Pneumatic control flexure system for stabilizing a projection device

Abstract

This disclosure relates to a projection stabilization system and a maskless lithography system having a projection stabilization system. The projection stabilization system compensates for propagating vibrations in a moving image projection system (IPS). Prior to the maskless lithography process operation, the IPS is in a processing position. One or more reinforcements are coupled to the IPS. The one or more reinforcements apply pressure to a flexure coupled to each reinforcement. The flexure is coupled to the IPS to provide stabilization to the IPS during the maskless lithography process operation. For example, the one or more reinforcements protect the IPS from vibrations propagating through the system during operation.

Description

Technical Field

[0001] The embodiments of this disclosure generally relate to photolithography systems. More specifically, the embodiments of this disclosure relate to projection stabilization systems and maskless photolithography systems having projection stabilization systems. Background Technology

[0002] Photolithography is widely used in the manufacture of semiconductor components (such as for back-end processing of semiconductor components) and display devices (such as liquid crystal displays, LCDs). For example, large-area substrates are typically used in the manufacture of LCDs. LCDs, or flat panel displays, are commonly used in active-matrix displays, such as computers, touch panel devices, personal digital assistants (PDAs), cell phones, and television displays. Typically, a flat panel display includes a layer of liquid crystal material sandwiched between two plates as the phase-change material at each pixel. When electricity from a power source is applied to or passes through the liquid crystal material, the amount of light passing through the liquid crystal material is controlled (i.e., selectively modulated) at the pixel location, thereby enabling the generation of an image on the display.

[0003] Conventional maskless lithography systems utilize multiple image projection systems. Each image projection system has a spatial light modulator configured to project multiple write beams onto a photoresist layer on a substrate surface. The write beams projected by the image projection systems write a pattern (also known as a mask pattern) into the photoresist layer on the substrate surface. However, during operation of a maskless lithography system, vibrations can propagate throughout the system, potentially altering the position of the image projection systems. This movement can lead to muras or other undesirable effects in the mask pattern.

[0004] Therefore, there is a need in the art for projection stabilization systems and maskless lithography systems with projection stabilization systems. Summary of the Invention

[0005] In one embodiment, a system is provided. The system includes a pair of bridges. Each bridge is vertically arranged adjacent to each other. The system further includes a reinforcing bracket coupled to a first bridge in the pair of bridges; and a connector coupled to a second bridge in the pair of bridges. The system further includes an upper base coupled to an upper portion of the reinforcing bracket; an upper reinforcing flexure disposed on the upper base; and an upper reinforcing member coupled to the upper portion of the reinforcing bracket. The upper reinforcing member includes an upper pneumatic cylinder located above the upper reinforcing flexure. The system further includes a lower base coupled to a lower portion of the reinforcing bracket; a lower reinforcing flexure disposed on the lower base; and a lower reinforcing member coupled to the lower portion of the reinforcing bracket. The lower reinforcement includes a lower pneumatic cylinder located above the lower reinforcement flexure. The lower reinforcement flexure is perpendicular to the joint.

[0006] In another embodiment, a system is provided. The system includes a reinforcing bracket; an upper base coupled to an upper portion of the reinforcing bracket; an upper reinforcing flexure disposed on the upper base; and an upper reinforcing member coupled to the upper portion of the reinforcing bracket. The upper reinforcing member includes an upper pneumatic cylinder located above the upper reinforcing flexure. The system further includes a lower base coupled to a lower portion of the reinforcing bracket; a lower reinforcing flexure disposed on the lower base; and a lower reinforcing member coupled to the lower portion of the reinforcing bracket. The lower reinforcing member includes a lower pneumatic cylinder located above the lower reinforcing flexure.

