Component for timepiece, movement for timepiece, and timepiece

Abstract

A component for a timepiece, a movement for a timepiece, and a timepiece. The color expression range is wide, and the decorative property is excellent. A component for a timepiece has a base material with silicon as a main component, and a light reflection layer formed by sequentially stacking a first silicon oxide layer, a silicon layer, and a second silicon oxide layer on the base material. When the light reflection layer is viewed in plan, the light reflection layer has a first region and a second region. At least one of the thickness of the first silicon oxide layer in the first region and the thickness of the first silicon oxide layer in the second region, or the thickness of the second silicon oxide layer in the first region and the thickness of the second silicon oxide layer in the second region is different.

Description

Technical Field

[0001] This invention relates to a component for a watch, a watch movement having the component, and a watch. Background Technology

[0002] In the past, watch components were formed by machining metal materials. However, in recent years, from the perspectives of lightweighting and processability, silicon-containing substrates have been used as materials for watch components.

[0003] Furthermore, in recent years, decorative requirements have been placed not only on components exposed on the outside of the watch, but also on components built into the inside of the watch.

[0004] For example, Patent Document 1 discloses a technique for enhancing the decorative appeal of gears incorporated in clocks. Specifically, it comprises a substrate primarily composed of silicon and a light-reflecting layer formed by sequentially stacking a first silicon oxide layer, a silicon layer, and a second silicon oxide layer on the substrate. When viewed from above, the light-reflecting layer has a first region and a second region. By making the thickness of the silicon layer in the first region different from the thickness of the silicon layer in the second region, the colors in the two regions are altered. In other words, the color is adjusted simply by varying the thickness of the silicon layer.

[0005] Patent Document 1: Japanese Patent Application Publication No. 2021-15083

[0006] However, the technology in Patent Document 1 has room for improvement. Specifically, since the color is changed only by the thickness of the silicon layer, there is a limit to the range of colors that can be achieved.

[0007] That is, watch parts that require a wide range of colors and excellent decorative properties. Summary of the Invention

[0008] One aspect of the present invention provides a watch component comprising: a substrate primarily composed of silicon; and a light-reflecting layer formed by sequentially stacking a first silicon oxide layer, a silicon layer, and a second silicon oxide layer on the substrate, wherein, when viewed from above, the light-reflecting layer has a first region and a second region, wherein at least one of the following is true: the thickness of the first silicon oxide layer in the first region is different from the thickness in the second region; or the thickness of the second silicon oxide layer in the first region is different from the thickness in the second region.

[0009] One aspect of the watch movement of this application includes the aforementioned watch components.

[0010] One aspect of the clock in this application is a perspective structure that allows the clock components to be seen. Attached Figure Description

[0011] Figure 1 This is the front view of the clock according to Embodiment 1.

[0012] Figure 2 This is the rear view of the clock.

[0013] Figure 3 This is a top view of the escapement gear.

[0014] Figure 4 It is along Figure 3 A sectional view of the bb section.

[0015] Figure 5A This is a cross-sectional view showing the process of forming the light-reflecting layer.

[0016] Figure 5B This is a cross-sectional view showing the process of forming the light-reflecting layer.

[0017] Figure 5C This is a cross-sectional view showing the process of forming the light-reflecting layer.

[0018] Figure 5D This is a cross-sectional view showing the process of forming the light-reflecting layer.

[0019] Figure 5E This is a cross-sectional view showing the process of forming the light-reflecting layer.

[0020] Figure 5F This is a cross-sectional view showing the process of forming the light-reflecting layer.

[0021] Figure 5G This is a cross-sectional view showing the process of forming the light-reflecting layer.

[0022] Figure 6 This is a cross-sectional view showing an example of a light-reflecting layer with multiple regions.

[0023] Figure 7 This is a graph showing the relationship between the thickness of the first silicon oxide layer and the grayscale.

[0024] Figure 8 It is a graph showing the relationship between the thickness of the silicon layer and the grayscale.

[0025] Figure 9 This is a graph showing the relationship between the thickness of the second silicon oxide layer and the grayscale.

[0026] Figure 10 It is a chart that shows the colors in three regions with different layer thicknesses.

[0027] Figure 11 This is a top view of the escapement gear section in Embodiment 2.

[0028] Figure 12 yes Figure 3 Enlarged view of part p.

