Interferometer-based nanoimprint planarization apparatus and method

Abstract

The application discloses an interferometer-based nanoimprint leveling device and method, which is used for leveling a first mold closing surface of a first fixed plate and a second mold closing surface of a second adjusting block, and comprises at least one interferometer, which is used for detecting a real-time distance d of any point on the first mold closing surface of the first fixed plate and the second mold closing surface of the second adjusting block; a translation assembly, which comprises a translation driving device in transmission connection with the interferometer and a translation support, the interferometer is installed on the translation support, and the translation driving device can drive the interferometer to translate in a first plane, the first plane is parallel to the first mold closing surface or the second mold closing surface; and a control device, which is electrically connected with the translation driving device and the interferometer respectively, controls the translation driving device to act, receives the real-time distance d detected by the interferometer, and judges the real-time distance d. The application has a simple structure, can quickly judge whether two planes are parallel, and is suitable for various nanoimprint devices.

Description

Technical Field

[0001] This invention belongs to the field of nanoimprint technology, specifically relating to a nanoimprint leveling device and method based on an interferometer. Background Technology

[0002] With the continuous development and progress of micro-nano fabrication technology, nanoimprint technology has overcome the difficulties of traditional photolithography in reducing feature size. It has the characteristics of high resolution, low cost and high yield, and is widely used in various fields involving micro-nano fabrication, such as semiconductor manufacturing, MEMS, and biochips.

[0003] Nanoimprint lithography primarily uses nanoimprint adhesive to transfer micro- and nanostructures from a template onto a substrate. Because these micro- and nanostructures are extremely small, even minute deviations can affect the imprinting effect; therefore, a high degree of parallelism is required between the template and the substrate. Summary of the Invention

[0004] To address the aforementioned technical problems, this invention proposes a nanoimprint leveling device and method based on an interferometer.

[0005] To achieve the above objectives, the technical solution of the present invention is as follows:

[0006] This invention discloses a nanoimprint leveling device based on an interferometer, used to level the first mold-fitting surface of a first fixed plate and the second mold-fitting surface of a second adjusting block, comprising:

[0007] At least one interferometer is used to detect the real-time distance d between any point on the first mold-closing surface of the first fixed plate and the second mold-closing surface of the second adjusting block;

[0008] The translation assembly includes: a translation drive device and a translation bracket connected to the interferometer drive. The interferometer is mounted on the translation bracket. The translation drive device can drive the interferometer to translate in a first plane. The first plane is parallel to a first mold-forming surface or a second mold-forming surface.

[0009] The control device is electrically connected to the translation drive device and the interferometer. The control device is used to control the operation of the translation drive device, and to receive the real-time distance d detected by the interferometer and judge whether the first mold surface and the second mold surface are parallel.

[0010] Based on the above technical solution, the following improvements can be made:

[0011] As a preferred option, the nanoimprint leveling device includes: N interferometers, where N≥2.

[0012] As a preferred option, all interferometers are arranged at equal intervals along the same straight line.

[0013] As a preferred embodiment, the translation support includes: an X-axis guide rail, an X-axis plate slidably connected to the X-axis guide rail, an X-axis drive device driven by the X-axis plate, a Y-axis guide rail mounted on the X-axis plate, a Y-axis plate slidably connected to the Y-axis guide rail, and a Y-axis drive device driven by the Y-axis plate, with all interferometers mounted on the Y-axis plate.

[0014] As a preferred option, the interferometer can be raised and lowered.

[0015] Furthermore, this invention also discloses an interferometer-based nanoimprint leveling method, which utilizes any of the aforementioned nanoimprint leveling devices, specifically including:

[0016] Step S1: Turn on an interferometer;

[0017] Step S2: The interferometer obtains the real-time distance between the first mold-closing surface of the first fixed plate and the second mold-closing surface of the second adjusting block when it is at position (x1, y1). And send it to the control device;

[0018] Step S3: The control device controls the translation component to move the interferometer to position (x) p y p The interferometer obtains the real-time distance between the first mold-closing surface of the first fixed plate and the second mold-closing surface of the second adjusting block at that position. And send it to the control device;

[0019] Step S4: Repeat S3, K1 times, to obtain... And K1≥3;

[0020] Step S5: Control device to Make a judgment.

