Substrate processing apparatus

Abstract

A substrate processing apparatus is provided. A technique capable of reducing pressure variation in an exhaust pipe with higher accuracy is provided. The substrate processing apparatus has a tower, a plurality of individual exhaust pipes, a collective exhaust pipe, a switching section, an external gas introduction section, and a control section. The tower includes a plurality of processing units arranged in a vertical direction. The switching section switches between communication and disconnection of each of the plurality of individual exhaust pipes with the collective exhaust pipe. The external gas introduction section has a flow path that introduces an external gas from outside to the collective exhaust pipe. The control section controls an introduction area of the external gas introduction section based on individual introduction areas corresponding to the plurality of processing units respectively and a switching state of the switching section. The individual introduction areas corresponding to the plurality of processing units respectively are set according to each arrangement position of the plurality of processing units.

Description

Technical Field

[0001] This disclosure relates to a substrate processing apparatus. Background Technology

[0002] Conventionally, a substrate processing apparatus for processing substrates has been proposed (e.g., Patent Document 1). In Patent Document 1, the substrate processing apparatus includes multiple processing units stacked in a vertical direction. Each processing unit includes a processing chamber in which a processing fluid, such as a processing liquid, is supplied to the substrate. The substrate is thus processed in accordance with the processing fluid. Gas within the processing chamber is discharged to the outside through an exhaust system described later.

[0003] In Patent Document 1, the processing unit is capable of sequentially supplying an acidic solution, an alkaline solution, and an organic solvent. When the processing unit supplies an acidic solution, the gas discharged from the processing chamber contains gas and mist generated from the acidic solution. At this time, the fluid type of the discharged gas is acidic gas. When the processing unit supplies an alkaline solution, the gas discharged from the processing chamber contains gas and mist generated from the alkaline solution. At this time, the fluid type of the discharged gas is alkaline gas. When the processing unit supplies an organic solvent, the gas discharged from the processing chamber contains gas and mist generated from the organic solvent. At this time, the fluid type of the discharged gas is organic gas.

[0004] The exhaust system directs these exhaust gases to individual exhaust units corresponding to the fluid category. In Patent Document 1, the exhaust system includes a manifold, multiple exhaust pipes, a flow path switching section, and an external gas inlet. The manifold is provided according to the fluid category. That is, manifolds for acidic gases, manifolds for alkaline gases, and manifolds for organic gases are provided. These manifolds are arranged vertically above the stacked unit comprising multiple processing units stacked in the vertical direction.

[0005] Multiple exhaust pipes are provided corresponding to multiple processing units. The upstream end of each exhaust pipe is connected to the processing chamber of the processing unit, and the downstream end of each exhaust pipe is connected to a flow path switching unit. The flow path switching unit guides the exhaust gas from the exhaust pipes to the manifold corresponding to the fluid type. That is, the exhaust gas from the processing unit is guided to any one of the three manifolds according to its fluid type. The processing unit switches and supplies processing liquid sequentially, so the exhaust gas from the processing unit flows by sequentially switching the manifolds.

[0006] Pressure fluctuations in manifolds are undesirable. Therefore, in manifolds where no exhaust gas from the processing unit flows, pressure fluctuations are suppressed by allowing external gas to flow in through an external gas inlet. For example, a flow path switching unit is connected to the downstream end of the external gas inlet, guiding external gas from the external inlet to a manifold that is not connected to the exhaust pipe.

[0007] Existing technical documents

[0008] Patent documents

[0009] Patent Document 1: Japanese Patent Application Publication No. 2020-47897 Summary of the Invention

[0010] The problem the invention aims to solve

[0011] Multiple processing units are stacked vertically, with a manifold positioned vertically above the stacked units. Consequently, the lengths of the exhaust pipes from each processing unit to the manifold vary. Therefore, exhaust gas from the processing unit located at the highest position flows into the manifold through the shortest exhaust pipe, while exhaust gas from the processing unit located at the lowest position flows into the manifold through the longest exhaust pipe. Thus, the pressure variation in the manifold, which changes with the fluid type of the exhaust gas from the processing units, is also related to the location of the processing unit. It is difficult to suppress such pressure variations with high precision.

[0012] Therefore, the purpose of this disclosure is to provide a technique that can reduce pressure variations in an exhaust pipe with greater precision.

[0013] means for solving problems

[0014] The first embodiment is a substrate processing apparatus comprising: a first tower including a plurality of first processing units arranged vertically, each of the first processing units processing a substrate; a plurality of first individual exhaust pipes through which gases discharged from the plurality of first processing units flow; a first combined exhaust pipe; a first switching unit switching the connection and disconnection between each of the first individual exhaust pipes and the first combined exhaust pipe; a first external gas inlet unit having a flow path for introducing external gas from the outside into the first combined exhaust pipe, the inlet area of ​​the flow path being variable; and a control unit controlling the inlet area of ​​the first external gas inlet unit based on the individual inlet areas corresponding to the plurality of first processing units and the switching state of the first switching unit; the individual inlet areas corresponding to the plurality of first processing units are set according to the arrangement position of each of the plurality of first processing units.

[0015] The second approach is that, in the substrate processing apparatus of the first approach, the control unit controls the import area based on the sum of the individual import areas corresponding to the first processing units that are cut off from the first collection exhaust pipe among the plurality of first processing units. The individual import area is set such that the higher the position of the first processing unit among the plurality of first processing units, the larger the value of the individual import area.

[0016] The third approach is that, in the substrate processing apparatus of the first or second approach, the first external gas inlet includes: a single inlet pipe disposed in the first collection exhaust pipe; and a movable member for adjusting the inlet area of ​​the single inlet pipe, controlled by the control unit.

[0017] The fourth approach is that, in a third-party substrate processing apparatus, the substrate processing apparatus further includes a storage unit that pre-stores individual area data showing the individual import areas corresponding to a plurality of first processing units, and the control unit controls the movable member based on the switching state and the individual area data.

[0018] The fifth approach is that, in the substrate processing apparatus of the first or second approach, the first external gas inlet includes: a plurality of inlet pipes having individual inlet areas corresponding to the plurality of first processing units respectively, and a plurality of on / off valves for switching the opening and closing of the plurality of inlet pipes respectively; the control unit controls the plurality of on / off valves based on the switching state.

[0019] The sixth embodiment is a substrate processing apparatus comprising, in any of the first to fifth embodiments, a second tower including a plurality of second processing units arranged horizontally with respect to the first tower, the plurality of second processing units arranged vertically, each of the second processing units processing the substrate; a plurality of second separate exhaust pipes through which gases discharged from the plurality of second processing units flow; a second combined exhaust pipe; a second switching unit switching the connection and disconnection between each of the second separate exhaust pipes and the second combined exhaust pipe; and a second external gas inlet having a flow path for introducing external gas from the outside into the second combined exhaust pipe, the inlet area of ​​which is variable; the control unit controlling the inlet area of ​​the second external gas inlet to be different from the individual inlet areas corresponding to the plurality of second processing units based on the individual inlet areas respectively set for the plurality of second processing units and the switching state of the second switching unit.

[0020] The effects of the invention

[0021] According to the first method, the individual inlet area corresponding to the first processing unit is set according to the installation position of the first processing unit. Therefore, pressure fluctuations caused by different installation positions of the first processing unit can be reduced. In other words, pressure fluctuations in the first manifold exhaust pipe can be reduced with higher precision.

[0022] According to the second method, the amount of exhaust gas from the processing unit that is cut off from the first collection exhaust pipe can be compensated by external gas, and pressure fluctuations can be reduced with higher precision.

[0023] The third and fourth methods make maintenance easier.

[0024] According to the fifth method, it is not necessary to calculate the individual import area, thus reducing the computational load on the control unit.

[0025] According to the sixth method, although the exhaust gas from the first processing unit can flow into the first manifold exhaust pipe, the exhaust gas from the second processing unit cannot. Similarly, although the exhaust gas from the second processing unit can flow into the second manifold exhaust pipe, the exhaust gas from the first processing unit cannot. Therefore, pressure fluctuations caused by the pressure difference between the first and second towers can be reduced more reliably. Attached Figure Description

[0026] Figure 1 This is a top view that schematically illustrates an example of the structure of the substrate processing apparatus according to the first embodiment.

[0027] Figure 2 This is a side view that schematically illustrates an example of the structure of the substrate processing apparatus according to the first embodiment.