[0029] Label Explanation

[0030] 1: Substrate; 3: Dial; 5: Outer Case; 7: Crown; 8: Case Back; 10: Linear Section (Region 2); t11~t13: Thickness; 20: Region 3; t21~t23: Thickness; 30: Region 4; t31~t33: Thickness; 35: Movement; 40: Light Reflecting Layer; 41: Barrel Wheel; 44A: Hour Hand; 44B: Minute Hand; 44C: Power Reserve Hand; 44D: Small Seconds Hand; 45: Gear Train; 46: Frame Components; 47: Balance Wheel; 48A: Window; 48B: Window; 49: Hairspring; 50: Automatic Winding Mechanism; 51: Fourth Wheel; 52: Drive Gear; 53: Resist Layer; 53a: Opening; 54: Mask; 58: Escapement Fork; 60: Manual Winding Mechanism ; 61: Round hole wheel; 62: Square hole transmission wheel; 63: Square hole wheel; 65: First line; 66: Second line; 67: Third line; 70: Regulator; 77: Marker; 78: Circular area; 80: Escapement; t81~t83: Thickness; 81: First silicon oxide layer; 82: Silicon layer; 83: Second silicon oxide layer; 100: Escape gear section; 100b: Gear section; 101: Escape wheel; 102: Shaft component; 110: Through insertion section; 111: Rim section; 112: Tooth section; 113: First holding section; 113A: Abutting section; 114: Second holding section; 114A: First part; 114B: Second part; 114C: Abutting section; 115: Holding section; 200: Clock. Detailed Implementation

[0031] Implementation Method 1

[0032] ***Overview of Clocks***

[0033] Figure 1 This is the front view of the clock. Figure 2 This is the rear view of the clock.

[0034] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

[0035] like Figure 1 As shown, the clock 200 of Embodiment 1 is an analog wristwatch with an hour hand 44A and a minute hand 44B. The clock 200 is a mechanical clock, employing a mechanism that allows movement from the dial 3 sides and the back cover 8 sides (…). Figure 2 The transparent structure allows a portion of the movement 35 to be seen. Furthermore, the transparent structure includes: a light-transmitting component such as glass disposed on the back cover 8, allowing the movement 35 to be seen through the back cover 8; and an opening in the dial 3 allowing the components of the movement 35 to be seen through the opening in the dial 3.

[0036] The watch 200 has a cylindrical outer casing 5, and a disc-shaped dial 3 is disposed on the inner circumference of the outer casing 5. A window 48A is provided on the dial 3. The watch 200 is configured such that a part of the movement 35 can be seen through the window 48A.

[0037] The surface-side opening of the two openings of the outer casing 5 is blocked by a windshield, and a rear cover 8 is installed at the rear-side opening. Figure 2 In addition, the outer casing 5 is also referred to as the main body.

[0038] The watch 200 includes: a movement 35 housed within an outer case 5; hour hands 44A and minute hands 44B that display time information; a power reserve hand 44C that indicates the duration of a mainspring (not shown); and a small seconds hand 44D.

[0039] The hour hand 44A, minute hand 44B, power reserve hand 44C, and small seconds hand 44D are mounted on the pointer axis of movement 35 and are driven by movement 35.

[0040] A crown 7 is provided on the side of the outer casing 5. By operating the crown 7, inputs corresponding to the operation can be made.

[0041] exist Figure 1 In the dial 3, the escape wheel 101, escape fork 58, balance wheel 47, hairspring 49, screw 90, etc., which are part of the movement 35, can be seen from the side of the dial 3 through the window 48A provided on the dial 3. The escape wheel 101 has an escape gear part 100 and a shaft part 102, which are components for watches.

[0042] like Figure 2 As shown, the back cover 8 is composed of an annular frame member 46 and a window 48B. The frame member 46 forms the outer periphery, and the window 48B is formed by a transparent member embedded in the frame member 46.

[0043] The movement 35 includes a wheel train 45, a balance plate 43, a manual winding mechanism 60, and an automatic winding mechanism 50.

[0044] The wheel train 45 includes a box wheel 41, a second wheel, a third wheel, a fourth wheel 51, an escape wheel 101, an escape fork 58, and a balance wheel 47, all located on the side of the rear cover 8 of the base plate. Figure 2 The diagram shows the barrel wheel 41, the fourth wheel 51, the escape wheel 101, the escape fork 58, and the balance wheel 47. The escape wheel 101 and the escape fork 58 constitute the escapement mechanism 80, and the balance wheel 47 and the hairspring 49 constitute the regulator 70. Furthermore, the regulator 70 is equivalent to the balance wheel and hairspring mechanism.

[0045] The manual winding mechanism 60 includes a handle, a vertical wheel, a clutch wheel, a round hole wheel 61, a square hole transmission wheel 62, and a square hole wheel 63. Figure 2The image shows a round hole wheel 61, a square hole transmission wheel 62, and a square hole wheel 63.

[0046] The automatic winding mechanism 50 includes a rotating hammer, bearings, an eccentric wheel, a claw bar, and a transmission wheel 52. Figure 2 The transmission wheel 52 is shown in the image.

[0047] exist Figure 2 In the casement, the barrel wheel 41, escape wheel 101, escape fork 58, balance wheel 47, round hole wheel 61, square hole transmission wheel 62, square hole wheel 63, eccentric wheel and transmission wheel 52, which are part of the movement 35, can be observed through the window 48B set on the back cover 8.