[0007] In another embodiment, a system is provided. The system includes a plurality of image projection systems (IPS) disposed between a first bridge and a second bridge. Each image projection system (IPS) has a connector coupled to the second bridge. The system further includes a plurality of projection stabilization systems. Each projection stabilization system is coupled to a corresponding IPS. Each projection stabilization system includes one or more reinforcements. Each reinforcement includes a housing coupled to the first bridge using a reinforcement bracket. The housing has a pneumatic cylinder disposed therein. The reinforcement further includes a base coupled to the housing. The system further includes one or more flexures. Each flexure is coupled to the base of the corresponding reinforcement and the IPS bracket of the corresponding IPS. Each flexure is perpendicular to the connector that couples the corresponding IPS to the second bridge. Attached Figure Description

[0008] To gain a more detailed understanding of the features described above, a more specific description of the present disclosure can be obtained by referring to the embodiments, some of which are illustrated in the accompanying drawings. However, it should be noted that the drawings illustrate only exemplary embodiments and should not be considered as limiting their scope, and other equally effective embodiments are permissible.

[0009] Figure 1 This is a perspective view of a maskless lithography system according to an embodiment.

[0010] Figure 2A and Figure 2B This is a schematic side view of an image projection system with a projection stabilization system according to an embodiment.

[0011] To facilitate understanding, the same reference numerals are used to denote common elements in the figures where possible. Elements and features of one embodiment are contemplated to be advantageously incorporated into other embodiments without further description. Detailed Implementation

[0012] The embodiments described herein provide projection stabilization systems and maskless lithography systems having projection stabilization systems. In one embodiment, a system is provided. The system includes a reinforcement. The reinforcement includes a housing that can be coupled to a support bridge using a reinforcement bracket. The housing has a pneumatic cylinder disposed therein. The reinforcement further includes a substrate coupled to the housing. The system further includes a flexure that can be coupled to an IPS bracket of an IPS coupled to an image projection system (IPS) bridge and can be coupled to the substrate of the housing. When coupled to the IPS and the substrate, the flexure is perpendicular to the connector that couples the IPS to the IPS bridge. When the flexure is coupled to the IPS bracket and the substrate, the pneumatic cylinder is operable to engage or disengage from the flexure.

[0013] Figure 1 This is a perspective view of a maskless lithography system 100 that can benefit from the embodiments described herein. The maskless lithography system 100 includes a stage 114 and a processing unit 104. The stage 114 is supported by a pair of tracks 116 disposed on a flat plate 102. A substrate 120 is supported by the stage 114. The stage 114 moves along the pair of tracks 116 in the X direction, as described above. Figure 1The coordinate system is shown. The stage 114 also moves in the Y direction for processing and / or indexing the substrate 120. The stage 114 is capable of independent operation and can scan the substrate 120 in one direction and step in another. In one embodiment, which can be combined with other embodiments described herein, the pair of tracks 116 is a pair of parallel magnetic channels. As shown, each track in the pair of tracks 116 extends along a straight path. An encoder 118 is coupled to the stage 114 to provide position information of the stage 114 to the controller 122.

[0014] Controller 122 is typically designed to facilitate the control and automation of the processing techniques described herein. Controller 122 may be coupled to or communicate with processing device 104, stage 114, and encoder 118. Processing device 104 and encoder 118 may provide controller 122 with information regarding substrate processing and substrate alignment. For example, processing device 104 may provide information to controller 122 informing it that substrate processing has been completed. A program (or computer instruction) readable by controller 122, referred to as an imaging program, determines which tasks can be performed on the substrate. This program includes mask pattern data and code to monitor and control processing time and substrate position. The mask pattern data corresponds to a pattern to be written into photoresist using electromagnetic radiation.

[0015] Substrate 120 comprises any suitable material, such as glass, which serves as part of a flat panel display. In other embodiments, substrate 120 is made of other materials suitable for use as part of a flat panel display. Substrate 120 has a film layer formed thereon to be patterned (e.g., by pattern etching), and a photoresist layer formed on the film layer to be patterned, the photoresist layer being sensitive to electromagnetic radiation (e.g., UV or deep UV "light"). Positive photoresist includes portions of photoresist that, upon exposure to radiation, are soluble in photoresist developer applied to the photoresist after patterning is written using electromagnetic radiation. Negative photoresist includes portions of photoresist that, upon exposure to radiation, are insoluble in photoresist developer applied to the photoresist after patterning is written using electromagnetic radiation. The chemical composition of the photoresist determines whether it is a positive or negative photoresist. After exposing the photoresist to electromagnetic radiation, the photoresist is developed to leave patterned photoresist on the underlying film layer. Subsequently, using patterned photoresist, the underlying thin film is etched through the opening pattern in the photoresist to form part of the electronic circuitry system of the display panel.

