Post- electrostatic removal device

Abstract

The application discloses a post electrostatic removal device and belongs to the technical field of electrostatic removal. ‑4 M / bar - 1x10 ‑4 M / bar, the movable bending block and the movable outer frame rotate around the stable rod as the fulcrum, the outer end of the movable bending block and the movable outer frame is unfolded, the film (opp, PET), metallized film and capacitor film needing to be treated are treated, the film is clamped by the two groups of cathode block plates, thereby the two sides of the film are processed, when the lower end surface of the post-treatment rear end plate is attached to the upper end surface of the pre-treatment front end plate, the inner end surface of the first clamping part and the second clamping mechanism are attached, the cooling water is introduced into the inner cavity of the device through the water passing mechanism, thereby the edge of the cathode assembly is cooled by the contact of the cooling water, the first clamping part and the second clamping mechanism are double-opening structures in the whole device, so that the spare parts are convenient to replace and the maintenance is convenient.

Description

Technical Field

[0001] This invention relates to the field of electrostatic removal technology, and more specifically, to a post-electrostatic removal device. Background Technology

[0002] A thin film is a thin, flexible, transparent sheet made of plastics, adhesives, rubber, or other materials. Scientifically, a thin film is a two-dimensional material formed by the deposition of atoms, molecules, or ions onto the surface of a substrate. Examples include optical thin films, composite thin films, superconducting thin films, polyester films, nylon films, and plastic films. Thin films are widely used in electronics, machinery, printing, and other industries. Thin film materials refer to thin layers of metal or organic matter with a thickness ranging from a single atom to several millimeters. Electronic semiconductor functional devices and optical coatings are the main applications of thin film technology.

[0003] Patent No. CN201020158215.3 discloses an electrostatic removal device for thin film materials, including a guide roller and an antistatic rope disposed beside the guide roller. The thin film passes between the guide roller and the antistatic rope. The two ends of the antistatic rope are mounted on magnets, which are fixed on a bracket. The distance between the antistatic rope and the thin film is preferably 2 cm. This patent solution achieves a simple structure, convenient installation, easy cleaning, and improved antistatic effect. However, it cannot use a double-opening structure to perform electrostatic treatment on the thin film. It is also convenient to replace parts and maintain the device. The cathode assembly can be cooled by a water cooling system to avoid dangerous situations caused by excessive temperature.

[0004] In view of this, we propose a post-static removal device. Summary of the Invention

[0005] 1. Technical problems to be solved

[0006] The purpose of this invention is to provide a post-static removal device to solve the problems mentioned in the background art.

[0007] 2. Technical Solution

[0008] The post-static discharge device includes a first clamping member, a processing support frame, and a second clamping mechanism. One side of both the first clamping member and the second clamping mechanism is movably connected to the processing support frame. The first clamping member includes a mounting plate, a receiving end plate, a receiving frame plate, a post-processing rear end plate, and a cathode assembly. The receiving end plate is mounted on one side of the mounting plate, and the receiving frame plate is mounted on the other side of the mounting plate. The post-processing rear end plate is disposed on the other side of the receiving end plate. The mounting plate, the receiving end plate, and the receiving frame plate are connected in series on one side through the cathode assembly.

[0009] Preferably, the cathode assembly includes a mounting frame, through holes, cathode blocks, and partition strips. Through holes are arranged along the edge of the mounting frame, and two sets of cathode blocks are installed in the inner cavity of the mounting frame. The two sets of cathode blocks are separated by partition strips.

[0010] Preferably, the separator is a component made of synthetic rubber.

[0011] Preferably, the second clamping mechanism includes a mounting plate, a bearing plate, a support plate, a post-processing front end plate, a water-passing plate, and a water-passing mechanism. One side of the mounting plate is connected to the bearing plate, and the other side of the mounting plate is connected to the support plate. A water-passing plate is installed on the side of the mounting plate, and a water-passing mechanism is arranged on the other side of the water-passing plate.

[0012] Preferably, the water-passing mechanism includes a water-passing block, a reinforcing block, a vent, a water inlet cavity, a water passage hole, and a storage tank. The reinforcing blocks are arranged opposite each other at the upper and lower ends of the water-passing block. A vent is opened on one side of the edge of the water-passing block, and a water inlet cavity is opened through the other side of the water-passing block. A water passage hole is opened through one side of the water-passing block, and a storage tank is opened in the inner cavity of the water passage hole.