[0048] Furthermore, the watch components are not limited to the escapement gear 100; any component visible in the perspective view is acceptable. For example, the barrel wheel 41, the numbering wheel including the fourth wheel 51, the escape fork 58, and the regulator 70, which functions as the balance wheel and hairspring mechanism, are also included in the watch components. Additionally, the dial 3 visible through the glass and the hands, including the hour hand 44A and minute hand 44B, are also included in the watch components. In other words, the watch components include at least one of the barrel wheel 41, the numbering wheel, the escapement gear 100, the escape fork 58, and the balance wheel and hairspring mechanism. Furthermore, the watch components include at least one of the dial 3 and the hands.

[0049] Furthermore, in the watch 200, the way in which the structural components of the movement 35 can be seen from the dial 3 side or the case back 8 side is not limited to the above methods.

[0050] For example, the desired structural components of the movement 35 can be seen by appropriately changing the design, size, configuration position, and number of windows 48A and 48B.

[0051] Alternatively, the dial 3 can be formed entirely of transparent components, allowing the movement 35 to be seen from the side of the dial 3. Or the back cover 8 can be formed entirely of transparent components, allowing the movement 35 to be seen from the side of the back cover 8.

[0052] ***The structure of the escape wheel***

[0053] Figure 3 This is a top view of the escapement gear.

[0054] The escapement gear section 100 has a shaft supply component 102 in the central part. Figure 2 The escapement gear 100 has a rim portion 111 having a plurality of teeth 112 and a retaining portion 115, which constitute the through insertion member 110.

[0055] The rim portion 111 is the annular portion of the outer edge of the escapement gear portion 100. The tooth portion 112 protrudes outward from the outer periphery of the rim portion 111 and is formed into a special hook shape.

[0056] The escapement gear section 100 has seven retaining portions 115. The retaining portions 115 are arranged at seven equal intervals of 360° / 7 at seven locations in the circumferential direction of the annular rim section 111. In addition, the number of retaining portions 115 can be between three and seven, or more than seven, and there is no particular limitation.

[0057] The retaining portion 115 has: a first retaining portion 113 extending from the rim portion 111; and a second retaining portion 114 branching from the first retaining portion 113. The first retaining portion 113, the second retaining portion 114 and the rim portion 111 are integrally formed from the same material.

[0058] The first retaining portion 113 extends from the rim portion 111 toward the center portion, and is configured such that its width decreases toward the center portion. The end of the first retaining portion 113 on the center portion side becomes connected to the shaft member 102. Figure 2 The abutting portion 113A is formed in the shape of a planar arc.

[0059] The second retaining part 114 has a first part 114A and a second part 114B. The second retaining part 114 has a shaft member 102 ( Figure 2 It is fixed to the center of the escape gear part 100 and has the function of preventing the escape gear part 100 from tilting or falling off relative to the shaft part 102.

[0060] The first portion 114A is connected to the first retaining portion 113, branching off from the first retaining portion 113 and extending in a direction intersecting the extending direction of the first retaining portion 113. The second retaining portion 114 has a plurality of first portions 114A. The plurality of first portions 114A are arranged substantially parallel to each other. The second portion 114B is connected to the plurality of first portions 114A and extends in a direction toward the center. The width dimension of the second portion 114B is substantially constant, and the end on the center side becomes connected to the shaft member 102 ( Figure 2 The contact portion 114C is formed in the shape of a planar arc.

[0061] ***Structure of the light-reflecting layer***

[0062] Figure 4 It is along Figure 3 A sectional view of the bb section.

[0063] like Figure 3As shown, a decorative line-like portion 10 is provided on the extension of the toothed portion 112 that protrudes outward from the rim portion 111. The line-like portion 10 is an example of the second region and is presented in a different color from the surrounding parts, thus it is set as a design highlight.

[0064] Figure 4 The cross-section of the extension of the tooth 112 is shown. The escapement gear 100 is configured to have a light-reflecting layer 40 on the surface of the substrate 1. The light-reflecting layer 40 is disposed around the entire circumference of the substrate 1.

[0065] Substrate 1 is primarily composed of silicon. There are no particular limitations on the type of silicon; a suitable type can be chosen from a processability perspective. Examples of silicon include monocrystalline silicon and polycrystalline silicon. One type can be used alone, or two or more types can be used in combination. By using a silicon substrate 1, the escapement gear section 100 is made lighter compared to using a metal substrate. Furthermore, complex shapes can be formed using photolithography and etching techniques.

[0066] The light-reflecting layer 40 is formed by sequentially stacking a first silicon oxide layer 81, a silicon layer 82, and a second silicon oxide layer 83 on the substrate 1. The formation methods of each layer will be described later.

