A friction-resistant alloy thin film and a preparation method and application thereof

Abstract

This invention discloses a friction-resistant alloy thin film, its preparation method, and its applications. The friction-resistant alloy thin film has an amorphous structure and is mainly composed of Co, Cr, Ni, and C elements. The C element exists primarily in elemental form and is uniformly distributed throughout the friction-resistant alloy thin film. In this invention, the friction-resistant alloy thin film has an amorphous structure, thus lacking grain boundaries and various crystal defects. Furthermore, the C element is uniformly dispersed throughout the alloy thin film primarily in elemental form, with almost no carbide formation. Therefore, the introduction of a large amount of C element does not cause significant changes in the mechanical properties of the alloy thin film. Excellent room-temperature friction resistance and corrosion resistance can be obtained while maintaining mechanical properties such as hardness close to those of the original CoCrNi alloy thin film.

Description

Technical Field

[0001] This invention relates to the field of friction-resistant multi-principal-element alloy technology, and in particular to a friction-resistant alloy thin film, its preparation method and application. Background Technology

[0002] Multi-principal element alloys are designed using multiple principal elements in equiatomic or near-equiatomic ratios. This shifts the traditional alloy design strategy, which focuses on the vertices and edges of phase diagrams, to the central region, greatly enriching the alloy system. Simultaneously, the high mixing entropy resulting from multi-principal elements favors the formation of single-phase solid solutions, while hindering the formation of intermetallic compounds and other complex ordered phases, thus achieving excellent mechanical properties. CoCrNi-based multi-principal element alloys possess excellent comprehensive mechanical properties, including high fracture toughness, high ductility, good low- and mid-temperature stability, and good corrosion resistance and radiation resistance. Therefore, they hold broad prospects as novel engineering materials in aerospace, military, nuclear energy, marine, and electronic information fields.

[0003] However, friction and wear are unavoidable in practical engineering applications. The energy loss related to friction and wear and the cost of remanufacturing components after failure exceed 20% of global energy consumption annually. Corrosion, radiation, low temperatures, oxidation, and thermal shock caused by complex working environments place higher demands on the tribological properties of materials. Therefore, it is desirable to further improve the friction resistance of CoCrNi-based multi-principal-element alloy thin films (such as CoCrNi alloy thin films) to make them new materials that can meet the wear resistance requirements under various working conditions. This will be of great significance to the development of national defense and high-tech fields.

[0004] Therefore, existing technologies still need to be improved and developed. Summary of the Invention

[0005] In view of the shortcomings of the prior art, the purpose of this invention is to provide a friction-resistant alloy thin film, its preparation method and application, in order to solve the problem that the friction resistance of existing CoCrNi-based multi-principal-element alloy thin films still needs to be further improved.

[0006] The technical solution of the present invention is as follows:

[0007] In a first aspect, the present invention provides a friction-resistant alloy film, wherein the friction-resistant alloy film has an amorphous structure and is mainly composed of Co, Cr, Ni and C elements, wherein the C element exists mainly in elemental form and is uniformly distributed in the friction-resistant alloy film.

[0008] Optionally, the atomic percentage of each element in the wear-resistant alloy film is:

[0009] Co 26-29%, Cr 26-29%, Ni 26-29%, C 14-20%.

[0010] Optionally, the hardness of the wear-resistant alloy film is 80% to 120% of the hardness of the CoCrNi alloy film.

[0011] A second aspect of the present invention provides a method for preparing a friction-resistant alloy thin film as described in any of the preceding claims, comprising the steps of:

[0012] Provide base materials;

[0013] Using a composite target containing Co, Cr, Ni, and C elements as the target material, single-target magnetron sputtering deposition is performed on the substrate to obtain the wear-resistant alloy film.

[0014] Alternatively, using a CoCrNi alloy target and a graphite target as target materials, a dual-target magnetron co-sputtering deposition is performed on the substrate to obtain the friction-resistant alloy film;

[0015] Alternatively, using Co, Cr, Ni, and graphite targets as targets, multi-target magnetron co-sputtering deposition is performed on the substrate to obtain the friction-resistant alloy film.