[0013] Preferably, the processing support frame includes a receiving frame, a stabilizing rod, a movable bend block, and a movable outer frame. The stabilizing rod is provided at the side end of the receiving frame, the movable bend block passes through the middle of the stabilizing rod, and the movable outer frame is inserted at both ends of the stabilizing rod.

[0014] Preferably, both the movable bend and the movable outer frame rotate around the stabilizing rod as a fulcrum, with a maximum rotation angle of 90 degrees.

[0015] Preferably, one side of the movable bending block is connected to the receiving frame plate, and one side of the movable outer frame is connected to the bearing plate, so that the first clamping member, the processing support frame and the second clamping mechanism are integrated into one unit.

[0016] Preferably, the other side of the water inlet cavity is connected to the inner cavity of the water passage plate, and the receiving frame is a C-shaped metal component.

[0017] Preferably, when the post-processing rear end plate and the post-processing front end plate are bonded together, the lower end surface of the post-processing rear end plate is bonded to the upper end surface of the post-processing front end plate. Beneficial effects

[0018] Compared with the prior art, the advantages of this invention are:

[0019] 1. This invention proposes a post-static static removal device. The receiving frame is connected to an external connection device, and the device is pushed into a vacuum environment with a vacuum value of [missing value]. The movable bending block and the movable outer frame rotate around the stabilizing rod as the fulcrum, unfolding the outer ends of the movable bending block and the movable outer frame to 30 degrees. The films (opp, PET), metallized films and capacitor films that need to be destaticated are processed. The films are clamped by two sets of cathode plates, thereby processing both sides of the films. When the lower end face of the post-processing rear end plate is attached to the upper end face of the post-processing front end plate, the inner end face of the first clamping member is attached to the inner end face of the second clamping mechanism. Cooling water is introduced into the inner cavity of the device through the water inlet cavity. It enters the inner cavity of the water passage plate through the water inlet cavity, thereby providing cooling water contact cooling to the edge of the cathode assembly.

[0020] 2. This invention proposes a post-static discharge device, which electrically connects the cathode assembly to an external AC intermediate frequency current. Static discharge is assisted by filling a gas in a vacuum environment. The gas is a mixture of argon, nitrogen, and oxygen in a ratio of 10%, 20%, and 70%, respectively. The gas flow rate is limited to 50-500 Sccm. Excessive flow will affect the vacuum annulus. Simultaneously, a vacuum pump evacuates the vacuum environment to ensure adequate gas content. Static discharge can be further assisted by a magnet with a magnetic flux of 440MT.

[0021] 3. This invention proposes a post-static removal device, which mills the central hole of the copper plate structure into a T-shape, with its outer end being a square flat tube plate. The welded square tube is then processed, thereby processing the resulting T-shaped copper plate structure onto the thin film, improving processing efficiency. In the overall device, the first clamping component and the second clamping mechanism are double-opening structures, which facilitates the replacement of parts and maintenance. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the overall structure of the electrostatic removal device of the present invention;

[0023] Figure 2 This is a schematic diagram of the structure of the first clamping member of the static electricity removal device of the present invention;

[0024] Figure 3 This is a schematic diagram of the cathode assembly structure of the electrostatic removal device of the present invention;

[0025] Figure 4 This is a schematic diagram of the support frame structure for the post-static removal device of the present invention;

[0026] Figure 5 This is a schematic diagram of the second clamping mechanism of the static electricity removal device of the present invention.

[0027] The following are the labels in the diagram: 1. First clamping component; 11. Mounting plate; 12. Receiving end plate; 13. Receiving frame plate; 14. Post-treatment rear end plate; 15. Cathode assembly; 151. Mounting frame; 152. Through hole; 153. Cathode block plate; 154. Separator strip; 2. Treatment support frame; 21. Receiving frame; 22. Stabilizing rod; 23. Movable bend; 24. Movable outer frame; 3. Second clamping mechanism; 31. Mounting frame plate; 32. Bearing plate; 33. Support frame plate; 34. Post-treatment front end plate; 35. Water passage plate; 36. Water passage mechanism. Detailed Implementation

[0028] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," and "counterclockwise," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0029] In the description of this invention, "a plurality of" means two or more, unless otherwise explicitly specified.