[0067] The thickness t81 of the first silicon oxide layer 81 is adjusted according to the desired color, and is typically 100 nm or more and 450 nm or less, preferably 100 nm or more and 400 nm or less. When the thickness t81 of the first silicon oxide layer 81 is 100 nm or more, the thickness is easy to control. When the thickness t81 is 400 nm or less, the film formation time can be shortened, thus improving productivity.

[0068] A silicon layer 82 is disposed on the first silicon oxide layer 81. The silicon layer 82 can be an amorphous layer or a polycrystalline silicon layer, preferably a polycrystalline silicon layer. The thickness t82 of the silicon layer 82 is adjusted according to the color to be developed, preferably 30 nm or more and 150 nm or less. However, it is not limited to this.

[0069] The second silicon oxide layer 83 is disposed on the silicon layer 82. The thickness t83 of the second silicon oxide layer 83 is adjusted according to the color to be developed, and is usually 5 nm or more and 500 nm or less, preferably 10 nm or more and 500 nm or less.

[0070] like Figure 4As shown, the thickness of the light-reflecting layer 40 in the linear portion 10 differs from the thickness of the surrounding layer. Specifically, the thickness t11 of the first silicon oxide layer 81 in the linear portion 10 is smaller than the thickness t81 of the surrounding first silicon oxide layer 81. On the other hand, the thickness t12 of the silicon layer 82 in the linear portion 10 is the same as the thickness t82 of the surrounding silicon layer 82. Similarly, the thickness t13 of the second silicon oxide layer 83 is the same as the thickness t83 of the surrounding second silicon oxide layer 83. That is, compared to the surrounding light-reflecting layer 40, only the thickness t11 of the first silicon oxide layer 81 in the linear portion 10 is thinner. Furthermore, the base portion surrounding the linear portion 10 is referred to as the first region.

[0071] ***Methods for forming a light-reflecting layer***

[0072] Figures 5A to 5G This is a cross-sectional view showing the process of forming the light-reflecting layer. Figures 5A to 5G and Figure 4 Correspondence is along Figure 3 A sectional view of the bb section.

[0073] Next, the method for forming the light-reflecting layer 40, which includes the linear portion 10, will be described.

[0074] First, such as Figure 5A As shown, a first silicon oxide layer 81 is formed around the entire periphery of the substrate 1. In a preferred embodiment, a first silicon oxide layer 81 of thickness t81 is formed on the silicon substrate 1 by thermal oxidation. Examples of thermal oxidation methods include wet oxidation using water and dry oxidation using oxygen. Furthermore, not limited to thermal oxidation, physical vapor deposition (PVD), chemical vapor deposition (CVD), and combinations thereof can also be used. Examples of PVD methods include sputtering, ion plating, and vacuum evaporation. Examples of CVD methods include plasma chemical vapor deposition, thermochemical vapor deposition, and photochemical vapor deposition.

[0075] Next, as Figure 5B As shown, a resist layer 53 is formed by coating the entire surface of the first silicon oxide layer 81 with a known resist, for example. In a preferred embodiment, a positive resist is applied by spraying. Alternatively, a negative resist may also be used.

[0076] Next, exposure is performed using a mask 54, which has an opening in the portion of the mask 54 that serves as the linear portion 10. Specifically, as... Figure 5B As shown, the pattern of the mask 54 is transferred and exposed by irradiating the photoresist layer 53 through the mask 54. Figure 5B The process shown is equivalent to (a) the exposure process.

[0077] Next, as Figure 5CAs shown, the exposed resist layer 53 is developed and removed to form an opening 53a. This process is equivalent to the developing process (b).

[0078] Next, as Figure 5D As shown, the first silicon oxide layer 81 exposed at the opening 53a is etched using the resist layer 53 as a mask. In a preferred embodiment, etching is performed by dry etching until the thickness of the first silicon oxide layer 81 reaches thickness t11. Alternatively, wet etching can also be used. This process is equivalent to etching process (c).

[0079] Then, as Figure 5E As shown, the resist layer 53 is removed.

[0080] Next, as Figure 5F As shown, a silicon layer 82 is formed over the entire surface of the first silicon oxide layer 81. In a preferred embodiment, the silicon layer 82 is formed using a low-pressure CVD method. For example, in a low-pressure CVD method, the silicon layer 82 can be formed by controlling the film formation temperature to be above 500°C and below 700°C and allowing a monosilane gas to flow under low pressure. By forming the silicon layer 82 using a low-pressure CVD method, the composition of the silicon layer 82 can be controlled from amorphous silicon to polycrystalline silicon depending on the film formation temperature.

[0081] Next, as Figure 5G As shown, a second silicon oxide layer 83 is formed over the entire surface of silicon layer 82. In a preferred embodiment, the second silicon oxide layer 83 is formed using the same method as the first silicon oxide layer 81.

