A method for patterning a quasi-periodic micro-nano structure

Abstract

The application discloses a kind of quasi-periodic micro-nano structure patterning preparation method, comprising the following steps:1) preparing photoresist film on substrate, then making patterned photoresist film by photoetching process;2) after the substrate treated in step 1) deposition with patterned photoresist conductive film, then remove photoresist, get with patterned conductive film;3) on the substrate with patterned conductive film deposition soluble material layer, after air drying, get soluble material film;4) with patterned conductive film ground or connected to bias voltage opposite to electrostatic atomization voltage, then through electrostatic atomization soluble material film corresponding solvent, micro-nano scale droplet is deposited on the surface of soluble material film, form thin film with patterned quasi-periodic micro-nano structure, the method can realize large-area patterned manufacturing quasi-periodic micro-nano structure, and with the characteristics of simple process, low cost.

Description

Technical Field

[0001] This invention belongs to the field of micro-nano manufacturing and relates to a method for patterning quasi-periodic micro-nano structures. Background Technology

[0002] Through long periods of evolution, various organisms in nature possess near-perfect structures and functions, enabling them to adapt to complex environments. Each organism is a natural treasure trove waiting to be discovered and utilized by researchers. Marc André Meyers of the University of California proposed that the functions of most organisms are not determined by material properties alone; the specific arrangement of functional structures also plays a crucial role. The functional interfaces of organisms are generally assembled from quasi-periodic micro- and nano-structures. To utilize these superior properties, humans must manufacture these micro- and nano-structures with specific functions. Currently, common biomimetic structure manufacturing processes include photolithography, etching, bio-template methods, breath mapping, surface exposure 3D printing, and laser processing. Photolithography, etching, and laser processing methods are costly, complex, and difficult to perform on curved surfaces. Bio-template methods are limited by the size of the biological templates, hindering mass production and only allowing the replication of relatively simple structures. Breath mapping is inexpensive but requires very strict environmental humidity control and can only form honeycomb-like two-dimensional structures, exhibiting poor forming ability and controllability. Surface exposure 3D printing can form three-dimensional structures with curved surface capabilities, but its forming accuracy is generally in the tens of micrometers, resulting in low precision and efficiency. These manufacturing drawbacks limit the widespread application of biomimetic structures in daily life. Therefore, exploring a new, low-cost, simple, and large-area patterned fabrication process for quasi-periodic micro / nano structures is essential to enabling biomimetic research to benefit humanity as soon as possible. Summary of the Invention

[0003] The purpose of this invention is to overcome the shortcomings of the prior art and provide a method for patterning quasi-periodic micro / nano structures. This method can realize the fabrication of quasi-periodic micro / nano structures with large-area patterning and has the characteristics of simple process and low cost.

[0004] To achieve the above objectives, the patterning fabrication method for quasi-periodic micro / nano structures of the present invention includes the following steps:

[0005] 1) Prepare a photoresist film on a substrate, and then fabricate a patterned photoresist film using a photolithography process;

[0006] 2) Deposit a conductive film with patterned photoresist on the substrate after step 1), and then remove the photoresist to obtain a conductive film with patterned photoresist.

[0007] 3) A soluble material layer is deposited on a substrate with a patterned conductive film, and after air drying, a soluble material film is obtained.

[0008] 4) The patterned conductive film is grounded or connected to a bias voltage opposite to the electrostatic atomization voltage. Then, the solvent corresponding to the soluble material film is electro-atomized to deposit micro-nano-scale droplets on the surface of the soluble material film. Due to the presence of the patterned conductive film, the micro-nano-scale droplets are directionally deposited at the position of the patterned conductive film under the action of the electric field, and a film with a patterned quasi-periodic micro-nano structure is formed under the action of the electric field. The droplets without the patterned conductive film are repelled by the substrate and are recovered and evaporated by the annular droplet recovery device, thus completing the patterning of the quasi-periodic micro-nano structure.

[0009] In step 1), a photoresist film is prepared on the substrate by spin coating or blade coating.

[0010] The substrate in step 1) includes glass and polymer substrates.

[0011] In step 2), the thickness of the conductive film with patterned photoresist is 0.1 to 100 micrometers.

[0012] In step 3), a soluble material layer is deposited on a substrate with a patterned conductive thin film by solution film deposition.

[0013] The solution film-forming method is one of spin coating, screen printing, spraying, doctor blade coating, slot coating, immersion coating, and embossing.

[0014] In step 3), the thickness of the soluble material film is 0.1 to 100 micrometers.

[0015] The soluble material film may be made of, but is not limited to, natural proteins, silk fibroin, carboxymethyl cellulose, methyl cellulose, ethyl cellulose, and polyethylene glycol.

[0016] In step 4), the inner diameter of the annular droplet recovery device is 5-500 mm, the outer diameter is 5-1000 mm, and the shape of the electrode is square, circular or elliptical.

[0017] In step 4), the material of the annular droplet recovery device is a conductive material.