[0016] The processing unit 104 includes a support 108 and a processing unit 106. The support 108 includes a pair of lifters 128 disposed on a plate 102 for supporting two or more bridges 124. The lifters 128 and bridges 124 form an opening 112 to allow a pair of tracks 116 and one or more worktables 114 to pass beneath the processing unit 106. The processing unit 106 is supported by the support 108. The processing unit 106 includes a plurality of image projection systems (IPS) 110. Each IPS 110 is disposed within a housing 111. Each IPS 110 is supported by an adjacent bridge 124.

[0017] although Figure 1 The illustration shows three bridges 124 supporting two rows of IPS 110, but the maskless lithography system 100 may include two bridges 124 disposed on the pair of lifters 128 to support a single row of IPS 110. In one embodiment, which may be combined with other embodiments described herein, the processing unit 106 contains up to 84 IPS 110. Each IPS 110 includes a spatial light modulator. Spatial light modulators include, but are not limited to, micro-LEDs, OLEDs, digital micromirror devices (DMDs), liquid crystal displays (LCDs), and vertical-cavity surface-emitting lasers (VCSELs). The components of each IPS 110 vary depending on the spatial light modulator used.

[0018] Figure 2A and Figure 2B This is a schematic side view of an image projection system (IPS) 110 with a projection stabilization system 200. For ease of explanation, reference will be made to... Figure 1 The projection stabilization system 200 is described using a maskless lithography system 100. However, it should be noted that a maskless lithography system or other lithography systems utilizing IPS 110 can be used in conjunction with the projection stabilization system 200.

[0019] IPS 110 is positioned between adjacent bridges 124. One of the adjacent bridges 124 is a support bridge 250. The other adjacent bridge 124 is an IPS bridge 260. (The text abruptly ends here.) Figure 2A and Figure 2BAs shown, either reinforcing bracket 224a or reinforcing bracket 224b is coupled to support bridge 250. IPS 110 is also coupled to connector 214. Connector 214 is coupled to IPS bridge 260 using connector bracket 248. In one embodiment, which can be combined with other embodiments described herein, connector 214 is a ball connector. As shown, IPS 110 is disposed between connector 214, IPS bridge 260, and support bridge 250. Support bridge 250 and IPS bridge 260 are vertically arranged along the z-direction.

[0020] IPS 110 is coupled to Z-stage 202. In one embodiment, which can be combined with other embodiments described herein, Z-stage 202 is in direct contact with IPS 110. Movement of Z-stage 202 in the Z direction causes movement of IPS 110 in the Z direction, such as... Figure 2A and Figure 2B The coordinate system is shown. The Z-stage 202 moves in the Z direction to adjust IPS110 as needed.

[0021] Processing device 104 includes an XY stage 204. IPS 110 is coupled to the XY stage 204. The XY stage 204 is disposed on the upper surface 206 of the IPS bridge 260. The XY stage 204 moves in the X and Y directions, causing IPS 110 to rotate about the X and Y axes, respectively. Figure 2A and Figure 2B The coordinate system is shown. The XY stage 204 moves along the upper surface 206 of the IPS bridge 260 to adjust the IPS 110 as needed. The XY stage 204 is coupled to the IPS 110 using a stage flexure 208. The stage flexure 208 allows the IPS 110 to move in the Z direction while remaining coupled to the XY stage 204. In one embodiment, which can be combined with other embodiments described herein, the stage flexure 208 is a metallic material. For example, the stage flexure 208 is stainless steel. The stage flexure 208 can move in the Z direction by approximately ±0.8 mm. In another embodiment, which can be combined with other embodiments described herein, the stage flexure 208 includes a thickness of approximately 0.1 mm.