[0082] Through the above processes, a Figure 4 The light-reflecting layer 40 shown has a linear portion 10.

[0083] ***Light-reflecting layer with multiple zones***

[0084] Figure 6 This is a cross-sectional view showing an example of a light-reflecting layer with multiple regions, and... Figure 4 correspond.

[0085] exist Figure 4 The example described is a light-reflecting layer 40 with one linear portion 10 as the second region, but multiple regions can be provided on the light-reflecting layer 40.

[0086] exist Figure 6 The light-reflecting layer 40 shown has three regions with different layer thickness structures. First, the second region has the same layer thickness structure as the linear portion 10 described above, and will be referred to as the second region 10 below. The third region 20 is a region with a different layer thickness structure located next to the second region 10. The fourth region 30 is a region with a different layer thickness structure located next to the third region 20.

[0087] Region 30 and Region 40, for example, are decorated with the same lines as the linear section 10, consisting of three long strips of different colors. Hereinafter, [the text continues with further details about the decorative lines and their arrangement]. Figure 4 In the description, the same parts are marked with the same number, and repeated descriptions are omitted.

[0088] In the layer thickness structure of the third region 20, the thickness t22 of the silicon layer 82 is smaller than the thickness t82 of the surrounding silicon layers 82. On the other hand, the thickness t21 of the first silicon oxide layer 81 is the same as the thickness t81 of the surrounding first silicon oxide layer 81. Similarly, the thickness t23 of the second silicon oxide layer 83 is the same as the thickness t83 of the surrounding second silicon oxide layer 83. That is, compared with the surrounding light-reflecting layer 40, only the thickness t22 of the silicon layer 82 in the third region 20 is thinner.

[0089] Such a third region 20 can be formed by the same process as the linear portion 10. In detail, by performing the above-described (a) exposure process, (b) development process, and (c) etching process on the portion that is the third region 20 after the silicon layer 82 is formed, it is possible to reduce only the thickness t22 of the silicon layer 82.

[0090] In the layer thickness structure of region 30, the thickness t33 of the second silicon oxide layer 83 is smaller than the thickness t83 of the surrounding second silicon oxide layers 83. On the other hand, the thickness t31 of the first silicon oxide layer 81 is the same as the thickness t81 of the surrounding first silicon oxide layers 81. Similarly, the thickness t32 of the silicon layer 82 is the same as the thickness t82 of the surrounding silicon layers 82. That is, compared with the surrounding light-reflecting layer 40, only the thickness t33 of the second silicon oxide layer 83 in region 30 is thinner.

[0091] Such a fourth region 30 can be formed by the same process as the linear portion 10. In detail, by performing the above-described (a) exposure process, (b) development process, and (c) etching process on the portion that is the fourth region 30 after the second silicon oxide layer 83 is formed, it is possible to reduce only the thickness t33 of the second silicon oxide layer 83.

[0092] according to Figure 6 The light-reflecting layer 40 can display three colors through the second region 10, the third region 20, and the fourth region 30. Furthermore, by adding the color of the first region in the surrounding base portion, it can display four colors. In other words, the colors in the first through fourth regions are different. Moreover, it is not limited to four colors; more regions with different colors can be provided.

[0093] Furthermore, while the thickness of only one layer was changed in each area as described above, it is also possible to change the thickness of multiple layers in one area. This allows for a wider variety of color representations.

[0094] In other words, when viewed from above, the light-reflecting layer 40 has a first region and a second region 10 of the base portion. Furthermore, the thickness of the first region of the first silicon oxide layer 81 is different from the thickness of the second region 10, or the thickness of the first region of the second silicon oxide layer 83 is different from the thickness of the second region 10. Additionally, the thickness of the silicon layer 82 in the first region may be further made different from the thickness of the silicon layer 82 in the second region 10.

[0095] Furthermore, when viewed from above, the light-reflecting layer 40 also has a third region 20, wherein at least one of the following is different: the thickness of the first silicon oxide layer 81 in the first region is different from the thickness of the first silicon oxide layer 81 in the third region 20; the thickness of the silicon layer 82 in the first region is different from the thickness of the silicon layer 82 in the third region 20; and the thickness of the second silicon oxide layer 83 in the first region is different from the thickness of the second silicon oxide layer 83 in the third region 20.

[0096] ***Hue***

[0097] The above describes the case where the colors of region 10 (region 2), region 20 (region 3), and region 30 are different. This difference in color means that at least one of the hue and chroma, as defined by the CIELAB color space, is different. Furthermore, hue and chroma are represented by color coordinates a* and b* in the CIELAB color space.

[0098] The hue angle ∠h° defined by the CIELAB color space is a parameter representing hue, calculated using the color coordinates a* and b* of the L*a*b* color space, which has approximately equal perceptual step sizes and was recommended by the International Commission on Illumination (CIE) in 1976.