[0028] Figure 3 This is a diagram that schematically illustrates an example of the connection relationships of the exhaust system in the first embodiment.

[0029] Figure 4 This is a functional block diagram that roughly illustrates an example of the internal structure of the control unit.

[0030] Figure 5 This is a diagram that roughly illustrates an example of a situation where only the processing unit located at the highest position is connected to the combined exhaust pipe.

[0031] Figure 6 This is a diagram that roughly illustrates an example of a situation where the processing unit, located only at the second highest position, is connected to the combined exhaust pipe.

[0032] Figure 7 This is a diagram that roughly illustrates an example of a situation where only the processing unit located at the lowest position is connected to the exhaust manifold.

[0033] Figure 8 This is a top view that schematically illustrates an example of the structure of the substrate processing apparatus according to the second embodiment.

[0034] Figure 9 This is a side view that schematically illustrates an example of the structure of the substrate processing apparatus according to the second embodiment.

[0035] Figure 10 This is a diagram that schematically illustrates an example of the connection relationship of the exhaust system in the second embodiment.

[0036] Figure 11 This is a perspective view that roughly illustrates an example of the structure of an area adjustment component.

[0037] Figure 12 This is a diagram that roughly illustrates an example of a situation where only the processing unit located at the highest position is connected to the combined exhaust pipe.

[0038] Figure 13 This is a diagram that roughly illustrates an example of a situation where the processing unit, located only at the second highest position, is connected to the combined exhaust pipe.

[0039] Figure 14 This is a diagram that roughly illustrates an example of a situation where only the processing unit located at the lowest position is connected to the exhaust manifold.

[0040] Explanation of reference numerals in the attached figures

[0041] 100: Substrate processing apparatus

[0042] 10, 10a~10c: First processing unit, second processing unit (processing unit)

[0043] 21: The first one is an exhaust pipe, the second one is an exhaust pipe (some exhaust pipes).

[0044] 22: First manifold exhaust pipe, second manifold exhaust pipe (manifold exhaust pipe)

[0045] 23: First switching unit, second switching unit (switching unit)

[0046] 24: First external gas inlet, second external gas inlet (external gas inlet)

[0047] 25: Import tube,

[0048] 252: On / off valve,

[0049] 90: Control Department. Detailed Implementation

[0050] The embodiments will now be described with reference to the accompanying drawings. Furthermore, the drawings are schematic; for ease of explanation, structures have been omitted or simplified as appropriate. Also, the sizes and relative positions of the structures shown in the drawings may not be accurately depicted and can be appropriately modified. Additionally, in the drawings, an XYZ Cartesian coordinate system is sometimes shown to illustrate the positional relationships of the structures. The Z-axis is the vertical axis, and the X and Y axes are horizontal axes. Hereinafter, one side along the X-axis will be referred to as the +X side, and the other side as the -X side. The same applies to the Y-axis.

[0051] Furthermore, in the following description, the same structural elements are labeled with the same reference numerals and illustrated, and their names and functions are also the same. Therefore, detailed descriptions are sometimes omitted to avoid repetition.

[0052] Furthermore, in the following description, even when ordinal numbers such as "first" or "second" are sometimes used, these terms are used for convenience in order to facilitate understanding of the implementation method and are not limited by the order generated by these ordinal numbers.

[0053] When using expressions indicating relative or absolute positional relationships (e.g., "in one direction," "along a direction," "parallel," "orthogonal," "center," "concentric," "coaxial," etc.), unless otherwise specified, the expression not only strictly indicates the positional relationship but also indicates a state of relative displacement in angle or distance within the tolerance range or to obtain the same level of function. When using expressions indicating equal states (e.g., "same," "equal," "homogeneous," etc.), unless otherwise specified, the expression not only indicates a state of quantitatively strict equality but also indicates a state of having tolerances or differences in obtaining the same level of function. When using expressions indicating shape (e.g., "quadrilateral shape" or "cylindrical shape," unless otherwise specified, the expression not only strictly represents the shape geometrically but also indicates a shape with features such as concavity / convexity, chamfering, etc., within the range to obtain the same level of effect. When using expressions such as "has," "is equipped with," "possesses," "includes," or "has" a constituent element, the expression is not an exclusive representation excluding the existence of other constituent elements. When using the expression "at least one of A, B and C", the expression includes: only A, only B, only C, any two of A, B and C, and all of A, B and C.

[0054] <First Implementation>

[0055] <Overview of the substrate processing apparatus>

[0056] Figure 1This is a top view that schematically illustrates an example of the structure of the substrate processing apparatus 100 according to the first embodiment. Figure 2 This is a side view that schematically illustrates an example of the structure of the substrate processing apparatus 100 according to the first embodiment. The substrate processing apparatus 100 is a monolithic processing apparatus that processes substrates W one by one in the processing unit 10 described later.

[0057] The substrate W is, for example, a semiconductor substrate, and has a circular shape. In addition to semiconductor substrates, substrate W can also be used for various other substrates such as photomask substrates, glass substrates for liquid crystal displays, glass substrates for plasma displays, substrates for FED (Field Emission Display) devices, substrates for organic EL (Electro-Luminescence) display devices, substrates for optical discs, substrates for magnetic disks, substrates for magneto-optical discs, ceramic substrates, and solar cell substrates. Furthermore, the shape of the substrate is not limited to a circular shape; for example, it can be a rectangular plate or other shapes.

[0058] exist Figure 1 as well as Figure 2 In this example, the substrate processing apparatus 100 includes an indexer section 110, an apparatus main body 120, and a control section 90. The indexer section 110 and the apparatus main body 120 are arranged in the X-axis direction. Figure 1 as well as Figure 2 In this example, the device body 120 is disposed on the +X side relative to the indexer section 110.

[0059] <Indexer Section>

[0060] Indexing section 110 is an interface section for moving substrates W between the device body 120 and the outside. Here, a substrate container (hereinafter referred to as a carrier) C, which houses multiple substrates W, is moved into indexing section 110 from the outside.

[0061] The indexing unit 110 includes multiple load ports 111 and an indexing robot 112. Each load port 111 holds the carrier C brought in from the outside. Figure 1 In this example, multiple loading / unloading machines 111 are arranged in the Y-axis direction. The indexing robot 112 is a transport unit that moves substrates W between each carrier C and the device body 120, and is positioned on the +X side relative to the multiple loading / unloading machines 111. The indexing robot 112 sequentially removes unprocessed substrates W from the carrier C, transports the substrates W to the device body 120, and sequentially receives processed substrates W from the device body 120, storing the processed substrates W in the carrier C. The carrier C containing the processed substrates W is then moved outward from the loading / unloading machines 111.

[0062] <Main body of the device>

[0063] The main body 120 is part of the processing substrate W, and the multiple processing units 10 include an exhaust system 20 and a central robotic arm 30.

[0064] exist Figure 1 as well as Figure 2 In this example, multiple processing units 10 constitute multiple towers 40. In other words, each tower 40 includes multiple processing units 10 arranged in a vertical direction. Figure 1 In this example, four towers 40A to 40D are provided as multiple towers 40. Specifically, when viewed from above, towers 40A to 40D are respectively located at the vertices of an imaginary quadrilateral. Among them, towers 40A and 40B are arranged in the X-axis direction, towers 40C and 40D are arranged in the X-axis direction, towers 40A and 40C are arranged in the Y-axis direction, and towers 40B and 40D are arranged in the Y-axis direction.

[0065] exist Figure 2 In the example, three processing units 10a to 10c are shown as multiple processing units 10 constituting each tower 40. The processing units 10a to 10c are arranged in this order from vertically above to vertically below. That is, processing unit 10a is located at the vertically uppermost position, and processing unit 10c is located at the vertically lowermost position.

[0066] When viewed from above, the central robot 30 is positioned surrounded by multiple towers 40. The central robot 30 moves the unprocessed substrate W received from the indexing robot 112 into the processing unit 10. The processing unit 10 processes the substrate W. The central robot 30 removes the processed substrate W from the processing unit 10 and transfers it to the indexing robot 112.