[0022] The projection stabilization system 200 includes a rear block 210. The rear block 210 includes an interface flexure 212. The interface flexure 212 is coupled to the IPS 110. The interface flexure 212 stabilizes the IPS 110 during operation. The interface flexure 212 also allows the IPS 110 to move in the Z direction while remaining coupled to the XY stage 204. In one embodiment, which can be combined with other embodiments described herein, the interface flexure 212 is a metallic material. For example, the interface flexure 212 is stainless steel. In another embodiment, which can be combined with other embodiments described herein, the interface flexure 212 includes multiple layers of flexures stacked together to form the interface flexure 212. For example, the interface flexure 212 may include eight or more flexures stacked together. Each flexure includes a thickness of about 0.1 mm. The interface flexure 212 can move in the Z direction by about ±0.8 mm. The rear block 210 is disposed on the XY stage 204. The weight of the rear block 210 and the interface flexure 212 is applied to the XY stage 204. The weight of the rear block 210 provides sufficient static friction with the XY stage 204, allowing the rear block 210 to remain in contact with the XY stage. In yet another embodiment, which can be combined with other embodiments described herein, the rear block 210 is freely mounted on the XY stage 204.

[0023] Connector 214 allows IPS 110 to move in three degrees of freedom while maintaining coupling to IPS bridge 260. Before operation, IPS 110 is moved to a processing position. The processing position is the position that allows the mask pattern data corresponding to the pattern to be written into the photoresist using electromagnetic radiation. Processing positions include a Z-position, a tilt position, and a tip position. The Z-position corresponds to the position of the Z-stage 202 in the Z-direction, as shown by... Figure 2A and Figure 2B The coordinate system shown is illustrated. The tip position corresponds to the rotation angle of IPS 110 about the Y-axis. The XY stage 204 is located at a predetermined position in the X direction, such that IPS 110 is in the tip position. The tilt position corresponds to the rotation angle of IPS 110 about the X-axis. The XY stage 204 is located at a predetermined position in the Y direction, such that IPS 110 is in the tilt position.

[0024] During operation of the maskless lithography system 100, vibrations propagate from the IPS 110 during mask patterning. These vibrations can displace the IPS 110 from its predetermined processing position. Displacement from the processing position can cause clouding or other undesirable effects during mask patterning. Therefore, the maskless lithography system includes a projection stabilization system 200 to hold the IPS 110 in the processing position during operation despite the presence of vibrations.

[0025] like Figure 2Aand Figure 2B As shown, the projection stabilization system 200 includes one or more reinforcements 216. Each projection stabilization system 200 is coupled to one of a plurality of IPS 110. In one embodiment, which may be combined with other embodiments described herein, the one or more reinforcements 216 include an upper reinforcement 218, a lower reinforcement 220, and a lens reinforcement 222.

[0026] One or more reinforcing members 216 are coupled to a support bridge 250 opposite to the IPS bridge 260. One or more reinforcing members 216 are disposed between the support bridge 250 and the IPS 110. For example... Figure 2A As shown, the upper reinforcement 218, the lower reinforcement 220, and the lens reinforcement 222 are coupled to the support bridge 250 using a reinforcement bracket 224a. Figure 2B As shown, the upper reinforcement 218, the lower reinforcement 220, and the lens reinforcement 222 are coupled to the support bridge 250 via a reinforcement bracket 224b. The upper reinforcement 218 is coupled to the upper portion 219 of the reinforcement brackets 224a and 224b. The lower reinforcement 220 is coupled below the upper portion 219 to the lower portion 221 of the reinforcement brackets 224a and 224b.

[0027] The upper reinforcement 218 includes an upper pneumatic cylinder 223 and an upper housing 225. The upper pneumatic cylinder 223 is disposed within the upper housing 225. An upper base 252 is coupled to the upper housing 225 of the upper reinforcement 218. The upper base 252 is also coupled to the upper portions 219 of the reinforcement brackets 224a and 224b. Thus, the upper housing 225 is coupled to the reinforcement brackets 224a and 224b and the upper base 252. The reinforcement brackets 224a and 224b and the upper base 252 support the upper housing 225 and the upper pneumatic cylinder 223 disposed within the upper housing. The reinforcement brackets 224a and 224b and the upper base 252 hold the upper housing 225 in place.

