7: Curves D1, D41: Distance 400: Magnetic field measurement equipment 410: Sensing Block 430: Laser generating device group Z: Direction X: Direction CL1~CL6: Sensing Module Column 499: Method OP41~OP44: Operations.

Claims

1. A method for measuring magnetic fields, characterized in that, include: A magnetic field is applied to the first and second particles; A first output light is generated by the first particle based on the magnetic field and the first coupling strength between the first particle and the second particle. as well as The strength of the magnetic field is calculated based on the intensity of the first output light. The calculation of the strength of this magnetic field includes: A readout signal is generated based on the intensity of the first output light; as well as The strength of the magnetic field is calculated based on at least one coupling strength value of the first coupling strength corresponding to at least one local peak of the readout signal.

2. The magnetic field measurement method according to claim 1, wherein generating the first output light comprises: Adjust the distance between the first particle and the second particle to adjust the first coupling strength; as well as The intensity of the first output light is adjusted by adjusting the first coupling strength.

3. The magnetic field measurement method according to claim 2 further includes: The first particle is fixed by the first laser; as well as The second particle is fixed by a second laser; Adjusting the distance between the first particle and the second particle includes: Adjust the position of at least one of the first laser and the position of the second laser.

4. A magnetic field measurement system, characterized in that, include: The first particle is used to generate the first output light based on the first coupling strength and the magnetic field; The second particle is used to couple with the first particle at the first coupling strength; A sensing device for generating a readout signal corresponding to the strength of the magnetic field based on the intensity of the first output light; as well as A processing device for calculating the strength of the magnetic field based on at least one coupling strength value of the first coupling strength corresponding to at least one local peak of the readout signal.

5. The magnetic field measurement system according to claim 4 further includes: A first moving device is used to adjust the distance between the first particle and the second particle, thereby adjusting the first coupling strength. This distance is perpendicular to the direction of the magnetic field.

6. The magnetic field measurement system according to claim 5, wherein, Also includes: The processing device is used to calculate the strength of the magnetic field based on the at least one coupling strength value of the first coupling strength corresponding to the at least one local peak of the read signal after the first moving device adjusts the distance.

7. A magnetic field measuring device, characterized in that, include: A first sensing module is used to sense the strength of the magnetic field around the first sensing module and to generate a readout signal. The second sensing module is used to sense the strength of the magnetic field around the second sensing module; A first laser generating device is used to position the first sensing module; A second laser generating device is used to position the second sensing module; A mobile device for moving at least one of the first laser generating device and the second laser generating device to adjust the distance between the first sensing module and the second sensing module; as well as A processing device for calculating the strength of the magnetic field based on at least one coupling strength value of a first coupling strength corresponding to at least one local peak of the readout signal.

8. The magnetic field measuring device according to claim 7, wherein the first sensing module comprises: The processing device is used to calculate the strength of the magnetic field around the first sensing module based on the coupling strength between the first particle and the second particle. The first laser generating device is also used to generate laser light and fix the first particle using the laser light.

9. The magnetic field measuring device according to claim 8, further comprising: The third sensing module includes a third particle and a fourth particle. The third sensing module is used to calculate the strength of the magnetic field around the third sensing module based on the coupling strength between the third particle and the fourth particle. The first laser generating device is also used to fix the third particle by means of the laser.

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