[0067] exist Figure 1 as well as Figure 2 In the diagram, the outline of the chambers in each processing unit 10 is shown as dashed rectangles. Each processing unit 10 contains various structural elements (not shown) such as a substrate holding section and a nozzle section inside the processing chamber. The processing unit 10 can supply various processing fluids to the substrate W held by the substrate holding section via the nozzle section. When the processing fluid is a liquid, for example, the substrate holding section includes a rotation mechanism for rotating the substrate W, and the processing unit 10 also includes a cup section surrounding the substrate holding section. The nozzle section supplies the processing fluid toward the main surface of the rotating substrate W. The processing fluid supplied to the substrate W flows radially outward on the main surface of the substrate W, disperses from the periphery of the substrate W, and is collected by the cup section. By acting on the substrate W with the processing fluid, the substrate W can be processed according to the processing fluid. The processing fluid collected by the cup section is appropriately recovered.

[0068] The processing fluids used in the processing unit 10 are classified into multiple fluid categories. In this embodiment, the multiple fluid categories include acidic solutions, alkaline solutions, and organic solvents. Furthermore, the processing fluid may also be a gas.

[0069] Acidic solutions include, for example, DHF (dilute hydrofluoric acid), SC2 (hydrogen peroxide hydrochloride), BHF (buffered hydrofluoric acid), sulfuric acid, SPM (hydrogen peroxide sulfuric acid), and fluoronitric acid (a mixture of hydrofluoric acid and nitric acid). Alkaline solutions include, for example, SC1 (ammonia peroxide), ammonia, ammonium fluoride solution, and TMAH (tetramethylammonium hydroxide). Organic solvents include IPA (isopropanol), methanol, ethanol, HFE (hydrofluoroether), and acetone. Organic solvents can be mixtures, such as a mixture of IPA and acetone, or a mixture of IPA and methanol.

[0070] exist Figure 1 In this example, the substrate processing apparatus 100 also includes an acidic solution supply unit 81, an alkaline solution supply unit 82, and an organic solvent supply unit 83. The acidic solution supply unit 81, alkaline solution supply unit 82, and organic solvent supply unit 83 are disposed on the +X side relative to the apparatus body 120. The acidic solution supply unit 81 stores acidic solution and supplies it to the nozzle of the processing unit 10. The alkaline solution supply unit 82 stores alkaline solution and supplies it to the nozzle of the processing unit 10. The organic solvent supply unit 83 stores organic solvent and supplies it to the nozzle of the processing unit 10.

[0071] In addition, a fan filter unit (FFU) is provided above each processing chamber, and the fan filter unit forms a downward airflow within the processing chamber. The gas in the processing chamber of each processing unit 10 is discharged to the outside of the substrate processing apparatus 100 through the exhaust system 20. Hereinafter, the gas discharged from the processing chamber of the processing unit 10 will be referred to as exhaust gas.

[0072] <Exhaust System>

[0073] When the processing fluid is a liquid, the exhaust gas discharged from each processing unit 10 contains vaporized components (gas) and mist from the processing fluid. Therefore, during the supply of an acidic solution as the processing fluid from the nozzle of the processing unit 10 to the substrate W, the exhaust gas contains both the acidic solution gas and mist. Here, the fluid category of the exhaust gas is also introduced. This exhaust gas fluid category is acidic gas. During the supply of an alkaline solution to the substrate W, the exhaust gas contains both the alkaline solution gas and mist. Hereinafter, this exhaust gas fluid category will be referred to as alkaline gas. During the supply of an organic solvent to the substrate W, the exhaust gas contains both the organic solvent gas and mist. Hereinafter, this exhaust gas fluid category will be referred to as organic gas. It is desirable that these exhaust gases be discharged separately according to their fluid category. Furthermore, this also applies when the processing fluid is a gas.

[0074] Figure 3 This is a diagram that schematically illustrates an example of the connection relationships of the exhaust system 20 according to the first embodiment. Furthermore, in Figure 3 Although the connection relationships of various pipes in the exhaust system 20 are shown in two dimensions, the actual piping is set in three dimensions.

[0075] The exhaust system 20 is a piping system for discharging exhaust gases from each processing unit 10 to the outside of the substrate processing apparatus 100. In this embodiment, the exhaust gases are discharged to the outside via an exhaust path corresponding to the fluid type of the exhaust gases.

[0076] exist Figures 1 to 3 In the example, the exhaust system 20 includes individual exhaust pipes 21, a combined exhaust pipe 22, a switching unit 23, and an external gas inlet unit 24.

[0077] Individual exhaust pipes 21 are configured correspondingly to processing units 10. For a more specific example, they are configured one-to-one with processing unit 10. The upstream end of each individual exhaust pipe 21 is connected to the corresponding processing unit 10, and exhaust gas from the processing unit 10 flows into the upstream end of the individual exhaust pipe 21. Therefore, exhaust gas from the corresponding processing unit 10 flows through each individual exhaust pipe 21.

[0078] like Figure 3 As shown, a pressure adjustment unit 211 can be provided in each exhaust pipe 21. The pressure adjustment unit 211 includes, for example, a pressure sensor (not shown) that measures the pressure in the processing chamber of the processing unit 10, and a flow regulator (e.g., a damper) that adjusts the flow rate of the exhaust gas flowing in the individual exhaust pipe 21. The control unit 90 can adjust the pressure in the processing chamber within a specified range by controlling the flow regulator based on the pressure sensor.

[0079] Additionally, exhaust gas from the processing unit 10 flows through individual exhaust pipes 21. The fluid type of this exhaust gas varies depending on the processing content in the processing unit 10 (i.e., the fluid type of the processed fluid).

[0080] The switching unit 23 guides the exhaust gas from the individual exhaust pipe 21 to the collection exhaust pipe 22 corresponding to the fluid type. That is, the switching unit 23 switches the connection and disconnection between the individual exhaust pipe 21 and the collection exhaust pipe 22. Hereinafter, the collection exhaust pipe 22 for acidic gases, the collection exhaust pipe 22 for alkaline gases, and the collection exhaust pipe 22 for organic gases will be referred to as collection exhaust pipes 22i to 22k, respectively. The switching unit 23 is provided one-to-one with the individual exhaust pipe 21 and is connected to the processing unit 10 via the individual exhaust pipe 21. That is, the switching unit 23 is connected to the downstream end of the individual exhaust pipe 21.

[0081] Each switching unit 23 includes multiple branch exhaust pipes 231 and multiple on / off valves 232, each corresponding to a fluid type. Since there are three fluid types, three types of branch exhaust pipes 231 are provided for each processing unit 10. Hereinafter, the branch exhaust pipe 231 for acidic gases, the branch exhaust pipe 231 for alkaline gases, and the branch exhaust pipe 231 for organic gases will be referred to as branch exhaust pipes 231i to 231k, respectively. The upstream ends of branch exhaust pipes 231i to 231k are connected to individual exhaust pipes 21, and the downstream ends of branch exhaust pipes 231i to 231k are connected to the collection exhaust pipes 22i to 22k, respectively.

[0082] An on / off valve 232 is installed in the branch exhaust pipe 231 to switch the opening and closing of the branch exhaust pipe 231. The on / off valve 232 can be, for example, a butterfly valve or other types of valves. Hereinafter, the on / off valves 232 installed in the branch exhaust pipes 231i to 231k will be referred to as on / off valves 232i to 232k, respectively.

[0083] The control unit 90 controls the on / off valve 232 corresponding to the processing unit 10 based on the fluid type of the exhaust gas from the processing unit 10. Specifically, when the fluid type of the exhaust gas is acidic, the control unit 90 opens the on / off valve 232i and closes the on / off valves 232j and 232k. As a result, the exhaust gas flowing from the processing unit 10 through the individual exhaust pipes 21 into the switching unit 23 flows through the branch exhaust pipe 231i into the collection exhaust pipe 22i for acidic gases. Conversely, when the fluid type of the exhaust gas is alkaline, the control unit 90 opens the on / off valve 232j and closes the on / off valves 232i and 232k. As a result, the exhaust gas from the processing unit 10 flows into the collection exhaust pipe 22j for alkaline gases. Furthermore, when the fluid type of the exhaust gas is organic, the control unit 90 opens the on / off valve 232k and closes the on / off valves 232i and 232j. Therefore, the exhaust gas from the processing unit 10 flows into the collection exhaust pipe 22k for organic gases.

[0084] As described above, the switching unit 23 guides the exhaust gas from the individual exhaust pipes 21 to the aggregate exhaust pipe 22 corresponding to its fluid category.