[0030] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installed," "equipped with," "sleeved / connected," "connected," etc., should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0031] Please see Figure 1-5 The present invention provides a technical solution: Example 1

[0032] The post-static discharge device includes a first clamping member 1, a processing support frame 2, and a second clamping mechanism 3. One side of both the first clamping member 1 and the second clamping mechanism 3 is movably connected to the processing support frame 2. The first clamping member 1 includes a mounting plate 11, a receiving end plate 12, a receiving frame plate 13, a post-processing rear end plate 14, and a cathode assembly 15. The receiving end plate 12 is mounted on one side of the mounting plate 11, and the receiving frame plate 13 is mounted on the other side. The post-processing rear end plate 14 is located on the other side of the receiving end plate 12. The mounting plate 11, the receiving end plate 12, and the receiving frame plate 13 are connected in series on one side via the cathode assembly 15. The cathode assembly 15 includes a mounting frame 151, a through hole 152, a cathode block plate 153, and a separator strip 154. The mounting frame 151 has a side... The cathode assembly 15 has through holes 152. Two sets of cathode plates 153 are installed in the inner cavity of the mounting frame 151. The two sets of cathode plates 153 are separated by a partition strip 154, which is a component made of synthetic rubber. The cathode assembly 15 is electrically connected to the external AC medium frequency current. In a vacuum environment, gas is filled for electrostatic removal. The gas is a mixture of argon, nitrogen and oxygen in a ratio of 10%, 20% and 70%, respectively. The gas flow rate is limited to 50-500 Sccm. If the flow rate is too high, it will affect the vacuum ring. At the same time, the vacuum pump evacuates the vacuum environment to ensure the gas content of the environment. Electrostatic removal can be assisted by a magnet with a magnetic flux of 440MT. Example 2

[0033] The post-static removal device, the second clamping mechanism 3 includes a mounting plate 31, a bearing plate 32, a support plate 33, a post-processing front end plate 34, a water-passing plate 35, and a water-passing mechanism 36. One side of the mounting plate 31 is connected to the bearing plate 32, and the other side of the mounting plate 31 is connected to the support plate 33. The water-passing plate 35 is installed on the side end of the mounting plate 31, and the water-passing mechanism 36 is arranged on the other side of the water-passing plate 35. The water-passing mechanism 36 includes a water-passing block, a reinforcing block, a vent hole, a water inlet chamber, a water-passing hole, and a storage tank. The upper and lower ends of the water-passing block are arranged opposite each other. A reinforcing block is placed, with a vent hole on one side of the water-passing block and a water inlet cavity through the other side. A water-passing hole is also formed on one side of the water-passing block, with a storage tank inside the hole. The other side of the water inlet cavity communicates with the inner cavity of the water-passing plate 35. The receiving frame 21 is a C-shaped metal component. When the post-processing rear end plate 14 and the post-processing front end plate 34 are attached, the lower end face of the post-processing rear end plate 14 is attached to the upper end face of the post-processing front end plate 34. The receiving frame 21 is connected to an external connection device, and the device is pushed into a vacuum environment with a vacuum value of [missing value]. The movable bending block 23 and the movable outer frame 24 rotate around the stabilizing rod 22 as the fulcrum, unfolding the outer ends of the movable bending block 23 and the movable outer frame 24 to 30 degrees. The films (opp, PET), metallized films and capacitor films that need to be destaticated are processed. The films are clamped by the two sets of cathode plates 15, thereby processing both sides of the films. When the lower end face of the post-processing rear end plate 14 is attached to the upper end face of the post-processing front end plate 34, the inner end face of the first clamping member 1 is attached to the second clamping mechanism 3. Cooling water is introduced into the inner cavity of the device through the water inlet cavity. It enters the inner cavity of the water passage plate 35 through the water inlet cavity, thereby cooling the edge of the cathode assembly 15 by contact cooling water. Example 3

[0034] The post-static removal device, the processing support frame 2 includes a receiving frame 21, a stabilizing rod 22, a movable bend 23, and a movable outer frame 24. The stabilizing rod 22 is set on the side end of the receiving frame 21, the movable bend 23 passes through the middle of the stabilizing rod 22, and the movable outer frame 24 is inserted at both ends of the stabilizing rod 22. The movable bend 23 and the movable outer frame 24 rotate around the stabilizing rod 22 as the fulcrum, with a maximum rotation angle of 90 degrees. One side of the movable bend 23 is connected to the receiving frame plate 13, and one side of the movable outer frame 24 is connected to the bearing plate 32, so that the first clamping member 1, the processing support frame 2, and the second clamping mechanism 3 are integrated into one unit. The central hole of the copper plate structure is milled into a T-shape, and its outer end is a square flat tube plate. The welded square tube is processed, thereby processing the obtained T-shaped copper plate structure for film processing, improving processing efficiency. In the overall device, the first clamping member 1 and the second clamping mechanism 3 are double-opening structures, which facilitates the replacement of parts and maintenance.

