Lithographic method for forming structures with an angle of inclination
By depositing alternating layers on a transparent substrate and combining this with etching, nanostructures are formed using lithography tools. This solves the problem of controlling the tilt angle and thickness of nanostructures in existing technologies, and enables precise nanostructure manufacturing.
CN116635787BActive Publication Date: 2026-06-23APPLIED MATERIALS INC
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- APPLIED MATERIALS INC
- Filing Date
- 2021-11-23
- Publication Date
- 2026-06-23
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Figure CN116635787B_ABST
Abstract
The present disclosure relates generally to methods of forming optical devices including nanostructures disposed on a transparent substrate. A first process of forming nanostructures includes depositing a first layer of a first material on a glass substrate; forming one or more trenches in the first layer; and depositing a second layer of a second material in the one or more holes to trenches, a first alternating layer of first portions of the first material and second portions of the second material. The first process is repeated one or more times to form additional alternating layers on top of the first alternating layer. Each first portion of each alternating layer is disposed in contact with and offset by a distance from an adjacent first portion in an adjacent alternating layer. A second process includes removing either the first portions or the second portions from each alternating layer to form a plurality of nanostructures.
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