一种高性能聚合物光热材料制备及其性能调控方法

CN116813888BActive Publication Date: 2026-07-17NANCHANG HANGKONG UNIVERSITY

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
NANCHANG HANGKONG UNIVERSITY
Filing Date
2023-03-17
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Improving the photothermal performance of existing organic photothermal materials is difficult to control, and structural modifications are costly and time-consuming, limiting their development in the field of photothermal materials.

Method used

By employing a random copolymerization strategy, 4,8-bis(5-bromo-4-(2-octyldodecyl)thienyl)-benzodithiadiazole was introduced as a regulating unit and reacted with 4,7-bis(bromo-ethylhexylthienyl-2-)-bisfluoro-benzodithiadiazole and 5,5-bis(trimethyltin)dithiophene via Stille coupling to obtain a random copolymer with a DA-type cross-conjugated structure. The surface of the copolymer was then coated by suspension polymerization to form a high-performance polymer photothermal material.

Benefits of technology

It significantly improves the upper limit of the material's photothermal performance to 350℃, reduces R&D costs and time, has a simple process, readily available raw materials, and is suitable for applications in multiple fields.

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Abstract

本发明涉及一种高性能聚合物光热材料制备及其性能调控方法,具体以BBT为调控单元,四(三苯基膦)钯为催化剂,与BT和5,5‑二(三甲基锡)二噻吩经Stille偶联反应,制得的无规共聚产物PFFBT4T‑BBT‑X通过悬浮聚合进行表面包覆,得到高性能聚合物光热材料。本发明聚合物光热材料的光热性能优异,光热性能上限能达到350℃,可广泛应用于医疗、化工和能源等领域,制备工艺简单,成本低,原料易得。
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