[0035] In addition, the receiving frame 21 is connected to an external connection device, which pushes the device into a vacuum environment with a vacuum value of [missing value]. The movable bending block 23 and the movable outer frame 24 rotate around the stabilizing rod 22, unfolding the outer ends of the movable bending block 23 and the movable outer frame 24 to 30 degrees. This allows for the processing of films (OPP, PET), metallized films, and capacitor films requiring destatic treatment. The films are clamped by two sets of cathode plates 15, thus processing both sides of the films. When the lower end face of the post-processing rear end plate 14 is in contact with the upper end face of the post-processing front end plate 34, the inner end face of the first clamping member 1 is in contact with the inner end face of the second clamping mechanism 3. Cooling water is introduced into the inner cavity of the device through the water inlet cavity, entering the inner cavity of the water-passing plate 35, thereby providing cooling water contact cooling to the edges of the cathode assembly 15 and allowing the cathode assembly 15 to exchange with the outside environment. The device uses a medium-frequency current electrical connection and employs a gas filling system in a vacuum environment for electrostatic discharge assistance. The gas is a mixture of argon, nitrogen, and oxygen in a ratio of 10%, 20%, and 70%, respectively. The gas flow rate is limited to 50-500 Sccm, as excessive flow will affect the vacuum annulus. Simultaneously, a vacuum pump evacuates the vacuum environment to ensure adequate gas content. Electrostatic discharge is assisted by a magnet with a magnetic flux of 440MT. The central hole of the copper plate structure is milled into a T-shape, with its outer end being a square flat tube. The welded square tube is then processed to obtain the T-shaped copper plate structure for thin film processing, improving processing efficiency. The first clamping component 1 and the second clamping mechanism 3 in the overall device have a double-opening structure, facilitating component replacement and maintenance.

[0036] Working principle: The receiving frame 21 is connected to the external connection equipment, pushing the device into a vacuum environment with a vacuum value of [value missing]. The movable bending block 23 and the movable outer frame 24 rotate around the stabilizing rod 22, unfolding the outer ends of the movable bending block 23 and the movable outer frame 24 to 30 degrees. This allows for the processing of films (OPP, PET), metallized films, and capacitor films requiring destatic treatment. The films are clamped by two sets of cathode plates 15, thus processing both sides of the films. When the lower end face of the post-processing rear end plate 14 is in contact with the upper end face of the post-processing front end plate 34, the inner end face of the first clamping member 1 is in contact with the inner end face of the second clamping mechanism 3. Cooling water is introduced into the inner cavity of the device through the water inlet cavity, entering the inner cavity of the water-passing plate 35, thereby providing cooling water contact cooling to the edges of the cathode assembly 15 and allowing the cathode assembly 15 to exchange with the outside environment. The device uses a medium-frequency current electrical connection and employs a gas filling system in a vacuum environment for electrostatic discharge assistance. The gas is a mixture of argon, nitrogen, and oxygen in a ratio of 10%, 20%, and 70%, respectively. The gas flow rate is limited to 50-500 Sccm, as excessive flow will affect the vacuum annulus. Simultaneously, a vacuum pump evacuates the vacuum environment to ensure adequate gas content. Electrostatic discharge is assisted by a magnet with a magnetic flux of 440MT. The central hole of the copper plate structure is milled into a T-shape, with its outer end being a square flat tube. The welded square tube is then processed to obtain the T-shaped copper plate structure for thin film processing, improving processing efficiency. The first clamping component 1 and the second clamping mechanism 3 in the overall device have a double-opening structure, facilitating component replacement and maintenance.

[0037] In summary: The receiving frame 21 is connected to the external connection equipment, pushing the device into a vacuum environment, where the vacuum value is... The movable bending block 23 and the movable outer frame 24 rotate around the stabilizing rod 22, unfolding the outer ends of the movable bending block 23 and the movable outer frame 24 to 30 degrees. This allows for the processing of films (OPP, PET), metallized films, and capacitor films requiring destatic treatment. The films are clamped by two sets of cathode plates 15, thus processing both sides of the films. When the lower end face of the post-processing rear end plate 14 is in contact with the upper end face of the post-processing front end plate 34, the inner end face of the first clamping member 1 is in contact with the inner end face of the second clamping mechanism 3. Cooling water is introduced into the inner cavity of the device through the water inlet cavity, entering the inner cavity of the water-passing plate 35, thereby providing cooling water contact cooling to the edges of the cathode assembly 15 and allowing the cathode assembly 15 to exchange with the outside environment. The device uses a medium-frequency current electrical connection and employs a gas filling system in a vacuum environment for electrostatic discharge assistance. The gas is a mixture of argon, nitrogen, and oxygen in a ratio of 10%, 20%, and 70%, respectively. The gas flow rate is limited to 50-500 Sccm, as excessive flow will affect the vacuum annulus. Simultaneously, a vacuum pump evacuates the vacuum environment to ensure adequate gas content. Electrostatic discharge is assisted by a magnet with a magnetic flux of 440MT. The central hole of the copper plate structure is milled into a T-shape, with its outer end being a square flat tube. The welded square tube is then processed to obtain the T-shaped copper plate structure for thin film processing, improving processing efficiency. The first clamping component 1 and the second clamping mechanism 3 in the overall device have a double-opening structure, facilitating component replacement and maintenance.