[0028] The upper IPS bracket 230 is located near the upper pneumatic cylinder 223. The upper IPS bracket 230 is coupled to the IPS 110 and holds the upper reinforcing flexure 232. The upper reinforcing flexure 232 may be coupled to the upper substrate 252 and the upper IPS bracket 230. In one embodiment, which may be combined with other embodiments described herein, the upper reinforcing flexure 232 is a metallic material. For example, the upper reinforcing flexure 232 is stainless steel. In another embodiment, which may be combined with other embodiments described herein, the upper reinforcing flexure 232 comprises multiple layers of flexures stacked together. In yet another embodiment, which may be combined with other embodiments described herein, the upper reinforcing flexure 232 comprises a stack of multiple flexures, each flexure comprising a thickness of approximately 0.1 mm. For example, the upper reinforcing flexure 232 may comprise eight flexures. The upper IPS bracket 230 and the upper base 252 hold the upper reinforcing flexure 232 such that the upper reinforcing flexure 232 is located in front of the surface of the upper pneumatic cylinder 223. In one embodiment, which can be combined with other embodiments described herein, the upper reinforcing flexure 23 is approximately 0.5 mm from the upper pneumatic cylinder 223.

[0029] The upper housing 225 houses the upper pneumatic cylinder 223, which is engaged to apply pressure to the upper reinforcing flexure 232, or disengaged to release the upper reinforcing flexure 232. The upper reinforcing flexure 232 is compressed between the upper pneumatic cylinder 223 and the upper base 252. When engaged, the upper pneumatic cylinder 223 applies pressure to the upper reinforcing flexure 232, so that the IPS 110 remains in the processing position despite vibration. Vibration in the Y direction produces clouding, thereby the upper reinforcing flexure 232 provides in-plane stabilization (i.e., in the Y direction).

[0030] The lower reinforcement 220 includes a lower pneumatic cylinder 226 and a lower housing 227. The lower pneumatic cylinder 226 is disposed within the lower housing 227. A lower base 254 is coupled to the lower housing 227 of the lower reinforcement 220. The lower base 254 is also coupled to the lower portions 221 of the reinforcement brackets 224a and 224b. Thus, the lower housing 227 is coupled to the reinforcement brackets 224a and 224b and the lower base 254. The reinforcement brackets 224a and 224b and the lower base 254 support the lower housing 227 and the lower pneumatic cylinder 226 disposed within the lower housing. The reinforcement brackets 224a and 224b and the lower base 254 hold the lower housing 227 in place.

[0031] The lower IPS bracket 234 is located near the lower pneumatic cylinder 226. The lower IPS bracket 234 is coupled to the IPS 110 and holds the lower reinforcing flexure 236. The lower reinforcing flexure 236 may be coupled to the lower substrate 254 and the lower IPS bracket 234. In one embodiment, which may be combined with other embodiments described herein, the lower reinforcing flexure 236 is a metallic material. For example, the lower reinforcing flexure 236 is stainless steel. In another embodiment, which may be combined with other embodiments described herein, the lower reinforcing flexure 236 comprises multiple layers of flexures. In yet another embodiment, which may be combined with other embodiments described herein, the lower reinforcing flexure 236 comprises a stack of multiple flexures, each flexure comprising a thickness of approximately 0.1 mm. For example, the lower reinforcing flexure 236 may comprise eight flexures. The lower IPS bracket 234 and the lower base 254 hold the lower reinforcing flexure 236 such that the lower reinforcing flexure 236 is positioned in front of the surface of the lower pneumatic cylinder 226. In one embodiment, which can be combined with other embodiments described herein, the lower reinforcing flexure 236 is approximately 0.5 mm from the lower pneumatic cylinder 226.