[0085] exist Figure 2 In this example, the switching unit 23 is positioned horizontally adjacent to the corresponding processing unit 10. Therefore, the height positions of the switching units 23 corresponding to processing units 10a to 10c are different. Specifically, the switching unit 23 corresponding to processing unit 10a is located vertically above both of the switching units 23 corresponding to processing units 10b and 10c, the switching unit 23 corresponding to processing unit 10c is located vertically below both of the switching units 23 corresponding to processing units 10a and 10b, and the switching unit 23 corresponding to processing unit 10b is located between the switching units 23 corresponding to processing units 10a and 10c.

[0086] exist Figures 1 to 3 In the example, a collection vent pipe 22 is provided for each tower 40 and each fluid category. That is, in tower 40A, collection vent pipes 22i to 22k are provided, and in tower 40B, collection vent pipes 22i to 22k are provided for all other towers except tower 40A. The same applies to towers 40C and 40D. There are four towers 40 with three fluid categories, therefore a total of 12 collection vent pipes 22 are provided.

[0087] exist Figure 2In this example, each exhaust pipe 22 includes a longitudinal exhaust pipe 221 and a transverse exhaust pipe 222. The longitudinal exhaust pipe 221 is positioned adjacent to the corresponding tower 40 in the horizontal direction (e.g., the X-axis direction) and extends along the Z-axis direction. The downstream ends of the branch exhaust pipes 231 corresponding to processing units 10a to 10c are connected to the longitudinal exhaust pipe 221 at different heights. That is, the branch exhaust pipe 231 corresponding to the highest-positioned processing unit 10a is connected to the longitudinal exhaust pipe 221 at a connection point vertically above the branch exhaust pipes 231 corresponding to processing units 10b and 10c, respectively. For example, if we focus on the branch exhaust pipe 231i, the connection position Pa of the branch exhaust pipe 231i corresponding to the processing unit 10a and the longitudinal exhaust pipe 221 is located at a higher position than the connection position Pb of the branch exhaust pipe 231i corresponding to the processing unit 10b, and the connection position Pb is located at a higher position than the connection position Pc of the branch exhaust pipe 231i corresponding to the processing unit 10c.

[0088] In each of the exhaust pipes 22, the lower end of the longitudinal exhaust pipe 221 is closed, and the upper end of the longitudinal exhaust pipe 221 is connected to the transverse exhaust pipe 222. Figure 1 as well as Figure 2 In this example, the horizontal exhaust pipe 222 is positioned vertically above the tower 40, extending horizontally (primarily along the X-axis). Specifically, the horizontal exhaust pipe 222 is positioned directly above the tower 40, traversing the tower 40 and extending along the X-axis, bending and extending from the +X side to the -Y side of the alkaline solution supply unit 82. Figure 1 In the example, the horizontal exhaust pipes 222 of the same tower 40, corresponding to the exhaust pipes 22i, 22j, and 22k, are arranged horizontally. The downstream end of each horizontal exhaust pipe 222 is connected to a plant piping, which in turn connects to an exhaust device corresponding to the fluid type. The cross-sectional shape of the horizontal exhaust pipe 222 perpendicular to its length direction is, for example, rectangular. However, the cross-sectional shape of the horizontal exhaust pipe 222 is not limited to rectangular and can be other shapes.

[0089] exist Figure 1 as well as Figure 2 In the example, the horizontal exhaust pipe 222 of the collection exhaust pipe 22i corresponding to tower 40C and the horizontal exhaust pipe 222 of the collection exhaust pipe 22i corresponding to tower 40D are arranged in the Z-axis direction. The horizontal exhaust pipe 222 of the collection exhaust pipe 22i corresponding to tower 40C and the horizontal exhaust pipe 222 of the collection exhaust pipe 22i corresponding to tower 40D extend in a manner that overlaps when viewed from above. The same applies to collection exhaust pipes 22j and 22k, as well as to towers 40A and 40B.

[0090] The external gas inlet 24 is a component used to reduce pressure fluctuations within the manifold exhaust pipe 22 by introducing external gas (hereinafter referred to as external gas) into the manifold exhaust pipe 22. Figure 1 as well as Figure 2 In this example, the external gas inlet 24 is provided in each of the manifold exhaust pipes 22. That is, the external gas inlet 24 and the manifold exhaust pipe 22 are provided one-to-one. Figure 1 as well as Figure 2 In this example, the external gas inlet 24 corresponds to the -X side end of the horizontal exhaust pipe 222. The -X side end of the horizontal exhaust pipe 222 is an opening, through which external gas can flow into the horizontal exhaust pipe 222. The -X side end of the horizontal exhaust pipe 222 is provided in the collection exhaust pipe 22, and can be regarded as a single inlet pipe for introducing external gas. That is, the external gas inlet 24 has a flow path for external gas to flow into the collection exhaust pipe 22, which corresponds to the flow path of the inlet pipe (the end of the horizontal exhaust pipe 222).

[0091] The area of ​​the flow path in the inlet pipe (hereinafter referred to as the inlet area) is variable and can be controlled by the control unit 90. For example, the external gas inlet 24 includes a damper 242 and a drive unit 243 for adjusting the opening of the damper 242 (see reference). Figure 2 The damper 242 includes a plate-shaped movable member 244 rotatably disposed within the -X side end (inlet pipe of the external gas inlet 24) of the transverse exhaust pipe 222. The movable member 244 is configured to rotate between a fully closed position that substantially closes the inlet pipe of the external gas inlet 24 and a fully open position that substantially fully opens the inlet pipe of the external gas inlet 24. Rotation of the movable member 244 between the fully closed and fully open positions allows adjustment of the inlet area. The opening degree of the damper 242 is represented by a rotation angle, wherein the opening degree of the external gas inlet 24 being substantially fully closed is 0 degrees, and the opening degree of the external gas inlet 24 being substantially fully open is 90 degrees.

[0092] The drive unit 243 displaces (rotates) the movable member 244. For example, the drive unit 243 includes a motor. The drive unit 243 is controlled by the control unit 90, which adjusts the rotational position of the movable member 244. Specifically, the control unit 90 controls the drive unit 243 based on the switching state of the switching unit 23, thereby adjusting the rotational position of the movable member 244 and the inlet area of ​​the external gas inlet 24. As detailed later, the control unit 90 adjusts the inlet area, thereby enabling a more precise reduction of pressure fluctuations in the manifold exhaust pipe 22.

[0093] Hereinafter, the external gas inlet 24 provided in the manifold exhaust pipes 22i to 22k will be referred to as external gas inlet 24i to 24k.

[0094] <Control Department>

[0095] The control unit 90 provides overall control of the substrate processing device 100. Specifically, the control unit 90 controls the indexing robot 112, the processing unit 10, the exhaust system 20 (specifically, the switching unit 23 and the drive unit 243, etc.) and the central robot 30.

[0096] Figure 4 This is a functional block diagram illustrating an example of the internal structure of the control unit 90. The control unit 90 is an electronic circuit, including, for example, a data processing unit 91 and a storage unit 92. Figure 4 In a specific example, the data processing unit 91 and the storage unit 92 are interconnected via a bus 93. The data processing unit 91 may be a computing processing device such as a CPU (Central Processing Unit). The storage unit 92 may have a non-temporary storage unit (such as ROM (Read Only Memory) or a hard disk) 921 and a temporary storage unit (such as RAM (Random Access Memory)) 922. The non-temporary storage unit 921 may store a program that specifies, for example, the processing to be performed by the control unit 90. The data processing unit 91 executes the program, thereby enabling the control unit 90 to perform the processing specified in the program. Of course, some or all of the processing performed by the control unit 90 may be executed by dedicated logic circuits or other hardware.

[0097] <Exhaust Action>

[0098] The control unit 90 controls the switching unit 23 based on the fluid type of the exhaust gas from the processing unit 10, guiding the exhaust gas to the collection exhaust pipe 22 corresponding to the fluid type. Since the fluid type of the exhaust gas from each processing unit 10 changes sequentially, the control unit 90 changes the switching state of the switching unit 23 according to the change in fluid type, appropriately guiding the exhaust gas from each processing unit 10 to the collection exhaust pipe 22. Therefore, as detailed below, the flow rate of the exhaust gas flowing into each collection exhaust pipe 22 varies according to the change in the switching state of the switching unit 23.