[0016] Optionally, the process conditions used for single-target magnetron sputtering deposition, dual-target magnetron sputtering co-deposition, or multi-target magnetron co-sputtering deposition are as follows:

[0017] Using an inert gas as the working gas, the background vacuum is less than 5 × 10⁻⁶. -4 The working air pressure is 0.2 to 1.0 Pa, the target power is 80 to 120 W, the substrate rotation speed is 30 to 80 r / min, and the substrate temperature is room temperature to 300℃.

[0018] Optionally, the purity of composite targets containing Co, Cr, Ni, and C elements, CoCrNi alloy targets, Co elemental targets, Cr elemental targets, Ni elemental targets, and graphite targets is greater than or equal to 99.9%.

[0019] Optionally, the process of pre-sputtering may be included before performing single-target magnetron sputtering deposition, dual-target magnetron co-sputtering deposition, or multi-target magnetron co-sputtering deposition.

[0020] Optionally, once the substrate temperature reaches room temperature to 300°C, it is kept at that temperature for a preset time before sputtering.

[0021] In a third aspect, the present invention provides the application of the friction-resistant alloy thin film of the present invention as described above, or the friction-resistant alloy thin film prepared by the preparation method of the present invention as described above, in the preparation of friction-resistant devices.

[0022] Beneficial Effects: Carbon (C) is low in cost and highly economical. Its small atomic radius allows it to easily fill the interatomic gaps between major elements, and it exhibits strong amorphous formation ability. Furthermore, graphite possesses excellent lubrication properties. Therefore, this invention uniformly adds a large amount of C to a CoCrNi alloy with high toughness and ductility to form a friction-resistant alloy film. This significantly improves the insufficient wear resistance of the CoCrNi alloy without significantly sacrificing its mechanical properties. In this invention, the friction-resistant alloy has an amorphous structure, thus lacking grain boundaries and various crystal defects. Furthermore, C is mainly distributed uniformly in elemental form within the alloy film, with almost no carbide formation. The introduction of a large amount of C does not cause significant changes in the mechanical properties of the alloy film. Excellent room-temperature friction resistance and corrosion resistance can be achieved while maintaining mechanical properties such as hardness close to those of the original CoCrNi alloy film. Attached Figure Description

[0023] Figure 1 The (CoCrNi) in Example 1 84 C 16 XRD patterns of the alloy thin film and the CoCrNi alloy thin film in Comparative Example 1.

[0024] Figure 2 To utilize a nanoindentation mechanical testing system to test the (CoCrNi) sample in Example 1 84 C 16 Test curves for mechanical property testing of alloy thin films and CoCrNi alloy thin films in Comparative Example 1.

[0025] Figure 3a For the (CoCrNi) in Example 1 84 C 16 Figure 1 shows the results of room temperature tribological wear tests on the alloy thin film and the CoCrNi alloy thin film in Comparative Example 1 under a load of 1N and a speed of 1mm / s. Figure 3b For the (CoCrNi) in Example 1 84 C 16 Figure 1 shows the results of room temperature tribological wear tests on the alloy thin film and the CoCrNi alloy thin film in Comparative Example 1 under a load of 3N and a speed of 1mm / s. Figure 3c For the (CoCrNi) in Example 1 84 C 16 Figure 1 shows the results of room temperature tribological wear tests on the alloy thin film and the CoCrNi alloy thin film in Comparative Example 1 at a speed of 10 mm / s and a load of 1 N.

[0026] Figure 4 In Example 1, (a) represents the load of 1 N and the speed of 1 mm / s (CoCrNi). 84 C 16(a) SEM image of the alloy film surface after 5000 cycles of friction; (b) SEM image of the (CoCrNi) film in Example 1 under a load of 3N and a speed of 1mm / s. 84 C 16 SEM image of the alloy film surface after 5000 cycles of friction; (c) shows the surface of (CoCrNi) in Example 1 at a speed of 10 mm / s and a load of 1 N. 84 C 16 SEM images of the surface of the alloy film after 5000 cycles of friction: (d) SEM image of the surface of the CoCrNi alloy film in Comparative Example 1 after 5000 cycles of friction with a load of 1N and a speed of 1mm / s; (e) SEM image of the surface of the CoCrNi alloy film in Comparative Example 1 after 50 cycles of friction with a load of 3N and a speed of 1mm / s; (f) SEM image of the surface of the CoCrNi alloy film in Comparative Example 1 after 100 cycles of friction with a speed of 10mm / s and a load of 1N.