[0032] The lower housing 227 accommodates the lower pneumatic cylinder 226, such that the lower pneumatic cylinder 226 can be engaged to apply pressure to the lower reinforcing flexure 236, or disengaged to release the lower reinforcing flexure 236. The lower reinforcing flexure 236 is compressed between the lower pneumatic cylinder 226 and the lower base 254. The lower pneumatic cylinder 226 applies pressure to the lower reinforcing flexure 236 so that the IPS 110 with the spatial light modulator remains in a preset position despite vibration. Vibration in the Y direction produces clouding, therefore the lower reinforcing flexure 236 provides stabilization in the in-plane direction (i.e., the Y direction).

[0033] Taken together, one or more reinforcements 216 (e.g., upper reinforcement 218 and lower reinforcement 220) provide stability in the in-plane direction while allowing deflection in the out-of-plane direction (e.g., the X and Z directions), so that the IPS 110 is stable and will not move due to the reaction force from the extraction of the lower pneumatic cylinder 226 and the upper pneumatic cylinder 223.

[0034] like Figure 2A and Figure 2BAs shown by the first vector 238, the upper reinforcing flexure 232 is perpendicular to the connector 214 coupled to the IPS bridge 260. The first vector 238 from the connector 214 to the upper reinforcing flexure 232 is perpendicular to the upper reinforcing flexure 232. The first vector forms a first angle with respect to the X direction between approximately 5° and approximately 85°. For example, the first angle is between approximately 10° and approximately 80°, between approximately 15° and approximately 75°, between approximately 20° and approximately 70°, between approximately 25° and approximately 65°, between approximately 30° and approximately 60°, between approximately 35° and approximately 55°, and between approximately 40° and approximately 50°.

[0035] like Figure 2A and Figure 2B As shown by the second vector 240, the lower reinforcement flexure 236 is perpendicular to the connector 214 coupled to the IPS bridge 260. The second vector 240 from the connector 214 to the lower reinforcement flexure 236 is perpendicular to the lower reinforcement flexure 236. The second vector forms a second angle with respect to the X direction between approximately 5° and approximately 85°. For example, the second angle is between approximately 10° and approximately 80°, between approximately 15° and approximately 75°, between approximately 20° and approximately 70°, between approximately 25° and approximately 65°, between approximately 30° and approximately 60°, between approximately 35° and approximately 55°, and between approximately 40° and approximately 50°.

[0036] The first vector 238 and the second vector 240 intersect at the joint 214. When the first vector 238 and the second vector 240 intersect at the joint 214, the additional reaction force from one or more reinforcements 216 is minimized. Therefore, the reaction force is unlikely to move the IPS 110 out of the processing position. Furthermore, when the first vector 238 and the second vector 240 intersect at the joint 214, the stabilization of the IPS 110 is improved because the forces are applied to a common point where the IPS 110 is stationary.

[0037] Figure 2A The reinforcing bracket 224a and Figure 2BThe reinforcing bracket 224b can be configured in any way such that the first vector 238 and the second vector 240 intersect at the joint 214. It should be noted that one or more reinforcing members 216 can be placed using any configuration of the reinforcing brackets 224a and 224b as needed. The reinforcing brackets 224a and 224b are configured such that the upper reinforcing member 218, the lower reinforcing member 220, and the lens reinforcing member 222 can be positioned relative to the IPS 110 as needed, provided that the first vector 238 and the second vector 240 intersect at the joint 214 such that the upper reinforcing member flexure 232 and the lower reinforcing member flexure 236 are perpendicular to the joint 214. In one example, the lens reinforcing member 222 applies a force to the lens 244 such that the force is directed towards the joint 214. The reinforcing bracket 224b includes a separate upper portion 219 and a lower portion 221. The reinforcing bracket 224a includes an upper portion 219 and a lower portion 221 that are in contact with each other.