[0099] For example, in tower 40A, if the fluid type of the exhaust gas from processing units 10a-10c is acidic, the control unit 90 opens the on / off valve 232i corresponding to processing units 10a-10c. As a result, the exhaust gas from processing units 10a-10c flows in the collection exhaust pipe 22i. Figure 3In the example, the flow of these exhaust gases is schematically shown using solid arrows within the piping. Specifically, when the processing fluid supplied to processing unit 10b changes from, for example, an acidic solution to an alkaline solution, control unit 90 closes the on / off valve 232i corresponding to processing unit 10b and opens the on / off valve 232j corresponding to processing unit 10b. This switches the destination of the exhaust gas from the collection exhaust pipe 22i to the collection exhaust pipe 22j. Figure 3 In the example, the dashed arrows within the piping schematically indicate the exhaust gas after the switch. This switch reduces the flow rate of exhaust gas flowing into manifold 22i by the amount flowing into processing unit 10b only, while increasing the flow rate of exhaust gas flowing into manifold 22j by the amount flowing into processing unit 10b only.

[0100] Thus, if the number of processing units 10 connected to each collection exhaust pipe 22 changes, the flow rate of the exhaust gas flowing in each collection exhaust pipe 22 will change.

[0101] Therefore, the control unit 90 controls the external gas inlet section 24 provided in each manifold exhaust pipe 22, adjusting its inlet area. In the above operation example, based on the switching of the opening and closing of the on / off valves 232i and 232j corresponding to the processing unit 10b, the inlet area of ​​the external gas inlet section 24i is increased, and the inlet area of ​​the external gas inlet section 24j is decreased. By increasing the inlet area of ​​the external gas inlet section 24i, the decrease in the exhaust gas discharged from the processing unit 10b in the manifold exhaust pipe 22i can be compensated by external gas, thereby reducing pressure fluctuations within the manifold exhaust pipe 22i. Furthermore, by decreasing the inlet area of ​​the manifold exhaust pipe 22j, the amount of external gas flowing into the manifold exhaust pipe 22j can be reduced, thus reducing pressure fluctuations in the manifold exhaust pipe 22j caused by the discharge gas from the processing unit 10b flowing into the manifold exhaust pipe 22j.

[0102] In this way, the control unit 90 controls the external gas inlet unit 24 based on the switching states of the multiple switching units 23, thereby reducing pressure fluctuations in each manifold exhaust pipe 22. Hereinafter, the description will focus on the manifold exhaust pipe 22i as a representative example.

[0103] Furthermore, the branch exhaust pipes 231i corresponding to the processing units 10a to 10c are connected to the longitudinal exhaust pipe 221 of the collection exhaust pipe 22i at different height positions. Therefore, the flow path lengths from the processing units 10a to 10c to the transverse exhaust pipe 222 of the collection exhaust pipe 22i are different. Specifically, the flow path length increases in length from processing units 10a to 10c. That is, the flow path length from processing unit 10a to transverse exhaust pipe 222 is the shortest, and the flow path length from processing unit 10c to transverse exhaust pipe 222 is the longest.

[0104] Therefore, even when only one processing unit 10 is connected to the manifold exhaust pipe 22i, the pressure in the manifold exhaust pipe 22i will vary depending on which of the processing units 10 (10a-10c) is connected to the manifold exhaust pipe 22i.

[0105] The following describes the switching state in which only one processing unit 10 is connected to the exhaust pipe 22i. Figures 5 to 7 This is a diagram that schematically illustrates an example of a configuration where only one processing unit 10 is connected to the exhaust manifold 22i. Figure 5 In this example, only the processing unit 10a, located at the highest position, is connected to the manifold exhaust pipe 22i. The exhaust gas from the processing unit 10a flows through the manifold exhaust pipe 22i with the shortest possible flow path, thus facilitating the flow of the exhaust gas within the manifold exhaust pipe 22i. Therefore, in Figure 5 In the diagram, thick arrows schematically show the exhaust gas flowing from the processing unit 10a into the collection exhaust pipe 22i.

[0106] exist Figure 6 In the example, only the processing unit 10b, located at the second highest position, is connected to the manifold exhaust pipe 22i. The exhaust gas from processing unit 10b flows in the manifold exhaust pipe 22i with a longer flow path than the flow path corresponding to processing unit 10a. Therefore, the exhaust gas from processing unit 10b is less likely to flow in the manifold exhaust pipe 22i compared to the exhaust gas from processing unit 10a. Therefore, in Figure 6 In China, with the United States Figure 5 The arrows showing the exhaust gas from processing unit 10a are thinner arrows, indicating the exhaust gas flowing from processing unit 10b in the manifold exhaust pipe 22i.

[0107] exist Figure 7 In this example, only the processing unit 10c, located at the lowest position, is connected to the manifold exhaust pipe 22i. The exhaust gas from the processing unit 10c flows through the manifold exhaust pipe 22i with the longest flow path, therefore, the exhaust gas is least likely to flow within the manifold exhaust pipe 22i. Therefore, in Figure 7 In China, with the United States Figure 5 as well as Figure 6 The arrows showing the exhaust gas are thinner, indicating the exhaust gas flowing from the processing unit 10c into the collection exhaust pipe 22i.

[0108] As described above, the flow rate of the gas flowing in the manifold 22i varies depending on the processing unit 10 connected to the manifold 22i, thus causing pressure variations.

[0109] Therefore, even if the number of processing units 10 connected to the collection exhaust pipe 22i is the same, the introduction area of ​​the external gas inlet 24i is adjusted according to the number of processing units 10 connected to the collection exhaust pipe 22i. Specifically, when only processing unit 10a is connected to the collection exhaust pipe 22i ( Figure 5 The inlet area of ​​the external gas inlet 24i is set to be relatively small, when only the processing unit 10b is connected to the collection exhaust pipe 22i. Figure 6 The inlet area of ​​the external gas inlet 24i is set to be larger than that when only the processing unit 10a is connected, when only the processing unit 10c is connected to the collection exhaust pipe 22i. Figure 7 The inlet area of ​​the external gas inlet section 24i is set to be larger than that when only the processing unit 10b is connected. As a result, pressure fluctuations in the manifold exhaust pipe 22i can be reduced with higher precision.

[0110] Specifically, the setting of the inlet area of ​​the external gas inlet 24i is achieved through the following operation. Specifically, an adjustment amount (hereinafter referred to as the individual inlet area) of the inlet area of ​​the external gas inlet 24i is preset for each processing unit 10a to 10c. Hereinafter, the individual inlet areas corresponding to processing units 10a to 10c will be referred to as individual inlet areas A1 to A3. The specific settings of the individual inlet areas A1 to A3 will be described in detail later.

[0111] If the open state of the on / off valve 232i is represented as "1" and the closed state of the on / off valve 232i is represented as "0", then the switching states of the three switching sections 23 of the exhaust manifold 22i are the following eight types. That is, if the open / off states of the on / off valves 232i corresponding to the processing units 10a to 10c are arranged in this order, then the switching states are (000), (001), (010), (100), (011), (101), (110), and (111).

[0112] As detailed below, the control unit 90 sets the inlet area A based on the sum of the individual inlet areas corresponding to the processing units 10 that are cut off from the manifold exhaust pipe 22. As a specific example, the control unit 90 controls the inlet area A of the external gas inlet 24i provided in the manifold exhaust pipe 22i based on the following formula.

[0113] A=Σ(αn·An)(n=1~3)···(1)

[0114] Here, α1 to α3 correspond to processing units 10a to 10c, respectively. When the opening / closing valve 232i is open, αn = 0, and when the opening / closing valve 232i is closed, αn = 1. For example, when the opening / closing valve 232i corresponding to processing unit 10a is open, α1 = 0, and when the opening / closing valve 232i corresponding to processing unit 10a is closed, α1 = 1.

[0115] Table 1 below is an example of the imported area A based on formula (1).

[0116] Table 1

[0117] (111) 0 (100) A2+A3 (110) A3 (010) A1+A3 (101) A2 (001) A1+A2 (011) A1 (000) A1+A2+A3

[0118] As can be understood from Table 1, the individual inlet area An corresponding to the processing unit 10 that is cut off from the collection exhaust pipe 22i is used for the calculation of the inlet area A. For example, in the switching state (100), the processing units 10b and 10c are cut off from the collection exhaust pipe 22i, and the sum of the individual inlet areas A2 and A3 corresponding to the processing units 10b and 10c is the inlet area A.