[0099] Hue angle ∠h°=tan -1 (b* / a*)……Equation (1)

[0100] Furthermore, in the Japanese Industrial Standard JIS Z8781-4:2013 "Color Measurement - Part 4: CIE1976L*a*b* Color Space" "3.6 CIELAB1976 ab Hue Angle", the hue angle ∠h° is also a hue-related quantity calculated by formula (11) "4.2 Quantities Related to Lightness, Chromaticity and Hue" (also refer to 03087 of JIS Z8113). "CIE1976L*a*b*" and "CIELAB" can be used interchangeably.

[0101] ***Relationship between film thickness and color in each layer***

[0102] Figure 7 This is a graph showing the relationship between the thickness of the first silicon oxide layer and grayscale. Figure 7 In the diagram, the horizontal axis represents the thickness (nm) of the first silicon oxide layer 81, and the vertical axis represents the grayscale. Additionally, the viewing angle is 0°, and the grayscale is shown as R, G, B.

[0103] exist Figure 7 In this process, the thickness of the first silicon oxide layer 81 is varied by 10 nm each time within a range of 10 nm to 500 nm. On the other hand, the thickness of the silicon layer 82 is fixed at 76 nm, and the thickness of the second silicon oxide layer 83 is fixed at 140 nm.

[0104] The method for determining the grayscale of RGB is as follows. Using a silicon substrate 1, a first silicon oxide layer 81, a silicon layer 82, and a second silicon oxide layer 83, with refractive indices n and attenuation coefficients k at wavelengths above 400 nm and below 800 nm, the reflectance spectrum is calculated optically. Next, using a known method, the reflectance R(λ) and isochromatic functions are transformed into tristimulus values ​​XYZ, and then into RGB values ​​of 256 grayscale. Furthermore, γ is set to 1 without γ correction.

[0105] like Figure 7 As shown, the grayscale values ​​R, G, and B all vary periodically depending on the thickness of the first silicon oxide layer 81.

[0106] For example, to make blue appear brighter, it is preferable to have B at a gray level of 150 or higher and G and R at a gray level of 100 or lower. Therefore, according to Figure 7 It is known that the thickness of the first silicon oxide layer 81 is preferably 20 nm or more and 100 nm or less, or 180 nm or more and 290 nm or less, or 330 nm or more and 500 nm or less. In particular, there is a region around 220 nm where B exhibits high grayscale and G and R exhibit low grayscale. Therefore, it is known that the thickness of the first silicon oxide layer is more preferably 210 nm or more and 280 nm or less.

[0107] Figure 8It is a graph showing the relationship between the thickness of the silicon layer and the grayscale, and... Figure 7 correspond.

[0108] exist Figure 8 In the diagram, the horizontal axis represents the thickness (nm) of the silicon layer 82, and the vertical axis represents the grayscale. Additionally, the viewing angle is 0°, and the grayscale is shown as R, G, B.

[0109] exist Figure 8 In this process, the thickness of the silicon layer 82 is varied by 2 nm each time within the range of 60 nm to 94 nm. On the other hand, the thickness of the first silicon oxide layer 81 is fixed at 220 nm, and the thickness of the second silicon oxide layer 83 is fixed at 140 nm.

[0110] like Figure 8 As shown, it can be seen that changing the thickness of silicon layer 82 by about 5nm results in a significant change in the grayscale of R, G, and B. When the thickness is changed by about 10nm, the grayscale changes even more dramatically.

[0111] Figure 9 This is a graph showing the relationship between the thickness of the second silicon oxide layer and grayscale, and... Figure 7 Corresponding. In Figure 9 In the diagram, the horizontal axis represents the thickness (nm) of the second silicon oxide layer 83, and the vertical axis represents the grayscale. Additionally, the viewing angle is 0°, and the grayscale is shown as R, G, B.

[0112] exist Figure 9 In this process, the thickness of the second silicon oxide layer 83 is varied by 10 nm each time within the range of 80 nm to 650 nm. On the other hand, the thickness of the first silicon oxide layer 81 is fixed at 220 nm, and the thickness of the silicon layer 82 is fixed at 76 nm.

[0113] like Figure 9 As shown, the grayscale values ​​R, G, and B all vary periodically depending on the thickness of the second silicon oxide layer 83.

[0114] For example, to make blue appear brighter, it is preferable to have B at a gray level of 150 or higher and G and R at a gray level of 100 or lower. Therefore, according to Figure 9 It is known that the thickness of the second silicon oxide layer is preferably 100 nm or more and 200 nm or less, or 250 nm or more and 360 nm or less, or 400 nm or more and 550 nm or less.

[0115] like Figures 7-9 As explained, it can be seen that by varying the thickness of the first silicon oxide layer 81, the silicon layer 82, and the second silicon oxide layer 83, a wide variety of colors can be represented.