[0018] The present invention has the following beneficial effects:

[0019] The patterning method for quasi-periodic micro / nanostructures described in this invention utilizes electric field manipulation to fabricate patterned quasi-periodic porous micro / nanostructures. Compared to traditional patterned porous micro / nanostructure fabrication processes, this method is less expensive and allows for large-area patterning. Furthermore, it should be noted that this invention, by using electric field manipulation to fabricate patterned quasi-periodic porous structures, enables maskless fabrication of these structures through digital control of the electric field, thus accelerating the application of biomimetic research to benefit humanity. Attached Figure Description

[0020] Figure 1 This is a flowchart of the present invention;

[0021] Figure 2 Here is a process flow diagram for step 7) of an embodiment;

[0022] Figure 3 This is a structural diagram of the present invention;

[0023] Figure 4 This is a physical illustration of the present invention.

[0024] Among them, 11 is the substrate, 12 is the photoresist film, 13 is the patterned photoresist film, 14 is the conductive film with patterned photoresist, 15 is the conductive film with patterned photoresist, 16 is the soluble material film, and 17 is the film with patterned quasi-periodic micro-nano structure. Detailed Implementation

[0025] To enable those skilled in the art to better understand the present invention, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are merely some embodiments of the present invention, not all embodiments, and are not intended to limit the scope of the present invention. Furthermore, in the following description, descriptions of well-known structures and technologies are omitted to avoid unnecessary confusion regarding the concepts disclosed in the present invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort should fall within the scope of protection of the present invention.

[0026] The accompanying drawings show structural schematic diagrams according to embodiments disclosed in this invention. These drawings are not drawn to scale, and some details have been enlarged for clarity, and some details may have been omitted. The shapes of the various regions and layers shown in the drawings, as well as their relative sizes and positional relationships, are merely exemplary and may deviate from reality due to manufacturing tolerances or technical limitations. Furthermore, those skilled in the art can design regions / layers with different shapes, sizes, and relative positions as needed.

[0027] Example 1

[0028] refer to Figure 1 The patterning fabrication method for quasi-periodic micro / nano structures described in this invention includes the following steps:

[0029] 1) A photoresist film 12 is prepared on a substrate 11 by spin coating or blade coating, and then a patterned photoresist film 13 is fabricated by photolithography.

[0030] 2) Deposit a conductive film 14 with patterned photoresist on the substrate 11 after step 1), and then remove the photoresist to obtain a conductive film 15 with patterned photoresist.

[0031] 3) A soluble material layer is deposited on a substrate 11 having a patterned conductive thin film 15 by solution film deposition, and after air drying, a soluble material thin film 16 is obtained.

[0032] 4) The patterned conductive film 15 is grounded or connected to a bias voltage opposite to the electrostatic atomization voltage. Then, the solvent corresponding to the soluble material film 16 is electro-atomized to deposit micro-nano-scale droplets on the surface of the soluble material film 16. Due to the presence of the patterned conductive film 15, the micro-nano-scale droplets are oriented and deposited at the position of the patterned conductive film 15 under the action of the electric field, and a film 17 with a patterned quasi-periodic micro-nano structure is formed under the action of the electric field. The droplets without the patterned conductive film 15 are repelled by the substrate 11 and are recovered and evaporated by the annular droplet recovery device, thus completing the patterning of the quasi-periodic micro-nano structure.

[0033] The substrate 11 in step 1) includes glass and polymer substrates, wherein the substrate 11 is a single-layer or multi-layer substrate prepared from glass and one or more of polydimethylsiloxane, polycarbonate, polyimide and polyethylene terephthalate.

[0034] In step 2), the thickness of the conductive film 14 with patterned photoresist is 0.1–100 micrometers;

[0035] In step 3), the thickness of the soluble material film 16 is 0.1 to 100 micrometers; the material of the soluble material film 16 includes, but is not limited to, natural protein, silk fibroin, carboxymethyl cellulose, methyl cellulose, ethyl cellulose and polyethylene glycol.

[0036] The solution film-forming method in step 3) is one of spin coating, screen printing, spraying, doctor blade coating, slot coating, immersion coating, and embossing.

[0037] In step 4), the inner diameter of the annular droplet recovery device is 5-500 mm, the outer diameter is 5-1000 mm, and the shape of the electrode is square, circular or elliptical.

[0038] In step 4), the material of the annular droplet recovery device is a conductive material, including but not limited to metals and conductive metal oxides.

[0039] Example 1

[0040] The specific process of this embodiment is as follows:

[0041] 1) Select a flexible or rigid substrate, such as dielectric polymers like polyethylene terephthalate (PET), polyimide (PI), or polyvinylidene fluoride (PVDF), or inorganic dielectric materials like glass or silicon wafers. In this embodiment, a quartz glass with a thickness of 1.1 mm is used. The substrate is then ultrasonically cleaned with ethanol and deionized water for 10 min in sequence, and then dried with an infrared lamp to obtain substrate 11.