[0021] If both are less than the set deviation value, it is determined that the first mold closing surface of the first fixed plate is parallel to the second mold closing surface of the second adjusting block;

[0022] Otherwise, it is determined to be non-parallel, and the adjustment device adjusts according to each position point. The difference between the value and the set deviation value is used to adjust the second adjustment block. After adjustment, steps S2-S5 are repeated until the values ​​at each position point are adjusted. All values ​​are less than the set deviation value. As a preferred solution, at least three location points are not collinear.

[0023] Furthermore, this invention also discloses another interferometer-based nanoimprint leveling method, which utilizes any of the aforementioned nanoimprint leveling devices, specifically including:

[0024] Step S1: Turn on N interferometers, where N≥2;

[0025] Step S2: The control device controls the translation component to drive N interferometers to move synchronously along the Y-axis. (j) Distance, to obtain the distance for that y j Distance And send it to the control device;

[0026] in,

[0027] The real-time distance between the first mold-closing surface of the first fixed plate and the second mold-closing surface of the second adjusting block, corresponding to the starting point of the j-th movement of the i-th interferometer;

[0028] The real-time distance between the first mold-closing surface of the first fixed plate and the second mold-closing surface of the second adjusting block, corresponding to the end point of the j-th movement of the i-th interferometer;

[0029] Step S3: The control device controls the translation component to drive N interferometers to move synchronously along the X-axis by a distance x.

[0030] Step S4: Repeat steps S2-S3 K2 times to obtain... And K2≥3;

[0031] Step S5: Control device to Make a judgment.

[0032] If both are less than the set deviation value, it is determined that the first mold closing surface of the first fixed plate is parallel to the second mold closing surface of the second adjusting block;

[0033] Otherwise, it is judged as non-parallel, and the adjustment device is adjusted accordingly. The difference between the value and the set deviation value is used to adjust the second adjustment block. After adjustment, steps S2-S5 are repeated until each value is adjusted. All values ​​are less than the set deviation value.

[0034] As a preferred embodiment, the control device controls the translation component to drive N interferometers to move synchronously along the Y-axis by the same distance.

[0035] As a preferred embodiment, the control device controls the translation component to drive N interferometers to move synchronously along the Y-axis by different distances.

[0036] The present invention provides a nanoimprint leveling device and method based on an interferometer, which has the following beneficial effects:

[0037] First, the present invention discloses a leveling device for leveling the first mold-closing surface of the first fixed plate and the second mold-closing surface of the second adjusting block. The device uses an interferometer to detect and obtain the real-time distance and sends it to the control device.

[0038] Secondly, this invention discloses two leveling methods. One leveling method uses points to determine whether two surfaces are parallel, and the other method uses straight lines to determine whether two surfaces are planar. Both methods can be used together to improve the accuracy of the judgment, or one method can be chosen for judgment.

[0039] Third, the present invention has a simple structure, is easy to implement, is applicable to various nanoimprinting devices, and is suitable for widespread application. Attached Figure Description

[0040] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0041] Figure 1 A top view of the nanoimprint leveling device (with an interferometer) provided in an embodiment of the present invention.

[0042] Figure 2 A side view of a nanoimprint leveling device (with an interferometer) provided in an embodiment of the present invention.

[0043] Figure 3 This is a schematic diagram showing the distance d between the first fixing plate and the second adjusting block provided in an embodiment of the present invention.

[0044] Figure 4 A top view of the nanoimprint leveling device (with two interferometers) provided in an embodiment of the present invention.

[0045] Figure 5 A side view of a nanoimprint leveling device (with two interferometers) provided in an embodiment of the present invention.