[0119] Individual inlet areas A1 to A3 are set to different values, specifically, values ​​corresponding to the installation positions of the corresponding processing units 10. More specifically, the higher the installation position of the processing unit 10, the larger the values ​​of individual inlet areas A1 to A3 are set. Therefore, individual inlet area A1 is set to a value larger than both individual inlet areas A2 and A3, individual inlet area A2 is set to a value between individual inlet areas A1 and A3, and individual inlet area A3 is set to a value smaller than both individual inlet areas A1 and A2. Therefore, in Table 1, the lower and righter the inlet area A is, the larger it is. Individual inlet areas A1 to A3 can be set, for example, to values ​​corresponding to the flow rates of the gas discharged from processing units 10a to 10c.

[0120] Individual area data for each import area A1 to A3 corresponding to the processing unit 10 are shown, for example, pre-stored in the storage unit 94. The storage unit 94 is a non-temporary storage unit, such as a memory or hard disk. Figure 4 In this example, the storage unit 94 is also connected to the bus 93. The control unit 90 reads individual area data from the storage unit 94 and, based on the individual area data, determines the individual import areas A1 to A3 corresponding to the processing unit 10.

[0121] Furthermore, the individual import area An can be represented by the product of a constant K and a weighting factor ωn. In this case, the weighting factor ωn can be set according to the setting position of the processing unit 10.

[0122] The control unit 90 controls the drive unit 243 of the external gas inlet unit 24i in such a way that, based on the switching state of the switching unit 23, the inlet area A is calculated using formula (1), so that the inlet area of ​​the external gas inlet unit 24i becomes the calculated inlet area A.

[0123] The following describes the case where only one processing unit 10 is connected to the collection exhaust pipe 22i, in relation to the control of the external gas inlet 24 based on equation (1). Figure 5 The switching state (100) is shown. Figure 6 The switching state (010) is shown. Figure 7 The switching state is shown as (001).

[0124] According to equation (1), the import area A(100) in the switching state (100) where only processing unit 10a is connected to the collection exhaust pipe 22i is controlled as (A2+A3), the import area A(010) in the switching state (010) where only processing unit 10b is connected to the collection exhaust pipe 22i is controlled as (A1+A3), and the import area A(001) in the switching state (001) where only processing unit 10c is connected to the collection exhaust pipe 22i is controlled as (A1+A2).

[0125] For individual imported areas A1 to A3, since the larger the number at the end of the reference numerals, the smaller the area, imported area A(100) is smaller than imported area A(010), and imported area A(010) is smaller than imported area A(001). Therefore, in Figure 5 In the example, the external gas flowing into the manifold exhaust pipe 22i through the external gas inlet 24i is indicated by a thin arrow. Figure 6 In the example of, with Figure 5 The thick arrow indicates the external gas flowing into the manifold exhaust pipe 22i through the external gas inlet 24i. Figure 7 In the example of, with Figure 6 The thick arrow indicates the external gas flowing into the manifold exhaust pipe 22i through the external gas inlet 24i.

[0126] As described above, even if the number of processing units 10 connected to the manifold exhaust pipe 22i is the same, the higher the installation position of the processing unit 10 connected to the manifold exhaust pipe 22i, the smaller the introduction area A. Therefore, external gas can flow into the manifold exhaust pipe 22i at an appropriate flow rate corresponding to the ease of flow of the exhaust gas flowing in the manifold exhaust pipe 22i. Thus, pressure fluctuations in the manifold exhaust pipe 22i can be reduced with higher precision. The same applies to the manifold exhaust pipes 22j and 22k.

[0127] In the above example, individual inlet areas A1 to A3 are set corresponding to the flow rates of the exhaust gases from processing units 10a to 10c, respectively. This allows external gas, equivalent to the exhaust gases from processing units 10 (which are disconnected from the collection exhaust pipe 22i), to be supplied to the collection exhaust pipe 22i through the external gas inlet 24i. For example, in the switching state (100), when processing unit 10a is connected to the collection exhaust pipe 22i and processing units 10b and 10c are disconnected from the collection exhaust pipe 22i, the inlet area A is adjusted to (A2 + A3). This allows external gas equivalent to the exhaust gases from processing units 10b and 10c to flow into the collection exhaust pipe 22i through the external gas inlet 24i. Therefore, a gas volume equivalent to the exhaust gases from processing units 10a to 10c flows in the collection exhaust pipe 22i. This is also true in other switching states, thus ideally eliminating pressure fluctuations in the collection exhaust pipe 22i caused by changes in the switching state.

[0128] Furthermore, in the above example, the external gas inlet 24 includes a single inlet pipe (the end of the horizontal exhaust pipe 222 on the -X side) provided in the manifold exhaust pipe 22 and a movable member 244 for adjusting the inlet area. Therefore, compared to the case where multiple inlet pipes are provided in the manifold exhaust pipe 22, the number of movable members 244 for adjusting the inlet area can be reduced, thus lowering manufacturing costs. Additionally, maintenance of the substrate processing apparatus 100 is also easier.

[0129] In addition, in the above example, individual area data corresponding to the individual imported area of ​​the processing unit 10 is pre-stored in the storage unit 94, and the control unit 90 controls the rotation position of the movable member 244 based on the individual area data and the switching state of the switching unit 23.

[0130] Furthermore, in the above example, while the exhaust manifold 22i was described, the same applies to exhaust manifolds 22j and 22k. In this case, the individual inlet areas A1 to A3 can be set for each fluid category. That is, in each tower 40, the individual inlet area A1 used to calculate the inlet area corresponding to the external gas inlet sections 24i, 24j, and 24k can be set independently. The same applies to the individual inlet areas A2 and A3. Thus, it is possible to set individual inlet areas A1 to A3 suitable for each fluid category.

[0131] exist Figure 1 as well as Figure 2In the example, a collection exhaust pipe 22i is provided for each tower 40. Specifically, there are collection exhaust pipes 22i corresponding to tower 40A, tower 40B, tower 40C, and tower 40D. Therefore, it is possible to prevent exhaust gases from different towers 40 from mixing into the collection exhaust pipe 22i. In this embodiment, individual inlet areas A1 to A3 can be independently set for each tower 40, thus allowing for the setting of individual inlet areas A1 to A3 suitable for each tower 40. Therefore, in each collection exhaust pipe 22i, pressure fluctuations caused by differences between towers 40 can be reduced with higher precision. The same applies to collection exhaust pipes 22j and 22k.

[0132] Here, the terminology used in the means of solving the problem is compared with the terminology used in the specific implementation. One of the towers 40A to 40D corresponds to the first tower, and the other tower corresponds to the second tower. The processing unit 10 belonging to one of the towers 40A to 40D (i.e., the first tower) corresponds to the first processing unit, and the processing unit 10 belonging to the other tower (i.e., the second tower) corresponds to the second processing unit. The individual exhaust pipe 21 connected to the first processing unit corresponds to the first separate exhaust pipe, and the individual exhaust pipe 21 connected to the second processing unit corresponds to the second separate exhaust pipe. The switching section 23 connected to the first separate exhaust pipe corresponds to the first switching section, and the switching section 23 connected to the second separate exhaust pipe corresponds to the second switching section. The various collection exhaust pipes 22i to 22k connected to the first switching section correspond to the first collection exhaust pipe, and the various collection exhaust pipes 22i to 22k connected to the second switching section correspond to the second collection exhaust pipe. The various external gas inlet sections 24i to 24k provided in the first collection exhaust pipe correspond to the first external gas inlet section, and the various external gas inlet sections 24i to 24k provided in the second collection exhaust pipe correspond to the second external gas inlet section.

[0133] <Second Implementation>

[0134] Figure 8 This is a top view that schematically illustrates an example of the structure of the substrate processing apparatus 100 according to the second embodiment. Figure 9 This is a side view schematically illustrating an example of the structure of the substrate processing apparatus 100 according to the second embodiment. Figure 8 In the example, a common exhaust pipe 22i is provided for each of the two adjacent towers 40 in the X-axis direction. That is, a common exhaust pipe 22i is provided on towers 40A and 40B, and a common exhaust pipe 22i is provided on towers 40C and 40D. The same applies to exhaust pipes 22j and 22k.