[0027] Figure 5a In Example 1, (CoCrNi) 84 C 16 The image shows the results of a friction and wear test on the alloy thin film under simulated seawater corrosion environment. The test conditions were a load of 1 N and a speed of 1 mm / s.

[0028] Figure 5b In Example 1, (CoCrNi) 84 C 16 SEM images of the alloy thin film surface after 360 cycles of friction and wear in a simulated seawater corrosion environment. Detailed Implementation

[0029] This invention provides a friction-resistant alloy thin film, its preparation method, and its application. To make the objectives, technical solutions, and effects of this invention clearer and more explicit, the invention is further described in detail below. It should be understood that the specific embodiments described herein are only for explaining the invention and are not intended to limit the invention.

[0030] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the description of this invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.

[0031] This invention provides a friction-resistant alloy film, wherein the friction-resistant alloy film has an amorphous structure and is mainly composed of Co, Cr, Ni and C elements, wherein the C element exists mainly in the form of an element and is uniformly distributed in the friction-resistant alloy film.

[0032] In this embodiment of the invention, a large amount of carbon element is uniformly added to a CoCrNi alloy with high toughness and high ductility. Since carbon element is low in cost and has good economic applicability, and has a small atomic radius, it is easy to fill the atomic gaps of the main elements and has a strong amorphous forming ability. Moreover, graphite has a good lubricating effect, which can significantly improve the defect of insufficient wear resistance of CoCrNi alloy without significantly losing the mechanical properties of CoCrNi alloy material. In this embodiment of the invention, the friction-resistant alloy film is mainly composed of Co, Cr, Ni, and C elements. The friction-resistant alloy film has an amorphous structure, thus lacking grain boundaries and various crystal defects. Furthermore, the C element is uniformly dispersed in the alloy film mainly in the form of elemental matter (the C element present in the alloy film in other forms is less than 10% of the total C element mass content). Almost no carbides are formed in the friction-resistant alloy film, and no C element segregation occurs. Therefore, the introduction of a large amount of C element will not cause significant changes in the mechanical properties of the alloy film. Excellent room temperature friction resistance and corrosion resistance can be obtained under the condition that the mechanical properties such as hardness are close to those of the original CoCrNi alloy film, reducing the friction coefficient and wear rate of the original CoCrNi alloy film and extending its service life.

[0033] In some embodiments, the atomic percentage (i.e., molar percentage) of each element in the friction-resistant alloy film is:

[0034] Co 26-29%, Cr 26-29%, Ni 26-29%, C 14-20%.

[0035] In some embodiments, the hardness of the friction-resistant alloy film is 80% to 120% of the hardness of the CoCrNi alloy film, and the room-temperature dry friction coefficient of the friction-resistant alloy film is less than 80% of the room-temperature dry friction coefficient of the CoCrNi alloy film. The friction-resistant alloy film provided by this invention achieves excellent room-temperature friction resistance and corrosion resistance while maintaining mechanical properties such as hardness close to those of the original CoCrNi alloy film. In some specific embodiments, when the ratio of Co, Cr, and Ni atoms in the friction-resistant alloy film and the CoCrNi alloy film is the same, the hardness of the friction-resistant alloy film is 80% to 120% of the hardness of the CoCrNi alloy film, and the room-temperature dry friction coefficient of the friction-resistant alloy film is less than 80% of the room-temperature dry friction coefficient of the CoCrNi alloy film.