[0046] Wherein: 1-first fixed plate, 2-second adjusting block, 31-first mold closing surface, 32-second mold closing surface, 4-interferometer, 5-X-axis guide rail, 6-X-axis plate, 7-X-axis drive device, 8-Y-axis guide rail, 9-Y-axis plate, 10-translation bracket. Detailed Implementation

[0047] The preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings.

[0048] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0049] Using ordinal numbers such as “first,” “second,” “third,” etc. to describe ordinary objects merely indicates different instances of similar objects and is not intended to imply that the objects being described must have a given order in time, space, sequence, or any other way.

[0050] Furthermore, the expression "includes" is an "open-ended" expression, which means only that there is a corresponding component or step, and should not be interpreted as excluding additional components or steps.

[0051] To achieve the objectives of this invention, in some embodiments of the interferometer-based nanoimprint leveling device and method, such as... Figure 1-3 As shown, the nanoimprint leveling device is used to level the first mold-fitting surface 31 of the first fixed plate 1 and the second mold-fitting surface 32 of the second adjusting block 2, and includes: an interferometer 4, a translation component and a control device.

[0052] The first fixing plate 1 is positioned above the second adjusting block 2, and the nanoimprint leveling device is positioned above the first fixing plate 1. The first fixing plate 1 may be, but is not limited to, glass (a transparent material with a maximum thickness of 70 mm and up to 6 layers) used for nanoimprinting, and the second adjusting block 2 may be, but is not limited to, a wafer or glass.

[0053] Interferometer 4 is used to detect the real-time distance d between any point on the first mold-fitting surface 31 of the first fixed plate 1 and the second mold-fitting surface 32 of the second adjusting block 2; the translation component includes: a translation drive device and a translation bracket 10 that are connected to the interferometer 4 in a transmission manner. The interferometer 4 is mounted on the translation bracket 10. The translation drive device can drive the interferometer 4 to translate in a first plane, which is parallel to the first mold-fitting surface 31 or the second mold-fitting surface 32; the control device is electrically connected to the translation drive device and the interferometer 4 respectively. The control device is used to control the operation of the translation drive device, and to receive the real-time distance d detected by the interferometer 4 and judge it to determine whether the first mold-fitting surface and the second mold-fitting surface are parallel. The judgment accuracy is up to 0.2μm.

[0054] Furthermore, the translation support 10 includes: an X-axis guide rail 5, an X-axis plate 6 slidably connected to the X-axis guide rail 5, an X-axis drive device 7 drivenly connected to the X-axis plate 6, a Y-axis guide rail 8 mounted on the X-axis plate 6, a Y-axis plate 9 slidably connected to the Y-axis guide rail 8, and a Y-axis drive device (not shown in the figure) drivenly connected to the Y-axis plate 9. All interferometers 4 are mounted on the Y-axis plate 9.

[0055] This invention also discloses a nanoimprint leveling method based on interferometer 4, which utilizes the aforementioned nanoimprint leveling equipment and specifically includes:

[0056] Step S1: Turn on one interferometer 4;

[0057] Step S2: The interferometer 4 obtains the real-time distance between the first mold-closing surface 31 of the first fixed plate 1 and the second mold-closing surface 32 of the second adjusting block 2 when it is at position (x1, y1). And send it to the control device;

[0058] Step S3: The control device controls the translation component to move the interferometer 4 to position (x) p y p Interferometer 4 obtains the real-time distance between the first mold-closing surface 31 of the first fixed plate 1 and the second mold-closing surface 32 of the second adjusting block 2 at that position. And send it to the control device;

[0059] Step S4: Repeat S3 3 times to obtain...

[0060] Step S5: Control device to Make a judgment.

[0061] If both are less than the set deviation value (e.g., 0.5μm), then the first mold-closing surface 31 of the first fixing plate 1 is parallel to the second mold-closing surface 32 of the second adjusting block 2;

[0062] Otherwise, it is determined to be non-parallel, and the adjustment device adjusts according to each position point. The difference between the value and the set deviation value is used to adjust the second adjustment block. After adjustment, steps S2-S5 are repeated until the values ​​at each position point are adjusted. All values ​​are less than the set deviation value.