[0042] 2) A photoresist film 12 is prepared on the substrate 11 using a doctor blade coater. The distance between the doctor blade and the substrate 11 is 50 μm, the coating speed is 15 mm / min, and the photoresist used is AZ4620. After the coating is completed, the sample is placed on a heating stage at 90℃-100℃ for 5 min of pre-baking, so as to obtain the photoresist film 12 on the substrate 11.

[0043] 3) The substrate 11 obtained in step 2) is attached to the mask template with the desired pattern for mask photolithography, and then exposed under a UV lamp for 25s-35s. The exposed sample is then placed in a 0.5wt% NaOH solution for development to remove excess photoresist. Then it is rinsed with deionized water and the substrate 11 is placed on a heating stage at 90℃-100℃ for 5min to obtain a patterned photoresist film 13.

[0044] 4) Place the substrate 11 obtained in step 3) in a thermal evaporation coating machine to deposit a 100 nm thick silver film at a deposition rate of 0.1 nm / s, thereby obtaining a conductive film 14 with patterned photoresist.

[0045] 5) Soak the sample obtained in step 4) in ethanol to remove the photoresist, then rinse with deionized water and dry with nitrogen to obtain a patterned conductive film 15.

[0046] 6) Use a doctor blade coater to uniformly coat a layer of silk protein onto the substrate 11 obtained in step 5) to obtain a silk protein film with a thickness of 0.1-10000 micrometers. Use the silk protein film as a soluble material film 16.

[0047] 7) such as Figure 2As shown, the patterned conductive film 15 on the sample obtained in step 6) is grounded, and then a solvent corresponding to the soluble material film 16 is electro-atomized to deposit micro-nano-scale droplets on the surface of the soluble material film 16. Due to the presence of the patterned conductive film 15, the micro-nano-scale droplets are directionally deposited at the location with the patterned conductive layer under the action of the electric field, and a film 17 with a patterned quasi-periodic micro-nano structure is formed under the action of the electric field. The planar schematic diagram is shown below. Figure 3 As shown and Figure 4 .

[0048] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and not to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that modifications or equivalent substitutions can still be made to the specific implementation of the present invention. Any modifications or equivalent substitutions that do not depart from the spirit and scope of the present invention should be covered within the scope of protection of the claims of the present invention.

Claims

1. A method for patterning quasi-periodic micro / nano structures, characterized in that, Includes the following steps: 1) A photoresist film (12) is prepared on a substrate (11), and then a patterned photoresist film (13) is made by photolithography. 2) Deposit a conductive film (14) with patterned photoresist on the substrate (11) after step 1), and then remove the photoresist to obtain a conductive film (15) with patterned photoresist. 3) A soluble material layer is deposited on a substrate (11) having a patterned conductive film (15), and after air drying, a soluble material film (16) is obtained. 4) The patterned conductive film (15) is grounded or connected to a bias voltage opposite to the electrostatic atomization voltage. Then, the solvent corresponding to the soluble material film (16) is electro-atomized to deposit micro-nano-scale droplets on the surface of the soluble material film (16). Due to the presence of the patterned conductive film (15), the micro-nano-scale droplets are oriented and deposited at the position of the patterned conductive film (15) under the action of the electric field, and a film (17) with a patterned quasi-periodic micro-nano structure is formed under the action of the electric field. The droplets without the patterned conductive film (15) are repelled by the substrate (11) and are recovered and evaporated by the annular droplet recovery device, thus completing the patterning of the quasi-periodic micro-nano structure. In step 4), the inner diameter of the annular droplet recovery device is 5-500 mm, the outer diameter is 5-1000 mm, and the shape of the electrode is square, circular, or elliptical. In step 4), the material of the annular droplet recovery device is a conductive material.

2. The patterning fabrication method for quasi-periodic micro / nano structures according to claim 1, characterized in that, In step 1), a photoresist film (12) is prepared on the substrate (11) by spin coating or blade coating.

3. The patterning fabrication method for quasi-periodic micro / nano structures according to claim 1, characterized in that, The substrate (11) in step 1) includes glass and polymer substrates.

4. The patterning fabrication method for quasi-periodic micro / nano structures according to claim 1, characterized in that, In step 2), the thickness of the conductive film (14) with patterned photoresist is 0.1 to 100 micrometers.

5. The patterning fabrication method for quasi-periodic micro / nano structures according to claim 1, characterized in that, In step 3), a soluble material layer is deposited on a substrate (11) having a patterned conductive thin film (15) by solution film deposition.

6. The patterning fabrication method for quasi-periodic micro / nano structures according to claim 5, characterized in that, The solution film-forming method is one of spin coating, screen printing, spraying, doctor blade coating, slot coating, immersion coating, and embossing.

7. The patterning fabrication method for quasi-periodic micro / nano structures according to claim 1, characterized in that, In step 3), the thickness of the soluble material film (16) is 0.1 to 100 micrometers.

8. The method for patterning quasi-periodic micro / nano structures according to claim 1, characterized in that, The soluble material film (16) may be made of, but is not limited to, natural proteins, silk fibroin, carboxymethyl cellulose, methyl cellulose, ethyl cellulose and polyethylene glycol.

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