[0135] The horizontal exhaust pipe 222, which is part of the exhaust pipe 22, is also provided vertically above the tower 40, similar to the first embodiment. The cross-sectional shape of the horizontal exhaust pipe 222, perpendicular to its length direction, is, for example, rectangular. Figure 8 as well as Figure 9 In this example, the width in the vertical direction is greater than the width in the horizontal direction in this cross-sectional shape. This reduces the total width (horizontal width) of the three adjacent horizontal exhaust pipes 222. Therefore, it is possible to prevent the airflow to the fan filter unit located directly above the processing unit 10 from being obstructed by the horizontal exhaust pipes 222. The -X side end of the horizontal exhaust pipes 222 is closed and not open.

[0136] Figure 10 This is a diagram that schematically illustrates an example of the connection relationships of the exhaust system 20 according to the second embodiment. Furthermore, in Figure 10 Although the connection relationships of various pipes in the exhaust system 20 are shown in two dimensions, the actual piping is set in three dimensions.

[0137] In the second embodiment, the external gas inlet 24 provided in each collection exhaust pipe 22 includes multiple inlet pipes 25 corresponding one-to-one with each of the multiple processing units 10. Specifically, a total of six processing units 10 belonging to the two towers 40 correspond to one collection exhaust pipe 22; therefore, six inlet pipes 25 are provided for each collection exhaust pipe 22. Figures 8 to 10 In the example, in each exhaust pipe 22, six inlet pipes 25 are arranged along the length direction (in this case, the X-axis direction) of the horizontal exhaust pipe 222.

[0138] exist Figure 9 In this example, the downstream end of the inlet pipe 25 is connected to the upper surface of the horizontal exhaust pipe 222 of the collection exhaust pipe 22. The inlet pipe 25 extends vertically upward from its downstream end, with its upper end opening vertically upward. External gas flows into the inlet pipe 25 from its upstream opening, passes through the inlet pipe 25, and flows into the horizontal exhaust pipe 222. The cross-sectional shape of the inlet pipe 25, which is perpendicular to the flow direction of the external gas, can be rectangular, or for example, circular.

[0139] The external gas inlet 24 includes an area adjustment member 251 and an on / off valve 252 for each inlet pipe 25. The on / off valve 252 is provided in the inlet pipe 25 to switch the opening and closing of the inlet pipe 25. The on / off valve 252 can be, for example, a butterfly valve or other types of valve.

[0140] The area adjustment component 251 is a component for adjusting the flow path area (individual inlet area) of the inlet pipe 25. Figure 11 This is a perspective view illustrating an example of the structure of the area adjustment member 251. Figure 11In this example, the area adjustment member 251 includes a pair of plate-shaped members 253. The plate-shaped members 253 are mounted on the upper opening of the inlet pipe 25. Specifically, a mounting plate 250 is provided at the upper end of the inlet pipe 25, and a pair of plate-shaped members 253 are mounted on the mounting plate 250. The pair of plate-shaped members 253 are arranged in an alignment direction parallel to the upper opening of the inlet pipe 25.

[0141] Multiple elongated holes 254, extending in the arrangement direction, are formed on each plate-shaped member 253. The elongated holes 254 penetrate the plate-shaped member 253 in the thickness direction. Screws 255 penetrate the elongated holes 254 and engage with screw holes provided in the mounting plate 250, thereby mounting the plate-shaped member 253 onto the mounting plate 250. With this structure, the mounting position of the plate-shaped member 253 relative to the mounting plate 250 can be changed within the range of the length direction (arrangement direction) of the elongated holes 254. Therefore, the spacing between a pair of plate-shaped members 253 can be adjusted, and the area of ​​the opening on the upstream side of the inlet pipe 25 (individual inlet area) can be adjusted.

[0142] For each individual inlet area of ​​the inlet pipe 25, the higher the position of the corresponding processing unit 10, the larger the value of the individual inlet area of ​​the inlet pipe 25 is set. Here, the collection exhaust pipe 22i corresponding to towers 40A and 40B will be described. A total of six inlet pipes 25 are provided on this collection exhaust pipe 22i, corresponding to the three processing units 10a to 10c of tower 40A and the three processing units 10a to 10c of tower 40B. Hereinafter, the inlet pipes 25 will be distinguished by the last letter of the reference numerals of tower 40 and the last letter of the reference numerals of processing unit 10. For example, inlet pipe 25Aa is the inlet pipe 25 corresponding to processing unit 10a of tower 40A.

[0143] The individual inlet areas of inlet pipe 25Aa are set to values ​​corresponding to the flow rates of the exhaust gas from processing unit 10a of tower 40A; the individual inlet areas of inlet pipe 25Ab are set to values ​​corresponding to the flow rates of the exhaust gas from processing unit 10b of tower 40A; and the individual inlet areas of inlet pipe 25Ac are set to values ​​corresponding to the flow rates of the exhaust gas from processing unit 10c of tower 40A. Similarly, the individual inlet areas of inlet pipe 25Ba are set to values ​​corresponding to the flow rates of the exhaust gas from processing unit 10a of tower 40B; the individual inlet areas of inlet pipe 25Bb are set to values ​​corresponding to the flow rates of the exhaust gas from processing unit 10b of tower 40B; and the individual inlet areas of inlet pipe 25Bc are set to values ​​corresponding to the flow rates of the exhaust gas from processing unit 10c of tower 40B.

[0144] Specifically, the individual inlet area of ​​inlet pipe 25Aa is set to be larger than that of inlet pipe 25Ab, and the individual inlet area of ​​inlet pipe 25Ab is set to be larger than that of inlet pipe 25Ac. This is because the higher the processing unit 10 is positioned, the easier it is for the exhaust gas to flow, resulting in a larger flow rate. Similarly, the individual inlet area of ​​inlet pipe 25Ba is set to be larger than that of inlet pipe 25Bb, and the individual inlet area of ​​inlet pipe 25Bb is set to be larger than that of inlet pipe 25Bc. This setting of the individual inlet area is achieved by the user adjusting the area adjustment member 251 corresponding to each inlet pipe 25.

[0145] External gas flows into the manifold exhaust pipe 22i through the multiple inlet pipes 25 of the external gas inlet section 24i, where the on / off valves 252 are open. Therefore, the inlet area A of the external gas inlet section 24i can be defined as the sum of the individual inlet areas of the inlet pipes 25 with the on / off valves 252 open. That is, the inlet area A is adjusted by the on / off valves 252. For example, when all six on / off valves 252 are open, the inlet area A is the sum of the individual inlet areas of the six inlet pipes 25; when only the on / off valve 252 of inlet pipe 25Aa is open, the inlet area A is the individual inlet area of ​​inlet pipe 25Aa.

[0146] The control unit 90 controls the inlet area of ​​the external gas inlet 24i to allow external gas corresponding to the exhaust gas from the processing unit 10, which is disconnected from the collection exhaust pipe 22i, to flow into the collection exhaust pipe 22i. In other words, the control unit 90 controls multiple on / off valves 252 based on the switching states of multiple switching units 23. Specifically, the control unit 90 opens the on / off valve 252 of the inlet pipe 25 corresponding to the processing unit 10 disconnected from the collection exhaust pipe 22i, and closes the on / off valve 252 of the inlet pipe 25 corresponding to the processing unit 10 connected to the collection exhaust pipe 22i. That is, in each collection exhaust pipe 22, the opening and closing states of the on / off valves 232 and 252 corresponding to the same processing unit 10 are opposite to each other. For example, in tower 40A, the opening and closing state of the on / off valve 252 of the inlet pipe 25Aa corresponding to processing unit 10a is controlled to be opposite to the opening and closing state of the on / off valve 232i corresponding to processing unit 10a.

[0147] The following description will representatively illustrate the exhaust operation when only one processing unit 10 in tower 40A is connected to the manifold exhaust pipe 22i. That is, for simplicity, tower 40B will be ignored in the following description. Figures 12 to 14 This is a diagram that roughly illustrates an example of a case where only one processing unit 10 is connected to the combined exhaust pipe 22i. Figure 12 In this example, only the processing unit 10a, located at the highest position, is connected to the exhaust manifold 22i. That is, in Figure 12In the example, the on / off valve 232i corresponding to processing unit 10a is open, and the on / off valves 232i corresponding to processing units 10b and 10c are closed. At this time, the exhaust gas from processing unit 10a flows in the manifold exhaust pipe 22i with the shortest flow path, so the exhaust gas flows easily in the manifold exhaust pipe 22i.