[0063] Among them, positions (x1, y1), (x2, y2), and (x3, y3) are not collinear.

[0064] The above method is based on the principle that three non-collinear points determine a plane, which can be used to determine whether the planes formed by the above positions are at the same height, and thus determine whether the upper and lower planes are parallel.

[0065] Furthermore, in some embodiments, positions (x1, y1), (x2, y2), and (x3, y3) are the three vertices of an equilateral triangle.

[0066] Furthermore, in other embodiments, such as Figure 4-5 As shown, the nanoimprint leveling device includes: two interferometers 4, a translation component and a control device. The two interferometers 4 are arranged on the same straight line and the distance between them is fixed.

[0067] This invention also discloses another nanoimprint leveling method based on interferometer 4, which utilizes the aforementioned nanoimprint leveling device with two interferometers 4 for operation, specifically including:

[0068] Step S1: Turn on both interferometers 4;

[0069] Step S2: The control device controls the translation component to drive the two interferometers 4 to move synchronously along the Y-axis. (j) Distance, to obtain the distance for that y j Distance And send it to the control device;

[0070] in,

[0071]

[0072] The real-time distance between the first mold-closing surface 31 of the first fixed plate 1 and the second mold-closing surface 32 of the second adjusting block 2, corresponding to the starting point of the j-th movement of the first interferometer 4;

[0073] The real-time distance between the first mold-closing surface 31 of the first fixed plate 1 and the second mold-closing surface 32 of the second adjusting block 2, corresponding to the end point of the j-th movement of the first interferometer 4;

[0074] The real-time distance between the first mold-closing surface 31 of the first fixed plate 1 and the second mold-closing surface 32 of the second adjusting block 2, corresponding to the starting point of the j-th movement of the second interferometer 4;

[0075] The real-time distance between the first mold-closing surface 31 of the first fixed plate 1 and the second mold-closing surface 32 of the second adjusting block 2, corresponding to the end point of the j-th movement of the second interferometer 4;

[0076] Step S3: The control device controls the translation component to drive the two interferometers 4 to move synchronously along the X-axis by a distance x.

[0077] Step S4: Repeat steps S2-S3 3 times to obtain...

[0078] Step S5: Control device to Make a judgment.

[0079] If both are less than the set deviation value (e.g., 0.5μm), then the first mold-closing surface 31 of the first fixing plate 1 is parallel to the second mold-closing surface 32 of the second adjusting block 2;

[0080] Otherwise, it is judged as non-parallel, and the adjustment device is adjusted accordingly. The difference between the value and the set deviation value is used to adjust the second adjustment block. After adjustment, steps S2-S5 are repeated until each value is adjusted. All values ​​are less than the set deviation value.

[0081] The control device controls the translation component to move the two interferometers 4 synchronously along the Y-axis by the same distance, i.e.: y (1) =y (2) =y (3) .

[0082] This invention is based on the principle of defining a plane using two parallel but non-coincident lines. It can then determine whether the resulting planes are at the same height, and consequently, whether the upper and lower planes are parallel. Compared to the first method that uses points to determine parallelism, using straight lines is more accurate and covers a wider detection range.

[0083] Of course, in other embodiments, the control device controls the translation component to drive the two interferometers 4 to move synchronously along the Y-axis by different distances, which can be y (1) <y (2) <y (3) .

[0084] To further optimize the implementation effect of the present invention, in some other embodiments, the remaining features are the same, except that the interferometer 4 can be raised and lowered, and the interferometer 4 can be adjusted to a suitable height before leveling.

[0085] The present invention provides a nanoimprint leveling device and method based on an interferometer, which has the following beneficial effects:

[0086] First, the present invention discloses a leveling device for leveling the first mold-fitting surface 31 of the first fixing plate 1 and the second mold-fitting surface 32 of the second adjusting block 2, which uses an interferometer 4 to detect and obtain the real-time distance and sends it to the control device.