[0038] Upper pneumatic cylinder 223 and lower pneumatic cylinder 226 are operable to engage upper reinforcing flexure 232 and lower reinforcing flexure 236, i.e., to apply pressure to the upper and lower reinforcing flexures. Due to the perpendicularity of the upper and lower reinforcing flexures 232 and 236 to the joint 214, the initial reaction force applied to the IPS 110 by the upper and lower pneumatic cylinders 223 and 226 during engagement is minimal. In one embodiment, which can be combined with other embodiments described herein, the initial reaction force of each of the one or more reinforcing members 216 is about 20 N or less.

[0039] In one embodiment that can be combined with other embodiments described herein, one or more reinforcements 216 include a lens reinforcement 222. The lens reinforcement includes a lens housing 229, a lens pneumatic cylinder 228, and a lens reinforcement flexure 242. In one embodiment that can be combined with other embodiments described herein, the lens reinforcement 222 is coupled to the lower portion 221 of the reinforcement bracket 224a or reinforcement bracket 224b (e.g., Figure 2A and Figure 2B(As shown). In another embodiment, which can be combined with other embodiments described herein, the lens reinforcement 222 is directly coupled to the support bridge 250. The lens housing 229 includes a lens pneumatic cylinder 228 disposed therein. The lens reinforcement 222 contacts the lens 244 of the IPS 110 using a lens reinforcement flexure 242. The lens reinforcement flexure 242 is an accessory configured to contact the lens 244. The lens pneumatic cylinder 228 is operable to engage the lens reinforcement flexure 242, i.e., to apply pressure to the lens reinforcement flexure. In one embodiment, which can be combined with other embodiments described herein, the lens pneumatic cylinder 228 will include a buffer end to ensure that the lens 244 is not subjected to impact during engagement of the lens reinforcement 222. The lens reinforcement 222 is preloaded to contact the lens 244 and lock in place. The lens reinforcement 222 improves the stability of the lens 244 despite vibrations during handling. The lens reinforcement 222 can be positioned such that the lens pneumatic cylinder 228 moves in the horizontal direction (i.e., the x-direction). The lens pneumatic cylinder 228 moves in a direction perpendicular to the support bridge 250 and the IPS bridge 260.

[0040] Pneumatic system control 246 is coupled to one or more reinforcing members 216. Pneumatic system control 246 is designed to communicate with one or more reinforcing members 216 when used to actuate the upper pneumatic cylinder 223, lower pneumatic cylinder 226, and lens pneumatic cylinder 228 to the withdrawn position. In one embodiment, which can be combined with other embodiments described herein, pneumatic system control 246 communicates with controller 122. Pneumatic system controller 246 can communicate with controller 122 to integrate the operation of projection stabilization system 200 with maskless lithography system 100. Controller 122 is operable to facilitate the withdrawal of upper pneumatic cylinder 223, lower pneumatic cylinder 226, and lens pneumatic cylinder 228 to the withdrawn position before, during, and after processing.

[0041] In summary, this paper provides a projection stabilization system and a maskless lithography system with a projection stabilization system. This projection stabilization system compensates for propagating vibrations that move the image projection system (IPS), thereby causing performance degradation of the IPS. Prior to the maskless lithography process operation, the IPS is in the processing position. One or more reinforcements are coupled to the IPS. These reinforcements apply pressure to one end of a flexure coupled to each reinforcement. These flexures are coupled to the IPS at the other end to provide stabilization to the IPS during the maskless lithography process operation. For example, the reinforcements protect the IPS from vibrations propagating through the system during operation. Vibrations disrupt the focus of the IPS and cause clouding or other undesirable effects in the display. Despite the presence of vibration, the projection stabilization system holds the IPS in the processing position. Furthermore, the reinforcements provide minimal reaction forces to the IPS and provide stability.

[0042] Although the foregoing examples are directed at this disclosure, other and further examples of this disclosure may be devised without departing from the basic scope of this disclosure, and the scope of this disclosure is defined by the appended claims.