[0148] Furthermore, at this time, the control unit 90 controls the opening and closing valve 252 of the inlet pipe 25 to have its opening and closing state reversed compared to that of the opening and closing valve 232i. That is, the control unit 90 closes the opening and closing valve 252 of the inlet pipe 25Aa and opens the opening and closing valves 252 of the inlet pipes 25Ab and 25Ac. In other words, the control unit 90 controls the inlet area A of the external gas inlet section 24i to be the sum of the individual inlet areas of the inlet pipes 25Ab and 25Ac. As a result, external gas flows through the inlet pipes 25Ab and 25Ac into the collection exhaust pipe 22i. The individual inlet areas of the inlet pipes 25Ab and 25Ac are set to values ​​corresponding to the flow rates of the exhaust gas from the processing units 10b and 10c, so that the amount of exhaust gas from the processing units 10b and 10c in the collection exhaust pipe 22i can be compensated by external gas.

[0149] exist Figure 13 In this example, only the processing unit 10b, located at the second highest position, is connected to the exhaust manifold 22i. That is, in Figure 13 In the example, the on / off valve 232i corresponding to processing unit 10b is open, and the on / off valves 232i corresponding to processing units 10a and 10c are closed, respectively. The exhaust gas from processing unit 10b flows in the manifold 22i with a longer flow path than the flow path corresponding to processing unit 10a. Therefore, the exhaust gas from processing unit 10b is less likely to flow in the manifold 22i compared to the exhaust gas from processing unit 10a.

[0150] Furthermore, at this time, the control unit 90 controls the opening and closing valve 252 of the inlet pipe 25 to have its opening and closing state reversed compared to that of the opening and closing valve 232i. That is, the control unit 90 closes the opening and closing valve 252 of the inlet pipe 25Ab and opens the opening and closing valves 252 of the inlet pipes 25Aa and 25Ac. In other words, the control unit 90 controls the inlet area A of the external gas inlet section 24i to be the sum of the individual inlet areas of the inlet pipes 25Aa and 25Ac. As a result, external gas flows through the inlet pipes 25Aa and 25Ac into the collection exhaust pipe 22i. The individual inlet areas of the inlet pipes 25Aa and 25Ac are set to values ​​corresponding to the flow rates of the exhaust gas from the processing units 10a and 10c, respectively. Therefore, the amount of exhaust gas from the processing units 10a and 10c in the collection exhaust pipe 22i can be compensated by external gas.

[0151] Furthermore, the individual inlet area of ​​inlet tube 25Aa is set to be larger than the inlet area of ​​inlet tube 25Ab, therefore, in Figure 13 The flow rate of external gas flowing into the central exhaust pipe 22i is at the ratio of Figure 12 The flow rate of external gas flowing into the central exhaust pipe 22i is large.

[0152] exist Figure 14 In this example, only the processing unit 10c, located at the lowest position, is connected to the exhaust manifold 22i. That is, in Figure 14 In the example, the on / off valve 232i corresponding to processing unit 10c is open, and the on / off valves 232i corresponding to processing units 10a and 10b are closed. The exhaust gas from processing unit 10c flows in the manifold exhaust pipe 22i with the longest flow path, therefore, the exhaust gas from processing unit 10c is the least likely to flow in the manifold exhaust pipe 22i.

[0153] Furthermore, at this time, the control unit 90 controls the opening and closing valve 252 of the inlet pipe 25 to have its opening and closing state reversed compared to that of the opening and closing valve 232i. That is, the control unit 90 closes the opening and closing valve 252 of the inlet pipe 25Ac and opens the opening and closing valves 252 of the inlet pipes 25Aa and 25Ab. In other words, the control unit 90 controls the inlet area A of the external gas inlet section 24i to be the sum of the individual inlet areas of the inlet pipes 25Aa and 25Ab. As a result, external gas flows through the inlet pipes 25Aa and 25Ab into the collection exhaust pipe 22i. The individual inlet areas of the inlet pipes 25Aa and 25Ab are set to values ​​corresponding to the flow rates of the exhaust gas from the processing units 10a and 10b, respectively. Therefore, the amount of exhaust gas from the processing units 10a and 10b in the collection exhaust pipe 22i can be compensated by external gas.

[0154] Furthermore, the individual inlet area of ​​inlet tube 25Ab is set to be larger than the inlet area of ​​inlet tube 25Ac, therefore, in Figure 14 The flow rate of external gas flowing into the central exhaust pipe 22i is at the ratio of Figure 13 The flow rate of external gas flowing into the central exhaust pipe 22i is large.

[0155] As described above, even if the number of processing units 10 connected to the same manifold exhaust pipe 22i is the same, the higher the installation position of the processing unit 10 connected to the manifold exhaust pipe 22i, the smaller the inlet area A. Therefore, external gas can flow into the manifold exhaust pipe 22i at an appropriate flow rate corresponding to the ease of flow of the exhaust gas flowing in the manifold exhaust pipe 22i. Thus, pressure fluctuations in the manifold exhaust pipe 22i can be reduced with higher precision. Furthermore, if the individual inlet areas of the inlet pipes 25 are set to a value equivalent to the flow rate of the exhaust gas from the corresponding processing unit 10, the flow rate of the gas flowing in the manifold exhaust pipe 22i can be kept approximately constant regardless of the switching state of the switching unit 23. Therefore, pressure fluctuations in the manifold exhaust pipe 22i can be reduced with even higher precision. The same applies to the manifold exhaust pipes 22j and 22k.

[0156] Furthermore, in the second embodiment, the control unit 90 does not need to calculate the inlet area of ​​the external gas inlet 24. Therefore, the computational load on the control unit 90 can be reduced.

[0157] Furthermore, in the above example, the horizontal exhaust pipe 222 of the combined exhaust pipe 22i is configured to be common to the two towers 40 (e.g., tower 40A and tower 40B). However, this is not a limitation. For example, the combined exhaust pipe 22i can be provided for each tower 40 in the same manner as in the first embodiment.

[0158] As described above, the substrate processing apparatus 100 has been described in detail, but the above description is exemplary in all respects and is not limited thereto. It should be understood that numerous variations not illustrated are conceivable without departing from the scope of this disclosure. The structures described in the above embodiments and variations can be appropriately combined or omitted as long as they do not contradict each other.

Claims

1. A substrate processing apparatus, characterized in that, have: The first tower includes n first processing units, where n is an integer greater than or equal to 2. The n first processing units are arranged vertically, and each first processing unit processes the substrate. The gas discharged from each of the n first processing units flows through one of the n first individual exhaust pipes. First exhaust pipe, The first switching unit switches the connection and disconnection between each of the n individual exhaust pipes and the first aggregate exhaust pipe. The first external gas inlet has a flow path for introducing external gas from the outside into the first aggregate exhaust pipe, and the inlet area of ​​the flow path is variable. The control unit, based on the individual inlet areas corresponding to the n first processing units and the switching state of the first switching unit, controls the inlet area of ​​the first external gas inlet, and The storage unit pre-stores individual area data showing the individual import areas corresponding to the n first processing units; The first external gas inlet includes: A single inlet pipe is disposed at the first assembly exhaust pipe; and A movable component, the inlet area of ​​the single inlet tube is adjusted, and the adjustment is controlled by the control unit; The control unit reads the individual area data from the storage unit and calculates the target value A of the imported area based on A=Σ(αn·An). Wherein, αn is "0" when the n first processing units are respectively connected to the first collection exhaust pipe, and is "1" when they are disconnected from the first collection exhaust pipe, and An shows the individual import area corresponding to the n first processing units respectively; The individual imported area An, which is included in the individual area data and corresponds to each of the n first processing units, is set such that the value of the individual imported area An is larger for the first processing unit that is set at a higher position among the n first processing units. The control unit controls the movable component to make the introduced area the target value A.

2. The substrate processing apparatus according to claim 1, characterized in that, have: The second tower includes multiple second processing units arranged horizontally with the first tower, and the multiple second processing units are arranged vertically. Each second processing unit processes the substrate. Multiple second separate exhaust pipes, through which gases discharged from multiple second processing units flow respectively. Second exhaust pipe, The second switching unit switches the connection and disconnection between each of the multiple second individual exhaust pipes and the second combined exhaust pipe, and... The second external gas inlet has a flow path for introducing external gas from the outside into the second collection exhaust pipe, and the inlet area of ​​the flow path is variable. The control unit controls the introduction area of ​​the second external gas introduction section based on individual introduction areas set corresponding to the plurality of second processing units and the switching state of the second switching section. The individual import areas corresponding to the plurality of second processing units are different from each other.

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