[0116] <Example>

[0117] Figure 10It is a chart that shows the colors in three regions with different layer thicknesses.

[0118] The thickness of each layer in regions 5, 6, and 7, which have different layer thickness structures, is set to... Figure 10 The thickness of the table confirmed the color in each area.

[0119] In region 5, the thickness of the first silicon oxide layer 81 is set to 150 nm, the thickness of the silicon layer 82 is set to 110 nm, and the thickness of the second silicon oxide layer 83 is set to 70 nm. The color at the observation angle of 0° in region 5 is red.

[0120] In region 6, the thickness of the first silicon oxide layer 81 is set to 220 nm, the thickness of the silicon layer 82 is set to 75 nm, and the thickness of the second silicon oxide layer 83 is set to 140 nm. The color at an observation angle of 0° in region 6 is blue.

[0121] In region 7, the thickness of the first silicon oxide layer 81 is set to 220 nm, the thickness of the silicon layer 82 is set to 65 nm, and the thickness of the second silicon oxide layer 83 is set to 140 nm. The color at an observation angle of 0° in region 7 is purple.

[0122] For example, such as Figure 6 As shown, when the 5th, 6th and 7th regions are arranged in three lines on the substrate 1, it is possible to provide decorative lines in three colors: red, blue and purple.

[0123] In addition, Figure 6 In the illustration, since it is a schematic diagram, the recess of the decorative line portion is shown in a larger size, but in reality, it is a very small recess and therefore will not affect the strength of the substrate 1. For example, in the case of the escapement gear portion 100, since the thickness of the substrate 1 is approximately 120 μm, the depth of the recess of the decorative line portion is on the order of tens of nm. Therefore, within the range of errors in the thickness of the substrate 1, it will not affect the strength of the watch component.

[0124] As described above, the clock component and clock 200 according to this embodiment can achieve the following effects.

[0125] The escapement gear 100, which is a watch component, includes: a substrate 1, which is mainly composed of silicon; and a light-reflecting layer 40, which is formed by sequentially stacking a first silicon oxide layer 81, a silicon layer 82 and a second silicon oxide layer 83 on the substrate 1. When viewed from above, the light-reflecting layer 40 has a first region and a second region 10 of a base portion. The thickness of the first region of the first silicon oxide layer 81 is different from the thickness of the second region 10, or the thickness of the first region of the second silicon oxide layer 83 is different from the thickness of the second region 10.

[0126] Therefore, for example, when the second region 10 is a linear portion 10, the thickness of the first silicon oxide layer 81 in the linear portion 10 is smaller than the thickness of the surrounding first silicon oxide layer 81. This allows decorative lines of a different color from the surrounding linear portion 10 to be provided on the extension of the toothed portion 112. Furthermore, the color of the linear portion 10 can be adjusted by changing the layer thickness.

[0127] Therefore, it is possible to provide watch parts with a wide range of color options and excellent decorative properties. Furthermore, since the substrate 1 is made of lightweight silicon, the depressions caused by changes in layer thickness are minimal, allowing for a wide variety of decorations without compromising the strength of the watch part. Thus, it is possible to provide lightweight watch parts with excellent decorative properties.

[0128] Therefore, it is possible to provide watches 200 that are highly decorative and well-designed.

[0129] Furthermore, the thickness of the silicon layer 82 in the first region can be different from the thickness of the silicon layer 82 in the second region 10.

[0130] Therefore, in addition to changing the thickness of the first silicon oxide layer 81, the thickness of the silicon layer 82 is also changed, thus enabling the representation of a wider variety of colors.

[0131] Furthermore, when viewed from above, the light-reflecting layer 40 also has a third region 20. At least one of the following is different: the thickness of the first silicon oxide layer 81 in the first region is different from the thickness of the first silicon oxide layer 81 in the third region 20; the thickness of the silicon layer 82 in the first region is different from the thickness of the silicon layer 82 in the third region 20; and the thickness of the second silicon oxide layer 83 in the first region is different from the thickness of the second silicon oxide layer 83 in the third region 20. In other words, the colors in the first to third regions are different.

[0132] Therefore, the third region 20 presents a different color than the second region 10. Thus, it can include the first region to represent three colors, and can represent a wider variety of colors.

[0133] In addition, the watch components include at least one of the following: barrel wheel 41, number wheel, escapement gear 100, escapement fork 58, and balance wheel and hairspring mechanism.

[0134] This allows for the provision of highly decorative watch components.

[0135] In addition, the watch components are at least one of the dial 3 and the hands.

[0136] This allows for the provision of highly decorative watch components.

[0137] Furthermore, the clock 200 includes the aforementioned clock components and has a transparent structure that allows the clock components to be seen.

[0138] Therefore, through the perspective structure, a highly designable clock 200 can be provided that uses internal clock components as design elements.