Claims

1. A system comprising: A pair of bridges, each bridge being positioned adjacent to the other in the vertical direction; A reinforcing bracket, the reinforcing bracket being coupled to a first bridge of the pair of bridges; A connector, the connector being coupled to the second bridge in the pair of bridges; Upper base, the upper base being coupled to the upper portion of the reinforcing member bracket; An upper reinforcing flexure is disposed on the upper base; An upper reinforcement member coupled to the upper portion of the reinforcement member bracket, the upper reinforcement member including an upper pneumatic cylinder located above the upper reinforcement member flexure; A lower base, which is coupled to the lower portion of the reinforcing bracket; A lower reinforcing flexure is disposed on the lower base; and A lower reinforcement member coupled to the lower portion of the reinforcement bracket, the lower reinforcement member including a lower pneumatic cylinder located above the lower reinforcement flexure, wherein the lower reinforcement flexure is perpendicular to the joint.

2. The system of claim 1, further comprising an XY stage coupled to the upper surface of the second bridge, the XY stage being operable to travel along the second bridge in the X and Y directions.

3. The system of claim 2, further comprising a rear block disposed on the XY worktable, the rear block comprising an interface flexure.

4. The system of claim 1, wherein the upper reinforcing flexure and the lower reinforcing flexure are made of stainless steel.

5. The system of claim 1, wherein the upper reinforcing flexure and the lower reinforcing flexure comprise a plurality of flexures stacked together.

6. The system of claim 1, further comprising a lens reinforcement coupled to the lower portion of the reinforcement bracket, the lens reinforcement including a lens pneumatic cylinder.

7. The system of claim 1, wherein the upper portion and the lower portion of the reinforcing bracket are separate.

8. The system of claim 1, wherein the upper portion and the lower portion of the reinforcing bracket are in contact with each other.

9. A system comprising: Reinforcing bracket; Upper base, the upper base being coupled to the upper portion of the reinforcing member bracket; An upper reinforcing flexure is disposed on the upper base; An upper reinforcement member coupled to the upper portion of the reinforcement member bracket, the upper reinforcement member including an upper pneumatic cylinder located above the upper reinforcement member flexure; A lower base, which is coupled to the lower portion of the reinforcing bracket; A lower reinforcing flexure is disposed on the lower base; and A lower reinforcement member coupled to the lower portion of the reinforcement member bracket, the lower reinforcement member including a lower pneumatic cylinder located above the lower reinforcement member flexure.

10. The system of claim 9, further comprising a lens reinforcement coupled to the lower portion of the reinforcement bracket, the lens reinforcement including a lens pneumatic cylinder.

11. The system of claim 10, wherein the lens reinforcement includes a buffer end on the lens pneumatic cylinder.

12. The system of claim 9, wherein the upper reinforcing flexure and the lower reinforcing flexure are made of stainless steel.

13. The system of claim 9, wherein the upper reinforcing flexure and the lower reinforcing flexure comprise a plurality of flexures stacked together.

14. The system of claim 9, wherein the upper portion and the lower portion of the reinforcing bracket are separate.

15. The system of claim 9, wherein the upper portion and the lower portion of the reinforcing bracket are in contact with each other.

16. A system comprising: Multiple image projection systems are disposed between a first bridge and a second bridge, each image projection system (IPS) having a connector coupled to the second bridge; Multiple projection stabilization systems, each coupled to a corresponding IPS, each projection stabilization system comprising: One or more reinforcing members, each reinforcing member having: A housing, coupled to the first bridge by a reinforcing bracket, the housing having a pneumatic cylinder disposed therein; and A substrate, the substrate being coupled to the housing; and One or more flexures, each flexure being coupled to the substrate of the corresponding reinforcement and the IPS support of the corresponding IPS, wherein each flexure is perpendicular to the connector that couples the corresponding IPS to the second bridge.

17. The system of claim 16, wherein the one or more reinforcing members include an upper reinforcing member coupled to an upper portion of the reinforcing member support.

18. The system of claim 16, wherein the one or more reinforcing members include a lower reinforcing member coupled to a lower portion of the reinforcing member support.

19. The system of claim 16, wherein the one or more flexural elements comprise stainless steel.

20. The system of claim 16, wherein the one or more flexures comprise a plurality of flexures stacked together.

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