[0036] Traditional alloy preparation techniques (such as vacuum melting) are often carried out at high temperatures with slow cooling rates, resulting in alloy crystals. Therefore, traditional alloy preparation techniques often cannot achieve a large, uniform addition of carbon (C), leading to carbide formation and C segregation at grain boundaries (as shown in reference 1, where vacuum melting of multi-principal element alloys resulted in C segregation, uneven element distribution, and altered original mechanical properties due to carbide formation and C segregation). Therefore, a large, uniform addition of C without carbide formation is crucial for maintaining the original mechanical properties and improving wear resistance. Based on this, this invention provides a method for preparing the friction-resistant alloy thin film as described above, comprising the following steps:

[0037] S1. Provide substrate;

[0038] S2. Using a composite target containing Co, Cr, Ni, and C elements as the target material, single-target magnetron sputtering deposition is performed on the substrate to obtain the wear-resistant alloy film.

[0039] Alternatively, using a CoCrNi alloy target and a graphite target as target materials, a dual-target magnetron co-sputtering deposition is performed on the substrate to obtain the friction-resistant alloy film;

[0040] Alternatively, using Co, Cr, Ni, and graphite targets as targets, multi-target magnetron co-sputtering deposition is performed on the substrate to obtain the friction-resistant alloy film.

[0041] This invention employs magnetron sputtering to prepare the aforementioned friction-resistant alloy film, offering advantages such as rapid cooling and low preparation temperature. It adds carbon (C) to the CoCrNi alloy without forming carbides (carbide formation often requires high reaction temperatures). Furthermore, the large amount of C added to the CoCrNi alloy increases atomic radius mismatch, thereby enhancing amorphous formation capability. This facilitates the formation of a fully amorphous structure without causing C segregation at grain boundaries. This effectively solves the problem of carbide formation and C segregation at grain boundaries, which alter the original mechanical properties of the material when adding C using traditional alloy preparation techniques. In tribology, wear resistance is generally considered positively correlated with the hardness and strength of a material; that is, higher hardness and strength result in better wear resistance. However, the preparation method provided in this invention allows for the large-scale introduction and uniform dispersion of C, achieving excellent room-temperature friction resistance and corrosion resistance while maintaining mechanical properties similar to the original CoCrNi alloy film, rather than improving friction resistance by increasing material hardness and strength through the formation of a large amount of hard carbides.

[0042] The preparation method provided in this invention is simple to operate and easy to promote and apply. The alloy thin film prepared by the preparation method provided in this invention has excellent friction resistance and mechanical properties, and is low in cost and has good stability.

[0043] In step S1, in some embodiments, the substrate includes, but is not limited to, one of stainless steel, low alloy steel, and silicon wafer.

[0044] In this invention, the process conditions used for single-target magnetron sputtering deposition or dual-target magnetron co-sputtering deposition can be set according to actual needs. For example, in step S2, in some embodiments, the process conditions used for single-target magnetron sputtering deposition, dual-target magnetron co-sputtering deposition, or multi-target magnetron co-sputtering deposition are as follows:

[0045] Using an inert gas as the working gas, the background vacuum is less than 5 × 10⁻⁶. -4 The working pressure is 0.2-1.0 Pa, the target power is 80-120 W, the substrate rotation speed is 30-80 r / min, the substrate temperature is room temperature to 300℃, and the sputtering time is 3-7 h (which can be selected and adjusted according to the film thickness).

[0046] Specifically, the working air pressure can be 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9 or 1.0 Pa, etc.

[0047] The target power can be 80, 85, 90, 95, 100, 105, 110, 115 or 120W, etc.

[0048] The rotational speed of the substrate can be 30, 40, 50, 60, 70 or 80 r / min.

[0049] The substrate temperature can be room temperature (25℃), 30, 40, 50, 80, 100, 150, 180, 200, 230, 250, 280 or 300℃, etc.

[0050] The sputtering time can be 3, 3.5, 4, 4.5, 5, 5.5, 6, 6.5 or 7 hours.

[0051] In some embodiments, before sputtering, the substrate temperature is maintained at room temperature to 300°C for a preset time before sputtering. This achieves uniform substrate temperature, which is more conducive to improving film quality.

[0052] In some embodiments, a pre-sputtering step is included before performing single-target magnetron sputtering deposition or dual-target magnetron co-sputtering deposition. The purpose of pre-sputtering is to remove impurities and oxide layers from the target surface.