[0038] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The embodiments and descriptions in the specification are merely preferred examples and are not intended to limit the invention. Various changes and modifications can be made to the invention without departing from its spirit and scope, and all such changes and modifications fall within the scope of the present invention as claimed. The scope of protection of the present invention is defined by the appended claims and their equivalents.

Claims

1. A post-static static removal device, characterized in that: The device includes a first clamping member (1), a processing support frame (2), and a second clamping mechanism (3). One side of the first clamping member (1) and the second clamping mechanism (3) are movably connected to the processing support frame (2). The first clamping member (1) includes a mounting plate (11), a receiving end plate (12), a receiving frame plate (13), a post-processing rear end plate (14), and a cathode assembly (15). The receiving end plate (12) is installed on one side of the mounting plate (11), and the receiving frame plate (13) is installed on the other side of the mounting plate (11). The post-processing rear end plate (14) is provided on the other side of the receiving end plate (12). The mounting plate (11), the receiving end plate (12), and the receiving frame plate (13) are connected in series on one side through the cathode assembly (15). The processing support frame (2) includes a receiving frame (21), a stabilizing rod (22), a movable bend (23), and a movable outer frame (24). The receiving frame (21) is provided with a stabilizing rod (22) at its side end. The movable bend (23) passes through the middle of the stabilizing rod (22), and the movable outer frame (24) is inserted through both ends of the stabilizing rod (22). Both the movable bend (23) and the movable outer frame (24) rotate around the stabilizing rod (22) as the fulcrum, with a maximum rotation angle of 90 degrees. One side of the movable bend (23) is connected to the receiving frame plate (13), and one side of the movable outer frame (24) is connected to the bearing plate (32), so that the first clamping member (1), the processing support frame (2) and the second clamping mechanism (3) are a whole.

2. The post-static removal device according to claim 1, characterized in that: The cathode assembly (15) includes a mounting frame (151), a through hole (152), a cathode block plate (153), and a partition strip (154). The through holes (152) are arranged along the edge of the mounting frame (151). Two sets of cathode blocks (153) are installed in the inner cavity of the mounting frame (151). The two sets of cathode blocks (153) are separated by the partition strip (154).

3. The post-static removal device according to claim 2, characterized in that: The separator (154) is a component made of synthetic rubber.

4. The post-static removal device according to claim 1, characterized in that: The second clamping mechanism (3) includes a mounting plate (31), a bearing plate (32), a support plate (33), a post-processing front end plate (34), a water-passing plate (35), and a water-passing mechanism (36). One side of the mounting plate (31) is connected to the bearing plate (32), and the other side of the mounting plate (31) is connected to the support plate (33). The water-passing plate (35) is installed on the side of the mounting plate (31), and the water-passing mechanism (36) is arranged on the other side of the water-passing plate (35).

5. The post-static removal device according to claim 4, characterized in that: The water-passing mechanism (36) includes a water-passing block, a reinforcing block, a vent hole, a water inlet cavity, a water passage hole, and a storage tank. The upper and lower ends of the water-passing block are provided with reinforcing blocks. A vent hole is opened on one side of the edge of the water-passing block. A water inlet cavity is opened through the other side of the water-passing block. A water passage hole is opened through one side of the water-passing block. A storage tank is opened in the inner cavity of the water passage hole.

6. The post-static removal device according to claim 5, characterized in that: The other side of the water inlet cavity is connected to the inner cavity of the water flow plate (35), and the receiving frame (21) is a C-shaped metal component.

7. The post-static removal device according to claim 1, characterized in that: When the post-processing rear end plate (14) is attached to the post-processing front end plate (34), the lower end surface of the post-processing rear end plate (14) is attached to the upper end surface of the post-processing front end plate (34).

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