[0139] Implementation Method 2

[0140] ***Different decorative styles***

[0141] Figure 11 This is a top view of the escapement gear section in Embodiment 2, and... Figure 3 correspond.

[0142] In the above embodiment, it is described that a line-shaped portion 10 for decorative purposes is provided in the extension of the tooth portion 112, but it is not limited to this, and any decorative form corresponding to the design is acceptable. For example, in the escapement gear portion 100b of this embodiment, an inclined strip-shaped decorative line is applied to the entire gear portion. Hereinafter, the same reference numerals will be used for the same parts as in the above embodiment, and repeated descriptions will be omitted.

[0143] In the escapement gear section 100b, an inclined strip of decorative lines is provided on the entire gear section. The decorative lines are a pattern of three lines repeating in sequence: red first line 65, blue second line 66, and purple third line 67.

[0144] Line 1, 65 Figure 10 The layer thickness structure of region 5 is red. Line 2, 66 is... Figure 10 The layer thickness structure of region 6 appears blue. Line 3, number 67... Figure 10 The layered structure of the 7th area is purple. Furthermore, while only one color is used for each line, other colors can also be used. Moreover, it is not limited to slanted lines; a variety of designs can be employed to suit the overall design focus of the watch 200.

[0145] As a result, the entire escapement gear section 100b is decorated more vividly with slanted three-color stripes based on the first line 65, the second line 66, and the third line 67.

[0146] Figure 12 yes Figure 3 An enlarged view of part p.

[0147] Figure 12This is an enlarged view of the periphery of the teeth 112 of the escapement gear 100, showing an S-shaped mark 77 on the rim 111. A circular area 78 is provided around the mark 77. In a preferred embodiment, the base portion of the escapement gear 100 is set to blue, the mark 77 is set to red, and the circular area 78 is set to purple. The base portion is set to... Figure 10 The layer thickness structure of the 6th region, mark 77 is set to the layer thickness structure of the 5th region, and the circular region 78 is set to the layer thickness structure of the 7th region.

[0148] In this way, markings, logos, and other text information can be vividly displayed in a variety of colors in watch components. Furthermore, while the above description illustrates setting decorative lines and text information on the surface of the substrate 1, it is not limited to the surface; any surface with the light-reflecting layer 40 can be used, such as the back or side of the substrate 1. This allows for a wider variety of decorations.

Claims

1. A component for a clock, comprising: The substrate, which is mainly composed of silicon; and The light-reflecting layer is formed by sequentially stacking a first silicon oxide layer, a silicon layer, and a second silicon oxide layer on the substrate. When viewed from above, the light-reflecting layer has a first region and a second region. The thickness of the first silicon oxide layer in the first region is different from the thickness in the second region, and the thickness of the second silicon oxide layer in the first region is different from the thickness in the second region.

2. The watch component according to claim 1, wherein, The thickness of the silicon layer in the first region is different from the thickness of the silicon layer in the second region.

3. The watch component according to claim 1 or 2, wherein, When viewed from above, the light-reflecting layer also has a third region. The thickness of the first silicon oxide layer in the first region is different from at least one of the following: the thickness of the first silicon oxide layer in the third region, the thickness of the silicon layer in the first region and the thickness of the silicon layer in the third region, and the thickness of the second silicon oxide layer in the first region and the thickness of the second silicon oxide layer in the third region. Furthermore, the thickness of the first silicon oxide layer in the second region is different from at least one of the following: the thickness of the first silicon oxide layer in the third region, the thickness of the silicon layer in the second region and the thickness of the silicon layer in the third region, and the thickness of the second silicon oxide layer in the second region and the thickness of the second silicon oxide layer in the third region.

4. The watch component according to claim 3, wherein, The colors in regions 1 through 3 are different.

5. The watch component according to claim 4, wherein, The watch component is provided with a decoration that includes a first color in the first region, a second color in the second region, and a third color in the third region.

6. The watch component according to claim 5, wherein, The decoration consists of three-color stripes. The three-color stripe has a first line formed by the first region, a second line formed by the second region, and a third line formed by the third region.

7. The watch component according to claim 5, wherein, The decoration has a base, a mark disposed within the base, and a portion disposed within the base and surrounding the mark. The base is formed from any one of the first region, the second region, and the third region. The marking is formed by a region from the first region, the second region, and the third region that is different from the base. The mark is surrounded by regions that are different from the base and the mark, which are part of the first region, the second region, and the third region.

8. The watch component according to claim 1, wherein, The watch component is at least one of the following: barrel wheel, number wheel, escape wheel, escape fork, and balance wheel and hairspring mechanism.

9. The watch component according to claim 1, wherein, The watch components are at least one of a dial and hands.

10. A watch movement comprising the watch component as described in claim 1.

11. A clock comprising the clock component of claim 1.

12. The clock according to claim 11, wherein, The clock has a transparent structure that allows the components of the clock to be seen.

Images