一种基座组件以及预清洁腔室
By designing a base assembly with a thermal protection ring and an air extraction channel in the pre-cleaning reaction chamber, the problems of base deposit contamination and airflow non-uniformity were solved, achieving long-term cleanliness of the substrate and chamber and uniformity of the process reaction.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- ADVANCED MICRO FAB EQUIP INC CHINA
- Filing Date
- 2022-03-15
- Publication Date
- 2026-07-17
AI Technical Summary
In existing pre-cleaning reaction chambers, salts tend to accumulate on the upper and side surfaces of the substrate, leading to contamination of the substrate and chamber. Furthermore, uneven pumping gaps affect the uniformity of the process reaction, resulting in frequent and time-consuming maintenance.
Design a base assembly including a thermal protection ring and an exhaust channel. The thermal protection ring covers the top edge of the base, and the exhaust channel isolates the reaction area from the sides and bottom of the base. Heat is transferred from the chamber wall through a thermally conductive material to prevent deposit formation, and the exhaust channel ensures uniform airflow.
It effectively prevents deposits on the upper and side surfaces of the base, reduces maintenance frequency, ensures uniformity of process gas flow, improves process reaction uniformity, and reduces maintenance time.
Smart Images
Figure CN116798932B_ABST