[0087] Secondly, this invention discloses two leveling methods. One leveling method uses points to determine whether two surfaces are parallel, and the other method uses straight lines to determine whether two surfaces are planar. Both methods can be used together to improve the accuracy of the judgment, or one method can be chosen for judgment.

[0088] Third, the present invention has a simple structure, is easy to implement, is applicable to various nanoimprinting devices, and is suitable for widespread application.

[0089] In the description of this invention, it should be understood that the terms "coaxial," "bottom," "one end," "top," "middle," "other end," "upper," "side," "top," "inner," "front," "center," "both ends," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting this invention.

[0090] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "setting," "connection," "fixing," "screw connection," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal connection of two components or the interaction between two components. Unless otherwise explicitly limited, those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0091] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of the present invention. Various changes and modifications can be made to the present invention without departing from its spirit and scope. All such changes and modifications fall within the scope of the present invention as claimed, which is defined by the appended claims and their equivalents.

Claims

1. An interferometer-based nanoimprint planarization apparatus for planarizing a first mold closing surface of a first fixed plate and a second mold closing surface of a second adjustment block, characterized in that, include: at least one interferometer for detecting the real-time distance between any point on the first clamping surface of the first fixed plate and the second clamping surface of the second adjusting block ; The translation assembly includes: a translation drive device and a translation bracket that are connected to the interferometer in a transmission manner. The interferometer is mounted on the translation bracket. The translation drive device can drive the interferometer to translate in a first plane, which is parallel to a first mold-forming surface or a second mold-forming surface. A control device is electrically connected to both the translation drive device and the interferometer. The control device controls the operation of the translation drive device and receives the real-time distance detected by the interferometer. And judge whether the first mold parting surface and the second mold parting surface are parallel; The nanoimprint leveling device performs the leveling operation through the following steps: Step S1: Turn on N interferometers, where N≥2; Step S2: The control device controls the translation component to drive N interferometers to move synchronously along the Y-axis. Distance, to obtain the target Distance And send it to the control device; in, ; The real-time distance between the first mold-closing surface of the first fixed plate and the second mold-closing surface of the second adjusting block, corresponding to the starting point of the j-th movement of the i-th interferometer; The real-time distance between the first mold-closing surface of the first fixed plate and the second mold-closing surface of the second adjusting block, corresponding to the end point of the j-th movement of the i-th interferometer; Step S3: The control device controls the translation component to drive N interferometers to move synchronously along the X-axis by a distance x. Step S4: Repeat steps S2-S3. Next time, obtain ; Step S5: Control device to Make a judgment. If both are less than the set deviation value, it is determined that the first mold closing surface of the first fixed plate is parallel to the second mold closing surface of the second adjusting block; Otherwise, it is judged as non-parallel, and the adjustment device is adjusted accordingly. The difference between the value and the set deviation value is used to adjust the second adjustment block. After adjustment, steps S2-S5 are repeated until each value is adjusted. All values ​​are less than the set deviation value.

2. The nanoimprint leveling device according to claim 1, characterized in that, All the interferometers are arranged at equal intervals along the same straight line.

3. The nanoimprint leveling device according to claim 1 or 2, characterized in that, The translation support includes: an X-axis guide rail, an X-axis plate slidably connected to the X-axis guide rail, an X-axis drive device driven by the X-axis plate, a Y-axis guide rail mounted on the X-axis plate, a Y-axis plate slidably connected to the Y-axis guide rail, and a Y-axis drive device driven by the Y-axis plate. All the interferometers are mounted on the Y-axis plate.

4. The nanoimprint leveling device according to claim 1 or 2, characterized in that, The interferometer can be raised and lowered.

5. The nanoimprint leveling device according to claim 1, characterized in that, The control device controls the translation component to drive N interferometers to move synchronously along the Y-axis by the same distance.

6. The nanoimprint leveling device according to claim 1, characterized in that, The control device controls the translation component to drive N interferometers to move synchronously along the Y-axis by different distances.

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