[0053] In some embodiments, the purity of composite targets containing Co, Cr, Ni, and C elements, CoCrNi alloy targets, Co elemental targets, Cr elemental targets, Ni elemental targets, and graphite targets is greater than or equal to 99.9%, and the above-mentioned target materials can be directly purchased through customization.

[0054] This invention also provides an application of the friction-resistant alloy film described above, or the friction-resistant alloy film prepared by the preparation method described above, in the fabrication of friction-resistant devices. The friction-resistant alloy film described above has good mechanical properties and good friction resistance, and can be used in friction-resistant devices.

[0055] The following detailed description uses specific examples.

[0056] Example 1

[0057] Abrasion resistant (CoCrNi) 84 C 16 The method for preparing alloy thin films includes the following steps:

[0058] Target preparation: using (CoCrNi) with a purity ≥99.9%. 80 C 20 (at%) alloy is used as the target material.

[0059] Substrate preparation: The single-sided polished monocrystalline silicon wafer was ultrasonically cleaned in acetone and deionized water for 15 minutes in sequence and then dried. It was then fixed on the bracket with high-temperature tape and sent into the sample inlet chamber of the magnetron sputtering instrument (purchased from Shenyang JZCK3-400 Vacuum Equipment Co., Ltd.) and transferred into the cavity. The vacuuming program was then started.

[0060] Temperature uniformity of substrate: when the vacuum level of the cavity is below 5×10 -4 When Pa is reached, the substrate heating button can be turned on, the temperature can be set to 300℃, and after reaching 300℃, it can be kept at 300℃ for 10 minutes to ensure that the substrate temperature is uniform.

[0061] Pre-sputtering: Set the argon flow rate to 20 sccm, adjust the gas pressure in the chamber to 0.3 Pa, set the DC power supply to 100 W, and perform pre-sputtering for 10 minutes with the baffle closed to remove impurities and oxide layers from the target surface.

[0062] Coating: Set the substrate rotation speed to 30 r / min, power to 100 W, argon flow rate to 20 sccm, working pressure to 0.3 Pa, and deposition time to 5 h. Open the baffle and start coating.

[0063] Cooling and sampling: After coating, allow the film to cool naturally to below 50°C in the vacuum chamber, then open the chamber and remove the film to obtain (CoCrNi).84 C 16 alloy film.

[0064] Comparative Example 1

[0065] This embodiment provides a CoCrNi alloy thin film, which is prepared in a manner that is basically the same as that in Example 1. The only difference is that an equiatomic CoCrNi alloy with a purity of ≥99.9% is used as the target material to obtain the CoCrNi alloy thin film.

[0066] Regarding (CoCrNi) in Example 1 84 C 16 The alloy thin film and the CoCrNi alloy thin film in Comparative Example 1 were tested:

[0067] (1) The composition of (CoCrNi) in Example 1 was determined using a three-dimensional atom probe (APT). 84 C 16 The atomic contents of each element in the alloy film are shown in Table 1 below, which proves that the obtained alloy film is (CoCrNi). 84 C 16 .

[0068] Table 1 (CoCrNi) 84 C 16 Atom percentage of alloy thin film

[0069] atom Atomic percentage (at%) C 16.06 Cr 27.94 Ni 28.47 Co 27.53 sum 100

[0070] (2) The (CoCrNi) sample in Example 1 was analyzed using a grazing incidence X-ray diffractometer. 84 C 16 The phase structure of the alloy thin film and the CoCrNi alloy thin film in Comparative Example 1 were tested, and the XRD results are as follows: Figure 1 As shown, (CoCrNi) 84 C 16 The alloy film exhibits a dome-shaped diffraction peak, indicating that it has an amorphous structure, while carbides are usually crystalline. Furthermore, the addition of 16% atomic C exceeds the solubility limit of C in this system (the solubility limit of C in component Co is the highest, at 4.1 at%, 1320℃), indicating that C mainly exists in elemental form. In contrast, the CoCrNi alloy film has a sharp diffraction peak, indicating that it has a crystalline structure. The calibration results show that the film is composed of face-centered cubic (fcc) and hexagonal close-packed (hcp) crystal structures.

