振动器件以及振动器件的制造方法
By designing a nanoporous concave-convex gas-absorbing layer in the silicon substrate and silicon cap structure, the problem of insufficient adsorption capacity in miniaturized electronic devices is solved, achieving efficient gas adsorption and vacuum maintenance, and improving the long-term stability of the device.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SEIKO EPSON CORP
- Filing Date
- 2023-02-21
- Publication Date
- 2026-07-17
AI Technical Summary
In the existing technology, with the miniaturization of electronic devices, it is difficult to guarantee the surface area of the metal film for adsorption, resulting in insufficient gas adsorption capacity and affecting the long-term stability of the device.
The structure employs a silicon substrate and silicon cap, with a nanoporous concave-convex surface design on the bottom and sides of the recess to form an adsorption layer. The recess is formed by metal-assisted chemical etching, and Ti and Au layers are deposited on it to increase the surface area of the adsorption layer and achieve efficient gas adsorption.
Without increasing the device size, the surface area of the getter layer is significantly increased, the gas adsorption capacity is improved, the vacuum stability of the device is maintained, the vibration frequency variation and Q value reduction are suppressed, and the long-term vibration characteristics of the device are ensured.
Smart Images
Figure CN116633306B_ABST