[0071] (3) The (CoCrNi) sample in Example 1 was tested using a nanoindentation mechanical testing system. 84 C 16 The mechanical properties of the alloy thin film and the CoCrNi alloy thin film in Comparative Example 1 were tested, and the test curves are shown below. Figure 2As shown. Nanoindentation mechanical testing reveals that (CoCrNi) 84 C 16 The alloy film has a hardness of 10.4±0.2 GPa and an elastic modulus of 162.8±2.9 GPa; while the CoCrNi alloy film has a hardness of 9.9±0.1 GPa and an elastic modulus of 182.0±1.0 GPa. Compared to the CoCrNi alloy film, (CoCrNi) 84 C 16 The alloy film still retains good mechanical properties and has not undergone significant changes.

[0072] (4) The (CoCrNi) sample in Example 1 was tested using a ball-and-disc friction and wear testing machine. 84 C 16 The alloy thin film and the CoCrNi alloy thin film in Comparative Example 1 were subjected to room temperature variable load tribological wear tests. The paired friction balls were alumina balls with a diameter of 6 mm. The friction mode was reciprocating friction at a speed of 1 mm / s, and the loads were 1 N, 2 N, and 3 N, respectively. The results show that when the loads are 1 N, 2 N, and 3 N, (CoCrNi) 84 C 16 All alloy films can withstand 5000 cycles of friction, with an average friction coefficient ranging from 0.50 to 0.56 (average value over the entire process, the same below). At a load of 1N, the CoCrNi alloy film can withstand 5000 cycles of friction, with an average friction coefficient of 0.71; at loads of 2N and 3N, the CoCrNi alloy films fail after 100 and 50 cycles of friction, respectively. The results for loads of 1N and 3N are as follows: Figure 3a , 3b As shown. The values ​​are 1N and 3N for (CoCrNi). 84 C 16 After the alloy thin film underwent 5000 cycles of friction, (CoCrNi) 84 C 16 SEM images of the alloy thin film surface are as follows: Figure 4 As shown in (a) and (b), after the CoCrNi alloy film under loads of 1N and 3N respectively, the SEM images of the CoCrNi alloy film surface after 5000 and 50 cycles of friction are shown in the figures. Figure 4 As shown in (d) and (e), it can be seen that cracks appeared in the CoCrNi alloy film after 50 cycles of friction under a 3N load.

[0073] (5) The (CoCrNi) sample in Example 1 was tested using a ball-and-disc friction and wear testing machine. 84 C 16The alloy thin film and the CoCrNi alloy thin film in Comparative Example 1 were subjected to room temperature variable rate tribological wear tests. The paired friction balls were alumina balls with a diameter of 6 mm. The friction mode was reciprocating friction, the load was 1 N, and the speeds were 1 mm / s, 2 mm / s, 5 mm / s, and 10 mm / s, respectively. The results showed that at speeds of 1 mm / s, 2 mm / s, 5 mm / s, and 10 mm / s, (CoCrNi) 84 C 16 All alloy films could withstand 5000 cycles of friction, with an average friction coefficient ranging from 0.49 to 0.56. At a speed of 1 mm / s, the CoCrNi alloy film could withstand 5000 cycles of friction, with an average friction coefficient of 0.71; at speeds of 2 mm / s, 5 mm / s, and 10 mm / s, the CoCrNi alloy films failed after 1000, 100, and 100 cycles of friction, respectively. The results at a speed of 10 mm / s are as follows... Figure 3c As shown. At a speed of 10 mm / s, (CoCrNi) 84 C 16 After the alloy film completed 5000 cycles of friction, (CoCrNi) 84 C 16 SEM images of the alloy thin film surface are shown below. Figure 4 As shown in (c); at a speed of 10 mm / s, the SEM image of the CoCrNi alloy film surface after 100 cycles of friction is shown in Figure 1. Figure 4 As shown in (f), the CoCrNi alloy film is damaged.

[0074] (6) The (CoCrNi) sample from Example 1 was tested using a ball-and-disc tribological tester equipped with an electrochemical workstation. 84 C 16 The alloy thin film underwent tribological wear testing in a simulated seawater corrosion environment. The paired friction balls were 6mm diameter alumina spheres. The friction method was unidirectional rotational friction, with a load of 1N, a speed of 1mm / s, and a friction radius of 3mm. Seawater simulation was performed using a 3.5wt% NaCl solution. The results are as follows: Figure 5a As shown, after 360 sliding cycles, the coefficient of friction remains essentially unchanged, with an average coefficient of friction of 0.55. (CoCrNi) 84 C 16 SEM images of the alloy thin film surface are shown below. Figure 5b As shown, its surface is smooth, without cracks, film peeling or detachment, and no non-uniform wear of the film caused by the corrosive environment was found.

[0075] The above tests show that the friction-resistant alloy film provided by the present invention has excellent wear resistance and mechanical properties.

[0076] It should be understood that the application of the present invention is not limited to the examples above. Those skilled in the art can make improvements or modifications based on the above description, and all such improvements and modifications should fall within the protection scope of the appended claims.

[0077] References:

[0078] 1. LB Chen, R. Wei, K. Tang, J. Zhang, F. Jiang, L. He, J. Sun, Heavy carbonalloyed FCC-structured high entropy alloy with excellent combination of strength and ductility, Materials Science and Engineering: A 716 (2018) 150-156.

Claims

1. A friction-resistant alloy thin film, characterized in that, The friction-resistant alloy film has an amorphous structure and is mainly composed of Co, Cr, Ni, and C elements. The C element exists primarily in elemental form and is uniformly distributed throughout the friction-resistant alloy film. C elements existing in other forms in the alloy film comprise less than 10% of the total C element mass content. The atomic percentage of each element in the friction-resistant alloy film is as follows: Co 26~29%, Cr 26~29%, Ni 26~29%, C 14~20%; The hardness of the friction-resistant alloy film is 80% to 120% of that of the CoCrNi alloy film; the room temperature dry friction coefficient of the friction-resistant alloy film is less than 80% of that of the CoCrNi alloy film.

2. A method for preparing a friction-resistant alloy thin film as described in claim 1, characterized in that, Including the following steps: Provide base materials; Using a composite target containing Co, Cr, Ni, and C elements as the target material, single-target magnetron sputtering deposition is performed on the substrate to obtain the wear-resistant alloy film. Alternatively, using a CoCrNi alloy target and a graphite target as target materials, a dual-target magnetron co-sputtering deposition is performed on the substrate to obtain the friction-resistant alloy film; Alternatively, using Co, Cr, Ni, and graphite targets as targets, multi-target magnetron co-sputtering deposition is performed on the substrate to obtain the friction-resistant alloy film.

3. The preparation method according to claim 2, characterized in that, The process conditions used for single-target magnetron sputtering deposition, dual-target magnetron co-sputtering deposition, or multi-target magnetron co-sputtering deposition are as follows: Using an inert gas as the working gas, the background vacuum is less than 5 × 10⁻⁶. -4 The working air pressure is 0.2~1.0Pa, the target power is 80~120W, the substrate rotation speed is 30~80r / min, and the substrate temperature is room temperature~300℃.

4. The preparation method according to claim 2, characterized in that, The purity of the composite target containing Co, Cr, Ni, and C elements, the CoCrNi alloy target, the Co elemental target, the Cr elemental target, the Ni elemental target, and the graphite target is greater than or equal to 99.9%.

5. The preparation method according to claim 2, characterized in that, The process of performing pre-sputtering is also included before performing single-target magnetron sputtering deposition, dual-target magnetron co-sputtering deposition, or multi-target magnetron co-sputtering deposition.

6. The preparation method according to claim 3, characterized in that, Once the substrate temperature reaches room temperature to 300°C, maintain the temperature for a preset time before sputtering.

7. The application of a friction-resistant alloy thin film as described in claim 1 or a friction-resistant alloy thin film prepared by any one of claims 2-6 in the preparation of friction-resistant devices.

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